CN101200349A - Hard anti-reflection transparent zeolite bed as well as manufacturing method thereof and solution generating zeolite bed - Google Patents
Hard anti-reflection transparent zeolite bed as well as manufacturing method thereof and solution generating zeolite bed Download PDFInfo
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- CN101200349A CN101200349A CNA2006101667677A CN200610166767A CN101200349A CN 101200349 A CN101200349 A CN 101200349A CN A2006101667677 A CNA2006101667677 A CN A2006101667677A CN 200610166767 A CN200610166767 A CN 200610166767A CN 101200349 A CN101200349 A CN 101200349A
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Abstract
The invention discloses a hard anti-reflective transparent zeolite layer, which comprises a zeolite nanometer structure arranged on the substrate, the zeolite nanometer structure is a multi-pore structure that is formed by stacking a plurality of zeolite crystals vertically and upwardly from the substrate, wherein the porosity is gradually increased along the structural height, thereby providing gradual refraction index grads. The invention also comprises the manufacture method of the hard anti-reflective transparent zeolite layer and the solution that can produce transparent zeolite layer.
Description
Technical field
The present invention relates to a kind of individual layer anti-reflective film technology, and be particularly related to a kind of nanometer transparent Zeolite membrane structures and manufacture method thereof with refractive index gradient of gradual change, and the solution that can produce this nano zeolite membrane structure.
Background technology
Along with the fast development of 3C Product with popularize, anti-reflective film changes elementary necessaries into from unattainable product gradually.Every need see through window screen receives message by eyes product, all need use anti-reflective film, its range of application comprises the header board (base material is a glass) of header board (base material is PC), plasma display panel (PDP) and iconoscope (CRT) of upper plate (base material is PET), projection TV of light polarizing film (base material is TAC), the contact panel of liquid-crystal display and optical mirror slip etc.When this is the medium of the different refractivity because light is passed through, can produce the partly physical phenomenon of breakthrough portion part reflection, when therefore handling as if no antireflection, incident light will come back reflective to cause many fan's light, dazzle and ghost etc. between many interfaces, so anti-reflective film has its necessity to the display quality that improves optical system, so the there's no one who doesn't or isn't fourth of the twelve Earthly Branches foot input exploitation with all strength of world all big enterprises.
The method that reduces reflectivity has two: one, utilizes the destruction interference principle, and another then is to utilize the change of refractive index gradient as antireflecting main mechanism.Utilizing aspect the destruction interference principle is that the optical thickness (product of specific refractory power and thickness) of control coating is the odd-multiple of lambda1-wavelength λ/4, make reflected light form destruction interference, approach zero effect and obtain reflectivity, but light not merely has single wavelength, then must want multi-layer film structure so desire in the wavelength domain of broadness, all to obtain very low reflectivity, common processing procedure has dry process (as vacuum evaporation, sputter etc.), wet process is (as dipping, rotation, nick version printing coating etc.) etc., wherein dry process is effective but throughput rate is slow, the cost height, the wet process effect is relatively poor but the low advantage of the fast cost of throughput rate is arranged.The principle of utilizing refractive index gradient to change can not have the light reflex because of the specific refractory power sudden change when being allow light pass through medium that specific refractory power gradually changes, common minute processing procedure has etch process (as glass substrate etc.), wet process (as sol-gel method), (nanoaperture membrane process), micro-embossing or pressing mold processing procedure etc. are separated, because the number of plies of this method needs only one deck, so future development hves great potential.
Of the present invention hard anti-reflection transparent zeolite bed be to belong to works with nano surface level roughness and porosity, because of its structure possesses the effect that internal void and refractive index gradient gradual change are arranged, so only individual layer can obtain good antireflective property.
Zeolite layer material of the present invention is a kind of by SiO
4Tetrahedron element is with the three-D space structure that oxo bridge is connected to form, and contains the molecule hole and has the silicic acid mineral of a large amount of inner areas.The duct of zeolite is mostly between 0.3 to 1.0 nanometer, so often as catalyzer or sorbent material with molecular selectivity.In this type of was used, the zeolite of use all was powder or granulous forming composition.
Zeolite also is made into film and uses, for example United States Patent (USP) 4,699,892 is just narrated a kind of way of the composite zeolite film that is used for separate substance, this method is made zeolite becomes the polycrystal film that is supported on the porous substrate, so that according to the molecular size separate substance.In addition, the zeolite membrane of making on the compact substance base material also sees some application.For example United States Patent (USP) 5,151,110 is coated in zeolite on the piezoelectric, measures ultralow quantification material with the adsorptive power of utilizing zeolite.United States Patent (USP) 5,843,392 are described in the directive crystallization of zeolites of making on the compact substance structured material, are used for working as catalyzer.In addition, U.S. Patent Application Publication 20010008662 has been described oxygen-absorbing substance and zeolite layer compound, makes the oxygen barrier layer on wrapping material.And U.S. Patent Application Publication 20020110699 has been described a kind of application of zeolite layer as corrosion protection of making in the metallic surface.U.S. Patent application 20020134995 is used in zeolite membrane in the manufacture of semiconductor and uses as low dielectric layer.
Though the existing various application of prior art about zeolite, as catalyzer, sorbent material, the saturating film of separation or corrosion protection etc., but the prepared zeolite membrane of prior art is normally opaque, so can not be used on the optical applications, up to the present not have the people that transparent zeolite is applied on anti-reflective film or other blooming as yet.We successfully are made into the transparent zeolite thin layer that contains nanoaperture and roughness and measure its optical characteristics through long-time research, finish the conception of making transparent zeolite reflectance coating coating finally.
Summary of the invention
One of purpose of the present invention provides the anti-reflection transparent zeolite bed of a kind of novelty, but and the hard layer of double as anti-scratching wearproof film.According to the preferred embodiments of the present invention, this hard anti-reflection transparent zeolite bed comprising: be arranged at the zeolite nanostructure on the base material, this zeolite nanostructure comprises the cellular structure that a plurality of zeolite nanocrystals are piled into vertically upward by this base material, except the rete that low-refraction is provided, its porosity is cumulative with structure height, thereby the refractive index gradient of gradual change is provided.
Two of purpose of the present invention just provides a kind of transparent zeolite bed solution that produces, and comprising: will contain silicon source, water, reach zeolite structured directed agents (structure-directing agent; SDA) mixing solutions forms through concentrating heating.
Three of purpose of the present invention just provides a kind of making method of hard anti-reflection layer, and its film forming stiffening temperature can be lower than 100 ℃, therefore not only can coat on the glass substrate and also can coat on the general plastic optics film.According to the preferred embodiments of the present invention, the key step of this method comprises: the aforementioned transparent zeolite bed solution that produces (a) is provided; (b) adjust the concentration that this can produce transparent zeolite bed solution; (c) describedly produce transparent zeolite bed solution coat on base material with concentration is adjusted; And (d) base material after this coating is carried out heat treated being lower than under the saturated humidity, produce transparent zeolite bed solution and be converted into transparent zeolite bed so that coat described on this base material.
For above and other objects of the present invention, feature and advantage can be become apparent more, cited below particularlyly go out preferred embodiment, and in conjunction with the accompanying drawings, be described in detail below:
Description of drawings
Fig. 1 is the diagrammatic cross-section of the zeolite nanostructure of the preferred embodiment of the present invention.
Fig. 2 is the atomic force microscope photo of the zeolite nanostructure of the embodiment of the invention 3.
Description of reference numerals
100～substrate;
200～zeolite nanostructure;
H～highly;
D～gap.
Embodiment
It is to belong to the works with nano surface level roughness that antireflection of the present invention is filmed, because of the nanometer porous property structure on its surface possesses the effect that the refractive index gradient gradual change is arranged, so only individual layer can obtain good antireflective property.Because this material is nano level crystalline material, therefore also with the characteristic of clear, colorless, high-hardness wear-resistant, therefore the stiffening temperature of film forming processing procedure can be lower than 100 ℃ in addition, not only can coat on the glass substrate but also can coat on the general plastic optics film.
