ZA8505194B - Radiation-polymerizable mixture,copolymer contained therein,and a process for the preparation of the copolymer - Google Patents

Radiation-polymerizable mixture,copolymer contained therein,and a process for the preparation of the copolymer

Info

Publication number
ZA8505194B
ZA8505194B ZA855194A ZA8505194A ZA8505194B ZA 8505194 B ZA8505194 B ZA 8505194B ZA 855194 A ZA855194 A ZA 855194A ZA 8505194 A ZA8505194 A ZA 8505194A ZA 8505194 B ZA8505194 B ZA 8505194B
Authority
ZA
South Africa
Prior art keywords
copolymer
radiation
preparation
process
polymerizable mixture
Prior art date
Application number
ZA855194A
Inventor
Ulrich Geissler
Klaus Albrecht
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE19843427519 priority Critical patent/DE3427519A1/en
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA8505194B publication Critical patent/ZA8505194B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04Acids; Metal salts or ammonium salts thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester
ZA855194A 1984-07-26 1985-07-10 Radiation-polymerizable mixture,copolymer contained therein,and a process for the preparation of the copolymer ZA8505194B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19843427519 DE3427519A1 (en) 1984-07-26 1984-07-26 By radiation-polymerizable mixture, contained therein copolymer and process for the production of the copolymer

Publications (1)

Publication Number Publication Date
ZA8505194B true ZA8505194B (en) 1986-02-26

Family

ID=6241595

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA855194A ZA8505194B (en) 1984-07-26 1985-07-10 Radiation-polymerizable mixture,copolymer contained therein,and a process for the preparation of the copolymer

Country Status (9)

Country Link
US (1) US4705740A (en)
EP (2) EP0173057B1 (en)
JP (1) JPH0668057B2 (en)
KR (1) KR930007506B1 (en)
AT (2) AT66681T (en)
DE (1) DE3427519A1 (en)
HK (1) HK94691A (en)
SG (1) SG79891G (en)
ZA (1) ZA8505194B (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1292011C (en) * 1985-10-25 1991-11-12 Susan S. Romm Storage stable (meth)acrylate plastisols
EP0305545B1 (en) * 1987-03-17 1993-02-10 Hitachi Chemical Co., Ltd. Substituted acridine derivatives and their use
US5026626A (en) * 1987-08-03 1991-06-25 Barton Oliver A Oxygen resistant radiation-polymerizable composition and element containing a photopolymer composition
US4952482A (en) * 1987-08-03 1990-08-28 Hoechst Calanese Corporation Method of imaging oxygen resistant radiation polymerizable composition and element containing a photopolymer composition
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
DE69030234D1 (en) * 1989-05-17 1997-04-24 Asahi Chemical Ind Photo-crosslinking plastic laminate and method for manufacturing a printed circuit board by using the same
CA2025198A1 (en) * 1989-10-25 1991-04-26 Daniel F. Varnell Liquid solder mask composition
EP0493317B2 (en) * 1990-12-18 2001-01-10 Ciba Specialty Chemicals Holding Inc. Radiosensitive composition on basis of water as solvent
DE4216167A1 (en) * 1992-05-18 1993-11-25 Roehm Gmbh Water-soluble polymer dispersions
DE4406624A1 (en) * 1994-03-01 1995-09-07 Roehm Gmbh Crosslinked water-soluble polymer dispersions
JP3638660B2 (en) * 1995-05-01 2005-04-13 東京応化工業株式会社 Photosensitive resin composition, photosensitive dry film for sandblasting using the same, and etching method using the same
US6287616B1 (en) 1996-08-21 2001-09-11 Nestec S.A. Cold water soluble creamer
US6589586B2 (en) 1996-08-21 2003-07-08 Nestec S.A. Cold beverage creamer
US6004725A (en) * 1997-12-01 1999-12-21 Morton International, Inc. Photoimageable compositions
KR101855504B1 (en) * 2009-07-28 2018-05-08 주식회사 동진쎄미켐 Photoresist composition comprising crosslinking curing material
KR20120071386A (en) * 2009-08-19 2012-07-02 닛산 가가쿠 고교 가부시키 가이샤 Transparent fluorine-containing polymer

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1619150A1 (en) * 1966-09-10 1969-08-21 Roehm & Haas Gmbh textile finishing
US3554913A (en) * 1969-08-15 1971-01-12 Us Army Friction reduction by copolymer of n-alkyl methacrylates and methacrylic acid in solution
US3833384A (en) * 1972-04-26 1974-09-03 Eastman Kodak Co Photopolymerizable compositions and elements and uses thereof
DE2363806B2 (en) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt
DE2509473A1 (en) * 1975-03-05 1976-09-16 Roehm Gmbh Bitumen additives of acrylic copolymers with basic nitrogen cpds. - giving improved adhesion to mineral fillers
US4296196A (en) * 1978-05-20 1981-10-20 Hoechst Aktiengesellschaft Photopolymerizable mixture in a transfer element
JPH033212B2 (en) * 1979-07-27 1991-01-18 Hitachi Chemical Co Ltd
JPS57204032A (en) * 1981-06-10 1982-12-14 Somar Corp Photosensitive material
US4361640A (en) * 1981-10-02 1982-11-30 E. I. Du Pont De Nemours And Company Aqueous developable photopolymer compositions containing terpolymer binder

Also Published As

Publication number Publication date
EP0271077A1 (en) 1988-06-15
JPH0668057B2 (en) 1994-08-31
HK94691A (en) 1991-11-29
AT66681T (en) 1991-09-15
EP0173057A2 (en) 1986-03-05
JPS6140310A (en) 1986-02-26
EP0173057A3 (en) 1986-11-20
DE3427519A1 (en) 1986-02-06
KR930007506B1 (en) 1993-08-12
EP0173057B1 (en) 1989-02-15
US4705740A (en) 1987-11-10
AT40846T (en) 1989-03-15
EP0271077B1 (en) 1991-08-28
SG79891G (en) 1991-11-15

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