AU2002317875A8 - Catadioptrical reduction lens - Google Patents
Catadioptrical reduction lensInfo
- Publication number
- AU2002317875A8 AU2002317875A8 AU2002317875A AU2002317875A AU2002317875A8 AU 2002317875 A8 AU2002317875 A8 AU 2002317875A8 AU 2002317875 A AU2002317875 A AU 2002317875A AU 2002317875 A AU2002317875 A AU 2002317875A AU 2002317875 A8 AU2002317875 A8 AU 2002317875A8
- Authority
- AU
- Australia
- Prior art keywords
- catadioptrical
- reduction lens
- lens
- reduction
- catadioptrical reduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33927501P | 2001-12-10 | 2001-12-10 | |
US60/339,275 | 2001-12-10 | ||
PCT/EP2002/008037 WO2003050587A2 (en) | 2001-12-10 | 2002-07-19 | Catadioptrical reduction lens |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2002317875A8 true AU2002317875A8 (en) | 2003-06-23 |
AU2002317875A1 AU2002317875A1 (en) | 2003-06-23 |
Family
ID=23328263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002317875A Abandoned AU2002317875A1 (en) | 2001-12-10 | 2002-07-19 | Catadioptrical reduction lens |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1456705A2 (en) |
JP (1) | JP2005512151A (en) |
AU (1) | AU2002317875A1 (en) |
WO (1) | WO2003050587A2 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
KR101255854B1 (en) | 2003-12-02 | 2013-04-17 | 칼 짜이스 에스엠티 게엠베하 | Projection Optical System |
CN100483174C (en) * | 2004-05-17 | 2009-04-29 | 卡尔蔡司Smt股份公司 | Catadioptric projection objective with intermediate images |
US7218453B2 (en) | 2005-02-04 | 2007-05-15 | Carl Zeiss Smt Ag | Projection system, in particular for a microlithographic projection exposure apparatus |
DE102005030839A1 (en) * | 2005-07-01 | 2007-01-11 | Carl Zeiss Smt Ag | Projection exposure system with a plurality of projection lenses |
EP1746463A2 (en) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Method for correcting a lithographic projection objective and projection objective of such a kind |
DE102009037077B3 (en) | 2009-08-13 | 2011-02-17 | Carl Zeiss Smt Ag | Catadioptric projection lens |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5581379A (en) * | 1993-02-15 | 1996-12-03 | Omron Corporation | Rectangular based convex microlenses surrounded within a frame and method of making |
JP3747951B2 (en) * | 1994-11-07 | 2006-02-22 | 株式会社ニコン | Catadioptric optics |
KR0179138B1 (en) * | 1995-12-01 | 1999-04-15 | 구자홍 | Objective lens |
EP0838812B1 (en) * | 1996-10-23 | 2003-04-09 | Konica Corporation | Method for recording/reproducing on/from an optical information recording medium, optical pickup apparatus, objective lens and design method of objective lens |
DE69933973T2 (en) * | 1998-07-29 | 2007-06-28 | Carl Zeiss Smt Ag | CATADIOPRIC OPTICAL SYSTEM AND EQUIPPED EXPOSURE DEVICE |
JP3967851B2 (en) * | 1999-08-11 | 2007-08-29 | フジノン株式会社 | Fly eye lens positioning structure |
US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
JP4116224B2 (en) * | 2000-03-23 | 2008-07-09 | ローム株式会社 | Manufacturing method of lens array |
-
2002
- 2002-07-19 AU AU2002317875A patent/AU2002317875A1/en not_active Abandoned
- 2002-07-19 EP EP02747468A patent/EP1456705A2/en not_active Withdrawn
- 2002-07-19 WO PCT/EP2002/008037 patent/WO2003050587A2/en not_active Application Discontinuation
- 2002-07-19 JP JP2003551585A patent/JP2005512151A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1456705A2 (en) | 2004-09-15 |
JP2005512151A (en) | 2005-04-28 |
AU2002317875A1 (en) | 2003-06-23 |
WO2003050587A2 (en) | 2003-06-19 |
WO2003050587A3 (en) | 2003-11-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |