CN102243436A - Electric-field-induced micro-compounding method under geometrical restraint - Google Patents
Electric-field-induced micro-compounding method under geometrical restraint Download PDFInfo
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- CN102243436A CN102243436A CN 201110150644 CN201110150644A CN102243436A CN 102243436 A CN102243436 A CN 102243436A CN 201110150644 CN201110150644 CN 201110150644 CN 201110150644 A CN201110150644 A CN 201110150644A CN 102243436 A CN102243436 A CN 102243436A
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Abstract
The invention discloses an electric-field-induced micro-compounding method under a geometrical restraint, comprising the following steps of: preparing a template with a certain pattern structure and performing a corresponding surface treatment, introducing a proper electric field between the template and a base material coated with a light-curing adhesive, causing the light-curing adhesive to finish a micro-compounding process under the function of the electric field force, then exposing and curing by an ultraviolet ray, and performing a post-treatment by means of dry-process oxygen etching, thereby preparing a micro-nano structure complementary with the pattern structure of the template. The method of the invention can be widely applied to the processing of various micro-nano apparatuses, for example, chip lab, high-capacitance decoupling type capacitor, solar cell, flat-plate displayers (OLED, SED, LCD) etc. The pattern structure prepared by such micro-compounding technique is identical with that of the template, and the characteristic structure size is from micron-grade to nanometre-grade.
Description
Technical field
The invention belongs to technical field of micro-nano manufacture, relate to a kind of electric field and induce little replication method, especially a kind ofly induce in the optic-solidified adhesive rheology process,, realize micron order or little replication method of nanoscale structures by the rheological behaviour of how much restriction optic-solidified adhesives at electric field.
Background technology
Traditional optical projection lithography technology utilization light wave sees through mask plate and carries out the selectivity exposure, thus the figure transfer on the template to the substrate that is coated with optic-solidified adhesive in advance, the immersion by developer solution again, and then obtain needed figure.Photoetching process is the core process in the VLSI (very large scale integrated circuit), and therefore the technical field of micro-nano manufacture in present stage has obtained the most ripe development.But, along with constantly reducing of characteristic dimension, existing optical projection lithography technology has almost reached its diffraction limit, and it is all very expensive to research and develop technology and fund cost that corresponding lithographic equipment pays, thus the people in the industry one after another with diversion on photoetching technique of future generation.
The people such as Chou of people such as the Schaffer of Germany Konstanz university and Princeton university use the high viscosity thermoplastic not have the research of constrained electric field inductive technology.They have proposed under high-temperature condition, and polymkeric substance is in fluid state, by powering up the stretching action of realizing polymkeric substance of inducing between template and polymkeric substance, thereby realize little replica of microtexture.This method equipment is simple, easy and simple to handle, but exists very important defective equally.The first, in the graphics field, carry out replica, may occur merging excessively or the fusion deficiency, produce defective by fusion; In case second polymkeric substance touches template, free polymkeric substance can be climbed up the sidewall of template graphics structure under the effect of capillary force, influences the accuracy of replica; Three, there is certain technical difficulty in operation under the hot environment, and incompatible with existing semiconductor processing technology.
Summary of the invention
The objective of the invention is to induce the structure of rheological molding existence inhomogeneous at existing electricity, defective appears easily, the shortcoming that working temperature is high, provide the electric field under a kind of geometrical constraint to induce little replication method, this method selects for use the UV optic-solidified adhesive as resistance erosion glue, adopt the electric field under the geometrical constraint to induce little replica, on the UV optic-solidified adhesive, process the micro-nano structure of high precision, low defective under the normal temperature.
