CN101393400B - Method for removing glue at surface of liquid light-sensitive resin letterpress - Google Patents
Method for removing glue at surface of liquid light-sensitive resin letterpress Download PDFInfo
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- CN101393400B CN101393400B CN2008102169998A CN200810216999A CN101393400B CN 101393400 B CN101393400 B CN 101393400B CN 2008102169998 A CN2008102169998 A CN 2008102169998A CN 200810216999 A CN200810216999 A CN 200810216999A CN 101393400 B CN101393400 B CN 101393400B
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- benzophenone
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Abstract
The present invention provides a method for the viscosity removal of the surface of a liquid light-sensitive resin relief printing plate. The method comprises the following steps: (1) preparing the photocatalyst solution, wherein the solute is the benzophenone or the alkyl derivative thereof, while the solvent is the alcohol, the aether or the chloroform and the concentration of the solution is between 0.1 and 8 weight percent; and (2) coating the photocatalyst solution in the first step on the surface of the relief printing plate, and removing viscosity under ultraviolet light. With the photocatalyst solution for viscosity removal, the photoreaction effect is improved, the viscosity on the surface of the relief printing plate is prominently reduced, the capacity of transferring PI solution in the PI printing process is enhanced, and the uniformity of the printing is improved.
Description
Technical field
The present invention relates to a kind of method of liquid light-sensitive resin relief printing plate surface viscosity.
Background technology
At present, liquid light-sensitive resin relief printing plate (being called for short the liquid version) is mainly used in PI (polyimide) printing process that LCD (Liquid CrystalDisplay) the medium and high-grade goods STN of producer (Super Twisted Nematic), color-STN produce.The principal ingredient of its used liquid resin raw material is undersaturated polybutadiene (Unsaturated Polybutadiene Resin), process be with resin-coating on special exposure sources, through the selectivity first curing molding that exposes, and then determine the final size and the performance of product through washing operations such as version, oven dry, optical processing, post-exposure.
According to the character of surface of LCD industry with printed material (PI liquid) and stock (ito glass), the liquid version space of a whole page surface tension as printing carrier remains on 22 ± 1Dyn/cm usually, and viscosity is proper.If space of a whole page viscosity is low excessively, transfer effect is better, but absorption PI liquid ability is relatively poor; On the contrary,, not only stick dust easily if space of a whole page viscosity is too high, not easy to clean, though the adsorbent solution ability shifts PI liquid ability by force in the PI printing process; The printing homogeneity is all bad under 2 kinds of situations.In the practice, it is very high that liquid version face exposure is washed edition general viscosity of the back space of a whole page, therefore need do the space of a whole page and remove sticking operation.It is by UV-irradiation that space of a whole page viscosity is removed essence, carries out Raolical polymerizable on the surface, to reduce surface energy.But, for reducing O
2Polymerization inhibition effect, though take ultraviolet light under the starvation situation, to shine the space of a whole page in the PROCESS FOR TREATMENT, go sticking effect still not obvious, even prolong irradiation time significantly, generally also can only make surface tension be reduced to 26.1Dyn/cm, go sticking effect again difficulty have clear improvement.
Summary of the invention
Embodiment of the invention technical matters to be solved is, a kind of sticking photoactivation agent solution that removes is provided, and is too high to solve the liquid light-sensitive resin relief printing plate surface viscosity, easily stick dust, not easy to clean, and in the PI printing process, shift PI liquid ability, the bad problem of printing homogeneity.
The embodiment of the invention another technical matters to be solved is, a kind of method that adopts above-mentioned photocatalyst solution to remove the liquid light-sensitive resin relief printing plate surface viscosity is provided.
Sticking photoactivation agent solution is removed on the liquid light-sensitive resin relief printing plate surface that the embodiment of the invention provides, and solute is benzophenone or its alkyl derivative, and solvent is alcohol, ether or chloroform, and its concentration is 0.1wt%～8wt%.
Adhering method is removed on the liquid light-sensitive resin relief printing plate surface that the embodiment of the invention provides, and comprises the steps:
(1) configuration photocatalyst solution, wherein, solute is for being benzophenone or its alkyl derivative, and solvent is alcohol, ether or chloroform, and its concentration is 0.1wt%～8wt%.
(2) photocatalyst solution is in relief surface in the application step (1), and UV-irradiation is gone down sticking.
Compared with prior art, adopt technique scheme, the finite concentration photocatalyst solution is coated relief surface after, UV-irradiation is gone down sticking, has strengthened the light reaction effect, and relief printing plate space of a whole page viscosity is obviously descended, shift PI liquid ability and strengthen in the PI printing process, the printing homogeneity improves.
Embodiment
In order to make the technical problem to be solved in the present invention, technical scheme and beneficial effect clearer,, the present invention is further elaborated below in conjunction with embodiment.Should be appreciated that specific embodiment described herein only in order to explanation the present invention, and be not used in qualification the present invention.
Embodiment 1
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 0.1wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in liquid light-sensitive resin
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Embodiment 2
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 0.5wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in the liquid light-sensitive resin relief printing plate surface
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Embodiment 3
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 1wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in the liquid light-sensitive resin relief printing plate surface
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Embodiment 4
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 1.5wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in the liquid light-sensitive resin relief printing plate surface
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Embodiment 5
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 2wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in the liquid light-sensitive resin relief printing plate surface
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Embodiment 6
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 3wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in the liquid light-sensitive resin relief printing plate surface
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Embodiment 7
Get a certain amount of benzophenone and be dissolved in the isopropyl alcohol, be mixed with the photocatalyst that concentration is 8wt%, be coated with it, adopt the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm in the liquid light-sensitive resin relief printing plate surface
2Shine relief surface under the condition, different the removing of test glued time lower surface tension force, and concrete data are referring to table 1.
Table 1
More than among each embodiment, solute can also be the alkyl derivative of benzophenone, 2 methyl benzophenone for example, 4-methyldiphenyl ketone, 3, the 4-dimethyl benzophenone, 4,4-dimethyl benzophenone or 2,4,6-tri-methyl benzophenone etc.Because isopropyl alcohol does not have influence, volatile, difficult suction and certain dissolving power is arranged plate itself, so preferred isopropyl alcohol of embodiment of the invention solvent, certainly, can also select this area other various organic solvents commonly used, other alcohols material for example, for example methyl alcohol, ethanol, propyl alcohol, butanols, and ether or chloroform.
The photocatalyst of the embodiment of the invention, its concentration range are 0.1wt%～8wt%, and in this scope, solution coat adopts the ultraviolet source of wavelength 254nm, at light intensity 60mw/cm after relief surface
2Shine relief surface under the condition, remove sticking certain hour, strengthened the light reaction effect, relief printing plate space of a whole page viscosity is obviously descended, shift PI liquid ability and strengthen in the PI printing process, the printing homogeneity improves.Certainly, in the embodiment of the invention, can also select the ultraviolet source of this area other wavelength commonly used, also can under different light intensity degree condition, shine relief surface, can realize the foregoing invention purpose equally.
But, being applied on the relief printing plate space of a whole page for above-mentioned photocatalyst in concentration greater than 3wt%, the solute Distribution inequality of meeting because of separating out after the solvent evaporates stays the seal stain, brings certain negative effect; And excessive concentration go easily sticking excessively, cause that to shift PI liquid ability not enough.Therefore, the photocatalyst concentration range of the embodiment of the invention is preferably 0.1wt%～3wt%.In addition, when photocatalyst concentration＜1wt%, though also can reduce relief printing plate space of a whole page surface tension, but need the time of UV-irradiation long, therefore photocatalyst concentration range 1wt%～2wt% more preferably, like this, not only can reach needed surface tension within a short period of time, eliminate the possible negative effect of process implementing and reduced the technological operation difficulty.
The above only is preferred embodiment of the present invention, not in order to restriction the present invention, all any modifications of being done within the spirit and principles in the present invention, is equal to and replaces and improvement etc., all should be included within protection scope of the present invention.
Claims (5)
1. adhering method is removed on a liquid light-sensitive resin relief printing plate surface, comprises the steps:
(1) configuration photocatalyst solution, wherein, solute is benzophenone or its alkyl derivative, and solvent is alcohol, ether or chloroform, and concentration is 0.1wt%～8wt%;
(2) photocatalyst solution is in described relief surface in the application step (1), and ultraviolet light goes down sticking.
2. adhering method is removed on the liquid light-sensitive resin relief printing plate surface according to claim 1, and wherein, photocatalyst solution concentration is 0.1wt%～3wt% in the step (1).
3. remove adhering method as liquid light-sensitive resin relief printing plate surface as described in the claim 2, wherein, photocatalyst solution concentration is 1wt%～2wt% in the step (1).
4. the liquid light-sensitive resin relief printing plate surface remove adhering method as claim 1 to 3 as described in each, wherein, described benzophenone alkyl derivative is a 2 methyl benzophenone, 4-methyldiphenyl ketone, 3,4-dimethyl benzophenone, 4,4-dimethyl benzophenone or 2,4,6-tri-methyl benzophenone, described alcohols material is methyl alcohol, ethanol, propyl alcohol, isopropyl alcohol or butanols.
5. adhering method is removed on the liquid light-sensitive resin relief printing plate surface according to claim 1, and wherein, ultraviolet wavelength is 254nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102169998A CN101393400B (en) | 2008-10-29 | 2008-10-29 | Method for removing glue at surface of liquid light-sensitive resin letterpress |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008102169998A CN101393400B (en) | 2008-10-29 | 2008-10-29 | Method for removing glue at surface of liquid light-sensitive resin letterpress |
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| Publication Number | Publication Date |
|---|---|
| CN101393400A CN101393400A (en) | 2009-03-25 |
| CN101393400B true CN101393400B (en) | 2011-12-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2008102169998A Active CN101393400B (en) | 2008-10-29 | 2008-10-29 | Method for removing glue at surface of liquid light-sensitive resin letterpress |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP7362612B2 (en) * | 2017-12-22 | 2023-10-17 | ブルーワー サイエンス アイ エヌ シー． | Laser releasable adhesive material for 3-D IC applications |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4894311A (en) * | 1986-10-29 | 1990-01-16 | Fuji Photo Film Co., Ltd. | Positive-working photoresist composition |
| CN1039555A (en) * | 1988-06-29 | 1990-02-14 | 帝国化学工业公司 | Receiver sheet |
| CN1182660A (en) * | 1996-11-20 | 1998-05-27 | 揖斐电株式会社 | Anti-welding composition and printed-circuit board |
| CN1399594A (en) * | 1999-10-29 | 2003-02-26 | 霍林斯沃思及沃斯公司 | Graft polymerization, separators, and batteries including the separators |
| CN1433468A (en) * | 1999-12-03 | 2003-07-30 | 茵微特克有限公司 | Surface modified supporting materials for binding biological materials, method for the production and use thereof |
| EP1257881B1 (en) * | 2000-02-22 | 2006-04-19 | Macdermid Graphic Arts, Inc. | Laser imaged printing plates comprising a multi-layer slip film |
-
2008
- 2008-10-29 CN CN2008102169998A patent/CN101393400B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4894311A (en) * | 1986-10-29 | 1990-01-16 | Fuji Photo Film Co., Ltd. | Positive-working photoresist composition |
| CN1039555A (en) * | 1988-06-29 | 1990-02-14 | 帝国化学工业公司 | Receiver sheet |
| CN1182660A (en) * | 1996-11-20 | 1998-05-27 | 揖斐电株式会社 | Anti-welding composition and printed-circuit board |
| CN1399594A (en) * | 1999-10-29 | 2003-02-26 | 霍林斯沃思及沃斯公司 | Graft polymerization, separators, and batteries including the separators |
| CN1433468A (en) * | 1999-12-03 | 2003-07-30 | 茵微特克有限公司 | Surface modified supporting materials for binding biological materials, method for the production and use thereof |
| EP1257881B1 (en) * | 2000-02-22 | 2006-04-19 | Macdermid Graphic Arts, Inc. | Laser imaged printing plates comprising a multi-layer slip film |
Non-Patent Citations (1)
| Title |
|---|
| JP昭60-88940A 1985.05.18 |
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| CN101393400A (en) | 2009-03-25 |
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Owner name: SHENZHEN QINGYI PRECISION MASKMAKING CO., LTD. Free format text: FORMER NAME: QINGYI PRECISION MASK MAKING (SHENZHEN) CO., LTD. |
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Address after: Two road high tech Industrial Zone in Shenzhen city Guangdong province 518057 North Song Ping Lang mountain No. 8 Qing Yi Building Patentee after: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Address before: Two road high tech Industrial Zone in Shenzhen city Guangdong province 518057 North Song Ping Lang mountain No. 8 Patentee before: Qingyi Precision Mask Making (Shenzhen) Co., Ltd. |