CA2583376C - Methods and apparatuses for detecting and monitoring corrosion using nanostructures - Google Patents
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N17/00—Investigating resistance of materials to the weather, to corrosion, or to light
- G01N17/04—Corrosion probes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
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Abstract
The present invention relates to methods and apparatuses for detecting and monitoring corrosion using nanostructures. One embodiment of the invention provides a method for detecting corrosion with a nanostructure in a corrosive atmosphere. The method includes providing at least one nanostructure comprising at least one reactive material, and exposing a portion of the at least one reactive material to a corrosive atmosphere. The method also includes detecting a reaction with the at least one reactive material, and based at least in part on the reaction, determining an amount of corrosion associated with the at least one reactive material.
Description
METHODS AND APPARATUSES FOR DETECTING AND MONITORING
CORROSION USING NANOSTRUCTURES
TECHNICAL FIELD
The invention relates generally to the field of corrosion monitoring. The invention more particularly relates to methods and apparatuses for detecting and monitoring corrosion using nanostructures.
BACKGROUND OF THE INVENTION
Many metal containing devices and structures must function in corrosive atmospheres that can cause them to deteriorate over time. Corrosion may take the form of metal oxides, resulting from reaction with oxygen in the air, or may be compounds formed by exposure to the effluent of industrial processes, such as hydrogen sulfide.
In the electronics industry, for example, approximately one-third of all warranty repair work can be attributable to corrosion. Accordingly, the ability to accurately monitor corrosion and take appropriate measures to avoid, deter, or prevent it can be of utmost importance to the industry.
One method and apparatus for monitoring corrosion utilizes a piezoelectric crystal as a corrosion monitor. The crystal is coated with a corrodible metal, and the coated crystal is attached to an oscillator before or after placement in the corrosive atmosphere. As the corrodible metal corrodes, the frequency of vibration of the coated crystal decreases. The frequency reading is then converted to a thickness reading corresponding to a selected corrosion thickness standard. While this type of method and apparatus is generally suitable for measuring and detecting certain degrees of corrosion, in some instances more precise measurements of corrosion are desired.
Therefore, a need exists for improved methods and apparatuses for detecting corrosion.
A further need exists for improved methods and apparatuses for monitoring corrosion.
A further need exists for an improved apparatus and methods of manufacturing a corrosion monitor.
SUMMARY OF THE INVENTION
Methods and apparatuses for detecting and monitoring corrosion using a nanostructure are provided herein. In addition, methods and apparatuses for detecting and monitoring corrosion using a corrosion monitor are provided herein. Also provided are methods of manufacturing a corrosion monitor.
Some or all of the needs above are addressed by various embodiments of the invention described herein. The methods, apparatuses, and corrosion monitor according to embodiments of the invention can find application in such environments as industrial process measurement and control rooms, motor control centers, electrical rooms, semiconductor clean rooms, electronic fabrication sites, critical parts storage, commercial data centers, museums, libraries, and archival storage rooms. The methods, apparatuses, and corrosion monitor described herein can also be useful for checking the exhaustion level of filtration media being used to protect the environment of such spaces. Other embodiments are useful for identifying a contaminant gas or gases that are causing or could cause corrosion in a particular environment.
Furthermore, methods, apparatuses, and corrosion monitor according to embodiments of the invention can also find application in any electronic device or any processor-based device. Such devices can include, but are not limited to, electronic chips, semiconductor chips, microelectronics chips, telephones, cell phones, smart phones, personal communication devices, personal digital assistants (PDAs), tablets, computers, notebooks, desktops, mainframe computers, MP3 players, CD / DVD players, audio player devices, radios, televisions, etc.
One embodiment of the present invention provides a method for detecting corrosion with a nanostructure in a corrosive atmosphere. The method includes providing at least one nanostructure comprising at least one reactive material, and exposing a portion of the at least one reactive material to a corrosive atmosphere. The method also includes detecting a reaction with the at least one reactive material, and based at least in part on the reaction, determining an amount of corrosion associated with the at least one reactive material.
Another embodiment of the present invention provides an apparatus for detecting and monitoring corrosion. The apparatus can include an electronic chip with at least one nanostructure comprising at least one reactive material, wherein the at least one reactive material is capable of reacting with a corrosive atmosphere. The electronic chip can also include a processor capable of receiving a signal associated with a reaction of the at least one reactive material, and based at least in part on the signal, determining an amount of corrosion of the at least one reactive material. The processor is further capable of generating an output signal associated with the amount of corrosion of the at least one reactive material. The apparatus can also include an output device capable of receiving the output signal from the electronic chip, and displaying an indicator associated with the amount of corrosion of the at least one reactive material.
Yet another embodiment of the present invention can include an apparatus for detecting and monitoring corrosion. The apparatus can include at least one nanostructure with at least one reactive material adapted to be exposed to a corrosive atmosphere. In addition, the apparatus can include a detection means for detecting a reaction associated with the at least one reactive material. Furthermore, the apparatus can include a measuring means for determining an amount of corrosion of the at least one reactive material based in part on at least the reaction.
Another embodiment of the present invention can include a method of manufacture for a corrosion monitor. The method can include providing a nanostructure including at least one reactive material, wherein the at least one reactive material is adapted to be exposed to a corrosive atmosphere. In addition, the method can include providing an electronic chip, and mounting the nanostructure to a portion of the electronic chip. Furthermore, the method can include providing a processor, wherein the processor is capable of detecting a reaction associated with the at least one reactive material, and based at least in part on the reaction, the processor is capable of determining an amount of corrosion of the at least one reactive material.
The method can also include mounting the electronic chip to an output device capable of receiving a signal associated with the amount of corrosion of the at least one reactive material. In addition, the output device is capable of displaying an indicator associated with the amount of corrosion of the at least one reactive material.
One aspect of an embodiment of the invention can provide methods and apparatuses for monitoring or detecting corrosion that are highly sensitive and precise.
Another aspect of an embodiment of the invention can provide methods for manufacturing a corrosion monitor using nanostructures.
Yet another aspect of an embodiment of the invention can provide an apparatus and methods of manufacture for mounting nanostructures on a microelectronics chip.
These and other aspects, features and advantages of the invention will become apparent after a review of the following detailed description of the disclosed embodiments and the appended claims.
-BRIEF DESCRIPTION OF DRAWINGS
FIG. I is view of a schematic diagram of an apparatus in accordance with one embodiment of the invention.
FIG. 2 is a detailed illustration of a microcantilever for the apparatus shown in FIG. 1.
FIG. 3 is a flowchart illustrating a method in accordance with one embodiment of the invention.
FIG. 4 is a flowchart illustrating another method in accordance with one embodiment of the invention.
FIG. 5 is an example of a detection circuit with a nanostructure in accordance with an embodiment of the invention.
DETAILED DESCRIPTION OF EMBODIMENTS
Embodiments of the invention are designed to detect and to monitor corrosion. The term "nanostructure" used in this specification generally defines a class of objects used in nanotechnology-related applications, such as a nanotubes, carbon nanotubes, nanoballs, nanoparticles, and other relatively small objects and devices.
