CN101556397A - Color-film substrate, manufacture method thereof and liquid crystal display - Google Patents

Color-film substrate, manufacture method thereof and liquid crystal display Download PDF

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Publication number
CN101556397A
CN101556397A CNA2008101038744A CN200810103874A CN101556397A CN 101556397 A CN101556397 A CN 101556397A CN A2008101038744 A CNA2008101038744 A CN A2008101038744A CN 200810103874 A CN200810103874 A CN 200810103874A CN 101556397 A CN101556397 A CN 101556397A
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substrate
photoresist
black matrix
membrane substrates
color membrane
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CNA2008101038744A
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Chinese (zh)
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冷长林
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Beijing BOE Optoelectronics Technology Co Ltd
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Beijing BOE Optoelectronics Technology Co Ltd
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Priority to CNA2008101038744A priority Critical patent/CN101556397A/en
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Abstract

The invention relates to a color-film substrate, a manufacture method thereof and a liquid crystal display. The color-film substrate comprises a substrate, black matrixes and color resin, wherein the black matrixes are formed on the substrate, the color resin is formed among the black matrixes, and scattering layers used for scattering incident light are formed on the surfaces of the black matrixes. The manufacture method of the color-film substrate comprises the steps of forming the black matrixes on the substrate, forming the scattering layers for scattering incident light on the black matrixes and forming red resin figures, green resin figures and blue resin figures. The liquid crystal display comprises an array substrate and the color-film substrate. In the invention, by forming the scattering layers which have a light scattering function on the surfaces of the black matrixes of the substrate, light ray which is emitted by a backlight source of the liquid crystal display to the black matrix area of the color-film substrate is scattered back for reuse, thereby the utility radio of backlight is enhanced, and the quality of displayed pictures is improved.

Description

Color membrane substrates, color membrane substrates manufacture method and LCD
Technical field
The present invention relates to a kind of Liquid crystal disply device and its preparation method, particularly a kind of color membrane substrates, color membrane substrates manufacture method and LCD.
Background technology
In recent years, liquid crystal indicator (Liquid Crystal Display, abbreviation LCD) production development is very swift and violent, increasing LCD is gone on the market gradually, the consumer is more and more higher to the quality requirements of liquid crystal display picture, and the brightness effects of display panels directly has influence on the picture quality of LCD.The agent structure of display panels comprises box color membrane substrates and array base palte together, is formed with the black matrix (Black Matrix is called for short BM) that prevents light leak on the inside surface of color membrane substrates.In order to strengthen the display panels light intensity, common way is that the width that reduces black matrix increases aperture opening ratio or improves back light source brightness.Yet it is bigger to reduce the technical difficulty that black matrix width faces, and improves back light source brightness and can increase power consumption in actual use.
The black matrix of prior art can block and absorb the light that the part of back source is transmitted into black matrix when preventing light leak, cause this a part of light not to be fully used, and has reduced utilization factor backlight, has influenced quality of display pictures.
Summary of the invention
The purpose of this invention is to provide a kind of color membrane substrates, color membrane substrates manufacture method and LCD, the black matrix that effectively solves the prior art color membrane substrates blocks and absorbs part of back and causes technological deficiencies such as utilization factor backlight is low.
To achieve these goals, the invention provides a kind of color membrane substrates, comprise substrate, be formed on the black matrix on the described substrate and be formed on color resin between the described black matrix, be formed with the scattering layer that is used for scatter incident light on the surface of described black matrix.
On the basis of technique scheme, the surface of described scattering layer is for forming convex, spill or the cancavo-convex curvature surface of surface diffuse reflectance.
Preferably, described convex is triangle or arc.
The material of described scattering layer is mercury, silver chloride or molybdenum.
To achieve these goals, the present invention also provides a kind of color membrane substrates manufacture method, comprising:
Step 1, on substrate, form black matrix;
Step 2, be formed for the scattering layer of scatter incident light on the substrate of completing steps 1, described scattering layer is positioned on the described black matrix;
Step 3, on the substrate of completing steps 2, form red resin, green resin and blue resins figure.
Described step 1 is specially:
Step 11, on substrate deposition layer of metal layer;
Step 12, on the substrate of completing steps 11 coating one deck photoresist;
Step 13, make the photoresist on the substrate form unexposed area and complete exposure area by exposure and development treatment on the substrate of completing steps 12, the photoresist of unexposed area all keeps, and the photoresist of complete exposure area is all removed;
Step 14, on the substrate of completing steps 13, adopt wet-etching technique that the metal level of complete exposure area is etched away;
Step 15, on the substrate of completing steps 14, peel off remaining photoresist, on substrate, form black matrix.
Described step 2 is specially:
Step 21, on the substrate of completing steps 1 coating layer of metal layer, material is mercury, silver chloride or molybdenum;
Step 22, on the substrate of completing steps 21 coating one deck photoresist;
Step 23, on the substrate of completing steps 22, make the photoresist on the substrate form unexposed area, partial exposure area and complete exposure area by exposure and development treatment, the photoresist of unexposed area all keeps, the photoresist of partial exposure area is partly removed, and the photoresist of complete exposure area is all removed;
Step 24, on the substrate of completing steps 23, adopt wet-etching technique that the metal level of complete exposure area is etched away;
Step 25, on the substrate of completing steps 24, peel off remaining photoresist, on substrate, form scattering layer;
Step 26, on the substrate of completing steps 25, adopt isotropic dry carving technology, carry out the shaping of scattering layer.
The present invention also provides a kind of LCD that comprises above-mentioned color membrane substrates, comprises and the array base palte of described color membrane substrates to box.
The present invention proposes color membrane substrates, color membrane substrates manufacture method and LCD, by on the black matrix surface of color membrane substrates, forming scattering layer with light scattering function, this part light scatter that backlight of LCD is transmitted into the black matrix area of color membrane substrates is gone back, make and backlightly utilized again, thereby improved utilization factor backlight, improved quality of display pictures.
Below by drawings and Examples, technical scheme of the present invention is described in further detail.
Description of drawings
Fig. 1 is the structural representation of color membrane substrates of the present invention;
Fig. 2 is the elevational schematic view of Fig. 1;
Fig. 3 is that the A-A of Fig. 2 is to diagrammatic cross-section;
Fig. 4 is that the B-B of Fig. 2 is to diagrammatic cross-section;
Fig. 5 is the perspective view of Fig. 2;
Fig. 6 a forms the depositing metal layers of black matrix and the synoptic diagram of coating photoresist for the present invention;
Fig. 6 b forms the synoptic diagram of the photoetching process of black matrix for the present invention;
Fig. 6 c forms the synoptic diagram of the wet-etching technique of black matrix for the present invention;
Fig. 6 d forms the synoptic diagram of the stripping photoresist of black matrix for the present invention;
Fig. 6 e deposits the synoptic diagram of scattering layer for the present invention;
Fig. 6 f applies the synoptic diagram of photoresist on scattering layer for the present invention;
Fig. 6 g forms the synoptic diagram of the photoetching process of scattering layer for the present invention;
Fig. 6 h forms the synoptic diagram of the wet-etching technique of scattering layer for the present invention;
Fig. 6 i forms the synoptic diagram of the stripping photoresist of scattering layer for the present invention;
Fig. 6 j forms the synoptic diagram of the scattering layer shaping of scattering layer for the present invention;
Fig. 7 is applied to the structural representation of liquid crystal indicator for color membrane substrates of the present invention;
Fig. 8 is applied to the work synoptic diagram of liquid crystal indicator for color membrane substrates of the present invention;
Fig. 9 is the process flow diagram of color membrane substrates manufacture method of the present invention;
Figure 10 forms the process flow diagram of black matrix for the present invention;
Figure 11 forms the process flow diagram of scattering layer for the present invention;
Figure 12 is the structural representation of LCD of the present invention.
Description of reference numerals:
The 10-substrate; The 20-color resin; 30-deceives matrix;
The 40-scattering layer; The 11-metal level; The 12-photoresist;
The 12a-unexposed area; The 12b-complete exposure area; The 12c-partial exposure area;
The 100-color membrane substrates; The 200-array base palte; The 300-liquid crystal layer;
The 400-backlight; The 401-incident light; The 402-reflected light.
