CN102109766B - Decoupling mechanism and exposure machine using same - Google Patents
Decoupling mechanism and exposure machine using same Download PDFInfo
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- CN102109766B CN102109766B CN 200910200946 CN200910200946A CN102109766B CN 102109766 B CN102109766 B CN 102109766B CN 200910200946 CN200910200946 CN 200910200946 CN 200910200946 A CN200910200946 A CN 200910200946A CN 102109766 B CN102109766 B CN 102109766B
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Abstract
The invention discloses a decoupling mechanism which realizes Rz-direction rotation decoupling of a macro motion platform and a micro motion platform. Through the decoupling mechanism, the macro motion platform and the micro motion platform are connected in a floating way. Through the decoupling mechanism, the macro motion platform is connected with the micro motion platform through a floating bearing, so that the complete decoupling of micro motion and micro motion in Rz-direction freedom degrees is realized.
Description
Technical field
The present invention relates to Rz to decoupling mechanism, relate to the decoupling mechanism that is used for lithographic equipment by it.
Background technology
In the bilateral driving work stage of H type system, because early stage micropositioner is not high to coarse motion platform plane motion rate request, the reacting force that its XY coarse motion motion is produced is introduced on the complete machine inner frame, and its negative effect is remedied by active vibration isolation system.But along with current XY coarse motion rate request to micropositioner is increasingly high; So introduced balance mass piece technology; Reacting force during in order to real-time counteracting micropositioner plane coarse motion high-speed motion; But because counterbalance weight is free plane motion, additional the rotatablely moving that it produces will cause the upper strata moving component to follow deflection.Because micropositioner and coarse motion platform, and the Rz direction is rigidly connected or weak coupling is connected on the plane between coarse motion platform and the balance mass, and the rotation of counterbalance weight can cause micropositioner to rotate the overshoot limit.
U.S. Pat 6635887 discloses a kind of technology that flexibly connects.This flexible block connects linear electric motors and guide rail thereof, and crossbeam and two linear electric motors are rigidly connected.The torsional deformation that this structure absorbs between Rz direction coarse motion platform and the balance mass through the mechanically deform that relies on flexible block can; Thereby alleviate the coarse motion rail-sides is out of shape to pneumatically supported compressing; Make complete machine possess dynamics preferably, and reach Rz to precise Positioning Control.The key protection point of this patent will carry out Rz when H type layout rotation and X to stretching.But this structure still is a structure weak coupling form, does not realize the full decoupled of coarse motion and balance mass, and the design technology of Rz structure itself is required and processing, debugs and require difficulty bigger, and the Life Design of Rz structure itself receives strict the restriction.
Chinese patent CN200720071434.6 discloses a kind of flexible connecting device.This flexible block connects linear electric motors and guide rail thereof.The distortion of the different degree of freedom through main flexible block and secondary flexible block realizes that Rz is to mobile decoupling.On flexible block, impact damper has been installed and contact-making switch shields to system.But this flexible block can not be controlled Rz to rotation center.Said exposure desk has adopted crosses location structure installation linear electric motors and guide rail thereof, all is unfavorable for debuging and controlling of exposure desk.
For eliminating above-mentioned deficiency, this patent has provided a kind of structure, and particularly a kind of Rz that is used for the nano-precision exposure desk is to decoupling mechanism.
Summary of the invention
Because the above-mentioned defective of prior art, technical matters to be solved by this invention provides a kind of Rz that eliminates between coarse motion platform and the micropositioner to the decoupling mechanism of coupling.
Be to realize above-mentioned purpose, the invention provides a kind of decoupling mechanism from the Rz of coarse motion platform and micropositioner to the rotation decoupling zero that realize, formation is unsteady between said coarse motion platform and said micropositioner is connected for said decoupling mechanism.
Preferably; Said decoupling mechanism comprises that the wherein said half-cylindrical air supporting module of the half-cylindrical air supporting module that links together, half-cylindrical slide block and lateral plane air supporting module is connected with the wafer-supporting platform of said micropositioner, and said lateral plane air supporting module is connected with the beam guideway of said coarse motion platform.
Preferably; Said decoupling mechanism comprises the floating module of the half-cylindrical magnetic that links together, half-cylindrical slide block and the floating module of lateral plane magnetic; The floating module of wherein said half-cylindrical magnetic is connected with the wafer-supporting platform of said micropositioner, and the floating module of said lateral plane magnetic is connected with the beam guideway of said coarse motion platform.
Decoupling mechanism according to the present invention makes between coarse motion platform and the micropositioner to be that floating bearing connects, thereby realizes that rough micro-moving mechanism is Rz full decoupled to degree of freedom.
Description of drawings
With reference to the description and the accompanying drawing of hereinafter preferred embodiment, can understand the present invention and purpose and advantage best, wherein:
Fig. 1 has described an embodiment of decoupling mechanism of the present invention;
Fig. 2 has described another embodiment of decoupling mechanism of the present invention;
Fig. 3 has described the exposure desk of decoupling mechanism of the present invention;
Fig. 4 has described the floating anti-collision protection device of rotation magnetic of exposure desk;
Fig. 5 has described the rotary magnet anti-collision protection device of exposure desk;
Fig. 6 has described the rotating spring cushion bumper protective device of exposure desk;
Fig. 7 has described the Rz limiting and protecting device of exposure desk;
The left side that Fig. 8 has described the long stroke motion of exposure desk drives and guide piece;
The right side that Fig. 9 has described the long stroke motion of exposure desk drives and guide piece.
Embodiment
Referring to the accompanying drawing of the embodiment of the invention, hereinafter will be described the present invention in more detail.Yet the present invention can realize with many different forms, and should not be construed as the restriction of the embodiment that receives in this proposition.On the contrary, it is abundant and complete open in order to reach proposing these embodiment, and makes the technician in present technique field understand scope of the present invention fully.In the whole part of instructions, identical or similar parts give identical or similar label.
Refer now to Fig. 1 and describe first embodiment to the decoupling mechanism that rotates decoupling zero according to the Rz of realization coarse motion platform of the present invention and micropositioner, it utilizes plane air supporting and cylindricality air-bearing, the Rz of the rough micro-moving mechanism platform that is achieved to decoupling zero.As shown in Figure 1, cylindrical air supporting rotation decoupling mechanism 100 comprises half-cylindrical air supporting module 101a and 101b, half- cylindrical slide block 103a and 103b and lateral plane air supporting module 105a and the 105b that links together.Half-cylindrical air supporting module 101a, 101b is connected with the wafer-supporting platform 102 of micropositioner, and lateral plane air supporting module 105a is connected with the beam guideway 108 of coarse motion platform with 105b.
Particularly, lateral plane air supporting module 105a and 105b make beam guideway 108 and wafer-supporting platform 102 realize vibration air supporting isolation.Half-cylindrical air supporting module 101a, 101b make half- cylindrical slide block 103a and 103b and wafer-supporting platform 102 realize vibration air supporting isolation.When beam guideway 108 at Y to when motion, beam guideway 108 promotes half-cylindrical slide block 103a and 103bY to motion through lateral plane air supporting module 105a and 105b, so through half-cylindrical air supporting module 101a and 101b promotion wafer-supporting platform 102Y to motion.At X to when motion, through half- cylindrical slide block 103a and 103b and lateral plane air supporting module 105a and 105b, can realize fine motion wafer-supporting platform 102 and beam guideway 108 X to decoupling zero.Simultaneously; Because the XY accelerated motion of motion stage; The additional torque that produces cause beam guideway 108 Rz to rotation the time, half- cylindrical slide block 103a and 103b along with rotation, rotate decoupling zero function owing to half-cylindrical air supporting module 101a and 101b possess Rz through lateral plane air supporting module 105a and 105b; Therefore beam guideway 108 Rz to rotation can directly not cause fine motion wafer-supporting platform 102 upwards to rotate at Rz, thereby removed the rotation coupling between wafer-supporting platform 102 and the beam guideway 108.
Refer now to Fig. 2 and describe second embodiment according to decoupling mechanism of the present invention, its utilize plane magnetic floating with the cylindricality magnetic bearing, the Rz of the rough micro-moving mechanism platform that is achieved to decoupling zero.As shown in Figure 2, the floating decoupling mechanism 200 of rotation magnetic comprises the floating module 204a of the half-cylindrical magnetic that links together and 204b, half-cylindrical slide block 201a and 201b and floating module 203a of lateral plane magnetic and 203b.The floating module 204a of half-cylindrical magnetic is connected with the wafer-supporting platform 202 of micropositioner with 204b, and the floating module 203a of lateral plane magnetic is connected with beam guideway 108 with 203b.
Particularly; Floating module 203a of lateral plane magnetic and 203b make beam guideway 108 and 202 floating isolation of realization vibration magnetic of fine motion wafer-supporting platform that floating module 204a of half-cylindrical magnetic and 204b make half- cylindrical slide block 201a and 201b and 202 floating isolation of realization vibration magnetic of fine motion wafer-supporting platform.When beam guideway 108 at Y to when motion, beam guideway 108 promotes half-cylindrical slide block 201a and 201bY to motion through floating module 203a of lateral plane magnetic and 203b, and then floats module 204a and 204b promotion wafer-supporting platform 202Y to motion through half-cylindrical magnetic.At X to when motion, through half-cylindrical slide block 201a and 201b and floating module 203a of lateral plane magnetic and 203b, with realization wafer-supporting platform 202 and beam guideway 108 X to decoupling zero.Simultaneously; Because the XY accelerated motion of motion stage; The additional torque that produces cause beam guideway 108 Rz to rotation the time; Half-cylindrical slide block 201a and 201b, possess Rz and rotate the decoupling zero function because half-cylindrical magnetic floats module 204a and 204b along with rotation through the floating module 203a of lateral plane magnetic and 203b, thus beam guideway 108 Rz to the rotation rotation that can directly not cause wafer-supporting platform 202 to make progress at Rz.Thereby removed the rotation coupling between wafer-supporting platform 202 and the beam guideway 108.
Decoupling mechanism according to the present invention makes between coarse motion platform and the micropositioner to be that floating bearing connects, thereby realizes that rough micro-moving mechanism is Rz full decoupled to degree of freedom.
Hereinafter will detail the exposure desk that adopts decoupling mechanism of the present invention with reference to figure 3.
As shown in Figure 3, said exposure desk comprises coarse motion platform and micropositioner.The coarse motion platform comprises and which is provided with at marble pedestal 111 support frames 112.In the left and right sides of marble pedestal 111 Y linear electric motors to the left have been installed respectively, Y is linear electric motors to the right.Left and right sides motor comprises stator 16a and 16b and mover 17a and 17b respectively.Left side one dimension Y is connected in the left and right sides of marble pedestal 111 to the long stroke air-float guide rail of two dimension 109b to long stroke air-float guide rail 109a and right side Y.Right side Y is suspended in the upper surface of right side two dimension Y to long stroke air-float guide rail 109b to two-dimensional gas floating guide rail slide block 110 through vertical air supporting module, and two dimension Y in right side also isolates to 110 air supportings of two-dimensional gas floating guide rail slide block through side direction air supporting module and Y to the both sides of long stroke air-float guide rail 109b thus.The coarse motion platform comprises that also long stroke X is to beam guideway 108.Long stroke X is suspended in the upper surface of left side one dimension Y to long stroke air-float guide rail 109a to the left end of beam guideway 108 through vertical air supporting module, and long stroke X is connected to two-dimensional gas floating guide rail slide block 110 to the right-hand member and the right side Y of beam guideway 108.Long stroke X to the left end of beam guideway 108 and Y to the left linear motor rotor 17a be fixed together, right side Y to two-dimensional gas floating guide rail slide block 110 and Y to the right linear motor rotor 17b be fixed together.Therefore, guide rail slide block 110 is retrained by right side two dimension Y to long stroke air-float guide rail 109b through three side air supportings, only at Y to motion.Long stroke X is provided with X to long stroke motor 15 to beam guideway 108, its magnet and mover have allow Rz to the deviation capacity.Counter motion mass 113 and Y to the left linear electric motors stator 16a and Y to the right the stator 16b of linear electric motors be connected.When long stroke module XY moved, Three Degree Of Freedom counter motion mass 113 was given in the direct retroaction of reacting force, made Three Degree Of Freedom counter motion mass 113 in the opposite direction motion of long stroke module.Counter motion mass 113 also is suspended on the support frame 112 through vertical air supporting.
Micropositioner comprises wafer-supporting platform 12.Wafer-supporting platform 12 with X, Y, these 3 degree of freedom of Rz is suspended on the marble pedestal 111 through vertical gas foot module.Micropositioner also comprises planar guide module 102a and the 102b that is positioned at beam guideway 108 both sides.
Be provided with decoupling mechanism between micropositioner and the coarse motion platform, the XY motor function of rough micro-moving mechanism platform and Rz to the mobile decoupling function.Decoupling mechanism like first embodiment or second embodiment is provided with to the both sides of beam guideway 108 around long stroke X.Because preamble had detailed description already, repeated no more here.
The X of wafer-supporting platform 12 is provided to long stroke motor 15 by X to driving, the Y of wafer-supporting platform 12 to driving by Y to the left linear electric motors and Y to the right linear electric motors provide.The Rz that the XY of wafer-supporting platform 12 produces when quickening will directly pass to counter motion mass 113 through long stroke linear electric motors reacting force to additional torque.Because in the Rz air supporting coupling that makes progress, so counter motion mass 113 rotates up at Rz with long stroke module Y synchronously to two-dimensional gas floating guide rail slide block 110 and counter motion mass 113.And long stroke X passes through said decoupling mechanism to beam guideway 108 and wafer-supporting platform 12, so lithographic equipment scan exposure demand is satisfied in not rotation thereupon of wafer-supporting platform 12.Simultaneously, said decoupling mechanism utilizes air supporting and the floating principle of magnetic when satisfying the motor function demand, to realize the isolation of coarse motion platform and micropositioner, has played the vibration isolation cushioning effect.More than be the application that example has provided the rotation decoupling mechanism with exposure desk equipment, but rotating decoupling mechanism is not limited in this application mode.
In addition, X also can comprise Anti-bumping protection structure 104 to the both sides of beam guideway 108.When beam guideway 108 at Rz when relative fine motion wafer-supporting platform 12 anglecs of rotation exceed preset value, Anti-bumping protection structure 104 can play buffer action, thus protection fine motion wafer-supporting platform 12 collides beam guideway 108.
Fig. 4 shows the floating Anti-bumping protection structure of magnetic, and the floating Anti-bumping protection structure of magnetic is magnet snubber assembly 401 and 402.Long stroke X is equipped with magnet array to the both sides of beam guideway 108; When beam guideway 108 at Rz when the anglec of rotation of relative wafer-supporting platform 102 exceeds preset value; The principle that the floating snubber assembly 401 of magnetic and 402 repels each other through the same sex produces repulsion; Can play buffer action, thereby protection wafer-supporting platform 102 collides beam guideway 108.
The electromagnet Anti-bumping protection structure that Fig. 5 shows, electromagnet Anti-bumping protection structure is electromagnet snubber assembly 501 and 502.Long stroke X is equipped with magnet array to the both sides of beam guideway 108; When beam guideway 108 at Rz when the anglec of rotation of relative wafer-supporting platform 102 exceeds preset value; Electromagnet snubber assembly 501 and 502 produces magnetic force through ring current in iron core; Its magnetic force direction is identical to the polarity of beam guideway 108 1 sides with X, and the same sex repulsion that produces that repels each other can play buffer action, thereby protection wafer-supporting platform 102 collides beam guideway 108.The electromagnetic force that the electromagnet of described electromagnet Anti-bumping protection structure produces can be regulated through changing size of current.
