CN100580505C - Thin film type adjustable phase retarder - Google Patents

Thin film type adjustable phase retarder Download PDF

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Publication number
CN100580505C
CN100580505C CN200810032709A CN200810032709A CN100580505C CN 100580505 C CN100580505 C CN 100580505C CN 200810032709 A CN200810032709 A CN 200810032709A CN 200810032709 A CN200810032709 A CN 200810032709A CN 100580505 C CN100580505 C CN 100580505C
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phase delay
phase
delay chip
adjusting frame
turntable
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CN200810032709A
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CN101236306A (en
Inventor
董洪成
李笑
申雁鸣
黄建兵
易葵
邵建达
范正修
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Shanghai Institute of Optics and Fine Mechanics of CAS
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Shanghai Institute of Optics and Fine Mechanics of CAS
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Abstract

The invention provides a thin-film type adjustable phase retarder which consists of two thin-film type phase delay plates, two three-dimensional optical adjusting mounts and a precise rotating platform. Two phase delay plates are arranged on the rotating platform and ensure that reflecting surfaces are parallel; a beam of light enters to the first phase delay plate at a certain angle, reflects to the second phase delay plate and emerges parallel to the incident light direction through the second reflection. The rotating platform rotates to change an incidence angle of the beam of light; the phase delay or compensation dosage is also changed along the change of the incident angle, thereby realizing precise and tunable phase delay. The thin-film type adjustable phase retarder is characterized in simple structure, easy manufacturing, high degree of precision, simple operation, multi-purpose, etc.

Description

Thin film-type adjustable phase retarder
Technical field
The present invention is relevant with film, is a kind of thin film-type adjustable phase retarder, and it is to utilize special phase retardation film to carry out the high precision adjusting of phase place or the device of compensation, can be applicable in the light path of phase control or compensation, and is simple and practical.
Technical background
Phase place is to describe an important parameter of light beam intrinsic property, and it also is the function in time and space.More frequent what use is phase differential, and promptly the phase place of two different light beams is poor.In interference of light, phase differential has been played the part of important role, if accurately control phase is poor, and the result of interference that can obtain to envision just; In polarisation of light, phase differential is important especially, such as the phase differential that changes on two direction of vibration of light beam, just can realize the conversion between elliptically polarized light and the line polarisation, the conversion between left-handed ellipse polarisation and the ellipse polarisation of dextrorotation.Therefore, in relating to application such as interference of light and polarization state, the control compensation of phase place or phase differential is very important.But phase differential is the fast variable element in time or space, and after transmitting through space length discrepancy delta z such as two-beam, the phase differential of generation is: δ = 2 πn λ Δz , Wherein λ is a wavelength, and n is the propagation medium refractive index, and when Δ z changes a wavelength, phase differential has just changed 2 π radians, so the quantitative control of phase differential and being not easy.A kind of phase compensator commonly used is Babinet-Suo Lier phase compensator, but this phase delay device is made of crystal, but should not be used for the situation of heavy caliber light beam, and price is also more expensive.
Summary of the invention
The object of the present invention is to provide a kind of thin film-type adjustable phase retarder, being applicable to the situation of larger caliber light beam, and have simple in structure, making is easy, easy and simple to handle, precision is high, cost is low and characteristics such as multi-usage.
We know that light beam can produce a phase shift after the reflection of dieletric reflection film, and phase-shift phase is by the media coating optical thickness and the interface decision of light beam experience, with the incident angle monotone variation.In addition, when tilting to use, because P light (vertical incidence surface vibration) is different with the effective admittance of S light (parallel plane of incidence vibration), i.e. phase shift (phase delay) difference, so produced phase differential between P light and the S light.Utilize these character, both can produce arbitrarily controlled phase delay, also can compensation of phase poor.Therefore, technical solution of the present invention is as follows:
A kind of thin film-type adjustable phase retarder, be characterized in that it is by first phase delay chip and second phase delay chip, first optical adjusting frame and second optical adjusting frame and a rotation platform are formed, its position relation is: described rotation platform is made up of fixing base plate and turntable, described first phase delay chip and second phase delay chip are sticked respectively in the picture frame of described first optical adjusting frame and second optical adjusting frame, described first optical adjusting frame and second optical adjusting frame are fixed on the upper surface of the turntable of described rotation platform abreast, and make the reflecting surface of described first phase delay chip relative with the reflecting surface of second phase delay chip, parallel and perpendicular to the upper surface of described turntable, the center of described turntable equates to the distance of the reflecting surface of described first phase delay chip and second phase delay chip.
The fixed form of the turntable of described first optical adjusting frame and second optical adjusting frame and described rotation platform is gluing or screw is fixed.
The sidewall of the base plate of described rotation platform is provided with handwheel, rotates to drive turntable, and the periphery of this turntable is carved with angle line, is carved with alignment line on the wall of this base plate, and the slewing area of universal stage is 360 degree.
Described first phase delay chip and second phase delay chip are a kind of dielectric reflection films with same structure, in wide range, has very high reflectivity, phase-delay quantity is linear change with the incident angle difference of light beam, the simplest rectangle or the circle of being shaped as of this phase delay chip.
The film structure of the dielectric reflection film of described first phase delay chip and second phase delay chip is: (HL) ^ 140.4H wherein H is ZnS, refractive index is 2.58 (550nm), and L is MgF 2, refractive index is 1.38 (550nm), and the optical thickness of 1 H layer is 75.85nm, and the optical thickness of 1 L layer is 129.17nm, uses wavelength to be 633nm.
Ultimate principle of the present invention is: light beam incides on first phase delay chip at a certain angle, reflexes on second retardation plate, after the reflection second time through second retardation plate, with the parallel ejaculation of incident light direction.Difference along with incident angle, each phase delay chip can make the phase differential monotone variation in certain delay scope between P light and the S light, can make P light produce the dull phase shift of certain limit again, therefore, by rotating accurate rotation platform, both can make to produce tunable phase differential between the P component of light and the S component, be equivalent to the wave plate of a variable thickness, can make the P light of linear polarization produce default phase shift again, thereby realize accurate, tunable phase delay or compensation.
Technique effect of the present invention:
1, the present invention utilizes tunable delay or the compensation of the reflection phase shift characteristic realization of optical medium film to phase differential, and principle is simple, is easy to preparation.
2, the present invention can be applicable to the phase delay compensation of heavy caliber light beam, owing to adopted the parallel structure of double-reflecting face, does not change the transmission direction of light beam.
3, core parts of the present invention are dielectric reflection films, and therefore the threshold for resisting laser damage height can use in the light path of high-power laser beam.
4, the present invention both can compensate the P of a branch of light and the phase differential between the S component, can realize the conversion of elliptically polarized light and linearly polarized light, can make linearly polarized light produce the phase-delay quantity of expection again, had multi-functional characteristics.
5, the present invention is to different because of the highly reflecting films that adopt of the delay scope of P light and S light phase difference.
6, the angular resolution of the rotation platform among the present invention has determined the phase control precision, if the universal stage angular resolution is 0.01 °, the phase delay precision can reach λ/3600, and control accuracy is very high.High precision may not be useful to using, and therefore can make phase control precision and service condition coupling, the dirigibility height according to actual conditions design rotation ratio of gear.
7, the present invention can realize the positive and negative compensation rate control to phase differential, also can insert in the automatic control closed loop, realizes real time delay or compensation control.
In a word, the present invention is a kind of easy and accurate phase delay or compensating device.By rotating accurate rotation platform, make the angle that light beam incides phase delay chip take place to change continuously, thereby the phase control amount that changes is simple to operate, the degree of accuracy height.That this device has is simple in structure, make easily, characteristics such as degree of accuracy is high, easy and simple to handle, cost is low, multi-usage.
Description of drawings
Fig. 1 is a thin film-type adjustable phase retarder one-piece construction synoptic diagram of the present invention
Fig. 2 is a thin film-type adjustable phase retarder of the present invention planimetric position synoptic diagram
Fig. 3 is the phase shift and the phase difference characteristics figure of the phase delay chip of the embodiment of the invention.
Fig. 4 is the P light reflectivity and the average reflectance curve of the phase delay chip of the embodiment of the invention.
Embodiment
The invention will be further described below in conjunction with embodiment and accompanying drawing, but should not limit protection scope of the present invention with this.
See also Fig. 1 earlier, Fig. 1 is a thin film-type adjustable phase retarder one-piece construction synoptic diagram of the present invention, as seen from the figure, thin film-type adjustable phase retarder of the present invention, by first phase delay chip 7 and second phase delay chip 8, first optical adjusting frame 4 and second optical adjusting frame 5 and a rotation platform are formed, its position relation is: described rotation platform is made up of fixing base plate 1 and turntable 2, described first phase delay chip 7 and second phase delay chip 8 are sticked respectively in the picture frame of described first optical adjusting frame 4 and second optical adjusting frame 5, described first optical adjusting frame 4 and second optical adjusting frame 5 are fixed on the upper surface of the turntable 2 of described rotation platform abreast, and make the reflecting surface of described first phase delay chip 7 relative with the reflecting surface of second phase delay chip 8, parallel and perpendicular to the upper surface of described turntable 2, the center o of described turntable 2 equates to the distance of the reflecting surface of described first phase delay chip 7 and second phase delay chip 8.The sidewall of described base plate 1 is provided with handwheel 3, rotates to drive turntable 2, and the periphery of this turntable 2 is carved with angle line, is carved with alignment line on the wall of this base plate 1, and the slewing area of universal stage is 360 degree.Determine minimum rotation resolution by setting ratio of gear, as 0.01 degree.
Described first optical adjusting frame 4 and second optical adjusting frame 5 are ordinary optical adjustment racks of using always, are made of datum plate and lens frame, are linked by spring between datum plate and the lens frame.By regulating three fine-tuning nuts 6 on the datum plate, realize to the moving forward and backward of reflecting optics, about and rotate up and down and adjust.The shape of adjustment rack is determined by eyeglass.The fixed form of the turntable 2 of described first optical adjusting frame 4 and second optical adjusting frame 5 and described rotation platform is gluing or screw is fixed.
Described first phase delay chip 7 and second phase delay chip 8 are a kind of dielectric reflection films with same structure, in wide range, has very high reflectivity, phase-delay quantity is linear change with the incident angle difference of light beam, the simplest rectangle or the circle of being shaped as of this phase delay chip.
The film structure of first phase delay chip 7 of present embodiment and the dielectric reflection film of second phase delay chip 8 is: (HL) ^ 140.4H wherein H is ZnS, refractive index is 2.58 (550nm), and L is MgF 2, refractive index is 1.38 (550nm), and the optical thickness of 1 H layer is 75.85nm, and the optical thickness of 1 L layer is 129.17nm, uses wavelength to be 633nm.The phase delay curve of the phase delay chip of this specific embodiment as shown in Figure 3, horizontal ordinate is an incident angle among the figure, dotted line is the phase differential of P light and S light in the reflected light, solid line is the phase shift of P reflection of light.In 10 °~82 ° scopes, this reflectance coating can make the phase differential of P light and S light change in 180 °~360 °, P reflection of light phase shift variations scope is 28 °~196 °, after the reflection of light beam through two identical phase delay chips, the phase range of P light and S light is: 360 °~720 °, the phase shift of P light is: 56 °~392 °.Because phase place is the independent variable of cosine function, with 360 ° be the cycle, therefore, behind two secondary reflections, the phase differential range of adjustment of P light and S light is an one-period, the phase shift range of P light is near one-period.Fig. 4 is the angle reflectance curve (corresponding wavelength is 632.8nm) of this phase retardation film, and dotted line is the P light reflectivity, and solid line is average reflectance (half of P light and S light reflectivity sum).Incident angle is during less than 70 °, and P light reflectivity and average reflectance all approach 1, and incident angle is during greater than 70 °, and reflectivity can descend to some extent.
The size of phase delay chip (movable length of hot spot on minute surface in the rotary course) will be followed the rotation angle range inner light beam all will be through the principle of two reflectings surface, and the size of two retardation plates will equate.Fig. 2 is a phase delay device planimetric position synoptic diagram, the face of making even be the plane of incidence (parallel) of light beam with Table top able to be rotated, the reflecting surface of first phase delay chip 7 and second phase delay chip 8 is parallel to each other among the figure, and the distance of O to two reflecting surface of rotation center of turntable 2 equates, that is: OC=OD=h, rotation center O is d to the distance of incident beam outward flange light, and light beam is with initial incident angle θ 1Incide on the individual reflecting surface of first phase delay chip 7, rotation causes that the incident angle after the 2 π phase change is θ 2, then the minimum dimension of eyeglass is:
l=(tanθ 1-tanθ 2)h (1)
The pass of d and h is:
d = 2 ( sin ( θ 1 - θ 2 ) ) cos θ 2 - cos θ 1 h - - - ( 2 )
The d value is used to locate first phase delay chip 7, determines the incoming position of light beam.For reducing the manufacture difficulty of phase retardation film, minimum dimension l should not be too big, thus h can in conjunction with the practical application condition exhaust may be little value so that the value of l is appropriate, general l<100mm is advisable, corresponding h<18mm.The size of first phase delay chip 7 of actual fabrication is than the big 5~10mm of minimum dimension l, with convenient for assembly.
When debuging, at first determine the position of first phase delay chip 7.In conjunction with illustrated in figures 1 and 2, earlier on universal stage according to two parallel lines of h value picture of being got, again first phase delay chip 7 is placed the picture frame of first optical adjusting frame 4, and be placed on the turntable 2, the reflecting surface of first phase delay chip 7 is alignd with parallel lines, along this parallel lines translation first optical adjusting frame 4, make and work as light then with θ 1When the edge reflections point (A point among Fig. 2) of first phase delay chip 7 was incided at the angle, the rotation center O of turntable 2 was d to the distance of incident ray, and the d value is determined that by formula (2) be fixed to 4 glue bonds of first adjustment rack or screw on the turntable 2 this moment.The reflecting surface of second phase delay chip 8 aligns with another parallel lines, can determine according to the edge reflections light of first phase delay chip 7 during the location.After having located two phase delay chips, incide on first phase delay chip 7 with a branch of light, through second phase delay chip 8 secondary reflection again, regulate the fine-tuning nut 6 of second optical adjusting frame 5, penetrate along former incident beam direction after making light beam through reflection for the second time, guarantee the strict parallel of two reflectings surface.
During use, this device is placed light path, by rotation hand wheel 3 turntable 2 is turned an angle, making light beam is initial incident angle θ in the incident angle of the reflecting surface of first phase delay chip 7 1, as the phase delay chip of Fig. 2 and Fig. 3 correspondence, θ 1Get 82 °, whole then this phase delay device that moves is promptly regulated incidence point, make rotation center o to incident ray satisfy (2) formula apart from d, last rotation hand wheel 3 driven in rotation platforms, the change incident angle realizes the function of this device.

