CN102252828A - Method for monitoring real-time changes in reflectivity of highly reflective optical element under laser irradiation - Google Patents
Method for monitoring real-time changes in reflectivity of highly reflective optical element under laser irradiation Download PDFInfo
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Abstract
The invention relates to a method for monitoring real-time changes in reflectivity of a highly reflective optical element under laser irradiation, an initial optical resonant cavity is constituted by a highly reflective mirror in the same wave band with the optical element to be monitored, a detection laser beam is incident to the optical resonant cavity and the ring-down time tau 0 of the detection laser beam is recorded; and the optical element to be monitored is inserted into the initial optical resonant cavity for constituting a testing optical resonant cavity. An irradiation laser beam is focused to the position of the detection laser beam on the surface of the optical element to be monitored, irradiation laser energy density or irradiation time or irradiation pulse frequency is increased continuously, the ring-down time tau (n) of the detection laser beam under the different irradiation laser energy density or the irradiation time or the irradiation pulse frequency is recorded simultaneously and the real-time change situation of the reflectivity of the highly reflective optical element to be monitored under the different irradiation laser energy density or the irradiation time or the irradiation pulse frequency situation can be further obtained. The method is simple, the measurement sensitivity is high and the practicability is strong.
Description
Technical field
The present invention relates to a kind of method of monitoring optical element reflectivity real-time change under laser irradiation, particularly a kind of method of measuring high reflectivity film reflectivity real-time change under laser irradiation.
Background technology
Along with the expansion day by day of high power laser light technology and range of application thereof, the importance of high reflectance optical thin film reflecting properties becomes increasingly conspicuous, so that reflectivity has become the indispensable performance index of optical thin film.In the large laser system of complexity, can the anti-high power laser light irradiation ability of high reflectance optical element and the stability under high power laser light irradiation thereof and laser system normally be moved closely related.Have only and measure the reflectivity of optical thin film under high power laser light irradiation quantitatively, just might carry out corresponding research work for further improving the optical thin film quality, its reflectivity in the high power radiation environment directly reacts the height of optical element quality, thereby the test of optical thin film reflectivity in the high power radiation environment also just become the technical matters that needs to be resolved hurrily.
For reflectivity greater than 99.9% optical element albedo measurement mainly based on optical cavity ring-down technology (Li Bincheng, Gong Yuan; Optical cavity ring-down high reflection rate measurement summary, " laser and optoelectronics progress ", 2010,47:021203; Angela Duparre, Detlev Ristau; Optical Interference Coatings 2010 Measurement Problem, Appl.Opt., 2010,50:C172).The patent of invention " a kind of measuring method of anti-mirror high reflectance " of Chinese patent application numbers 98114152.8 adopts pulse laser system to make light source.The patent of invention " a kind of measuring method of reflectance ratio of high reflected mirror " of Chinese patent application numbers 200610011254.9, the patent of invention " measuring method of reflectance ratio of high reflected mirror " of Chinese patent application numbers 200610165082.0, the patent of invention of Chinese patent application 200710098755.X " high reflectivity measurement method of based semiconductor self-mixing effect ", the patent of invention " a kind of device that is used to measure high reflectance " of the patent of invention " based on the high reflectivity measurement method of frequency selective optical feedback cavity ringdown spectroscopy " of Chinese patent application numbers 200810102778.8 and Chinese patent application numbers 200810055635.4 all uses the continuous light cavity attenuation and vibration technique to measure high reflectance.The optical cavity ring-down technology has solved the problem of high reflectance optical element albedo measurement, and its albedo measurement scope is 98%～99.9999% even higher.
Above-mentioned various measuring method all is that measured reflectivity result can not reflect the situation of optical element in actual high power laser light irradiation running environment in more weak relatively laser testing environment to the measurement of optical thin film reflectivity.In order to assess the work online performance of high catoptrics film in the high power laser light radiation environment, it is very necessary developing a kind of method and apparatus of monitoring high reflective optical devices reflectivity real-time change under laser irradiation.
Summary of the invention
The technical problem to be solved in the present invention is: the deficiency that overcomes existing high catoptrics reflectivity of optical thin film measuring method, a kind of method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation has been proposed, this method can be monitored the real-time change situation of high reflective optical devices reflectivity under high power laser light irradiation in real time, and have simple in structure, highly sensitive, advantage such as practical.
