CH573448A5 - - Google Patents

Info

Publication number
CH573448A5
CH573448A5 CH1765872A CH1765872A CH573448A5 CH 573448 A5 CH573448 A5 CH 573448A5 CH 1765872 A CH1765872 A CH 1765872A CH 1765872 A CH1765872 A CH 1765872A CH 573448 A5 CH573448 A5 CH 573448A5
Authority
CH
Switzerland
Application number
CH1765872A
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Priority to CH1765872A priority Critical patent/CH573448A5/xx
Priority to NL7315878A priority patent/NL7315878A/xx
Priority to FR7342221A priority patent/FR2217355B1/fr
Priority to US05/420,176 priority patent/US4001017A/en
Priority to GB1841975A priority patent/GB1436590A/en
Priority to CA187,233A priority patent/CA980350A/en
Priority to GB5592573A priority patent/GB1436589A/en
Priority to IT5405473A priority patent/IT997924B/en
Priority to DE19732360350 priority patent/DE2360350A1/en
Priority to BE138476A priority patent/BE808179A/en
Priority to JP13545473A priority patent/JPS5928205B2/en
Priority to JP48135455A priority patent/JPS5924147B2/en
Priority to FR7413181A priority patent/FR2221453B1/fr
Publication of CH573448A5 publication Critical patent/CH573448A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C07D241/40—Benzopyrazines
    • C07D241/42—Benzopyrazines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
CH1765872A 1972-12-05 1972-12-05 CH573448A5 (en)

Priority Applications (13)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (en) 1972-12-05 1972-12-05
NL7315878A NL7315878A (en) 1972-12-05 1973-11-20
FR7342221A FR2217355B1 (en) 1972-12-05 1973-11-27
US05/420,176 US4001017A (en) 1972-12-05 1973-11-29 Process for the photopolymerization of ethylenically unsaturated compounds
GB1841975A GB1436590A (en) 1972-12-05 1973-12-03 Quinoxalium salts
CA187,233A CA980350A (en) 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturated compounds
GB5592573A GB1436589A (en) 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturate compounds
IT5405473A IT997924B (en) 1972-12-05 1973-12-03 PROCEDURE AND COMPOSITIONS FOR PHOTOPOLYMERIZING UNSATURATED ETHYLENE BOND COMPOUNDS
DE19732360350 DE2360350A1 (en) 1972-12-05 1973-12-04 PROCESS FOR THE PHOTOPOLYMERIZATION OF ETHYLENIC UNSATURED COMPOUNDS
BE138476A BE808179A (en) 1972-12-05 1973-12-04 PROCESS FOR PHOTOPOLYMERIZATION OF NON-SATURATED ETHYLENIC COMPOUNDS
JP13545473A JPS5928205B2 (en) 1972-12-05 1973-12-05 Photopolymerization method of ethylenically unsaturated compounds
JP48135455A JPS5924147B2 (en) 1972-12-05 1973-12-05 Production method of new quinoxalinium salt
FR7413181A FR2221453B1 (en) 1972-12-05 1974-04-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (en) 1972-12-05 1972-12-05

Publications (1)

Publication Number Publication Date
CH573448A5 true CH573448A5 (en) 1976-03-15

Family

ID=4427103

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1765872A CH573448A5 (en) 1972-12-05 1972-12-05

Country Status (8)

Country Link
JP (2) JPS5928205B2 (en)
BE (1) BE808179A (en)
CA (1) CA980350A (en)
CH (1) CH573448A5 (en)
DE (1) DE2360350A1 (en)
FR (2) FR2217355B1 (en)
GB (1) GB1436589A (en)
NL (1) NL7315878A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621545A5 (en) * 1976-05-24 1981-02-13 Ciba Geigy Ag
JPS6026122B2 (en) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 Photopolymerizable composition
DE10029929A1 (en) * 2000-06-17 2001-12-20 Henkel Kgaa Quinoxaline derivative-containing dyes for dyeing keratin fibers e.g. hair give a wide variety of brilliant, intense shades without the need for an oxidizing component
JP4291638B2 (en) 2003-07-29 2009-07-08 富士フイルム株式会社 Alkali-soluble polymer and planographic printing plate precursor using the same
JP5089866B2 (en) 2004-09-10 2012-12-05 富士フイルム株式会社 Planographic printing method
JP4538350B2 (en) 2005-03-18 2010-09-08 富士フイルム株式会社 Photosensitive composition, image recording material, and image recording method
JP4777226B2 (en) 2006-12-07 2011-09-21 富士フイルム株式会社 Image recording materials and novel compounds
JP4860525B2 (en) 2007-03-27 2012-01-25 富士フイルム株式会社 Curable composition and planographic printing plate precursor
EP2048539A1 (en) 2007-09-06 2009-04-15 FUJIFILM Corporation Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
JP2009091555A (en) 2007-09-18 2009-04-30 Fujifilm Corp Curable composition, image forming material and planographic printing plate precursor
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
ATE475906T1 (en) 2007-09-28 2010-08-15 Fujifilm Corp NEGATIVE LIGHT SENSITIVE MATERIAL AND NEGATIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR
JP4890408B2 (en) 2007-09-28 2012-03-07 富士フイルム株式会社 Polymerizable composition, lithographic printing plate precursor using the same, alkali-soluble polyurethane resin, and method for producing diol compound
KR101671249B1 (en) 2008-03-17 2016-11-01 후지필름 가부시키가이샤 Colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
JP5554106B2 (en) 2009-03-31 2014-07-23 富士フイルム株式会社 Colored curable composition, method for producing color filter, color filter, solid-state imaging device, and liquid crystal display device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1085868A (en) * 1952-05-30 1955-02-08 Ciba Geigy Process for the preparation of novel quinoxaline compounds
US3573922A (en) * 1965-04-23 1971-04-06 Hughes Aircraft Co Photopolymerizable composition and process
DE2039861C3 (en) * 1970-08-11 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerizable copying compound

Also Published As

Publication number Publication date
FR2221453B1 (en) 1978-09-08
JPS5924147B2 (en) 1984-06-07
JPS5928205B2 (en) 1984-07-11
DE2360350A1 (en) 1974-06-06
NL7315878A (en) 1974-06-07
CA980350A (en) 1975-12-23
FR2221453A1 (en) 1974-10-11
JPS4987780A (en) 1974-08-22
FR2217355B1 (en) 1977-06-10
GB1436589A (en) 1976-05-19
BE808179A (en) 1974-06-04
FR2217355A1 (en) 1974-09-06
JPS4986383A (en) 1974-08-19

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