Claims (4)

1, a kind of thin film-type adjustable phase retarder, it is characterized in that by first phase delay chip (7) and second phase delay chip (8), first optical adjusting frame (4) and second optical adjusting frame (5) and a rotation platform are formed, its position relation is: described rotation platform is made up of fixing base plate (1) and turntable (2), described first phase delay chip (7) and second phase delay chip (8) are sticked respectively in the picture frame of described first optical adjusting frame (4) and second optical adjusting frame (5), described first optical adjusting frame (4) and second optical adjusting frame (5) are fixed on the upper surface of the turntable (2) of described rotation platform abreast, and make the reflecting surface of described first phase delay chip (7) relative with the reflecting surface of second phase delay chip (8), parallel and perpendicular to the upper surface of described turntable (2), the center (o) of described turntable (2) is equal to the distance of the reflecting surface of described first phase delay chip (7) and second phase delay chip (8).
2, thin film-type adjustable phase retarder according to claim 1, the fixed form that it is characterized in that the turntable (2) of described first optical adjusting frame (4) and second optical adjusting frame (5) and described rotation platform is gluing or screw is fixed.
3, thin film-type adjustable phase retarder according to claim 1, it is characterized in that, the sidewall of this base plate (1) is provided with handwheel (3), rotate to drive turntable (2), the periphery of this turntable (2) is carved with angle line, be carved with alignment line on the wall of this base plate (1), the slewing area of universal stage is 360 degree.
4, thin film-type adjustable phase retarder according to claim 1, it is characterized in that described first phase delay chip (7) and second phase delay chip (8) are a kind of dielectric reflection films with same structure, the film structure of the dielectric reflection film of described first phase delay chip (7) and second phase delay chip (8) is: (HL) ^ 140.4H wherein H is ZnS, is 2.58 to the refractive index of 550nm wavelength light, L is MgF 2, be that the optical thickness of 1.38,1 H layers is 75.85nm to the refractive index of 550nm wavelength light, the optical thickness of 1 L layer is 129.17nm, uses wavelength to be 633nm.
CN200810032709A 2008-01-16 2008-01-16 Thin film type adjustable phase retarder Expired - Fee Related CN100580505C (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102156349A (en) * 2011-03-25 2011-08-17 中国科学院上海光学精密机械研究所 Tunable wideband phase self-compensation retarder
CN104570379B (en) * 2015-01-20 2017-07-18 中国科学院上海应用物理研究所 A kind of reflection-type grating is to pulse stretcher device
CN110716314A (en) * 2019-11-26 2020-01-21 深圳惠牛科技有限公司 Light and thin type optical module and VR equipment
CN112630879B (en) * 2020-12-25 2022-09-30 中国工程物理研究院激光聚变研究中心 Phase delay element and phase delay device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1385718A (en) * 2001-05-10 2002-12-18 住友化学工业株式会社 Phase delay device
CN1387071A (en) * 2001-05-22 2002-12-25 北京亚科晶体器件有限责任公司 Optical phase delay device
US20040105678A1 (en) * 2002-11-29 2004-06-03 Xiang-Dong Cao Method and apparatus for providing simultaneous channel power equalization and monitoring

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1385718A (en) * 2001-05-10 2002-12-18 住友化学工业株式会社 Phase delay device
CN1387071A (en) * 2001-05-22 2002-12-25 北京亚科晶体器件有限责任公司 Optical phase delay device
US20040105678A1 (en) * 2002-11-29 2004-06-03 Xiang-Dong Cao Method and apparatus for providing simultaneous channel power equalization and monitoring

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