See also Fig. 1, this figure shows that zeolite nanostructure 200 of the present invention comprises the cellular structure that a plurality of crystallization of zeolites are piled into vertically upward by base material 100, and its porosity is cumulative with structure height h, thereby the refractive index gradient of gradual change is provided, and only individual layer can obtain good antireflective property.In the preferred embodiment shown in Fig. 1, crystallization of zeolites is the class pyramidal structure that is stacked vertically, and therefore the refractive index gradient of gradual change can be provided.Yet the structure that zeolite of the present invention is piled up is not exceeded with the class pyramidal structure, and can be the structure of other taper or gradually thin (taper).It should be noted that Fig. 1 only is Utopian synoptic diagram, the top of practical structures also may not be a pointed cone as shown in FIG., but comprises butt shape (flat top) top or circular-arc (round top) top.In addition, experiment shows that the internal structure of zeolite crystal of the present invention also comprises hole, Gu specific refractory power is lower.Therefore, except refractive index gradient, still can provide destruction interference, further reduce specific refractory power.
According to the present invention, the crystallization of zeolite nanostructure 200 or spacing are all best less than 1/4th of optical wavelength, even less than 1/10th, to reach optic transparency.Therefore, the crystallization of zeolite nanostructure 200 and gap d are preferably all less than 100 nanometers, preferably less than 50 nanometers.And crystallization height h is preferably between the 30-300 nanometer.
Transparent nano of the present invention is zeolite structured to have certain roughness, and it belongs to the inorganic crystal material, therefore also possesses good hardness, connectivity and abrasion resistance properties.Of the present invention filming when being coated on the plastic basis material, pencil hardness usually can be greater than 3H, generally approximately between 3H-6H.
Method of the present invention comprises that at first preparation can produce transparent zeolite bed solution, comprising: contain silicon source (silica source), water, reach zeolite structured directed agents (structure-directing agent; SDA) mixing solutions.The silicon source that it used for example is to be selected to comprise that orthosilicic acid C1-C2 alkyl ester (C1-C2alkyl orthosilicate), zeolite structured directed agents are selected from quaternary ammonium hydroxide (quaternaryammonium hydroxide) and its esters.In a preferred embodiment, aforementioned silicon source can be ethyl orthosilicate (ethyl orthosilicate), and zeolite structured directed agents can be TPAOH (tetrapropylammonium hydroxide).In addition, possess hydrophilic needs according to filming in the solution and add source metal, aluminum metal source for example, or possess hydrophobic needs according to filming and add other and replace atom, for example nonmetal source fluorine is to prepare aforementioned supersiliceous zeolite.
After described solution preparation is finished, earlier with the spissated mode general of heating wherein silica content bring up between 20～40wt%, generally heat appropriate time being lower than under 100 ℃ the temperature, for example preferably can be in about 80 ℃ of down heating 13～30 hours, or for the degree of crystallinity that improves particle can be 150～200 ℃ of heating 1～2 hour down.
Afterwards, this can be produced transparent zeolite bed solution and transfer to specific concentrations.This specific concentrations is generally 0.01-3wt%, is preferably about 0.5-1wt%.The solvent that can produce transparent zeolite bed solution in order to dilution for example is water and carbonatoms less than 6 alcohols mixture.In addition, in this step, also can add tensio-active agent, be beneficial to control the arrangement of formed crystallization of zeolites, wherein tensio-active agent can be ion or nonionogenic tenside, for example is selected from nonionogenic tenside or the quaternary cationics or the organic sulfonic acid salt anionic surfactant commonly used of polyoxyethylene (polyethylene oxide) and polyoxypropylene (polypropylene oxide) group connection.The addition preference of tensio-active agent is lower than that 10 grams/every liter are described to produce transparent zeolite bed solution in this way.
