CN102642092B - Laser beam based micropore machining device and method - Google Patents

Abstract

The invention relates to a laser beam based micropore machining device and method. The device comprises a radially polarized beam generation unit for converting a laser beam into a radially polarized beam, and emitting the radially polarized beam to a diffractive optical element, the diffractive optical element for modulating the amplitude and phase of the radially polarized beam, and emitting the modulated radially polarized beam to a focusing lens, and the focusing lens for focusing the modulated radially polarized beam, and obtaining a focusing field of the radially polarized beam in the vicinity of a focus of the focusing lens, wherein the intensity distribution of the focusing filed is determined by the structure of the diffractive optical element and the numerical aperture of the focusing lens, and the micropore machining of a material to be machined is carried out by controlling the intensity distribution of the focusing field. The laser beam based micropore machining device provided by the embodiment of the invention can be used for machining the micropores with large depth to diameter ratio and improving the cutting speed and efficiency of the micropores.

Description

Based on micropore processing device and the method for laser beam

Technical field

The present invention relates to laser technology field, particularly a kind of micropore processing device based on laser beam and method.

Background technology

In some precise light Mechatronic Systems, need processing aperture little and the micropore that aspect ratio is large, micropore size is in submillimeter magnitude, and aspect ratio is greater than 10.Capillary processing method of the prior art (as methods such as machine drilling, electric spark-erosion perforation, electrochemistry punchings) all cannot process this kind of micropore by high-quality, therefore very in the urgent need to developing a kind of small-bore and the capillary processing technology of large aspect ratio.

Summary of the invention

The object of the present invention is to provide a kind of micropore processing device based on laser beam and method, realize small-bore and the capillary processing of large aspect ratio, improve cutting speed and the efficiency of micropore simultaneously.

The embodiment of the present invention provides a kind of micropore processing device based on laser beam, comprising:

Radial polarized light beam generation unit, for laser beam is converted to radial polarized light beam, and is emitted to diffraction optical element by described radial polarized light beam;

Described diffraction optical element, for modulating amplitude and the phase place of described radial polarized light beam, and is emitted to condenser lens by the described radial polarized light beam after modulation;

Described condenser lens, for the described radial polarized light beam after modulation is focused on, the focousing field of described radial polarized light beam is obtained at the near focal point of described condenser lens, the intensity distribution of described focousing field is determined by the structure of described diffraction optical element and the numerical aperture of described condenser lens, carries out capillary processing by the intensity distribution controlling described focousing field to material to be processed.

The embodiment of the present invention also provides a kind of capillary processing method based on laser beam, comprising:

By radial polarized light beam generation unit, laser beam is converted to radial polarized light beam;

Amplitude and the phase place of described radial polarized light beam is modulated by described diffraction optical element;

By described condenser lens, the described radial polarized light beam after modulation is focused on, obtain the focousing field of described radial polarized light beam at the near focal point of described condenser lens, the intensity distribution of described focousing field is determined by the structure of described diffraction optical element and the numerical aperture of described condenser lens;

By the intensity distribution controlling described focousing field, micropore is processed.

Micropore processing device based on laser beam provided by the invention and method, the intensity distribution of light beam focousing field can be regulated and controled by the regulation and control structure of diffraction optical element and the numerical aperture of condenser lens, therefore the intensity distribution of suitable focousing field can be set according to the degree of depth of micropore and aperture, and due to the extra small focal beam spot of Diode laser can be obtained from radial polarized light beam, and focusing light field has column symmetry polarisation distribution, therefore the depth of cut of micropore and the ratio of width can be controlled neatly by controlling focal beam spot, improve cutting speed and the efficiency of micropore simultaneously.

Accompanying drawing explanation

In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.

The polarisation distribution schematic diagram of radial polarized light beam on cross section that Fig. 1 uses for the embodiment of the present invention;

Fig. 2 is the structural representation of the micropore processing device embodiment that the present invention is based on laser beam;

Fig. 3 is the structural representation of another embodiment of micropore processing device that the present invention is based on laser beam;

Fig. 4 is the structural representation of another embodiment of micropore processing device that the present invention is based on laser beam;

Fig. 5 is the structural representation according to the diffraction optical element in embodiment illustrated in fig. 4;

Fig. 6 be according to the focusing shaping of a transmittance function embodiment illustrated in fig. 4 after distribution of light intensity distribution schematic diagram;

Fig. 7 be according to the focusing shaping of another transmittance function embodiment illustrated in fig. 4 after distribution of light intensity distribution schematic diagram;

Fig. 8 be according to the focusing shaping of another transmittance function embodiment illustrated in fig. 4 after distribution of light intensity distribution schematic diagram;

Fig. 9 is the schematic flow sheet of the capillary processing method embodiment that the present invention is based on laser beam.