The technical solution adopted for the present invention to solve the technical problems is: according to the optical cavity ring-down technical know-how, at first form an initial optical resonator cavity by high reflection mirror, measure initial optical resonator cavity output optical cavity ring-down signal, simulate exploring laser light bundle ring-down time in the initial optical resonator cavity by the single index attenuation function.In the initial optical resonator cavity, insert optical element to be measured then, constitute a measuring optical resonator cavity, shine optical element to be measured with irradiation laser, and constantly increase the energy density of irradiation laser or irradiation time or total irradiance pulse number of times, monitor the ring-down time of exploring laser light bundle in the measuring optical resonator cavity simultaneously.The ring-down time of exploring laser light bundle can calculate the real-time change situation of optical element reflectivity to be measured in variation by exploring laser light bundle ring-down time in the measuring optical resonator cavity and the initial optical resonator cavity.
The specific implementation step is as follows:
(1) by forming an initial optical resonator cavity with the high reflection mirror of wave band with optical element to be measured, the exploring laser light bundle is incided the initial optical resonator cavity, write down the optical cavity ring-down signal of initial optical resonator cavity output, simulate the ring-down time τ of exploring laser light bundle by the single index attenuation function
0
(2) optical element to be measured is inserted the initial optical resonator cavity, constitute the measuring optical resonator cavity.Then with the irradiation laser bundle by use angle and focus on optical element surface exploring laser light bundle to be measured position, change irradiation laser beam energy density or exposure time or irradiance pulse number of times.Write down the optical cavity ring-down signal of measuring optical resonator cavity output simultaneously, simulate the ring-down time τ (n) that different irradiation laser beam energy density or exposure time or total irradiance pulse number of times are surveyed laser beam down by the single index attenuation function, wherein n represents irradiation laser beam energy density or exposure time or irradiance pulse number of times.
(3) by τ
0Calculate the reflectivity R (n) of optical element to be measured under different irradiation laser beam energy density or exposure time or the total irradiance pulse number of times, optical element reflectivity real-time change amount Δ R to be measured with τ (n)
n=R
0-R (n), wherein R
0For n=0 is irradiation laser bundle optical element reflectivity to be measured when not opening.
Described initial optical resonator cavity and measuring optical resonator cavity are realized by one of following two kinds of array modes:
(1) two identical plano-concave high reflection mirror concave surface is placed perpendicular to optical axis relatively and is formed stable initial optical resonator cavity, the exploring laser light bundle enters the initial optical resonator cavity from first plano-concave high reflection mirror center along optical axis, impinges perpendicularly on second plano-concave high reflection mirror; Keep first plano-concave high reflection mirror position motionless, between two plano-concave high reflection mirrors, add optical element to be measured, the exploring laser light bundle incides optical element to be measured after seeing through first plano-concave high reflection mirror, incident angle is an optical element use angle to be measured, reflected light impinges perpendicularly on second plano-concave high reflection mirror, constitutes the measuring optical resonator cavity;
(2) constitute stable initial optical resonator cavity by two identical plano-concave high reflection mirrors and a plane high reflection mirror, the plane high reflection mirror is incident chamber mirror and favours the optical axis placement, the exploring laser light bundle impinges perpendicularly on first plano-concave high reflection mirror placing perpendicular to optical axis after along optical axis from this plane high reflection mirror transmission, the exploring laser light bundle is back to the plane high reflection mirror by first plano-concave high reflection mirror reflection back by former road, again by plane high reflection mirror secondary reflection again, reflected light impinges perpendicularly on second plano-concave dual wavelength high reflection mirror then; Between second plano-concave high reflection mirror of initial optical resonator cavity and plane high reflection mirror, insert optical element to be measured, after the exploring laser light bundle sees through the plane high reflection mirror, successively through behind first plano-concave high reflection mirror and the plane high reflection mirror, incide optical element to be measured, incident angle is for treating photometry unit use angle, from treating that photometry unit reflected probe laser beam impinges perpendicularly on second plano-concave high reflection mirror, constitutes the measuring optical resonator cavity.
Two plano-concave high reflection mirrors, plane high reflection mirror and the optical element to be measured of described composition optical resonator at exploring laser light bundle output wave strong point reflectivity all greater than 98%.
Described optical resonator is stable cavity or confocal resonator, and the long L in optical resonator chamber satisfies 0＜L＜2r, and wherein r is the radius-of-curvature of plano-concave high reflection mirror concave surface.
Described exploring laser light bundle can be continuous light beam or pulsed light beam.
Described irradiation laser bundle can be continuous light beam or pulsed light beam.
Described optical element to be measured can place on the two-dimension displacement platform, can realize the two-dimensional imaging test of optical element reflectance varies to be measured by mobile two-dimension displacement platform.
Described optical element reflectivity to be measured calculates formula: R (n)=exp (L
0/ c τ
0-L
1/ c τ (n)), L wherein
0For initial optical resonator cavity chamber long, L
1Long for measuring optical resonator cavity chamber, c is the light velocity.
The present invention compared with prior art has following advantage: the invention provides a kind of high reflective optical devices real-time method of reflectivity under laser irradiation of monitoring, the situation of change that this method can the high catoptrics film of on-line real time monitoring reflectivity under high power laser light irradiation.Be applicable to the monitoring of the high catoptrics film of each wave band reflectivity real-time change under laser irradiation, and measurement result is not subjected to the influence of exploring laser light beam power fluctuation, total system is simple in structure.This method has fast simultaneously, accurately, and high sensitivity, advantages such as real-time online detection.
Description of drawings
Fig. 1 is the measurement mechanism synoptic diagram based on " Z " type measuring optical resonator cavity of the present invention;
Fig. 2 is the initial optical resonator cavity measurement mechanism synoptic diagram of " V " type corresponding with " Z " type measuring optical resonator cavity of the present invention;
Fig. 3 is the measurement mechanism synoptic diagram based on folded form measuring optical resonator cavity of the present invention;
Fig. 4 is the straight type initial optical resonator cavity measurement mechanism synoptic diagram corresponding with folded form measuring optical resonator cavity of the present invention;
Fig. 5 is the synoptic diagram of optical element to be measured of the present invention reflectivity real-time change under high power laser light irradiation.
Embodiment
Below in conjunction with accompanying drawing 1 described system description a kind of measuring method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation of the present invention.Among Fig. 1: 1 is the exploring laser light light source, 2 and 21 is visible secondary light source, 3 and 22 is catoptron, 4 and 23 is the twin-beam spectroscope, 5 and 6 is the plano-concave high reflection mirror, 7 is the plane high reflection mirror, 8 is condenser lens, 9 is optical element to be measured, 10 is photodetector, 11 is data collecting card, 12 is computing machine, 13 is high power irradiation laser light source, 14 is variable attenuator, 15 is the beam shaping unit, 16 is focusing system, 17 and 18 is spectroscope, 19 is the light beam diagnosis unit, 20 is laser energy/power meter, wherein plano-concave high reflection mirror 6 is the output cavity mirror, described plano-concave high reflection mirror 5 and 6 is concave surface and is coated with high catoptrics film, thick line is a light path among the figure, and fine rule is a connecting line.
Exploring laser light light source 1 is selected pulsed laser or continuous semiconductor laser instrument for use, when selecting the continuous semiconductor laser instrument for use, adopts square-wave frequency modulation output." Z " type measuring optical resonator cavity by plane high reflection mirror 7, plano-concave high reflection mirror 5 and 6 and optical element to be measured 9 form, they at the reflectivity of exploring laser light light source 1 output wave strong point all greater than 98%, " Z " type optical resonator long L in chamber
1Satisfy 0＜L
1＜2r, wherein r is the radius-of-curvature of plano-concave high reflection mirror 5 and 6 concave surfaces, and plane high reflection mirror 7 is for incident chamber mirror and favour the optical axis placement, and plano-concave high reflection mirror 6 is the output cavity mirror.Exploring laser light light source 1 output exploring laser light bundle impinges perpendicularly on the plano-concave high reflection mirror of placing perpendicular to optical axis 6 after 7 transmissions of plane high reflection mirror, the exploring laser light bundle is back to plane high reflection mirror 7 by plano-concave high reflection mirror 6 reflection backs by former road, then again by plane high reflection mirror 7 secondary reflection again, reflected light incides optical element 9 to be measured, and the reflected light of optical element 9 to be measured impinges perpendicularly on plano-concave high reflection mirror 5.From the output cavity mirror is that the exploring laser light bundle that plano-concave high reflection mirror 6 is exported focuses on photodetector 10 by condenser lens 8, the optical cavity ring-down signal of photodetector 10 probing test optical resonators output, the electric signal of photodetector 10 outputs is stored and is handled by data collecting card 11 records and output computing machine 12.