The objective of the invention is to solve by the following technical programs:
Electric field under this geometrical constraint is induced little replication method, may further comprise the steps:
1) preparation of template and processing
Preparation has the template of graphic structure, and carries out surface treatment;
2) selection of base material and even glue
Adopt highly doped silicon chip as base material, utilize sol evenning machine at its surperficial spin coating UV optic-solidified adhesive, the thickness of UV optic-solidified adhesive is that nanoscale is to micron order;
3) template that will handle is pressed on the UV optic-solidified adhesive
The mould of handling is pressed on the UV optic-solidified adhesive, as long as guarantee that template contacts with the UV optic-solidified adhesive;
4) external dc power supply
Adopt direct supply, connect the positive pole of power supply as the ITO conductive layer of template, mix silicon as the height of base material and connect power cathode, the regulation voltage size makes the suffered electric field force of UV optic-solidified adhesive be enough to overcome surface tension, drives the rheological behaviour of optic-solidified adhesive;
5) electricity under the geometrical constraint is induced replica
The UV optic-solidified adhesive was kept under stable voltage 0.25 hour to 4 hours, finish until replidcation process;
6) curing of UV optic-solidified adhesive
Under the constant situation of sustaining voltage, utilize ultraviolet light to finish the liquid UV optic-solidified adhesive of replica, solidify the micro-nano structure that electricity is induced the replica gained by the transparent template irradiation;
7) demoulding aftertreatment
Utilize oxygen to carry out dry etching, remove the UV optic-solidified adhesive of non-graph area remnants.
Further, the preparation of step 1) template and disposal route are: at electrical-conductive nanometer indium tin metal compound glass surface deposition last layer silicon dioxide, on silicon dioxide layer, process needed graphic structure then with photoetching process, obtain required template, or adopt photoetching process at first on electrical-conductive nanometer indium tin metal compound glass surface, to process required graphic structure, adopt alignment process deposit SiO2 in position then, obtain required template.
Further, in step 3), the mould that will handle with the pressure of 10Mpa is pressed on the UV optic-solidified adhesive.
Further, in step 4), the voltage-regulation scope is adjustable continuously at 0-300V.
The present invention possesses following beneficial effect:
The micro-nano structure that adopts the electric field under the geometrical constraint of the present invention to induce little replication method to obtain has precision height, characteristics that defective is few, this kind method both can have been avoided the restriction of the diffraction limit of conventional lithography, had greatly improved again and had not had the electric problem that the defective that exists in the rheological molding technology is many, temperature is high of inducing that retrains.Because the present invention does not need expensive lithographic equipment and accuracy control over temperature, so this programme greatly reduces processing cost, improved working (machining) efficiency.The technical program can be applied in microsensor, chip lab, high capacitance decoupling type capacitor, solar cell, panel display aspects such as (OLED, SED, LCD) widely.
Description of drawings
Fig. 1-1 and Fig. 1-2 look synoptic diagram for the master of template;
Fig. 2 is the synoptic diagram that is coated with the base material of UV optic-solidified adhesive;
Fig. 3 is for being pressed in template the synoptic diagram on the UV optic-solidified adhesive;
Fig. 4 induces the auxiliary principle schematic of optic-solidified adhesive internal field in the process for electricity;
Fig. 5 carries out the helper-inducer synoptic diagram for applying electric field;
Fig. 6 solidifies synoptic diagram for UV light;
Fig. 7 sloughs the initial micro-nano structure synoptic diagram that template obtains for optic-solidified adhesive after solidifying;
Fig. 8 handles the synoptic diagram of initial micro-nano structure for adopting dry etching;
The micro-nano structure synoptic diagram of Fig. 9 for obtaining behind the dry etching;
Figure 10 is the elevational schematic view of the micro-nano structure that finally obtains.
Embodiment
Below, will believe that in conjunction with the accompanying drawings the electric field of explanation under the geometrical constraint induce little replica technological process:
As shown in the figure, at ito glass 1 surface deposition last layer silicon dioxide 2, and carry out photoetching, etching and surface-treated technology, shown in accompanying drawing 1-1, or on ito glass, carry out photoetching, technologies such as etching, adopt alignment process deposit SiO2 then, carry out process of surface treatment at last, shown in Fig. 1-2, mix the technology of spin coating UV optic-solidified adhesive 4 on the silicon substrate 5 at height, as shown in Figure 2, the template for preparing is pressed in technology on the UV optic-solidified adhesive 4 with the pressure of 10MPa, as shown in Figure 3, connect the electric field that direct supply 6 carries out under the geometrical constraint between the silicon substrate and induce little replica technology in template and high mixing, as shown in Figure 5, under the situation of sustaining voltage, the technology that is cured by ultraviolet light 8, as shown in Figure 6, Fig. 7 is a synoptic diagram of sloughing the initial micro-nano structure that obtains after the template, remove the technology 9 of staying film to sloughing template initial micro-nano structure afterwards, as shown in Figure 8, Fig. 9 stays the master of the final micro-nano structure that obtains behind the film to look synoptic diagram for removing, the micro-nano structure elevational schematic view of Figure 10 for finally making.