Detailed description of the invention

Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.

The polarisation distribution schematic diagram of radial polarized light beam on cross section that Fig. 1 uses for the embodiment of the present invention; As shown in Figure 1, on beam cross-section, the polarization state of any point (except central point) of radial polarized light beam is all linear polarization, and the electric field intensity of radial polarized light beam is along radial direction; Radial polarized light beam is a kind of vector beam be most widely used at present, a lot of method is had to generate radial polarized light beam in prior art, such as: in laser cavity, add specific optical element modulating oscillation pattern outputting radial polarized light beam, utilize interferometer to be generated by pattern superposition, and by some polarization converter device, the linearly polarized light of space uniform or circularly polarized light are converted to radial polarisation light outside laser cavity.Radial polarized light beam, when high NA focus, can obtain the extra small focal beam spot that a circle is symmetrical, except cross stream component, also creates a stronger axial light field component; Further, the polarisation distribution of focousing field still distributes about the propagation axis column symmetry of light beam.By regulating and controlling the intensity distribution of focousing field, the optical field distribution of multiple uniqueness can be obtained.

Fig. 2 is the structural representation of the micropore processing device embodiment that the present invention is based on laser beam, and as shown in Figure 2, the embodiment of the present invention comprises: radial polarized light beam generation unit 21, diffraction optical element 22, condenser lens 23, material 20 to be processed.

Particularly, laser beam is converted to radial polarized light beam by radial polarized light beam generation unit 21, and radial polarized light beam is emitted to diffraction optical element 22; Diffraction optical element (Diffractivc Optical Element, referred to as DOE) 22 modulates amplitude and the phase place of this radial polarized light beam, and the radial polarized light beam after modulation is emitted to condenser lens 23; Radial polarized light beam after modulation focuses on by condenser lens 23, the focousing field of radial polarized light beam is obtained at the near focal point of condenser lens 23, the intensity distribution of focousing field is determined by the structure of diffraction optical element 22 and the numerical aperture of condenser lens 23, carries out capillary processing by the intensity distribution controlling focousing field to material 20 to be processed.

The micropore processing device based on laser beam that the embodiment of the present invention provides, the intensity distribution of light beam focousing field can be regulated and controled by the regulation and control structure of diffraction optical element 22 and the numerical aperture of condenser lens 23, therefore the intensity distribution of suitable focousing field can be set according to the degree of depth of micropore and aperture, and due to the extra small focal beam spot of Diode laser can be obtained from radial polarized light beam, and focusing light field has column symmetry polarisation distribution, therefore the depth of cut of micropore and the ratio of width can be controlled neatly by controlling focal beam spot, improve cutting speed and the efficiency of material 20 to be processed simultaneously.

Fig. 3 is the structural representation of another embodiment of micropore processing device that the present invention is based on laser beam; As shown in Figure 3, the radial polarized light beam generation unit 31 in the embodiment of the present invention specifically comprises: be provided with the laser instrument 311 of the optical element of setting, spatial filtering system 312, collimation lens 313, transmissibility of adjustable attenuation piece 315 in chamber; Beam-expanding system 34 is also provided with between radial polarized light beam generation unit 31 and diffraction optical element 32.

Particularly, the laser instrument 311 being provided with the optical element of setting in chamber utilizes oscillation mode in optical element buncher to make laser instrument 311 outputting radial polarised light, and this radial polarized light beam is emitted to spatial filtering system 312 by laser instrument 311; Spatial filtering system 312 carries out filtering to this radial polarized light beam, and filtered radial polarized light beam is emitted to collimation lens 313; Collimation lens 313 collimates filtered radial polarized light beam, form the radial polarized light beam of collimation, and the radial polarized light beam of this collimation is emitted to transmissibility of adjustable attenuation piece 315, transmissibility of adjustable attenuation piece 315 can regulate the intensity of this radial polarized light beam, this radial polarized light beam is emitted to beam-expanding system 34 by transmissibility of adjustable attenuation piece 315 afterwards, this beam-expanding system 34 adjusts the spot size of radial polarized light beam, and the radial polarized light beam after adjustment is emitted to diffraction optical element 32.

Diffraction optical element 32 modulates amplitude and the phase place of this radial polarized light beam, and the radial polarized light beam after modulation is emitted to condenser lens 33; Radial polarized light beam after modulation focuses on by condenser lens 33, the focousing field of radial polarized light beam is obtained at the near focal point of condenser lens 33, the intensity distribution of focousing field is determined by the structure of diffraction optical element 32 and the numerical aperture of condenser lens 33, carries out capillary processing by the intensity distribution controlling focousing field to material 30 to be processed.

The micropore processing device based on laser beam that the embodiment of the present invention provides, the intensity distribution of light beam focousing field can be regulated and controled by the regulation and control structure of diffraction optical element 32 and the numerical aperture of condenser lens 33, therefore the intensity distribution of suitable focousing field can be set according to the degree of depth of micropore and aperture, and due to the extra small focal beam spot of Diode laser can be obtained from radial polarized light beam, and focusing light field has column symmetry polarisation distribution, therefore the depth of cut of micropore and the ratio of width can be controlled neatly by controlling focal beam spot, improve cutting speed and the efficiency of material 30 to be processed simultaneously.

Further, above-mentioned embodiment illustrated in fig. 3 in, the optical element of setting is specifically as follows birefringece crystal or prism of corner cube; By arranging specific optical element in laser instrument 311, laser beam can be made to vibrate with specific polarization mode in the laser cavity of laser instrument 311, thus the light beam making laser support 311 outputs is radial polarized light beam.

Further, above-mentioned embodiment illustrated in fig. 3 in, spatial filtering system 312 specifically can comprise microcobjective and pin hole.

Fig. 4 is the structural representation of another embodiment of micropore processing device that the present invention is based on laser beam; As shown in Figure 4, the radial polarized light beam generation unit 41 in the embodiment of the present invention specifically comprises: laser instrument 411, spatial filtering system 412, collimation lens 413, polarization converter 414, transmissibility of adjustable attenuation piece 415; Beam-expanding system 44 is also provided with between radial polarized light beam generation unit 41 and diffraction optical element 42.

Particularly, laser instrument 411 generates laser beam, and this laser beam is emitted to spatial filtering system 412; Spatial filtering system 412 carries out filtering to this laser beam, and filtered laser beam is emitted to collimation lens 413; Collimation lens 413 collimates filtered laser beam, forms the collimated light beam of even intensity, and this collimated light beam is emitted to polarization converter 414; Polarization converter 414 is in this collimated light beam is converted to radial polarized light beam, and this radial polarized light beam is emitted to beam-expanding system 44, this beam-expanding system 44 can adjust the spot size of radial polarized light beam, and the radial polarized light beam after adjustment is emitted to transmissibility of adjustable attenuation piece 415, transmissibility of adjustable attenuation piece 415 can regulate the intensity of this radial polarized light beam, and this radial polarized light beam is emitted to diffraction optical element 42 by transmissibility of adjustable attenuation piece 415 afterwards.

Diffraction optical element 42 modulates amplitude and the phase place of this radial polarized light beam, and the radial polarized light beam after modulation is emitted to condenser lens 43; Radial polarized light beam after modulation focuses on by condenser lens 43, the focousing field of radial polarized light beam is obtained at the near focal point of condenser lens 43, the intensity distribution of focousing field is determined by the structure of diffraction optical element 42 and the numerical aperture of condenser lens 43, carries out capillary processing by the intensity distribution of control focusing, field to material 40 to be processed.

The micropore processing device based on laser beam that the embodiment of the present invention provides, the intensity distribution of light beam focousing field can be regulated and controled by the regulation and control structure of diffraction optical element 42 and the numerical aperture of condenser lens 43, therefore the intensity distribution of suitable focousing field can be set according to the degree of depth of micropore and aperture, and due to the extra small focal beam spot of Diode laser can be obtained from radial polarized light beam, and focusing light field has column symmetry polarisation distribution, therefore the depth of cut of micropore and the ratio of width can be controlled neatly by controlling focal beam spot, improve cutting speed and the efficiency of material 40 to be processed simultaneously.

In order to the technical scheme that clearer explanation is embodiment illustrated in fig. 4, carry out exemplary illustration below in conjunction with Fig. 5 ~ Fig. 8 to embodiment illustrated in fig. 4; Fig. 5 is the structural representation according to the diffraction optical element in embodiment illustrated in fig. 4, Fig. 6 be according to the focusing shaping of a transmittance function embodiment illustrated in fig. 4 after distribution of light intensity distribution schematic diagram, Fig. 7 be according to the focusing shaping of another transmittance function embodiment illustrated in fig. 4 after distribution of light intensity distribution schematic diagram, Fig. 8 be according to the focusing shaping of another transmittance function embodiment illustrated in fig. 4 after distribution of light intensity distribution schematic diagram.

Fig. 5 is the structural representation according to the diffraction optical element in embodiment illustrated in fig. 4; As shown in Figure 5, the DOE in the embodiment of the present invention has rotational symmetric many zonary structures, and the radius of endless belt is respectively r ₁, r ₂, r ₃..., r _n-1and r _n, the light beam convergent angle that these endless belt outer edges are corresponding in focusing system is respectively θ ₁, θ ₂, θ ₃..., θ _n-1and θ _n.If the complex amplitude transmitance of DOE is as shown in equation (1):

Wherein, a _jwith the amplitude of the corresponding jth of a difference endless belt amplitude transmittance and phase value, j ∈ [1, N], a _j∈ [-1,1], for the device described in the embodiment of the present invention, the maximum radius r of DOE _ndetermined by the numerical aperture NA of condenser lens.Now, when endless belt quantity N → ∞, DOE then infinite approach continuous structure.

Further, by adopting the DOE of more circular ring structures, and condenser lens adopts suitable numerical aperture, then can obtain longer depth of focus and less focal beam spot size, thus make this kind of focusing light field can process the micropore of larger aspect ratio at material 40 to be processed.

In addition, when carrying out capillary processing, for the condenser lens of specific numerical aperture, the DOE of different structure can also be adopted, thus obtains the hot spot of different aspect ratio, further the micropore of the different aspect ratio of processing.

As shown in Figure 6 to 8, show three kinds for focousing field intensity distribution during different DOE design, lens numerical aperture is 0.85; The DOE transmittance function that Fig. 6 ~ Fig. 8 is corresponding is respectively shown in formula (2) ~ formula (4):

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.05}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.05\mathrm{\α},0.75\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.75\mathrm{\α},0.80\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.80\mathrm{\α},\mathrm{\α}]\end{array}\right.---\left(2\right)$

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.5}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.5\mathrm{\α},0.75\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.75\mathrm{\α},0.85\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.85\mathrm{\α},\mathrm{\α}]\end{array}\right.---\left(3\right)$

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.5}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.05\mathrm{\α},0.70\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.70\mathrm{\α},0.80\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.80\mathrm{\α},\mathrm{\α}]\end{array}\right.---\left(4\right)$

Wherein, the largest beam convergent angle of the corresponding condenser lens of α is 58.2 °.

Can be seen by above result, use the DOE of simple circle ring structure and the intensity distribution of controllable focousing field, obtain the focusing light field of Diode laser, depth of focus length reaches 10 times of wavelength, focal spot size is very little, usually be less than a wavelength and focal beam spot is circular, and focus on light field there is column symmetry polarisation distribution, therefore utilize such focusing light field can realize the high-quality processing of high aspect ratio micropore.

Fig. 9 is the schematic flow sheet of the capillary processing method embodiment that the present invention is based on laser beam; The method flow of the embodiment of the present invention can pass through above-mentioned Fig. 2 ~ device embodiment illustrated in fig. 4 and realize, and as shown in Figure 9, the embodiment of the present invention comprises the steps:

Step 901, by radial polarized light beam generation unit, laser beam is converted to radial polarized light beam;

Step 902, by the amplitude of diffraction optical element modulated radial light beam and phase place;

Step 903, by condenser lens by modulation after radial polarized light beam focus on, the focousing field of radial polarized light beam is obtained at the near focal point of condenser lens, wherein, the intensity distribution of focousing field is determined by the structure of diffraction optical element and the numerical aperture of condenser lens;

Step 904, by controlling the intensity distribution of this focousing field, capillary processing is carried out to material to be processed.

