ZA8002395B - Vacuum deposition system and method - Google Patents

Vacuum deposition system and method

Info

Publication number
ZA8002395B
ZA8002395B ZA00802395A ZA8002395A ZA8002395B ZA 8002395 B ZA8002395 B ZA 8002395B ZA 00802395 A ZA00802395 A ZA 00802395A ZA 8002395 A ZA8002395 A ZA 8002395A ZA 8002395 B ZA8002395 B ZA 8002395B
Authority
ZA
South Africa
Prior art keywords
method
vacuum deposition
deposition system
system
vacuum
Prior art date
Application number
ZA00802395A
Inventor
R Love
Original Assignee
Advanced Coating Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
Priority to US06/034,347 priority Critical patent/US4274936A/en
Application filed by Advanced Coating Tech filed Critical Advanced Coating Tech
Publication of ZA8002395B publication Critical patent/ZA8002395B/en
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21875863&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ZA8002395(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
ZA00802395A 1979-04-30 1980-04-21 Vacuum deposition system and method ZA8002395B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/034,347 US4274936A (en) 1979-04-30 1979-04-30 Vacuum deposition system and method

Publications (1)

Publication Number Publication Date
ZA8002395B true ZA8002395B (en) 1981-04-29

Family

ID=21875863

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00802395A ZA8002395B (en) 1979-04-30 1980-04-21 Vacuum deposition system and method

Country Status (8)

Country Link
US (1) US4274936A (en)
EP (1) EP0018690B2 (en)
JP (1) JPS55148768A (en)
AT (1) AT3307T (en)
CA (1) CA1140002A (en)
DE (2) DE3016069A1 (en)
GB (1) GB2051136A (en)
ZA (1) ZA8002395B (en)

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US4405435A (en) * 1980-08-27 1983-09-20 Hitachi, Ltd. Apparatus for performing continuous treatment in vacuum
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US4582720A (en) * 1982-09-20 1986-04-15 Semiconductor Energy Laboratory Co., Ltd. Method and apparatus for forming non-single-crystal layer
US4650557A (en) * 1982-11-03 1987-03-17 Donnelly Corporation Process for making a conductively coated glass member and the product thereof
US4490227A (en) * 1982-11-03 1984-12-25 Donnelly Mirrors, Inc. Process for making a curved, conductively coated glass member and the product thereof
JPS6337186B2 (en) * 1983-09-02 1988-07-25 Hitachi Ltd
US6784033B1 (en) 1984-02-15 2004-08-31 Semiconductor Energy Laboratory Co., Ltd. Method for the manufacture of an insulated gate field effect semiconductor device
US5780313A (en) 1985-02-14 1998-07-14 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device
US4548699A (en) * 1984-05-17 1985-10-22 Varian Associates, Inc. Transfer plate rotation system
GB8413776D0 (en) * 1984-05-30 1984-07-04 Dowty Electronics Ltd Sputtering process
US4790921A (en) * 1984-10-12 1988-12-13 Hewlett-Packard Company Planetary substrate carrier method and apparatus
US4576830A (en) * 1984-11-05 1986-03-18 Chronar Corp. Deposition of materials
US5021138A (en) * 1985-01-17 1991-06-04 Babu Suryadevara V Side source center sink plasma reactor
US4663009A (en) * 1985-02-08 1987-05-05 Hewlett-Packard Company System and method for depositing plural thin film layers on a substrate
US4749465A (en) * 1985-05-09 1988-06-07 Seagate Technology In-line disk sputtering system
EP0222877A4 (en) * 1985-05-09 1989-03-21 Seagate Technology IN-lINE DISK SPUTTERING SYSTEM.
US5044314A (en) * 1986-10-15 1991-09-03 Advantage Production Technology, Inc. Semiconductor wafer processing apparatus
US4885074A (en) * 1987-02-24 1989-12-05 International Business Machines Corporation Plasma reactor having segmented electrodes
JPS6411320A (en) * 1987-07-06 1989-01-13 Toshiba Corp Photo-cvd device
DE3731444A1 (en) * 1987-09-18 1989-03-30 Leybold Ag Device for coating substrates
JP2714833B2 (en) * 1988-12-18 1998-02-16 日本真空技術株式会社 Loading / unloading room
JPH0733576B2 (en) * 1989-11-29 1995-04-12 株式会社日立製作所 Sputter device, target exchanging device, and exchanging method thereof
DE4111384C2 (en) * 1991-04-09 1999-11-04 Leybold Ag Device for coating substrates
DE4303462C2 (en) * 1992-03-30 1994-03-31 Leybold Ag Multi-chamber coating system
DE4325011A1 (en) * 1993-07-28 1995-03-02 Herlitz Michael Extension of antireflection coating, as usual for spectacle glasses, to automobile windscreens and further motor vehicles and means of transportation, and all other silicate and plastic sheets
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
US5738767A (en) * 1994-01-11 1998-04-14 Intevac, Inc. Substrate handling and processing system for flat panel displays
US5660114A (en) * 1995-05-10 1997-08-26 Seagate Technology, Inc. Transport system for thin film sputtering system
JPH0950992A (en) * 1995-08-04 1997-02-18 Sharp Corp Film forming device
WO1997039160A1 (en) * 1996-04-18 1997-10-23 Kabushiki Kaisha Toshiba Method of producing a cathode-ray tube and apparatus therefor
DE19808163C1 (en) * 1998-02-27 1999-07-15 Ardenne Anlagentech Gmbh Airlock system for transfer chamber of vacuum coating installation
EP1221526A1 (en) * 2001-01-09 2002-07-10 Emil BÄCHLI Method and equipment for making heat-insulating construction and/or lighting elements
US6500264B2 (en) 2001-04-06 2002-12-31 Wafermasters, Inc. Continuous thermal evaporation system
US6524463B2 (en) 2001-07-16 2003-02-25 Technic, Inc. Method of processing wafers and other planar articles within a processing cell
US6558750B2 (en) 2001-07-16 2003-05-06 Technic Inc. Method of processing and plating planar articles
US7832177B2 (en) 2002-03-22 2010-11-16 Electronics Packaging Solutions, Inc. Insulated glazing units
US6962834B2 (en) 2002-03-22 2005-11-08 Stark David H Wafer-level hermetic micro-device packages
DE102004008598B4 (en) * 2004-02-21 2006-12-28 Applied Films Gmbh & Co. Kg Method for operating an in-line coating system
EP1582606A1 (en) * 2004-03-25 2005-10-05 Applied Films GmbH & Co. KG Vacuum treating apparatus with variable pumping arrangement.
AU2008210794A1 (en) * 2007-02-01 2008-08-07 Willard & Kelsey Solar Group, Llc System and method for glass sheet semiconductor coating
WO2009036359A1 (en) * 2007-09-14 2009-03-19 Electronics Packaging Solutions, Inc. Insulating glass unit having multi-height internal standoffs and visible decoration
US8283023B2 (en) * 2008-08-09 2012-10-09 Eversealed Windows, Inc. Asymmetrical flexible edge seal for vacuum insulating glass
WO2010083475A2 (en) * 2009-01-15 2010-07-22 Eversealed Windows, Inc. Filament-strung stand-off elements for maintaining pane separation in vacuum insulating glazing units
WO2010083476A2 (en) * 2009-01-15 2010-07-22 Eversealed Windows, Inc Flexible edge seal for vacuum insulating glazing unit
US9051650B2 (en) 2009-01-16 2015-06-09 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
US9297064B2 (en) * 2009-01-16 2016-03-29 Marca Machinery, Llc In-line metallizer assemblies and part-coating conveyor systems incorporating the same
US9664974B2 (en) * 2009-03-31 2017-05-30 View, Inc. Fabrication of low defectivity electrochromic devices
DE102009020512B4 (en) * 2009-05-08 2017-07-27 Von Ardenne Gmbh Continuous vacuum coating plant
JP2013527609A (en) * 2010-04-30 2013-06-27 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Vertical in-line CVD system
WO2011153381A2 (en) 2010-06-02 2011-12-08 Eversealed Windows, Inc. Multi-pane glass unit having seal with adhesive and hermetic coating layer
CN102337510A (en) * 2010-07-23 2012-02-01 鸿富锦精密工业(深圳)有限公司 Continuous vacuum plating method
US9328512B2 (en) 2011-05-05 2016-05-03 Eversealed Windows, Inc. Method and apparatus for an insulating glazing unit and compliant seal for an insulating glazing unit
ES2657115T3 (en) 2011-12-12 2018-03-01 View, Inc. Thin film devices and manufacturing
EP2650135A1 (en) * 2012-04-12 2013-10-16 KBA-NotaSys SA Intaglio printing plate coating apparatus
CN107099773B (en) * 2016-02-22 2019-04-09 蓝思科技(长沙)有限公司 The multi-functional continuous sputter coating line of one kind and its film plating process and coating control method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2925062A (en) * 1953-05-15 1960-02-16 Heraeus Gmbh W C Coating apparatus
US3294670A (en) * 1963-10-07 1966-12-27 Western Electric Co Apparatus for processing materials in a controlled atmosphere
US3521765A (en) * 1967-10-31 1970-07-28 Western Electric Co Closed-end machine for processing articles in a controlled atmosphere
US3584847A (en) * 1968-05-31 1971-06-15 Western Electric Co Advancing workpieces through a sputtering chamber
US3673981A (en) * 1969-05-13 1972-07-04 Libbey Owens Ford Co Filming apparatus
US3907660A (en) * 1970-07-31 1975-09-23 Ppg Industries Inc Apparatus for coating glass
GB1321640A (en) * 1970-12-05 1973-06-27 Hunt C J L Vacuum metallising or vacuum coating
FR2132033B1 (en) * 1971-04-02 1975-10-24 Delog Detag Flachglas Ag
FR2202169B2 (en) * 1972-10-07 1977-05-27 Delog Detag Flachglas Ag
DE2253769C3 (en) * 1972-11-02 1979-07-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen
US3925182A (en) * 1973-09-25 1975-12-09 Shatterproof Glass Corp Method for continuous production of sputter-coated glass products
US4015558A (en) * 1972-12-04 1977-04-05 Optical Coating Laboratory, Inc. Vapor deposition apparatus

Also Published As

Publication number Publication date
CA1140002A (en) 1983-01-25
AT3307T (en) 1983-05-15
EP0018690A1 (en) 1980-11-12
DE3016069A1 (en) 1980-11-13
DE3063058D1 (en) 1983-06-16
EP0018690B1 (en) 1983-05-11
JPS55148768A (en) 1980-11-19
US4274936A (en) 1981-06-23
GB2051136A (en) 1981-01-14
EP0018690B2 (en) 1993-07-14
CA1140002A1 (en)

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