AU2002221058A1 - Stencil mask and manufacturing method thereof - Google Patents

Stencil mask and manufacturing method thereof

Info

Publication number
AU2002221058A1
AU2002221058A1 AU2002221058A AU2105802A AU2002221058A1 AU 2002221058 A1 AU2002221058 A1 AU 2002221058A1 AU 2002221058 A AU2002221058 A AU 2002221058A AU 2105802 A AU2105802 A AU 2105802A AU 2002221058 A1 AU2002221058 A1 AU 2002221058A1
Authority
AU
Australia
Prior art keywords
manufacturing
stencil mask
stencil
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002221058A
Inventor
Mitsuhiro Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002221058A1 publication Critical patent/AU2002221058A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AU2002221058A 2000-12-06 2001-12-05 Stencil mask and manufacturing method thereof Abandoned AU2002221058A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000371925A JP2006173142A (en) 2000-12-06 2000-12-06 Stencil mask and its manufacturing method
JP2000-371925 2000-12-06
PCT/JP2001/010638 WO2002047134A1 (en) 2000-12-06 2001-12-05 Stencil mask and manufacturing method thereof

Publications (1)

Publication Number Publication Date
AU2002221058A1 true AU2002221058A1 (en) 2002-06-18

Family

ID=18841564

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002221058A Abandoned AU2002221058A1 (en) 2000-12-06 2001-12-05 Stencil mask and manufacturing method thereof

Country Status (3)

Country Link
JP (1) JP2006173142A (en)
AU (1) AU2002221058A1 (en)
WO (1) WO2002047134A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4649780B2 (en) * 2001-06-20 2011-03-16 凸版印刷株式会社 Stencil mask, manufacturing method thereof and exposure method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04330712A (en) * 1991-04-19 1992-11-18 Mitsubishi Electric Corp Manufacture of mask for manufacturing of fine-pattern
JPH07176462A (en) * 1993-12-21 1995-07-14 Canon Inc Manufacture of x-ray mask structure, x-ray mask structure, x-ray exposure method using the structure, x-ray exposure device, and semiconductor device manufactured by applying the exposure method
JPH08254815A (en) * 1995-03-16 1996-10-01 Hoya Corp Production of transfer mask
JP3193863B2 (en) * 1996-01-31 2001-07-30 ホーヤ株式会社 Transfer mask manufacturing method
JP3875356B2 (en) * 1997-06-09 2007-01-31 Ｈｏｙａ株式会社 Transfer mask substrate and transfer mask manufacturing method using the substrate
JP3363110B2 (en) * 1998-06-23 2003-01-08 株式会社東芝 X-ray exposure mask

Also Published As

Publication number Publication date
JP2006173142A (en) 2006-06-29
WO2002047134A1 (en) 2002-06-13

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