The capillary processing method based on laser beam that the embodiment of the present invention provides, the intensity distribution of light beam focousing field can be regulated and controled by the regulation and control structure of diffraction optical element and the numerical aperture of condenser lens, therefore the intensity distribution of suitable focousing field can be set according to the degree of depth of micropore and aperture, and due to the extra small focal beam spot of Diode laser can be obtained from radial polarized light beam, and focusing light field has column symmetry polarisation distribution, therefore the depth of cut of micropore and the ratio of width can be controlled neatly by controlling focal beam spot, improve cutting speed and the efficiency of material to be processed simultaneously.

Further, above-mentioned embodiment illustrated in fig. 9 in, can also comprise the steps: between step 901 and step 902

The spot size of described radial polarized light beam is adjusted by beam-expanding system.

The invention described above embodiment, radial polarized light beam is when high NA focus, the extra small focal beam spot that circle is symmetrical can be obtained, and utilize diffraction optical element to carry out focusing shaping, can spot size be reduced further and increase depth of focus, this extra small hot spot and Diode laser laser focusing Shu Youwang, for machining small footpath on material to be processed and the micropore of large aspect ratio, obtain the profound and subtle hole with low surface roughness and high verticality.

One of ordinary skill in the art will appreciate that: all or part of step realizing above-described embodiment can have been come by the hardware that programmed instruction is relevant, aforesaid program can be stored in a computer read/write memory medium, this program, when performing, performs the step comprising said method embodiment; And aforesaid storage medium comprises: ROM, RAM, magnetic disc or CD etc. various can be program code stored medium.

Last it is noted that above embodiment is only in order to illustrate technical scheme of the present invention, be not intended to limit; Although with reference to previous embodiment to invention has been detailed description, those of ordinary skill in the art is to be understood that: it still can be modified to the technical scheme described in foregoing embodiments, or carries out equivalent replacement to wherein portion of techniques feature; And these amendments or replacement, do not make the essence of appropriate technical solution depart from the spirit and scope of various embodiments of the present invention technical scheme.

Claims (6)

1. based on a micropore processing device for laser beam, it is characterized in that, described device comprises:

Radial polarized light beam generation unit, for laser beam is converted to radial polarized light beam, and is emitted to diffraction optical element by described radial polarized light beam;

Described diffraction optical element, for modulating amplitude and the phase place of described radial polarized light beam, and the described radial polarized light beam after modulation is emitted to condenser lens, described condenser lens numerical aperture is 0.85, and the transmittance function of described diffraction optical element is for shown in arbitrary in following formula:

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.05}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.05\mathrm{\α},0.75\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.75\mathrm{\α},0.80\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.80\mathrm{\α},\mathrm{\α}]\end{array}\right.;$ Or

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.5}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.5\mathrm{\α},0.75\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.75\mathrm{\α},0.85\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.85\mathrm{\α},\mathrm{\α}]\end{array}\right.;$ Or

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.5}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.05\mathrm{\α},0.70\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.70\mathrm{\α},0.80\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.80\mathrm{\α},\mathrm{\α}]\end{array}\right.;$

Wherein, the largest beam convergent angle of the corresponding condenser lens of α is 58.2 °;

Described condenser lens, for the described radial polarized light beam after modulation is focused on, the focousing field of described radial polarized light beam is obtained at the near focal point of described condenser lens, the intensity distribution of described focousing field is determined by the structure of described diffraction optical element and the numerical aperture of described condenser lens, carries out capillary processing by the intensity distribution controlling described focousing field to material to be processed;

Wherein, described radial polarized light beam generation unit comprises:

Laser instrument, for generating laser beam, and is emitted to spatial filtering system by described laser beam;

Described spatial filtering system, for carrying out filtering to described laser beam, and is emitted to collimation lens by filtered described laser beam;

Described collimation lens, for collimating filtered described laser beam, forming the collimated light beam of even intensity, and described collimated light beam is emitted to polarization converter;

Described polarization converter, for being converted to radial polarized light beam by described collimated light beam;

Described radial polarized light beam generation unit comprises:

Be provided with the laser instrument of the optical element of setting in chamber, make described laser instrument outputting radial polarized light beam by the described optical element oscillation mode of modulating in described chamber;

Described spatial filtering system, for carrying out filtering to described radial polarized light beam, and is emitted to collimation lens by filtered described radial polarized light beam;

Described collimation lens, for collimating filtered described radial polarized light beam, forming the radial polarized light beam of collimation, and the radial polarized light beam of described collimation is emitted to transmissibility of adjustable attenuation piece;

Described transmissibility of adjustable attenuation piece, for regulating the intensity of described radial polarized light beam.

