CN102323719B - Continuous exposure method and device - Google Patents
Continuous exposure method and device Download PDFInfo
- Publication number
- CN102323719B CN102323719B CN201110181192.7A CN201110181192A CN102323719B CN 102323719 B CN102323719 B CN 102323719B CN 201110181192 A CN201110181192 A CN 201110181192A CN 102323719 B CN102323719 B CN 102323719B
- Authority
- CN
- China
- Prior art keywords
- mask plate
- base material
- negative pressure
- exposure
- exposure area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to a continuous exposure method and device. The continuous exposure method comprises the step of coating a material mixture on the surface of a moving substrate and is characterized by further comprising the steps of: enabling the substrate in a set area to be in a relaxation state or a state with lower tension, laminating the substrate in the relaxation state or the state with lower tension with a mask plate, driving the substrate and the mask plate by a mask plate transmission device to pass through an exposure area at same speed, separating the substrate and the mask plate which pass through the exposure area, and returning the mask plate separated from the substrate to an initial position through the transmission device. The continuous exposure device comprises a negative pressure box, the mask plate, an exposure light source and a mask plate transmission device. The continuous exposure method and device provided by the invention can be used for manufacturing optical diaphragms, optical filter arrays, photoelectric devices containing flexible substrates, or other diaphragms and devices which are in need of transferring patterns prefabricated on mask plates to surface coatings of the flexible substrates through an exposure system according to setting requirements, and can also be used in liquid crystal displays, LED (Light-Emitting Diode) illuminating devices or solar cell panels.
Description
Technical field
The present invention relates to a kind of by mask manufacture for the blooming piece of liquid crystal display, LED lighting device and solar panel and the method and apparatus that contains photoelectric component that can flexing base material.
Background technology
Flat panel display including liquid crystal display (LCD) is just playing a part more and more important in people's live and work.Liquid crystal display combines liquid crystal-semiconductor technology, is topmost technology in current flat pannel display.In liquid crystal display, conventionally comprise a light source emitting beam, be called backlight (BLU).In backlight, contain blooming piece, make to send from backlight, and shine the ray space in display front through liquid crystal even, visual angle is by certain requirement distribution.Prism diaphragm, lenticule diaphragm and derived product thereof are very important blooming piece in backlight.The mode that the making of prism diaphragm and lenticule diaphragm adopts mould to copy conventionally.For example, US Patent No. 5,175, a kind of method of 030 narration, coats fluoropolymer resin and the die surface of the structure of blooming piece complementation, makes blooming piece by UV-irradiation or heat treated.For example PCT WO2009/017319 has narrated a kind of method for making again, its device comprises home roll, mold membrane, applicator roll, pressure roller etc., the fluoropolymer resin of coating mold membrane one surface is depressed into the inner side of this mold membrane pattern, so that the inner side of this mold membrane pattern is filled with this fluoropolymer resin, through overcuring with separate, form contain this fluoropolymer resin blooming piece.Although mould clone method can be used to make blooming piece, but because resin material directly contacts with mould, easily make die surface structure stop up, affect quality and the yield of blooming piece product, and die surface is easily oxidized, and easily producing the scuffing causing by cleaning, mould need to be changed continually, has increased the cost of manufacture of blooming piece.
Summary of the invention
For above defect, the present invention discloses a kind of continuous exposure method and apparatus, for make continuously blooming piece and contain can flexing base material photoelectric component.
Technical scheme of the present invention is achieved in the following ways: a kind of continuous exposure method, comprising: at the substrate surface coating material potpourri of motion,
The base material that makes setting regions is in lax or compared with the state of small tension receiving coil,
Make in relaxing or fitting compared with the base material of small tension receiving coil state and mask plate,
Make base material and mask plate be subject to the driving of mask plate gearing to pass through exposure area with identical speed,
Make to separate with mask plate by the base material of exposure area,
Make the mask plate after separating with base material be back to initial position by gearing.
Described base material is: the material of polyester, polycarbonate, polymethylmethacrylate or other rollables; Material blends comprises light trigger, photopolymerization material, adjuvant; The coating process of substrate surface material blends is slot coated, draw together and be coated with or showering.
Described light trigger is benzyl dimethyl ketal, 4-methyldiphenyl ketone, tri-methyl benzophenone; Photopolymerization material is acryl resin, vibrin, polyurethane, Polyvinylchloride or silicones; Adjuvant is defoamer, antistatic agent.
Described in lax or compared with the base material of small tension receiving coil state by base material and coating material blends self gravitation thereon, or auxiliary with negative pressure, fit with mask plate.
Described base material and the laminating of mask plate are also included between base material and mask plate and are accompanied by fluid layer; Described fluid is water or isopropyl alcohol.
It is the direction of motion by changing base material or the auxiliary effect with air-flow that described base material separates with mask plate, and base material is separated with mask plate.
A kind of continuous exposure device, comprising:
Negative pressure box, makes the base material of negative pressure box front and back have different tension force;
Mask plate, the pattern that contains printing opacity and light-blocking part composition;
Exposure light source, optionally exposes to the material blends on base material by mask plate light transmission part;
Mask plate gearing, drives the cated base material that contains of mask plate and laminating with it to pass through exposure area, and the mask plate transmission after separating with base material is returned to initial position.
Many empties body that described negative pressure box comprises the cavity that contains opening and is positioned at cavity periphery and moves around cavity, the cavity of opening is hollow cylinder or flat open column shape object.
The pattern that described mask plate contains glass substrate and is made up of chromium layer on glass substrate, or the pattern that contains base copolyester and formed by emulsion on base copolyester.
Described exposure light source is light source or the electron beam source that sends ultraviolet light; Ultraviolet light is directional light or approximate directional light.
The directional light that described exposure light source sends or approximate directional light are vertical with mask plate plane.
The directional light that described exposure light source sends or approximate directional light and mask plate plane form an angle tilting.
Described mask plate gearing comprises machine driven system and motor driven systems; Machine driven system comprises odontoid belt or line slideway; Motor driven systems comprises servomotor or variable-frequency motor.
The present invention, can be used for making blooming piece, filter arrays, contain can flexing base material photoelectric component or other need to be through exposure system by pre-pattern on mask by setting requirement, be delivered to diaphragm and device on can flexing substrate surface coating, and for liquid crystal display, LED lighting device or solar panel.
Brief description of the drawings
Fig. 1 is the first embodiment of the present invention.
Fig. 2 is exemplary method and the device of the mask plate transmission of Fig. 1.
Fig. 3 is the sectional view of the first negative pressure box of Fig. 1.
Fig. 4 is the sectional view of the second negative pressure box of Fig. 1.
Fig. 5 is the first mask plate pattern example.
Fig. 6 is the second mask plate pattern example.
Fig. 7 is second embodiment of the present invention.
Fig. 8 the 3rd embodiment of the present invention.
Embodiment
Embodiment 1:
Known a kind of continuous exposure method and apparatus by Fig. 1: unreel the form base material placed thereon that running roller 101 comprises rolling up, as polyester (PET), polycarbonate (PC), the material of polymethylmethacrylate (PMMA) or other rollables.The base material process dispense tip 102 of emitting from unreeling running roller, coats material blends in the one side of base material, forms a coating.Base material can pass through conventional pre-service, as clean, destatics, and maybe can contain a precoated shet, or through corona treatment, to increase the clinging power to coating material.Material blends comprises light trigger, as benzyl dimethyl ketal, and 4-methyldiphenyl ketone, tri-methyl benzophenone; Photopolymerization material, as acryl resin, vibrin, polyurethane, Polyvinylchloride or silicones; Adjuvant, as defoamer, antistatic agent.The coating method of dispense tip can adopt slot coated (Slot die), draws together painting (Doctor blade), film coating (curtain coating), spraying (spray), printing coating (printing) or other suitable coating methods.Backing roll 103,104 is any surface finish, and the base material 105 through this roller is not produced to the metallic roll of cut or other damages.After backing roll 103 and 104, arrive a negative pressure box 106 containing cated base material.
Base material 107 after negative pressure box 106 is in lax or compared with the state of small tension receiving coil.The substrate base of mask plate 108 can adopt the glass of high-flatness, as quartz glass, soda-lime glass or Pyrex.Defect concentration, uv transmittance and temperature expansion coefficient to glass have certain requirement.Mode by sputter or evaporation is at glass surface deposit one metallic chromium layer.Crome metal has the effect that block ultraviolet is passed through.On chromium layer, coat optics etching glue or electron beam resist, by layout, photoresist is exposed by optics or electron beam mode, then pass through etching, obtain having the mask plate of printing opacity and light-blocking part.
Relax or fit with mask plate under the Action of Gravity Field of base material self and coating compared with the base material of small tension receiving coil 107.The laminating of base material and mask plate 108 also can strengthen laminating effect by additional negative pressure between base material and mask plate.Between base material and mask plate, also can apply fluid, as water, or isopropyl alcohol.Add fluid refractive index preferably between base material and the refractive index of mask plate transparent part medium, to eliminate or reduce the interference fringe producing between base material and mask plate.It is parallel, approximate parallel that the light that light source 116 sends can be, or scattered light.The light wavelength that light source 116 sends can be at ultraviolet, visible or infrared band.The form of light source can be short arc electric discharge, or laser.It is worth mentioning that light source 116 or can be electron beam source, its electron beam sending is by the initiating agent to electron beam sensitive in mask plate and coating or polymeric material effect, and the material blends that makes to be coated on base material optionally solidifies.
Base material 109 passes through exposure area 117 with after mask plate 108 laminatings with identical speed.111 is the second negative pressure box.In the vertical direction, the position of the second negative pressure box 111 is higher than the position of mask plate 108, and therefore the second negative pressure box drives base material 110 to the motion of mask plate oblique upper, base material and mask plate to be departed from.The disengaging of base material and mask plate also can evenly add with air-flow between base material and mask plate, the disengaging of auxiliary base material and mask plate.Base material 110 after departing from by exposure region and with mask plate can be in lax or less tension state.Mask plate after departing from base material will, by mask plate gearing, be transported to the opposite side of exposure area, and containing the laminating of cated base material, then this enters exposure region, and so circulation, forms and by mask plate, the coating on base material is optionally exposed continuously.Exposure can at room temperature be carried out, and maybe can under the environment higher than room temperature, expose by a heating arrangement.While being parallel or approximately parallel light as light source, they can be perpendicular to mask plate plane, or forms an angle tilting with mask plate plane.The cated base material 112 that contains after selectivity exposure enters a treating apparatus 113.Device 113 can be ultraviolet light source, baking oven, makes further to solidify through this treating apparatus the material blends that is attached on base material, with the common diaphragm with particular surface feature or optical property that forms of base material.Base material 112 is by supporting running roller 114 by 115 rollings of rolling running roller.
At least two mask plates 108 that use in shown in Fig. 1, in the first mask plates enters and arrives exposure region, set position time, the second mask plates enters the state joining with the first mask plates, and start and fit containing cated base material, with realize light source by mask plate the continuous exposure to material blends.It should be noted that the continuous exposure described in this example may contain the needs of first and second mask plates junction because of mask plate manufacture craft, or be subject to the restriction of mask plate support frame, corresponding material blends part fails to receive exposure.In the time of the actual fabrication of device, the part of failing to accept to expose can reduce as far as possible.Fail to accept the existence of exposed portion, do not affect the validity of this example continuous exposure method and apparatus.