Fig. 2 has provided " V " type initial optical resonator cavity corresponding with " Z " type measuring optical resonator cavity, by plano-concave high reflection mirror 5 and 6 and plane high reflection mirror 7 form, they at the reflectivity of exploring laser light light source 1 output wave strong point all greater than 98%, " V " type initial optical resonator cavity long L in chamber
0Satisfy 0＜L
0＜2r, wherein r is the radius-of-curvature of plano-concave high reflection mirror 5 and 6 concave surfaces.Exploring laser light light source 1 output exploring laser light bundle sees through the plano-concave high reflection mirror of placing perpendicular to optical axis 5, and transmitted light incides plane high reflection mirror 7, and by 7 reflections of plane high reflection mirror, reflected light impinges perpendicularly on plano-concave high reflection mirror 6.From the output cavity mirror is that the exploring laser light bundle that plano-concave high reflection mirror 6 is exported focuses on photodetector 10 by condenser lens 8, and photodetector 10 is surveyed the optical cavity ring-down signal of optical resonators output.
High power irradiation laser light source 13 output beams are regulated by variable attenuator 14, regulate after 15 shapings of beam shaping unit, focus on optical element to be measured 9 surfaces by focusing system 16, irradiation laser bundle and exploring laser light bundle overlap at optical element 9 lip-deep facula positions to be measured. Spectroscope 17 and 18 has high permeability (T＞95%) in high power irradiation laser light source 13 output light-wave strong points, and spectroscope 17 and 18 arrives the 13 output light beam splitting of fraction high power irradiation laser light source and laser energy/power meter 20 respectively.High power irradiation laser light source 13 can be continuous laser or pulse laser, calculate irradiation laser energy or energy density or the power density that focuses on optical element to be measured 9 surfaces by laser energy/power meter 20 and light beam diagnosis unit 19, can obtain exposure time and total irradiance pulse number of times of high power irradiation laser light source 13 by computing machine 12.
When exploring laser light light source beam 1 is the continuous semiconductor laser instrument of square-wave frequency modulation, when being turn-offed fast, incident exploring laser light bundle, forms an optical cavity ring-down signal in initial (test) optical resonator output signal at the modulated square wave negative edge; When exploring laser light light source 1 was pulsed laser, each pulse of inciding initial (test) optical resonator all can form an optical cavity ring-down signal in initial (test) optical resonator output signal.As seen secondary light source 2 and 21, catoptron 3 and 22 and twin- beam spectroscope 4 and 23 be used for when exploring laser light light source 1 and high power irradiation laser light source 13 during for invisible light auxiliary optical path regulate.When if exploring laser light light source 1 and high power irradiation laser light source 13 are visible light, then do not need visible secondary light source 2 and 21, catoptron 3 and 22 and twin- beam spectroscope 4 and 23.
Specific implementation process is as follows:
At first, under " V " initial optical resonator cavity situation, the initial optical resonator cavity output optical cavity ring-down signal that photodetector 10 is surveyed is pressed single index attenuation function: I (t)=C
1Exp (t/ τ
0)+C
2(C
1, C
2Be constant coefficient) simulate under " V " type initial optical resonator cavity situation the ring-down time τ that surveys laser beam
0
Then, in " V " type initial optical resonator cavity, insert optical element 9 to be measured, constitute " Z " type measuring optical resonator cavity.Open high power irradiation laser light source 13, change energy density or exposure time or total irradiance pulse number of times of high power irradiation laser light source 13, meanwhile, the measuring optical resonator cavity output optical cavity ring-down signal that photodetector 10 is surveyed is pressed single index attenuation function: I (t)=C
3Exp (t/ τ (n))+C
4(C
3, C
4Be constant coefficient) simulate the ring-down time τ (n) that surveys laser beam under " Z " type measuring optical resonator cavity situation, wherein n is irradiation laser beam energy density or exposure time or irradiance pulse number of times.
According to formula: R (n)=exp (L
0/ c τ
0-L
1/ c τ (n)) calculates the reflectivity of optical element to be measured under different irradiation laser beam energy density or exposure time or total irradiance pulse number of times, wherein L
0For initial optical resonator cavity chamber long, L
1Long for measuring optical resonator cavity chamber, c is the light velocity.Optical element 9 reflectivity real-time change amount Δ R to be measured
n=R
0-R (n), wherein R
0For n=0 is the reflectivity of high power irradiation laser light source 13 optical element 9 to be measured when not opening.
Fig. 3 has provided the structural representation of folded form measuring optical resonator cavity.Folded form measuring optical resonator cavity by plano-concave high reflection mirror 5 and 6 and optical element to be measured 9 form, they at the reflectivity of exploring laser light light source 1 output wave strong point all greater than 98%, the folded form measuring optical resonator cavity long L in chamber
1Satisfy 0＜L
1＜2r, wherein r is the radius-of-curvature of plano-concave high reflection mirror 5 and 6 concave surfaces.Exploring laser light light source 1 output exploring laser light bundle sees through the plano-concave high reflection mirror of placing perpendicular to optical axis 5, and transmitted light incides optical element 9 to be measured, and by optical element 9 reflections to be measured, reflected light impinges perpendicularly on plano-concave high reflection mirror 6.From the output cavity mirror is that the exploring laser light bundle that plano-concave high reflection mirror 6 is exported focuses on photodetector 10 by condenser lens 8, the optical cavity ring-down signal of photodetector 10 probing test optical resonators output.High power irradiation laser light source 13 output beams are regulated by variable attenuator 14, regulate after 15 shapings of beam shaping unit, focus on optical element to be measured 9 surfaces by focusing system 16, irradiation laser bundle and exploring laser light bundle overlap at optical element 9 lip-deep facula positions to be measured.
Provided the straight type initial optical resonator cavity corresponding with folded form measuring optical resonator cavity among Fig. 4, be made up of plano-concave high reflection mirror 5 and 6, concave surface is placed perpendicular to optical axis relatively.Plano-concave high reflection mirror 5 and 6 at the reflectivity of exploring laser light light source 1 output wave strong point all greater than 98%, the long L in initial optical resonator cavity chamber
0Satisfy 0＜L
0＜2r, wherein r is the radius-of-curvature of plano-concave high reflection mirror 5 and 6 concave surfaces.Exploring laser light light source 1 output exploring laser light bundle sees through the plano-concave high reflection mirror of placing perpendicular to optical axis 5, and transmitted light impinges perpendicularly on plano-concave high reflection mirror 6.From the output cavity mirror is that the exploring laser light bundle that plano-concave high reflection mirror 6 is exported focuses on photodetector 10 by condenser lens 8, and photodetector 10 is surveyed the optical cavity ring-down signal of optical resonators output.
Fig. 5 has provided the synoptic diagram of optical element 9 to be measured reflectivity real-time change under high power irradiation laser light source 13 irradiation.When n less than n
1The time (n represents irradiation laser beam energy density or exposure time or irradiance pulse number of times), obvious variation does not take place in the reflectivity of optical element 9 to be measured; When n greater than n
1The time, along with the increase of n, the reflectivity of optical element 9 to be measured descends gradually.N among Fig. 5
2Represent optical element 9 to be measured to show the loss threshold value of optical thin film, when n reaches n
2The time, optical element 9 to be measured shows that optical thin film is damaged.
In the above-mentioned various test structure, all optical element 9 to be measured can be placed on the two-dimension displacement platform, realize the scanning survey of optical element 9 surperficial multiple spot reflectivity to be measured.
In a word, the present invention proposes a kind of measuring method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation, can measure all kinds of high catoptrics film reflectivity real-time change situation under laser irradiation from the ultraviolet to the mid and far infrared.The total system of this implementation method is simple in structure, and this method has fast simultaneously, and is accurately highly sensitive, advantages such as real-time online detection.
