WO2025213620A1 - 一种多波长非线性飞秒激光加工方法及系统 - Google Patents

一种多波长非线性飞秒激光加工方法及系统

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Publication number
WO2025213620A1
WO2025213620A1 PCT/CN2024/106745 CN2024106745W WO2025213620A1 WO 2025213620 A1 WO2025213620 A1 WO 2025213620A1 CN 2024106745 W CN2024106745 W CN 2024106745W WO 2025213620 A1 WO2025213620 A1 WO 2025213620A1
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femtosecond laser
power
optical path
nonlinear
path difference
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French (fr)
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杨中民
郝默雷
韦小明
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South China University of Technology SCUT
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South China University of Technology SCUT
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
    • B23K26/0673—Dividing the beam into multiple beams, e.g. multi-focusing into independently operating sub-beams, e.g. beam multiplexing to provide laser beams for several stations

Definitions

  • the present invention relates to the field of laser applications, and in particular to a multi-wavelength nonlinear femtosecond laser processing method and system.
  • laser processing has many advantages such as high processing efficiency, fast speed and good quality. It has broad application prospects and development space in the field of industrial manufacturing.
  • femtosecond laser processing offers higher peak energy and more ordered energy output. This means that femtosecond laser processing can process a wider range of materials, achieve greater processing depth, minimize thermal damage outside the processing area, achieve higher processing quality, and further enhance processing speed and efficiency.
  • solid-state femtosecond lasers have a number of disadvantages, including large size, fragility, difficulty in maintenance, and high cost.
  • existing technologies using single-wavelength lasers for processing also have numerous limitations. For example, they have poor adaptability to different materials, limiting processing to materials with high absorption rates within that wavelength band; the material heating method is linear, which is slow, and heat is easily transferred to the periphery of the processing area, resulting in poor processing quality; and they cannot actively and accurately modulate the local transient temperature field in the processing area.
  • the multi-wavelength laser processing device described in the "Multi-wavelength Laser Processing Device” includes a multi-wavelength laser emitting lasers of different wavelengths, a laser processing system, and a laser beam combining device.
  • the laser processing system includes a galvanometer assembly, which includes a scanning galvanometer and a focusing mirror.
  • the laser beam combining device includes a first dispersion compensation assembly, a second dispersion compensation assembly, a first reflector, a second reflector, and a first polychromatic beam combining mirror.
  • the first dispersion compensation assembly includes a first right-angle mirror and a first prism for the first wavelength laser to pass through.
  • the second dispersion compensation assembly includes a second right-angle mirror and a second prism for the second wavelength laser to pass through.
  • the first reflector reflects the dispersion-compensated first wavelength laser and combines it with the dispersion-compensated second wavelength laser in the first polychromatic beam combining mirror.
  • the combined laser beam is then reflected by the second reflector into the scanning galvanometer, focused by the focusing mirror, and then processed by the workpiece. Due to the lack of an optical path difference and group delay detector, the relative delays of the laser beams of different wavelengths cannot be changed, making high-precision material processing impossible.
  • the three wavelengths used red, green, and violet
  • the multi-wavelength nonlinear femtosecond laser processing method proposed in this paper can effectively overcome the above-mentioned problems.
  • the method can improve the variety of processed materials and the processing accuracy, speed, depth, and quality.
  • a multi-wavelength nonlinear femtosecond laser processing method comprises the following steps:
  • step S2 passing each high-power femtosecond laser beam obtained in step S1 through a pair of angle-adjustable thin film reflectors, and then combining the reflected light beams using a beam combiner;
  • step S3 allowing the combined light beams obtained in step S2 to enter a beam splitter for splitting each high-power femtosecond laser beam into two paths: a signal light and an idle light;
  • step S4 allowing the signal light obtained in step S3 to enter a photodetector, converting the optical signal into an electrical signal, and then passing it through an optical path difference and group delay detector to regulate the thin film mirror pair, thereby controlling the optical path difference and group delay of each high-power femtosecond laser and adjusting the idle light in step S3;
  • step S5 The idle light adjusted in step S4 is passed through a beam focusing module.
  • the focused laser is vertically irradiated onto the upper surface of the sample to be processed.
  • the different effects of each femtosecond laser on the processed sample are used to control the nonlinear temperature field and finally complete the processing.
  • the group of high-power femtosecond lasers includes two or more high-power femtosecond lasers that can output different wavelengths, and is used to generate multiple high-power femtosecond lasers including at least two different wavelengths.
  • the repetition frequency of high-power femtosecond lasers output by each high-power femtosecond laser is consistent, and the output power is adjustable.
  • step S4 after the photodetector converts each signal light signal into an electrical signal, the optical path difference and group delay detector detects the relative time delay between each high-power femtosecond laser and calculates the optical path difference, thereby adjusting the tilt angle of each thin film reflector pair to compensate for the optical path difference of each high-power femtosecond laser, thereby achieving time domain regulation of the idle light;
  • the time for each laser to act on the sample surface is accurately allocated according to the actual application scenario, with an accuracy of the fs level.
  • step S5 the beam focusing module is fixed on a three-dimensional displacement adjustment frame to form a three-dimensional displacement focusing module, which is used to change the relative position of the beam focus and the surface of the sample to be processed, adjust the spot size on the surface of the sample to be processed, and adapt to the processing requirements of different samples to be processed.
  • the temperature field refers to the local temperature field of the sample to be processed when the laser is focused by the beam focusing module and irradiated on the sample to be processed
  • the nonlinearity refers to the nonlinear heating method of the sample to be processed during the temperature rise period.
  • step S5 the manner of regulating the nonlinear temperature field includes changing the output power of each high-power femtosecond laser.
  • step S5 the nonlinear temperature field is regulated by controlling the optical path difference and group delay of high-power femtosecond lasers emitted by different high-power femtosecond lasers through an optical path difference and group delay control module.
  • the method of regulating the nonlinear temperature field includes controlling the effective area of the emitted laser on the surface of the sample to be processed by a three-dimensional displacement focusing module.
  • a multi-wavelength nonlinear femtosecond laser processing system includes a group of high-power femtosecond lasers, an optical path difference and group delay control module, and a three-dimensional displacement focusing module;
  • the group of high-power femtosecond lasers includes two or more high-power femtosecond lasers capable of outputting different wavelengths
  • the optical path difference and group delay control module includes two sets of angle-adjustable thin film reflectors, a set of beam-splitting mirrors, a beam splitter, a photodetector, and an optical path difference and group delay controller;
  • the three-dimensional displacement focusing module includes a beam focusing module and a three-dimensional displacement adjustment frame;
  • a group of high-power femtosecond lasers generates multiple high-power femtosecond lasers with at least two different wavelengths.
  • Each high-power femtosecond laser is reflected by two sets of angle-adjustable thin film reflectors, and then combined by a beam combiner to obtain a combined light beam.
  • the combined light beam is incident on a beam splitter, which splits each high-power femtosecond laser into a signal light and an idle light.
  • the signal light enters the photodetector, which converts the optical signal into an electrical signal. Then, it passes through the optical path difference and group delay detector to achieve precise control of the thin film reflector, control the optical path difference and group delay of each high-power femtosecond laser, and adjust the idle light.
  • the adjusted idle light passes through the beam focusing module, and the focused laser is vertically irradiated onto the upper surface of the sample to be processed, finally completing the processing.
  • the present invention uses multiple high-power femtosecond lasers that output lasers of different wavelengths and adopts a series of means to regulate the temperature field of the sample processing area, thereby improving the precision processing efficiency, quality and processing depth, and expanding the application scope of femtosecond laser precision processing.
  • FIG1 is a schematic structural diagram of a multi-wavelength nonlinear femtosecond laser processing system according to an embodiment of the present invention
  • FIG2 is a schematic diagram of a timing arrangement of pulses of different wavelengths within a single pulse period according to an embodiment of the present invention
  • FIG3 is a schematic diagram of a temperature rise curve of a material processed using a single-wavelength femtosecond laser within a single pulse period in an embodiment of the present invention
  • FIG4 is a schematic diagram of a temperature rise curve of a material processed using a multi-wavelength femtosecond laser within a single pulse period in an embodiment of the present invention
  • FIG5 is a schematic diagram showing a comparison of the temperature rise curves of a material processed using a single-wavelength femtosecond laser and the temperature rise curves of a material processed using a multi-wavelength femtosecond laser during the entire processing process in an embodiment of the present invention.
  • a multi-wavelength nonlinear femtosecond laser processing method comprises the following steps:
  • the group of high-power femtosecond lasers includes two or more high-power femtosecond lasers that can output different wavelengths, and is used to generate multiple high-power femtosecond lasers including at least two different wavelengths.
  • the high-power femtosecond laser repetition frequency output by each high-power femtosecond laser is consistent, and the output power is adjustable.
  • step S2 passing each high-power femtosecond laser beam obtained in step S1 through a pair of angle-adjustable thin film reflectors, and then combining the reflected light beams using a beam combiner;
  • step S3 allowing the combined light beams obtained in step S2 to enter a beam splitter for splitting each high-power femtosecond laser beam into two paths: a signal light and an idle light;
  • step S4 allowing the signal light obtained in step S3 to enter a photodetector, converting the optical signal into an electrical signal, and then passing it through an optical path difference and group delay detector to regulate the thin film mirror pair, thereby controlling the optical path difference and group delay of each high-power femtosecond laser and adjusting the idle light in step S3;
  • the optical path difference and group delay detector detects the relative time delay between the high-power femtosecond lasers of each channel and calculates the optical path difference, thereby adjusting the tilt angle of each thin film reflector pair to compensate for the optical path difference of each high-power femtosecond laser and realize time domain regulation of the idle light;
  • the time for each laser to act on the sample surface is accurately allocated according to the actual application scenario, with an accuracy of the fs level.
  • step S5 The idle light adjusted in step S4 is passed through a beam focusing module.
  • the focused laser is vertically irradiated onto the upper surface of the sample to be processed.
  • the different effects of each femtosecond laser on the processed sample are used to control the nonlinear temperature field and finally complete the processing.
  • the beam focusing module is fixed on the three-dimensional displacement adjustment frame to form a three-dimensional displacement focusing module, which is used to change the relative position of the beam focus and the surface of the sample to be processed, adjust the spot size on the surface of the sample to be processed, and adapt to the processing requirements of different samples to be processed.
  • the temperature field refers to the local temperature field of the sample to be processed when the laser is focused by the beam focusing module and irradiated on the sample to be processed.
  • the nonlinearity refers to the nonlinear heating method of the sample to be processed during the temperature rise period.
  • Methods for regulating the nonlinear temperature field include changing the output power of each high-power femtosecond laser.
  • the method for regulating the nonlinear temperature field includes controlling the optical path difference and group delay of high-power femtosecond lasers emitted by different high-power femtosecond lasers through an optical path difference and group delay control module.
  • the method of regulating the nonlinear temperature field includes controlling the effective area of the emitted laser on the surface of the sample to be processed through a three-dimensional displacement focusing module.
  • a multi-wavelength nonlinear femtosecond laser processing system includes a set of high-power femtosecond lasers A, an optical path difference and group delay control module B, and a three-dimensional displacement focusing module C;
  • the group of high-power femtosecond lasers A includes two or more high-power femtosecond lasers capable of outputting different wavelengths, wherein A 1 , A 2 , ..., An is n high-power femtosecond lasers, and n ⁇ 2;
  • the optical path difference and group delay control module includes two groups of angle-adjustable thin film mirrors, a group of combining mirrors, a beam splitter B4 , a photodetector B5 , and an optical path difference and group delay controller B6 ;
  • B11 , B12 , ..., B1n are a first group of n angle-adjustable thin film mirrors, n ⁇ 2;
  • B21 , B22 , ..., B2n are a second group of n angle-adjustable thin film mirrors;
  • B31 , B32 , ..., B3n are n beam combining mirrors;
  • the three-dimensional displacement focusing module C includes a plane reflector C 1 , a beam focusing module C 2 , a three-dimensional displacement adjustment frame C 3 and a sample to be processed C 4 ;
  • a high-power 1.0 ⁇ m wavelength femtosecond fiber laser and a high-power 2.0 ⁇ m wavelength femtosecond laser are selected as the first high-power femtosecond laser A1 and the first high-power femtosecond laser A2 , respectively, based on the absorption spectrum, melting and boiling points, etc. of the quartz crystal; wherein the output power of the first high-power femtosecond laser A1 is 1000 W, the repetition frequency is 1 GHz, and the pulse width is 300 fs; the output power of the second high-power femtosecond laser A2 is 200 W, the repetition frequency is 1 GHz, and the pulse width is 200 fs.
  • the incident optical path difference and group delay control module B of the first high-power femtosecond laser A1 passes through the first thin-film reflective mirrors B11 and B21 with electrically adjustable angles, and the first beam-combining mirror B31 with high transmittance for 1.0 ⁇ m laser and high reflectivity for 2.0 ⁇ m laser in sequence;
  • the laser output by the second high-power femtosecond laser A2 passes through the second thin-film reflective mirrors B12 and B22 with electrically adjustable angles, the second beam-combining mirror B32 with high reflectivity for 2.0 ⁇ m laser, and the first beam-combining mirror B31 with high transmittance for 1.0 ⁇ m laser and high reflectivity for 2.0 ⁇ m laser in sequence.
  • the resulting combined light beam is incident on the beam splitter B4 .
  • the combined beam is then split by beamsplitter B4.
  • One beam acting as the signal light, enters photodetector B5 and is then transmitted to optical path difference and group delay controller B6 .
  • Optical path difference and group delay controller B6 outputs an electrical control signal to adjust the angles of the electrically adjustable first thin-film mirrors B11 and B21 and the second thin-film mirrors B12 and B22 , causing the wavefront of the 2.0 ⁇ m femtosecond laser to advance by 100 fs compared to the 1.0 ⁇ m femtosecond laser.
  • the timing of the two laser pulses is shown in Figure 2, where the solid line represents the single-pulse energy distribution of a femtosecond fiber laser with an output wavelength of 2.0 ⁇ m and a repetition rate of 1GHz, and the dashed line represents the single-pulse energy distribution of a femtosecond fiber laser with an output wavelength of 1.0 ⁇ m and a repetition rate of 1GHz.
  • the other laser beam split by the beam splitter B4 is incident on the three-dimensional displacement focusing module C as idle light. After being reflected by the plane reflector C1 , it is incident on the beam focusing module C2 controlled by the three-dimensional displacement adjustment frame C3 to control the position and area of the processing beam irradiated on the sample to be processed C4 .
  • the material C 4 to be processed heats up faster and with a higher temperature rise within a single pulse cycle.
  • the upper curve represents the temperature rise curve of the material processed using a single-wavelength femtosecond laser
  • the lower curve represents the temperature rise curve of the material processed using a multi-wavelength femtosecond laser.
  • the above method is used to process the quartz crystal. During the entire processing process, the C4 temperature of the material to be processed meets the processing conditions faster, thereby effectively reducing problems such as thermal damage and energy consumption caused by long processing time.
  • the core innovation of this invention lies in: using multiple (two or more) high-power femtosecond lasers that can output different wavelengths, and by adjusting the energy and timing of each laser pulse, the heating process of the processing material is nonlinearly controlled to achieve the goals of reducing energy consumption and improving processing speed and accuracy.
  • a femtosecond laser with a central wavelength of 1030nm, an average power of 1W, a repetition rate of 100kHz, and a pulse width of 300fs was selected for processing, while a second femtosecond laser with a central wavelength of 532nm, an average power of 500mW, a repetition rate of 100kHz, and a pulse width of 500fs was selected for processing.
  • the relative delay between the first and second lasers was 200fs. Compared to a single femtosecond laser with the same parameters, the thermal damage to the processed material was reduced, the surface of the Mini LED cutout was smoother, and the processing effect was better.
  • a femtosecond laser with a central wavelength of 532nm, an average power of 30W, a repetition rate of 1kHz, and a pulse width of 800fs was selected for processing, along with a second femtosecond laser with a central wavelength of 355nm, an average power of 30W, a repetition rate of 1kHz, and a pulse width of 300fs.
  • the relative time delay between the first and second lasers was 300fs. Compared to a single femtosecond laser with the same parameters, this laser produces less thermal damage to the material being processed, resulting in a smoother cut surface on the copper sheet, better processing results, and higher efficiency.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
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Abstract

一种多波长非线性飞秒激光加工方法，使用多个高功率飞秒激光器(A)发射不同波长的高功率飞秒激光；通过光程差与群延迟控制模块(B)对各个激光器发出激光的光程差和群延迟进行精确控制；将多波长飞秒激光入射三维位移聚焦模块(C)；最终垂直入射待加工样品(C4)的上表面，完成飞秒激光加工。该方法通过精确调制各波长激光脉冲在时域上的相对位置，对样品加工区域的温度场实现动态非线性精准调控，提升精密加工效率、质量和加工深度，拓展飞秒激光精密加工应用范围。还涉及一种多波长非线性飞秒激光加工系统。

Description

一种多波长非线性飞秒激光加工方法及系统 技术领域
本发明涉及本发明涉及激光应用领域，具体涉及一种多波长非线性飞秒激光加工方法及系统。
 背景技术
与传统加工方式相比，激光加工具有加工效率高、速度快、质量好等诸多优势，在工业制造领域有广阔的应用前景和发展空间。
与连续光激光加工相比，飞秒激光加工峰值能量更高、能量输出更有序。这也意味着，使用飞秒激光对材料进行加工，可加工的材料种类更广，加工深度更大，材料加工区域外的热损伤更小、加工质量更高，加工速度与效率均可进一步提升。
目前，飞秒激光加工领域以使用单波长固体激光源的方案为主。与光纤飞秒激光器相比，固体飞秒激光器存在体积大、易损坏、维修难度高、成本高等一系列劣势。另一方面，以现有的技术手段使用单波长激光进行加工，也相应存在许多局限。例如：对不同材料的适应性差，只能选择对该波段吸收率高的材料进行加工；材料升温方式为线性升温，升温速度慢，热量易传导至加工区域周边，加工质量差；无法主动精确调制加工区域局部瞬态温度场；等等。
现有的多（双）波长激光加工方法，均通过单个激光器发出的基频光及对该基频光进行倍频实现。该方案在一定程度上改进了上述单波长激光加工方法的缺陷，但并未完全突破上述问题的制约。
现有技术中，《多波长激光加工装置》中提到的多波长激光加工装置，包括发射不同波长激光的多波长激光器、激光加工系统和激光合束装置；激光加工系统包括振镜组件，振镜组件包括扫描振镜和聚焦镜；激光合束装置包括第一色散补偿组件、第二色散补偿组件、第一反射镜、第二反射镜和第一多色合束镜；第一色散补偿组件包括第一直角镜和供第一种波长激光经过的第一棱镜；第二色散补偿组件包括第二直角镜和供第二种波长激光经过的第二棱镜；第一反射镜反射色散补偿后的第一种波长激光并与被色散补偿后的第二种波长激光在第一多色合束镜合束，合束后的激光由第二反射镜反射进入扫描振镜经由聚焦镜聚焦后加工工件。由于没有光程差与群延迟探测器，无法改变各个波长激光的相对时延，无法对材料进行高精度加工。使用的三种波长（红光、绿光、紫光）固定不变，难以适应不同材料的吸收特性（CN112091416A）。
 发明内容
据此，本发明提出的一种多波长非线性飞秒激光加工方法，可以有效克服上述问题。使用多个不同输出波长的飞秒光纤激光器作为加工光源，并通过对各路激光进行时域调控，实现加工材料种类及材料加工精度、速度、深度、质量的提升。
本发明的目的至少通过如下技术方案之一实现。
一种多波长非线性飞秒激光加工方法，包括以下步骤：
S1、使用一组高功率飞秒激光器产生多路至少包括两个不同波长的高功率飞秒激光；
S2、使步骤S1中得到的各路高功率飞秒激光分别经一对角度可调的薄膜反射镜，然后使用合束镜对各路反射光进行合束；
S3、使步骤S2中得到的经过合束后的光束入射分束镜，用于将各路高功率飞秒激光分为信号光和闲置光两路；
S4、使步骤S3中得到的信号光入射光电探测器，将光信号转为电信号，然后通过光程差与群延迟探测器，进而对薄膜反射镜对进行调控，控制各路高功率飞秒激光的光程差与群时延，对步骤S3中的闲置光进行调节；
S5、使经过步骤S4调节的闲置光通过光束聚焦模组，聚焦后的激光垂直照射至待加工样品的上表面，通过各路飞秒激光对加工样品的不同作用效果，实现对非线性温度场进行调控，最终完成加工。
进一步地，步骤S1中，所述一组高功率飞秒激光器包括两个或两个以上的可输出不同波长的高功率飞秒激光器，用于产生多路至少包括两个不同波长的高功率飞秒激光。
进一步地，各个高功率飞秒激光器输出的高功率飞秒激光重复频率一致，输出功率可调。
进一步地，步骤S4中，在所述光电探测器将各路信号光信号转为电信号后，光程差与群延迟探测器探测各路高功率飞秒激光之间的相对时延并计算出光程差，进而调整各个薄膜反射镜对的倾斜角，对各路高功率飞秒激光的光程差进行补偿，实现对闲置光的时域调节；
经过调节后，根据实际应用场景，精确分配各路激光作用在样品表面的时间，精确度达到fs量级。
进一步地，步骤S5中，所述光束聚焦模组固定在三维位移调整架上，构成三维位移聚焦模块，用于改变光束焦点与待加工样品表面的相对位置，调节待加工样品表面的光斑大小，适应不同待加工样品的加工需求。
进一步地，步骤S5中，所述温度场指的是经过光束聚焦模组聚焦后的激光照射在待加工样品处的局部温度场，所述非线性指的是待加工样品在温度上升期间，升温方式为非线性升温。
进一步地，步骤S5中，对非线性温度场进行调控的方式包括改变各个高功率飞秒激光器的输出功率。
进一步地，步骤S5中，对非线性温度场进行调控的方式包括通过光程差与群延迟控制模块控制不同高功率飞秒激光器发出的高功率飞秒激光的光程差与群延迟。
进一步地，步骤S5中，对非线性温度场进行调控的方式包括通过三维位移聚焦模块控制出射激光在待加工样品表面的作用面积。
一种多波长非线性飞秒激光加工系统，包括一组高功率飞秒激光器、一个光程差与群延迟控制模块和一个三维位移聚焦模块；
所述一组高功率飞秒激光器，包括两个或两个以上的可输出不同波长的高功率飞秒激光器；
所述光程差与群延迟控制模块包括两组角度可调的薄膜反射镜、一组合束镜、一个分束镜、一个光电探测器和一个光程差与群延迟控制器；
所述三维位移聚焦模块包括一个光束聚焦模组和一个三维位移调整架；
其中，一组高功率飞秒激光器产生多路至少包括两个不同波长的高功率飞秒激光；各路高功率飞秒激光分别经两组角度可调的薄膜反射镜反射后经过合束镜对各路反射光进行合束，得到的经过合束后的光束；经过合束后的光束入射至分束镜，将各路高功率飞秒激光分为信号光和闲置光两路；
信号光入射光电探测器，将光信号转为电信号，然后通过光程差与群延迟探测器，用于实现对薄膜反射镜进行精确调控，控制各路高功率飞秒激光的光程差与群时延，对闲置光进行调节；
经过调节的闲置光通过光束聚焦模组，聚焦后的激光垂直照射至待加工样品的上表面，最终完成加工。
相比于现有技术，本发明的优点在于：
本发明通过使用多个输出不同波长激光的高功率飞秒激光器，并采用一系列手段对样品加工区域的温度场进行调控，提升精密加工效率、质量和加工深度，拓展飞秒激光精密加工应用范围。
 附图说明
图1为本发明实施例中一种多波长非线性飞秒激光加工系统的结构示意图；
图2为本发明实施例中单脉冲周期内，不同波长脉冲的一种时序排列示意图；
图3为本发明实施例中单脉冲周期内，使用单波长飞秒激光加工材料的升温曲线示意图；
图4为本发明实施例中单脉冲周期内，使用多波长飞秒激光加工材料的升温曲线示意图；
图5为本发明实施例中整个加工过程中，使用单波长飞秒激光加工材料的升温曲线及使用多波长飞秒激光加工材料的升温曲线对比示意图。
 本发明的实施方式
下面结合附图和具体实施例对本发明的内容作进一步说明。应当理解，此处的具体实施例仅用于解释本发明内容，并不用于限定本发明。
实施例：
一种多波长非线性飞秒激光加工方法，包括以下步骤：
S1、使用一组高功率飞秒激光器产生多路至少包括两个不同波长的高功率飞秒激光；
所述一组高功率飞秒激光器包括两个或两个以上的可输出不同波长的高功率飞秒激光器，用于产生多路至少包括两个不同波长的高功率飞秒激光。
各个高功率飞秒激光器输出的高功率飞秒激光重复频率一致，输出功率可调。
S2、使步骤S1中得到的各路高功率飞秒激光分别经一对角度可调的薄膜反射镜，然后使用合束镜对各路反射光进行合束；
S3、使步骤S2中得到的经过合束后的光束入射分束镜，用于将各路高功率飞秒激光分为信号光和闲置光两路；
S4、使步骤S3中得到的信号光入射光电探测器，将光信号转为电信号，然后通过光程差与群延迟探测器，进而对薄膜反射镜对进行调控，控制各路高功率飞秒激光的光程差与群时延，对步骤S3中的闲置光进行调节；
在所述光电探测器将各路信号光信号转为电信号后，光程差与群延迟探测器探测各路高功率飞秒激光之间的相对时延并计算出光程差，进而调整各个薄膜反射镜对的倾斜角，对各路高功率飞秒激光的光程差进行补偿，实现对闲置光的时域调节；
经过调节后，根据实际应用场景，精确分配各路激光作用在样品表面的时间，精确度达到fs量级。
S5、使经过步骤S4调节的闲置光通过光束聚焦模组，聚焦后的激光垂直照射至待加工样品的上表面，通过各路飞秒激光对加工样品的不同作用效果，实现对非线性温度场进行调控，最终完成加工。
所述光束聚焦模组固定在三维位移调整架上，构成三维位移聚焦模块，用于改变光束焦点与待加工样品表面的相对位置，调节待加工样品表面的光斑大小，适应不同待加工样品的加工需求。
所述温度场指的是经过光束聚焦模组聚焦后的激光照射在待加工样品处的局部温度场，所述非线性指的是待加工样品在温度上升期间，升温方式为非线性升温。
对非线性温度场进行调控的方式包括改变各个高功率飞秒激光器的输出功率。
对非线性温度场进行调控的方式包括通过光程差与群延迟控制模块控制不同高功率飞秒激光器发出的高功率飞秒激光的光程差与群延迟。
对非线性温度场进行调控的方式包括通过三维位移聚焦模块控制出射激光在待加工样品表面的作用面积。
本实施例中，以加工石英晶体为例，一种多波长非线性飞秒激光加工系统，如图1所示，包括一组高功率飞秒激光器A、一个光程差与群延迟控制模块B和一个三维位移聚焦模块C；
所述一组高功率飞秒激光器A，包括两个或两个以上的可输出不同波长的高功率飞秒激光器，A 1，A 2，……，A n为n个各高功率飞秒激光器，n≥2；
所述光程差与群延迟控制模块包括两组角度可调的薄膜反射镜、一组合束镜、一个分束镜B 4、一个光电探测器B 5和一个光程差与群延迟控制器B 6；B 11，B 12，……，B 1n为第一组n个角度电控可调的薄膜反射镜，n≥2；B 21，B 22，……，B 2n为第二组n个角度电控可调的薄膜反射镜；B 31，B 32，……，B 3n为n个合束镜；
所述三维位移聚焦模块C包括一个平面反射镜C 1、一个光束聚焦模组C 2、一个三维位移调整架C 3和待加工样品C 4；
所述一组高功率飞秒激光器中，根据石英晶体的吸收谱线、熔沸点等特性，选择一台高功率1.0μm波长飞秒光纤激光器和一台高功率2.0μm波长飞秒激光器分别作为第一高功率飞秒激光器A 1和第一高功率飞秒激光器A 2；其中，第一高功率飞秒激光器A 1的输出功率为1000W，重复频率为1GHz，脉冲宽度为300fs；第二高功率飞秒激光器A 2的输出功率为200W，重复频率为1GHz，脉冲宽度为200fs。
第一高功率飞秒激光器A 1入射光程差与群延迟控制模块B，依次经过角度电控可调的第一薄膜反射镜B 11、B 21以及对1.0μm激光有高透过率且对2.0μm激光有高反射率的第一合束镜B 31；第二高功率飞秒激光器A 2输出的激光分别经过角度电控可调的第二薄膜反射镜B 12、B 22、对2.0μm激光有高反射率的第二合束镜B 32和对1.0μm激光有高透过率且对2.0μm激光有高反射率的第一合束镜B 31，完成合束后，得到的经过合束后的光束入射至分束镜B 4。
得到的经过合束后的光束经分束镜B 4分束后，一束激光作为信号光入射光电探测器B 5，随后传输至光程差与群延迟控制器B 6。通过光程差与群延迟控制器B 6输出电控信号，调节角度电控可调的第一薄膜反射镜B 11、B 21和第二薄膜反射镜B 12、B 22，使2.0μm飞秒激光的波前超前1.0μm飞秒激光100fs，两束激光脉冲的时序排列如图2所示，其中，实线表示输出波长2.0μm、重复频率1GHz的飞秒光纤激光的单脉冲能量分布，虚线表示输出波长1.0μm、重复频率1GHz的飞秒光纤激光的单脉冲能量分布。
经分束镜B 4分束的另一束激光作为闲置光入射三维位移聚焦模块C，经过平面反射镜C 1反射后，入射由三维位移调整架C 3控制的光束聚焦模组C 2，以控制加工光束照射在待加工样品C 4上的位置和面积。
参照图3与图4，相比单波长飞秒激光加工方法，采用上述方法对石英晶体进行加工，在单脉冲周期内，待加工材料C 4升温速度更快，升温量更高。
参照图5，其中，上方曲线代表使用单波长飞秒激光加工材料的升温曲线，下方曲线代表使用多波长飞秒激光加工材料的升温曲线；相比单波长飞秒激光加工方法，采用上述方法对石英晶体进行加工，在整个加工过程中，待加工材料C 4温度满足加工条件更快，进而可以有效减少因加工时间较长而引起的热损伤、能量消耗等问题。
应当理解的是，本发明的核心创新点在于：使用多个（两个或两个以上）可输出不同波长的高功率飞秒激光器，通过调节各个激光脉冲的能量和时序，对待加工材料的升温过程予以非线性调控，达到减少能耗、提升加工速度与精度等目的。
实施例2：
本实施例中，以加工Mini LED晶圆为例，根据Mini LED的特性，选择一路中心波长1030nm、平均功率1W、重复频率100kHz、脉冲宽度300fs的飞秒激光，另一路中心波长532nm、平均功率500mW、重复频率100kHz、脉冲宽度500fs的飞秒激光进行加工。第一路激光与第二路激光的相对时延为200fs。相比单路同参数的飞秒激光，待加工材料产生的热损伤更小，Mini Led切口表面更光滑，加工效果更好。
实施例3：
本实施例中，以加工铜片为例，根据铜片的吸收反射率曲线，选择一路中心波长532nm、平均功率30W、重复频率1kHz、脉冲宽度800fs的飞秒激光，另一路中心波长355nm、平均功率30W、重复频率1kHz、脉冲宽度300fs的飞秒激光进行加工。第一路激光与第二路激光的相对时延为300fs。相比单路同参数的飞秒激光，待加工材料产生的热损伤更小，铜片切口表面更光滑，加工效果更好，加工效率更高。
本实施例的提出及具体数据的呈现仅为对本专业技术人员提供更清晰直观的理解，对本发明而言仅仅是说明性的，而非限制性的。在本发明权利要求所限定的精神和范围内可对其进行许多改变、修改，但都将落入本发明的保护范围。

Claims (10)

  1. 一种多波长非线性飞秒激光加工方法，其特征在于，包括以下步骤：
    S1、使用一组高功率飞秒激光器产生多路至少包括两个不同波长的高功率飞秒激光；
    S2、使步骤S1中得到的各路高功率飞秒激光分别经一对角度可调的薄膜反射镜，然后使用合束镜对各路反射光进行合束；
    S3、使步骤S2中得到的经过合束后的光束入射分束镜，用于将各路高功率飞秒激光分为信号光和闲置光两路；
    S4、使步骤S3中得到的信号光入射光电探测器，将光信号转为电信号，然后通过光程差与群延迟探测器，进而对薄膜反射镜对进行调控，控制各路高功率飞秒激光的光程差与群时延，对步骤S3中的闲置光进行调节；
    S5、使经过步骤S4调节的闲置光通过光束聚焦模组，聚焦后的激光垂直照射至待加工样品的上表面，通过各路飞秒激光对加工样品的不同作用效果，实现对非线性温度场进行调控，最终完成加工。
  2. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S1中，所述一组高功率飞秒激光器包括两个或两个以上的可输出不同波长的高功率飞秒激光器，用于产生多路至少包括两个不同波长的高功率飞秒激光。
  3. 根据权利要求2所述的一种多波长非线性飞秒激光加工方法，其特征在于，各个高功率飞秒激光器输出的高功率飞秒激光重复频率一致，输出功率可调。
  4. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S4中，在所述光电探测器将各路信号光信号转为电信号后，光程差与群延迟探测器探测各路高功率飞秒激光之间的相对时延并计算出光程差，进而调整各个薄膜反射镜对的倾斜角，对各路高功率飞秒激光的光程差进行补偿，实现对闲置光的时域调节；
    经过调节后，根据实际应用场景，精确分配各路激光作用在样品表面的时间，精确度达到fs量级。
  5. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S5中，所述光束聚焦模组固定在三维位移调整架上，构成三维位移聚焦模块，用于改变光束焦点与待加工样品表面的相对位置，调节待加工样品表面的光斑大小，适应不同待加工样品的加工需求。
  6. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S5中，所述温度场指的是经过光束聚焦模组聚焦后的激光照射在待加工样品处的局部温度场，所述非线性指的是待加工样品在温度上升期间，升温方式为非线性升温。
  7. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S5中，对非线性温度场进行调控的方式包括改变各个高功率飞秒激光器的输出功率。
  8. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S5中，对非线性温度场进行调控的方式包括通过光程差与群延迟控制模块控制不同高功率飞秒激光器发出的高功率飞秒激光的光程差与群延迟。
  9. 根据权利要求1所述的一种多波长非线性飞秒激光加工方法，其特征在于，步骤S5中，对非线性温度场进行调控的方式包括通过三维位移聚焦模块控制出射激光在待加工样品表面的作用面积。
  10. 一种多波长非线性飞秒激光加工系统，其特征在于，包括一组高功率飞秒激光器、一个光程差与群延迟控制模块和一个三维位移聚焦模块；
    所述一组高功率飞秒激光器，包括两个或两个以上的可输出不同波长的高功率飞秒激光器；
    所述光程差与群延迟控制模块包括两组角度可调的薄膜反射镜、一组合束镜、一个分束镜、一个光电探测器和一个光程差与群延迟控制器；
    所述三维位移聚焦模块包括一个光束聚焦模组和一个三维位移调整架；
    其中，一组高功率飞秒激光器产生多路至少包括两个不同波长的高功率飞秒激光；各路高功率飞秒激光分别经两组角度可调的薄膜反射镜反射后经过合束镜对各路反射光进行合束，得到的经过合束后的光束；经过合束后的光束入射至分束镜，将各路高功率飞秒激光分为信号光和闲置光两路；
    信号光入射光电探测器，将光信号转为电信号，然后通过光程差与群延迟探测器，用于实现对薄膜反射镜进行精确调控，控制各路高功率飞秒激光的光程差与群时延，对闲置光进行调节；
    经过调节的闲置光通过光束聚焦模组，聚焦后的激光垂直照射至待加工样品的上表面，最终完成加工。
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