AU6121899A - Exposure system - Google Patents

Exposure system

Info

Publication number
AU6121899A
AU6121899A AU61218/99A AU6121899A AU6121899A AU 6121899 A AU6121899 A AU 6121899A AU 61218/99 A AU61218/99 A AU 61218/99A AU 6121899 A AU6121899 A AU 6121899A AU 6121899 A AU6121899 A AU 6121899A
Authority
AU
Australia
Prior art keywords
exposure system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU61218/99A
Inventor
Osamu Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU6121899A publication Critical patent/AU6121899A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU61218/99A 1998-10-13 1999-10-13 Exposure system Abandoned AU6121899A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10/290326 1998-10-13
JP29032698 1998-10-13
PCT/JP1999/005633 WO2000022656A1 (en) 1998-10-13 1999-10-13 Exposure system

Publications (1)

Publication Number Publication Date
AU6121899A true AU6121899A (en) 2000-05-01

Family

ID=17754637

Family Applications (1)

Application Number Title Priority Date Filing Date
AU61218/99A Abandoned AU6121899A (en) 1998-10-13 1999-10-13 Exposure system

Country Status (3)

Country Link
AU (1) AU6121899A (en)
TW (1) TW439114B (en)
WO (1) WO2000022656A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001345263A (en) 2000-03-31 2001-12-14 Nikon Corp Aligner, exposure method, and device-manufacturing method
JPWO2002075795A1 (en) * 2001-03-19 2004-07-08 株式会社ニコン Exposure method and apparatus, and device manufacturing method
JP2003068630A (en) * 2001-08-29 2003-03-07 Kyocera Corp Aligner
JP4721575B2 (en) * 2001-08-29 2011-07-13 京セラ株式会社 Exposure equipment
KR20040024516A (en) * 2002-09-13 2004-03-20 에이에스엠엘 네델란즈 비.브이. Lithographic apparatus and device manufacturing method
JP2008034740A (en) * 2006-07-31 2008-02-14 Dainippon Screen Mfg Co Ltd Load lock device, substrate processing apparatus and substrate processing system equipped therewith
NL2007439A (en) * 2010-10-19 2012-04-23 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
KR102323993B1 (en) 2017-03-15 2021-11-10 에이에스엠엘 네델란즈 비.브이. Devices that deliver gases and light sources that generate harmonic radiation
CN111929990B (en) * 2020-07-31 2023-02-07 中国科学院微电子研究所 Hydrogen ion trap, ammonium sulfate prevention system, photoetching system and ammonium sulfate prevention method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5430303A (en) * 1992-07-01 1995-07-04 Nikon Corporation Exposure apparatus
JP3031790B2 (en) * 1992-12-10 2000-04-10 キヤノン株式会社 Semiconductor manufacturing equipment
JPH0737783A (en) * 1993-07-20 1995-02-07 Fujitsu Ltd Aligner
JPH09270385A (en) * 1996-03-29 1997-10-14 Nikon Corp Environmental control device for exposure device

Also Published As

Publication number Publication date
WO2000022656A1 (en) 2000-04-20
TW439114B (en) 2001-06-07

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase