CN101949000A - Vacuum magnetron sputtering multi-arc ion composite coating machine - Google Patents
Vacuum magnetron sputtering multi-arc ion composite coating machine Download PDFInfo
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- CN101949000A CN101949000A CN 201010289461 CN201010289461A CN101949000A CN 101949000 A CN101949000 A CN 101949000A CN 201010289461 CN201010289461 CN 201010289461 CN 201010289461 A CN201010289461 A CN 201010289461A CN 101949000 A CN101949000 A CN 101949000A
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Abstract
The invention relates to a vacuum magnetron sputtering multi-arc ion composite coating machine, which comprises a vacuum air exhaust system, a vacuum chamber, a vacuum chamber door, a workpiece rotating stand arranged in the vacuum chamber and an arc source device arranged on the body of the vacuum chamber, wherein the body of the vacuum chamber is also provided with a magnetron sputtering device. The coating machine has the advantage that: as both the arc source device and the magnetron sputtering device are arranged on the body of the vacuum chamber, the coating machine can perform multi-arc ion coating, or magnetron sputtering coating, or both multi-arc ion coating and magnetron sputtering coating synchronously, or both multi-arc ion coating and magnetron sputtering coating in turn, and has the advantages of multiple purposes, wide applicability and various coated products.
Description
Technical field
The present invention relates to a kind of coating equipment, relate in particular to a kind of vacuum magnetic-control sputtering multi sphere ion composite film coating machine.
Background technology
At present, vacuum plating unit is the specific equipment that is used for surface treatment PVD rete, comprise vacuum magnetic-control sputtering coating equipment, vacuum evaporating coating machine, vacuum arc deposition film machine etc., the vacuum magnetic-control sputtering coating equipment can carry out plated film to non-metallic material such as plastics under low-temperature condition, vacuum evaporating coating machine and vacuum arc deposition film machine belong to the high temperature plated film, be applicable to plated film is carried out in the metallic surface.Every kind of coating equipment all has characteristics and use range restriction separately, is coated with multiple different rete and carries out plated film on metal and non-metallic material as need, need purchase above-mentioned multiple vacuum plating unit, has the big shortcoming of facility investment.
Summary of the invention
Technical problem to be solved by this invention overcomes the deficiencies in the prior art exactly, and a kind of multi-functional vacuum magnetic-control sputtering multi sphere ion composite film coating machine is provided.
The technical solution adopted in the present invention is: vacuum magnetic-control sputtering multi sphere ion composite film coating machine, comprise vacuum-pumping system, vacuum chamber, door for vacuum chamber, be arranged on the workpiece pivoted frame in the vacuum chamber and be arranged on arc source apparatus on the vacuum chamber body, on the vacuum chamber body, also be provided with magnetic control sputtering device, magnetic control sputtering device comprises the magnetic controlling target flange of fixedlying connected with the vacuum chamber body, fixedly connected with the magnetic controlling target flange and place the magnetic controlling target iron yoke of vacuum chamber, magnetic controlling target magnet, the magnetic controlling target negative plate, the magnetic control target, magnetic control sputtering device also comprises cold water jacket, inlet channel seat and water outlet seat, the inlet channel seat is fixedlyed connected with the magnetic controlling target flange with the water outlet seat, cold water jacket is installed in the inner end of inlet channel seat and water outlet seat, magnetic controlling target iron yoke, magnetic controlling target magnet, the magnetic controlling target negative plate, the magnetic control target is fixed on the cold water jacket successively, constitutes cooling-water duct between cold water jacket and magnetic controlling target negative plate.
Beneficial technical effects of the present invention is: owing to be provided with arc source apparatus and magnetic control sputtering device simultaneously on the vacuum chamber body, on a coating equipment, both can carry out multi-arc ion plating film, can carry out magnetron sputtering plating again, also can carry out the plated film of dual mode or the first another kind of again plated film of a kind of plated film simultaneously, have that a tractor serves several purposes, suitability are wide, the advantage of plated film rich choice of products.
Description of drawings
Fig. 1: be structural representation of the present invention;
Fig. 2: be the left view of Fig. 1;
Fig. 3: be the structural representation of magnetic control sputtering device;
Fig. 4: be the vertical view (removing magnetic controlling target negative plate, target) of Fig. 3;
Fig. 5: be the structural representation of arc source apparatus;
Fig. 6: for the A of Fig. 5 to enlarged view (structural representation of ring-shaped magnet);
Fig. 7: be the structural representation of workpiece pivoted frame;
Fig. 8: be the vertical view of Fig. 7.
Embodiment
Below in conjunction with drawings and Examples the present invention is further described:
Shown in Fig. 1-4, vacuum magnetic-control sputtering multi sphere ion composite film coating machine, comprise vacuum-pumping system, vacuum chamber 25, door for vacuum chamber 1, be arranged on the workpiece pivoted frame 2 in the vacuum chamber 25 and be arranged on arc source apparatus 22 on the vacuum chamber body 9, on vacuum chamber body 9, also be provided with magnetic control sputtering device 3, magnetic control sputtering device 3 comprises the magnetic controlling target flange 10 of fixedlying connected with vacuum chamber body 9, fixedly connected with magnetic controlling target flange 10 and place the magnetic controlling target iron yoke 11 of vacuum chamber 25, magnetic controlling target magnet 12, magnetic controlling target negative plate 13, magnetic control target 14, magnetic control sputtering device 3 also comprises cold water jacket 15, inlet channel seat 16 and water outlet seat 17, be respectively equipped with water-in 19 and water outlet 20 in inlet channel seat 16 and the water outlet seat 17, inlet channel seat 16 is fixedlyed connected with magnetic controlling target flange 10 with water outlet seat 17, cold water jacket 15 is installed in the inner end of inlet channel seat 16 and water outlet seat 17, magnetic controlling target iron yoke 11, magnetic controlling target magnet 12, magnetic controlling target negative plate 13, magnetic control target 14 is fixed on the cold water jacket 15 successively, constitutes cooling-water duct 18 between cold water jacket 15 and magnetic controlling target negative plate 13.18 pairs of magnetic control targets 14 of cooling-water duct and magnetic controlling target magnet 12 cool off, and have the advantage of good cooling results, and then guarantee coating quality.What deserves to be mentioned is that according to the difference of magnetic control target 14 materials, magnetic controlling target negative plate 13 can directly replace with magnetic control target 14, water coolant directly contacts with magnetic control target 14, and cooling performance is better.On door for vacuum chamber 1, be provided with viewing window 8, be convenient to observe the plated film situation.Also be provided with heating unit 23 in vacuum chamber 25, vacuum chamber 25 is heated, the temperature of heating can be provided with according to the different process of product.On the frame of coating equipment, be provided with working gas inflation mechanism 24.
Described magnetic controlling target magnet 12 is some the spaced strip permanent magnets 21 of yi word pattern, and strip permanent magnet 21 is the China fir cobalt magnet of high-strength magnetic.Present embodiment is made as the strip permanent magnet of 3 yi word patterns arrangements that equate at interval, forms closed magnetic field, can improve sputtering rate, shortens film formation time, thereby increases work efficiency.
Described magnetic controlling target negative plate 13, magnetic controlling target flange 10, cold water jacket 15, inlet channel seat 16 and water outlet seat 17 are made by stainless steel.Adopt aluminum alloy materials to compare than prior art, have the density height, discharge quantity is few, and the advantage of long service life.
As shown in Figure 5, described arc source apparatus 22 comprises the arc source flange 26 of fixedlying connected with vacuum chamber body 9, be located at arc initiation device 27 and negative electrode water jacket 28 on the arc source flange 26, be contained in the ion target 29 on the negative electrode water jacket 28, be located at the arc source magnet 30 of ion target 29 tops, on negative electrode water jacket 28, insert fixedly connected magnet cylinder body 31, the upper end of magnet cylinder body 31 fixedly connected magnetic cylinder regulating sleeve 32, magnetic cylinder regulating sleeve 32 is provided with the adjusting screw(rod) 33 that is threaded, arc source magnet 30 is fixedlyed connected with the inner end of adjusting screw(rod) 33, and arc source magnet 30 places magnet cylinder body 31.Water coolant in the described negative electrode water jacket 28 directly contacts with arc source target 29, has the better advantage of cooling performance.Described negative electrode water jacket 28 is radially fixedlyed connected with arc source flange 26, axially flexibly connects.The arc source target 29 that is contained on the negative electrode water jacket 28 can be according to the requirement of different operating modes, and the turnover position can be regulated.
Described arc initiation device 27 comprises striking cylinder 35, insulation covering 36 and arc ignition bar 37, striking cylinder 35 is fixedlyed connected with arc source flange 26 with insulation covering 36, arc ignition bar 37 is radially fixedlyed connected with insulation covering 36, axially flexibly connects, and arc ignition bar 37 is fixedlyed connected with the piston rod of striking cylinder 35.35 actions of striking cylinder directly drive arc ignition bar 37 actions, and the pneumatic type striking is shorter than the electromagnetic type striking time.The power supply of described arc source apparatus 22 is the pulse power.Make electric current littler, have plasma sputter particle exquisiteness, the advantage that plated film product surface glossiness is strong.
As shown in Figure 6, described arc source magnet 30 is arranged by some permanent magnets 34 annular space and is formed.Has the Distribution of Magnetic Field advantage of uniform.
Shown in Fig. 7-8, described workpiece pivoted frame 2 comprises hanger shaft collar 38, hanger bar 39, toothed disc 40, main driving axle 41, sun-wheel 42 and sun and planet gear 43, toothed disc 40 is fixedlyed connected with main driving axle 41 with sun-wheel 42, sun and planet gear 43 axial restraints, radially be located at versatilely on the toothed disc 40, hanger bar 39 1 ends and sun and planet gear 43 are in transmission connection, hanger bar 39 the other ends and hanger shaft collar 38 flexibly connect, and constitute public from rotation structure.This structure has fully guaranteed the homogeneity of rete, does not have the plated film dead angle.
Described vacuum-pumping system comprises low vacuum pumping device and fine pumping device.Described low vacuum pumping device comprises Roots vaccum pump 5 and oil-sealed rotary pump 7, and the fine pumping device comprises holding vacuum pump 6 and vacuum diffusion pump 4.Its working process is as follows: open Roots vaccum pump 5 and oil-sealed rotary pump 7 earlier, carry out rough vacuum and bleed, when treating that vacuum tightness is evacuated to a certain degree, enter fine pumping, bleed by holding vacuum pump 6 and vacuum diffusion pump 4, treat that the vacuum tightness of vacuum chamber is evacuated to 8.0 * 10
-3During Pa, can be according to the different process requirement, can utilize magnetic control sputtering device 3 or arc source apparatus 22, the plated film product that is loaded on the workpiece pivoted frame 2 is carried out sputter coating or ion film plating, need open working gas inflation system 24 simultaneously and heating unit 23 comes assisted deposition, the plated film situation can be observed by viewing window 8.
Claims (9)
1. vacuum magnetic-control sputtering multi sphere ion composite film coating machine, comprise vacuum-pumping system, vacuum chamber, door for vacuum chamber, be arranged on the workpiece pivoted frame in the vacuum chamber and be arranged on arc source apparatus on the vacuum chamber body, it is characterized in that: on the vacuum chamber body, also be provided with magnetic control sputtering device, magnetic control sputtering device comprises the magnetic controlling target flange of fixedlying connected with the vacuum chamber body, fixedly connected with the magnetic controlling target flange and place the magnetic controlling target iron yoke of vacuum chamber, magnetic controlling target magnet, the magnetic controlling target negative plate, the magnetic control target, magnetic control sputtering device also comprises cold water jacket, inlet channel seat and water outlet seat, the inlet channel seat is fixedlyed connected with the magnetic controlling target flange with the water outlet seat, cold water jacket is installed in the inner end of inlet channel seat and water outlet seat, magnetic controlling target iron yoke, magnetic controlling target magnet, the magnetic controlling target negative plate, the magnetic control target is fixed on the cold water jacket successively, constitutes cooling-water duct between cold water jacket and magnetic controlling target negative plate.
2. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 1 is characterized in that: described magnetic controlling target magnet is some the spaced strip permanent magnets of yi word pattern.
3. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 1 and 2, it is characterized in that: described arc source apparatus comprises the arc source flange of fixedlying connected with the vacuum chamber body, be located at arc initiation device and negative electrode water jacket on the flange of arc source, be contained in the ion target on the negative electrode water jacket, be located at the arc source magnet of ion target top, on the negative electrode water jacket, insert fixedly connected magnet cylinder body, the upper end of magnet cylinder body fixedly connected magnetic cylinder regulating sleeve, magnetic cylinder regulating sleeve is provided with the adjusting screw(rod) that is threaded, the arc source magnet is fixedlyed connected with the inner end of adjusting screw(rod), and the arc source magnet places the magnet cylinder body.
4. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 3 is characterized in that: described arc source magnet is spaced by some permanent magnet annulars and forms.
5. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 3, it is characterized in that: described negative electrode water jacket is radially fixedlyed connected with arc source flange, axially flexibly connects.
6. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 3, it is characterized in that: described arc initiation device comprises striking cylinder, insulation covering and arc ignition bar, the striking cylinder is fixedlyed connected with arc source flange with insulation covering, arc ignition bar is radially fixedlyed connected with insulation covering, axially flexibly connect, arc ignition bar is fixedlyed connected with the piston rod of striking cylinder.
7. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 1 and 2, it is characterized in that: the power supply of described arc source apparatus is the pulse power.
8. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 1 and 2, it is characterized in that: described workpiece pivoted frame comprises hanger shaft collar, hanger bar, toothed disc, main driving axle, sun-wheel and sun and planet gear, toothed disc is fixedlyed connected with main driving axle with sun-wheel, sun and planet gear is axially fixed, radially is located on the toothed disc versatilely, hanger bar one end and sun and planet gear are in transmission connection, the hanger bar the other end and hanger shaft collar flexibly connect, and constitute public from rotation structure.
9. vacuum magnetic-control sputtering multi sphere ion composite film coating machine according to claim 1 and 2, it is characterized in that: described magnetic controlling target negative plate, magnetic controlling target flange, cold water jacket, inlet channel seat and water outlet seat are made by stainless steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN 201010289461 CN101949000A (en) | 2010-09-17 | 2010-09-17 | Vacuum magnetron sputtering multi-arc ion composite coating machine |
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| CN 201010289461 CN101949000A (en) | 2010-09-17 | 2010-09-17 | Vacuum magnetron sputtering multi-arc ion composite coating machine |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103668093A (en) * | 2013-11-27 | 2014-03-26 | 昂纳信息技术（深圳）有限公司 | AR (anti-reflect) film and AF (anti-fingerprint) film coating equipment in one furnace and film coating method |
| CN103668074A (en) * | 2012-09-04 | 2014-03-26 | 深圳市特艺实业有限公司 | Vacuum film-plating device having three-section shell and alternate plating piece turners |
| CN103824693A (en) * | 2014-03-22 | 2014-05-28 | 沈阳中北通磁科技股份有限公司 | Manufacturing method for neodymium iron boron lanthanon permanent magnet device with composite plated film |
| CN108893719A (en) * | 2018-09-14 | 2018-11-27 | 苏州浩联光电科技有限公司 | A kind of target suspension mechanism and ion sputtering film coating equipment |
| CN109338310A (en) * | 2018-11-26 | 2019-02-15 | 上海子创镀膜技术有限公司 | One kind being used for multi-arc ion plating equipment circular flat multi sphere target assembly |
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| CN2086749U (en) * | 1990-12-25 | 1991-10-16 | 航空航天工业部第五研究院五一一研究所 | Multifunctional coating equipment using multiarc-magnetic control sputtering |
| CN2219306Y (en) * | 1994-12-26 | 1996-02-07 | 中国科学院电工研究所 | Ionic coating equipment utilizing combination of arc evaporation and magnetocontrolled sputtering |
| CN2228916Y (en) * | 1995-10-23 | 1996-06-12 | 北京美克亚通用技术有限责任公司 | Magneto-controlled sputtering - multi-arc multifunction vacuum plating apparatus |
| US6296742B1 (en) * | 1997-03-11 | 2001-10-02 | Chemfilt R & D Aktiebolag | Method and apparatus for magnetically enhanced sputtering |
| CN201217685Y (en) * | 2008-05-28 | 2009-04-08 | 玉环县金源比特科技发展有限公司 | Magnetron sputtering and multi-sphere ion plating combined vacuum coating machine |
| CN201793726U (en) * | 2010-09-17 | 2011-04-13 | 温州市佳能真空电镀设备科技有限公司 | Vacuum magnetron sputtering and multi-arc ion recombination film plating machine |
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2010
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Patent Citations (6)
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| CN2086749U (en) * | 1990-12-25 | 1991-10-16 | 航空航天工业部第五研究院五一一研究所 | Multifunctional coating equipment using multiarc-magnetic control sputtering |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103668074A (en) * | 2012-09-04 | 2014-03-26 | 深圳市特艺实业有限公司 | Vacuum film-plating device having three-section shell and alternate plating piece turners |
| CN103668093A (en) * | 2013-11-27 | 2014-03-26 | 昂纳信息技术（深圳）有限公司 | AR (anti-reflect) film and AF (anti-fingerprint) film coating equipment in one furnace and film coating method |
| CN103824693A (en) * | 2014-03-22 | 2014-05-28 | 沈阳中北通磁科技股份有限公司 | Manufacturing method for neodymium iron boron lanthanon permanent magnet device with composite plated film |
| CN103824693B (en) * | 2014-03-22 | 2016-08-17 | 沈阳中北通磁科技股份有限公司 | A kind of manufacture method of the neodymium iron boron rare earth permanent magnet device with composite film coating |
| CN108893719A (en) * | 2018-09-14 | 2018-11-27 | 苏州浩联光电科技有限公司 | A kind of target suspension mechanism and ion sputtering film coating equipment |
| CN108893719B (en) * | 2018-09-14 | 2024-05-07 | 苏州浩联光电科技有限公司 | Target suspension mechanism and ion sputtering coating equipment |
| CN109338310A (en) * | 2018-11-26 | 2019-02-15 | 上海子创镀膜技术有限公司 | One kind being used for multi-arc ion plating equipment circular flat multi sphere target assembly |
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Open date: 20110119 |