CN101261116A - Thin film thickness and refractivity optical measurement method and its device - Google Patents
Thin film thickness and refractivity optical measurement method and its device Download PDFInfo
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- CN101261116A CN101261116A CNA200810047420XA CN200810047420A CN101261116A CN 101261116 A CN101261116 A CN 101261116A CN A200810047420X A CNA200810047420X A CN A200810047420XA CN 200810047420 A CN200810047420 A CN 200810047420A CN 101261116 A CN101261116 A CN 101261116A
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Abstract
The invention discloses an optical measurement method and devices used for measuring film thickness and refractive index. Light emitted out of a broadband light source generates an interference signal through interference structure, the spectrum information of the interference signal is detected and the fourier transform of the spectrum information is carried out, thus obtaining the optical path difference information of two optical paths which can generate the interference signal. Under known refractive index, a sample is arranged in an interference arm in the same type and is measured again, and the film thickness can be obtained by comparing the information of twice optical path differences. If the refractive index is unknown, the film is required to be rotated by an angle, and the refractive index and the thickness of the film can be worked out by the measurement of a third time. The optical measurement method and the devices used for measuring film thickness and refractive index adopt an optical method and have no damage to the sample; the resolution is micro level and the measured range can achieve millimeter level. Furthermore, the sample is not required to be strictly attached onto a sample platform; meanwhile, the information processing method is simple, and the information of the thickness and the refractive index of transparent or half-transparent film can be conveniently obtained in real time.
Description
Technical field
The invention belongs to the optical measurement field, be specifically related to the measuring method and the device thereof of a kind of film thickness and refractive index, it is applicable to the thickness of transparent or semitransparent film (thin layer that can be penetrated by light) and the industrial detection field of refractive index.
Background technology
Film thickness is a key parameter weighing film quality, has the multiple mode can MEASUREMENTS OF THIN thickness at present, and such as the X ray interference technique, interference microscope is measured, but they can only be used for MEASUREMENTS OF THIN thickness, can not be used for surveying refractive index.And the X ray technology seldom adopted by film line, and the X-ray tube lifetime is short, the renewal cost costliness, and general available 2-3, and be not suitable for the polymkeric substance that measurement is made of multiple element, the signal source radioactivity is strong, is usually used in the measurement of single-elements such as steel plate.And interference microscope to be exactly method by the contrast interference fringe realize measurement to the sample surfaces pattern, also can be used for the thickness of MEASUREMENTS OF THIN, contrast is handled but this method need be carried out striped to the interferogram of two dimension, structure, disposal route be relative complex also, measure thickness and generally also can only be unsuitable for real-time commercial measurement certainly at 0.03um～1um.
Often use ellipsometer test to come MEASUREMENTS OF THIN thickness and refractive index at present.The basic ideas that the elliptic polarization method is measured are, the linearly polarized light that the polarizer produces becomes special elliptically polarized light after being orientated certain quarter wave plate, when it is projected the testing sample surface, as long as the polarizer is got suitable printing opacity direction, what come out by the testing sample surface reflection will be linearly polarized light. change according to the polarization state of polarized light before and after reflection, comprise the variation of amplitude and phase place, just can determine many optical characteristics of sample surfaces.Concrete device becomes linearly polarized light from the emergent light of light source 1 as shown in Figure 1 behind the polarizer 2, the polarization direction is by the position angle decision of the polarizer, and linearly polarized light passes through quarter wave plate 3 again, wherein the phasic difference δ of extraordinary ray and ordinary light=2 π (n
e-n
o) d/ λ, as (n
e-n
o) d/ λ=λ/4 o'clock, phasic difference between ordinary light and the extraordinary ray is 90 °, synthetic elliptically polarized light is radiated on the testing sample 7, and 8 is substrate, be generally another ellipse polarisation after reflection, rotate the polarizer, can make the ellipse polarisation of reflection become linearly polarized light, rotate the position angle of analyzer 4, make it reach the delustring state, detect by detector 5.If the refractive index of incident angle, lambda1-wavelength, air and substrate is known, by the ellipsometric parameter of measuring (Ψ, Δ), can obtain the refractive index n and the physical thickness d of film, but generally all not have analytic solution, can only provide numerical solution by computing machine 6 usually.The elliptic polarization method is to measure the common method of optics film refractive index and thickness, and the degree of accuracy height generally can reach nanometer scale, and scope is generally micron dimension.But because this method principle and operation more complicated can not be used for real-time detection.
Chinese patent literature " equipment and the method for measurement optics equivalent index of thin film and physical thickness " (number of patent application: 02137758.8).This patent has been mentioned a kind of by measuring equipment and the method that a plurality of angle reflectance spectrums obtain film refractive index and thickness simultaneously.This method is can interfere according to two secondary reflections at the interface of incident light at air-film-substrate, and its interference can show from reflectance spectrum.Record two different incidence angles θ
1, θ
2Reflectance spectrum R (the θ that contains interference information
1, ω) and R (θ
2, ω), adopt the reflectivity of optical thin film formula to fit this two reflectance spectrums simultaneously, obtain corresponding optical path difference Δ
1And Δ
2, at last according to refraction law, two equations of simultaneous can draw the refractive index n and the thickness d of film.But above-mentioned all measuring methods all are the reflective measurements of adopting, and promptly the light of each layer reflection interferes during two aspects by sample of light, extracts this interference signal, obtains thickness information.The common interference technique of utilizing is extracted thickness information, also all is reflective measurement.
Summary of the invention
The object of the present invention is to provide the measuring method of a kind of film thickness and refractive index, this method precision height, measurement range is big, and structure is flexible simultaneously, disposal route is simple, does not require the strict sample of placing; The present invention also provides the device of realizing this method.
The measuring method of film thickness provided by the invention and refractive index, its step comprises:
(a) light with the wideband light source outgoing is divided into two-beam by Amici prism, then respectively by a mirror reflects, two-beam after will being reflected by Amici prism again pools a branch of, form optical interference circuit, produce interference signal, survey the spectral information of interference signal again, and spectral information is carried out Fourier transform, obtain producing the optical path difference information S1 of two light paths of interference signal;
(b) sample thin film to be measured is placed on above-mentioned arbitrary catoptron before, repeating step (a) obtains producing the optical path difference information S2 of two light paths of interference signal;
(c) when the refractive index of sample to be measured is known, utilize optical path difference information S1 and S2, obtain sample thickness to be measured;
When the refractive index of sample to be measured was unknown, before being placed into same catoptron after angle of sample rotation to be measured, repeating step (a) again obtained producing the optical path difference information S3 of two light paths of interference signal; According to light path information S1, S2 and S3, calculate the refractive index and the film thickness that obtain film.
The optical measuring device of film thickness provided by the invention and refractive index comprises wideband light source, interference component, frequency domain sniffer and data processor;
Wideband light source, interference component and frequency domain sniffer are positioned on the same light path, and data processor is electrically connected with the frequency domain sniffer;
The light of wideband light source outgoing produces interference signal through interference component, passes through the frequency domain sniffer again, the spectral information of detectable signal light, and send spectral information to data processor, data processor is handled the data that obtain.
The present invention adopts optical means, and sample be can't harm, and has utilized interference technique, so the precision height.And carry out transmission-type and survey, the principle of utilizing optical path difference to change, resolution can reach micron dimension.Handle with the mode of frequency domain in addition, do not need device this has any moving in measuring process, and measurement range can reach a millimeter magnitude.And the information processing method of apparatus of the present invention is simple, and sample does not require that strictness is attached on the sample stage simultaneously, can make things convenient for to obtain film thickness information in real time.
The present invention surveys for transmission-type, promptly incident light is divided into the two-beam road with an Amici prism or light splitting piece, this two-beam road pools a branch of generation again after mirror reflects interferes, and sample just is placed in one one and interferes in the middle of the arm, only sees through from sample.So the present invention only is suitable for the thickness of the film that can be penetrated by light and the measurement of refractive index, but not requiring that film is attached in certain substrate or is strict with is placed on certain position.As this material that can be penetrated by light, reflectivity is far below catoptron, so the interference signal to noise ratio (S/N ratio) that obtains by reflection is low, and by mirror reflects, the signal that light forms is very strong.So the present invention is directed to the material that can be penetrated by light, can obtain interference signal in real time, accurately, easily, extract thickness and refractive index information.
Description of drawings
Fig. 1 is the ellipsometer test structural representation;
Fig. 2 is an optical detection apparatus structural representation of the present invention;
Fig. 3 is a Michelson interference structure synoptic diagram;
Fig. 4 relates to structural representation for Mach-Ze Deccan;
Fig. 5 is a frequency domain sniffer structural representation;
Fig. 6 is the interference signal figure of wideband light source;
Fig. 7 (a) is reflective detection mode, and Fig. 7 (b) is the transmission-type detection mode;
Fig. 8 is the structural representation of optical detection apparatus instantiation device of the present invention;
Fig. 9 is during for no film, with the optical path difference figure that reconstructs behind the interference signal Fourier transform;
Figure 10 is for to keep flat film, with the optical path difference figure that reconstructs behind the interference signal Fourier transform before the sample mirror;
Figure 11 for the certain angle that before the sample mirror, film tilted after, with the optical path difference figure that reconstructs behind the interference signal Fourier transform;
Light path synoptic diagram when Figure 12 passes through film for light;
Embodiment
The present invention is further detailed explanation below in conjunction with accompanying drawing and example.
As shown in Figure 2, apparatus of the present invention comprise wideband light source 9, interference component 10, frequency domain sniffer 11 and data processor 12.
As shown in Figure 4, Mach-Ze Deccan relates to structure and comprises light source 17, beam splitter 13,18, catoptron 14,15 and detector 16.If adopt this interference structure, interference component 10 comprises beam splitter 13,18, catoptron 14,15.Beam splitter 13 is divided into two bundles with the light of wideband light source 9 outgoing, is reflected away at a certain angle by first, second catoptron 14,15 respectively, pools a branch of then on second beam splitter 18.Be that the position that light beam drops on first, second beam splitter 13,18, first, second catoptron 14,15 is positioned on tetragonal four angles of light beam formation.What these four reflectings surface were arranged usually is intimate parallel, on their four angles that are centered close to parallelogram.
Because light source can be to disperse light source usually, adjusts light path so can add plus lens as required in interference structure.In following part is just to add 4 plus lens in the listed instantiation device of example with the Michelson interference structure, also as the part of interference component.Beam splitter can adopt light-splitting devices such as light splitting piece or Amici prism.
The interference signal that the light of wideband light source 9 outgoing produces behind interference component, pass through frequency domain sniffer 11 again, the spectral information of detectable signal light, and send spectral information to data processor 12 and do Fourier transform obtains producing the optical path difference information of two light paths of interference.Frequency domain sniffer 11 can adopt spectrometer, perhaps adopts structure as shown in Figure 5, comprises spectro-grating 19 and detection array 20, receives each wavelength intensity signal by linear detecting array or face detection array again after the spectro-grating beam split.When wideband light source 9 was the broadband scanning light source, frequency domain sniffer 11 also can adopt point probe.
During use, sample thin film is placed on one of them catoptron of interference component 10 before, the sample face is perpendicular to light path, film can not require and is attached on the catoptron, the light transmission film changes the optical path difference between two light paths.Under the known situation of sample refractive index, the relative optical path difference information that measures for twice (once place sample thin film, once not setting-out product film) handled to obtain thickness of sample in data processor 12 contrasts.
Under sample thin film refractive index condition of unknown, the sample face is rotated to an angle, measure for the third time according to above-mentioned same measuring method, relatively can calculate the light path information of light with above two times result by the film of inclination.The distance that the back light that tilts is propagated in film has changed, and contrasts this three light path information, and promptly three equations of simultaneous can draw the refractive index and the film thickness of film.
Usually the coherent ranges of wideband light source is very narrow, and the optical path difference of the two-way light that promptly interferes just can interfere in coherent ranges.As shown in Figure 6, if the light source center wavelength is 1327nm, bandwidth 70nm is according to formula
Coherent ranges is about 11um.Usually utilize wideband light source to carry out thickness direction and measure on a large scale, generally all need scanning, so just brought the influence of mechanical shock, or reduced speed and degree of accuracy, it is complicated that operation also becomes.The present invention still adopts wideband light source, and adopts frequency domain sniffer 11 and data processor 12 to carry out the frequency domain mode and handle.According to theoretical formula
λ wherein
0Be the light source center wavelength, Δ λ is the light source bandwidth, and n is the refractive index of medium that light penetrates, and N is the unit number of spectrometer detection array.Contrast equation (1), (2) as can be seen, investigative range has approximately increased N times than originally, generally can reach a millimeter magnitude.So just can under the situation of no-raster, obtain the thickness information of film.
It is normally reflective to use this frequency domain mode to survey in addition, shown in Fig. 7 (a), at this moment the light of two-layer totally three reflectings surface up and down of catoptron 14 and film 27 and the reflected light of reference mirror 15 interfere, what spectrometer received is the information of multi-coated interference optical superposition, through Fourier transform, will obtain the optical path difference of these three reflecting surface relative reference mirrors 15, thereby also can calculate the thickness of film.But generally far below the reflectivity of catoptron, signal to noise ratio (S/N ratio) is not high because of other material reflectivity.The resolution of the detection thickness of this method will be subjected to the restriction of wideband light source coherent ranges in addition, when promptly if the thickness of film is in coherent ranges, the bilevel distance of film can not be made a distinction, promptly resolution can not be less than the coherent ranges that is subjected to the light source bandwidth constraints.In fact for the measurement of film, this resolution is often not enough.The present invention takes the mode of transmission-type, shown in Fig. 7 (b), the reflected light that promptly can ignore film two surfaces about in the of 27, only adopt light from sample mirror (catoptron 14) return reflection surface, the interference signal degree of modulation of Huo Deing is bigger like this, can obtain reasonable signal to noise ratio (S/N ratio), the accuracy of measurement is also higher.To add film again handles with the relative optical path difference positional information contrast that does not add twice measurement of film, obtain sample thickness information, be exactly the principle of utilizing optical path difference to change like this, avoided the restriction of wideband light source coherent length, can obtain the resolution of micron or sub-micron.
Being example with the Michelson interference structure below is described in detail the structure of apparatus of the present invention.As shown in Figure 8, this device comprises wideband light source 9, spectrometer 11, Amici prism 13, first to fourth condenser lens 22,23,24,25, first, second catoptron 14,15, data processor 12.Light is derived from wideband light source 9 by optical fiber 21, becomes a divergence point light source, so converged by first lens 22, light is divided into two bundles by Amici prism 13 again.For convenience of description, be the sample mirror with first catoptron 14, second catoptron 15 is a reference mirror.Before arriving two catoptrons, light is focused into a bit by second, third lens 23,24 respectively.Light by 14,15 reflections of first, second catoptron after, converge into a branch of emergent light through Amici prism 13 again, pool click-through by the 4th lens 25 again and cross optical fiber 26 and be sent to spectrometer 11.Spectrometer 11 exports the spectral signal of interference signal to data processor 12, and data processor 12 carries out Fourier transform to the received signal, just can obtain the relative optical path difference of two mirrors.If before sample mirror 14, add upper film 27, film 27 does not require and is attached on the catoptron, only need be placed between sample mirror 14 and the collector lens 24, does for the second time again and measures, because the adding of film 27 makes the relative optical path difference of two catoptrons compare to some extent with measurement for the first time and changes.If the refractive index of film 27 is known, twice relative optical path difference information contrast processing can be obtained thickness of sample.Data processor 12 is used for doing the contrast processing of Fourier transform and information.Suppose that wideband light source 9 centre wavelengths are 1327nm, bandwidth is 70nm, and the wideband light source interference signal spectrum that is received by spectrometer 11 carries out Fourier transform by processor 12, promptly
I(z)＝FT{I(k)} (3)
When not adding film 27, the optical path difference information that obtains sample mirror relative reference mirror as shown in Figure 9.Between first catoptron 14 and the 3rd condenser lens 24, put thin film 27, film 27 vertical and light paths, promptly parallel with catoptron 14, to do for the second time and measure, the interference signal spectrum that received by spectrometer 11 this moment is through the information that obtains relative optical path difference behind the Fourier transform as shown in figure 10.Comparison diagram 9, Figure 10 can see that because introduced thin film, the optical path difference between two catoptrons changes to some extent, and the sample mirror was respectively with respect to the optical path difference position of reference mirror when two peaks were promptly measured for twice.And then with this twice relative optical path difference information contrast processing, two peaks are expressed as x1, x2 respectively, then
(n2-n1)*d＝x2-x1＝5.1um (4)
Wherein n2 is the plastic sheeting refractive index, and n1 is an air refraction, and d is a film thickness, if get n1=1, n2=1.47, then d=10.85um.
If refractive index the unknown of film can be with angle of film 27 rotations, the optical path difference information of sample mirror 14 relative reference mirrors 15 as shown in figure 11 at this moment.The index path that Figure 12 propagates in film for light, solid line are represented the light path of propagation of this moment of light, when dotted line is represented not have film or film be parallel to the propagation light path in 14 time of catoptron.As follows according to Figure 12 derivation formula:
(n2-n1)d＝x2-x1 (5)
n2*d/cosθ
2+n1*L-n1*d/cosθ
1＝x3-x1 (6)
L＝d/cosθ
2*sin(θ
1-θ
2)*tanθ
1 (7)
n1*sinθ
1＝n2*sinθ
2 (8)
N2 is a film refractive index, and n1 is an air refraction, and the two catoptron relative positions that x1 records when not putting film, x2 are the two catoptron relative positions that film records when keeping flat, and x3 is the two catoptron relative position (θ that film records when tiltedly putting
1The normal of placing for film and the angle of incident light), L as shown is the segment distance that light is propagated in air.With x1=61.19um, x2=66.29um, x3=69.69um, n1=1 bring formula (5) (6) (7) (8) into and get: n2=1.5.
Claims (5)
1, the measuring method of a kind of film thickness and refractive index, its step comprises:
(a) light with the wideband light source outgoing is divided into two-beam by Amici prism, then respectively by a mirror reflects, two-beam after will being reflected by Amici prism again pools a branch of, form optical interference circuit, produce interference signal, survey the spectral information of interference signal again, and spectral information is carried out Fourier transform, obtain producing the optical path difference information S1 of two light paths of interference signal;
(b) sample thin film to be measured is placed on above-mentioned arbitrary catoptron before, repeating step (a) obtains producing the optical path difference information S2 of two light paths of interference signal;
(c) when the refractive index of sample to be measured is known, utilize optical path difference information S1 and S2, obtain sample thickness to be measured;
When the refractive index of sample to be measured was unknown, before being placed into same catoptron after angle of sample rotation to be measured, repeating step (a) again obtained producing the optical path difference information S3 of two light paths of interference signal; According to light path information S1, S2 and S3, calculate the refractive index and the film thickness that obtain film.
2, realize the device of the described method of claim 1, it is characterized in that: it comprises wideband light source (9), interference component (10), frequency domain sniffer (11) and data processor (12);
Wideband light source (9), interference component (10) and frequency domain sniffer (11) are positioned on the same light path, and data processor (12) is electrically connected with frequency domain sniffer (11);
The light of wideband light source (9) outgoing produces interference signal through interference component (10), pass through frequency domain sniffer (11) again, the spectral information of detectable signal light, and send spectral information to data processor (12), data processor (12) is handled the data that obtain.
3, device according to claim 2 is characterized in that: interference component (10) comprises first beam splitter (13), first, second catoptron (14,15); The reflecting surface of first, second catoptron (14,15) is respectively with vertical from the two-beam direction of first beam splitter (13) outgoing.
4, device according to claim 2 is characterized in that: interference component (10) comprises first, second beam splitter (13,18) and first, second catoptron (14,15);
The position that light beam drops on first, second beam splitter (13,18), first, second catoptron (14,15) is positioned on tetragonal four angles of light beam formation.
5, device according to claim 4 is characterized in that: first, second beam splitter (13,18), and on four angles that are centered close to parallelogram of the reflecting surface of first, second catoptron (14,15).
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