Said method, the micro-nano structure that can realize is of a size of: the portion size w1 of mould projection is that nanoscale is to micron order, mould sunk part size w2 is that nanoscale is to micron order, the UV optic-solidified adhesive size h1 that height is mixed spin coating on the silicon substrate is that nanoscale is to micron order, the initial micro-nano structure bossing size w3 that obtains is that nanoscale is to micron order, initial micro-nano structure sunk part size w4 is that nanoscale is to micron order, the final micro-nano structure height h4 that obtains be nanoscale to micron order, final micro-nano structure width w3 is that nanoscale is to micron order.
The present invention has broken away from the restriction of diffraction limit in the conventional photoetching process, also solve no constrained electric field and induced the high temperature in the rheological molding, the problem that defective is many, compare the two, the present invention has added geometrical constraint in electric field is induced the process of moulding, adopt UV to solidify glue simultaneously, both limited the mobile arbitrariness of optic-solidified adhesive, make it more to meet desired direction, can obtain more accurate, more uniform micro-nano structure, also realized the normal temperatureization of technology, make its can with other ripe semiconductor technology compatibilities, lowered operation easier.
Electric field under this employing geometrical constraint induces the specific implementation process of little replica technology to be:
1) preparation of template and processing: template adopts electrical-conductive nanometer indium tin metal oxide (ITO) glass 1 as the base material of making template, deposits one deck SiO thereon
2, and on this layer, adopt the method for conventional lithography to process graphic structure, then with residual SiO
2Etching is removed, thereby obtains final SiO
2 Graphic structure 3, or on ITO layer 2, adopt conventional lithography process to process graphic structure, adopt alignment process deposit one deck SiO then
2, at last the template that makes is carried out surface treatment, reduce surface energy, the micro-nano structure of damage replica gained when preventing the demoulding.The target of template preparation obtains sunk part 2 exactly and is conductive layer, and bossing 3 is the structure of insulation course;
2) selection of base material and even glue: select high doped silicon slice 5 as base material, with sol evenning machine spin coating UV optic-solidified adhesive 4 thereon, the thickness h 1 of UV optic-solidified adhesive for nanoscale to micron order.
3) template that will handle is pressed on the UV optic-solidified adhesive.The template that to handle with the pressure P of 10MP is pressed on the UV optic-solidified adhesive 4, can just contact to guarantee both.
4) external dc power supply: adopt laboratory direct supply 6 (voltage 0-300V is adjustable continuously), the electrical-conductive nanometer indium tin metal oxide ito glass layer 2 on the template connects the positive pole of direct supply, connects the negative pole of power supply as the high doped silicon slice 5 of base material.Regulate the size of direct supply 6, make electric field force increase to the surface tension that can overcome the UV optic-solidified adhesive, thereby drive the rheology of UV optic-solidified adhesive 4.
5) electric field that carries out under the geometrical constraint is induced little replica: the UV optic-solidified adhesive was kept under stable voltage 0.25 hour to 4 hours, finish until replidcation process.As shown in Figure 4, the UV optic-solidified adhesive that is between two bulge-structures 3 is subjected to an electric field force Pe who makes progress, electric field force Pe can make herein UV optic-solidified adhesive overcome surface tension and atmospheric pressure upwards flows, after the UV optic-solidified adhesive upwards begins to flow, because the contact angle of UV optic-solidified adhesive and template is less than 90 degree, so the power that this moment, surface tension upwards flowed as optic-solidified adhesive jointly with electric field force has finally formed the graphic structure 7. with the template complementation in little replidcation process
6) curing of UV optic-solidified adhesive: under the prerequisite that keeps burning voltage, adopt commercial UV curing apparatus to produce ultraviolet ray 8, the liquid UV that utilizes ultraviolet light to finish replica by the transparent template irradiation solidifies optic-solidified adhesive, solidify electricity and induce the micro-nano structure of replica gained, slough template, can obtain preliminary micro-nano structure 7.
7) demoulding aftertreatment: adopt the method for dry etching to handle preliminary micro-nano structure 7, get rid of residual UV optic-solidified adhesive, thereby obtain final micro-nano structure 10.
Electric field under the geometrical constraint is induced little replica, is to make liquid UV solidify optic-solidified adhesive to produce the rheology in directed fixed zone under electric field driven in geometrical constraint, thereby the pattern on the template is transferred on the UV optic-solidified adhesive.This replidcation process has made full use of himself rheological characteristics and geometrical constraint of UV optic-solidified adhesive, reduced greatly not have how much constraints down electric field induce the chance that various defectives may occur.This kind method has simple, and the characteristics that cost is low only need a suitable external electric field, can realize the autonomous flowing forming of UV optic-solidified adhesive, obtain needed replica structure.
Basic functional principle of the present invention: apply certain pressure, template contact optic-solidified adhesive is got final product, the UV optic-solidified adhesive has flowability before solidifying, apply suitable electric field, under the geometric condition constraint, electric field that makes progress of UV optic-solidified adhesive in the constraint, generally speaking, original state, electric field force need overcome the surface tension of liquid film, in case yet optic-solidified adhesive flows in the template depression, owing to template is wetting for the UV optic-solidified adhesive, therefore, the atmospheric pressure that surface tension and electric field force acting in conjunction overcome the residual gas in the template depression produces the acting force that upwards draws high to the UV optic-solidified adhesive, after keeping a period of time, treat that the UV optic-solidified adhesive finishes replica, adopt ultraviolet to make its curing it, optic-solidified adhesive just no longer has flowability, slough template at last, remove the film that stays of non-graph area carrying out the oxygen dry etching, can obtain needed micro-nano structure.The micro-nano structure that obtains in this way is littler than the micro-nano structure size that conventional lithography process obtains, defective still less, working (machining) efficiency is higher.Simultaneously, because the existence of geometrical constraint has limited the mobile arbitrariness that unconfined condition solidifies glue down, the micro-nano structure that obtains is more even, and degree of accuracy is higher.
In sum, the present invention has overcome the problem of the diffraction limit that exists in the conventional lithography process, has also overcome simultaneously no constrained electric field and has occurred defective, deficiency that working temperature is high in inducing easily.The present invention adopts the electric field under the geometrical constraint to induce, and makes the stressed rheology of optic-solidified adhesive in the constraint, obtains more accurate microtexture.
Claims (4)
1. the electric field under the geometrical constraint is induced little replication method, it is characterized in that, may further comprise the steps:
1) preparation of template and processing
Preparation has the template of graphic structure, and carries out surface treatment;
2) selection of base material and even glue
Adopt silicon chip as base material, utilize sol evenning machine at its surperficial spin coating UV optic-solidified adhesive, the thickness of UV optic-solidified adhesive is that nanoscale is to micron order;
3) template that will handle is pressed on the UV optic-solidified adhesive
The mould of handling is pressed on the UV optic-solidified adhesive, as long as guarantee that template contacts with the UV optic-solidified adhesive;
4) external dc power supply
Adopt direct supply, connect the positive pole of power supply as the ITO conductive layer of template, mix silicon as the height of base material and connect power cathode, the regulation voltage size makes the suffered electric field force of UV optic-solidified adhesive be enough to overcome surface tension, drives the rheological behaviour of optic-solidified adhesive;
5) electricity under the geometrical constraint is induced replica
The UV optic-solidified adhesive was kept under stable voltage 0.25 hour to 4 hours, finish until replidcation process;
6) curing of UV optic-solidified adhesive
Under the constant situation of sustaining voltage, utilize ultraviolet light to finish the liquid UV optic-solidified adhesive of replica, solidify the micro-nano structure that electricity is induced the replica gained by the transparent template irradiation;
7) demoulding aftertreatment
Utilize oxygen to carry out dry etching, remove the UV optic-solidified adhesive of non-graph area remnants.
2. the electric field under the geometrical constraint according to claim 1 is induced little replication method, it is characterized in that, preparation and disposal route in the step 1) template are: at electrical-conductive nanometer indium tin metal compound glass surface deposition last layer silicon dioxide, on silicon dioxide layer, process needed graphic structure then with photoetching process, obtain required template, or adopt photoetching process at first on electrical-conductive nanometer indium tin metal compound glass surface, to process required graphic structure, adopt alignment process deposit SiO2 in position then, obtain required template.
3. the electric field under the geometrical constraint according to claim 1 is induced little replication method, it is characterized in that, in step 3), the mould that will handle with the pressure of 10Mpa is pressed on the UV optic-solidified adhesive.
4. the electric field under the geometrical constraint according to claim 1 is induced little replication method, it is characterized in that, in step 4), the voltage-regulation scope is adjustable continuously at 0-300V.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103149607A (en) * | 2013-03-01 | 2013-06-12 | 西安交通大学 | Micro-lens array manufacturing method based on template electric induction forming |
| CN103159164A (en) * | 2013-03-01 | 2013-06-19 | 西安交通大学 | Electric-field-induced impressing method for high-depth-to-width-ratio microcolumn array |
| CN104844015A (en) * | 2015-04-27 | 2015-08-19 | 欧阳宣 | Manufacturing process for glass with micro-nano structure |
| CN108351596A (en) * | 2015-08-10 | 2018-07-31 | 科磊股份有限公司 | The geometric classfication based on polygon examined for semiconductor mask |
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| EP1251974B1 (en) * | 1999-12-23 | 2005-05-04 | University of Massachusetts | Methods for forming submicron patterns on films |
| CN1678443A (en) * | 2002-05-24 | 2005-10-05 | 斯蒂文·Y·周 | Methods and apparatus of field-induced pressure imprint lithography |
| US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
| CN101446762A (en) * | 2008-12-31 | 2009-06-03 | 西安交通大学 | Micro-complex type method for inducing electric field under the restrict of non-contact moulding board |
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2011
- 2011-06-07 CN CN 201110150644 patent/CN102243436B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1251974B1 (en) * | 1999-12-23 | 2005-05-04 | University of Massachusetts | Methods for forming submicron patterns on films |
| US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
| CN1678443A (en) * | 2002-05-24 | 2005-10-05 | 斯蒂文·Y·周 | Methods and apparatus of field-induced pressure imprint lithography |
| CN101446762A (en) * | 2008-12-31 | 2009-06-03 | 西安交通大学 | Micro-complex type method for inducing electric field under the restrict of non-contact moulding board |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103149607A (en) * | 2013-03-01 | 2013-06-12 | 西安交通大学 | Micro-lens array manufacturing method based on template electric induction forming |
| CN103159164A (en) * | 2013-03-01 | 2013-06-19 | 西安交通大学 | Electric-field-induced impressing method for high-depth-to-width-ratio microcolumn array |
| CN103159164B (en) * | 2013-03-01 | 2015-08-05 | 西安交通大学 | A kind of electric field induce method for stamping of high-depth-to-width-microcolumn microcolumn array |
| CN103149607B (en) * | 2013-03-01 | 2015-08-05 | 西安交通大学 | A kind of fabricating method of microlens array be shaped based on template electric induction |
| CN104844015A (en) * | 2015-04-27 | 2015-08-19 | 欧阳宣 | Manufacturing process for glass with micro-nano structure |
| CN108351596A (en) * | 2015-08-10 | 2018-07-31 | 科磊股份有限公司 | The geometric classfication based on polygon examined for semiconductor mask |
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