CN102785410A - Conductive film - Google Patents
Conductive film Download PDFInfo
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- CN102785410A CN102785410A CN2011101339457A CN201110133945A CN102785410A CN 102785410 A CN102785410 A CN 102785410A CN 2011101339457 A CN2011101339457 A CN 2011101339457A CN 201110133945 A CN201110133945 A CN 201110133945A CN 102785410 A CN102785410 A CN 102785410A
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- conductive film
- reflectivity
- conducting layer
- transparency conducting
- light
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Abstract
The invention provides a conductive film which comprises a substrate, a reflectance adjusting structure, and a transparent conducting layer. The reflectivity adjusting structure is disposed on the substrate; the transparent conducting layer is disposed on the reflectance adjusting structure; thus the reflectance adjusting structure is located between the transparent conducting layer and the substrate; and the transparent conducting layer covers a part of the reflectance adjusting structure. When light enters into the transparent conducting layer with an incidence angle, the light is reflected by the transparent conducting layer with a first reflectance; when the light enters into the reflectance adjusting structure with the incidence angle, the light is reflected by the reflectance adjusting structure with a second reflectance; and the difference between the first reflectance and the second reflectance is less than a first threshold value. Therefore, the conductive film of the invention can eliminate coloration difference between an etched area and a non-etched area.
Description
Technical field
The present invention is particularly to a kind of conductive film that receives etching and do not receive the colour development difference between the etched zone of eliminating relevant for a kind of conductive film.
Background technology
Along with progress and its continuous expansion at various application surfaces of manufacturing technology, electronic product also provides the usability of more and more diversified function and higher conformability gradually, to make things convenient for user's operation.For example, can make user's appliance and electronic more convenient, that more directly control in order to provide, the present electronics and IT products display floater that is equiped with touch more and more widely is to replace the control button of traditional key-press form.
At present, contact panel can be divided into the contact panel of resistance-type, condenser type, infrared-type and ultrasonic formula or the like form haply, is modal product with electric resistance touch-control panel and capacitance type touch-control panel wherein.With present application, capacitance type touch-control panel can be applicable to the contact panel of the characteristic with multi-point touch, so that humanized operator scheme to be provided, thereby makes capacitance type touch-control panel receive market and user's favor gradually.But, the shortcoming of capacitance type touch-control panel is that it must be with conductive material, and for example the finger touches contact panel is to carry out the operation of electronic product.And for electric resistance touch-control panel, no matter the user is with which kind of material touching contact panel, can carry out the operation and the control of electronic product, thereby improve the ease of use of contact panel.In addition, the required cost of electric resistance touch-control panel is lower, and the technical development of electric resistance touch-control panel is comparatively ripe, thereby present main product uses electric resistance touch-control panel mostly.
Traditional contact panel directly on glass baseplate surface lamination one conductive film is arranged, through touching said conductive film, to reach the function of input signal or sensing position of touch etc.
Yet; Said conductive film must pass through gold-tinted development, etched manufacturing process; Thereby obtain line pattern above that, thus the relevant drive circuit of moulding, but in the manufacturing process of reality; Etching manufacturing process can stay etched vestige on panel, for example on transparency conducting layer, form the structure with difference in height; And in the analysis of optics; Because of having very big difference in reflectivity between exposed glass substrate of etched part branch and the not etched transparency conducting layer; Significant drop can appear on spectrum; Therefore the user visually can cause not clear image or block, or tangible boundary line or the like appears, therefore cause the decline of electronic product quality.
In view of this, the inventor is to above-mentioned problem, proposes a kind of reasonable in design and can effectively improve the present invention of above-mentioned shortcoming.
Summary of the invention
The embodiment of the invention is to provide a kind of conductive film; Utilize adjustment to change the refractive index and the thickness of reflectivity adjustment structure wherein; Make and receive etching and do not receive etched conductive film to have close reflectivity; And then make naked eyes can't perceive in the manufacturing process the vestige under residual, improve optic display effect.
The embodiment of the invention provides a kind of conductive film, and conductive film comprises substrate, reflectivity adjustment structure and transparency conducting layer.Said reflectivity adjustment structure is arranged on the substrate, and said transparency conducting layer is arranged on the reflectivity adjustment structure, makes reflectivity adjustment structure between transparency conducting layer and substrate, and the reflectivity of transparency conducting layer cover part adjustment structure.When transparency conducting layer is injected with an incidence angle by a light; Transparency conducting layer reflects said light with one first reflectivity; When reflectivity adjustment structure is injected with said incidence angle by said light; Reflectivity adjustment structure reflects said light with one second reflectivity, and the difference of first reflectivity and second reflectivity is less than one first threshold values.