The term "chip" used in this specification generally defines a microelectronics chip, semiconductor chip, computer chip, circuit chip, microprocessor, processor, or any type of suitable chip in an electronics or processor-based platform.
The term "corrosive atmosphere" used in this specification can include, but is not limited to, an atmosphere within an electronic device, an atmosphere within a processor-based device, an atmosphere within an enclosed space, an atmosphere within a room, an atmosphere within a building, and an atmosphere within an air duct.
The apparatus, methods, and other embodiments of the invention is useful for detecting and monitoring corrosion in various environments including, but not limited to, industrial process measurement and control rooms, motor control centers, electrical rooms, semiconductor clean rooms, electronic fabrication sites, commercial data centers, museums, libraries, and archival storage rooms. Such embodiments are also useful for checking the exhaustion level of filtration media being used to protect the environment of such spaces. Other embodiments are useful for identifying a contaminant gas or gases, particularly a contaminant gas or gases in an environment, which have caused or might cause corrosion of a metal in that environment.
Furthermore, the apparatus, methods, and other embodiments of the invention may also find application in any electronic device or any processor-based device.
Such devices include, but are not limited to, electronic chips, semiconductor chips, microelectronic chips, circuit chips, computer chips, telephones, cell phones, smart phones, personal communication devices, personal digital assistants (PDAs), tablets, computers, notebooks, desktops, mainframe computers, MP3 players, CD / DVD
players, audio player devices, radios, televisions, etc.
An environment for the embodiment shown in FIGS. 1 and 2 can be an electrical chip such as a microelectronics chip, semiconductor chip, computer chip, circuit chip, microprocessor, processor, or any other suitable component in an electronic or processor-based platform.
FIG. 1 is a schematic view of an apparatus in accordance with an embodiment of the invention. The apparatus shown in FIG. 1 is a corrosion monitor 100 for detecting and monitoring corrosion in a corrosive atmosphere. The corrosion monitor 100 includes a nanostructure, such as a microcantilever 102. The nanostructure includes at least one reactive material adapted to react with a corrosive atmosphere, such as a metallic material 104. The nanostructure is in the form of, but is not limited to, a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, a nanocantilever, or any combination thereof. A suitable reactive material can include, but is not limited to, a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), permalloy, or any combination thereof.
In the embodiment shown, providing a nanostructure such as a microcantilever 102 with a reactive material 104 can be accomplished by, for example, coating a copper electrode onto a silicon wafer. Providing a nanostructure with at least one reactive material, such as a microcantilever 102 with reactive material 104, can be achieved by various methods including, but not limited to, integrating, bonding, layering, etching, applying, attaching, connecting thin film deposition techniques, and ion beam sputtering. Other examples of providing a nanostructure with a reactive material 104 can include coating a portion of a microcantilever with a metallic material, coating a portion of a nanostructure with a metallic material, coating a portion of a nanotube with a metallic material, or coating a portion of one or more nanoballs with a metallic material. In this manner, at least a portion of the nanostructure includes at least one reactive material.
Suitable nanostructures for the methods and apparatuses provided herein may be obtained from commercial suppliers such as NanoDevices of Santa Barbara, California. Suitable methods to coat or otherwise apply at least one reactive material to a nanostructure may be performed by nanotechnology and/or nanoscience material processors such as BioForce Nanosciences, Inc. of Ames, Iowa.
In at least one embodiment of the invention, multiple reactive materials can be coated onto the nanostructure, and some or all of the reactive materials can be adapted to react with a corrosive atmosphere, material, or substance. In one embodiment, reactive materials can be adapted to react with different types of corrosive atmospheres, materials, or substances.
In another embodiment, at least one reactive material is coated onto multiple nanostructures that are integrated or otherwise connected together such that some or all of the nanostructures are monitored separately or as a single device. In one embodiment, the nanostructures are monitored to react with particular corrosive atmospheres, materials, or substances.
Furthermore, the apparatus shown in FIG. 1 may optionally include a means for detecting a reaction associated with the reactive material. A means for detecting a reaction associated with the reactive material can be, for example, facilitated by a processor 106 in operative communication with the nanostructure, such as the microcantilever 102 shown in FIG. 1. The processor 106 may include or be capable of executing a set of computer-executable instructions, such as instructions 108 stored on a computer-readable medium or in memory 110, for detecting a reaction associated with a reactive material.
Such processors may comprise a microprocessor, an ASIC, and state machines. Such processors comprise, or may be in communication with, media, for example computer-readable media, which stores instructions that, when executed by the processor, cause the processor to perform the steps described herein.
Embodiments of computer-readable media include, but are not limited to, an electronic, optical, magnetic, or other storage or transmission device capable of providing a processor, such as the processor 106, with computer-readable instructions. Other examples of suitable media include, but are not limited to, a floppy disk, CD-ROM, DVD, magnetic disk, memory chip, ROM, RAM, an ASIC, a configured processor, all optical media, all magnetic tape or other magnetic media, or any other medium from which a computer processor can read instructions. Also, various other forms of computer-readable media may transmit or carry instructions to a computer, including a router, private or public network, or other transmission device or channel, both wired and wireless. The instructions may comprise code from any computer-programming language, including, for example, CTM, C++TM, C#TM, Visual BasicTM, JavaTM, PythonTM, PerlTM, and JavaScriptTM.
A reaction associated with a reactive material can include, but is not limited to, a change in mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, a chemical characteristic of the reactive material, or any combination thereof.
For example, the processor 106 shown can include or is capable of executing a set of instructions to detect a mass change in a reactive material associated with a nanostructure. In most instances, a predefined mass of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent mass, change in mass, or difference.
In another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in displacement in a reactive material associated with a nanostructure. In most instances, a predefined position of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent position, change in position, or difference.
In another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in vibration frequency in a reactive material associated with a nanostructure. In most instances, a predefined vibration frequency of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent vibration frequency, change in vibration frequency, or difference.
By way of another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in electrical resistance in a reactive material associated with a nanostructure. In most instances, a predefined electrical resistance of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent electrical resistance, change in electrical resistance, or difference.
In yet another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in electrical voltage in a reactive material associated with a nanostructure. In most instances, a predefined electrical voltage of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent electrical voltage, change in electrical voltage, or difference.
Other examples of physical, electrical, and/or chemical characteristics associated with a reactive material that can be detected and monitored for changes and within the scope of the invention, will be recognized by those skilled in the art upon reviewing this specification.
Further, the apparatus optionally also includes a measuring means for determining an amount of corrosion of the at least one reactive material based at least in part on the reaction. In the embodiment shown in FIG. 1, the measuring means is facilitated by the processor 106 in operative communication with a nanostructure, such as the microcantilever 102, as shown. The processor 106 can include or is capable of executing a set of computer-executable instructions, such as instructions stored on a computer-readable medium, for determining an amount of corrosion of the reactive material based at least in part on the reaction. Generally, detection of a reaction with a particular reactive material can be quantified or otherwise measured depending on the type of reaction detected. A predefined correlation between a quantitative measurement of the reaction and an amount of the reactive material remaining can be used to determine an amount of corrosion of the reactive material.