Fig. 2 describes exemplary method and the device of mask plate transmission in the present invention's the first example.Containing cated base material 107 in lax or compared with the state of small tension receiving coil.The first mask plate, from initial position 210, by mask plate gearing, accelerates to arrive a desired location 205A.At desired location 205A place, by self gravitation or the auxiliary effect with negative pressure, containing cated base material and the first mask plate 108A laminating.In example of the present invention, the mask plate that is fitted in of mask plate and corresponding base material enters before exposure area and completes, to avoid affecting owing to not fitting the quality of exposure effect and diaphragm.The first mask plate 108A and enter exposure area 117 with the base material of its laminating, and with identical speed motion, by exposure area 117.The suffered exposure of material blends depends on the intensity, exposure area of the light source speed in the size of base material traffic direction, base material operation.The first mask plate moves to the position of a setting in exposure area, the second mask plate 108B, by mask plate gearing, arrives another desired location, and its forward position 203 and the rear of the first mask plate are joined along 202.Containing cated base material and the second mask plate in the same way, by self gravitation, or auxiliaryly fit at desired location 205A with negative pressure, and enter and pass through exposure area 117 with identical speed.The first mask plate 108A, by behind exposure area 117, can depart from base material.When the forward position 201 of the first mask plate arrives desired location 205B by exposure area, can depart from base material.Shown in position 205B be the disengaging configuration of mask plate and base material.With the base material of mask plate laminating in the time moving to desired location 205B, due to backing roll 111(as shown in Figure 1) effect that higher than the position of mask plate, base material 112 upwards promoted at vertical direction, or can be at desired location 205B place to being blown into equably the auxiliary base material of appropriate air-flow and mask plate disengaging between base material and mask plate.After the first mask plate 108A along 202 in-position 205B, and after departing from base material, mask plate gearing will speed up and makes the first rapid in-position 206 of mask plate, and by mask plate gearing, makes the first mask plate arrive initial position 210 through position 207,208,209 successively.The first mask plate that arrives initial position 210 is accelerated by mask plate gearing again, its forward position 201 before entering exposure area along 204, the second mask plate rear is joined with it, and pass through self gravitation or auxiliary with negative pressure and containing cated base material laminating at desired location 205A, again enter exposure area.Such process repetitive cycling, optionally exposes to the coating material on base material continuously by mask plate, makes continuously the planform with setting, the blooming piece of structure distribution and surface characteristics or photoelectric component.In the example of Fig. 2, described the situation of two mask plates, but enforcement of the present invention is not restricted to use two mask plates.As the speed of base material operation, the forward position that mask plate gearing cannot be realized the second mask plate to the transmission speed of mask plate joined with the rear edge of the first mask plate before entering exposure area, the forward position that maybe cannot realize the first mask plate joined with the rear edge of the second mask plate before entering exposure area, can increase the 3rd, or more mask plate, the rear edge of the mask plate of the Yu Yi exposure area, forward position of the mask plate that will enter exposure area is joined.The piece number of mask plate used in specific design, depends on speed to mask plate transmission of base material travelling speed, mask plate gearing or the requirement of device stability and product quality.
In Fig. 2, mask plate gearing can contain linear guide apparatus.Guide piece can comprise that pair of parallel is fixed on the guide rail on pedestal, and assembles support component thereon slidably.Drive unit can contain servomotor, or adjustable frequency motor.Mask plate can be placed in the framework of a use metal material or nonmetallic materials making, by drive unit and guide piece, drives mask plate framework to move together with mask plate.Servomotor in drive unit or variable-frequency motor also can drive a driving-belt, drive mask plate motion by the friction of driving-belt and mask plate framework, or drive mask plate motion by the locking device between driving-belt and mask plate.
Fig. 3 is the sectional view of the first negative pressure box in the present embodiment 1.Negative pressure box is cylindrical structure.301 is negative pressure box cavity, contains negative pressure box chamber wall 302 and negative pressure box cavity hatch 303.304 for to rotate around cavity 301, and the power wheel that contains porous.
Fig. 4 is the sectional view of the second negative pressure box in the present embodiment 1.Negative pressure box has flat pattern.401 is negative pressure box cavity, contains negative pressure box chamber wall 402 and negative pressure box cavity hatch 403.404 is the travelling belt that contains porous, by the rotation of runner 405 and 406, is driven around vacuum cavity and moves.Negative pressure box in Fig. 3 and Fig. 4, by the device of bleeding or other are suitable, makes the pressure in casing be starkly lower than the pressure (pressure outside casing is generally atmospheric pressure) outside casing.The back side (uncoated one side) of base material and negative pressure box porous power wheel 304, travelling belt 404 Surface Contacts.Due to the pressure differential inside and outside casing, negative pressure box is implemented pinning effect by 303,403 pairs of base materials of cavity hatch, has cut off the tension force of negative pressure box both sides base materials.The base material 305 and 306,407 and 408 that is positioned at negative pressure box both sides can have different tension force.The design of suitable negative pressure box, can make negative pressure box base material on one side, as 306,408, in lax or compared with the state of small tension receiving coil, and the base material of negative pressure box another side, as 305,407, in compared with the state of hightension.Compared with Fig. 3 example negative pressure box, Fig. 4 negative pressure box cavity hatch 403 has larger area, therefore can implement stronger pinning effect to base material.
Fig. 5 is the first mask plate pattern example, and wherein 501 is light transmission part, and 502 is light-blocking part.The light transmission part of mask plate is made up of suitable random arrangement and apart circular institute.This exemplary mask template can be used for making the blooming piece with diffusion function.
Fig. 6 is the second mask plate pattern example, and wherein 601 is light transmission part, and 602 is light-blocking part.The light transmission part of mask plate is elongated strip, and this exemplary mask template can be used for making grating or similar optical element.Mask plate of the present invention is not limited to the kind described in example.In fact, the mask plate of any pattern all can be combined with continuous exposure method and apparatus of the present invention application, makes blooming piece and the photoelectric component of various different performances.
Embodiment 2:
Shown in Fig. 7, be second embodiment of the present invention.Unreel the form base material placed thereon that running roller 701 comprises rolling up.The base material process dispense tip 702 of emitting from unreeling running roller, coats material blends in the one side of base material, forms a coating.703,704 is backing roll.706 is a negative pressure box, can be the described negative pressure box of Fig. 3, Fig. 4, or other forms of negative pressure box, makes the base material 705,707 on negative pressure box both sides have different tension force.Mask plate 708 is with layout.Lax or have compared with the base material of small tension receiving coil by the gravity of base material and coating, or assist with the negative pressure between base material and mask plate, fit with mask plate 708.720 is a light source, and 721 is exposure area correspondingly.Mask plate 708 and light source 720 can be mask plate and the light source described in example 1, or other forms of mask plate and light source.Mask plate 708 passes through exposure area 721 with base material 709 with identical speed.The second negative pressure box 711, can be the described negative pressure box of Fig. 3, Fig. 4, or other forms of negative pressure box, makes the base material 710 and 712 that is positioned at its front and back have different tension force.Above part is corresponding with the appropriate section described in the first example, is all applicable to the description of the second example appropriate section about the description of the first example.
In the second example shown in Fig. 7, base material 712 enters an Etaching device 715 after backing roll 713,714.Etaching device 715 can comprise a flux bath, solvent is contacted with the coating on base material, and the material blends not being exposed in the coating that makes to contact with solvent dissolves, or dissolving because being exposed the material blends decomposing or degraded of making to contact with it, and separate from base material.Solvent in flux bath can be methyl alcohol, acetone, isopropyl alcohol, water or other solubilized uncured, decompose or solvent or the solvent mixture of the material blends of having degraded.Etaching device also can comprise an etching tank, and etching tank makes mordant contact with the material coming out after dissolved because of material blends on base material, and it is corroded, and produces geometric configuration or the character of surface different from adjacent area.Etaching device also can comprise a rinse bath, in order to remove residual material blends.
The continuous exposure method and apparatus of this example also can be used for making thin film integrated circuit, flexible circuit board (FPC) or other flexible optoelectronic components and parts.In base material, can contain conductive layer, as copper, transparency conducting layer ITO or the conductive layer that contains nanotube.By exposure and etching, the mask graph on the mask plate of the various circuit board structure designing requirements of reflection is transferred on the conductive layer on base material.The material blends being coated with on base material is also known as photoresist.The photoresist being exposed by mask plate light transmission part or curable (negative photoresist) maybe can decompose or degrade (eurymeric photoresist), uncured or decompose or degraded part by the solvent being dissolved in Etaching device, and corresponding conductive layer is come out, through the corrosive liquid in Etaching device and be removed, corresponding Etaching device also comprises to be removed curing or undecomposed or degrades and cover the device of the photoresist on remaining conductive layer.
As shown in Figure 7, base material through Etaching device enters drying box 716, make solvent evaporates residual from Etaching device, and make to be retained in material blends in base material and further solidify, with common diaphragm or the photoelectric component with particular surface feature or optical property of forming of base material.Drying box 716 can be a baking oven, ultraviolet light source or other can make volatilize residual solvents on base material, or makes to be retained in the further curing device of material blends in base material.Base material after drying case 716 is dried after backing roll 717,718 by 719 rollings of rolling running roller.
Embodiment 3:
Fig. 8 describes the third embodiment of the present invention.Unreel the form base material placed thereon that running roller 801 comprises rolling up.The base material process dispense tip 802 of emitting from unreeling running roller, coats material blends in the one side of base material.803,804 is backing roll.806 is a negative pressure box.Base material 805 between backing roll 804 and negative pressure box 806 has the tension force of a setting.Base material is after negative pressure box 806, and tension force significantly reduces, and makes base material 807 in lax or compared with the state of small tension receiving coil, flexible mask plate 808 is a flexible mask plate with layout, can comprise a base copolyester, has good dimensional stability; Emulsion layer, as silver salt emulsion layer, provides the pattern of printing opacity and resistance light; Tack coat, promotes the adhesion between emulsion layer and base copolyester; Protective seam, protection silver salt emulsion layer is not destroyed.Emulsion described in this example, means any being coated on base copolyester, and can form the material of printing opacity and resistance light pattern.Described flexible mask plate 808 can be wound up on roller, and by the rotation of roller, drives directly or indirectly the motion of flexible mask plate.Flexible mask plate 808 produces motion by the rotation of power wheel 820,821,822,823.Light source 824, can be the light source being similar to described in example 1 or example 2, or other suitable light sources.The position that flexible mask plate 808 contacts with power wheel 820 can be set as initial position.Be positioned at the mask plate of initial position and relax or there is the base material laminating compared with small tension receiving coil, and passing through exposure region 825 with base material with identical speed.Relax or fit with flexible mask plate under the Action of Gravity Field of base material self and coating compared with the base material of small tension receiving coil, or between base material and flexible mask plate, add negative pressure to strengthen the effect of fitting.Between base material and mask plate, also can apply fluid, as water, or isopropyl alcohol.Add fluid refractive index preferably between base material and the refractive index of mask plate transparent part medium, to eliminate or reduce the interference fringe producing between base material and mask plate.The base material 809 of laminating and flexible mask plate 808 by behind exposure region, due to the difference of position and direction of motion in the vertical direction, or evenly additional with air-flow between base material and flexible mask plate, make base material 810 and flexible mask plate disengaging in the speed with identical.Flexible mask plate after departing from base material, by the direct or indirect drive of power wheel 821,822 and 823, get back to the initial position contacting with power wheel 820, and again fit with base material 807, and again enter exposure region with identical speed, form by flexible mask plate the continuous unremitting exposure of the coating on base material.
The tension force of the base material 812 between the second negative negative pressure box 811 and backing roll 813,814 can be different from the tension force of the base material 810 between flexible mask plate 808 and negative pressure box 811.The tension force of base material 812 can be because wrap-up draws the tension force producing.Base material 812 enters successively Etaching device 815 and drying device 816 after backing roll 813 and 814.Etaching device 815 and drying device 816 can be and similar Etaching device and drying device described in example two.Base material after drying case 816 is dried after backing roll 817,818 by 819 rollings of rolling running roller.
Enforcement of the present invention, also makes conventionally can only carry out technique and the element of discrete making, can adopt continuously, the technique of volume to volume makes, and improves significantly the efficiency that element is made.Disclosed continuous exposure method and apparatus can be used for making blooming piece, as PCT US2007/069539 and the disclosed blooming piece of patent of invention ZL200910234688.9; Filter arrays; Contain can flexing base material photoelectric component; Or other need to be through exposure system by pre-pattern on mask by setting requirement, be delivered to diaphragm and device on can flexing substrate surface coating.
Content disclosed in this invention, as the detail of the exposure method in example and device provides in order to help those of ordinary skill in the art to understand the present invention, but the present invention is not limited to described detail.
Claims (4)
1. a continuous exposure method, comprises the following steps:
A. the base material that makes to contain material blends coating in setting regions in lax or compared with the state of small tension receiving coil;
B. by mask plate gearing, make the first mask plate accelerate to arrive a desired location 205A from initial position 210;
C. at desired location 205A place, by self gravitation or the auxiliary effect with negative pressure, make to contain coating and in lax or entering exposure area compared with the base material of small tension receiving coil state before with the first mask plate laminating, and be subject to the driving of mask plate gearing to pass through exposure area with identical speed with the first mask plate;
D. the first mask plate moves to the position of a setting in exposure area, and the second mask plate, by mask plate gearing, arrives another desired location, and the rear edge of its forward position and the first mask plate is joined;
E. by self gravitation or the auxiliary effect with negative pressure, make to contain coating and in lax or entering exposure area compared with the base material of small tension receiving coil state before at desired location 205A and the second attaching mask, and be subject to the driving of mask plate gearing to pass through exposure area with identical speed with the second mask plate;
F., when the first mask plate forward position reaches position 205B by exposure area, can depart from base material; After the first mask plate, edge reaches position 205B, and after departing from base material, mask plate gearing will speed up and makes the first mask plate reach rapidly position 206, and by mask plate gearing, makes the first mask plate arrive initial position 210 through position 207,208,209 successively;
G. the first mask plate that arrives initial position 210 is accelerated by mask plate gearing again, its forward position before entering exposure area, the rear edge of the second mask plate is joined with it, and pass through self gravitation or auxiliary with negative pressure and containing cated base material laminating at desired location 205A, again enter exposure area; Such process repetitive cycling, optionally exposes to the coating material on base material continuously by mask plate.
2. according to a kind of continuous exposure method described in claim 1, comprise use the 3rd or more mask plate, the rear edge of the mask plate of the Yu Yi exposure region, forward position of the mask plate that will enter exposure area is joined.
3. according to a kind of continuous exposure method described in claim 1, comprise and use the framework of making by metal material or nonmetallic materials of placing mask plate, by drive unit and guide piece, drive mask plate framework to move together with mask plate.
4. the device that the continuous exposure method as described in claim 1 is used, is characterized in that: comprising: negative pressure box, makes the base material of negative pressure box front and back have different tension force; Mask plate, the pattern that contains printing opacity and light-blocking part composition; Exposure light source, optionally exposes to the material blends on base material by mask plate light transmission part; Mask plate gearing, drive the cated base material that contains of mask plate and laminating with it to pass through exposure area, and after separating with base material, initial position is returned in mask plate transmission; The porous body that described negative pressure box comprises the cavity that contains opening and is positioned at cavity periphery and moves around cavity, the cavity of opening is hollow cylinder or flat open column shape object; The pattern that described mask plate contains glass substrate and the pattern that is made up of chromium layer on glass substrate or mask plate contain base copolyester and be made up of emulsion on base copolyester.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110181192.7A CN102323719B (en) | 2011-06-30 | 2011-06-30 | Continuous exposure method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110181192.7A CN102323719B (en) | 2011-06-30 | 2011-06-30 | Continuous exposure method and device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102323719A CN102323719A (en) | 2012-01-18 |
| CN102323719B true CN102323719B (en) | 2014-09-03 |
Family
ID=45451484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110181192.7A Expired - Fee Related CN102323719B (en) | 2011-06-30 | 2011-06-30 | Continuous exposure method and device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102323719B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105538726A (en) * | 2016-02-18 | 2016-05-04 | 苏州苏大维格光电科技股份有限公司 | Three-dimensional molding device and method based on film substrate |
| CN109116678A (en) * | 2018-08-21 | 2019-01-01 | 中国科学院深圳先进技术研究院 | Roll ultraviolet nanometer imprinting apparatus |
| CN111103771A (en) * | 2019-12-30 | 2020-05-05 | 广东华恒智能科技有限公司 | Continuous production method and structure of soft material |