In the present invention's one example embodiment, the reflectivity of said conductive film adjustment structure comprises hard conating, first refracting layer and second refracting layer.Hard conating is arranged on the substrate, and first refracting layer is arranged on the hard conating, and second refracting layer is arranged on first refracting layer and contacts transparency conducting layer.At this; The thickness of first refracting layer is in the scope of 100 to 300 dusts; And the refractive index of first refracting layer is in 1.6 to 2.0 scope, and the thickness of second refracting layer is in the scope of 500 to 700 dusts, and the refractive index of second refracting layer is in 1.42 to 1.46 scope.In addition, the material that substrate is served as reasons in the group that is selected from glass and PET is formed, and the refractive index of substrate is 1.52.
In other words, the present invention is a kind of conductive film, wherein, comprising:
One substrate;
One reflectivity adjustment structure is arranged on the said substrate; And
One transparency conducting layer is arranged on the said reflectivity adjustment structure, makes said reflectivity adjustment structure between this transparency conducting layer and this substrate, and this reflectivity adjustment structure of this transparency conducting layer cover part;
Wherein when said transparency conducting layer is injected with an incidence angle by a light; Said transparency conducting layer reflects said light with one first reflectivity; When said refracting layer adjustment structure is injected with said incidence angle by said light; Said refracting layer adjustment structure reflects said light with one second reflectivity, and the difference of said first reflectivity and said second reflectivity is less than one first threshold values.
Conductive film of the present invention, wherein, said reflectivity adjustment structure comprises:
One hard conating is arranged on the said substrate;
One first refracting layer is arranged on the said hard conating; And
One second refracting layer is arranged on said first refracting layer, and contacts said transparency conducting layer.
Conductive film of the present invention, wherein, the thickness of said first refracting layer is in the scope of 100 to 300 dusts, and the refractive index of said first refracting layer is in 1.6 to 2.0 scope.
Conductive film of the present invention, wherein, the thickness of said second refracting layer is in the scope of 500 to 700 dusts, and the refractive index of said second refracting layer is in 1.42 to 1.46 scope.
Conductive film of the present invention, wherein, said first threshold values is 0.5.
Conductive film of the present invention; Wherein, When said transparency conducting layer was injected with said incidence angle by said light, the said light in the said transparency conducting layer had one first penetrance, when said reflectivity adjustment structure is injected with said incidence angle by said light; Said light in the said reflectivity adjustment structure has one second penetrance, and the difference of said first penetrance and said second penetrance is less than one second threshold values.
Conductive film of the present invention, wherein, said second threshold values is 0.5.
Conductive film of the present invention, wherein, the material that said substrate is served as reasons in the group that is selected from glass and PET is formed, and the refractive index of said substrate is 1.52.
In sum, the conductive film that the embodiment of the invention provided utilizes adjustment change reflectivity wherein to adjust the refractive index and the thickness of structure and transparency conducting layer, makes to receive etching and do not receive etched conductive film to have close reflectivity.At this; When conductive film receives etching through the subregion of the transparency conducting layer of etching manufacturing process and the superiors; Light sees through the reflectivity that transparency conducting layer and reflectivity adjustment structure are injected conductive film, be comparable to light only the penetration rate adjust the reflectivity that structure is injected conductive film.Thus, conductive film of the present invention can be eliminated and receive etching and do not receive the colour development difference between the etched zone, make naked eyes can't perceive in the manufacturing process the vestige under residual, and then improve optic display effect.
For enabling further to understand characteristic of the present invention and technology contents, please with reference to following relevant detailed description of the present invention and accompanying drawing, yet appended graphic only be for the usefulness of reference with explanation is provided, be not to be used for the present invention is limited.
Description of drawings
Fig. 1 shows the sketch map of the conductive film of one example embodiment according to the present invention.
Fig. 2 shows the stereogram of the conductive film of one example embodiment according to the present invention.
The explanation of Reference numeral
1: conductive film 10: substrate
12: reflectivity adjustment structure 14: transparency conducting layer
16: adhesive layer 122: hard conating
126: the second refracting layers of 124: the first refracting layers
R1, R2: reflectivity T1, T2: refractive index
The specific embodiment
(conductive film embodiment)
Please in the lump with reference to Fig. 1 and Fig. 2, Fig. 1 shows the sketch map of the conductive film of one example embodiment according to the present invention.Fig. 2 shows the stereogram of the conductive film of one example embodiment according to the present invention.As shown in the figure; Conductive film 1 of the present invention has substrate 10, reflectivity adjustment structure 12 and transparency conducting layer 14; Be sequentially provided with reflectivity adjustment structure 12 and transparency conducting layer 14 on the substrate 10, make reflectivity adjustment structure 12 between substrate 10 and transparency conducting layer 14.The each several part assembly of conductive film 1 of the present invention is below described respectively.
In practical application, to select for use when processing when substrate 10 by the material of glass or PET, the refractive index that substrate 10 is had is about 1.52.Certainly, except above-mentioned material, the present technique field has common knowledge personnel and also can select for use the material that is similar to other compound of 1.52 by refractive index to process substrate 10.At this, the present invention is the thickness of restricting substrate 10 not, and in general, the thickness of substrate 10 is below 300 μ m.In addition, except a surface of substrate 10 can be provided with reflectivity adjustment structure 12, on the surface of the opposition side of substrate 10, more can form the adhesive layer 16 that is used for pasting other device.Said adhesive layer 16 should be selected the material with good optical characteristic for use, and for example acrylic acid series binding agent, amine formic acid esters are that binding agent, silicon are binding agent etc.
In practical application; The thickness and the refractive index of each layer in the reflectivity adjustment structure 12 that the present invention selectes; Can make conductive film 1 eliminate the colour development difference after etching manufacturing process thus, and make naked eyes can't perceive in the manufacturing process vestige under 1 of conductive film is residual.In an example, the thickness of first refracting layer 124 of the present invention in the scope of 100 to 300 dusts and refractive index in 1.6 to 2.0 scope.The thickness of second refracting layer 126 in the scope of 500 to 700 dusts and refractive index in 1.42 to 1.46 scope.As for the thickness and the refractive index of hard conating, the present invention does not limit at this.
Transparency conducting layer 14 is formed on the reflectivity adjustment structure 12 and is positioned at the outermost layer of conductive film 1.After overetched manufacturing process; Transparency conducting layer 14 can be because of only having the subregion to receive etching and forming specific pattern; Receive etched zone and just do not have transparency conducting layer 14, and do not receive the reflectivity adjustment structure 12 of etched transparency conducting layer 14 continuation cover parts.For instance, transparency conducting layer 14 can be for by SnO
2, ZnO
2, In
2O
3Or material such as ITO is made, and the thickness of transparency conducting layer 14 is in the scope of 150 to 250 dusts.In general, when the material of transparency conducting layer 14 was ITO, the thickness of transparency conducting layer 14 can be 180 dusts.
On the other hand, the refractive index of transparency conducting layer 14 is in 1.9 to 2.1 scope.Because above-mentioned transparency conducting layer 14 has electric conductivity; When using, can simplify the qualification rate of ground connection process and raising manufacturing process; And because transparency conducting layer 14 is a conductive layer; Electrode can be formed on the transparency conducting layer 14 at an easy rate, so the present invention is particularly advantageous in the application of touch display unit, but is not limited only to this.In practical application; When the thickness of selecting transparency conducting layer 14 and refractive index; Should cooperate reflectivity adjustment structure 12 to adjust in the lump; No matter make the user watch conductive film 1 attentively, can not perceive in the manufacturing process vestige under 1 of conductive film is residual from transparency conducting layer 14 or reflectivity adjustment structure 12.
Angle from the light reflection; When a light is injected conductive film 1 through transparency conducting layer 14 with reflectivity adjustment structure 12 with an incidence angle; Said light has one first reflectivity R1; When said light when only penetration rate adjustment structure 12 is injected conductive film 1 with same incidence angle, said light has one second reflectivity R2, and the difference of the first reflectivity R1 and the second reflectivity R2 is less than one first threshold values.In practical application, with the conductive film 1 of specification manufacturing of the present invention, the first reflectivity R1 and second reflectivity R2 difference is very little just can reach the effect that naked eyes can't be discovered if said first threshold values less than 0.5, that is to say.
On the other hand; Angle from light penetration; When a light saw through transparency conducting layer 14 and injects substrate 10 with reflectivity adjustment structure 12 with an incidence angle, said light had one first penetrance T1, when said light when only penetration rate adjustment structure 12 is injected substrate 10 with same incidence angle; Said light has one second penetrance T2, and the difference of the first penetrance T1 and the second penetrance T2 is less than one second threshold values.In practical application, with the conductive film 1 of specification manufacturing of the present invention, if said second threshold values is equally less than 0.5; Just the first penetrance T1 and the second penetrance T2 difference are very little; In like manner can know, because light is straight ahead, when light is when substrate 10 is injected; When the user observes in transparency conducting layer 14 outsides, naked eyes still can not observe in the manufacturing process the vestige under residual.
For instance; Conductive film 1 sticks on the surface of display device that can be luminous through adhesive layer 16; The surface of display such as LCD, CRT and contact panel or other related display device for example; Or have the surface of the electronic product of above-mentioned display device, make when the user watches the display device picture displayed through conductive film 1, can not receive in the manufacturing process the interference of residual vestige.
In sum, the conductive film that the embodiment of the invention provided receives etching and does not receive etched conductive film to have close reflectivity and penetrance through selecting the reflectivity adjustment structure and the transparency conducting layer of refractive index and thickness in the particular range, making.Particularly,, or inject conductive film from substrate no matter light is to inject conductive film from transparency conducting layer, the conductive film of specification manufacturing of the present invention can reach naked eyes can't perceive in the manufacturing process the effect of the vestige under residual.Thus, conductive film of the present invention can be eliminated and receive etching and do not receive the colour development difference between the etching area, make naked eyes can't perceive in the manufacturing process the vestige under residual, and then improve optic display effect.
Though embodiment disclosed by the invention as stated, these embodiment are merely the usefulness that illustrates, and should not be interpreted as the restriction that the present invention is implemented.In not breaking away from essential scope of the present invention, other change or variation all belong to protection scope of the present invention.
Claims (8)
1. a conductive film is characterized in that, comprising:
One substrate;
One reflectivity adjustment structure is arranged on the said substrate; And
One transparency conducting layer is arranged on the said reflectivity adjustment structure, makes said reflectivity adjustment structure between said transparency conducting layer and said substrate, and the said reflectivity adjustment structure of said transparency conducting layer cover part;
Wherein when said transparency conducting layer is injected with an incidence angle by a light; Said transparency conducting layer reflects said light with one first reflectivity; When said reflectivity adjustment structure is injected with said incidence angle by said light; Said reflectivity adjustment structure reflects said light with one second reflectivity, and the difference of said first reflectivity and said second reflectivity is less than one first threshold values.
2. conductive film according to claim 1 is characterized in that, said reflectivity adjustment structure comprises:
One hard conating is arranged on the said substrate;
One first refracting layer is arranged on the said hard conating; And
One second refracting layer is arranged on said first refracting layer, and contacts said transparency conducting layer.
3. conductive film according to claim 2 is characterized in that, the thickness of said first refracting layer is in the scope of 100 to 300 dusts, and the refractive index of said first refracting layer is in 1.6 to 2.0 scope.
4. conductive film according to claim 2 is characterized in that, the thickness of said second refracting layer is in the scope of 500 to 700 dusts, and the refractive index of said second refracting layer is in 1.42 to 1.46 scope.
5. conductive film according to claim 1 is characterized in that, said first threshold values is 0.5.
6. conductive film according to claim 1; It is characterized in that; When said transparency conducting layer was injected with said incidence angle by said light, the said light in the said transparency conducting layer had one first penetrance, when said reflectivity adjustment structure is injected with said incidence angle by said light; Said light in the said reflectivity adjustment structure has one second penetrance, and the difference of said first penetrance and said second penetrance is less than one second threshold values.
7. conductive film according to claim 6 is characterized in that, said second threshold values is 0.5.
8. conductive film according to claim 1 is characterized in that, the material that said substrate is served as reasons in the group that is selected from glass and PET is formed, and the refractive index of said substrate is 1.52.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101339457A CN102785410A (en) | 2011-05-19 | 2011-05-19 | Conductive film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101339457A CN102785410A (en) | 2011-05-19 | 2011-05-19 | Conductive film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102785410A true CN102785410A (en) | 2012-11-21 |
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ID=47151086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011101339457A Pending CN102785410A (en) | 2011-05-19 | 2011-05-19 | Conductive film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102785410A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090244028A1 (en) * | 2008-03-25 | 2009-10-01 | Epson Imaging Devices Corporation | Capacitive input device, display device with input function, and electronic apparatus |
| TW201114602A (en) * | 2009-10-20 | 2011-05-01 | Toyo Boseki | Transparent electrically conductive laminated film |
-
2011
- 2011-05-19 CN CN2011101339457A patent/CN102785410A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090244028A1 (en) * | 2008-03-25 | 2009-10-01 | Epson Imaging Devices Corporation | Capacitive input device, display device with input function, and electronic apparatus |
| TW201114602A (en) * | 2009-10-20 | 2011-05-01 | Toyo Boseki | Transparent electrically conductive laminated film |
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Application publication date: 20121121 |