Then, implement the step of solution coat on base material that producing of specific concentrations is transparent zeolite bed.Wherein for example spin coating of Tu Bu method (spin), dip-coating (dip), spraying (spray), nick version printing (micro-gravure), liquid level coating (meniscus) or tension force base material extruding type (web tension) etc.In addition, the kind of applied base material is very extensive, such as Silicon Wafer, glass, plastic plate or plastic optics film etc., so do not limit the material of base material.After this step, can wait for a period of time earlier allow the dilution usefulness solvent evaporates, carry out next step again.
Subsequently, the base material after enforcement will be coated with is lower than the step of handling under the saturated humidity (saturated humidity) at 70-150 ℃, so that the solution of coating on the base material is converted into the crystallization of zeolites film, the temperature of processing should be decided on the kind of base material.This step can be carried out in steam treatment chamber, for example under the relative humidity (relative humidity) as 5-10% under the lower humidity, be warmed to earlier 70 to 150 degree Celsius, kept about 10-30 minute, improve relative humidity to 30%～98% again, continuation was heated for some time under 70～150 degree Celsius, as 2 to 12 hours.When taking out from the vapour cure chamber, just obtained on the base material transparent continuously and the crystallization of zeolites film of adhere firmly, wherein hole all presents transparence less than 100 nanometers between the crystallization of zeolites of the crystallization of zeolites film of Xing Chenging and crystallization thereof, and the zeolite in this crystallization of zeolites film can be to have zeolite structured supersiliceous zeolite of MFI (high-silica zeolite) or pure silicon zeolite (pure-silica zeolite).It should be noted, though the temperature of above-mentioned heating is generally approximately between 70-150 ℃, but then can be lower than 100 ℃ if be coated on the plastic base, if and be coated on the glass substrate, then can in follow-up further in air heated substrate to 350-550 ℃, to remove the organism (organic) in the crystallization of zeolites film.
The TPAOH aqueous solution 25.4 grams of getting 40% concentration add in 20.8 gram deionized waters and the 41.6 gram ethyl orthosilicates.Under room temperature, stir and obtained clear liquor in 1.5 hours.This clear liquor is placed 80 degree Celsius heating taking-up after 18 hours down, as producing transparent zeolite bed solution.Three's mol ratio is an ethyl orthosilicate: TPAOH: water=1: 0.25: 10, silicon oxide weight percent ratio: 13.68%.Above-mentioned precursor was heated 18 hours down 80 ℃ (temperature slowly raises), and precursor reduces to 35.29 grams (52.46 grams of removing should be almost alcohol) by original weight 87.75 grams.This moment silicon oxide weight percent ratio: 34wt%, TPAOH weight percent ratio: 28.76wt%, all the other should be water, and this moment, three's mol ratio was a silicon oxide: TPAOH: water=1: 0.25: 3.65, gains are transparent, sticky, meeting mobile jellies.Add 95%EtOH afterwards and be diluted to proper concn, this example is the transparent zeolite solution that silicon oxide weight percent ratio is adjusted into 10wt%.If this transparent zeolite solution again with the coating liquid of alcohol dilution becoming 0.7wt% silica content, records its median size through laser light scattering caliper (plus-90) and is: 68.7nm (standard deviation: 0.5nm), halfwidth: 12.2nm (standard deviation: 1.9nm).
Getting the silicon oxide weight percent ratio that had before prepared is transparent zeolite solution 1 gram of 10wt%, and 95% alcohol that adds 27 grams stirs 10 minutes as coating liquid, and this moment, silicon oxide weight percent ratio was 0.357wt%.Prepare clean cellulosetri-acetate (TAC) blooming as base material, coating liquid is coated on the cellulosetri-acetate blooming in the blade coating mode.After being coated with test piece in baking oven under 80 degree Celsius dry 2.5 hours.The full impregnated luminosity of this single face coating (with Nippon Denshoku-300A apparatus measures) can be increased to 94.48% from original uncoated 93.15%, increases by 1.33%.
Comparative example (control group)
Tensio-active agent tween20 (available from Aldrich company) with 0.03,0.10,0.50 gram is dissolved in the right amount alcohol fully respectively, adds in the transparent zeolite solution of above-mentioned 10wt% to make transparent clarifying coating liquid A, B, the C that silicon oxide weight percent ratio is 0.357wt% again.Similarly these coating liquids are coated on the cellulosetri-acetate blooming in the blade coating mode.After being coated with test piece was obtained transparent filming in baking oven after under 80 degree Celsius dry 2.5 hours.The full impregnated luminosity of these single face coatings (with Nippon Denshoku-300A apparatus measures) is 93.24%, 92.85%, 93.15% respectively, there is no increase.
Embodiment 2
Various coating liquids are identical with embodiment 1, only change the handling procedure after be coated with, spend being warmed to Celsius 80 under as relative humidity 5-10% under the lower humidity earlier, kept about 20 minutes, improve relative humidity to 90% again, obtain transparent coating after continuing under 80 degree Celsius, to heat 2.5 hours.The full impregnated luminosity of these single face coatings (with Nippon Denshoku-300A apparatus measures) respectively is 95.84%, 95.03%, 95.26%, 95.28%, has increased by 2.69%, 1.88%, 2.11%, 2.13% when more uncoated respectively.
Embodiment 3
Getting the silicon oxide weight percent ratio that had before prepared is transparent zeolite solution 2 grams of 10wt%, adds in 27 95% alcohol that restrain and stirs 10 minutes as coating liquid, and this moment, the weight percent ratio of silicon oxide was 0.689wt%.Prepare clean cellulosetri-acetate (TAC) blooming as base material, coating liquid is coated on the cellulosetri-acetate blooming in the blade coating mode.Be coated with the back earlier to be warmed to 80 degree Celsius under the relative humidity as 5-10% under the lower humidity, kept about 20 minutes, improved relative humidity to 90% again, continuation heating under 80 degree Celsius obtained transparent coating after 2.5 hours.The full impregnated luminosity of this single face coating (with Nippon Denshoku-300A apparatus measures) can be increased to 97.08% from original uncoated 93.15%, increases by 3.93%.Reflectivity is (with Perkin Elmer-Lambda 900 apparatus measures; The test piece another side is uncoated, coarsening-free or dye black the processing) then be reduced to 5.2% from original uncoated 8.3%, if coated substrate is two-sided, its reflectivity can be reduced to about 2%.The pencil hardness of coating caudacoria is 5H～6H, and the Haze behind the wear test (Taber Abrasive Test:500g/500 commentaries on classics) is then below 4.8.The image that is obtained with the atomic force microscope observation zeolite membrane as shown in Figure 2, as seen from Figure 2, this zeolite membrane is built by obvious granulous zeolite, forms in order and have the zeolite membrane of roughness.
So this experimental verification described zeolite membrane on the TAC blooming, can bring into play wear-resistant and antireflecting function really.
In sum, characteristics of the present invention are at making the transparent zeolite film of (thickness is less than below 0.5 micron) as thin as a wafer on the base material.After producing this zeolite membrane on the base material, can have wear-resistant and antireflecting function.And another characteristics of the zeolite membrane of made of the present invention are crystal grain marshalling and may command surfaceness.
And, the making method of zeolite membrane of the present invention is with the difference of all method maximums of past: at first (one) use proper concn produces transparent zeolite bed solution as coating liquid, (2) will scribble the film that can produce transparent zeolite bed solution and heat being lower than under the condition of saturated humidity then, make zeolite solution be converted into zeolite membrane.
Though the present invention discloses as above with a plurality of preferred embodiments; right its is not in order to limit the present invention; those of ordinary skill in the art; without departing from the spirit and scope of the present invention; change arbitrarily and retouching with can doing, so protection scope of the present invention should be as the criterion with the appended claims restricted portion.
