AU4194896A - Apparatus for depositing a layer of material on a substrate - Google Patents

Apparatus for depositing a layer of material on a substrate

Info

Publication number
AU4194896A
AU4194896A AU41948/96A AU4194896A AU4194896A AU 4194896 A AU4194896 A AU 4194896A AU 41948/96 A AU41948/96 A AU 41948/96A AU 4194896 A AU4194896 A AU 4194896A AU 4194896 A AU4194896 A AU 4194896A
Authority
AU
Australia
Prior art keywords
depositing
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU41948/96A
Inventor
Laxminarayana Ganapathi
Steven E Giles
Rama Rao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EDSI Inc
Original Assignee
EDSI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EDSI Inc filed Critical EDSI Inc
Publication of AU4194896A publication Critical patent/AU4194896A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
AU41948/96A 1994-10-18 1995-10-18 Apparatus for depositing a layer of material on a substrate Abandoned AU4194896A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32489494A 1994-10-18 1994-10-18
PCT/US1995/013585 WO1996012389A1 (en) 1994-10-18 1995-10-18 Apparatus for depositing a layer of material on a substrate
US324894 1999-06-03

Publications (1)

Publication Number Publication Date
AU4194896A true AU4194896A (en) 1996-05-06

Family

ID=23265565

Family Applications (1)

Application Number Title Priority Date Filing Date
AU41948/96A Abandoned AU4194896A (en) 1994-10-18 1995-10-18 Apparatus for depositing a layer of material on a substrate

Country Status (2)

Country Link
AU (1) AU4194896A (en)
WO (1) WO1996012389A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (en) 1999-04-09 2004-08-18 三宅 正二郎 Sliding member and manufacturing method thereof
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (en) 2003-07-31 2012-01-25 日産自動車株式会社 gear
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
DE102021128160B3 (en) * 2021-10-28 2023-01-05 Joachim Richter Systeme und Maschinen GmbH & Co. KG Apparatus and method for fabricating a graphene sheet

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475069A1 (en) * 1980-02-01 1981-08-07 Commissariat Energie Atomique METHOD FOR RAPID DOPING OF SEMICONDUCTORS
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
FR2542327B1 (en) * 1983-03-07 1986-03-07 Bensoussan Marcel
US4762975A (en) * 1984-02-06 1988-08-09 Phrasor Scientific, Incorporated Method and apparatus for making submicrom powders
USH872H (en) * 1987-09-15 1991-01-01 The United States Of America As Represented By The Department Of Energy Method of applying coatings to substrates
US5098737A (en) * 1988-04-18 1992-03-24 Board Of Regents The University Of Texas System Amorphic diamond material produced by laser plasma deposition
US4987007A (en) * 1988-04-18 1991-01-22 Board Of Regents, The University Of Texas System Method and apparatus for producing a layer of material from a laser ion source
DE3914476C1 (en) * 1989-05-02 1990-06-21 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
JP3192666B2 (en) * 1990-03-02 2001-07-30 住友電気工業株式会社 Method and apparatus for producing oxide superconducting film
JP2742631B2 (en) * 1990-07-24 1998-04-22 トヨタ自動車株式会社 Manufacturing method of amorphous magnetic film
JP2917587B2 (en) * 1991-06-12 1999-07-12 住友電気工業株式会社 Method for forming composite oxide superconducting thin film

Also Published As

Publication number Publication date
WO1996012389A1 (en) 1996-04-25

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