Claims (6)
1. the method for monitoring high reflective optical devices reflectivity real-time change under laser irradiation is characterized in that performing step is as follows:
(1) by forming an initial optical resonator cavity with the high reflection mirror of wave band with optical element to be measured, the exploring laser light bundle is incided the initial optical resonator cavity, write down the optical cavity ring-down signal of initial optical resonator cavity output, simulate the ring-down time τ of exploring laser light bundle by the single index attenuation function
0Described initial optical resonator cavity has two kinds of implementations, a kind of placement perpendicular to optical axis relatively by two identical plano-concave high reflection mirror concave surfaces formed straight type initial optical resonator cavity, the exploring laser light bundle enters along optical axis from first plano-concave high reflection mirror center, impinges perpendicularly on second plano-concave high reflection mirror; Another kind is to constitute " V " type initial optical resonator cavity by two identical plano-concave high reflection mirrors and a plane high reflection mirror, the plane high reflection mirror is incident chamber mirror and favours the optical axis placement, the exploring laser light bundle impinges perpendicularly on first plano-concave high reflection mirror placing perpendicular to optical axis after along optical axis from this plane high reflection mirror transmission, the exploring laser light bundle is back to the plane high reflection mirror by first plano-concave high reflection mirror reflection back by former road, again by plane high reflection mirror secondary reflection again, reflected light impinges perpendicularly on second plano-concave dual wavelength high reflection mirror then;
(2) optical element to be measured is inserted the initial optical resonator cavity, constitute the measuring optical resonator cavity, then with the irradiation laser bundle by use angle and focus on optical element surface exploring laser light bundle to be measured position, change irradiation laser beam energy density or exposure time or irradiance pulse number of times, write down the optical cavity ring-down signal of measuring optical resonator cavity output simultaneously, simulate the ring-down time τ (n) that different irradiation laser beam energy density or exposure time or total irradiance pulse number of times are surveyed laser beam down by the single index attenuation function, wherein n represents irradiation laser beam energy density or exposure time or irradiance pulse number of times; Described measuring optical resonator cavity has two kinds of implementations, first kind is corresponding with the straight type initial optical resonator cavity in the step (1), keep first plano-concave high reflection mirror position motionless, between two plano-concave high reflection mirrors, add optical element to be measured, the exploring laser light bundle incides optical element to be measured after seeing through first plano-concave high reflection mirror, incident angle is an optical element use angle to be measured, and reflected light impinges perpendicularly on second plano-concave high reflection mirror, constitutes folded form measuring optical resonator cavity; Second kind is corresponding with " V " type initial optical resonator cavity in the step (1), between second plano-concave high reflection mirror and plane high reflection mirror, insert optical element to be measured, after the exploring laser light bundle sees through the plane high reflection mirror, successively through behind first plano-concave high reflection mirror and the plane high reflection mirror, incide optical element to be measured, incident angle is for treating photometry unit use angle, from treating that photometry unit reflected probe laser beam impinges perpendicularly on second plano-concave high reflection mirror, constitutes " Z " type measuring optical resonator cavity;
(3) by τ
0Calculate the reflectivity R (n) of optical element to be measured under different irradiation laser beam energy density or exposure time or the total irradiance pulse number of times, optical element reflectivity real-time change amount Δ R to be measured with τ (n)
n=R
0-R (n), wherein R
0For n=0 is irradiation laser bundle optical element reflectivity to be measured when not opening, the reflectivity of described optical element to be measured calculates formula and is: R (n)=exp (L
0/ c τ
0-L
1/ c τ (n)), L wherein
0For initial optical resonator cavity chamber long, L
1Long for measuring optical resonator cavity chamber, c is the light velocity.
2. a kind of method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation according to claim 1 is characterized in that: described two plano-concave high reflection mirrors, plane high reflection mirror and optical element to be measured at exploring laser light bundle output wave strong point reflectivity all greater than 98%.
3. a kind of method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation according to claim 1, it is characterized in that: described optical resonator is stable cavity or confocal resonator, the long L in optical resonator chamber satisfies 0＜L＜2r, and wherein r is the radius-of-curvature of plano-concave high reflection mirror concave surface.
4. a kind of method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation according to claim 1 is characterized in that: described exploring laser light bundle can be continuous light beam or pulsed light beam.
5. a kind of method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation according to claim 1 is characterized in that: described irradiation laser bundle can be continuous light beam or pulsed light beam.
6. a kind of method of monitoring high reflective optical devices reflectivity real-time change under laser irradiation according to claim 1, it is characterized in that: described optical element to be measured can place on the two-dimension displacement platform, can realize the two-dimensional imaging test of optical element reflectance varies to be measured by mobile two-dimension displacement platform.
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| CN108267661B (en) * | 2018-03-30 | 2023-08-25 | 华中科技大学 | Photovoltaic property measuring equipment, measuring method and imaging system of photoelectric device |
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| CN110231610B (en) * | 2019-05-24 | 2022-12-02 | 武汉大学 | Detection calibration platform and method for active light spot energy detector of satellite-borne laser altimeter |
| CN110411718A (en) * | 2019-08-05 | 2019-11-05 | 中国科学院光电技术研究所 | High reflection element reflectivity and absorption method for real-time measurement under CW Laser |
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