Claims (32)
- One kind hard anti-reflection transparent zeolite bed, comprising:Be arranged at the zeolite nanostructure on the base material, described zeolite nanostructure comprises the cellular structure that a plurality of crystallization of zeolites are piled into vertically upward by this base material, and its porosity is cumulative with structure height, thereby the refractive index gradient of gradual change is provided.
- 2. as claimed in claim 1 hard anti-reflection transparent zeolite bed, the gap of the wherein said cellular structure of being piled up by crystallization of zeolites is less than 100 nanometers.
- 3. as claimed in claim 1 hard anti-reflection transparent zeolite bed, the height of the wherein said cellular structure of being piled up by crystallization of zeolites is approximately between the 30-300 nanometer.
- 4. as claimed in claim 1 hard anti-reflection transparent zeolite bed, wherein said zeolite comprises supersiliceous zeolite or the pure silicon zeolite with MFI structure.
- 5. as claimed in claim 1 hard anti-reflection transparent zeolite bed, pencil hardness was greater than 3H when it coated on the plastic basis material.
- 6. as claimed in claim 1 hard anti-reflection transparent zeolite bed, its pencil hardness is approximately between 3H-6H.
- 7. as claimed in claim 1 hard anti-reflection transparent zeolite bed, wherein said base material is glass baseplate or plastic basis material.
- 8. one kind can produce transparent zeolite bed solution, comprising: will contain silicon source, water, and the mixing solutions of zeolite structured directed agents form through concentrating heating.
- 9. as claimed in claim 8ly produce transparent zeolite bed solution, the temperature that wherein heats described mixing solutions is lower than 100 ℃ and heated 13～30 hours.
- 10. as claimed in claim 8ly produce transparent zeolite bed solution, the temperature that wherein heats described mixing solutions is 150～200 ℃ and heated 1～2 hour.
- 11. as claimed in claim 8ly produce transparent zeolite bed solution, wherein said mixing solutions also comprises source metal.
- 12. as claimed in claim 8ly produce transparent zeolite bed solution, wherein said mixing solutions also comprises nonmetal source.
- 13. as claimed in claim 8ly produce transparent zeolite bed solution, the mol ratio in wherein said zeolite structured directed agents and described silicon source is approximately between 0.2-0.6, and the mol ratio in water and described silicon source is approximately between 4-100.
- 14. transparent zeolite bed solution, the wherein said orthosilicic acid C1-C2 alkyl ester of producing as claimed in claim 8.
- 15. as claimed in claim 8ly produce transparent zeolite bed solution, wherein said zeolite structured directed agents is selected from quaternary ammonium hydroxide or its esters.
- 16. as claimed in claim 8ly produce transparent zeolite bed solution, wherein said silicon source is an ethyl orthosilicate, described zeolite structured directed agents is a TPAOH.
- 17. as claimed in claim 8ly produce transparent zeolite bed solution, wherein the content of silicon oxide is about 20～40wt%.
- 18. a hard anti-reflection transparent zeolite bed manufacture method comprises:(a) provide the transparent zeolite bed solution that produces as claimed in claim 8;(b) adjust the described concentration that produces transparent zeolite bed solution;(c) describedly produce transparent zeolite bed solution coat on base material with concentration is adjusted; And(d) base material after this coating is carried out heat treated being lower than under the saturated humidity, produce transparent zeolite bed solution and be converted into transparent zeolite bed so that coat described on this base material.
- 19. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, the wherein said transparent zeolite bed cellular structure that comprises that a plurality of crystallization of zeolites are piled into vertically upward by this base material, and its porosity is cumulative with structure height, thereby the refractive index gradient of gradual change is provided.
- 20. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein step (b) comprises the concentrated described transparent zeolite bed solution that produces.
- 21. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein step (b) comprises with the described concentration that produces transparent zeolite bed solution of solvent cut.
- 22. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein step (b) comprises the described weight concentration that produces the silicon oxide in the transparent zeolite bed solution is adjusted to 0.01-3wt%.
- 23. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein said solvent comprise that water and carbonatoms are less than 6 alcohols mixture.
- 24. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein step (b) comprises that also the interpolation tensio-active agent is to described the generation in the transparent zeolite bed solution.
- 25. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 24, described tensio-active agent are selected from nonionogenic tenside or the quaternary cationics or the organic sulfonic acid salt anionic surfactant of polyoxyethylene, polyoxypropylene group connection.
- 26. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 24, the addition of described tensio-active agent are lower than, and 10 grams/every liter are described to produce transparent zeolite bed solution.
- 27. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein said base material are Silicon Wafer, glass, plastic plate or plastic optics film.
- 28. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein the coating method of step (c) is selected from spin coating, dip-coating, spraying, the printing of nick version, liquid level coating or tension force base material extruding type.
- 29. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein step (d) comprising: earlier under the relative humidity of about 5-10%, carry out first section heating, improve again relative humidity extremely about 30-98% carry out second section heating.
- 30. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 29 wherein is about 10-30 minute first period heat-up time, be about 2-12 hour second period heat-up time.
- 31. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein the Heating temperature of step (d) is approximately between 70-150 ℃.
- 32. hard anti-reflection transparent zeolite bed manufacture method as claimed in claim 18, wherein said base material are plastic basis material, and wherein the Heating temperature of step (d) is lower than 100 ℃.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102004270A (en) * | 2009-08-26 | 2011-04-06 | 索尼公司 | Optical element, and processing apparatus and method for reducing reflection |
| CN104246667A (en) * | 2012-03-30 | 2014-12-24 | 应用材料公司 | Transparent body for use in a touch panel and method and system for manufacturing transparent body |
| CN108388041A (en) * | 2018-02-08 | 2018-08-10 | 深圳市华星光电技术有限公司 | Color membrane substrates and its manufacturing method, the manufacturing method of light screening material and light shield layer |
| WO2018165820A1 (en) * | 2017-03-13 | 2018-09-20 | Boe Technology Group Co., Ltd. | Anti-reflective coating, touch substrate, display apparatus, and method of fabricating anti-reflective coating |
| CN116514464A (en) * | 2023-04-27 | 2023-08-01 | 重庆交通大学 | Reflective cement mucilage and reflective semi-flexible pavement material |
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2006
- 2006-12-14 CN CNA2006101667677A patent/CN101200349A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102004270A (en) * | 2009-08-26 | 2011-04-06 | 索尼公司 | Optical element, and processing apparatus and method for reducing reflection |
| CN104246667A (en) * | 2012-03-30 | 2014-12-24 | 应用材料公司 | Transparent body for use in a touch panel and method and system for manufacturing transparent body |
| CN104246667B (en) * | 2012-03-30 | 2018-04-10 | 应用材料公司 | Method for the transparent body and the manufacture transparent body of contact panel |
| WO2018165820A1 (en) * | 2017-03-13 | 2018-09-20 | Boe Technology Group Co., Ltd. | Anti-reflective coating, touch substrate, display apparatus, and method of fabricating anti-reflective coating |
| CN109196388A (en) * | 2017-03-13 | 2019-01-11 | 京东方科技集团股份有限公司 | Anti-reflection coating, touch base plate, display device and the method for manufacturing anti-reflection coating |
| US10481299B2 (en) | 2017-03-13 | 2019-11-19 | Boe Technology Group Co., Ltd. | Anti-reflective coating comprising nano-flakes for reducing reflection of light, and touch substrate and display apparatus having the same |
| CN108388041A (en) * | 2018-02-08 | 2018-08-10 | 深圳市华星光电技术有限公司 | Color membrane substrates and its manufacturing method, the manufacturing method of light screening material and light shield layer |
| CN116514464A (en) * | 2023-04-27 | 2023-08-01 | 重庆交通大学 | Reflective cement mucilage and reflective semi-flexible pavement material |
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