2. device according to claim 1, is characterized in that, the optical element of described setting is birefringece crystal or prism of corner cube.

3. device according to claim 1 and 2, is characterized in that, described diffraction optical element is rotational symmetric many zonary structures, and the maximum radius of described diffraction optical element is determined by the numerical aperture of described condenser lens.

4. device according to claim 1 and 2, is characterized in that, is also provided with beam-expanding system between described radial polarized light beam generation unit and described diffraction optical element, and described beam-expanding system is for adjusting the spot size of described radial polarized light beam.

5. based on a capillary processing method for laser beam, it is characterized in that, described method comprises:

By radial polarized light beam generation unit, laser beam is converted to radial polarized light beam;

Modulated amplitude and the phase place of described radial polarized light beam by diffraction optical element, condenser lens numerical aperture is 0.85, and the transmittance function of described diffraction optical element is for shown in arbitrary in following formula:

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.05}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.05\mathrm{\α},0.75\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.75\mathrm{\α},0.80\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.80\mathrm{\α},\mathrm{\α}]\end{array}\right.;$ Or

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.5}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.5\mathrm{\α},0.75\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.75\mathrm{\α},0.85\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.85\mathrm{\α},\mathrm{\α}]\end{array}\right.;$ Or

$T\left(\mathrm{\θ}\right)=\left\{\begin{array}{cc}1& \mathrm{\θ}\∈\left[\mathrm{0,0.5}\mathrm{\α}\right]\\ 0& \mathrm{\θ}\∈[0.05\mathrm{\α},0.70\mathrm{\α}]\\ -1& \mathrm{\θ}\∈[0.70\mathrm{\α},0.80\mathrm{\α}]\\ 1& \mathrm{\θ}\∈[0.80\mathrm{\α},\mathrm{\α}]\end{array}\right.$

Wherein, the largest beam convergent angle of the corresponding condenser lens of α is 58.2 °;

By condenser lens, the described radial polarized light beam after modulation is focused on, obtain the focousing field of described radial polarized light beam at the near focal point of described condenser lens, the intensity distribution of described focousing field is determined by the structure of described diffraction optical element and the numerical aperture of described condenser lens;

By the intensity distribution controlling described focousing field, capillary processing is carried out to material to be processed;

Wherein, described step laser beam being converted to radial polarized light beam by radial polarized light beam generation unit comprises:

Generate laser beam by laser instrument, and described laser beam is emitted to spatial filtering system;

By described spatial filtering system, filtering is carried out to described laser beam, and filtered described laser beam is emitted to collimation lens;

By described collimation lens, filtered described laser beam is collimated, form the collimated light beam of even intensity, and described collimated light beam is emitted to polarization converter;

By described polarization converter, described collimated light beam is converted to radial polarized light beam;

Described step laser beam being converted to radial polarized light beam by radial polarized light beam generation unit comprises:

Described laser instrument outputting radial polarized light beam is made by the oscillation mode in described optical element buncher;

By described spatial filtering system, filtering is carried out to described radial polarized light beam, and filtered described radial polarized light beam is emitted to collimation lens;

By described collimation lens, filtered described radial polarized light beam is collimated, form the radial polarized light beam of collimation, and the radial polarized light beam of described collimation is emitted to transmissibility of adjustable attenuation piece;

The intensity of described radial polarized light beam is regulated by described transmissibility of adjustable attenuation piece.

6. method according to claim 5, it is characterized in that, described by radial polarized light beam generation unit laser beam is converted to radial polarized light beam step and described modulate described radial polarized light beam by described diffraction optical element amplitude and the step of phase place between, also comprise:

The spot size of described radial polarized light beam is adjusted by beam-expanding system.