Embodiment
Fig. 1 is the structural representation of color membrane substrates of the present invention.As shown in Figure 1, color membrane substrates of the present invention is used for array base palte box-like being become liquid crystal indicator (LCD), color membrane substrates comprises substrate 10, color resin 20, black matrix 30 and scattering layer 40, black matrix 30 is formed on the substrate with array way, color resin 20 comprises the color resin of three kinds of colors: red resin, blue resins and green resin, be formed on successively between the black matrix 30, scattering layer 40 is arranged on the surface of black matrix 30, scattering layer 40 forms reflected light 402 with a part of incident light 401 scatterings that backlight of LCD is transmitted into black matrix 30 zones of color membrane substrates, reflected light 402 is utilized again, has improved service efficiency backlight.
In the above-mentioned technical solutions of this embodiment, the position of scattering layer, profile and size are partly or entirely corresponding consistent with position, profile and the size of described black matrix.The curvature surface configuration is arranged in the position of the corresponding black matrix of scattering layer, forms irregular scattering (being surface diffuse reflectance) by incident light on this curvature surface, plays the effect of scattered beam.Particularly, the surface configuration of scattering layer can be usual other curvature shapes that adopt of spill, convex, concave-convex or those skilled in the art.Fig. 2 is the elevational schematic view of Fig. 1; Fig. 3 is that the A-A of Fig. 2 is to diagrammatic cross-section; Fig. 4 is that the B-B of Fig. 2 is to diagrammatic cross-section; Fig. 5 is the perspective view of Fig. 2, and as Fig. 2~shown in Figure 5, the surface configuration of scattering layer 40 is preferably triangle, also can adopt arc, as semicircle, can avoid the reflection ray concentrations.
In the technique scheme of present embodiment, the material of scattering layer can be mercury, silver chloride or molybdenum, also can adopt the usual material with high reflectance that adopts of those skilled in the art, to improve diffuse effect.
By the technical scheme of the invention described above color membrane substrates as can be seen, color membrane substrates of the present invention is by being provided with the scattering layer with scatter incident light effect on the surface of black matrix, backlight is transmitted in this part light reflected back backlight module of the black matrix area of color membrane substrates, this part light can be utilized again, under the condition that does not increase aperture opening ratio, improve utilization factor backlight, increased the light intensity of liquid crystal panel.
Process for making below by color membrane substrates of the present invention further specifies technical scheme of the present invention.
Fig. 6 a forms the depositing metal layers of black matrix and the synoptic diagram of coating photoresist for the present invention.Adopt the method for sputter or thermal evaporation, go up deposition layer of metal layer 11 at substrate 10 (as glass substrate or quartz base plate), metal level 11 can use chromium or evanohm, applies one deck photoresist 12 afterwards on the substrate 10 of depositing metal layers 11, shown in Fig. 6 a.
Fig. 6 b forms the synoptic diagram of the photoetching process of black matrix for the present invention.Adopt the mask plate exposure and carry out development treatment to make the photoresist on the substrate 10 form unexposed area 12a and complete exposure area 12b, the photoresist of unexposed area 12a all keeps, and the photoresist of complete exposure area 12b is all got rid of, shown in Fig. 6 b.
Fig. 6 c forms the synoptic diagram of the wet-etching technique of black matrix for the present invention.Adopt wet-etching technique to carry out etching, etch away the metal level 11 of complete exposure area, on substrate 10, form black matrix, shown in Fig. 6 c.
Fig. 6 d forms the synoptic diagram of the stripping photoresist of black matrix for the present invention.Peel off remaining photoresist on the substrate of above-mentioned flow process finishing, form black matrix 30, shown in Fig. 6 d.
Fig. 6 e deposits the synoptic diagram of scattering layer for the present invention.Adopt the method for sputter or thermal evaporation, deposit layer of metal layer 40 on the substrate of step 15, metal level 40 can use mercury, silver chloride or molybdenum, shown in Fig. 6 e.
Fig. 6 f applies the synoptic diagram of photoresist on scattering layer for the present invention.Coating one deck photoresist 12 on depositing metal layers 40 is shown in Fig. 6 f.
Fig. 6 g forms the synoptic diagram of the photoetching process of scattering layer for the present invention.Adopting the exposure of gray mask plate or half-tone mask plate and carrying out development treatment makes the photoresist on the substrate 10 form unexposed area 12a, partial exposure area 12c and complete exposure area 12b, the photoresist of unexposed area 12a all keeps, the photoresist of partial exposure area 12c is partly removed, the photoresist of complete exposure area 12b is all got rid of, shown in Fig. 6 g.
Fig. 6 h forms the synoptic diagram of the wet-etching technique of scattering layer for the present invention.Adopt wet-etching technique to carry out etching, etch away the metal level 40 of complete exposure area, on substrate, form the scattering layer figure, shown in Fig. 6 h.
Fig. 6 i forms the synoptic diagram of the stripping photoresist of scattering layer for the present invention.Peel off remaining photoresist on the substrate of above-mentioned flow process finishing, on black matrix 30 surfaces, form scattering layer 40, shown in Fig. 6 i.
Fig. 6 j forms the synoptic diagram of the scattering layer shaping of scattering layer for the present invention.Carry out isotropic dry carving technology on the substrate of above-mentioned flow process finishing, forming xsect on black matrix 30 surfaces is leg-of-mutton scattering layer 40, shown in Fig. 6 j.
By the technical scheme of the invention described above color membrane substrates as can be seen, color membrane substrates of the present invention is by being provided with the scattering layer with scatter incident light effect on the surface of black matrix, backlight is transmitted in this part light reflected back backlight module of the black matrix area of color membrane substrates, this part light can be utilized again, under the condition that does not increase aperture opening ratio, improve utilization factor backlight, increased the light intensity of liquid crystal panel.
Fig. 7 is applied to the structural representation of liquid crystal indicator for color membrane substrates of the present invention, as shown in Figure 7, the agent structure of liquid crystal indicator comprises color membrane substrates 100 and the array base palte 200 that box is formed together panel, color membrane substrates 100 comprises substrate 10, color resin 20, black matrix 30 and scattering layer 40, black matrix 30 is formed on the substrate 10 in the mode of array, color resin 20 comprises red resin, blue resins and green resin, be formed on successively between the black matrix 30, scattering layer 40 is arranged on the surface of black matrix 30, this scattering layer 40 goes back this part incident light 401 scattering that backlight of LCD is transmitted into black matrix 30 zones of color membrane substrates, reflected light 402 is utilized again, array base palte 200 comprises substrate and array structure layer, between color membrane substrates 100 and the array base palte 200 liquid crystal layer is set.Fig. 8 is applied to the work synoptic diagram of liquid crystal indicator for color membrane substrates of the present invention, as shown in Figure 8, area source light by backlight 400 ejaculations, through array base palte 200 and liquid crystal layer 300 directive color membrane substrates 100, part incident light 401 penetrates via color resin 20, another part incident light 401 directives are deceived matrix 30 zones, this part incident light 401 forms reflected light 402 by being arranged on black matrix 30 lip-deep scattering layers 40, reflected back liquid crystal layer 300, array base palte 200 and backlight 400 are utilized by backlight module again.
The present invention is by being provided with the scattering layer with scatter incident light effect on black matrix surface, backlight is transmitted in the incident ray reflected back backlight module of the black matrix area of color membrane substrates, this part light can be utilized again, under the condition that does not increase aperture opening ratio, improve utilization factor backlight, increased the light intensity of liquid crystal panel.
Fig. 9 is the process flow diagram of color membrane substrates manufacture method of the present invention, is specially:
Step 1, on substrate, form black matrix;
Step 2, be formed for the scattering layer of scatter incident light on the substrate of completing steps 1, described scattering layer is positioned on the described black matrix;
Step 3, on the substrate of completing steps 2, form red resin, green resin and blue resins figure.
Technique scheme of the present invention is by forming the scattering layer with light scattering function on the surface of the black matrix of substrate, the incident ray scattering that LCD backlight source is transmitted into the black matrix area of color membrane substrates is gone back, again utilize, thereby improve utilization factor backlight, improved quality of display pictures.
Figure 10 is the process flow diagram that the present invention forms black matrix, is specially:
Step 11, on substrate deposition layer of metal layer;
Step 12, on the substrate of completing steps 11 coating one deck photoresist;
Step 13, make the photoresist on the substrate form unexposed area and complete exposure area by exposure and development treatment on the substrate of completing steps 12, the photoresist of unexposed area all keeps, and the photoresist of complete exposure area is all removed;
Step 14, on the substrate of completing steps 13, adopt wet-etching technique that the metal level of complete exposure area is etched away;
Step 15, on the substrate of completing steps 14, peel off remaining photoresist, on substrate, form black matrix.
