WO2025215344A1 - A valve module for a vacuum pumping and/or abatement apparatus - Google Patents
A valve module for a vacuum pumping and/or abatement apparatusInfo
- Publication number
- WO2025215344A1 WO2025215344A1 PCT/GB2025/050729 GB2025050729W WO2025215344A1 WO 2025215344 A1 WO2025215344 A1 WO 2025215344A1 GB 2025050729 W GB2025050729 W GB 2025050729W WO 2025215344 A1 WO2025215344 A1 WO 2025215344A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- valve
- valve module
- valves
- abatement system
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B39/00—Component parts, details, or accessories, of pumps or pumping systems specially adapted for elastic fluids, not otherwise provided for in, or of interest apart from, groups F04B25/00 - F04B37/00
- F04B39/10—Adaptations or arrangements of distribution members
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
Definitions
- the present invention relates to vacuum pumping and abatement systems.
- Vacuum pumping and abatement systems are used in varied and different technological fields, for example semiconductor fabrication.
- vacuum pumping equipment is used to pump gas (e.g. gas from an industrial process) out of a particular location
- abatement equipment is used to abate (e.g. destroy or dispose of) undesirable substances which have been produced.
- vacuum pumping and abatement there may be different criteria for vacuum pumping and abatement. For example, it is typically desirable to use different vacuum pumping equipment and/or different abatement equipment for different processes involving different process gases.
- Vacuum pumping and/or abatement systems are typically designed bespoke according to the particular processes involved, where each system tends to have a different inlet assembly for receiving process gas. Accordingly, it is typically required to design a bespoke valve assembly to control and/or restrict process gas flow to each inlet assembly design.
- a vacuum pumping or abatement system for respectively evacuating or abating process gas from a process chamber, the system comprising: a frame having a first end, a second end opposite to the first end, and a plurality of frame members disposed therebetween, the frame defining an interior space; a vacuum pumping or abatement apparatus positioned within the interior space and comprising a plurality of inlets; and a valve module comprising a plurality of valves, each valve of the plurality of valves configured to control a flow of a respective portion of the process gas to a corresponding inlet of the plurality of inlets.
- Each valve of the valve module is positioned in a common plane substantially parallel to a boundary of the interior space defined by the first end.
- the valve module is positioned within the interior space such that the valve module is at or proximate to the boundary.
- Each valve of the valve module may be a bypass valve configured to selectively route the flow of the process gas from the process chamber to one of: the corresponding inlet; or a bypass pipe.
- Each valve of the valve module may be coupled to the corresponding inlet by a corresponding pipe.
- Each pipe may comprise a variable length portion.
- the valve module may further comprise a plurality of isolation valves.
- Each isolation valve of the plurality of isolation valves may be intermediately positioned between a corresponding bypass valve and a corresponding pipe.
- Each valve of the valve module may further comprise an inlet configured to receive the respective portion of the process gas.
- Each inlet may be positioned on a third common plane substantially parallel to the upper boundary.
- the third common plane may be positioned at a distance of 7cm or less from the upper boundary.
- the frame may be a vertically oriented frame comprising an upper wall at the first end.
- the valve module may be mounted to the upper wall.
- the valve module may be slidably mounted to the frame.
- the plurality of valves may be arranged in a plurality of parallel rows.
- the plurality of parallel rows may be slidably mounted to the upper wall.
- the valve module may be arranged as 2 parallel rows of 3 valves or 2 parallel rows of 6 valves.
- the upper wall may comprise a through hole.
- the inlets to the valves may be located at or proximate to the through hole.
- the vacuum pumping or abatement system may be an abatement system comprising: a burner for combusting the process gas; and a head assembly for the burner.
- the head assembly may comprise the plurality of inlets.
- the burner may be selected from the group of burners consisting of a gas-fired burner, an induction-heated burner, and a plasma torch.
- valve module for a vacuum pumping and/or abatement system, the valve module comprising: a plurality of valves, each valve of the plurality of valves configured to control a flow of a respective portion of a process gas from a process chamber to a corresponding inlet of the vacuum pumping and/or abatement system.
- Each valve of the valve module is positioned in a common plane.
- Figure 1 is a schematic illustration (not to scale) showing a vacuum pumping and abatement system
- Figure 2 is a schematic illustration (not to scale) showing a conventional abatement system
- Figure 3 is a schematic illustration (not to scale) showing a perspective view of a valve module of the conventional abatement system
- Figure 4 is a schematic illustration (not to scale) showing an abatement system
- Figure 5 is a schematic illustration (not to scale) showing a perspective view of a portion of a valve module of the abatement system
- Figure 6 is a schematic illustration (not to scale) showing a perspective view of a portion of the abatement system
- Figure 7 is a schematic illustration (not to scale) showing a perspective view of a valve module and pipes
- Figures 8A - 8C are schematic illustrations (not to scale) showing further abatement systems
- Figure 9 is a schematic illustration (not to scale) showing a valve module of an abatement system.
- Figure 10 is a schematic illustration (not to scale) showing a portion of an abatement system.
- Figure 1 is a schematic illustration (not to scale) showing a vacuum pumping and abatement system 100 for evacuating process gas from a process chamber 102 and removing undesirable substances from the process gas.
- the processing of products is performed in the process chamber 102 in the presence of a process gas, for example, processing of silicon wafers, such as by dielectric etching or flat panel etching.
- a process gas for example, processing of silicon wafers, such as by dielectric etching or flat panel etching.
- undesirable substances are exhausted from the process chamber 102 in the process gas during or after processing. These noxious substances may include, but are not limited to, CF4, C2F6, NF3, SF 6 , SiCk, and/or CI2.
- the system 100 comprises a vacuum pump 104 arranged to pump the process gas from the process chamber 102 via a first fluid connection 108, commonly referred to as a “foreline”.
- the vacuum pump 104 may be, for example, a dry vacuum pump.
- the system 100 further comprises an abatement apparatus 106 fluidly connected to the vacuum pump 104 via a second fluid connection 110.
- the abatement apparatus 106 is described in more detail later below with reference to Figure 2.
- the abatement apparatus 106 is configured to remove the undesirable substances from the process gas received from the vacuum pump 104, and to output an exhaust gas via a third fluid connection 112.
- the abatement apparatus 106 is configured to convert a component of the received process gas into a different compound or compounds.
- the abatement apparatus 106 may output the exhaust gas via the third fluid connection 112 to, for example, the environment, or to other gas processing and/or storage apparatuses (not shown).
- Figure 2 is a schematic illustration (not to scale) showing an example of a conventional abatement system 200.
- Figure 3 is a schematic illustration (not to scale) showing a perspective view of a conventional valve module 204 of the conventional abatement system 200.
