CN100506921C - Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment - Google Patents
Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment Download PDFInfo
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- CN100506921C CN100506921C CNB2005100337764A CN200510033776A CN100506921C CN 100506921 C CN100506921 C CN 100506921C CN B2005100337764 A CNB2005100337764 A CN B2005100337764A CN 200510033776 A CN200510033776 A CN 200510033776A CN 100506921 C CN100506921 C CN 100506921C
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- Prior art keywords
- surface treatment
- dioxide
- nano silicon
- silicon
- gas
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 238000004381 surface treatment Methods 0.000 title claims abstract description 31
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 26
- 230000002209 hydrophobic effect Effects 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000005543 nano-size silicon particle Substances 0.000 title claims abstract description 21
- 239000012756 surface treatment agent Substances 0.000 claims abstract description 19
- 238000006243 chemical reaction Methods 0.000 claims abstract description 17
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract 5
- 229960001866 silicon dioxide Drugs 0.000 claims description 31
- 239000000377 silicon dioxide Substances 0.000 claims description 29
- 239000007789 gas Substances 0.000 claims description 23
- 239000012159 carrier gas Substances 0.000 claims description 11
- 238000000889 atomisation Methods 0.000 claims description 8
- 238000002360 preparation method Methods 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 239000002912 waste gas Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 7
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 230000035484 reaction time Effects 0.000 abstract description 2
- 229910000077 silane Inorganic materials 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 description 16
- 229910002012 Aerosil® Inorganic materials 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000011362 coarse particle Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000012752 auxiliary agent Substances 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- -1 makeup Substances 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 239000008247 solid mixture Substances 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 241000024287 Areas Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB2005100337764A CN100506921C (en) | 2005-03-28 | 2005-03-28 | Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment |
Applications Claiming Priority (1)
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CNB2005100337764A CN100506921C (en) | 2005-03-28 | 2005-03-28 | Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment |
Publications (2)
Publication Number | Publication Date |
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CN1687246A CN1687246A (en) | 2005-10-26 |
CN100506921C true CN100506921C (en) | 2009-07-01 |
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CNB2005100337764A Active CN100506921C (en) | 2005-03-28 | 2005-03-28 | Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101723317B (en) * | 2009-12-09 | 2013-02-27 | 广州吉必盛科技实业有限公司 | Method and device for on-line continuous surface treatment of hydrophilic nano-silicon dioxide |
CN102513031B (en) | 2011-11-30 | 2014-04-16 | 广州吉必盛科技实业有限公司 | Deacidification process and equipment thereof |
CN103073927A (en) * | 2013-01-31 | 2013-05-01 | 沈阳化工股份有限公司 | Surface-modified fumed silica capable of improving tearing strength of silicone rubber and production method of silicon dioxide |
CN105399103B (en) * | 2015-12-24 | 2017-12-05 | 江西黑猫炭黑股份有限公司 | A kind of aerosil flatting silica and preparation method thereof |
CN106000290A (en) * | 2016-07-12 | 2016-10-12 | 常州大学 | Silica gel hydrophobic modification method achieved under action of microwaves |
CN108441026A (en) * | 2018-04-25 | 2018-08-24 | 福建远翔新材料股份有限公司 | A kind of dewatering nano hydrated SiO 2 and its preparation method and application |
CN111392735B (en) * | 2020-02-20 | 2021-08-06 | 广州汇富研究院有限公司 | Surface modification combined treatment method of fumed silica |
CN111286215B (en) * | 2020-02-21 | 2021-07-06 | 广州汇富研究院有限公司 | Continuous process for modifying surface of fumed silica |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873337A (en) * | 1972-08-14 | 1975-03-25 | Degussa | Process for the hydrophobization of higher dispersed oxides |
US4503092A (en) * | 1982-03-27 | 1985-03-05 | Degussa Aktiengesellschaft | Process for the hydrophobization of pyrogenically produced silica |
US5057151A (en) * | 1988-11-25 | 1991-10-15 | Wacker-Chemie Gmbh | Process for preparing hydrophobic particulate solids containing si-oh groups and a process for using the same |
-
2005
- 2005-03-28 CN CNB2005100337764A patent/CN100506921C/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873337A (en) * | 1972-08-14 | 1975-03-25 | Degussa | Process for the hydrophobization of higher dispersed oxides |
US4503092A (en) * | 1982-03-27 | 1985-03-05 | Degussa Aktiengesellschaft | Process for the hydrophobization of pyrogenically produced silica |
US5057151A (en) * | 1988-11-25 | 1991-10-15 | Wacker-Chemie Gmbh | Process for preparing hydrophobic particulate solids containing si-oh groups and a process for using the same |
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CN1687246A (en) | 2005-10-26 |
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Denomination of invention: Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment Effective date of registration: 20100429 Granted publication date: 20090701 Pledgee: Bank of China Limited by Share Ltd Guangzhou Baiyun Branch Pledgor: Guangzhou GBS High-Tech & Industry Co., Ltd. Registration number: 2010990000747 |
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Denomination of invention: Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment Effective date of registration: 20110415 Granted publication date: 20090701 Pledgee: Bank of China Limited by Share Ltd Guangzhou Baiyun Branch Pledgor: Guangzhou GBS High-Tech & Industry Co., Ltd. Registration number: 2011990000129 |
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Denomination of invention: Method for preparing hydrophobic type nano silicon dioxide thruogh continuous surface treatment Effective date of registration: 20120326 Granted publication date: 20090701 Pledgee: Bank of China Limited by Share Ltd Guangzhou Baiyun Branch Pledgor: Guangzhou GBS High-Tech & Industry Co., Ltd. Registration number: 2012990000110 |
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Effective date of registration: 20170505 Address after: 66-2 No. 443000 Hubei city of Yichang province located in Xiaoting District Road Patentee after: Yichang HuiFu silicon material Co. Ltd. Address before: 510450 Tong Shan section of Guangzhou first grade highway, Guangdong, Guangzhou Patentee before: Guangzhou GBS High-Tech & Industry Co., Ltd. |
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Effective date of registration: 20180801 Address after: 510663 508 laboratory building 15, Nanxiang three road, science and Technology City, Guangzhou high tech Industrial Development Zone, Guangdong, China Co-patentee after: Yichang HuiFu silicon material Co. Ltd. Patentee after: Guangzhou Hui Fu Research Institute Co., Ltd. Address before: 443000 No. 66-2 Ting Ting Road, Ting Ting District, Yichang, Hubei Patentee before: Yichang HuiFu silicon material Co. Ltd. |
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Address after: 510000 room 508, laboratory building, No. 15, Nanxiang Third Road, Science City, Guangzhou high tech Industrial Development Zone, Guangdong Province Co-patentee after: Hubei HuiFu nano materials Co., Ltd Patentee after: Guangzhou Hui Fu Research Institute Co.,Ltd. Address before: 510663 508 laboratory building 15, Nanxiang three road, science and Technology City, Guangzhou high tech Industrial Development Zone, Guangdong, China Co-patentee before: YICHANG HUIFU SILICON MATERIAL Co.,Ltd. Patentee before: Guangzhou Hui Fu Research Institute Co.,Ltd. |
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