Particularly, at first adopt the method for sputter or thermal evaporation, go up deposition layer of metal layer at substrate (as glass substrate or quartz base plate), metal level can use chromium and alloy thereof; On the substrate of depositing metal layers, apply one deck photoresist afterwards; Adopt the gray tone photoetching process to make the photoresist on the substrate form unexposed area and complete exposure area by exposure and development treatment, the photoresist of unexposed area all keeps, and the photoresist of complete exposure area is all got rid of; Adopt wet-etching technique to carry out etching, etch away the metal level of complete exposure area, on substrate, form black matrix, last, peel off remaining photoresist on the substrate of above-mentioned flow process finishing, form black matrix.
Figure 11 is the process flow diagram that the present invention forms scattering layer, is specially:
Step 21, on the substrate of completing steps 1 coating layer of metal layer, material is mercury, silver chloride or molybdenum;
Step 22, on the substrate of completing steps 21 coating one deck photoresist;
Step 23, on the substrate of completing steps 22, make the photoresist on the substrate form unexposed area, partial exposure area and complete exposure area by exposure and development treatment, the photoresist of unexposed area all keeps, the photoresist of partial exposure area is partly removed, and the photoresist of complete exposure area is all removed;
Step 24, on the substrate of completing steps 23, adopt wet-etching technique that the metal level of complete exposure area is etched away;
Step 25, on the substrate of completing steps 24, peel off remaining photoresist, on substrate, form scattering layer.
Step 26, on the substrate of completing steps 25, adopt isotropic dry carving technology, carry out the shaping of scattering layer.
Particularly, adopt the method for sputter or thermal evaporation, deposition layer of metal layer on the black matrix that forms, metal level can use mercury, silver chloride or molybdenum; On depositing metal layers, apply one deck photoresist afterwards; By the exposure of gray mask plate or half-tone mask plate and carry out development treatment and form unexposed area, partial exposure area and complete exposure area, the photoresist of unexposed area all keeps, the photoresist of partial exposure area is partly removed, and the photoresist of complete exposure area is all got rid of; Adopt wet-etching technique to carry out etching, etch away the metal level of complete exposure area, then, peel off remaining photoresist, on black matrix surface, form scattering layer, last, adopt isotropic dry carving technology, finish the shaping of scattering layer.
By the technical scheme of the invention described above color membrane substrates as can be seen, color membrane substrates of the present invention is by being provided with the scattering layer with scatter incident light effect on black matrix surface, backlight is transmitted in this part light reflected back backlight module of the black matrix area of color membrane substrates, this part light can be utilized again, under the condition that does not increase aperture opening ratio, improve utilization factor backlight, increased the light intensity of liquid crystal panel.
Figure 12 is the structural representation of LCD of the present invention.As shown in figure 12, LCD of the present invention comprises color membrane substrates 100 and array base palte 200, color membrane substrates 100 comprises substrate 10, color resin 20, black matrix 30 and scattering layer 40, black matrix 30 is formed on the substrate with array way, color resin 20 comprises the color resin of three kinds of colors: red resin, blue resins and green resin, be formed on successively between the black matrix 30, scattering layer 40 is arranged on the surface of black matrix 30, scattering layer 40 forms reflected light 402 with a part of incident light 401 scatterings that backlight of LCD is transmitted into color membrane substrates 100 black matrix 30 zones, reflected light 402 is utilized again, has improved service efficiency backlight.
In the above-mentioned technical solutions of this embodiment, the position of scattering layer, profile and size are partly or entirely corresponding consistent with position, profile and the size of described black matrix.The curvature surface configuration is arranged in the position of the corresponding black matrix of scattering layer, forms irregular scattering (being surface diffuse reflectance) by incident light on this curvature surface, plays the effect of scattered beam.Particularly, the surface configuration of scattering layer can be usual other curvature shapes that adopt of spill, convex, concave-convex or those skilled in the art.The surface configuration of scattering layer 40 is preferably triangle, also can adopt arc, as semicircle, can avoid the reflection ray concentrations.
In the technique scheme of present embodiment, the material of scattering layer can be mercury, silver chloride or molybdenum, also can adopt the usual material with high reflectance that adopts of those skilled in the art, to improve diffuse effect.
By the technical scheme of the invention described above LCD as can be seen, color membrane substrates of the present invention is by being provided with the scattering layer with scatter incident light effect on the surface of black matrix, backlight is transmitted in this part light reflected back backlight module of the black matrix area of color membrane substrates, this part light can be utilized again, under the condition that does not increase aperture opening ratio, improve utilization factor backlight, increased the light intensity of liquid crystal panel.
It should be noted that at last: above embodiment is only unrestricted in order to technical scheme of the present invention to be described, although the present invention is had been described in detail with reference to preferred embodiment, those of ordinary skill in the art is to be understood that, can make amendment or be equal to replacement technical scheme of the present invention, and not break away from the spirit and scope of technical solution of the present invention.

Claims (8)

1. color membrane substrates comprises substrate, is formed on the black matrix on the described substrate and is formed on color resin between the described black matrix, it is characterized in that, is formed with the scattering layer that is used for scatter incident light on the surface of described black matrix.
2. color membrane substrates according to claim 1 is characterized in that, the surface of described scattering layer is for forming convex, spill or the cancavo-convex curvature surface of surface diffuse reflectance.
3. color membrane substrates according to claim 2 is characterized in that, described convex is triangle or arc.
4. according to the described color membrane substrates of arbitrary claim in the claim 1~3, it is characterized in that the material of described scattering layer is mercury, silver chloride or molybdenum.
5. a color membrane substrates manufacture method is characterized in that, comprising:
Step 1, on substrate, form black matrix;
Step 2, be formed for the scattering layer of scatter incident light on the substrate of completing steps 1, described scattering layer is positioned on the described black matrix;
Step 3, on the substrate of completing steps 2, form red resin, green resin and blue resins figure.
6. color membrane substrates manufacture method according to claim 5 is characterized in that, described step 1 is specially:
Step 11, on substrate deposition layer of metal layer;
Step 12, on the substrate of completing steps 11 coating one deck photoresist;
Step 13, make the photoresist on the substrate form unexposed area and complete exposure area by exposure and development treatment on the substrate of completing steps 12, the photoresist of unexposed area all keeps, and the photoresist of complete exposure area is all removed;
Step 14, on the substrate of completing steps 13, adopt wet-etching technique that the metal level of complete exposure area is etched away;
Step 15, on the substrate of completing steps 14, peel off remaining photoresist, on substrate, form black matrix.
7. color membrane substrates manufacture method according to claim 5 is characterized in that, described step 2 is specially:
Step 21, on the substrate of completing steps 1 coating layer of metal layer, material is mercury, silver chloride or molybdenum;
Step 22, on the substrate of completing steps 21 coating one deck photoresist;
Step 23, on the substrate of completing steps 22, make the photoresist on the substrate form unexposed area, partial exposure area and complete exposure area by exposure and development treatment, the photoresist of unexposed area all keeps, the photoresist of partial exposure area is partly removed, and the photoresist of complete exposure area is all removed;
Step 24, on the substrate of completing steps 23, adopt wet-etching technique that the metal level of complete exposure area is etched away;
Step 25, on the substrate of completing steps 24, peel off remaining photoresist, on substrate, form scattering layer;
Step 26, on the substrate of completing steps 25, adopt isotropic dry carving technology, carry out the shaping of scattering layer.
8. a LCD that comprises the described color membrane substrates of arbitrary claim in the claim 1~4 is characterized in that, comprises and the array base palte of described color membrane substrates to box.
CNA2008101038744A 2008-04-11 2008-04-11 Color-film substrate, manufacture method thereof and liquid crystal display Pending CN101556397A (en)

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CN109828405A (en) * 2019-03-14 2019-05-31 京东方科技集团股份有限公司 A kind of color membrane substrates and preparation method thereof, display panel and display device
CN110456553A (en) * 2019-08-22 2019-11-15 武汉华星光电技术有限公司 A kind of display device
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Application publication date: 20091014