- the abatement system 200 comprises a frame 202, a valve module 204, a burner module 210, a drainage tank 212, a scrubber 214, and an exhaust gas outlet pipe 208.
- the valve module 204, and an abatement apparatus comprising the burner module 210, the drainage tank 212, and the scrubber 214 are positioned within an interior space 201 defined by the frame 202.
- the exhaust gas outlet pipe 208 may be positioned at least partially within the interior space 201 defined by the frame 202.
- the burner module 210 comprises a head assembly 216 having a plurality of inlets 218, a burner 220, and a quench 222.
- the plurality of inlets 218 are inputs to the burner 220.
- the valve module 204 comprises a plurality of valves 226.
- the valves 226 are bypass valves.
- Each bypass valve 226 of the valve module 204 comprises a first inlet pipe 230 configured to receive a respective portion of the process gas, a first outlet pipe 232 coupled to a corresponding inlet 218 on the head assembly 216, and a second outlet pipe 234 coupled to a bypass pipe (not shown).
- the plurality of valves 226 are coupled to the second fluid connection 110 such that, in operation, each valve of the plurality of valves 226 receives the respective portion of the process gas as indicated in FIG. 2 by a dotted arrow and the reference numeral 235.
- the bypass valves 226 are configured to selectively route a flow of the respective portion of the process gas to the corresponding inlet 218, or to the bypass pipe.
- the bypass valves 226 can be actuated, via an actuator 228, between an “on-line” position to route process gas to the corresponding inlets 218, and an “off-line” position to route the process gas to the bypass pipe.
- the bypass pipe may be coupled to a back-up gas treatment system (not shown).
- process gas received from the second fluid connection 110 is routed to the inlets 218 via the valve module 204.
- the process gas is then received by the burner 220, wherein the process gas is combusted.
- normal operation refers to operating the system when the bypass valves 226 are in the “on-line” position.
- the combusted process gases may include combustion by-products such as HF and SiO2.
- the abatement apparatus is further configured to remove these combustion by-products prior to outputting exhaust gases. More specifically, the quench 222, drainage tank 212, and scrubber 214 are configured to remove the aforementioned combustion by-products.
- the burner 220 is further coupled to the quench 222 such that, in operation, the combusted process gases from the burner 220 are received by the quench 222.
- the quench 222 is configured to cool the combusted process gas from a relatively high temperature (for example, about 800°C-1200°C, e.g. about 1000°C) to a relatively low temperature (for example, a temperature less than 80°C).
- the quench may spray finely atomised water across the hot gas stream, thereby cooling the gas stream. In this way, particulates in the gases are entrained in water vapour, which condenses as water at the bottom of the quench.
- the quench 222 is further coupled to the drainage tank 212, such that, in operation, the cooled gas stream is output from the quench 222 and into the drainage tank 212.
- the cooled gas stream flows from the quench 222, through the drainage tank 212, and into the scrubber 214 at its base.
- the scrubber 214 is coupled to an upper surface 211 of the drainage tank 212.
- the scrubber 214 is configured to remove certain substances from a gas stream flowing therethrough. More specifically, the scrubber 214 is configured to remove any remaining particulates in the cooled gas stream.
- the scrubber 214 may be configured to introduce a scrubbing liquid, for example water, into the gas stream flowing through the scrubber 214.
- a scrubbing liquid for example water
- the scrubber 214 removes water soluble combustion byproducts from the cooled gas stream.
- water soluble gaseous substances such as HF and SiO2 tend to be absorbed or dissolved in the scrubbing liquid. These droplets subsequently fall into the drainage tank 212.
- valve module 204 is mounted to a sidewall of the frame 202 by means of a cantilever bracket 238.
- this configuration tends to make access to at least some of the valves 226 difficult (e.g., by a human for the purposes of inspection, maintenance, repair and/or replacement), especially those valves 226 situated closer to the cantilever bracket 238 or the frame 202.
- valve module 204 including the inlet pipes 230, the first outlet pipes 232, the second outlet pipes 234, the valves 226 and the actuators 228, tend to take up a relatively large volume within the interior space 201. This tends to make installation of the valve module 204 difficult, and prohibit inspection, maintenance, repair and/or replacement of the other components (e g., the burner module 210) within the interior space 201 .
- Figure 4 is a schematic illustration (not to scale) showing an embodiment of an abatement system 400.
- Figure 5 is a schematic illustration (not to scale) showing a portion of a valve module 404 of the abatement system 400.
- Figure 6 is a schematic illustration (not to scale) showing a perspective view of a portion of the abatement system 400.
- Figure 7 is a schematic illustration (not to scale) showing a perspective view of the valve module 404 and pipes 417 of the abatement system 400.
- the abatement system 400 comprises a frame 402, a valve module 404, a burner module 410, a drainage tank 412, and a scrubber 414.
- the burner module 410 comprises a head assembly 416 having a plurality of inlets 418, a burner 420, and a quench 422. The plurality of inlets 418 are inputs to the burner 420.
- the frame 402 comprises a first end wall 444, a second end wall 446 opposite to the first end wall 444, and a plurality of sidewalls 448 disposed between the first end wall 444 and the second end wall 446.
- the frame 402 may be vertically oriented such that the first end wall 444 defines an upper wall, and the second wall 446 defines a lower wall.
- the valve module 404 and an abatement apparatus comprising the burner module 410, the drainage tank 412, and the scrubber 414 are positioned within an interior space 401 defined by the walls of the frame 402.
- the exhaust gas outlet pipe 408 may be positioned at least partially within the interior space 401.
- the valve module 404 comprises a plurality of valves 426.
- the plurality of valves 426 are coupled to the second fluid connection 110 such that, in operation, each valve of the plurality of valves 426 receives a respective portion of the process gas as indicated in FIG. 4 by a dotted arrow and the reference numeral 435. More specifically, the process gas is received by each valve 426 at a first inlet 430.
- the valves 426 are bypass valves, wherein each bypass valve 426 is configured to selectively route a flow of the respective portion of the process gas to either a corresponding inlet 418 via a first outlet 432, or to a bypass pipe (not shown) via a second outlet 434.
- bypass valves 426 can be actuated, via an actuator 428, between an “on-line” position to route process gas to the corresponding inlets 418, and an “off-line” position to route the process gas to the bypass pipeline.
- the bypass pipe may be coupled to a back-up gas treatment system (not shown).
- Normal operation refers to operating the system such that a flow of process gas to the inlets 418 is permitted. For example, when the bypass valves are in the “on-line” position.
- the valve module 404 comprises a plurality of valves 426 positioned in a common plane 450. More specifically, each valve of the plurality of valves 426 is positioned in a common plane 450 which is substantially parallel to an upper boundary defined by the upper wall 444. Furthermore, the first inlets 430 of the valve module are positioned in a common inlet plane 452 which is substantially parallel to the upper boundary defined by the first end wall 444.
- the upper boundary defined by the upper wall 444, the common plane 450, and the common inlet plane 452 may be substantially parallel to a ground surface on which the abatement system is disposed and, optionally, attached to.
- the upper boundary defined by the upper wall 444, the common plane 450, and the common inlet plane 452 may be substantially horizontal planes.
- the valve module 404 is positioned within the interior space 401 defined by the frame 402 such that it is at or proximate to the upper boundary.
- proximate may mean, for example, that a distance between the upper boundary and the common inlet plane 452 is 7cm or less. More preferably, this distance is 6cm or less. More preferably, this distance is 5cm or less. More preferably, this distance is 4cm or less. More preferably, this distance is 3cm or less. More preferably, this distance is 2cm or less. More preferably, this distance is 1cm or less.
- proximate may alternatively be understood as the valve module 404 being positioned entirely within 30cm of the upper boundary.
- valve module 404 is positioned entirely within 25cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 20cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 15cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 14cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 13cm of the upper boundary.
- valves 426 of the valve module 404 are arranged in an array.
- the valves 426 of the valve module 404 are arranged in multiple side-by-side rows 442.
- the valve module 404 comprises two parallel rows 442 of three valves 426 each.
- the valve module is slidably mounted to the frame 402, for example to the first end wall 444.
- the valve module may comprise one or more sliding members 438 configured to be received by one or more corresponding rails 440 attached to or disposed on the upper wall 444.
- each row of the one or more side-by-side rows 442 may comprise a sliding member 438 that is independently received by a corresponding rail 440 on the upper wall 444.
- each valve 426 belonging to a row of valves is detachably fixed to the corresponding sliding member 438.
- the upper wall 444 may comprise a through hole 456 to enable or facilitate servicing of the valve module 404 and/or connection of the plurality of valves 426 to the second fluid connection 110 and to the bypass pipe.
- a maximum height at which the inlets 418 may be attached to the pipes 417 is provided on a second inlet plane 454.
- the second inlet plane 454 may be substantially parallel to the first end wall 444.
- the pipes 417 comprise a flexible bellows portion having a variable length to facilitate connection to inlets 418 at a height below the maximum height.
- the burner 420 is a gas-fired burner. In other embodiments, however, the burner 420 may be a different type of burner, such as an induction-heated burner or a plasma torch.
- the increased available space by virtue or providing a compact valve module 404, enables these burners to be used within the same interior space 401 and/or frame 402. For example, plasma torches are typically taller than gas-fired burners.
- the valve module 404 according to the present invention advantageously enables a plasma torch to be used in the system 400 with frame 402, which would otherwise have required a separate valve module.
- FIG. 8A is a schematic illustration showing a plasma torch 860 with a head assembly 861 implemented in the abatement system 400.
- FIG. 8A is a schematic illustration showing a plasma torch 860 with a head assembly 861 implemented in the abatement system 400.
- FIG. 8B is a schematic illustration showing a gas-fired burner 862 with a first head assembly 864 implemented in the abatement system 400.
- FIG. 80 is a schematic illustration showing a gas-fired burner 862 with a second head assembly 866 implemented in the abatement system 400. It will be appreciated that, each of these burners and head assemblies, that would have otherwise required a bespoke valve module, are implemented in the same abatement system 400 using the same valve module 404.
- different burners typically have different head assemblies having a different configuration of inlets 418.
- the inlets may sit on a different pitch circle diameter (PCD) with a different arrangement of inlets on the PCD.
- PCD pitch circle diameter
- the valve module 404 and pipes 417 provide a common PCD for which head assemblies 418 may be designed.
- a plasma torch typically requires inlets 418 at a greater PCD than that of conventional gas-fired burners.
- the pipes 417 are provided in a circular arrangement such that it is compatible with a plasma torch. As illustrated in FIG. 8B and FIG.
- the inlets 418 on a head assembly 864 or a head assembly 866 for a gas-fired burner 862 may be provided in a splayed arrangement to match the PCD at which the plasma torch inlets are situated.
- the same valve module 404 and arrangement of pipes 417 may be used with various burners and/or head assemblies.
- valve module 404 may facilitate improved designs of burners such as gas-fired burners by virtue of providing additional space for a reactor of the burner.
- a taller gas-fired burner may be designed for use with the valve module 404.
- the inlets 418 illustrated in FIG. 4 will be elevated to a position at or closer to the second inlet plane 454.
- the above-described configuration provides a common PCD for future burner and/or head assembly designs, thereby reducing time spent designing, manufacturing, and installing future head assemblies.
- a common inlet interface design is provided for various burners and/or head assemblies.
- the above-described configuration reduces the amount of pipe variants 417 required for different burners and/or head assemblies by providing a common PCD at which the inlets 418 couple to the pipes 417.
- the valve module 404 may further comprise a plurality of isolation valves 458 positioned intermediately between each bypass valve 426 and pipe 417.
- each isolation valve 458 is positioned downstream (with respect to the direction of fluid flow of the process gas) of a corresponding bypass valve 426 and upstream of a corresponding pipe 417.
- the isolation valves 458 may be used as secondary isolation for service tasks such as cleaning the head assembly 416.
- secondary isolation is provided outside of the abatement system 400.
- secondary isolation is typically provided upstream of the abatement system 400.
- the valve module 404 enables a taller scrubber 414 to be used in the abatement system 400.
- valve module 404 is provided, thereby increasing the space available for the scrubber 414.
- valve module 404 may be slid out of the frame for maintenance and servicing, therefore a taller scrubber 414 may be provided in the space that would otherwise be required for servicing a conventional valve module. This advantageously tends to provide for improved removal of combustion by-products by the scrubber 414.
- valve module 404 is arranged in two parallel rows 442 each having three valves 426.
- the valve module 404 may comprise any number of rows 442, each row having any number of valves 426.
- the number of valves 426 can vary between 2 to 20 valves arranged in 1 , 2, 3, 4, or 5 rows 442.
- FIG. 9 is a schematic illustration (not to scale) showing a perspective view of a further embodiment of the valve module 404 and head assembly 416.
- FIG. 10 is a schematic illustration (not to scale) of the valve module 404 shown in FIG. 9 provided in a frame 402.
- the valve module 404 comprises two rows 442 of six valves 426 each.
- the valve module 404 comprises bypass valves 426 and isolation valves 458.
- the bypass valves 426 may be omitted, and the valve module 404 only comprises isolation valves 458.
- the isolation valves 458 may be omitted, and the valve module 404 only comprises bypass valves 426.
- both may be omitted, and the plurality of valves may include one or more different types of valves configured to control and/or restrict the flow of process gas to the inlets 418.
- the plurality of valves may include one or more different types of valves in addition to either or both of the bypass valves 426 and isolation valves 458.
- the valve module 404 is implemented in an abatement system 400. However, in other embodiments, the valve module 404 is implemented in a different type of system such as a vacuum pumping system. In such an embodiment, the valve module is provided in an enclosure or frame in which a vacuum pumping apparatus is situated. The valve module may be positioned proximate to, and in a plane parallel to, a wall of the enclosure, thereby maximising space for the vacuum pumping apparatus positioned therein.
- the present invention advantageously provides a valve module that is compatible with different burners and different head assemblies within the same frame.
- the present invention also facilitates future burners and/or head assemblies to be designed to be compatible with the valve module according to embodiments of the present invention.
- time spent designing, manufacturing, and installing bespoke components of abatement systems is reduced.
- valves are positioned proximate to an upper boundary of the frame, thereby maximising space for the abatement apparatus below.
- the valve module according to the present invention facilitates the use of various burner technologies to be used with the same valve module and in the same frame.
- burners and/or head assemblies with inlets at varying heights may be implemented with the same valve module.
- valves are slidably mounted to the frame such that the valves may be slidably removed from the frame, thereby enabling servicing of the valves outside of the frame.
- ease of access to the valves for the purposes of inspection, maintenance, repair and/or replacement is provided.
- mounting the valve module to one or more rails on an upper wall of the frame tends to distribute the load of the valve module more evenly over the frame compared to use of a cantilever bracket mounted to a sidewall of the frame.
- the rails tend to allow the heavy valves to be slidably removed from the confines of the frame and easily managed outside of the system in a safe and controlled manner avoiding risk of injury and speeding up service operations.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Incineration Of Waste (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
A vacuum pumping or abatement system (400) for respectively evacuating or abating process gas from a process chamber, the system comprising: a frame (402) having a first end, a second end opposite to the first end, and a plurality of frame members (448) disposed therebetween, the frame (402) defining an interior space (401); a vacuum pumping or abatement apparatus positioned within the interior space and comprising a plurality of inlets (418); and a valve module (404) comprising a plurality of valves (426), each valve of the plurality of valves (426) configured to control a flow of a respective portion of the process gas to a corresponding inlet of the plurality of inlets (418); wherein each valve (426) of the valve module (404) is positioned in a common plane (450) substantially parallel to a boundary of the interior space defined by the first end; and the valve module (404) is positioned within the interior space (401) such that the valve module (404) is at or proximate to the boundary.
Description
A VALVE MODULE FOR A VACUUM PUMPING AND/OR ABATEMENT APPARATUS
FIELD OF THE INVENTION
The present invention relates to vacuum pumping and abatement systems.
BACKGROUND
Vacuum pumping and abatement systems are used in varied and different technological fields, for example semiconductor fabrication. Typically, in said systems, vacuum pumping equipment is used to pump gas (e.g. gas from an industrial process) out of a particular location, and abatement equipment is used to abate (e.g. destroy or dispose of) undesirable substances which have been produced.
Depending on the processes involved, there may be different criteria for vacuum pumping and abatement. For example, it is typically desirable to use different vacuum pumping equipment and/or different abatement equipment for different processes involving different process gases.
Vacuum pumping and/or abatement systems are typically designed bespoke according to the particular processes involved, where each system tends to have a different inlet assembly for receiving process gas. Accordingly, it is typically required to design a bespoke valve assembly to control and/or restrict process gas flow to each inlet assembly design.
SUMMARY OF INVENTION
In a first aspect, there is provided a vacuum pumping or abatement system for respectively evacuating or abating process gas from a process chamber, the system comprising: a frame having a first end, a second end opposite to the first end, and a plurality of frame members disposed therebetween, the frame defining an interior space; a vacuum pumping or
abatement apparatus positioned within the interior space and comprising a plurality of inlets; and a valve module comprising a plurality of valves, each valve of the plurality of valves configured to control a flow of a respective portion of the process gas to a corresponding inlet of the plurality of inlets. Each valve of the valve module is positioned in a common plane substantially parallel to a boundary of the interior space defined by the first end. The valve module is positioned within the interior space such that the valve module is at or proximate to the boundary.
Each valve of the valve module may be a bypass valve configured to selectively route the flow of the process gas from the process chamber to one of: the corresponding inlet; or a bypass pipe.
Each valve of the valve module may be coupled to the corresponding inlet by a corresponding pipe. Each pipe may comprise a variable length portion.
The valve module may further comprise a plurality of isolation valves. Each isolation valve of the plurality of isolation valves may be intermediately positioned between a corresponding bypass valve and a corresponding pipe.
Each valve of the valve module may further comprise an inlet configured to receive the respective portion of the process gas. Each inlet may be positioned on a third common plane substantially parallel to the upper boundary. The third common plane may be positioned at a distance of 7cm or less from the upper boundary.
The frame may be a vertically oriented frame comprising an upper wall at the first end. The valve module may be mounted to the upper wall.
The valve module may be slidably mounted to the frame.
The plurality of valves may be arranged in a plurality of parallel rows.
The plurality of parallel rows may be slidably mounted to the upper wall.
The valve module may be arranged as 2 parallel rows of 3 valves or 2 parallel rows of 6 valves.
The upper wall may comprise a through hole. The inlets to the valves may be located at or proximate to the through hole.
The vacuum pumping or abatement system may be an abatement system comprising: a burner for combusting the process gas; and a head assembly for the burner. The head assembly may comprise the plurality of inlets.
The burner may be selected from the group of burners consisting of a gas-fired burner, an induction-heated burner, and a plasma torch.
In a further aspect, there is provided a valve module for a vacuum pumping and/or abatement system, the valve module comprising: a plurality of valves, each valve of the plurality of valves configured to control a flow of a respective portion of a process gas from a process chamber to a corresponding inlet of the vacuum pumping and/or abatement system. Each valve of the valve module is positioned in a common plane.
BRIEF DESCRIPTION OF DRAWINGS
Figure 1 is a schematic illustration (not to scale) showing a vacuum pumping and abatement system;
Figure 2 is a schematic illustration (not to scale) showing a conventional abatement system;
Figure 3 is a schematic illustration (not to scale) showing a perspective view of a valve module of the conventional abatement system;
Figure 4 is a schematic illustration (not to scale) showing an abatement system;
Figure 5 is a schematic illustration (not to scale) showing a perspective view of a portion of a valve module of the abatement system;
Figure 6 is a schematic illustration (not to scale) showing a perspective view of a portion of the abatement system;
Figure 7 is a schematic illustration (not to scale) showing a perspective view of a valve module and pipes;
Figures 8A - 8C are schematic illustrations (not to scale) showing further abatement systems;
Figure 9 is a schematic illustration (not to scale) showing a valve module of an abatement system; and
Figure 10 is a schematic illustration (not to scale) showing a portion of an abatement system.
DETAILED DESCRIPTION
Figure 1 is a schematic illustration (not to scale) showing a vacuum pumping and abatement system 100 for evacuating process gas from a process chamber 102 and removing undesirable substances from the process gas.
The processing of products is performed in the process chamber 102 in the presence of a process gas, for example, processing of silicon wafers, such as by dielectric etching or flat panel etching. Typically, undesirable substances are exhausted from the process chamber 102 in the process gas during or after processing. These noxious substances may include, but are not limited to, CF4, C2F6, NF3, SF6, SiCk, and/or CI2.
The system 100 comprises a vacuum pump 104 arranged to pump the process gas from the process chamber 102 via a first fluid connection 108, commonly referred to as a “foreline”. The vacuum pump 104 may be, for example, a dry vacuum pump.
The system 100 further comprises an abatement apparatus 106 fluidly connected to the vacuum pump 104 via a second fluid connection 110. The abatement apparatus 106 is described in more detail later below with reference to Figure 2. The abatement apparatus 106 is configured to remove the undesirable substances from the process gas received from the vacuum pump 104, and to output an exhaust gas via a third fluid connection 112. Preferably
the abatement apparatus 106 is configured to convert a component of the received process gas into a different compound or compounds.
The abatement apparatus 106 may output the exhaust gas via the third fluid connection 112 to, for example, the environment, or to other gas processing and/or storage apparatuses (not shown).
What will now be described with reference to Figures 2 and 3 is an example of a conventional abatement system 200, which is useful in understanding the present invention which is described later below with reference to Figures 4 and 5.
Figure 2 is a schematic illustration (not to scale) showing an example of a conventional abatement system 200.
Figure 3 is a schematic illustration (not to scale) showing a perspective view of a conventional valve module 204 of the conventional abatement system 200.
The abatement system 200 comprises a frame 202, a valve module 204, a burner module 210, a drainage tank 212, a scrubber 214, and an exhaust gas outlet pipe 208. The valve module 204, and an abatement apparatus comprising the burner module 210, the drainage tank 212, and the scrubber 214 are positioned within an interior space 201 defined by the frame 202. The exhaust gas outlet pipe 208 may be positioned at least partially within the interior space 201 defined by the frame 202.
The burner module 210 comprises a head assembly 216 having a plurality of inlets 218, a burner 220, and a quench 222. The plurality of inlets 218 are inputs to the burner 220.
As shown in Figure 3, the valve module 204 comprises a plurality of valves 226. In this example, the valves 226 are bypass valves. Each bypass valve 226 of the valve module 204 comprises a first inlet pipe 230 configured to receive a respective portion of the process gas, a first outlet pipe 232 coupled to a corresponding inlet 218 on the head assembly 216, and a second outlet pipe 234 coupled to a bypass pipe (not shown). The plurality of valves 226 are
coupled to the second fluid connection 110 such that, in operation, each valve of the plurality of valves 226 receives the respective portion of the process gas as indicated in FIG. 2 by a dotted arrow and the reference numeral 235. The bypass valves 226 are configured to selectively route a flow of the respective portion of the process gas to the corresponding inlet 218, or to the bypass pipe. For example, the bypass valves 226 can be actuated, via an actuator 228, between an “on-line” position to route process gas to the corresponding inlets 218, and an “off-line” position to route the process gas to the bypass pipe. The bypass pipe may be coupled to a back-up gas treatment system (not shown).
In normal operation, process gas received from the second fluid connection 110 is routed to the inlets 218 via the valve module 204. The process gas is then received by the burner 220, wherein the process gas is combusted. In this example, normal operation refers to operating the system when the bypass valves 226 are in the “on-line” position.
The combusted process gases may include combustion by-products such as HF and SiO2. The abatement apparatus is further configured to remove these combustion by-products prior to outputting exhaust gases. More specifically, the quench 222, drainage tank 212, and scrubber 214 are configured to remove the aforementioned combustion by-products.
The burner 220 is further coupled to the quench 222 such that, in operation, the combusted process gases from the burner 220 are received by the quench 222. The quench 222 is configured to cool the combusted process gas from a relatively high temperature (for example, about 800°C-1200°C, e.g. about 1000°C) to a relatively low temperature (for example, a temperature less than 80°C). For example, the quench may spray finely atomised water across the hot gas stream, thereby cooling the gas stream. In this way, particulates in the gases are entrained in water vapour, which condenses as water at the bottom of the quench.
The quench 222 is further coupled to the drainage tank 212, such that, in operation, the cooled gas stream is output from the quench 222 and into the drainage tank 212.
In operation, the cooled gas stream flows from the quench 222, through the drainage tank 212, and into the scrubber 214 at its base. The scrubber 214 is coupled to an upper surface 211 of the drainage tank 212.
The scrubber 214 is configured to remove certain substances from a gas stream flowing therethrough. More specifically, the scrubber 214 is configured to remove any remaining particulates in the cooled gas stream. For example, the scrubber 214 may be configured to introduce a scrubbing liquid, for example water, into the gas stream flowing through the scrubber 214. Thus, particulates in the cooled process gas may be captured by droplets of the scrubbing liquid, and subsequently fall into the drainage tank 212.
In this example, the scrubber 214 removes water soluble combustion byproducts from the cooled gas stream. For example, water soluble gaseous substances such as HF and SiO2 tend to be absorbed or dissolved in the scrubbing liquid. These droplets subsequently fall into the drainage tank 212.
In this example, the valve module 204 is mounted to a sidewall of the frame 202 by means of a cantilever bracket 238. However, such mounting may cause angular deformation of the sidewall. Furthermore, this configuration tends to make access to at least some of the valves 226 difficult (e.g., by a human for the purposes of inspection, maintenance, repair and/or replacement), especially those valves 226 situated closer to the cantilever bracket 238 or the frame 202. Moreover, valve module 204, including the inlet pipes 230, the first outlet pipes 232, the second outlet pipes 234, the valves 226 and the actuators 228, tend to take up a relatively large volume within the interior space 201. This tends to make installation of the valve module 204 difficult, and prohibit inspection, maintenance, repair and/or replacement of the other components (e g., the burner module 210) within the interior space 201 .
Yet further, conventionally it tends to be the case that, for a given type of burner module, head assembly, and/or frame size/shape, a bespoke valve module having a bespoke valve and pipe arrangement is designed.
What will now be described are embodiments of a valve module and mounting mechanism that tends to address the aforementioned problems associated with conventional valve modules.
Figure 4 is a schematic illustration (not to scale) showing an embodiment of an abatement system 400.
Figure 5 is a schematic illustration (not to scale) showing a portion of a valve module 404 of the abatement system 400.
Figure 6 is a schematic illustration (not to scale) showing a perspective view of a portion of the abatement system 400.
Figure 7 is a schematic illustration (not to scale) showing a perspective view of the valve module 404 and pipes 417 of the abatement system 400.
In this embodiment, the abatement system 400 comprises a frame 402, a valve module 404, a burner module 410, a drainage tank 412, and a scrubber 414. The burner module 410 comprises a head assembly 416 having a plurality of inlets 418, a burner 420, and a quench 422. The plurality of inlets 418 are inputs to the burner 420.
The frame 402 comprises a first end wall 444, a second end wall 446 opposite to the first end wall 444, and a plurality of sidewalls 448 disposed between the first end wall 444 and the second end wall 446. The frame 402 may be vertically oriented such that the first end wall 444 defines an upper wall, and the second wall 446 defines a lower wall.
The valve module 404 and an abatement apparatus comprising the burner module 410, the drainage tank 412, and the scrubber 414 are positioned within an interior space 401 defined by the walls of the frame 402. The exhaust gas outlet pipe 408 may be positioned at least partially within the interior space 401.
The valve module 404 comprises a plurality of valves 426. The plurality of valves 426 are coupled to the second fluid connection 110 such that, in operation, each valve of the plurality of valves 426 receives a respective portion of the process gas as indicated in FIG. 4 by a dotted arrow and the reference
numeral 435. More specifically, the process gas is received by each valve 426 at a first inlet 430. In this embodiment, the valves 426 are bypass valves, wherein each bypass valve 426 is configured to selectively route a flow of the respective portion of the process gas to either a corresponding inlet 418 via a first outlet 432, or to a bypass pipe (not shown) via a second outlet 434. For example, the bypass valves 426 can be actuated, via an actuator 428, between an “on-line” position to route process gas to the corresponding inlets 418, and an “off-line” position to route the process gas to the bypass pipeline. The bypass pipe may be coupled to a back-up gas treatment system (not shown).
In normal operation, the respective portion of process gas received by each valve 426 is routed to the corresponding inlet 418. The process gas is then received by the burner 420, wherein the process gas is combusted. Normal operation refers to operating the system such that a flow of process gas to the inlets 418 is permitted. For example, when the bypass valves are in the “on-line” position.
The valve module 404 comprises a plurality of valves 426 positioned in a common plane 450. More specifically, each valve of the plurality of valves 426 is positioned in a common plane 450 which is substantially parallel to an upper boundary defined by the upper wall 444. Furthermore, the first inlets 430 of the valve module are positioned in a common inlet plane 452 which is substantially parallel to the upper boundary defined by the first end wall 444.
In this embodiment, the upper boundary defined by the upper wall 444, the common plane 450, and the common inlet plane 452 may be substantially parallel to a ground surface on which the abatement system is disposed and, optionally, attached to. The upper boundary defined by the upper wall 444, the common plane 450, and the common inlet plane 452 may be substantially horizontal planes.
The valve module 404 is positioned within the interior space 401 defined by the frame 402 such that it is at or proximate to the upper boundary. As used herein, the term “proximate” may mean, for example, that a distance between the upper boundary and the common inlet plane 452 is 7cm or less. More
preferably, this distance is 6cm or less. More preferably, this distance is 5cm or less. More preferably, this distance is 4cm or less. More preferably, this distance is 3cm or less. More preferably, this distance is 2cm or less. More preferably, this distance is 1cm or less. The term “proximate” may alternatively be understood as the valve module 404 being positioned entirely within 30cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 25cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 20cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 15cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 14cm of the upper boundary. More preferably, the valve module 404 is positioned entirely within 13cm of the upper boundary.
In this embodiment, the valves 426 of the valve module 404 are arranged in an array. In other words, the valves 426 of the valve module 404 are arranged in multiple side-by-side rows 442. For example, in this embodiment, the valve module 404 comprises two parallel rows 442 of three valves 426 each.
The valve module is slidably mounted to the frame 402, for example to the first end wall 444. The valve module may comprise one or more sliding members 438 configured to be received by one or more corresponding rails 440 attached to or disposed on the upper wall 444. For example, each row of the one or more side-by-side rows 442 may comprise a sliding member 438 that is independently received by a corresponding rail 440 on the upper wall 444. In this example, each valve 426 belonging to a row of valves is detachably fixed to the corresponding sliding member 438.
The upper wall 444 may comprise a through hole 456 to enable or facilitate servicing of the valve module 404 and/or connection of the plurality of valves 426 to the second fluid connection 110 and to the bypass pipe.
As illustrated in FIG. 4, a maximum height at which the inlets 418 may be attached to the pipes 417 is provided on a second inlet plane 454. The second inlet plane 454 may be substantially parallel to the first end wall 444. The pipes
417 comprise a flexible bellows portion having a variable length to facilitate connection to inlets 418 at a height below the maximum height.
In this embodiment, the burner 420 is a gas-fired burner. In other embodiments, however, the burner 420 may be a different type of burner, such as an induction-heated burner or a plasma torch. The increased available space, by virtue or providing a compact valve module 404, enables these burners to be used within the same interior space 401 and/or frame 402. For example, plasma torches are typically taller than gas-fired burners. The valve module 404 according to the present invention advantageously enables a plasma torch to be used in the system 400 with frame 402, which would otherwise have required a separate valve module. By way of example, FIG. 8A is a schematic illustration showing a plasma torch 860 with a head assembly 861 implemented in the abatement system 400. FIG. 8B is a schematic illustration showing a gas-fired burner 862 with a first head assembly 864 implemented in the abatement system 400. FIG. 80 is a schematic illustration showing a gas-fired burner 862 with a second head assembly 866 implemented in the abatement system 400. It will be appreciated that, each of these burners and head assemblies, that would have otherwise required a bespoke valve module, are implemented in the same abatement system 400 using the same valve module 404.
Furthermore, different burners typically have different head assemblies having a different configuration of inlets 418. For example, conventionally, the inlets may sit on a different pitch circle diameter (PCD) with a different arrangement of inlets on the PCD. The valve module 404 and pipes 417 provide a common PCD for which head assemblies 418 may be designed. For example, a plasma torch typically requires inlets 418 at a greater PCD than that of conventional gas-fired burners. Accordingly, the pipes 417 are provided in a circular arrangement such that it is compatible with a plasma torch. As illustrated in FIG. 8B and FIG. 8C, the inlets 418 on a head assembly 864 or a head assembly 866 for a gas-fired burner 862 may be provided in a splayed arrangement to match the PCD at which the plasma torch inlets are situated.
Thus, the same valve module 404 and arrangement of pipes 417 may be used with various burners and/or head assemblies.
Furthermore, it is contemplated that the valve module 404 may facilitate improved designs of burners such as gas-fired burners by virtue of providing additional space for a reactor of the burner. In other words, a taller gas-fired burner may be designed for use with the valve module 404. In such an embodiment, the inlets 418 illustrated in FIG. 4 will be elevated to a position at or closer to the second inlet plane 454.
Advantageously, the above-described configuration provides a common PCD for future burner and/or head assembly designs, thereby reducing time spent designing, manufacturing, and installing future head assemblies. In other words, a common inlet interface design is provided for various burners and/or head assemblies. Furthermore, the above-described configuration reduces the amount of pipe variants 417 required for different burners and/or head assemblies by providing a common PCD at which the inlets 418 couple to the pipes 417.
The above-described configuration advantageously enables burners 420 and/or head assemblies 416 to be switched depending on the desired abatement apparatus for a particular process or process gas. Thus, a modular system for assembling an abatement system 400 having a common frame 402 and valve module 404 is provided.
The valve module 404 may further comprise a plurality of isolation valves 458 positioned intermediately between each bypass valve 426 and pipe 417. In other words, each isolation valve 458 is positioned downstream (with respect to the direction of fluid flow of the process gas) of a corresponding bypass valve 426 and upstream of a corresponding pipe 417. The isolation valves 458 may be used as secondary isolation for service tasks such as cleaning the head assembly 416. Conventionally, secondary isolation is provided outside of the abatement system 400. In other words, secondary isolation is typically provided upstream of the abatement system 400.
As illustrated in FIG. 4, the valve module 404 enables a taller scrubber 414 to be used in the abatement system 400. More specifically, a more compact valve module 404 is provided, thereby increasing the space available for the scrubber 414. Furthermore, the valve module 404 may be slid out of the frame for maintenance and servicing, therefore a taller scrubber 414 may be provided in the space that would otherwise be required for servicing a conventional valve module. This advantageously tends to provide for improved removal of combustion by-products by the scrubber 414.
In the above embodiments, the valve module 404 is arranged in two parallel rows 442 each having three valves 426. However, in other embodiments, the valve module 404 may comprise any number of rows 442, each row having any number of valves 426. For example, the number of valves 426 can vary between 2 to 20 valves arranged in 1 , 2, 3, 4, or 5 rows 442. By way of example, FIG. 9 is a schematic illustration (not to scale) showing a perspective view of a further embodiment of the valve module 404 and head assembly 416. FIG. 10 is a schematic illustration (not to scale) of the valve module 404 shown in FIG. 9 provided in a frame 402. In the embodiments shown in Figures 9 and 10, the valve module 404 comprises two rows 442 of six valves 426 each.
In the above embodiments, the valve module 404 comprises bypass valves 426 and isolation valves 458. In other embodiments, the bypass valves 426 may be omitted, and the valve module 404 only comprises isolation valves 458. In yet another embodiment, the isolation valves 458 may be omitted, and the valve module 404 only comprises bypass valves 426. In yet another embodiment, both may be omitted, and the plurality of valves may include one or more different types of valves configured to control and/or restrict the flow of process gas to the inlets 418. In yet another embodiment, the plurality of valves may include one or more different types of valves in addition to either or both of the bypass valves 426 and isolation valves 458.
In the above embodiments, the valve module 404 is implemented in an abatement system 400. However, in other embodiments, the valve module 404
is implemented in a different type of system such as a vacuum pumping system. In such an embodiment, the valve module is provided in an enclosure or frame in which a vacuum pumping apparatus is situated. The valve module may be positioned proximate to, and in a plane parallel to, a wall of the enclosure, thereby maximising space for the vacuum pumping apparatus positioned therein.
The present invention advantageously provides a valve module that is compatible with different burners and different head assemblies within the same frame. Advantageously, the present invention also facilitates future burners and/or head assemblies to be designed to be compatible with the valve module according to embodiments of the present invention. Thus, time spent designing, manufacturing, and installing bespoke components of abatement systems is reduced.
Advantageously, the valves are positioned proximate to an upper boundary of the frame, thereby maximising space for the abatement apparatus below. Thus, the valve module according to the present invention facilitates the use of various burner technologies to be used with the same valve module and in the same frame. In other words, burners and/or head assemblies with inlets at varying heights may be implemented with the same valve module.
Advantageously, the valves are slidably mounted to the frame such that the valves may be slidably removed from the frame, thereby enabling servicing of the valves outside of the frame. Thus, ease of access to the valves for the purposes of inspection, maintenance, repair and/or replacement is provided. Furthermore, mounting the valve module to one or more rails on an upper wall of the frame tends to distribute the load of the valve module more evenly over the frame compared to use of a cantilever bracket mounted to a sidewall of the frame. Furthermore, the rails tend to allow the heavy valves to be slidably removed from the confines of the frame and easily managed outside of the system in a safe and controlled manner avoiding risk of injury and speeding up service operations.
REFERENCE NUMERAL KEY
100 - vacuum pumping and abatement system
102 - process chamber
104 - vacuum pump
106 - abatement apparatus
108 - first fluid connection
110 - second fluid connection
112 - third fluid connection
200 - abatement system
201 - interior space
202 - frame
204 - valve module
208 - exhaust gas outlet pipe
210 - burner module
212 - drainage tank
214 - scrubber
216 - head assembly
218 - plurality of inlets
220 - burner
222 - quench
226 - valves of the valve module
228 - valve actuator
230 - first inlet pipe
232 - first outlet pipe
234 - second outlet pipe
235 - process gas flow
238 - cantilever bracket
400 - abatement system
401 - interior space
402 - frame
404 - valve module
408 - exhaust gas outlet pipe
410 - burner module
412 - drainage tank
414 - scrubber
416 - head assembly
417 - pipes
418 - plurality of inlets
420 - burner
426 - valves of the valve module
428 - valve actuator
430 - first inlet
432 - first outlet
434 - second outlet
435 - process gas flow
438 - sliding members
440 - rails
442 - rows of valves
444 - first end wall
446 - second end wall
448 - frame members
450 - common plane
452 - common inlet plane
454 - second inlet plane 456 - through hole
458 - isolation valves
860 - plasma torch
861 - plasma torch head assembly
862 - gas-fired burner 864 - first head assembly
866 - second head assembly
Claims
1 . An abatement system for abating process gas from a process chamber, the system comprising: a frame having a first end, a second end opposite to the first end, and a plurality of frame members disposed therebetween, the frame defining an interior space; an abatement apparatus positioned within the interior space and comprising a plurality of inlets; and a valve module comprising a plurality of valves, each valve of the plurality of valves configured to control a flow of a respective portion of the process gas to a corresponding inlet of the plurality of inlets; wherein each valve of the valve module is positioned in a common plane substantially parallel to a boundary of the interior space defined by the first end; the valve module is positioned within the interior space such that the valve module is at or proximate to the boundary; each valve of the valve module is coupled to the corresponding inlet by a corresponding pipe; each pipe has a first end connected to a corresponding valve of the valve module and a second end connected to the corresponding inlet; the second end of each pipe is positioned on a second common plane; and wherein the second common plane is substantially parallel to the common plane.
2. The abatement system of claim 1 , wherein the plurality of pipes and inlets are arranged in a circular arrangement having a common pitch circle diameter (PCD).
3. The abatement system of claim 1 or 2, wherein each valve of the valve module is a bypass valve configured to selectively route the flow of the process gas from the process chamber to one of: the corresponding inlet; or a bypass pipe.
4. The abatement system of claim 3, wherein the valve module further comprises a plurality of isolation valves, wherein each isolation valve of the plurality of isolation valves is intermediately positioned between a corresponding bypass valve and a corresponding pipe.
5. The abatement system of any preceding claim, wherein each pipe comprises a variable length portion.
6. The abatement system of any preceding claim, wherein each valve of the valve module comprises a valve inlet configured to receive the respective portion of the process gas, wherein each valve inlet is positioned on a third common plane substantially parallel to the upper boundary.
7. The abatement system of claim 6, wherein the third common plane is positioned at a distance of 7cm or less from the upper boundary.
8. The abatement system any preceding claim, wherein the frame is a vertically oriented frame comprising an upper wall at the first end, and wherein the valve module is mounted to the upper wall.
9. The abatement system of any preceding claim, wherein the valve module is slidably mounted to the frame.
10. The abatement system of any preceding claim, wherein the plurality of valves is arranged in a plurality of parallel rows.
11 . The abatement system of claim 10, wherein the frame is a vertically oriented frame comprising an upper wall at the first end, and wherein each row of the plurality of parallel rows is slidably mounted to the upper wall.
12. The vacuum pumping or abatement system of claim 10 or 11 , wherein the valve module is arranged as 2 parallel rows of 3 valves or 2 parallel rows of 6 valves.
13. The abatement system of any preceding claim, wherein the frame is a vertically oriented frame comprising an upper wall at the first end, wherein the upper wall comprises a through hole, and wherein inlets to the valves are located at or proximate to the through hole.
14. The abatement system of any preceding claim, further comprising: a burner for combusting the process gas; and a head assembly for the burner; wherein the head assembly comprises the plurality of inlets.
15. The abatement system of claim 1 , wherein the burner is selected from the group of burners consisting of: a gas-fired burner, an induction-heated burner, and a plasma torch.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2404980.1 | 2024-04-08 | ||
| GB202404980 | 2024-04-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2025215344A1 true WO2025215344A1 (en) | 2025-10-16 |
Family
ID=91335077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/GB2025/050729 Pending WO2025215344A1 (en) | 2024-04-08 | 2025-04-07 | A valve module for a vacuum pumping and/or abatement apparatus |
Country Status (2)
| Country | Link |
|---|---|
| TW (1) | TW202603299A (en) |
| WO (1) | WO2025215344A1 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220090592A1 (en) * | 2019-02-20 | 2022-03-24 | Edwards Limited | Vacuum pumping |
| WO2022229642A1 (en) * | 2021-04-29 | 2022-11-03 | Edwards Limited | A valve module for a vacuum pumping system |
| GB2622561A (en) * | 2022-05-30 | 2024-03-27 | Edwards Ltd | An abatement system for treatment of exhaust gases of a vacuum processing system |
-
2025
- 2025-03-21 TW TW114110738A patent/TW202603299A/en unknown
- 2025-04-07 WO PCT/GB2025/050729 patent/WO2025215344A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220090592A1 (en) * | 2019-02-20 | 2022-03-24 | Edwards Limited | Vacuum pumping |
| WO2022229642A1 (en) * | 2021-04-29 | 2022-11-03 | Edwards Limited | A valve module for a vacuum pumping system |
| GB2622561A (en) * | 2022-05-30 | 2024-03-27 | Edwards Ltd | An abatement system for treatment of exhaust gases of a vacuum processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202603299A (en) | 2026-01-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP3243005B1 (en) | Improvements in or relating to vacuum pumping arrangements | |
| US8293184B2 (en) | Falling film plasma reactor | |
| US8366423B2 (en) | Method and arrangement for realizing a vacuum in a vacuum chamber | |
| WO2004041415A1 (en) | Semiconductor manufacturing facility and process systems utilizing exhaust recirculation | |
| EP2923751A1 (en) | Multi-stage vacuum pump with abatement function | |
| CN112740369B (en) | Substrate processing equipment | |
| GB2568359A (en) | Vacuum pumping and/or abatement system | |
| WO2008147523A1 (en) | Cogeneration abatement system for electronic device manufacturing | |
| JP6153033B2 (en) | Gas flow treatment equipment | |
| WO2020123050A1 (en) | Heat exchanger with multi stag ed cooling | |
| CN110779357B (en) | Device with multistage cooling | |
| TW202603299A (en) | A valve module for a vacuum pumping and/or abatement apparatus | |
| JP6874957B2 (en) | Exhaust gas abatement emission system | |
| EP4532083A1 (en) | An abatement system for treatment of exhaust gases of a vacuum processing system | |
| WO2020008177A1 (en) | Gas abatement apparatus | |
| CN223517204U (en) | Waste gas treatment device | |
| KR102910741B1 (en) | Wet Scrubber | |
| CN221349176U (en) | Plasma water washing type single-cavity waste gas treatment equipment | |
| US20250114740A1 (en) | Compact scrubber for plasma abatement gas stream | |
| KR20250084673A (en) | Waste gas treatment system and method of operation thereof | |
| TW202543717A (en) | Gas treatment device | |
| CN119113741A (en) | A plasma water washing tail gas treatment system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 25718026 Country of ref document: EP Kind code of ref document: A1 |