Fig. 6 shows spring Anti-bumping protection structure, and spring Anti-bumping protection structure is spring bumper 601 and 602.When beam guideway 108 at Rz when relative wafer-supporting platform 102 anglecs of rotation exceed preset value, spring flushing device 601 and 602 elastic deformations through spring can play buffer action, thus the protection wafer-supporting platform 102 collide beam guideway 108.
In addition; By X, Y to the servo stiffness of long stroke motor make wafer-supporting platform keep desired location; Between the half-cylindrical slide block (103a, 103b or 201a, 201b) of decoupling mechanism and framework 112, angle Rz stop means 13 is installed, to survey the relative angular velocity of rotation between beam guideway 108 and the fine motion framework 112.The angular velocity signal that detects passes to long journey controller, if judge that rotating speed transfinites, then stops to drive the motion of Y to long stroke motor, protection fine motion wafer-supporting platform device security.Fig. 7 has specifically illustrated the structure of limiting and protecting device.As shown in Figure 7,
said stop means comprises limit sensors 701,702,703 and 704. When beam guideway 108 at Rz when relative wafer-supporting platform 102 anglecs of rotation exceed preset value, said spacing Sensor receives the signal that transfinites, and this signal is sent to the controller of long stroke linear electric motors, and then gives Go out response actions, avoid Rz to bump to beam guideway 108 and wafer-supporting platform 102.
Be example with the exposure desk that has spring Anti-bumping protection structure below, the work of stop means is described.In the scan exposure process, wafer-supporting platform 12 through fine motion motor (not shown) servocontrol silicon chip 11 at Rz to remaining on the desired position.Be located at X and make wafer-supporting platform fine motion framework 202 remain on the angle position synchronous with silicon chip 11 to the Rz stop means of beam guideway 108 both sides, can prevent fine motion framework 112 at Rz to freely drifting about.Simultaneously, the Rz stop means with wafer-supporting platform 12 Rz to driving torque pass to beam guideway 108 through passive or active mode.The characteristic frequency value of framework 112 is preferably to 0.1～10Hz, and the counter-force that the wafer-supporting platform rotary torque produces when its characteristic frequency＞10Hz, just is difficult to be delivered on the beam guideway 108, because under this frequency situation, framework 112 does not receive the influence of stop means frequency.Equally, also occur in the frequency more than the 10Hz for the maximum disturbance of wafer-supporting platform harm, the disturbance of beam guideway 108 generation＞10Hz in long stroke motion process has also been isolated through said stop means.Select for use the damper of 502 formulas spacing, typical ratio of damping between 0.4 to 0.85, preferred 0.65 to 0.75.Like this, the acting force of long stroke can not be exaggerated and influence framework 112.Stop means is selected the characteristic frequency f of spring for use
cCan according to formula (1) calculates:
Wherein, k is the spring rate of stop means, and m is the modal mass of fine motion framework (202) and beam guideway (108), and it calculates according to formula (2) and calculates:
Wherein, m
SsfBe the quality of fine motion framework 112, m
BeamQuality for beam guideway 108.
The spring characteristic frequency f of stop means
cPreferred 3Hz, then framework 112) and beam guideway 108 between torsional rigidity be 2.2e3Nm/rad, under the perturbing torque effect of 1Nm, will produce the rotation displacement of 0.455mrad.
Refer now to long stroke Y that Fig. 8 describes exposure desk in detail drive unit and guide piece to the left.As shown in Figure 8, Y drive unit and guide piece to the left mainly comprises left side linear motor magnet 801a, left side linear motor magnet support 802a, left side linear motor rotor 803a, the vertical air-float guide rail 804a of left side one dimension, and vertical air supporting module 805a.Vertical air supporting module 805a makes beam guideway 108 be suspended on the vertical air-float guide rail 804a of left side one dimension, has the one dimension guide effect.Left side linear motor rotor 803a and beam guideway 108 are connected.When motor-driven, beam guideway 108 along the left side the vertical air-float guide rail 804aY of one dimension to moving.Left side linear motor magnet support 802a then is located on the counter motion mass 113.
Refer now to long stroke Y that Fig. 9 describes exposure desk in detail drive unit and guide piece to the right.As shown in Figure 9; Y drive unit and guide piece to the right mainly comprises right side Y to two-dimensional gas floating guide rail slide block 110, right side linear motor magnet 801b, right side linear motor magnet support 802b; Linear motor rotor 803b; Right side two-dimensional gas floating guide rail 804b, vertical air supporting module 805b, and side direction air supporting module 806.Vertical air supporting module 805b makes beam guideway 108 be suspended on the vertical air-float guide rail 804b of right side two dimension; Side direction air supporting module 806 makes beam guideway 108 receive right side two-dimensional gas floating guide rail 804bX to position constraint, and beam guideway 108 has the two-dimensional guide effect like this.Right side Y is connected to two-dimensional gas floating guide rail slide block 110 and beam guideway 108, and linear motor rotor 803b also is connected with beam guideway 108 simultaneously.When motor-driven, beam guideway 108 along the vertical air-float guide rail 804bY of right side two dimension to moving.Right side linear motor magnet support 802b then is located on the counter motion mass 113.
Adopt the exposure desk of decoupling mechanism of the present invention to have following advantage.
(1) to when rotation, confirm and be controlled by its rotation center and coupling stiffness at Rz for the micropositioner that links to each other with decoupling mechanism of the present invention, and not limited by the coarse motion rotation and influence.
(2) when rotating, its anglec of rotation can far exceed the anglec of rotation of micropositioner equipment to the coarse motion platform that links to each other with decoupling mechanism of the present invention at Rz, thereby removes the tight constraint restriction to the strictness of coarse motion platform design.
(3) decoupling mechanism of the present invention can be applied on the high precision exposure desk, can realize the vibration damping and accurate position compensation of exposure desk.
(4) adopt the exposure desk of the present invention's decoupling mechanism to adopt an end two-dimensional gas floating guide frame, the other end has adopted vertical air supporting support level Rz one dimension air-float guide rail frame mode freely, has eliminated the problem of assembling the location.The air-float guide rail of said exposure desk adds cylindricality decoupling zero bearing mode, has eliminated because the inertia additional torque that produces in the motor stepping scanning process designs bottleneck to air film.
Here description of the invention and application is illustrative, is not to want with scope restriction of the present invention in the above-described embodiments.Here the distortion of the embodiment that is disclosed and change are possible, and the replacement of embodiment is known with the various parts of equivalence for those those of ordinary skill in the art.Those skilled in the art are noted that under the situation that does not break away from spirit of the present invention or essential characteristic, and the present invention can be with other forms, structure, layout, ratio, and realize with other elements, material and parts.Under the situation that does not break away from the scope of the invention and spirit, can carry out other distortion and change here to the embodiment that is disclosed.
Claims (11)
1. a Rz who realizes coarse motion platform and micropositioner is to the decoupling mechanism that rotates decoupling zero; It is characterized in that; Said decoupling mechanism forms to float between said coarse motion platform and said micropositioner and is connected; Said decoupling mechanism comprises the half-cylindrical air supporting module that links together, half-cylindrical slide block and lateral plane air supporting module, and wherein said half-cylindrical air supporting module is connected with the wafer-supporting platform of said micropositioner, and said lateral plane air supporting module is connected with the beam guideway of said coarse motion platform.
2. a Rz who realizes coarse motion platform and micropositioner is to the decoupling mechanism that rotates decoupling zero; It is characterized in that; Said decoupling mechanism forms to float between said coarse motion platform and said micropositioner and is connected; Said decoupling mechanism comprises the floating module of the half-cylindrical magnetic that links together, half-cylindrical slide block and the floating module of lateral plane magnetic, and the floating module of wherein said half-cylindrical magnetic is connected with the wafer-supporting platform of said micropositioner, and the floating module of said lateral plane magnetic is connected with the beam guideway of said coarse motion platform.
3. exposure desk; It is characterized in that; Comprise coarse motion platform and micropositioner, and be arranged between said coarse motion platform and the said micropositioner, like aforementioned claim 1 or 2 described decoupling mechanisms, wherein said coarse motion platform and said micropositioner form to float through said decoupling mechanism and are connected.