| CN217181402U (en) * | 2022-01-14 | 2022-08-12 | 宁德时代新能源科技股份有限公司 | Equipment that substrate was handled |
| CN217181403U (en) * | 2022-01-26 | 2022-08-12 | 宁德时代新能源科技股份有限公司 | Exposure equipment |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3685906A (en) * | 1970-05-22 | 1972-08-22 | Addressograph Multigraph | Apparatus and means for making duplicates of a microfilm original |
| CN1740914A (en) * | 2004-02-02 | 2006-03-01 | Lg电子株式会社 | Exposure apparatus |
| CN1816771A (en) * | 2003-07-04 | 2006-08-09 | 雷恩哈德库兹两合公司 | Exposure station for film webs |
| CN101063831A (en) * | 2006-04-27 | 2007-10-31 | 株式会社Orc制作所 | Conveying device |
| CN101542323A (en) * | 2007-03-30 | 2009-09-23 | Lg化学株式会社 | Manufacturing method of film having micro-pattern thereon and film manufactured thereby |
| CN101706086A (en) * | 2009-11-27 | 2010-05-12 | 丹阳博昱科技有限公司 | Optical film and production method thereof |
-
2011
- 2011-06-30 CN CN201110181192.7A patent/CN102323719B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3685906A (en) * | 1970-05-22 | 1972-08-22 | Addressograph Multigraph | Apparatus and means for making duplicates of a microfilm original |
| CN1816771A (en) * | 2003-07-04 | 2006-08-09 | 雷恩哈德库兹两合公司 | Exposure station for film webs |
| CN1740914A (en) * | 2004-02-02 | 2006-03-01 | Lg电子株式会社 | Exposure apparatus |
| CN101063831A (en) * | 2006-04-27 | 2007-10-31 | 株式会社Orc制作所 | Conveying device |
| CN101542323A (en) * | 2007-03-30 | 2009-09-23 | Lg化学株式会社 | Manufacturing method of film having micro-pattern thereon and film manufactured thereby |
| CN101706086A (en) * | 2009-11-27 | 2010-05-12 | 丹阳博昱科技有限公司 | Optical film and production method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102323719A (en) | 2012-01-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102323719B (en) | Continuous exposure method and device | |
| NL2012087C2 (en) | Additive manufacturing system for manufacturing a three dimensional object. | |
| CN1928712B (en) | Mould for use in production structure and marking device | |
| JP7008157B2 (en) | Optical layer configuration in the imprint lithography process | |
| TWI343873B (en) | ||
| US9720312B2 (en) | Projection screen and manufacturing method of projection screen | |
| TW201519962A (en) | Application device for forming coating having discontinuous pattern onto strip-shaped film substrate, and method for manufacturing strip-shaped film substrate having uneven pattern | |
| CN107405861A (en) | Antifog antifouling layered product and its manufacture method, article and its manufacture method and anti-fouling method | |
| JP2007004155A (en) | Anti-reflection film and method for manufacturing the same | |
| JP2007105662A (en) | Method and apparatus for washing optical plastic film, method for manufacturing optical plastic film and coating apparatus | |
| JP4862033B2 (en) | Light-absorbing mold, photosensitive resin pattern forming method using the mold, and printing plate manufacturing method | |
| JP2004325861A (en) | Method for forming light diffusion layer, light diffusion film and its manufacturing method, and ink jet device for light diffusion layer formation | |
| JP2007246849A (en) | Washing method for optical plastic film, manufacturing method for optical plastic film, washing apparatus for optical plastic film, and coating apparatus | |
| US8288074B2 (en) | Photoimaging method and apparatus | |
| JP2018187767A (en) | Water-repellent member and manufacturing method thereof | |
| US20160250661A1 (en) | Uv-curing process with exterior masking for internal and selective decoration of tube-like and 3d electronic housing | |
| US8641935B2 (en) | Apparatus and method of manufacturing light guide plate | |
| WO2014156452A1 (en) | Optical film production method, optical film, surface light-emitting body and optical film production device | |
| JP2008207374A (en) | Resin mold and manufacturing method of printing plate utilizing the same | |
| JP2022023065A (en) | Configuring optical layer in imprint lithography process | |
| JP6688296B2 (en) | Light diffusing member and method for manufacturing light diffusing member | |
| KR20110018588A (en) | A decoration member applied to the external surface of home appliances and manufacturing method thereof | |
| TWI274911B (en) | Manufacturing device and method for color filter | |
| CN115793112A (en) | Flat lens, preparation method thereof and electronic device | |
| JP5641085B2 (en) | Method for manufacturing antireflection article, and method for manufacturing mold for manufacturing antireflection article |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20190109 Granted publication date: 20140903 |
|
| PP01 | Preservation of patent right | ||
| PD01 | Discharge of preservation of patent |
Date of cancellation: 20220109 Granted publication date: 20140903 |
|
| PD01 | Discharge of preservation of patent | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140903 Termination date: 20190630 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |