CN102830567B

CN102830567B - Electronic ink display thin film, electronic ink display panel and manufacturing method of electronic ink display thin film

Info

Publication number: CN102830567B
Application number: CN201210313825.XA
Authority: CN
Inventors: 王东岳; 梁永超; 李赣湘; 毛航超; 何基强
Original assignee: Truly Semiconductors Ltd
Current assignee: Truly Semiconductors Ltd
Priority date: 2012-08-29
Filing date: 2012-08-29
Publication date: 2014-11-19
Anticipated expiration: 2032-08-29
Also published as: CN102830567A

Abstract

The embodiment of the invention provides an electronic ink display thin film, an electronic ink display panel and a manufacturing method of the electronic ink display thin film. The manufacturing method of the electronic ink display thin film comprises the steps of: providing a transparent substrate; forming a waterproof layer on a front surface of the transparent substrate; forming a transparent conductive layer on the waterproof layer; and coating an electrophoretic capsule layer on the transparent conductive layer. According to the electronic ink display thin film, the electronic ink display panel and the manufacturing method of the electronic ink display thin film, a protective film in the conventional process is directly formed in the electronic ink display thin film to become a part of the electronic ink display thin film so as to cancel the step of attaching the protective film on the electronic ink display thin film by a laminating machine in the conventional process. Therefore, according to the electronic ink display thin film, the electronic ink display panel and the manufacturing method of the electronic ink display thin film provided by the embodiment of the invention, the quality of the electronic ink display panel can be improved.

Description

Electric ink show film, electronic ink display panel, and preparation method thereof

Technical field

The present invention relates to technical field of manufacturing semiconductors, be specifically related to a kind of electric ink show film, electronic ink display panel, and preparation method thereof.

Background technology

At present, electronic ink display obtains applying more and more widely, and wherein, electronic ink display panel is the chief component of electronic ink display.As shown in Figure 1; electronic ink display panel 100 generally includes drive plate 101 and electric ink shows film 102; for further protecting electronic ink display panel 100; conventionally use make-up machine to show on film 102 and paste layer protecting film 103 at electric ink; be that current electronic ink display panel 100 has drive plate 101 conventionally, electric ink shows film 102, diaphragm 103 three-deckers; wherein mainly utilize functional layer (mainly referring to water barrier, not shown) the protection electronic ink display panel 100 in diaphragm 103.

But, when using make-up machine diaphragm to be attached on electric ink demonstration film, may show between film 102 and diaphragm 103 and remain space at electric ink; form bubble; cause electronic ink display panel Quality Down, also increased production procedure, increased manufacturing cost.

Summary of the invention

In view of this; the object of the present invention is to provide a kind of electric ink show film, electronic ink display panel, and preparation method thereof; to solve electric ink in prior art, show the problem that forms bubble between film and diaphragm; thereby improve the quality of electronic ink display panel, and shorten production procedure, reduction manufacturing cost.

For achieving the above object, the embodiment of the present invention provides a kind of electric ink to show the method for making of film, comprising:

Transparent substrates is provided;

At the positive water barrier that forms of described transparent substrates;

On described water barrier, form transparency conducting layer;

On described transparency conducting layer, apply running gel cystoblast.

Preferably, described positive any one deck or the combination in any forming in UV-protective ild layer, hard coat, antiglare layer of described transparent substrates that be also included in before the positive formation of described transparent substrates water barrier; Or,

Described being also included in form transparency conducting layer on described water barrier before forms any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer on described water barrier; Or,

Described on described transparency conducting layer, apply to be also included in before running gel cystoblast on described transparency conducting layer, form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer.

Preferably, described method also comprises:

At the described transparent substrates back side, form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer.

Preferably, described method also comprises: the marginal portion of described running gel cystoblast is wiped off; Or,

The described running gel cystoblast that applies on described transparency conducting layer comprises: on the middle section of described transparency conducting layer, apply running gel cystoblast;

To make the middle section of described transparency conducting layer be covered by described running gel cystoblast, the fringe region of described transparency conducting layer is not covered by described running gel cystoblast.

The embodiment of the present invention also provides a kind of method for making of electronic ink display panel, comprising:

Provide drive plate and electric ink to show film, wherein, described electric ink shows that film adopts the method for making that the embodiment of the present invention provides to make;

Precalculated position on described drive plate makes conductive structure;

Described electric ink demonstration is film adhered on described drive plate, make described drive plate be electrically connected to by described conductive structure with described transparency conducting layer;

The slit filling with sealant that shows periphery between film and described drive plate at described electric ink.

In the running gel cystoblast of described electric ink demonstration film, make through hole, the degree of depth of described through hole is identical with the thickness of described running gel cystoblast;

Filled conductive material in described through hole;

Described electric ink demonstration is film adhered on described drive plate, make described drive plate be electrically connected to by the conductive material in described through hole with described transparency conducting layer;

The embodiment of the present invention also provides a kind of electric ink to show the method for making of film, comprising:

Transparent substrates is provided;

At the positive transparency conducting layer that forms of described transparent substrates;

On described transparency conducting layer, form water barrier;

On described water barrier, apply running gel cystoblast.

Preferably, described positive any one deck or the combination in any forming in UV-protective ild layer, hard coat, antiglare layer of described transparent substrates that be also included in before the positive formation of described transparent substrates transparency conducting layer; Or,

Described being also included in form water barrier on described transparency conducting layer before forms any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer on described transparency conducting layer; Or,

Described on described water barrier, apply to be also included in before running gel cystoblast on described water barrier, form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer.

Preferably, described method also comprises:

The described running gel cystoblast that applies on described water barrier, comprising: on the middle section of described water barrier, apply running gel cystoblast;

To make the middle section of described water barrier be covered by described running gel cystoblast, the fringe region of described water barrier is not covered by described running gel cystoblast.

Preferably, described method also comprises:

At the fringe region of described water barrier, make the first through hole, the degree of depth of described the first through hole is identical with the thickness of described water barrier.

Preferably, described method also comprises:

At described electric ink, show on film and make the second through hole, described the second through hole penetrates the structure between described running gel cystoblast and described running gel cystoblast and described transparency conducting layer, and the gross thickness of the structure between the degree of depth of described the second through hole and described running gel cystoblast and described running gel cystoblast and described transparency conducting layer is identical.

The embodiment of the present invention provides a kind of method for making of electronic ink display panel, and described method comprises:

At described electric ink, show in film and make third through-hole, described third through-hole penetrates the structure between described running gel cystoblast and described running gel cystoblast and described transparency conducting layer, and the gross thickness of the structure between the degree of depth of described third through-hole and described running gel cystoblast and described running gel cystoblast and described transparency conducting layer is identical;

Filled conductive material in described third through-hole;

Described electric ink demonstration is film adhered on described drive plate, to make described drive plate be electrically connected to by the conductive material being filled in described third through-hole with described transparency conducting layer;

The embodiment of the present invention provides a kind of method for making of electronic ink display panel, comprising:

Precalculated position on described drive plate makes conductive structure;

Filled conductive material in described the first through hole;

Described electric ink is shown film adhered on described drive plate, and make described the first through hole and described conductive structure join, to make described drive plate be electrically connected to by described conductive structure and the conductive material being filled in described the first through hole with described transparency conducting layer;

Filled conductive material in described the second through hole;

Described electric ink demonstration is film adhered on described drive plate, to make described drive plate be electrically connected to by the conductive material being filled in described the second through hole with described transparency conducting layer;

The embodiment of the present invention provides a kind of electric ink to show film, comprising:

Transparent substrates;

Be positioned at the water barrier in described transparent substrates front;

Be positioned at the transparency conducting layer on described water barrier and be positioned at the running gel cystoblast on described transparency conducting layer.

Preferably, also comprise:

Any one deck or combination in any between described transparent substrates front and described water barrier or in the UV-protective ild layer between described water barrier and described transparency conducting layer or between described transparency conducting layer and described running gel cystoblast, hard coat, antiglare layer.

Preferably, also comprise:

Be arranged in UV-protective ild layer, the hard coat at the described transparent substrates back side, any one deck or the combination in any of antiglare layer.

Preferably, described running gel cystoblast covers the middle section of described transparency conducting layer, does not cover the fringe region of described transparency conducting layer.

The embodiment of the present invention provides a kind of electronic ink display panel, comprising:

Drive plate;

Be positioned at the conductive structure in the precalculated position on described drive plate;

The electric ink being fitted on described drive plate shows film, wherein, described electric ink shows that film has the structure of the electric ink demonstration film in the embodiment of the present invention, and described drive plate shows that by described conductive structure and described electric ink the transparency conducting layer in film is electrically connected to;

And the fluid sealant that is filled in the slit of periphery between described electric ink demonstration film and described drive plate.

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink shows that film has the structure of the electric ink demonstration film in the embodiment of the present invention;

Be arranged in the through hole that described electric ink shows the running gel cystoblast of film, the degree of depth of described through hole is identical with the thickness of described running gel cystoblast; Described drive plate shows that with described electric ink the transparency conducting layer in film is electrically connected to by the conductive material being filled in described through hole;

Transparent substrates;

Be positioned at the transparency conducting layer in described transparent substrates front;

Be positioned at the water barrier on described transparency conducting layer and be positioned at the running gel cystoblast on described water barrier.

Preferably, also comprise:

Any one deck or combination in any between described transparent substrates front and described transparency conducting layer or in the UV-protective ild layer between described transparency conducting layer and described water barrier or between described water barrier and described running gel cystoblast, hard coat, antiglare layer.

Preferably, also comprise:

Preferably, described running gel cystoblast covers the middle section of described water barrier, does not cover the fringe region of described water barrier.

Preferably, also comprise:

Be positioned at the first through hole of the fringe region of described water barrier, the degree of depth of described the first through hole is identical with the thickness of described water barrier.

Preferably, also comprise:

Be positioned at the second through hole that described electric ink shows film, described the second through hole penetrates the structure between described running gel cystoblast and described running gel cystoblast and described transparency conducting layer, and the gross thickness of the structure between the degree of depth of described the second through hole and described running gel cystoblast and described running gel cystoblast and described transparency conducting layer is identical.

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink shows that film has the structure of the electric ink demonstration film in the embodiment of the present invention; Described electric ink shows that film also comprises the third through-hole that penetrates the structure between described running gel cystoblast and described transparency conducting layer, in described third through-hole, be filled with conductive material, described drive plate is by described conductive structure and be filled in conductive material in described third through-hole and show that with described electric ink the transparency conducting layer in film is electrically connected to;

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink demonstration film has the structure described in the electric ink demonstration film in the embodiment of the present invention; In described third through-hole, be filled with conductive material, described drive plate shows that with described electric ink the transparency conducting layer in film is electrically connected to by the conductive material being filled in described third through-hole;

According to the electric ink of the embodiment of the present invention show film, electronic ink display panel, and preparation method thereof; diaphragm in traditional handicraft (as water barrier) is formed directly into electric ink to be shown in film; become the part that electric ink shows film; thereby saved, in traditional handicraft, adopt make-up machine that diaphragm is fitted in to electric ink to show the step on film, and then avoided that diaphragm is fitted in to electric ink and show on film and easily cause the problem that produces bubble between diaphragm and electric ink demonstration film.Therefore, electric ink that the embodiment of the present invention provides show film, electronic ink display panel, and preparation method thereof can improve the quality of electronic ink display panel, and can shorten production procedure, reduce manufacturing cost.

Accompanying drawing explanation

In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.Identical Reference numeral represents identical parts.

Fig. 1 is the structural representation that the electric ink of the first example in the embodiment of the present invention one shows film;

Fig. 2 is the process flow diagram that the electric ink shown in Fig. 1 shows the method for making of film;

Fig. 3 is the structural representation that the electric ink of the second example in the embodiment of the present invention one shows film;

Fig. 4 is the process flow diagram that the electric ink shown in Fig. 3 shows the method for making of film;

Fig. 5 is the structural representation that the electric ink of the first example in the embodiment of the present invention two shows film;

Fig. 6 is the process flow diagram that the electric ink shown in Fig. 5 shows the method for making of film;

Fig. 7 is the structural representation that the electric ink of the second example in the invention process two shows film;

Fig. 8 is the process flow diagram that the electric ink shown in Fig. 7 shows the method for making of film;

Fig. 9 is the structural representation that the electric ink of the first example in the embodiment of the present invention three shows film;

Figure 10 is the process flow diagram that the electric ink shown in Fig. 9 shows the method for making of film;

Figure 11 is the structural representation that the electric ink of the second example in the embodiment of the present invention three shows film;

Figure 12 is the process flow diagram that the electric ink shown in Figure 11 shows the method for making of film;

Figure 13 is the structural representation that the electric ink of the first example in the embodiment of the present invention four shows film;

Figure 14 is the process flow diagram that the electric ink shown in Figure 13 shows the method for making of film;

Figure 15 is the structural representation that the electric ink of the second example in the embodiment of the present invention four shows film;

Figure 16 is the process flow diagram that the electric ink shown in Figure 15 shows the method for making of film;

Label in accompanying drawing:

100: electric ink shows film, 101: transparent substrates, 102: water barrier,

103: transparency conducting layer, 104: running gel cystoblast, 105: UV-protective ild layer,

106: hard coat, 107: antiglare layer, 108: the first through holes, 109: the second through holes, 110-through hole, 111: drive plate, 112-conductive structure, 113-fluid sealant, 114-through hole.

Embodiment

For making object, technical scheme and the advantage of the embodiment of the present invention clearer, below in conjunction with the accompanying drawing in the embodiment of the present invention, technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is the present invention's part embodiment, rather than whole embodiment.Embodiment based in the present invention, those of ordinary skills, not making the every other embodiment obtaining under creative work prerequisite, belong to the scope of protection of the invention.

For electric ink in solution prior art shows the problem, the shortening that form bubble between film and diaphragm, make flow process, further reduce costs; the embodiment of the present invention provides electric ink to show film and preparation method thereof; in addition, the embodiment of the present invention also provides electronic ink display panel that adopts this electric ink to show film and preparation method thereof.With some specific embodiments, be described in detail below.

Embodiment mono-

The first example of the embodiment of the present invention one provides a kind of electric ink to show film, Fig. 1 shows the structural representation that this electric ink shows film, and this electric ink shows that film 100 comprises: transparent substrates 101, be positioned at transparent substrates 101 fronts water barrier 102, be positioned at the transparency conducting layer 103 on water barrier 102 and be positioned at the running gel cystoblast 104 on transparency conducting layer 103.

Transparent substrates 101 is for showing that to electric ink film 100 provides support, this transparent substrates 101 can be the conventional any transparent substrates in this area, as plastic, can be polyimide (Polyimide, PI), polyethersulfone resin (Polyethersulfone resin, PES), polyethylene terephthalate (Polyethylene terephthalate, PET) etc.

Water barrier 102 is positioned at transparent substrates 101 fronts, and water barrier 102 is fine and close material layers that one deck adopts silicon dioxide or silicon nitride to form, and can prevent that steam from entering transparency conducting layer 103 and running gel cystoblast 104, thus protection running gel cystoblast 104; The thickness of water barrier 102 can be between 10 ~ 40 μ m, such as thinking 12 μ m, 30 μ m or 40 μ m etc.

Transparency conducting layer 103 is positioned on water barrier 102, and transparency conducting layer 103 can adopt tin indium oxide (ITO), indium zinc oxide (IZO) or other transparent conductive material etc. to make, and the thickness of transparency conducting layer 103 can be left and right.

Be positioned on transparency conducting layer 103 is running gel cystoblast 104.

It should be noted that, electric ink in this first example shows that film 100, except comprising said structure, can also comprise: any one deck or combination in any between transparent substrates 101 fronts and water barrier 102 or in the UV-protective ild layer between water barrier 102 and transparency conducting layer 103 or between transparency conducting layer 103 and running gel cystoblast 104, hard coat, antiglare layer.It is one or several the combination that can also comprise between the positive and water barrier 102 of transparent substrates 101 in UV-protective ild layer, hard coat, antiglare layer, between water barrier 102 and transparency conducting layer 103, can also comprise one or several the combination in UV-protective ild layer, hard coat, antiglare layer, between transparency conducting layer 103 and running gel cystoblast 104, can also comprise one or several the combination in UV-protective ild layer, hard coat, antiglare layer.

In addition, the back side of transparent substrates 101 can also comprise any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer, and this layer and water barrier 102 lay respectively at the both sides of transparent substrates 101.

It should be noted that, electric ink in this first example shows that the running gel cystoblast 104 in film 100 can cover whole transparency conducting layer 103, also can only cover the middle section of transparency conducting layer 103 and does not cover the fringe region (not shown) of transparency conducting layer 103; In a concrete example of the present invention, the fringe region of the transparency conducting layer 103 not covered by running gel cystoblast 104 can be not less than 1.5mm at the width of either side, as being 1.5mm or 2mm etc.

The electric ink that Fig. 2 shows the first example of the embodiment of the present invention one shows the process flow diagram of the method for making of film (being the structure shown in Fig. 1), and this method for making comprises the following steps:

Step S201: transparent substrates 101 is provided;

This transparent substrates 101 can be the conventional any transparent substrates in this area, it can be plastic, as polyimide (Polyimide, PI), polyethersulfone resin (Polyethersulfone resin, PES), polyethylene terephthalate (Polyethylene terephthalate, PET) etc.;

Transparent substrates 101 can be also on glass substrate, to apply the structure that one deck polyimide forms, and general, wherein that thickness of glass substrate can be 0.7mm, and the thickness of polyimide can be 5 μ m.

Step S202: at the positive water barrier 102 that forms of transparent substrates 101;

Particularly, can adopt the conventional thin film-forming method in this areas such as physical method or chemical method at the positive one deck water barrier 102 that forms of transparent substrates, this water barrier 102 can adopt the conventional waterproof material in this area.

Step S203: form transparency conducting layer 103 on water barrier 102;

Particularly, can on water barrier 102, form transparency conducting layer 103 by magnetron sputtering or other conventional thin film-forming methods, this transparency conducting layer 103 can adopt tin indium oxide (ITO), indium zinc oxide (IZO) or other transparent conductive material.

Step S204: apply running gel cystoblast 104 on transparency conducting layer 103.

This running gel cystoblast 104 can adopt the conventional running gel capsule material in this area, and the present invention is not limited in this respect.

The electric ink that the first example of the embodiment of the present invention one provides shows the method for making of film; diaphragm in traditional handicraft (as water barrier) is formed directly into electric ink to be shown in film; become the part that electric ink shows film; thereby saved, in traditional handicraft, adopt make-up machine that diaphragm is fitted in to electric ink to show the step on film, and then avoided that diaphragm is fitted in to electric ink and show on film and easily cause the problem that produces bubble between diaphragm and electric ink demonstration film.Therefore the electric ink that, the embodiment of the present invention provides shows that the method for making of film can improve the quality of electronic ink display panel.

It should be noted that, the electric ink of the first example of the embodiment of the present invention one shows that the method for making of film, except comprising above step, can also comprise steps A and/or B:

Steps A: transparent substrates 101 positive form that water barriers 102 are front can also be in positive any one deck or the combination in any forming in UV-protective ild layer, hard coat, antiglare layer of transparent substrates 101; And/or,

On water barrier 102, form that transparency conducting layer 103 is front can also form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer on water barrier 102; And/or,

On transparency conducting layer 103, apply that running gel cystoblast 104 is front can also form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer on transparency conducting layer 103;

Step B: form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer at transparent substrates 101 back sides.

It should be noted that, this method for making can also comprise wipes the marginal portion of running gel cystoblast 104 off, or, while applying running gel cystoblast 104 on transparency conducting layer 103, only on the middle section of transparency conducting layer 103, apply running gel cystoblast 104; To make the middle section of transparency conducting layer 103 be covered by running gel cystoblast 104, the fringe region of transparency conducting layer 103 is not covered by running gel cystoblast 104.

The second example of the embodiment of the present invention one also provides a kind of electric ink to show film, shown in Figure 3, with Fig. 1 different be, electric ink in the embodiment of the present invention two shows that film also comprises: UV-protective ild layer 105, antiglare layer 107 and hard coat 106(are shown in Figure 3), the transparent substrates 101 of this second example, water barrier 102, transparency conducting layer 103 and running gel cystoblast 104 have identical structure with the description in above-mentioned the first example, do not repeat them here.For simplicity, at this, only introduce the difference of Fig. 3 and Fig. 1, with the something in common of Fig. 1 can be referring to the description in above-mentioned the first example.

In the electric ink demonstration film of this second example, UV-protective ild layer 105 is between transparent substrates 101 fronts and water barrier 102, and hard coat 106 is positioned at transparent substrates 101 back sides, and antiglare layer 107 is positioned at the below (as shown in Figure 3) of hard coat 106.

Wherein, UV-protective ild layer 105 can adopt the material that can allow most ultraviolet light reflections or absorb, for example allow see through and allow lower than 5% ultraviolet light be greater than the material that 90% visible ray sees through, UV-protective ild layer 105 can protect its inner structure (for example running gel cystoblast 104) not affected by ultraviolet ray; The thickness of this UV-protective ild layer 105 can be between 25 ~ 50 μ m, such as thinking 25 μ m, 50 μ m etc.; Hard coat 106 can be the material that one deck passes through the hardening of illumination curing rear surface, and for example hard coat 106 can adopt photosensitive resin, and thickness can be in 2 μ m left and right; Antiglare layer 107 can be one deck by illumination rear surface hackly material that becomes, and this layer material can prevent that electronic ink display panel under illumination, mirror-reflection occurring, and makes electronic ink display panel have larger visual range.

Correspondingly, the method for making that this second example also provides a kind of electric ink to show film, the electric ink that Fig. 4 shows structure shown in construction drawing 3 shows the process flow diagram of the method for film, this method for making comprises the following steps:

Step S401: transparent substrates 101 is provided;

Particularly, this transparent substrates 101 can adopt polyethylene terephthalate (Polyethylene terephthalate, PET), and the thickness of substrate can be between 50 ~ 200 μ m, such as being 50 μ m, 100 μ m or 200 μ m etc.

Step S402: in the positive UV-protective ild layer 105 that forms of transparent substrates 101;

Can adopt the mode of coating in positive this UV-protective ild layer 105 that forms of transparent substrates 101, for example, can adopt the mode of rotary coating or slot coated;

This UV-protective ild layer 105 can adopt the material that can allow most ultraviolet light reflections or absorb, for example allow see through and allow lower than 5% ultraviolet light be greater than the material that 90% visible ray sees through, UV-protective ild layer 105 can protect electronic ink display panel not affected by ultraviolet ray;

The thickness of this UV-protective ild layer 105 can be between 25 ~ 50 μ m, such as thinking 25 μ m, 50 μ m etc.

Step S403: form hard coat 106 at transparent substrates 101 back sides;

This hard coat 106 adopts a kind of special chemical material, this chemical material by illumination after solidified surface hardening, can make electronic ink display panel there is hard outside surface, thus protection electronic ink display panel, and for example this hard coat can adopt photosensitive resin;

Particularly, can adopt the mode (as rotary coating or slot coated) of coating at the transparent substrates back side, to form hard coat, the thickness of this hard coat can be in 2 μ m left and right.

Step S404: form antiglare layer 107 on hard coat 106;

Can adopt the mode of rotary coating or slot coated on hard coat 106, to be coated with one deck chemical material to form antiglare layer 107, the rough surface of this antiglare layer 107 is uneven, can prevent that electronic ink display panel under illumination, mirror-reflection occurring, make electronic ink display panel there is larger visual range.

Step S405: form water barrier 102 on UV-protective ild layer 105;

Water barrier 102 is material layers of one deck densification, can be silicon dioxide or silicon nitride, in this step, can adopt material that conventional physical deposition method deposits one deck densification as chemical gaseous phase depositing process on UV-protective ild layer 105 to form water barrier 102, the thickness of water barrier 102 can be between 10 ~ 40 μ m, for example, can be 10 μ m, 30 μ m or 40 μ m etc.

Step S406: form transparency conducting layer 103 on water barrier 102;

Particularly, can on water barrier, form transparency conducting layer by low temperature magnetic sputtering or other conventional thin film-forming methods, this transparency conducting layer 103 can adopt tin indium oxide (ITO), indium zinc oxide (IZO) or other transparent conductive material, and the thickness of this transparency conducting layer 103 can be left and right.

Step S407: apply running gel cystoblast 104 on transparency conducting layer 103.

It should be noted that, adopt electric ink that this second example provides to show the method for making of film, can on whole transparency conducting layer 103, cover running gel cystoblast 104(as shown in Figure 3), also can be only at the middle section of transparency conducting layer 103, cover running gel cystoblast 104, and not shown in the fringe region of transparency conducting layer 103 does not cover running gel cystoblast 104(Fig. 3).In a concrete example of the present invention, the fringe region of the transparency conducting layer 103 not covered by running gel cystoblast 104 can be not less than 1.5mm at the width of either side, as being 1.5mm or 2mm etc.

In addition, step 402, step S403, step S404 and step S405 as long as carry out between step 401 and step 406, and the sequencing of its execution can be changed arbitrarily, preferably adopts the order execution in the second example of the embodiment of the present invention one.

The embodiment of the present invention one has been introduced electric ink and has been shown film and preparation method thereof, and correspondingly, the embodiment of the present invention two provides the electric ink adopting in the embodiment of the present invention one to show electronic ink display panel of film and preparation method thereof.

Embodiment bis-

The first example of the embodiment of the present invention two provides a kind of electronic ink display panel, and Fig. 5 shows the structural representation of the electronic ink display panel of this first example, and this electronic ink display panel 110 comprises:

Drive plate 111, the conductive structure 112 in the precalculated position on drive plate 111, the fluid sealant 113 that is fitted in the electric ink demonstration film 100 on drive plate 111 and is filled in the slit of periphery between electric ink demonstration film 100 and drive plate 111, wherein drive plate 111 shows that by conductive structure 112 and electric ink the transparency conducting layer 103 in film 100 is electrically connected to; Wherein, this electric ink shows that film 100 can have the structure of the first example in the embodiment of the present invention one or the second example, and this electric ink shows that the running gel cystoblast 104 in film 100 only covers the middle section of transparency conducting layer 103, and not covering the fringe region of transparency conducting layer 103, Fig. 5 only shows electric ink and shows that film 100 has the situation of the structure of the first example in the embodiment of the present invention one.

The embodiment of the present invention and the electronic ink display panel that provides of the first example; diaphragm in traditional handicraft (as water barrier) is formed directly into electric ink to be shown in film; become the part that electric ink shows film; thereby saved, in traditional handicraft, adopt make-up machine that diaphragm is fitted in to electric ink to show the step on film, and then avoided that diaphragm is fitted in to electric ink and show on film and easily cause the problem that produces bubble between diaphragm and electric ink demonstration film.Therefore the electric ink that, the embodiment of the present invention provides shows that the method for making of film can improve the quality of electronic ink display panel.

Conductive structure 112 in the embodiment of the present invention two in the first example can have multiple difform structure, conductive structure 112 shown in Fig. 5 is cuboid, it should be noted that this conductive structure 112 can also be cylindrical, truncated cone-shaped, taper shape or irregular structure, as long as transparency conducting layer 103 can be electrically connected to drive plate 111, the embodiment of the present invention is to the not restriction of the shape of conductive structure 112.

Those skilled in the art are easily combined with the foregoing of the embodiment of the present invention 2 first examples and are obtained other structures of multiple electronic ink display panel by the technical scheme of the first example in the embodiment of the present invention one or the second example, do not repeat them here.

Correspondingly, the first example of the embodiment of the present invention two also provides the method for the electronic ink display panel of structure shown in a kind of construction drawing 5, and referring to Fig. 6, the method comprises the following steps:

Step S601: provide drive plate 111 and electric ink to show film 100, wherein in these electric ink demonstration film 100 employing embodiment of the present invention one, the method for making of the electric ink demonstration film in the first example or the second example is made, and this electric ink shows that the running gel cystoblast 104 in film 100 only covers the middle section of transparency conducting layer 103, and does not cover the fringe region of transparency conducting layer 103;

Step S602: the precalculated position on drive plate 111 makes conductive structure 112, and this precalculated position can be determined according to designing requirement, this conductive structure 112 adopts conductive material, for example, can adopt conductive silver paste.

Step S603: electric ink is shown to film 100 is fitted on drive plate 111, make drive plate 111 be electrically connected to by conductive structure 112 with transparency conducting layer 103;

Step S604: the slit filling with sealant 113 that shows periphery between film 100 and drive plate 111 at electric ink.

The second example of the embodiment of the present invention two provides another kind of electronic ink display panel, shown in Figure 7, and this electronic ink display panel comprises:

Drive plate 111, the electric ink being fitted on drive plate 111 shows film 100, the through hole 110 in the running gel cystoblast 104 of electric ink demonstration film 100 and is filled in the fluid sealant 113 that electric ink shows the slit of periphery between film 100 and drive plate 111; Drive plate 111 shows that with electric ink the transparency conducting layer 103 in film 100 is electrically connected to by the conductive material being filled in through hole 110.

Wherein, this electric ink shows that film 100 can have the structure that electric ink in the first example in the embodiment of the present invention one or the second example shows film, and this electric ink shows that the running gel cystoblast 104 in film 100 can only cover the middle section of transparency conducting layer 103, also can cover whole transparency conducting layer 103; And the degree of depth of through hole 110 is identical with the thickness of running gel cystoblast 104,

Correspondingly, the second example of the embodiment of the present invention two also provides the method for making of the electronic ink display panel shown in Fig. 7, and referring to Fig. 8, the method comprises:

Step S801: provide drive plate 111 and electric ink to show film 100, wherein, electric ink shows that film 100 can adopt electric ink in the first example in the embodiment of the present invention one or the second example to show that the method for making of film makes;

Step S802: make through hole 110 in the running gel cystoblast 104 of electric ink demonstration film 100, wherein the degree of depth of through hole 110 is identical with the thickness of running gel cystoblast 104;

Step S803: at the interior filled conductive material of through hole 110;

Step S804: electric ink is shown to film 100 is fitted on drive plate 111, make drive plate 111 be electrically connected to by the conductive material being filled in through hole 110 with transparency conducting layer 103;

Step S805: the slit filling with sealant 113 that shows periphery between film 100 and drive plate 111 at electric ink.

It should be noted that, electronic ink display panel in the embodiment of the present invention and be confined to said structure, electric ink in this electronic ink display panel shows that film can also comprise UV-protective ild layer, antiglare layer and hard coat etc., and transparent substrates, water barrier, transparency conducting layer, running gel cystoblast, UV-protective ild layer, antiglare layer and hard coat can be arranged in any order, put in order and can determine by designing requirement, at this, will not enumerate.

Embodiment tri-

The first example of the embodiment of the present invention three provides a kind of electric ink to show film, and Fig. 9 shows the structural representation that this electric ink shows film, and this electric ink shows that film comprises:

Transparent substrates 101, is positioned at the transparency conducting layer 103 in transparent substrates 101 fronts, is positioned at the water barrier 102 on transparency conducting layer 103 and is positioned at the running gel cystoblast 104 on water barrier 102.

In traditional handicraft, conventionally by transparency conducting layer setting adjacent with running gel cystoblast, still, in fact can also between transparency conducting layer and running gel cystoblast, press from both sides skim, the thickness of this thin layer can not be excessive certainly.

Except structure illustrated in fig. 9, the electric ink in the first example of the embodiment of the present invention three shows that film can also comprise following structure:

Any one deck or combination in any between transparent substrates 101 fronts and transparency conducting layer 103 or in the UV-protective ild layer between transparency conducting layer 103 and water barrier 102 or between water barrier 102 and running gel cystoblast 104, hard coat, antiglare layer; And/or, be arranged in UV-protective ild layer, the hard coat at transparent substrates 101 back sides, any one deck or the combination in any of antiglare layer.

Electric ink in the embodiment of the present invention three shows that the running gel cystoblast 104 in film can cover whole water barrier 102(as shown in Figure 9), also can only cover the middle section of water barrier 102 and do not cover the fringe region (not shown) of water barrier 102; In addition, electric ink in the embodiment of the present invention three shows that film can also comprise the first through hole 108 of the fringe region that is positioned at water barrier 102, wherein the identical (not shown) of thickness of the degree of depth of the first through hole 108 and water barrier 102.

In addition, electric ink in this first example shows that film can also comprise that the second through hole 109(is not shown), this second through hole 109 penetrates the structure (for example penetrating running gel cystoblast 104 and water barrier 102 in Fig. 9) between running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103, and wherein the gross thickness of the structure between the degree of depth of the second through hole 109 and running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103 is identical.

The first example of the embodiment of the present invention three also provides the electric ink shown in a kind of Fig. 9 to show the method for making of film, and referring to Figure 10, the method comprises the following steps:

Step S1001: transparent substrates 101 is provided;

Step S1002: at the positive transparency conducting layer 103 that forms of transparent substrates 101;

Step S1003: form water barrier 102 on transparency conducting layer 103;

Step S 1004: on water barrier 102, apply running gel cystoblast 104.

In addition, this method for making can also comprise the following steps C and/or step D:

Step C: positive to form transparency conducting layer 103(be step S1002 in transparent substrates 101) front can also be in positive any one deck or the combination in any forming in UV-protective ild layer, hard coat, antiglare layer of transparent substrates 101; And/or,

On transparency conducting layer 103, forming water barrier 102(is step S1003) frontly can also on transparency conducting layer 103, form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer; And/or,

On water barrier 102, applying running gel cystoblast 104(is step S1003) frontly can also on water barrier 102, form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer;

Step D: form any one deck or the combination in any in UV-protective ild layer, hard coat, antiglare layer at transparent substrates 101 back sides.

In addition, the method for making in this first example can also comprise: the marginal portion of running gel cystoblast 104 is wiped off, or, while applying running gel cystoblast 104 on water barrier 102, only on the middle section of water barrier 102, apply running gel cystoblast 104; To make the middle section of water barrier 102 be covered by running gel cystoblast 104, the fringe region of water barrier 102 is not covered (not shown) by running gel cystoblast 104.

It should be noted that, in the first example of the embodiment of the present invention three or the method for making of the demonstration of the electric ink in the second example film, can also comprise: at the fringe region of water barrier 102, make the first through hole 108, wherein the identical (not shown) of thickness of the degree of depth of the first through hole 108 and water barrier 102, can adopt the modes such as etching to make the first through hole 108 particularly.

In addition, in this second example, this method for making can also comprise: on electric ink demonstration film 100, make the second through hole 109(not shown), this second through hole 109 penetrates the structure (for example penetrating running gel cystoblast 104 and water barrier 102 in Fig. 9) between running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103, wherein the gross thickness of the structure between the degree of depth of the second through hole 109 and running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103 is identical, can adopt particularly the modes such as etching to make the second through hole 109.

The second example of the embodiment of the present invention three provides a kind of electric ink to show film, its structural representation as shown in figure 11, with Fig. 9 different be, UV-protective ild layer 105, antiglare layer 107 and hard coat 106(are shown in Figure 11), wherein, UV-protective ild layer 105 between transparent substrates 101 and transparency conducting layer 103, hard coat 106 is positioned at that transparent substrates 101 back sides, antiglare layer 107 are positioned at below hard coat 106 and is positioned at the same side of transparent substrates 101 with hard coat 106; The transparent substrates 101 of this second example, water barrier 102, transparency conducting layer 103 and running gel cystoblast 104 have identical structure with the description in above-mentioned the first example, do not repeat them here.For simplicity, at this, only introduce the difference of Figure 11 and Fig. 9, with the something in common of Fig. 9 can be referring to the description in above-mentioned the first example.

Figure 11 only shows a kind of concrete structure, in other embodiments of the invention, transparent substrates 101, water barrier 102, transparency conducting layer 103, running gel cystoblast 104, UV-protective ild layer 105, antiglare layer 107 and hard coat 106 can be arranged in any order, put in order and can determine by designing requirement, at this, will not enumerate.

Correspondingly, the method for making that this second example also provides a kind of electric ink to show film, Figure 12 shows the process flow diagram of the method for the electric ink demonstration film of making structure shown in Figure 11, and this method for making comprises the following steps:

Step S1201: transparent substrates 101 is provided;

Step S1202: in the positive UV-protective ild layer 105 that forms of transparent substrates 101;

Step S1203: form hard coat 106 at transparent substrates 101 back sides;

Step S1204: form antiglare layer 107 on hard coat 106;

Step S1205: form transparency conducting layer 103 on UV-protective ild layer 105;

Step S1206: form water barrier 102 on transparency conducting layer 103;

Step S 1207: on water barrier 102, apply running gel cystoblast 104.

It should be noted that, adopt electric ink that this second example provides to show the method for making of film, can on whole water barrier 102, cover running gel cystoblast 104(as shown in figure 11), also can be only at the middle section of water barrier 102, cover running gel cystoblast 104, and not shown in the fringe region of water barrier 102 does not cover running gel cystoblast 104(Figure 11).In a concrete example of the present invention, the fringe region of the water barrier 102 not covered by running gel cystoblast 104 can be not less than 1.5mm at the width of either side, as being 1.5mm or 2mm etc.

In addition, step 1202, step S1203, step S1204 and step S1205 as long as carry out between step 1201 and step 1206, the sequencing of its execution can be changed arbitrarily, preferably adopts the order in the second example of the embodiment of the present invention one to carry out.

The embodiment of the present invention three has been introduced electric ink and has been shown film and preparation method thereof, and correspondingly, the embodiment of the present invention four provides the electric ink adopting in the embodiment of the present invention three to show electronic ink display panel of film and preparation method thereof.

Embodiment tetra-

The first example of the embodiment of the present invention four provides a kind of electronic ink display panel, as shown in figure 13, this electronic ink display panel comprises: the conductive structure 112 in drive plate 111, the precalculated position on drive plate 111, the electric ink being fitted on drive plate 111 show film 100, penetrate the first through hole 108 of the structure between running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103 and be filled in the fluid sealant 113 that electric ink shows the slit of periphery between film 100 and drive plate 111; Wherein, electric ink shows that film 100 can have the structure (than structure as shown in Figure 9) described in the embodiment of the present invention three; The gross thickness of the structure (for example water barrier in Figure 13 102) between the degree of depth of the first through hole 108 and running gel cystoblast 104 and transparency conducting layer 103 is identical, and the first through hole 108 joins with conductive structure 112; Drive plate 111 is by conductive structure 112 and be filled in conductive material in the first through hole 108 and show that with electric ink the transparency conducting layer 103 in film 100 is electrically connected to.

It should be noted that, in Figure 13, only schematically show between running gel cystoblast 104 and transparency conducting layer 103 and comprise water barrier 102, but, in the embodiment of the present invention, running gel cystoblast 104 can also comprise other structures with transparency conducting layer 103, as one or several the combination in UV-protective ild layer, hard coat and antiglare layer.

The first example of the embodiment of the present invention four also provides the method for making of the electronic ink display panel shown in first example of making the embodiment of the present invention four, and Figure 14 shows the process flow diagram of the method, and the method comprises the following steps:

Step S1401: provide drive plate 111 and electric ink to show film 10, wherein, electric ink shows that film 100 can adopt method for making in the embodiment of the present invention three (for example method for making) as shown in figure 10 to make;

Step S1402: show in film 100 and make the first through hole 108 at electric ink, the first through hole 108 penetrates running gel cystoblast 104 and states the structure (for example water barrier in Figure 13 102) between transparency conducting layer 103, and the gross thickness of the structure between the degree of depth of the first through hole 108 and running gel cystoblast 104 and transparency conducting layer 103 is identical; It should be noted that, in Figure 13, only schematically show between running gel cystoblast 104 and transparency conducting layer 103 and comprise water barrier 102, but, in the embodiment of the present invention, running gel cystoblast 104 can also comprise other structures with transparency conducting layer 103, as one or several the combination in UV-protective ild layer, hard coat and antiglare layer;

Step S1403: at the interior filled conductive material of the first through hole 108;

Step S1404: the precalculated position on drive plate 111 makes conductive structure 112;

Step S1405: electric ink is shown to film 100 is fitted on drive plate 111, and make the first through hole 108 and conductive structure 112 join, to make drive plate 111 be electrically connected to by conductive structure 112 and the conductive material being filled in the first through hole 108 with transparency conducting layer 103;

Step S1406: the slit filling with sealant 113 that shows periphery between film 100 and drive plate 111 at electric ink.

The second example of the embodiment of the present invention five also provides a kind of electronic ink display panel, Figure 15 shows the structural representation of this electronic ink display panel, and this electronic ink display panel comprises: drive plate 111, the electric ink being fitted on drive plate 111 show film 100 and be filled in the fluid sealant 113 that electric ink shows the slit of periphery between film 100 and drive plate 111; Wherein, electric ink shows that film 100 has through hole 114(and wherein in through hole 114, is filled with conductive material), drive plate 111 shows that with electric ink the transparency conducting layer 113 in film 100 is electrically connected to by the conductive material being filled in through hole 114.

Correspondingly, the embodiment of the present invention five also provides the method for making of the electronic ink display panel shown in second example of making the embodiment of the present invention four, and Figure 16 shows the process flow diagram of the method, and the method comprises the following steps:

Step S1601: provide drive plate 111 and electric ink to show film 100, wherein, electric ink shows that film 100 can adopt method for making in the embodiment of the present invention three (for example method for making) as shown in figure 10 to make;

Step S1602: at the interior filled conductive material of through hole 114;

In Figure 16, only show in electric ink demonstration film 100 and comprise through hole 114, and this through hole 114 penetrates the situation of the structure between running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103, in fact, in concrete example, before execution step S1602 and after step S1601, can also comprise: at electric ink, show that the interior making of film 100 penetrates the through hole 114 of the structure between running gel cystoblast 104 and running gel cystoblast 104 and transparency conducting layer 103.

Step S1603: electric ink is shown to film 100 is fitted on drive plate 111, and make through hole 114 and conductive structure 112 join, to make drive plate 111 be electrically connected to by being filled in the conductive material of through hole 114 inside with transparency conducting layer 103;

Step S1604: the slit filling with sealant 113 that shows periphery between film 100 and drive plate 111 at electric ink.

It should be noted that, electronic ink display panel in the embodiment of the present invention and be confined to said structure, electric ink in this electronic ink display panel shows that film can also comprise UV-protective ild layer, antiglare layer and hard coat etc., and transparent substrates, water barrier, transparency conducting layer, running gel cystoblast, UV-protective ild layer, antiglare layer and hard coat can be arranged by arbitrary order, put in order and can determine by designing requirement, at this, will not enumerate.

The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.

Claims

1. electric ink shows a method for making for film, it is characterized in that, comprising:

Transparent substrates is provided;

At the positive water barrier that forms of described transparent substrates;

On described water barrier, form transparency conducting layer;

On described transparency conducting layer, apply running gel cystoblast;

Wherein, described water barrier is the fine and close material layer that one deck adopts silicon dioxide or silicon nitride to form, and adopts the thin film-forming method of physical method or chemical method to form.

2. method for making according to claim 1, is characterized in that, described positive any one deck or the combination in any forming in UV-protective ild layer, hard coat, antiglare layer of described transparent substrates that be also included in before the positive formation of described transparent substrates water barrier; Or,

3. method for making according to claim 1 and 2, is characterized in that, described method also comprises:

4. method for making according to claim 1, is characterized in that,

Described method also comprises: the marginal portion of described running gel cystoblast is wiped off; Or,

5. a method for making for electronic ink display panel, is characterized in that, comprising:

Provide drive plate and electric ink to show film, wherein, described electric ink shows that film adopts method for making as claimed in claim 4 to make;

Precalculated position on described drive plate makes conductive structure;

6. a method for making for electronic ink display panel, is characterized in that, comprising:

Provide drive plate and electric ink to show film, wherein, described electric ink shows that film adopts the method for making as described in claim 1-4 any one to make;

Filled conductive material in described through hole;

7. electric ink shows a method for making for film, it is characterized in that, comprising:

Transparent substrates is provided;

On described transparency conducting layer, form water barrier;

On described water barrier, apply running gel cystoblast;

8. method for making according to claim 7, it is characterized in that described positive any one deck or the combination in any forming in UV-protective ild layer, hard coat, antiglare layer of described transparent substrates that be also included in before the positive formation of described transparent substrates transparency conducting layer; Or,

9. according to the method for making described in claim 7 or 8, it is characterized in that, described method also comprises:

10. method for making according to claim 7, is characterized in that,

11. method for makings according to claim 10, is characterized in that, described method also comprises:

12. method for makings according to claim 10, is characterized in that, described method also comprises:

The method for making of 13. 1 kinds of electronic ink display panels, is characterized in that, described method comprises:

Provide drive plate and electric ink to show film, wherein, described electric ink shows that film adopts the method for making as described in claim 7-10 any one to make;

Filled conductive material in described third through-hole;

The method for making of 14. 1 kinds of electronic ink display panels, is characterized in that, comprising:

Provide drive plate and electric ink to show film, wherein, described electric ink shows that film adopts method for making as claimed in claim 11 to make;

Precalculated position on described drive plate makes conductive structure;

Filled conductive material in described the first through hole;

15. 1 kinds of electric inks show film, it is characterized in that, comprising:

Transparent substrates;

Be positioned at the water barrier in described transparent substrates front;

16. electric inks according to claim 15 show film, it is characterized in that, also comprise:

17. show film according to the electric ink described in claim 15 or 16, it is characterized in that, also comprise:

18. electric ink films according to claim 17, is characterized in that,

Described running gel cystoblast covers the middle section of described transparency conducting layer, does not cover the fringe region of described transparency conducting layer.

19. 1 kinds of electronic ink display panels, is characterized in that, comprising:

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink shows that film has structure as claimed in claim 18, and described drive plate shows that by described conductive structure and described electric ink the transparency conducting layer in film is electrically connected to;

20. 1 kinds of electronic ink display panels, is characterized in that, comprising:

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink shows that film has the structure as described in claim 15-18 any one;

21. 1 kinds of electric inks show film, it is characterized in that, comprising:

Transparent substrates;

22. electric inks according to claim 21 show film, it is characterized in that, also comprise:

23. show film according to the electric ink described in claim 21 or 22, it is characterized in that, also comprise:

24. electric inks according to claim 21 show film, it is characterized in that, described running gel cystoblast covers the middle section of described water barrier, does not cover the fringe region of described water barrier.

25. electric inks according to claim 24 show film, it is characterized in that, also comprise:

26. electric inks according to claim 24 show film, it is characterized in that, also comprise:

27. 1 kinds of electronic ink display panels, is characterized in that, comprising:

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink shows that film has the structure as described in claim 21-24; Described electric ink shows that film also comprises the third through-hole that penetrates the structure between described running gel cystoblast and described transparency conducting layer, in described third through-hole, be filled with conductive material, described drive plate shows that with described electric ink the transparency conducting layer in film is electrically connected to by the conductive material being filled in described third through-hole;

28. 1 kinds of electronic ink display panels, is characterized in that, comprising:

Drive plate;

The electric ink being fitted on described drive plate shows film, and wherein, described electric ink shows that film has structure as claimed in claim 25; In described the first through hole, be filled with conductive material, described conductive structure and described the first through hole join, and described drive plate is by described conductive structure and be filled in conductive material in described the first through hole and show that with electric ink the transparency conducting layer in film is electrically connected to; And the fluid sealant that is filled in the slit of periphery between described electric ink demonstration film and described drive plate.