4. exposure desk as claimed in claim 3; It is characterized in that; Said coarse motion platform by X to driving to long stroke motor with Y; Wherein said Y comprises left side linear motor magnet, left side linear motor magnet support, left side linear motor rotor, the vertical air-float guide rail of left side one dimension and vertical air supporting module to the left side of long stroke motor drive unit and guide piece; Wherein said vertical air supporting module makes said coarse motion platform be suspended on the vertical air-float guide rail of said left side one dimension, and said left side linear motor rotor and said coarse motion platform are connected, and said left side linear motor magnet support and Three Degree Of Freedom counter motion mass are connected; As said Y during to long stroke motor-driven, said coarse motion platform along said left side the vertical air-float guide rail Y of one dimension to moving.
5. exposure desk as claimed in claim 4; It is characterized in that; Said Y comprises right side linear motor magnet, right side linear motor magnet support, right side linear motor rotor, right side two-dimensional gas floating guide rail slide block, right side two-dimensional gas floating guide rail, vertical air supporting module and side direction air supporting module to the right driving device and the guide piece of long stroke motor; Vertical air supporting module in wherein said right driving device and the guide piece makes said coarse motion platform be suspended on the two-dimensional gas floating guide rail of said right side; Said side direction air supporting module makes X that said coarse motion platform receives said right side two-dimensional gas floating guide rail to position constraint; Thus said coarse motion platform had the two-dimensional guide effect; Said right side two-dimensional gas floating guide rail slide block and said coarse motion platform are connected, and said right side linear motor rotor also is connected with said coarse motion platform, and said right side linear motor magnet support and Three Degree Of Freedom counter motion mass are connected; As said Y during to long stroke motor-driven, said coarse motion platform along said right side two-dimensional gas floating guide rail Y to moving.
6. exposure desk as claimed in claim 5 is characterized in that; Said coarse motion platform is provided with the Rz stop means; Said stop means comprises limit sensors; When said coarse motion platform at Rz when relative rotation angle exceeds preset value, said limit sensors is controlled to avoid said coarse motion platform and said micropositioner to bump to long stroke motor said Y.
7. exposure desk as claimed in claim 6 is characterized in that, said Rz stop means is the Rz angular-rate sensor.
8. exposure desk as claimed in claim 3 is characterized in that said decoupling mechanism is equipped with anti-collision protection device, to prevent the collision between said micropositioner and the said coarse motion platform.
9. exposure desk as claimed in claim 8 is characterized in that, said anti-collision protection device is the floating Anti-bumping protection structure of magnetic.
10. exposure desk as claimed in claim 8 is characterized in that, said anti-collision protection device is an electromagnet Anti-bumping protection structure.
11. exposure desk as claimed in claim 8 is characterized in that, said anti-collision protection device is a spring Anti-bumping protection structure.
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| CN104238273B (en) * | 2013-06-19 | 2016-09-28 | 上海微电子装备有限公司 | A kind of work stage safety device |
| CN104948629A (en) * | 2015-05-05 | 2015-09-30 | 常州大学 | Equal-stiffness vibration isolator based on air floatation and magnetic floatation combination three-directional decoupling |
| CN104948656A (en) * | 2015-05-05 | 2015-09-30 | 常州大学 | Three-direction equal-stiffness vibration isolator on basis of magnetic suspension damping decoupling |
| CN105607415B (en) * | 2016-02-25 | 2019-10-25 | 中国科学技术大学 | A kind of nano impression head and the Embosser with the nano impression head |
| CN109813476B (en) * | 2019-01-23 | 2021-03-16 | 广西大学 | Capacitive torque sensor based on structure decoupling |
| CN113029235B (en) * | 2021-02-25 | 2021-09-10 | 哈尔滨工业大学 | Small-stroke nanoscale motion platform and heat-related hysteresis data measuring method |
| CN113192873B (en) * | 2021-04-22 | 2023-09-22 | 上海御微半导体技术有限公司 | Flexible connection mechanism, micro-motion stage mechanism and semiconductor device |
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