BE739834A - ADDITIVES TO IMPROVE THE SENSITIVITY OF NEGATIVE PHOTORESERVES - Google Patents

ADDITIVES TO IMPROVE THE SENSITIVITY OF NEGATIVE PHOTORESERVES

Info

Publication number
BE739834A
BE739834A BE739834DA BE739834A BE 739834 A BE739834 A BE 739834A BE 739834D A BE739834D A BE 739834DA BE 739834 A BE739834 A BE 739834A
Authority
BE
Belgium
Prior art keywords
photoreserves
additives
sensitivity
negative
improve
Prior art date
Application number
Other languages
French (fr)
Original Assignee
Western Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Ltd filed Critical Western Electric Co Ltd
Publication of BE739834A publication Critical patent/BE739834A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE739834D 1968-10-03 1969-10-03 ADDITIVES TO IMPROVE THE SENSITIVITY OF NEGATIVE PHOTORESERVES BE739834A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US76486768A 1968-10-03 1968-10-03
US76486668A 1968-10-03 1968-10-03

Publications (1)

Publication Number Publication Date
BE739834A true BE739834A (en) 1970-03-16

Family

ID=27117530

Family Applications (1)

Application Number Title Priority Date Filing Date
BE739834D BE739834A (en) 1968-10-03 1969-10-03 ADDITIVES TO IMPROVE THE SENSITIVITY OF NEGATIVE PHOTORESERVES

Country Status (5)

Country Link
BE (1) BE739834A (en)
DE (1) DE1949502C3 (en)
GB (1) GB1291441A (en)
NL (1) NL6915006A (en)
SE (1) SE361366B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3987215A (en) * 1974-04-22 1976-10-19 International Business Machines Corporation Resist mask formation process
GB201413924D0 (en) 2014-08-06 2014-09-17 Univ Manchester Electron beam resist composition
GB201517273D0 (en) * 2015-09-30 2015-11-11 Univ Manchester Resist composition
US20220005687A1 (en) * 2020-07-02 2022-01-06 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing a semiconductor device and pattern formation method

Also Published As

Publication number Publication date
DE1949502A1 (en) 1970-04-09
DE1949502C3 (en) 1975-01-16
DE1949502B2 (en) 1974-05-30
NL6915006A (en) 1970-04-07
SE361366B (en) 1973-10-29
GB1291441A (en) 1972-10-04

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