CN102540621B - Optical wavelength separator based on lithium niobate photon line - Google Patents

Optical wavelength separator based on lithium niobate photon line Download PDF

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CN102540621B
CN102540621B CN2012100222879A CN201210022287A CN102540621B CN 102540621 B CN102540621 B CN 102540621B CN 2012100222879 A CN2012100222879 A CN 2012100222879A CN 201210022287 A CN201210022287 A CN 201210022287A CN 102540621 B CN102540621 B CN 102540621B
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lithium niobate
waveguide
optical
optical wavelength
mum
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CN102540621A (en
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陈明
陈乐建
弟寅
席洁
陆蓉
梁猛
杨祎
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Xi'an Post & Telecommunication College
Xian University of Posts and Telecommunications
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Abstract

The invention discloses an optical wavelength separator based on a lithium niobate photon line, which comprises a lithium niobate substrate, a silicon dioxide coating and two lithium niobate optical waveguides, wherein one lithium niobate optical waveguide is straight, part of the other lithium niobate optical waveguide is straight, and part of the other lithium niobate optical waveguide is straight bent, and the two parts of the lithium niobate optical waveguides have the same waveguide width and height. The height of each lithium niobate optical waveguide is 0.73 mum, the width of the top of each lithium niobate optical waveguide is 0.5 mum, center spacing Sc of parallel parts of the two optical waveguides forming the optical wavelength separator is 0.75 mum, coupling length Lc is 19.6 mum, waveguide spacing of the output port is 2.6 mum, and the bent part of the waveguide at the output port is formed by combining two parallel Bezier curves. Waveguide parameters suitable for the optical wavelength separator are as follows: operation wavelengths are respectively 1.31 mum and 1.55 mum; the refractive index of an LN waveguide, namely nLN, is 2.2; and the refractive index of a silicon dioxide (SiO2) area, namely nSiO2, is 1.444. The optical wavelength separator can be used for light paths with high integrated level based on the lithium niobate photon line and has the advantages of being high in transmissivity on a working wavelength, independent in polarization and super compact in structure.

Description

Optical wavelength separation vessel based on the lithium niobate photon line
Technical field
The invention belongs to one of critical component of photonics technical field, specifically, is a kind of based on the irrelevant optical wavelength separation vessel of the ultra-compact of lithium niobate (lithium niobate, i.e. LiNbO3, i.e. LN) photon line and polarization.
Background technology
LN photon line (that is, lithium niobate fiber waveguide) [1-8]Becoming the candidate of following integrated photonics, this is that to have a dimensional structure little due to it, good electrical-optical, sound-optical, and nonlinear optical properties [9], be subject to rare earth element ion and mix and obtain the laser active material [10], highly-efficient equipment likely especially (even in appropriate optical power value, also may realize).Obviously, based on the optical wavelength separation vessel of LN photon line be a critical component of the integrated optical circuit that formed by the LN photon line.Yet the data-searching according to the applicant carries out, up to the present, there is no the correlative study report about the optical wavelength separation vessel based on the LN photon line.
Below the pertinent literature that the inventor retrieves:
【1】P.Rabiei,and?W.H.Steier,“Lithium?niobate?ridge?waveguides?and?modulators?fabricated?using?smart?guide,”Appl.Phys.Lett.Vol.86,no.16,pp.161115-161118,Apr?2005。
【2】D.Djukic,G.Cerda-Pons,R.M.Roth,R.M.Osgood,Jr.,S.Bakhru,and?H.Bakhru,“Electro-optically?tunable?second-harmonic-generation?gratings?in?ion-exfoliated?thin?films?of?periodically?poled?lithium?niobate,”Appl.Phys.Lett.Vol.90,no.17,pp.171116-171119,April?2007。
【3】A.Guarino,G.Poberaj,D.Rezzonico,R.Degl’innocenti,and?P.Günter,“Electro-optically?tunable?microring?resonators?in?lithium?niobate,”Nat.Photonics?Vol.1,no.7,pp.407-410,May?2007。
【4】F.Schrempel,T.Gischkat,H.Hartung,T. E.B.Kley,A.Tünnermann,and?W.Wesch,“Ultrathin?membranes?in?x-cut?lithium?niobate,”Opt.Lett.Vol.34,no.9,pp.1426-1428,April?2009。
【5】T.Takaoka,M.Fujimura,and?T.Suhara,“Fabrication?of?ridge?waveguides?in?LiNbO3?thin?film?crystal?by?proton-exchange?accelerated?etching,”Electron.Lett.Vol.45,no.18,pp.940-941(2009)。
【6】G.Poberaj,M.Koechlin,F.Sulser,A.Guarino,J.Hajfler,and?P.Günter,“Ion-sliced?lithium?niobate?thin?films?for?active?photonic?devices,”Opt.Mater.Vol.31,no.7,pp.1054-1058(2009)。
【7】G.W.Burr,S.Diziain,and?M.-P.Bernal,“Theoretical?study?of?lithium?niobate?slab?waveguides?for?integrated?optics?applications,”Opt.Mater.Vol.31,no.10,pp.1492-1497(2009)。
【8】H.Hu,R.Ricken,and?W.Sohler,“Lithium?niobate?photonic?wires,”Opt.Express,Vol.17,no.26,pp.2426-242681,December?2009。
【9】R.S.Weis,and?T.K.Gaylord,“Lithium?niobate:summary?of?physical?properties?and?crystal?structure,”Appl.Phys.,A?Mater.Sci.Process.Vol.37,no.4,pp.191-203,March?1985。
【10】W.Sohler,B.Das,D.Dey,S.Reza,H.Suche,and?R.Ricken,“Erbium-doped?lithium?niobate?waveguides?lasers,”in?2005?IEICE?Trans.Electron.E88(C),pp.990-997。
【11】H.Hu,R.Ricken,and?W.Sohler,Large?area,crystal-bonded?LiNbO3thin?films?and?ridge?waveguides?of?high?refractive?index?contrast,Topical?Meeting“Photorefractive?Materials,Effects,and?Devices-Control?of?Light?and?Matter”(PR?09),Bad?Honnef,Germany?2009。On?the?poster,presented?to?PR?09,a?photograph?of?a?3?inch?LNOI?wafer?was?shown.A?manuscript?to?describe?the?LNOI-technology?developed?is?in?preparation。
Summary of the invention
The object of the invention is to, a kind of separation vessel of optical wavelength based on the LN photon line is provided, this wavelength separator can be used to the high integration light path based on the lithium niobate photon line, with adapt to growing optical communication in the present age and sensing technology in the urgent need to.
In order to realize above-mentioned task.The present invention takes following technical solution to be achieved:
A kind of separation vessel of optical wavelength based on the LN photon line, is characterized in that, by at the bottom of lithium niobate base, silicon dioxide coating and two lithium niobate fiber waveguides form; Wherein, one is straight lithium niobate fiber waveguide, and another is the lithium niobate fiber waveguide that part is straight, part is crooked with identical duct width and height, and the height of lithium niobate fiber waveguide is 0.73 μ m, and the top width of lithium niobate fiber waveguide is 0.5 μ m; Form the distance between axles S of two optical waveguides (being photon line) parallel portion of this wavelength separator c=0.75 μ m, coupling length L c=19.6 μ m, output port waveguide spacing 2.6 μ m, output port waveguide bend part is combined by two parallel Bezier curves.
Above-mentioned Bezier curve is determined by following five points: (9.8,0.625), (12.325,0.75), (14.85,1.5625), (17.375,2.375), (19.9,2.5)
The preparation method of the above-mentioned separation vessel of optical wavelength based on the LN photon line, is characterized in that, at first the method makes the lithium niobate sample (being abbreviated as LNOI) based on insulator, and LNOI comprises the silicon dioxide (SiO that directly is attached on 1.3 micron thickness 2) the monocrystalline LN layer (being the LN film) of 730 nanometer thickness on layer, silicon dioxide layer is to cut Z face at the bottom of lithium niobate base through the Z that is coated in congruence with the plasma enhanced chemical vapor deposition method, and namely LN film and thickness are that the LN substrate of 0.5mm has congruent crystal orientation; After processing with CMP (Chemical Mechanical Polishing) process (CMP), the surface of LN film reaches the rms roughness of 0.5 nanometer; Then the wide photoresistance band of 1.7 μ m are thick and 0.5 μ m is used as etch mask.Photoresistance, through the annealing of 1 hour, is followed, in Oxford Plasmalab System100 under 120 ℃, induce lower coupling to become plasma at the 100W radio-frequency power, be coupled to the lithium niobate sample surface under the 70W radio-frequency power, through 60 minutes argons, mill etching, the end face polishing, obtain.
Optical wavelength based on LN photon line separation vessel of the present invention, the technique effect that brings is:
1, (be fit to transmission standard-TE (qTE) and standard-TM (qTM) single mode) under the condition of above-mentioned given waveguide dimensions parameter and optical parametric, input light wave for operation wavelength λ=1.31 μ m, can obtain 99.4% transmissivity at the straight wave guide output terminal; Input light wave for operation wavelength λ=1.55 μ m, can obtain 94.9% transmissivity at the curved waveguide output terminal.Contain the input light wave of wavelength 1.31 μ m and 1.55 μ m when simultaneously, through this optical wavelength separation vessel, can obtain wavelength at the straight wave guide output terminal is that 1.31 μ m, transmissivity are 99.4% output light-wave, and can obtain wavelength at the curved waveguide output terminal simultaneously is that 1.55 μ m, transmissivity are 94.9% output light-wave.
Irrelevant with polarization when 2, this optical wavelength separation vessel is worked, and be of compact construction.
Through applicant's emulation and analytical proof, should can be used to high integration light path based on the lithium niobate photon line based on optical wavelength separation vessel of LN photon line, with adapt to growing optical communication technique and optical sensing in the urgent need to.
Description of drawings
Fig. 1-1st, the input end view in transverse section based on LN photon line optical wavelength separation vessel of the present invention;
Fig. 1-2 is the output terminal view in transverse section based on LN photon line optical wavelength separation vessel corresponding with Fig. 1-1;
Fig. 1-3rd, the optical wavelength separation vessel vertical view corresponding with Fig. 1-1 and Fig. 1-2; In figure, the coupling length 19.6 μ m of optical wavelength separation vessel.Wherein upper right corner sweep is combined by two parallel Bezier curves, and Bezier curve is determined by following five points: (9.8,0.625), (12.325,0.75), (14.85,1.5625), (17.375,2.375), (19.9,2.5).
Fig. 2 is under above-mentioned intended size parameter and optical parametric, when input optical wavelength λ=1.31 μ m, and the distribution map of the electric field (power input: 0.318W, output power: 0.316W, the percent of pass: 99.4%) that utilize business software COMSOL to obtain.
Fig. 3 is under above-mentioned intended size parameter and optical parametric, when input optical wavelength λ=1.55 μ m, and the distribution map of the electric field (power input: 0.32625W, output power: 0.30959W, the percent of pass: 94.9%) that utilize business software COMSOL to obtain.
Fig. 4-1-a, b and Fig. 4-2-a, b are the manufacture craft schematic diagram, wherein, Fig. 4-1-a is based on the input end of optical wavelength separation vessel of the lithium niobate sample (LNOI) of insulator, and 4-2-a is based on the output terminal of optical wavelength separation vessel of the lithium niobate sample (LNOI) of insulator; And Fig. 4-1-b, 4-2-b and 4-3 represent final sample.
Fig. 5 A, Fig. 5 B and Fig. 5 C are concrete calculated examples, and wherein Fig. 5 A represents the incident end, and Fig. 5 B represents exit end, and Fig. 5 C represents final sample.
The present invention is described in further detail below in conjunction with drawings and Examples.
Embodiment
1, simulation result
The cyclone separator arrangement of the optical wavelength based on the LN photon line that the present embodiment provides, as shown in Figure 1, it by lithium niobate base at the bottom of, silicon dioxide coating and two lithium niobate waveguides form.Wherein, one is straight lithium niobate fiber waveguide, and another is the lithium niobate fiber waveguide that part is straight, part is crooked with identical duct width and height.
The waveguide parameter that is suitable for this optical wavelength separation vessel device is: the refractive index n of waveguide LN=2.2; SiO 2The refractive index n in zone SiO2=1.44; Height h=0.73 μ m, the top width w=0.5 μ m of LN waveguide, so select to guarantee to realize single mode transport.Form the distance between axles S of two optical waveguides (being photon line) parallel portion of this wavelength separator c=0.75 μ m, coupling length L c=19.6 μ m, output port waveguide spacing 2.6 μ m, output port waveguide bend part is formed by two parallel Bezier curve groups, and Bezier curve is determined by following five points: (9.8,0.625), (12.325,0.75), (14.85,1.5625), (17.375,2.375), (19.9,2.5).Operation wavelength λ 1=1.31 μ m, λ 2=1.55 μ m, SiO 2The bottom surface of layer is connected with the Z-face that Z-cuts the LN substrate, LN waveguide (being the LN photon line) and SiO 2Layer end face is connected, and LN substrate and LN photon line have the crystal orientation of omnidirectional.
Concrete calculated examples such as Fig. 5, for example, designed optical wavelength separation vessel, its coupling length is a, and two waveguide edge spacings are b, and the incident end as shown in Figure 5A, exit end as shown in Figure 5 B, vertical view is as shown in Fig. 5 C, and in figure, angular distortion part in upper right is combined by two parallel Bezier curves, and Bezier curve is that five points are determined:
(a/2,0.5+b/2);(0.625*a+0.25*c,0.5+b);(0.75*a+0.5*c,1.5+b/4);(0.875*a+0.75*c,2.5-b/2);(a+c,2.5)。In following formula, c is the regulating constant of sweep.
Utilize business software COMSOL to structure (a=19.6 shown in Figure 1, b=0.25, c=0.3) carried out the result demonstration of emulation: this wavelength separator, the input light wave for operation wavelength λ=1.31 μ m, can obtain 99.4% transmissivity at the straight wave guide output port; Input light wave for operation wavelength λ=1.55 μ m, can obtain 94.9% transmissivity at the curved waveguide output port.Contain the input light wave of wavelength 1.31 μ m and 1.55 μ m when simultaneously, through this optical wavelength separation vessel, can obtain wavelength at straight output port is that 1.31 μ m, transmissivity are 99.4% output light-wave, and can obtain wavelength at the curved waveguide output port simultaneously is that 1.55 μ m, transmissivity are 94.9% output light-wave.Fig. 2 and Fig. 3 provide the respective electric field distribution plan that is obtained by emulation.
2, manufacture craft
, in order to make lithium niobate (LN) photon line optical wavelength separation vessel, must first make the lithium niobate sample LNOI (shown in Fig. 4-1-a and Fig. 4-2-a) based on insulator.This sample has comprised the silicon dioxide (SiO that directly is attached on 1.3 micron thickness 2) the monocrystalline LN layer (LN film) of 730 nanometer thickness on layer, SiO 2Layer be cut lithium niobate base through the Z that is coated in congruence with plasma enhanced chemical vapor deposition (PECVD) method at the bottom of the Z face of (thickness is 0.5mm), namely LN film and thickness are that the LN substrate of 0.5mm has congruent crystal orientation; The surface of LN film must be with reaching the rms roughness of 0.5 nanometer after chemically mechanical polishing (CMP) PROCESS FOR TREATMENT.
Because refractive index differs large (n LN=2.2, n SiO=1.44), the LNOI sample is the slab guide with very strong leaded light performance, therefore is well suited for making the lithium niobate photon line.
Photoetching technique requires: photoresistance (OIR 907-17) band 1.7 μ m are thick and that 0.5 μ m is wide is used as etch mask.In order to improve the selectivity of mask, photoresistance under 120 ℃ through the annealing of 1 hour.Then, in Oxford Plasmalab System100, be coupled inductively and become plasma (ICP) with the 100W radio-frequency power, and be coupled to sample surface under the 70W radio-frequency power, sample after so processing mills etching through 60 minutes argons, and result is as shown in Fig. 4-1-b, Fig. 4-2-b and Fig. 4-3.
Finally, with the meticulous polishing of the end face of sample process, thereby realize efficient end-fire optically-coupled.
3, conclusion
Proposed first based on the irrelevant optical wavelength separation vessel of the ultra-compact structure of LN photon line and polarization, the field pattern of this optical wavelength separation vessel that utilized business software COMSOL emulation, and provided manufacture craft.This optical wavelength separation vessel have transmissivity high, with polarization the characteristics such as irrelevant and ultra-compact structure.
The present invention has been subject to state natural sciences fund (fund numbering: 61040064) subsidize.

Claims (3)

1. the separation vessel of the optical wavelength based on the lithium niobate photon line, is characterized in that, by at the bottom of lithium niobate base, silicon dioxide coating and two lithium niobate fiber waveguides form; Wherein, one is straight lithium niobate fiber waveguide, and another is the lithium niobate fiber waveguide that part is straight, part is crooked with identical duct width and height, and the height of lithium niobate fiber waveguide is 0.73 micron, and the top width of lithium niobate fiber waveguide is 0.5 micron; Form the distance between axles S of two optical waveguide parallel portion of this wavelength separator c=0.75 micron, coupling length L c=19.6 microns, 2.6 microns of output port waveguide spacings, output port waveguide bend part is combined by two parallel Bezier curves.
2. the separation vessel of the optical wavelength based on the lithium niobate photon line as claimed in claim 1, is characterized in that, described Bezier curve is determined by following five points: (9.8,0.625), (12.325,0.75), (14.85,1.5625), (17.375,2.375), (19.9,2.5).
3. the preparation method of the separation vessel of the optical wavelength based on the lithium niobate photon line claimed in claim 1, it is characterized in that, at first the method makes the lithium niobate sample based on insulator, the lithium niobate sample comprises the lithium niobate film of 730 nanometer thickness on the silicon dioxide layer that directly is attached on 1.3 micron thickness, silicon dioxide layer is to cut Z face at the bottom of lithium niobate base through the Z that is coated in congruence with the plasma enhanced chemical vapor deposition method, and namely lithium niobate film and thickness are congruent crystal orientation to be arranged at the bottom of the lithium niobate base of 0.5 millimeter; After processing with CMP (Chemical Mechanical Polishing) process, the surface of lithium niobate film reaches the rms roughness of 0.5 nanometer; Then with the photoresistance band of 1.7 micron thickness and 0.5 micron wide as etch mask, photoresistance under 120 ℃ through the annealing of 1 hour, then, in Oxford Plasmalab System 100, induce lower coupling to become plasma at the 100W radio-frequency power, be coupled to the lithium niobate sample surface under the 70W radio-frequency power, through 60 minutes argons, mill etching, the end face polishing, obtain.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5841929A (en) * 1995-12-26 1998-11-24 Nec Corporation Light wavelength filtering circuit and manufacturing method thereof
US6650819B1 (en) * 2000-10-20 2003-11-18 Konstantin P. Petrov Methods for forming separately optimized waveguide structures in optical materials
CN1570686A (en) * 2003-07-22 2005-01-26 中国科学院半导体研究所 Method for realizing stress optical waveguide polarization insensitivity of silicon group silicon dioxide with symmetric structure
CN101539647A (en) * 2009-04-07 2009-09-23 大连理工大学 Polarization-independent integrated waveguide single-fiber triple wavelength division multiplexer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5841929A (en) * 1995-12-26 1998-11-24 Nec Corporation Light wavelength filtering circuit and manufacturing method thereof
US6650819B1 (en) * 2000-10-20 2003-11-18 Konstantin P. Petrov Methods for forming separately optimized waveguide structures in optical materials
CN1570686A (en) * 2003-07-22 2005-01-26 中国科学院半导体研究所 Method for realizing stress optical waveguide polarization insensitivity of silicon group silicon dioxide with symmetric structure
CN101539647A (en) * 2009-04-07 2009-09-23 大连理工大学 Polarization-independent integrated waveguide single-fiber triple wavelength division multiplexer

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