AU2001250835A1 - Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals - Google Patents
Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystalsInfo
- Publication number
- AU2001250835A1 AU2001250835A1 AU2001250835A AU5083501A AU2001250835A1 AU 2001250835 A1 AU2001250835 A1 AU 2001250835A1 AU 2001250835 A AU2001250835 A AU 2001250835A AU 5083501 A AU5083501 A AU 5083501A AU 2001250835 A1 AU2001250835 A1 AU 2001250835A1
- Authority
- AU
- Australia
- Prior art keywords
- seed
- intergrowth
- large size
- tiled
- size single
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/14—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method characterised by the seed, e.g. its crystallographic orientation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/12—Liquid-phase epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18878400P | 2000-03-13 | 2000-03-13 | |
US60/188,784 | 2000-03-13 | ||
PCT/US2001/008047 WO2001068957A1 (en) | 2000-03-13 | 2001-03-13 | Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001250835A1 true AU2001250835A1 (en) | 2001-09-24 |
Family
ID=22694508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001250835A Abandoned AU2001250835A1 (en) | 2000-03-13 | 2001-03-13 | Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals |
Country Status (6)
Country | Link |
---|---|
US (1) | US6805745B2 (en) |
EP (1) | EP1268883A1 (en) |
JP (1) | JP2003527298A (en) |
AU (1) | AU2001250835A1 (en) |
TW (1) | TW539783B (en) |
WO (1) | WO2001068957A1 (en) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2852974A1 (en) * | 2003-03-31 | 2004-10-01 | Soitec Silicon On Insulator | PROCESS FOR THE PRODUCTION OF MONOCRYSTALLINE CRYSTALS |
US7608524B2 (en) * | 2005-04-19 | 2009-10-27 | Ii-Vi Incorporated | Method of and system for forming SiC crystals having spatially uniform doping impurities |
US8048221B2 (en) * | 2006-01-20 | 2011-11-01 | Stoddard Nathan G | Methods and apparatuses for manufacturing monocrystalline cast silicon and monocrystalline cast silicon bodies for photovoltaics |
KR101145234B1 (en) | 2006-05-18 | 2012-05-25 | 쇼와 덴코 가부시키가이샤 | Method for producing silicon carbide single crystal |
JP5332168B2 (en) * | 2006-11-17 | 2013-11-06 | 住友電気工業株式会社 | Method for producing group III nitride crystal |
CN101796226A (en) * | 2007-07-20 | 2010-08-04 | Bp北美公司 | Methods and apparatuses for manufacturing cast silicon from seed crystals |
WO2009014962A1 (en) | 2007-07-20 | 2009-01-29 | Bp Corporation North America Inc. | Methods and apparatuses for manufacturing cast silicon from seed crystals |
WO2009015168A1 (en) | 2007-07-25 | 2009-01-29 | Bp Corporation North America Inc. | Methods for manufacturing geometric multi-crystalline cast materials |
WO2009015167A1 (en) | 2007-07-25 | 2009-01-29 | Bp Corporation North America Inc. | Methods for manufacturing monocrystalline or near-monocrystalline cast materials |
US8206636B2 (en) | 2008-06-20 | 2012-06-26 | Amaranth Medical Pte. | Stent fabrication via tubular casting processes |
TW201012978A (en) * | 2008-08-27 | 2010-04-01 | Bp Corp North America Inc | Apparatus and method of use for a casting system with independent melting and solidification |
JP2012516572A (en) * | 2009-01-30 | 2012-07-19 | エイエムジー・アイデアルキャスト・ソーラー・コーポレーション | SEED LAYER AND SEED LAYER MANUFACTURING METHOD |
JP2011246315A (en) * | 2010-05-28 | 2011-12-08 | Sumitomo Electric Ind Ltd | Silicon carbide substrate and method for producing the same |
US9564320B2 (en) | 2010-06-18 | 2017-02-07 | Soraa, Inc. | Large area nitride crystal and method for making it |
DE112011105073T5 (en) * | 2011-03-22 | 2013-12-24 | Sumitomo Electric Industries, Ltd. | silicon carbide substrate |
US9322110B2 (en) | 2013-02-21 | 2016-04-26 | Ii-Vi Incorporated | Vanadium doped SiC single crystals and method thereof |
US9580837B2 (en) | 2014-09-03 | 2017-02-28 | Ii-Vi Incorporated | Method for silicon carbide crystal growth by reacting elemental silicon vapor with a porous carbon solid source material |
CN114000197A (en) | 2015-09-24 | 2022-02-01 | 帕里杜斯有限公司 | Vapor deposition apparatus and techniques using high purity polymer-derived silicon carbide |
CN105525351A (en) * | 2015-12-24 | 2016-04-27 | 中国科学院上海硅酸盐研究所 | Efficient SiC crystal diameter-expanding method |
CN105671638B (en) * | 2016-03-01 | 2018-07-06 | 山东大学 | A kind of preparation method of major diameter dimension SiC seed crystals |
US20170321345A1 (en) | 2016-05-06 | 2017-11-09 | Ii-Vi Incorporated | Large Diameter Silicon Carbide Single Crystals and Apparatus and Method of Manufacture Thereof |
JP6839525B2 (en) | 2016-11-15 | 2021-03-10 | 昭和電工株式会社 | SiC single crystal complex and SiC ingot |
US11466384B2 (en) | 2019-01-08 | 2022-10-11 | Slt Technologies, Inc. | Method of forming a high quality group-III metal nitride boule or wafer using a patterned substrate |
CN110541199B (en) * | 2019-10-11 | 2020-07-31 | 山东大学 | Preparation method of high-quality SiC seed crystal with diameter of 8 inches or more |
CN112746321A (en) * | 2019-10-31 | 2021-05-04 | 赛维Ldk太阳能高科技(新余)有限公司 | Seed crystal laying method, preparation method of mono-like silicon ingot and mono-like silicon ingot |
JP2023513570A (en) | 2020-02-11 | 2023-03-31 | エスエルティー テクノロジーズ インコーポレイテッド | Improved III-Nitride Substrates, Methods of Making the Same, and Methods of Using The Same |
US11721549B2 (en) | 2020-02-11 | 2023-08-08 | Slt Technologies, Inc. | Large area group III nitride crystals and substrates, methods of making, and methods of use |
AT524249B1 (en) * | 2020-09-28 | 2023-07-15 | Ebner Ind Ofenbau | Method of growing single crystals |
EP4144893A1 (en) | 2021-09-06 | 2023-03-08 | Instytut Wysokich Cisnien Polskiej Akademii Nauk | A method for reducing or eliminating cracks during crystal growing process and a shaped metal piece for use in this method |
CN114032613B (en) * | 2021-10-14 | 2023-10-31 | 吉林大学 | Method for improving quality of splicing seam of diamond monocrystal grown by splicing method |
CN114262936B (en) * | 2021-12-17 | 2023-08-01 | 杭州乾晶半导体有限公司 | Silicon carbide single crystal growth method and crack closure growth method |
CN114262935A (en) * | 2021-12-17 | 2022-04-01 | 杭州乾晶半导体有限公司 | Growth method of large-size silicon carbide seed crystal and growth method of corresponding single crystal |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4147572A (en) | 1976-10-18 | 1979-04-03 | Vodakov Jury A | Method for epitaxial production of semiconductor silicon carbide utilizing a close-space sublimation deposition technique |
US4866005A (en) | 1987-10-26 | 1989-09-12 | North Carolina State University | Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide |
JP3030111B2 (en) * | 1991-03-27 | 2000-04-10 | 三洋電機株式会社 | Semiconductor crystal growth method |
US5433167A (en) | 1992-02-04 | 1995-07-18 | Sharp Kabushiki Kaisha | Method of producing silicon-carbide single crystals by sublimation recrystallization process using a seed crystal |
US5441011A (en) | 1993-03-16 | 1995-08-15 | Nippon Steel Corporation | Sublimation growth of single crystal SiC |
US5611955A (en) * | 1993-10-18 | 1997-03-18 | Northrop Grumman Corp. | High resistivity silicon carbide substrates for high power microwave devices |
US5683507A (en) * | 1995-09-05 | 1997-11-04 | Northrop Grumman Corporation | Apparatus for growing large silicon carbide single crystals |
US5746827A (en) * | 1995-12-27 | 1998-05-05 | Northrop Grumman Corporation | Method of producing large diameter silicon carbide crystals |
US5667587A (en) * | 1996-12-18 | 1997-09-16 | Northrop Gruman Corporation | Apparatus for growing silicon carbide crystals |
US5873937A (en) | 1997-05-05 | 1999-02-23 | Northrop Grumman Corporation | Method of growing 4H silicon carbide crystal |
US5788768A (en) | 1997-05-08 | 1998-08-04 | Northrop Grumman Corporation | Feedstock arrangement for silicon carbide boule growth |
US6139632A (en) | 1997-09-15 | 2000-10-31 | Sumitomo Sitix Corporation | Seed crystals, seed crystal holders, and a method for pulling a single crystal |
JP4061700B2 (en) * | 1998-03-19 | 2008-03-19 | 株式会社デンソー | Single crystal manufacturing method |
-
2001
- 2001-03-13 WO PCT/US2001/008047 patent/WO2001068957A1/en active Application Filing
- 2001-03-13 US US10/221,392 patent/US6805745B2/en not_active Expired - Fee Related
- 2001-03-13 JP JP2001567832A patent/JP2003527298A/en active Pending
- 2001-03-13 EP EP01924154A patent/EP1268883A1/en not_active Withdrawn
- 2001-03-13 AU AU2001250835A patent/AU2001250835A1/en not_active Abandoned
- 2001-06-06 TW TW090105838A patent/TW539783B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1268883A1 (en) | 2003-01-02 |
WO2001068957A9 (en) | 2003-01-16 |
JP2003527298A (en) | 2003-09-16 |
US20030029376A1 (en) | 2003-02-13 |
US6805745B2 (en) | 2004-10-19 |
TW539783B (en) | 2003-07-01 |
WO2001068957A1 (en) | 2001-09-20 |
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