For example, the processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected mass change in a reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material remaining. That is, if a mass change in a reactive material associated with a nanostructure is detected, the mass change can be correlated to an amount of corrosion of the reactive material. In this example, mass change of a particular reactive material is correlated to a remaining thickness (in angstroms or other unit of thickness) of the reactive material, and the amount of corrosion of the reactive material is determined.
In another example, if a displacement of a reactive material associated with a nanostructure is detected, the displacement is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected displacement in a reactive material associated with a nanostructure to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
In another example, if a change in vibration frequency of a reactive material associated with a nanostructure is detected, the change in vibration frequency is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected change in vibration frequency in the reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
By way of another example, if a change in electrical resistance of a reactive material associated with a nanostructure is detected, the change in electrical resistance is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected change in electrical resistance in the reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
In yet another example, if a change in electrical voltage of a reactive material associated with a nanostructure is detected, the change in electrical voltage is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions correlate an amount of a detected change in electrical voltage in the reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
Other detected or otherwise monitored changes in physical, electrical, and/or chemical characteristics associated with a reactive material associated with a nanostructure can be correlated to an amount of corrosion of the reactive material in accordance with embodiments of the invention, and will be recognized by those skilled in the art upon reviewing this specification. Various responses over time for changes in physical, electrical, and/or chemical characteristics can be monitored and correlated to determine amounts of corrosion of reactive materials.
In at least one embodiment, an apparatus can include an output device for displaying the amount of corrosion. In the example shown in FIG. 1, the output device is a display device 112 associated with the processor 106. The output device can also include, but is not limited to, a meter, an indicator, an LED, an LCD, a display, a plasma display, a touch screen device, a projector display, a monitor, or any other suitable device for outputting an amount, measurement, determination, or result associated with the processor 106. Those skilled in the art will recognize that an output device can be integrated with components of an apparatus in accordance with the invention, or can be a separate component in operative communication with the other components of an apparatus in accordance with the invention.
In at least one embodiment, some or all of the components of an apparatus such as the corrosion monitor 100 shown in FIG. 1 can be adapted to mount to an electronic chip, such as a semiconductor chip or a silicon wafer. Some or all of the components of the apparatus can be integrated with or otherwise mounted to the electronic chip. In another embodiment, some or all of the components of an apparatus can be integrated with the electronic chip, while remaining components are operatively in communication with the chip-integrated components. For example, a nanostructure such as the microcantilever 102, as shown and described above, and the processor 106, as shown and described above, can each be integrated with an electronic chip for an electronic device or processor-based platform. By way of example, a diagram of a detection circuit with a nanostructure in accordance with an embodiment of the invention is illustrated in FIG. 5. An output device, such as the display device 108, as shown and described above, can be operatively in communication with the processor 106, or can otherwise be in operative communication with the electronic chip, or electronic device or processor-based platform. In this manner, the apparatus for detecting and monitoring corrosion can be implemented in accordance with various embodiments of the invention.
FIG. 2 is a detailed illustration of a microcantilever for the apparatus shown in FIG. 1. The microcantilever 102, as shown in FIG. 2, includes a silicon wafer and a copper electrode 202. Other combinations of nanostructures and reactive materials can be utilized in accordance with embodiments of the invention. As shown, the example dimensions of the microcantilever indicate that the sizes of nanostructures and reactive materials utilized in accordance with embodiments of the invention may be relatively small.
FIG. 3 is a flowchart illustrating a method in accordance with an embodiment of the invention. The method 300 of FIG. 3 is a method for monitoring and detecting corrosion with a nanostructure in a corrosive atmosphere. Other embodiments of the method can have fewer or greater steps in accordance with the invention. The method 300 begins at block 302.
In block 302, a nanostructure comprising at least one reactive material is provided. In one embodiment, a nanostructure can include one of the following:
a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, or a nanocantilever. In another embodiment, a reactive material can include one of the following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy. In yet another embodiment, providing at least one nanostructure comprising at least one reactive material comprises coating a copper electrode on a silicon wafer.
In one embodiment, providing a nanostructure comprising at least one reactive material can include one of the following: mounting a nanostructure to a microelectronics chip, mounting a nanostructure to a semiconductor chip, mounting a nanostructure within an electronic device, or mounting a nanostructure within an enclosure.
Block 302 is followed by block 304, in which the at least one reactive material is exposed to a corrosive atmosphere.
Block 304 is followed by block 306, in which a reaction with the at least one reactive material is detected. In embodiment, a reaction can include a change in one of the following: mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive material. In another embodiment, detecting a reaction with the at least one reactive material comprises determining a difference between an initial characteristic and a subsequent characteristic of the at least one reactive material.
Block 306 is followed by block 308, in which, based on at least the reaction, an amount of corrosion associated with the at least one reactive material is determined. In one embodiment, determining an amount of corrosion associated with the at least one reactive material can include determining a difference between an initial characteristic and a current characteristic of the at least one reactive material, and associating the difference with an amount of corrosion. The method 300 ends at block 308. In one embodiment, a reaction can include a change in one of the following: mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive material. The method 300 ends at block 308.
FIG. 4 is a flowchart illustrating another method in accordance with an embodiment of the invention. The method 400 in FIG. 4 is a method for manufacturing a corrosion monitor. Other embodiments of the method can have fewer or greater steps in accordance with the invention. The method 400 begins at block 402.
In block 402, a nanostructure comprising at least one reactive material is provided, wherein the at least one reactive material is adapted to react with a corrosive atmosphere.
Block 402 is followed by block 404, in which an electronic chip is provided, wherein the electronic chip is adapted to mount a portion of the nanostructure.
Block 404 is followed by block 406, in which the nanostructure is mounted to a portion of the electronic chip.
Block 406 is followed by block 408, in which a processor is provided, wherein the processor is capable of detecting a reaction associated with the at least one reactive material, and further capable of determining an amount of corrosion of the at least one reactive material based in part on at least the reaction. In one embodiment, the processor is in operative communication with the nanostructure.
Block 408 is followed by block 410, in which the electronic chip is connected to an output device, wherein the amount of corrosion of the at least one reactive material can be displayed. The method 400 ends at block 410.
FIG. 5 is a diagram of an example of a detection circuit with a nanostructure in accordance with an embodiment of the invention. The detection circuit 500 can be installed in a variety of electronic devices or processor-based devices, such as a corrosion monitor.
The detection circuit 500 shown in FIG. 5 includes a nanostructure such as a microcantilever 502. The detection circuit 500 shown also includes a power supply 504, a processor 506 and a memory such as an EEPROM 508, and an oscillator 510.
A detection circuit in accordance with other embodiments of the invention can have other configurations and arrangements of components.
In the detection circuit 500 shown, the power supply 504 can provide current as needed to some or all of the components arranged in the circuit, including the microcantilever 502, EEPROM 506, and oscillator 508. A suitable power supply can be a 3 - 5 VDC power supply manufactured by Bias Power Technologies, Inc.
In the detection circuit 500 shown, the microcantilever 502 can be exposed to, for instance, a corrosive atmosphere, substance or material. In response to the corrosive atmosphere, substance or material, the microcantilever 502 can, for instance, deflect or otherwise react to the corrosive atmosphere, substance or material.
In one embodiment, at least one reactive material coated, applied, or mounted to the microcantilever 502 can react to the corrosive atmosphere, substance, or material. A
suitable microcantilever can be a DMASP series micro-actuated silicon active probe manufactured by Veeco Instruments, Inc. In any instance, a signal associated with the reaction of the microcantilever 502 can be detected, transmitted to, or otherwise received by the oscillator 510.
The oscillator 510 shown in FIG. 5 can detect, or receive a signal associated with the reaction of the microcantilever to the corrosive atmosphere, substance, or material. The oscillator 510 can generate a frequency output signal based at least in part on the reaction of the microcantilever 502 to the corrosive atmosphere, substance, or material. For example, the oscillator 510 can provide a relatively greater frequency response signal based on a signal associated with a relatively large deflection of the microcantilever 502. Likewise, the oscillator 510 can provide a relatively smaller frequency response signal based on a signal associated with a relatively small deflection of the microcantilever 502. A suitable oscillator can be a HA7210 series kHz ¨ 10 MHz, low power, crystal-type oscillator manufactured and distributed by Intersil Corporation of Milpitas, California.
In one embodiment, a comparison between frequency response signals from an oscillator 510 can be used to determine a difference in the frequency response based at least in part on the signal received from the microcantilever 502 during a predefined period of time, such as an initial time and a subsequent time. The difference in the frequency response can be associated with an amount of corrosion of the reactive material.
The processor 506 can provide or otherwise execute a set of instructions or commands to control some or all of the components of the detection circuit 500. An associated memory such as the EEPROM 508 can provide data storage or a computer-readable medium for storing a set of instructions or commands for execution by the processor 506. For example, the processor 506 can execute a set of instructions for detecting, measuring, and monitoring corrosion using a nanostructure such as a microcantilever 502. A
suitable processor can be a PIC18F1220 series microcontroller manufactured by MircoChip Technology, Inc. A suitable memory can be a serial flash-type memory chip manufactured by ATMEL Corporation.
It should be understood, of course, that the foregoing relates only to certain embodiments of the present invention and that numerous modifications or alterations may be made therein without departing from the scope of the invention.
CORROSION USING NANOSTRUCTURES
TECHNICAL FIELD
The invention relates generally to the field of corrosion monitoring. The invention more particularly relates to methods and apparatuses for detecting and monitoring corrosion using nanostructures.
BACKGROUND OF THE INVENTION
Many metal containing devices and structures must function in corrosive atmospheres that can cause them to deteriorate over time. Corrosion may take the form of metal oxides, resulting from reaction with oxygen in the air, or may be compounds formed by exposure to the effluent of industrial processes, such as hydrogen sulfide.
In the electronics industry, for example, approximately one-third of all warranty repair work can be attributable to corrosion. Accordingly, the ability to accurately monitor corrosion and take appropriate measures to avoid, deter, or prevent it can be of utmost importance to the industry.
One method and apparatus for monitoring corrosion utilizes a piezoelectric crystal as a corrosion monitor. The crystal is coated with a corrodible metal, and the coated crystal is attached to an oscillator before or after placement in the corrosive atmosphere. As the corrodible metal corrodes, the frequency of vibration of the coated crystal decreases. The frequency reading is then converted to a thickness reading corresponding to a selected corrosion thickness standard. While this type of method and apparatus is generally suitable for measuring and detecting certain degrees of corrosion, in some instances more precise measurements of corrosion are desired.
Therefore, a need exists for improved methods and apparatuses for detecting corrosion.
A further need exists for improved methods and apparatuses for monitoring corrosion.
A further need exists for an improved apparatus and methods of manufacturing a corrosion monitor.
SUMMARY OF THE INVENTION
Methods and apparatuses for detecting and monitoring corrosion using a nanostructure are provided herein. In addition, methods and apparatuses for detecting and monitoring corrosion using a corrosion monitor are provided herein. Also provided are methods of manufacturing a corrosion monitor.
Some or all of the needs above are addressed by various embodiments of the invention described herein. The methods, apparatuses, and corrosion monitor according to embodiments of the invention can find application in such environments as industrial process measurement and control rooms, motor control centers, electrical rooms, semiconductor clean rooms, electronic fabrication sites, critical parts storage, commercial data centers, museums, libraries, and archival storage rooms. The methods, apparatuses, and corrosion monitor described herein can also be useful for checking the exhaustion level of filtration media being used to protect the environment of such spaces. Other embodiments are useful for identifying a contaminant gas or gases that are causing or could cause corrosion in a particular environment.
Furthermore, methods, apparatuses, and corrosion monitor according to embodiments of the invention can also find application in any electronic device or any processor-based device. Such devices can include, but are not limited to, electronic chips, semiconductor chips, microelectronics chips, telephones, cell phones, smart phones, personal communication devices, personal digital assistants (PDAs), tablets, computers, notebooks, desktops, mainframe computers, MP3 players, CD / DVD players, audio player devices, radios, televisions, etc.
One embodiment of the present invention provides a method for detecting corrosion with a nanostructure in a corrosive atmosphere. The method includes providing at least one nanostructure comprising at least one reactive material, and exposing a portion of the at least one reactive material to a corrosive atmosphere. The method also includes detecting a reaction with the at least one reactive material, and based at least in part on the reaction, determining an amount of corrosion associated with the at least one reactive material.
Another embodiment of the present invention provides an apparatus for detecting and monitoring corrosion. The apparatus can include an electronic chip with at least one nanostructure comprising at least one reactive material, wherein the at least one reactive material is capable of reacting with a corrosive atmosphere. The electronic chip can also include a processor capable of receiving a signal associated with a reaction of the at least one reactive material, and based at least in part on the signal, determining an amount of corrosion of the at least one reactive material. The processor is further capable of generating an output signal associated with the amount of corrosion of the at least one reactive material. The apparatus can also include an output device capable of receiving the output signal from the electronic chip, and displaying an indicator associated with the amount of corrosion of the at least one reactive material.
Yet another embodiment of the present invention can include an apparatus for detecting and monitoring corrosion. The apparatus can include at least one nanostructure with at least one reactive material adapted to be exposed to a corrosive atmosphere. In addition, the apparatus can include a detection means for detecting a reaction associated with the at least one reactive material. Furthermore, the apparatus can include a measuring means for determining an amount of corrosion of the at least one reactive material based in part on at least the reaction.
Another embodiment of the present invention can include a method of manufacture for a corrosion monitor. The method can include providing a nanostructure including at least one reactive material, wherein the at least one reactive material is adapted to be exposed to a corrosive atmosphere. In addition, the method can include providing an electronic chip, and mounting the nanostructure to a portion of the electronic chip. Furthermore, the method can include providing a processor, wherein the processor is capable of detecting a reaction associated with the at least one reactive material, and based at least in part on the reaction, the processor is capable of determining an amount of corrosion of the at least one reactive material.
The method can also include mounting the electronic chip to an output device capable of receiving a signal associated with the amount of corrosion of the at least one reactive material. In addition, the output device is capable of displaying an indicator associated with the amount of corrosion of the at least one reactive material.
One aspect of an embodiment of the invention can provide methods and apparatuses for monitoring or detecting corrosion that are highly sensitive and precise.
Another aspect of an embodiment of the invention can provide methods for manufacturing a corrosion monitor using nanostructures.
Yet another aspect of an embodiment of the invention can provide an apparatus and methods of manufacture for mounting nanostructures on a microelectronics chip.
These and other aspects, features and advantages of the invention will become apparent after a review of the following detailed description of the disclosed embodiments and the appended claims.
-BRIEF DESCRIPTION OF DRAWINGS
FIG. I is view of a schematic diagram of an apparatus in accordance with one embodiment of the invention.
FIG. 2 is a detailed illustration of a microcantilever for the apparatus shown in FIG. 1.
FIG. 3 is a flowchart illustrating a method in accordance with one embodiment of the invention.
FIG. 4 is a flowchart illustrating another method in accordance with one embodiment of the invention.
FIG. 5 is an example of a detection circuit with a nanostructure in accordance with an embodiment of the invention.
DETAILED DESCRIPTION OF EMBODIMENTS
Embodiments of the invention are designed to detect and to monitor corrosion. The term "nanostructure" used in this specification generally defines a class of objects used in nanotechnology-related applications, such as a nanotubes, carbon nanotubes, nanoballs, nanoparticles, and other relatively small objects and devices.
The term "chip" used in this specification generally defines a microelectronics chip, semiconductor chip, computer chip, circuit chip, microprocessor, processor, or any type of suitable chip in an electronics or processor-based platform.
The term "corrosive atmosphere" used in this specification can include, but is not limited to, an atmosphere within an electronic device, an atmosphere within a processor-based device, an atmosphere within an enclosed space, an atmosphere within a room, an atmosphere within a building, and an atmosphere within an air duct.
The apparatus, methods, and other embodiments of the invention is useful for detecting and monitoring corrosion in various environments including, but not limited to, industrial process measurement and control rooms, motor control centers, electrical rooms, semiconductor clean rooms, electronic fabrication sites, commercial data centers, museums, libraries, and archival storage rooms. Such embodiments are also useful for checking the exhaustion level of filtration media being used to protect the environment of such spaces. Other embodiments are useful for identifying a contaminant gas or gases, particularly a contaminant gas or gases in an environment, which have caused or might cause corrosion of a metal in that environment.
Furthermore, the apparatus, methods, and other embodiments of the invention may also find application in any electronic device or any processor-based device.
Such devices include, but are not limited to, electronic chips, semiconductor chips, microelectronic chips, circuit chips, computer chips, telephones, cell phones, smart phones, personal communication devices, personal digital assistants (PDAs), tablets, computers, notebooks, desktops, mainframe computers, MP3 players, CD / DVD
players, audio player devices, radios, televisions, etc.
An environment for the embodiment shown in FIGS. 1 and 2 can be an electrical chip such as a microelectronics chip, semiconductor chip, computer chip, circuit chip, microprocessor, processor, or any other suitable component in an electronic or processor-based platform.
FIG. 1 is a schematic view of an apparatus in accordance with an embodiment of the invention. The apparatus shown in FIG. 1 is a corrosion monitor 100 for detecting and monitoring corrosion in a corrosive atmosphere. The corrosion monitor 100 includes a nanostructure, such as a microcantilever 102. The nanostructure includes at least one reactive material adapted to react with a corrosive atmosphere, such as a metallic material 104. The nanostructure is in the form of, but is not limited to, a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, a nanocantilever, or any combination thereof. A suitable reactive material can include, but is not limited to, a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), permalloy, or any combination thereof.
In the embodiment shown, providing a nanostructure such as a microcantilever 102 with a reactive material 104 can be accomplished by, for example, coating a copper electrode onto a silicon wafer. Providing a nanostructure with at least one reactive material, such as a microcantilever 102 with reactive material 104, can be achieved by various methods including, but not limited to, integrating, bonding, layering, etching, applying, attaching, connecting thin film deposition techniques, and ion beam sputtering. Other examples of providing a nanostructure with a reactive material 104 can include coating a portion of a microcantilever with a metallic material, coating a portion of a nanostructure with a metallic material, coating a portion of a nanotube with a metallic material, or coating a portion of one or more nanoballs with a metallic material. In this manner, at least a portion of the nanostructure includes at least one reactive material.
Suitable nanostructures for the methods and apparatuses provided herein may be obtained from commercial suppliers such as NanoDevices of Santa Barbara, California. Suitable methods to coat or otherwise apply at least one reactive material to a nanostructure may be performed by nanotechnology and/or nanoscience material processors such as BioForce Nanosciences, Inc. of Ames, Iowa.
In at least one embodiment of the invention, multiple reactive materials can be coated onto the nanostructure, and some or all of the reactive materials can be adapted to react with a corrosive atmosphere, material, or substance. In one embodiment, reactive materials can be adapted to react with different types of corrosive atmospheres, materials, or substances.
In another embodiment, at least one reactive material is coated onto multiple nanostructures that are integrated or otherwise connected together such that some or all of the nanostructures are monitored separately or as a single device. In one embodiment, the nanostructures are monitored to react with particular corrosive atmospheres, materials, or substances.
Furthermore, the apparatus shown in FIG. 1 may optionally include a means for detecting a reaction associated with the reactive material. A means for detecting a reaction associated with the reactive material can be, for example, facilitated by a processor 106 in operative communication with the nanostructure, such as the microcantilever 102 shown in FIG. 1. The processor 106 may include or be capable of executing a set of computer-executable instructions, such as instructions 108 stored on a computer-readable medium or in memory 110, for detecting a reaction associated with a reactive material.
Such processors may comprise a microprocessor, an ASIC, and state machines. Such processors comprise, or may be in communication with, media, for example computer-readable media, which stores instructions that, when executed by the processor, cause the processor to perform the steps described herein.
Embodiments of computer-readable media include, but are not limited to, an electronic, optical, magnetic, or other storage or transmission device capable of providing a processor, such as the processor 106, with computer-readable instructions. Other examples of suitable media include, but are not limited to, a floppy disk, CD-ROM, DVD, magnetic disk, memory chip, ROM, RAM, an ASIC, a configured processor, all optical media, all magnetic tape or other magnetic media, or any other medium from which a computer processor can read instructions. Also, various other forms of computer-readable media may transmit or carry instructions to a computer, including a router, private or public network, or other transmission device or channel, both wired and wireless. The instructions may comprise code from any computer-programming language, including, for example, CTM, C++TM, C#TM, Visual BasicTM, JavaTM, PythonTM, PerlTM, and JavaScriptTM.
A reaction associated with a reactive material can include, but is not limited to, a change in mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, a chemical characteristic of the reactive material, or any combination thereof.
For example, the processor 106 shown can include or is capable of executing a set of instructions to detect a mass change in a reactive material associated with a nanostructure. In most instances, a predefined mass of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent mass, change in mass, or difference.
In another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in displacement in a reactive material associated with a nanostructure. In most instances, a predefined position of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent position, change in position, or difference.
In another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in vibration frequency in a reactive material associated with a nanostructure. In most instances, a predefined vibration frequency of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent vibration frequency, change in vibration frequency, or difference.
By way of another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in electrical resistance in a reactive material associated with a nanostructure. In most instances, a predefined electrical resistance of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent electrical resistance, change in electrical resistance, or difference.
In yet another example, the processor 106 can include or is capable of executing a set of instructions to detect a change in electrical voltage in a reactive material associated with a nanostructure. In most instances, a predefined electrical voltage of a particular reactive material associated with a nanostructure is known or measured, and can be compared with a subsequent electrical voltage, change in electrical voltage, or difference.
Other examples of physical, electrical, and/or chemical characteristics associated with a reactive material that can be detected and monitored for changes and within the scope of the invention, will be recognized by those skilled in the art upon reviewing this specification.
Further, the apparatus optionally also includes a measuring means for determining an amount of corrosion of the at least one reactive material based at least in part on the reaction. In the embodiment shown in FIG. 1, the measuring means is facilitated by the processor 106 in operative communication with a nanostructure, such as the microcantilever 102, as shown. The processor 106 can include or is capable of executing a set of computer-executable instructions, such as instructions stored on a computer-readable medium, for determining an amount of corrosion of the reactive material based at least in part on the reaction. Generally, detection of a reaction with a particular reactive material can be quantified or otherwise measured depending on the type of reaction detected. A predefined correlation between a quantitative measurement of the reaction and an amount of the reactive material remaining can be used to determine an amount of corrosion of the reactive material.
For example, the processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected mass change in a reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material remaining. That is, if a mass change in a reactive material associated with a nanostructure is detected, the mass change can be correlated to an amount of corrosion of the reactive material. In this example, mass change of a particular reactive material is correlated to a remaining thickness (in angstroms or other unit of thickness) of the reactive material, and the amount of corrosion of the reactive material is determined.
In another example, if a displacement of a reactive material associated with a nanostructure is detected, the displacement is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected displacement in a reactive material associated with a nanostructure to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
In another example, if a change in vibration frequency of a reactive material associated with a nanostructure is detected, the change in vibration frequency is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected change in vibration frequency in the reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
By way of another example, if a change in electrical resistance of a reactive material associated with a nanostructure is detected, the change in electrical resistance is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions to correlate an amount of a detected change in electrical resistance in the reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
In yet another example, if a change in electrical voltage of a reactive material associated with a nanostructure is detected, the change in electrical voltage is correlated to an amount of corrosion of the reactive material. The processor 106 can include or is capable of executing a set of instructions correlate an amount of a detected change in electrical voltage in the reactive material to the amount of the reactive material remaining and to determine an amount of corrosion of the reactive material.
Other detected or otherwise monitored changes in physical, electrical, and/or chemical characteristics associated with a reactive material associated with a nanostructure can be correlated to an amount of corrosion of the reactive material in accordance with embodiments of the invention, and will be recognized by those skilled in the art upon reviewing this specification. Various responses over time for changes in physical, electrical, and/or chemical characteristics can be monitored and correlated to determine amounts of corrosion of reactive materials.
In at least one embodiment, an apparatus can include an output device for displaying the amount of corrosion. In the example shown in FIG. 1, the output device is a display device 112 associated with the processor 106. The output device can also include, but is not limited to, a meter, an indicator, an LED, an LCD, a display, a plasma display, a touch screen device, a projector display, a monitor, or any other suitable device for outputting an amount, measurement, determination, or result associated with the processor 106. Those skilled in the art will recognize that an output device can be integrated with components of an apparatus in accordance with the invention, or can be a separate component in operative communication with the other components of an apparatus in accordance with the invention.
In at least one embodiment, some or all of the components of an apparatus such as the corrosion monitor 100 shown in FIG. 1 can be adapted to mount to an electronic chip, such as a semiconductor chip or a silicon wafer. Some or all of the components of the apparatus can be integrated with or otherwise mounted to the electronic chip. In another embodiment, some or all of the components of an apparatus can be integrated with the electronic chip, while remaining components are operatively in communication with the chip-integrated components. For example, a nanostructure such as the microcantilever 102, as shown and described above, and the processor 106, as shown and described above, can each be integrated with an electronic chip for an electronic device or processor-based platform. By way of example, a diagram of a detection circuit with a nanostructure in accordance with an embodiment of the invention is illustrated in FIG. 5. An output device, such as the display device 108, as shown and described above, can be operatively in communication with the processor 106, or can otherwise be in operative communication with the electronic chip, or electronic device or processor-based platform. In this manner, the apparatus for detecting and monitoring corrosion can be implemented in accordance with various embodiments of the invention.
FIG. 2 is a detailed illustration of a microcantilever for the apparatus shown in FIG. 1. The microcantilever 102, as shown in FIG. 2, includes a silicon wafer and a copper electrode 202. Other combinations of nanostructures and reactive materials can be utilized in accordance with embodiments of the invention. As shown, the example dimensions of the microcantilever indicate that the sizes of nanostructures and reactive materials utilized in accordance with embodiments of the invention may be relatively small.
FIG. 3 is a flowchart illustrating a method in accordance with an embodiment of the invention. The method 300 of FIG. 3 is a method for monitoring and detecting corrosion with a nanostructure in a corrosive atmosphere. Other embodiments of the method can have fewer or greater steps in accordance with the invention. The method 300 begins at block 302.
In block 302, a nanostructure comprising at least one reactive material is provided. In one embodiment, a nanostructure can include one of the following:
a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, or a nanocantilever. In another embodiment, a reactive material can include one of the following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy. In yet another embodiment, providing at least one nanostructure comprising at least one reactive material comprises coating a copper electrode on a silicon wafer.
In one embodiment, providing a nanostructure comprising at least one reactive material can include one of the following: mounting a nanostructure to a microelectronics chip, mounting a nanostructure to a semiconductor chip, mounting a nanostructure within an electronic device, or mounting a nanostructure within an enclosure.
Block 302 is followed by block 304, in which the at least one reactive material is exposed to a corrosive atmosphere.
Block 304 is followed by block 306, in which a reaction with the at least one reactive material is detected. In embodiment, a reaction can include a change in one of the following: mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive material. In another embodiment, detecting a reaction with the at least one reactive material comprises determining a difference between an initial characteristic and a subsequent characteristic of the at least one reactive material.
Block 306 is followed by block 308, in which, based on at least the reaction, an amount of corrosion associated with the at least one reactive material is determined. In one embodiment, determining an amount of corrosion associated with the at least one reactive material can include determining a difference between an initial characteristic and a current characteristic of the at least one reactive material, and associating the difference with an amount of corrosion. The method 300 ends at block 308. In one embodiment, a reaction can include a change in one of the following: mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive material. The method 300 ends at block 308.
FIG. 4 is a flowchart illustrating another method in accordance with an embodiment of the invention. The method 400 in FIG. 4 is a method for manufacturing a corrosion monitor. Other embodiments of the method can have fewer or greater steps in accordance with the invention. The method 400 begins at block 402.
In block 402, a nanostructure comprising at least one reactive material is provided, wherein the at least one reactive material is adapted to react with a corrosive atmosphere.
Block 402 is followed by block 404, in which an electronic chip is provided, wherein the electronic chip is adapted to mount a portion of the nanostructure.
Block 404 is followed by block 406, in which the nanostructure is mounted to a portion of the electronic chip.
Block 406 is followed by block 408, in which a processor is provided, wherein the processor is capable of detecting a reaction associated with the at least one reactive material, and further capable of determining an amount of corrosion of the at least one reactive material based in part on at least the reaction. In one embodiment, the processor is in operative communication with the nanostructure.
Block 408 is followed by block 410, in which the electronic chip is connected to an output device, wherein the amount of corrosion of the at least one reactive material can be displayed. The method 400 ends at block 410.
FIG. 5 is a diagram of an example of a detection circuit with a nanostructure in accordance with an embodiment of the invention. The detection circuit 500 can be installed in a variety of electronic devices or processor-based devices, such as a corrosion monitor.
The detection circuit 500 shown in FIG. 5 includes a nanostructure such as a microcantilever 502. The detection circuit 500 shown also includes a power supply 504, a processor 506 and a memory such as an EEPROM 508, and an oscillator 510.
A detection circuit in accordance with other embodiments of the invention can have other configurations and arrangements of components.
In the detection circuit 500 shown, the power supply 504 can provide current as needed to some or all of the components arranged in the circuit, including the microcantilever 502, EEPROM 506, and oscillator 508. A suitable power supply can be a 3 - 5 VDC power supply manufactured by Bias Power Technologies, Inc.
In the detection circuit 500 shown, the microcantilever 502 can be exposed to, for instance, a corrosive atmosphere, substance or material. In response to the corrosive atmosphere, substance or material, the microcantilever 502 can, for instance, deflect or otherwise react to the corrosive atmosphere, substance or material.
In one embodiment, at least one reactive material coated, applied, or mounted to the microcantilever 502 can react to the corrosive atmosphere, substance, or material. A
suitable microcantilever can be a DMASP series micro-actuated silicon active probe manufactured by Veeco Instruments, Inc. In any instance, a signal associated with the reaction of the microcantilever 502 can be detected, transmitted to, or otherwise received by the oscillator 510.
The oscillator 510 shown in FIG. 5 can detect, or receive a signal associated with the reaction of the microcantilever to the corrosive atmosphere, substance, or material. The oscillator 510 can generate a frequency output signal based at least in part on the reaction of the microcantilever 502 to the corrosive atmosphere, substance, or material. For example, the oscillator 510 can provide a relatively greater frequency response signal based on a signal associated with a relatively large deflection of the microcantilever 502. Likewise, the oscillator 510 can provide a relatively smaller frequency response signal based on a signal associated with a relatively small deflection of the microcantilever 502. A suitable oscillator can be a HA7210 series kHz ¨ 10 MHz, low power, crystal-type oscillator manufactured and distributed by Intersil Corporation of Milpitas, California.
In one embodiment, a comparison between frequency response signals from an oscillator 510 can be used to determine a difference in the frequency response based at least in part on the signal received from the microcantilever 502 during a predefined period of time, such as an initial time and a subsequent time. The difference in the frequency response can be associated with an amount of corrosion of the reactive material.
The processor 506 can provide or otherwise execute a set of instructions or commands to control some or all of the components of the detection circuit 500. An associated memory such as the EEPROM 508 can provide data storage or a computer-readable medium for storing a set of instructions or commands for execution by the processor 506. For example, the processor 506 can execute a set of instructions for detecting, measuring, and monitoring corrosion using a nanostructure such as a microcantilever 502. A
suitable processor can be a PIC18F1220 series microcontroller manufactured by MircoChip Technology, Inc. A suitable memory can be a serial flash-type memory chip manufactured by ATMEL Corporation.
It should be understood, of course, that the foregoing relates only to certain embodiments of the present invention and that numerous modifications or alterations may be made therein without departing from the scope of the invention.
Claims (20)
1. A method for detecting corrosion with a nanostructure in a corrosive atmosphere, comprising:
providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto;
exposing a portion of the at least one reactive material to a corrosive atmosphere;
detecting a reaction with the at least one reactive material; and based at least in part on the reaction, determining an amount of corrosion associated with the at least one reactive material.
providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto;
exposing a portion of the at least one reactive material to a corrosive atmosphere;
detecting a reaction with the at least one reactive material; and based at least in part on the reaction, determining an amount of corrosion associated with the at least one reactive material.
2. The method of claim 1, wherein providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto comprises coating a copper electrode on a silicon wafer.
3. The method of claim 1, wherein providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto comprises coating a nanostructure with a plurality of reactive materials, each reactive material capable of reacting with a different substance.
4. The method of claim 1, wherein providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto comprises coating each of a plurality of nanostructures with a respective reactive material, each respective reactive material capable of reacting with a different substance.
5. The method of claim 1, wherein the nanostructure comprises one of the following: a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, or a nanocantilever.
6. The method of claim 1, wherein the at least one reactive material comprises one of the following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy.
7. The method of claim 1 , wherein detecting a reaction with the at least one reactive material comprises determining a difference between an initial characteristic and a subsequent characteristic of the at least one reactive material.
8. The method of claim 1, wherein the reaction comprises a change in one of the following: mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive material.
9. The method of claim 1, wherein determining an amount of corrosion associated with the at least one reactive material comprises determining a difference between an initial characteristic and a current characteristic of the at least one reactive material, and associating the difference with an amount of corrosion.
10. An apparatus for detecting and monitoring corrosion, comprising:
an electronic chip comprising at least one nanostructure having at least one reactive material coated, applied or mounted thereto, wherein the at least one reactive material is capable of reacting with a corrosive atmosphere;
a processor capable of receiving a signal associated with a reaction of the at least one reactive material, and based at least in part on the signal, determining an amount of corrosion of the at least one reactive material; and generating an output signal associated with the amount of corrosion of the at least one reactive material; and an output device capable of receiving the output signal from the electronic chip; and displaying an indicator associated with the amount of corrosion of the at least one reactive material.
an electronic chip comprising at least one nanostructure having at least one reactive material coated, applied or mounted thereto, wherein the at least one reactive material is capable of reacting with a corrosive atmosphere;
a processor capable of receiving a signal associated with a reaction of the at least one reactive material, and based at least in part on the signal, determining an amount of corrosion of the at least one reactive material; and generating an output signal associated with the amount of corrosion of the at least one reactive material; and an output device capable of receiving the output signal from the electronic chip; and displaying an indicator associated with the amount of corrosion of the at least one reactive material.
11. The apparatus of claim 10, wherein the at least one reactive material is coated on the nanostructure.
12. The apparatus of claim 10, wherein the at least one nanostructure having at least one reactive material coated, applied or mounted thereto comprises a plurality of nanostructures, each coated with a respective reactive material capable of reacting with a respective substance.
13. The apparatus of claim 10, wherein the at least one nanostructure comprises one of the following: a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, or a nanocantilever.
14. The apparatus of claim 10, wherein the at least one reactive material comprises one of the following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy.
15. The apparatus of claim 10, wherein determining an amount of corrosion of the at least one reactive material comprises determining a difference between an initial signal associated with the at least one reactive material and a subsequent signal associated with the reaction of the at least one reactive material.
16. The apparatus of claim 10, wherein the reaction comprises a change in one of the following: mass, displacement, vibration frequency, electrical resistance, electrical voltage, a physical characteristic of the reactive material, an electrical characteristic of the reactive material, or a chemical characteristic of the reactive material.
17. An apparatus for detecting and monitoring corrosion, comprising:
at least one nanostructure having at least one reactive material adapted to be exposed to a corrosive atmosphere coated, applied or mounted thereto;
a detection means for detecting a reaction associated with the at least one reactive material; and a measuring means for determining an amount of corrosion of the at least one reactive material based in part on at least the reaction.
at least one nanostructure having at least one reactive material adapted to be exposed to a corrosive atmosphere coated, applied or mounted thereto;
a detection means for detecting a reaction associated with the at least one reactive material; and a measuring means for determining an amount of corrosion of the at least one reactive material based in part on at least the reaction.
18. The apparatus of claim 17, wherein the at least one nanostructure comprises one of the following: a microcantilever, a nanotube, a carbon nanotube, a nanoparticle, a nanoball, or a nanocantilever.
19. The apparatus of claim 17, wherein the at least one reactive material comprises one of the following: a metallic material, copper (Cu), silver (Ag), aluminum (Al), zinc (Zn), molybdenum (Mo), or permalloy.
20. A method of manufacture for a corrosion monitor, comprising:
providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto, the at least one reactive material adapted to be exposed to a corrosive atmosphere:
providing an electronic chip, and mounting the at least one nanostructure having at least one reactive material coated, applied or mounted thereto to a portion of the electronic chip;
providing a processor, wherein the processor is capable of detecting a reaction associated with the at least one reactive material, and based at least in part on the reaction, determining an amount of corrosion of the at least one reactive material; and mounting the electronic chip to an output device capable of receiving a signal associated with the amount of corrosion of the at least one reactive material; and displaying an indicator associated with the amount of corrosion of the at least one reactive material.
providing at least one nanostructure having at least one reactive material coated, applied or mounted thereto, the at least one reactive material adapted to be exposed to a corrosive atmosphere:
providing an electronic chip, and mounting the at least one nanostructure having at least one reactive material coated, applied or mounted thereto to a portion of the electronic chip;
providing a processor, wherein the processor is capable of detecting a reaction associated with the at least one reactive material, and based at least in part on the reaction, determining an amount of corrosion of the at least one reactive material; and mounting the electronic chip to an output device capable of receiving a signal associated with the amount of corrosion of the at least one reactive material; and displaying an indicator associated with the amount of corrosion of the at least one reactive material.
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| US60945404P | 2004-09-13 | 2004-09-13 | |
| US60/609,454 | 2004-09-13 | ||
| PCT/US2005/032510 WO2006137849A1 (en) | 2004-09-13 | 2005-09-13 | Methods and apparatuses for detecting and monitoring corrosion using nanostructures |
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| CA2583376A1 CA2583376A1 (en) | 2006-12-28 |
| CA2583376C true CA2583376C (en) | 2015-03-24 |
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| CA2583376A Expired - Fee Related CA2583376C (en) | 2004-09-13 | 2005-09-13 | Methods and apparatuses for detecting and monitoring corrosion using nanostructures |
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| JP (1) | JP2008512688A (en) |
| CA (1) | CA2583376C (en) |
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| AU2012231004A1 (en) * | 2011-03-21 | 2013-05-02 | Purafil, Inc. | Systems and methods for detecting and identifying contaminants in a gaseous environment |
| DE112017002910T5 (en) | 2016-06-10 | 2019-02-21 | Analog Devices, Inc. | Passive sensor system with components made of carbon nanotubes |
| US10502676B2 (en) | 2016-06-30 | 2019-12-10 | Seth S. Kessler | Disposable witness corrosion sensor |
| US10939379B2 (en) | 2016-11-14 | 2021-03-02 | Analog Devices Global | Wake-up wireless sensor nodes |
| WO2021262457A2 (en) | 2020-06-12 | 2021-12-30 | Analog Devices International Unlimited Company | Self-calibrating polymer nano composite (pnc) sensing element |
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| CA1180914A (en) * | 1981-08-17 | 1985-01-15 | James M. O'connor | Micromechanical chemical sensor |
| JP3230840B2 (en) * | 1992-06-10 | 2001-11-19 | 株式会社日立製作所 | Corrosion environment sensor and corrosion environment control device |
| JPH07301590A (en) * | 1994-05-06 | 1995-11-14 | Hitachi Ltd | Monitor for parameter of atmospheric corrosive environment and apparatus equipped therewith |
| US5874309A (en) * | 1996-10-16 | 1999-02-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for monitoring metal corrosion on integrated circuit wafers |
| JP3377162B2 (en) * | 1997-01-17 | 2003-02-17 | 株式会社リコー | Thermal analyzer and measurement method thereof |
| JP3643521B2 (en) * | 1999-07-29 | 2005-04-27 | 株式会社日立製作所 | Corrosion environment monitoring device |
| JP2001056278A (en) * | 1999-08-20 | 2001-02-27 | Stanley Electric Co Ltd | Mass detection type gas sensor |
| JP2001180250A (en) * | 1999-12-27 | 2001-07-03 | Inoac Corp | Air guide duct |
| US6953977B2 (en) * | 2000-02-08 | 2005-10-11 | Boston Microsystems, Inc. | Micromechanical piezoelectric device |
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- 2005-09-13 WO PCT/US2005/032510 patent/WO2006137849A1/en active Application Filing
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| WO2006137849A1 (en) | 2006-12-28 |
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| EP1792162A1 (en) | 2007-06-06 |
| CA2583376A1 (en) | 2006-12-28 |
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