AU2003284659A1 - Exposure apparatus and exposure method - Google Patents

Exposure apparatus and exposure method

Info

Publication number
AU2003284659A1
AU2003284659A1 AU2003284659A AU2003284659A AU2003284659A1 AU 2003284659 A1 AU2003284659 A1 AU 2003284659A1 AU 2003284659 A AU2003284659 A AU 2003284659A AU 2003284659 A AU2003284659 A AU 2003284659A AU 2003284659 A1 AU2003284659 A1 AU 2003284659A1
Authority
AU
Australia
Prior art keywords
exposure
exposure apparatus
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003284659A
Inventor
Kazuyuki Kato
Motoo Koyama
Michio Noboru
Masashi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003284659A1 publication Critical patent/AU2003284659A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
    • G02B19/0066—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED in the form of an LED array
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2003284659A 2002-11-25 2003-11-25 Exposure apparatus and exposure method Abandoned AU2003284659A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2002-341545 2002-11-25
JP2002341545 2002-11-25
JP2003065646 2003-03-11
JP2003-65646 2003-03-11
JP2003-133190 2003-05-12
JP2003133190A JP2004335953A (en) 2002-11-25 2003-05-12 Aligner and exposure method
PCT/JP2003/014973 WO2004049410A1 (en) 2002-11-25 2003-11-25 Exposure apparatus and exposure method

Publications (1)

Publication Number Publication Date
AU2003284659A1 true AU2003284659A1 (en) 2004-06-18

Family

ID=32397747

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003284659A Abandoned AU2003284659A1 (en) 2002-11-25 2003-11-25 Exposure apparatus and exposure method

Country Status (5)

Country Link
JP (1) JP2004335953A (en)
KR (1) KR20050086755A (en)
AU (1) AU2003284659A1 (en)
TW (1) TW200416824A (en)
WO (1) WO2004049410A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4938069B2 (en) * 2004-03-31 2012-05-23 日立ビアメカニクス株式会社 Pattern exposure method and pattern exposure apparatus
JP2006019412A (en) * 2004-06-30 2006-01-19 Canon Inc Exposure device and manufacturing method of device
JP4771753B2 (en) * 2005-06-08 2011-09-14 新光電気工業株式会社 Surface light source control apparatus and surface light source control method
JP2009302225A (en) * 2008-06-12 2009-12-24 Nikon Corp Light guide, illuminating device, exposure apparatus, and device manufacturing method
JP5245775B2 (en) * 2008-12-04 2013-07-24 株式会社ニコン Illumination apparatus, exposure apparatus, and device manufacturing method
KR101322737B1 (en) 2011-12-21 2013-10-29 마이다스시스템주식회사 Mask aligner using a UV-LED module
JP6866565B2 (en) 2016-01-20 2021-04-28 ウシオ電機株式会社 Light source device
JP6746934B2 (en) * 2016-02-08 2020-08-26 ウシオ電機株式会社 Light source
KR102139719B1 (en) * 2019-09-09 2020-08-12 주식회사 투에이치앤엠 UV exposure examination apparatus for display panel
JP2024048111A (en) 2022-09-27 2024-04-08 ウシオ電機株式会社 Light source

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334803A (en) * 1995-06-07 1996-12-17 Nikon Corp Uv laser beam source
JPH09179309A (en) * 1995-12-26 1997-07-11 Sony Corp Lighting device for exposure
JP4649717B2 (en) * 1999-10-01 2011-03-16 株式会社ニコン Exposure method, exposure apparatus, and device manufacturing method
JP2002303988A (en) * 2001-04-03 2002-10-18 Nippon Telegr & Teleph Corp <Ntt> Exposure device
JP2002318364A (en) * 2001-04-20 2002-10-31 Ricoh Co Ltd Illuminator
JP4546019B2 (en) * 2002-07-03 2010-09-15 株式会社日立製作所 Exposure equipment

Also Published As

Publication number Publication date
WO2004049410A1 (en) 2004-06-10
JP2004335953A (en) 2004-11-25
TW200416824A (en) 2004-09-01
KR20050086755A (en) 2005-08-30

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase