WO2025006092A1

WO2025006092A1 - Laser bonding of glass to material

Info

Publication number: WO2025006092A1
Application number: PCT/US2024/030684
Authority: WO
Inventors: Jason Roy GRENIER; Kristopher Allen WIELAND; Zheng XIONG
Original assignee: Corning Inc
Current assignee: Corning Inc
Priority date: 2023-06-26
Filing date: 2024-05-23
Publication date: 2025-01-02
Anticipated expiration: 2025-12-26
Also published as: CN121586697A; TW202517598A; KR20260028083A

Abstract

A method of bonding glass to a material includes contacting a first surface of a glass substrate with a first surface of a layer to create a contact location between the glass substrate and the layer; disposing an optical element optically upstream of the glass substrate; and conducting a welding step by directing a laser beam on the optical element such that the laser beam contacts the optical element, passes through the glass substrate at an oblique angle relative to the glass substrate, and contacts the contact location to bond the glass substrate to the layer. Directing the laser beam on the optical element imparts an optical element wavefront aberration effect. Passing the laser beam through the glass substrate imparts a substrate wavefront aberration effect. The optical element wavefront aberration effect counteracts the substrate wavefront aberration effect.

Description

LASER BONDING OF GLASS TO MATERIAL

[0001] This application claims the benefit of priority under 35 U.S.C §120 of U.S. Provisional Application Serial No. 63/523,196 filed on June 26, 2023, the content of which is relied upon and incorporated herein by reference in its entirety.

Field

[0002] The present specification generally relates to glass bonded to a material and, in particular, to laser bonding of glass to a material at an oblique angle.

Technical Background

[0003] Laser bonding glass to a material can have several commercial uses, such as, e.g., the creation of hermetically bonded glass packages. Hermetically bonded glass packages are increasingly popular for application to electronics and other devices that may benefit from a hermetic environment for sustained operation. In consumer electronics applications, desirable properties of a hermetically bonded glass package, may require laser bonding at an oblique angle. However, when a laser enters glass at an oblique angle (i.e., a non-normal angle of incidence), the laser beam may suffer an optical aberration, which may result in unsuccessful bonding.

[0004] Accordingly, a need exists for an alternative method of laser bonding glass to a material at an oblique angle.

SUMMARY

[0005] According to a first aspect Al, a method of bonding glass to a material may comprise: contacting a first surface of a glass substrate with a first surface of a layer to create a contact location between at least a portion of the first surface of the glass substrate and the first surface of the layer, the glass substrate comprising a second surface opposing the first surface of the glass substrate; disposing an optical element optically upstream of the glass substrate; and conducting a first welding step by directing a laser beam on the optical element such that the laser beam contacts the optical element, passes through the glass substrate at a first oblique angle relative to the second surface of the glass substrate, and contacts at least a portion of the contact location to bond the first surface of the glass substrate to the first surface of the layer, wherein: directing the laser beam on the optical element imparts an optical element wavefront aberration effect, passing the laser beam through the glass substrate imparts a substrate wavefront aberration effect, and the optical element wavefront aberration effect counteracts the substrate wavefront aberration effect such that a maximum deviation threshold of a cumulative wavefront effect, which is cumulative of the optical element wavefront aberration effect and the substrate wavefront aberration effect, is less than or equal to 0.3 waves.

[0006] A second aspect A2 includes the method according to the first aspect Al, wherein the maximum deviation threshold of the cumulative wavefront effect is a peak-to-valley value of the cumulative wavefront effect and is greater than or equal to 0 waves and less than or equal to 0.3 waves.

[0007] A third aspect A3 includes the method according to the first or second aspects Al or A2, wherein the maximum deviation threshold of the cumulative wavefront effect is less than or equal to 0.26 waves.

[0008] A fourth aspect A4 includes the method according to the first through third aspects Al- A3, wherein the maximum deviation threshold of the cumulative wavefront effect is less than or equal to 0.25 waves.

[0009] A fifth aspect A5 includes the method according to any of the first through fourth aspects A1-A4, wherein the optical element is configured to impart the optical element wavefront aberration effect.

[0010] A sixth aspect A6 includes the method according to any of the first through fifth aspects A1-A5, wherein the optical element comprises a cylindrical lens, a spherical optic, a diffractive optical element, a plane having an oblique planar angle relative to the laser beam, a spatial light modulator, or a combination thereof.

[0011] A seventh aspect A7 includes the method according to the sixth aspect A6, wherein the optical element is the cylindrical lens; the cylindrical lens comprises optical qualities including a lens curvature, a refractive index of a lens material, a lens thickness, a first distance between the cylindrical lens and the second surface of the glass substrate, and a second distance between the cylindrical lens and a source of the laser beam; and at least one of the optical qualities is configured to cause the optical element to impart the optical element wavefront aberration effect.

[0012] An eigth aspect A8 includes the method according to the seventh aspect A7, wherein the curvature of the cylindrical lens is greater than or equal to 0.0019 mm'¹ and less than or equal to 2.0000 mm'¹.

[0013] A ninth aspect A9 includes the method according to the seventh aspect A7 or the eight aspect A8, wherein the first distance is greater than or equal to 30 mm and less than or equal to 40 mm.

[0014] A tenth aspect A10 includes the method according to any of the seventh through ninth aspects A7-A9, wherein the second distance is greater than or equal to 35 mm and less than or equal to 45 mm.

[0015] An eleventh aspect Al l includes the method according to any of the first through tenth aspects A1-A10, wherein the directing the laser beam at the optical element comprises the laser beam passing through the optical element.

[0016] A twelfth aspect Al 2 includes the method according to any of the first through tenth aspects A1-A10, wherein the directing the laser beam at the optical element comprises the laser beam reflecting off of at least a portion of the optical element.

[0017] A thirteenth aspect Al 3 includes the method according to any of the first through twelfth aspects Al -Al 2, wherein the optical element wavefront aberration effect comprises a first vertical astigmatism effect; the substrate wavefront aberration effect comprises a second vertical astigmatism effect; the first vertical astigmatism effect counteracts the second vertical astigmatism effect.

[0018] A fourteenth aspect Al 4 includes the method according to any of the first through thirteenth aspects Al -Al 3, wherein the laser beam comprises a root mean squared beam spot radius, measured at the contact location, greater than or equal to 2.5 pm and less than or equal to 50 pm. [0019] A fifteenth aspect Al 5 includes the method according to the fourteenth aspect Al 4, wherein the laser beam comprises a root mean squared beam spot radius, measured at the contact location, greater than or equal to 5 pm and less than or equal to 7 pm.

[0020] A sixteenth aspect Al 6 includes the method according to any of the first through fifteenth aspects Al -Al 5, wherein the laser beam comprises a root mean squared beam spot radius, measured at the contact location, less than an Airy radius.

[0021] A seventeenth aspect Al 7 includes the method according to any of the first through sixteenth aspects Al -Al 6, wherein further comprising, prior to conducting the first welding step, disposing an optical flat optically upstream of the glass substrate, a first surface of the optical flat forming optical contact with the second surface of the glass substrate, the optical flat further comprising a second surface, wherein, during the first welding step, the laser beam passes through the optical flat.

[0022] An eighteenth aspect Al 8 includes the method according to the seventeenth aspect Al 7, wherein the laser beam passes through the second surface of the optical flat at a second oblique angle.

[0023] A nineteenth aspect Al 9 includes the method according to the eighteenth aspect Al 8, wherein laser beam passing through the second surface of the optical flat further imparts the substrate wavefront aberration effect.

[0024] A twentieth aspect A20 includes the method according to any of the seventeenth through nineteenth aspects Al 7-Al 9, wherein the optical flat comprises an optical flat refractive index and wherein the glass substrate comprises a substrate refractive index.

[0025] A twenty-first aspect A21 includes the method according to the twentieth aspect A20, wherein the optical flat refractive index is less than the glass substrate refractive index.

[0026] A twenty-second aspect A22 includes the method according to any of the seventeenth through twenty-first aspects A17-A21, wherein the first surface of the optical flat and the second surface of the glass substrate form an intermediate angle. [0027] A twenty-third aspect A23 includes the method according to any of the seventeenth through twenty-second aspects A17-A22, wherein the optical flat has a thickness greater than or equal to 10 mm.

[0028] A twenty-fourth aspect A24 includes the method according to any of the first through twenty-third aspects A1-A23, wherein the first oblique angle is greater than or equal to 15 degrees and less than or equal to 45 degrees.

[0029] A twenty-fifth aspect A25 includes the method according to any of the first through twenty-fourth aspects A1-A24, wherein the layer has a thickness greater than or equal to 5 pm and less than or equal to 50 pm.

[0030] A twenty-sixth aspect A26 includes the method according to any of the first through twenty-fifth aspects A1-A25, wherein the layer comprises a metal layer.

[0031] A twenty-seventh aspect A27 includes the method according to the twenty-sixth aspect A26, wherein the metal layer comprises aluminum, aluminum alloys, stainless steel, nickel, nickel alloys, silver, silver alloys, titanium, titanium alloys, tungsten, tungsten alloys, gold, gold alloys, copper, copper alloys, bronze, iron, or a combination thereof.

[0032] A twenty-eigth aspect A28 includes the method according to the twenty-sixth aspect A26, wherein the layer is a metal foil layer having a thickness greater than or equal to 5 pm and 50 pm.

[0033] A twenty-nineteenth aspect A29 includes the method according to any of the first through twenty-fifth aspects A1-A25, wherein the layer comprises a glass layer.

[0034] A thirtieth aspect A30 includes the method according to the twenty-ninth aspect A29, wherein the glass layer comprises a glass or glass-ceramic comprising borate glass, silicoborate glass, phosphate-based glass, silicon carbide glass, soda-lime silicate glass, aluminosilicate glass, alkali-aluminosilicate glass, borosilicate glass, alkali-borosilicate glass, aluminoborosilicate glass, alkali-alumino-borosilicate glass, silicon-dioxide glass, calcium fluoride glass, alkalialuminosilicate glass, or niobium tungsten lanthanum boron glass. [0035] A thirty-first aspect A31 includes the method according to the twenty-ninth aspect A29 or the thirtieth aspect A30, wherein the glass layer has a thickness greater than or equal to 10 mm.

[0036] A thirty-second aspect A32 includes the method according to any of the first through thirty-first aspects A1-A31, wherein the glass substrate is flat, triangular, spherical, non-planar, or a combination thereof.

[0037] A thirty -third aspect A33 includes the method according to any of the first through thirty - second aspects A1-A32, wherein the glass substrate has a thickness greater than or equal to 10 mm.

[0038] A thirty-fourth aspect A34 includes the method according to any of the first through thirty-third aspects A1-A33, wherein the glass substrate comprises a glass or glass-ceramic comprising borate glass, silicoborate glass, phosphate-based glass, silicon carbide glass, soda-lime silicate glass, aluminosilicate glass, alkali-aluminosilicate glass, borosilicate glass, alkali- borosilicate glass, aluminoborosilicate glass, alkali-alumino-borosilicate glass, silicon-dioxide glass, calcium fluoride glass, alkali-aluminosilicate glass, or niobium tungsten lanthanum boron glass.

[0039] A thirty-fifth aspect A35 includes the method according to any of the first through thirtyfourth aspects A1-A34, wherein the glass substrate comprises a refractive index greater than or equal to 1.4 and less than or equal to 2.7.

[0040] Additional features and advantages of the laser bonding methods described herein will be set forth in the detailed description which follows, and in part will be readily apparent to those skilled in the art from that description or recognized by practicing the embodiments described herein, including the detailed description which follows, the claims, as well as the appended drawings.

[0041] It is to be understood that both the foregoing general description and the following detailed description describe various embodiments and are intended to provide an overview or framework for understanding the nature and character of the claimed subject matter. The accompanying drawings are included to provide a further understanding of the various embodiments, and are incorporated into and constitute a part of this specification. The drawings illustrate the various embodiments described herein, and together with the description serve to explain the principles and operations of the claimed subject matter.

BRIEF DESCRIPTION OF THE DRAWINGS

[0042] FIG. l is a flow diagram of a first method of laser bonding glass to a material, according to one or more embodiments shown and described herein;

[0043] FIG. 2 schematically depicts a step of the first method, according to one or more embodiments shown and described herein;

[0044] FIG. 3 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0045] FIG. 4A depicts a table listing notation and an indexing order for Zernike polynomials and their associated effect names, according to one or more embodiments shown and described herein;

[0046] FIG. 4B depicts a table listing aberration effects and associated Zernike coefficients for a substrate wavefront aberration effect, an optical element wavefront aberration effect, and a cumulative wavefront aberration effect, according to one or more embodiments shown and described herein;

[0047] FIG. 5 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0048] FIG. 6 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0049] FIG. 7 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0050] FIG. 8 schematically depicts another step of the first method, according to one or more embodiments shown and described herein; [0051] FIG. 9 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0052] FIG. 10 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0053] FIG. 11 schematically depicts another step of the first method, according to one or more embodiments shown and described herein;

[0054] FIG. 12 is a flow diagram of a second method of laser bonding glass to a material, according to one or more embodiments shown and described herein;

[0055] FIG. 13 schematically depicts a step of the second method, according to one or more embodiments shown and described herein;

[0056] FIG. 14 schematically depicts another step of the second method, according to one or more embodiments shown and described herein;

[0057] FIG. 15 schematically depicts another step of the second method, according to one or more embodiments shown and described herein; and

[0058] FIG. 16 schematically depicts another step of the second method, according to one or more embodiments shown and described herein.

DETAILED DESCRIPTION

[0059] Reference will now be made in detail to various embodiments of methods of laser bonding glass to a material that counteract the aberrative effect of a laser that occurs when the laser enters the glass at an oblique angle relative to the glass. Specifically, the methods of laser bonding glass to a material disclosed herein comprise contacting a first surface of a glass substrate with a first surface of a layer to create a contact location between at least a portion of the first surface of the glass substrate and the first surface of the layer, the glass substrate comprising a second surface opposing the first surface of the glass substrate; disposing an optical element optically upstream of the glass substrate; and conducting a first welding step by directing a laser beam on the optical element such that the laser beam contacts the optical element, passes through the glass substrate at a first oblique angle relative to the second surface of the glass substrate, and contacts on at least a portion of the contact location to bond the first surface of the glass substrate to the first surface of the layer. Directing the laser beam on the optical element imparts an optical element wavefront aberration effect. Passing the laser beam through the glass substrate imparts a substrate wavefront aberration effect. The optical element wavefront aberration effect counteracts the substrate wavefront aberration effect. Various embodiments of laser bonding glass to a material and the articles formed therefrom will be described herein with specific reference to the appended drawings.

[0060] Ranges may be expressed herein as from “about” one particular value, and/or to “about” another particular value. When such a range is expressed, another embodiment includes from the one particular value and/or to the other particular value. Similarly, when values are expressed as approximations, by use of the antecedent “about,” it will be understood that the particular value forms another embodiment. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint, and independently of the other endpoint.

[0061] Directional terms as used herein - for example up, down, right, left, front, back, top, bottom - are made only with reference to the figures as drawn and are not intended to imply absolute orientation.

[0062] Unless otherwise expressly stated, it is in no way intended that any method set forth herein be construed as requiring that its steps be performed in a specific order, nor that with any apparatus specific orientations be required. Accordingly, where a method claim does not actually recite an order to be followed by its steps, or that any apparatus claim does not actually recite an order or orientation to individual components, or it is not otherwise specifically stated in the claims or description that the steps are to be limited to a specific order, or that a specific order or orientation to components of an apparatus is not recited, it is in no way intended that an order or orientation be inferred, in any respect. This holds for any possible non-express basis for interpretation, including: matters of logic with respect to arrangement of steps, operational flow, order of components, or orientation of components; plain meaning derived from grammatical organization or punctuation, and; the number or type of embodiments described in the specification. [0063] As used herein, the singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to “a” component includes aspects having two or more such components, unless the context clearly indicates otherwise.

[0064] As used herein, the phrase “wavefront” refers to the surface of points of equivalent phase of a radiation wave (e.g., the wave of a laser beam). For example, for a point source of a radiation wave at an infinite distance away, the wavefront of the radiation wave would be a plane wave.

[0065] As used herein, the phrases “optical aberration,” “aberration,” “aberrated wavefront,” “wavefront aberration” refer to the deviation of an actual wavefront (as measured on an image point) of a wave (of, e.g., a laser beam) when compared to an “ideal wavefront” (i.e., the wavefront that would result in an ideal imaging system) of the wave. An “ideal wavefront” is the wavefront of a wave that exhibits point-to-point imaging. However, real optical systems produce an imperfect, or “aberrated,” image. Thus, real optical systems produce waves with aberrated wavefronts (due to, e.g., imperfections in optical elements of the optical systems), and therefore optical elements (e.g., lenses, substrates, or other media which are at least partially transparent to the wave and through which the wave passes) of an optical system may impart an individual “optical element wavefront aberration.” In optical systems with multiple optical elements, an end wavefront of the wave may have a “cumulative wavefront aberration,” which is the sum effect of all optical element wavefront aberrations of all optical elements through which the wave passes. The aberration of a wavefront may distort the focus of a beam, and, in the context of laser bonding, the distortion of the focus of a laser beam can, as will be described in further detail below, affect bonding performance of the laser beam. If the distortion is significant enough, the distortion may prevent laser bonding. Wavefront aberrations can be described using various mathematical mechanisms such as the wavefront aberration function and Zernike polynomials, as will be described in further detail below. As will also be described below, in some mathematical modeling mechanisms, a wavefront aberration may be influenced by multiple “aberrative effects,” each of which is a category of wavefront aberration, and a wavefront aberration may comprise at least one aberrative effect and a magnitude associated with each of the at least one aberrative effects.

[0066] “Hermetically bonded” or “hermetically sealed,” as described herein, refers to a package that includes a hermetic seal in accordance with MIL-STD-750E, Test Method 1071.9. [0067] Hermetically bonded glass packages are increasingly popular for application to electronics and other devices that may benefit from a hermetic environment for sustained operation. In consumer electronics applications, desirable properties of a hermetically bonded glass package may require laser bonding at an oblique angle, such as, for example, creating apertures of equal sizes on either side of the glass package. However, when a laser enters glass at an oblique angle (i.e., a non- normal angle of incidence), a wavefront of the laser beam may suffer an optical aberration, causing a deviation from the ideal wavefront of such sufficient magnitude to result in unsuccessful bonding or otherwise limiting the performance of the laser beam in bonding.

[0068] Disclosed herein are methods of laser bonding glass to a material that mitigate the aforementioned problems such that a laser may be directed at an oblique angle of incidence to successfully bond a glass substrate to a material. Specifically, the methods of laser bonding glass to a material disclosed herein comprise disposing an optical element optically upstream of a glass substrate. Directing the laser beam on the optical element imparts an optical element wavefront aberration effect. The optical element wavefront aberration effect counteracts the substrate wavefront aberration effect that occurs when the laser beam passes through the glass substrate such that successful bonding may be achieved.

[0069] Referring now to FIGS. 1 and 2, a method of laser bonding glass to a material 100A begins at block 102 with contacting a first surface 212 of the glass substrate 210 with a first surface 222 of a layer 220 to create a contact location 224 between at least a portion of the first surface 212 of the glass substrate 210 and the first surface 222 of the layer 220. In embodiments, the layer 220 may be in contact with at least a portion of the first surface 212. In other embodiments, the layer 220 may be in contact with an entirety of the first surface 212.

[0070] The first surface 212 of the glass substrate 210 opposes a second surface 214 of the glass substrate 210, such that the first surface 212 (and, thereby, the layer 220) is disposed optically downstream of the second surface 214. In some embodiments, the second surface 214 may comprise a coating. In one or more embodiments, the coating may include a scratch-resistant coating, an easy-to-clean coating, an anti-reflective (“AR”) coating, and/or an abrasion-resistant coating. Examples of scratch-resistant, abrasion-resistant, and AR coatings are described in U.S. Pat. No. 9,335,444, entitled “DURABLE AND SCRATCH-RESISTANT ANTI-REFLECTIVE ARTICLES” filed on May 7, 2015, which is incorporated herein in its entirety by reference. An example of a suitable an easy-to-clean coating is described in U.S. Patent Application Ser. No. 13/690,904 (U.S. Pub. No. 2014/0113083A1), entitled “PROCESS FOR MAKING OF GLASS ARTICLES WITH OPTICAL AND EASY-TO-CLEAN COATINGS” filed on Nov. 30, 2012, which is incorporated herein in its entirety by reference.

[0071] It is noted that the present description and claims refer to disposing of various components “optically downstream” of other various components. This disposing of a first component “optically downstream” of a second component encompasses placement of the first component relative to the second component and a laser (or other radiation-producing device). Accordingly, a laser beam or other radiation-producing device would follow an optical path that travels through both of the first component and the second component such that the second component precedes the first component in the optical path. For example, in FIG. 2, the layer 220 is disposed optically downstream of the glass substrate 210 such that a potential laser beam of the laser 240 would, if activated, pass through the glass substrate 210 before being incident on the first surface 222 of the layer 220.

[0072] In embodiments, the glass substrate 210 may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7. In embodiments, the glass substrate 210 may comprise a refractive index greater than or equal to 1.4, greater than or equal to 1.5, greater than or equal to 1.6, greater than or equal to 1.7, greater than or equal to 1.8, or even greater than or equal to 1.9. In embodiments, the glass substrate 210 may comprise a refractive index less than or equal to 2.7, less than or equal to 2.6, less than or equal to 2.5, less than or equal to 2.4, less than or equal to 2.3, or even less than or equal to 2.2. In embodiments, the glass substrate 210 may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7, greater than or equal to 1.4 and less than or equal to 2.6, greater than or equal to 1.4 and less than or equal to 2.5, greater than or equal to 1.4 and less than or equal to 2.4, greater than or equal to 1.4 and less than or equal to 2.3, greater than or equal to 1.4 and less than or equal to 2.2, greater than or equal to 1.5 and less than or equal to 2.7, greater than or equal to 1.5 and less than or equal to 2.6, greater than or equal to 1.5 and less than or equal to 2.5, greater than or equal to 1.5 and less than or equal to 2.4, greater than or equal to 1.5 and less than or equal to 2.3, greater than or equal to 1.5 and less than or equal to 2.2, greater than or equal to 1.6 and less than or equal to 2.7, greater than or equal to 1.6 and less than or equal to 2.6, greater than or equal to 1.6 and less than or equal to 2.5, greater than or equal to 1.6 and less than or equal to 2.4, greater than or equal to 1.6 and less than or equal to 2.3, greater than or equal to 1.6 and less than or equal to 2.2, greater than or equal to 1.7 and less than or equal to 2.7, greater than or equal to 1.7 and less than or equal to 2.6, greater than or equal to 1.7 and less than or equal to 2.5, greater than or equal to 1.7 and less than or equal to 2.4, greater than or equal to 1.7 and less than or equal to 2.3, greater than or equal to 1.7 and less than or equal to 2.2, greater than or equal to 1.8 and less than or equal to 2.7, greater than or equal to 1.8 and less than or equal to 2.6, greater than or equal to 1.8 and less than or equal to 2.5, greater than or equal to 1.8 and less than or equal to 2.4, greater than or equal to 1.8 and less than or equal to 2.3, greater than or equal to 1.8 and less than or equal to 2.2, greater than or equal to 1.9 and less than or equal to 2.7, greater than or equal to 1.9 and less than or equal to 2.6, greater than or equal to 1.9 and less than or equal to 2.5, greater than or equal to 1.9 and less than or equal to 2.4, greater than or equal to 1.9 and less than or equal to 2.3, or even greater than or equal to 1.9 and less than or equal to 2.2, or any and all sub-ranges formed from any of these endpoints.

[0073] In embodiments, the glass substrate 210 may comprise a glass or a glass-ceramic. By way of non-limiting examples, the glass substrate 210 may comprise borate glass, silicoborate glass, phosphate-based glass, silicon carbide glass, soda-lime silicate glass, aluminosilicate glass, alkali-aluminosilicate glass, borosilicate glass, alkali-borosilicate glass, aluminoborosilicate glass, alkali-alumino-borosilicate glass, silicon-dioxide glass, calcium fluoride, alkali-aluminosilicate glass, or niobium tungsten lanthanum boron glass. In embodiments in which a relatively high refractive index glass (e.g., refractive index greater than or equal to 1.5 and less than or equal to 2.4) is desired, the glass substrate 210 may comprise borate glass, or silicoborate glass, such as the glass described in U.S. Provisional Application Serial Number 63/228,704, which is incorporated by reference herein in its entirety. In embodiments, the glass substrate 210 may be chemically strengthened, chemically tempered, and/or thermally tempered. Non-limiting examples of suitable commercially available glass substrates include EAGLE XG®, Lotus™, Willow®, and Gorilla® glasses from Corning Incorporated, including chemically strengthened, chemically tempered, and/or thermally tempered versions thereof. In embodiments, glasses and glass-ceramics that have been chemically strengthened by ion exchange may be suitable as substrates. In other embodiments, the glass substrate 210 may be a strengthened glass-to-glass laminate. [0074] In embodiments, the glass substrate 210 may be formed from a material that is substantially transparent to a selected wavelength of a laser beam. The term “substantially transparent” means that a wavelength of a laser beam transmits through the material without being substantially absorbed or scattered. For example, in embodiments, a material that is substantially transparent to a wavelength of a laser beam may be a material that exhibits a transmittance greater than or equal to 90% at the wavelength. In embodiments, the glass substrate 210 may be substantially transparent to a wavelength of light greater than or equal to 300 nm and less than or equal to 1100 nm or even greater than or equal to 330 nm and less than or equal to 750 nm.

[0075] In embodiments, the glass substrate 210 may comprise a thickness greater than or equal to 0.1 mm and less than or equal to 100 mm. In embodiments, the glass substrate 210 may comprise a thickness greater than or equal to 0.1 mm, greater than or equal to 1 mm, greater than or equal to 10 mm, or even greater than or equal to 20 mm. In embodiments, the glass substrate 210 may comprise a thickness less than or equal to 100 mm, less than or equal to 75 mm, or even less than or equal to 50 mm. In embodiments, the glass substrate 210 may comprise a thickness greater than or equal to 0.1 mm and less than or equal to 100 mm, greater than or equal to 0.1 mm and less than or equal to 75 mm, greater than or equal to 0.1 mm and less than or equal to 50 mm, greater than or equal to 1 mm and less than or equal to 100 mm, greater than or equal to 1 mm and less than or equal to 75 mm, greater than or equal to 1 mm and less than or equal to 50 mm, greater than or equal to 10 mm and less than or equal to 100 mm, greater than or equal to 10 mm and less than or equal to 75 mm, greater than or equal to 10 mm and less than or equal to 50 mm, greater than or equal to 20 mm and less than or equal to 100 mm, greater than or equal to 20 mm and less than or equal to 75 mm, or even greater than or equal to 20 mm and less than or equal to 50 mm, or any and all sub-ranges formed from any of these endpoints.

[0076] In the embodiment depicted in FIG. 2 (and in the embodiments depicted in subsequent FIGs.) both the first surface 212 and the second surface 214 of the glass substrate 210 are depicted as being substantially flat, with the cross-sectional view of the embodiments of FIGs. 2-10 and FIGs. 12-15 depicting the glass substrate 210 as a substantially rectangular plane. However, in other embodiments, the glass substrate may have a different shape or general geometry, and may instead be, for example, triangular, spherical, non-planar, or a combination thereof. As such, in embodiments, either or both of the first surface 212 and the second surface 214 may not be substantially planar, but may instead be, for example, jagged, non-uniform, arced, or ridged. Similarly, the layer 220 may also comprise a shape or geometry that is, for example, flat, triangular, spherical, non-planar, or a combination thereof, and the first surface 222 may not be substantially planar, but may instead may be, for example, jagged, non-uniform, arced, or ridged.

[0077] In embodiments, the glass substrate 210 may be subjected to surface preparation prior to bonding of the glass substrate 210 to the layer 220. For example, in embodiments, the glass substrate 210 may be polished until the surfaces thereof exhibit comparatively lower surface roughness values, which may enhance bonding. In embodiments, one or both of the first surface 212 and the second surface 214 of the glass substrate 210 may be polished until one or both of the first surface 212 and second surface 214 exhibit an average surface roughness (Ra) less than or equal to 1 pm, less than or equal to 0.5 pm, or even less than or equal to 0.25 pm. The smooth surface may allow either or both of the first surface 212 and the second surface 214 to be placed in close contact with a material (e.g., the layer 220). In addition, the glass substrate 210 may be cleaned with water and/or solvents to remove any debris present on the surface and/or to remove any material (oil, grease, etc.) which may diminish the transparency of the substrates to the desired laser wavelengths. Removal of any debris may allow the glass substrate 210 to be placed in close contact with a material (e.g., the layer 220) to better facilitate laser bonding of the layer 220 to the glass.

[0078] In embodiments, the layer 220 may comprise a thickness less than or equal to 50 pm. In embodiments, the layer 220 may have a thickness greater than or equal to 5 pm and less than or equal to 50 pm. In embodiments, the layer 220 may comprise a thickness greater than or equal to 5 pm, greater than or equal to 10 pm, or even greater than or equal to 20 pm. In embodiments, the layer 220 may comprise a thickness less than or equal to 50 pm, less than or equal to 40 pm, or even less than or equal to 30 pm. In embodiments, the layer 220 may have a thickness greater than or equal to 5 pm and less than or equal to 50 pm, greater than or equal to 5 pm and less than or equal to 40 pm, greater than or equal to 5 pm and less than or equal to 30 pm, greater than or equal to 10 pm and less than or equal to 50 pm, greater than or equal to 10 pm and less than or equal to 40 pm, greater than or equal to 10 pm and less than or equal to 30 pm, greater than or equal to 20 pm and less than or equal to 50 pm, greater than or equal to 20 pm and less than or equal to 40 pm, or even greater than or equal to 20 pm and less than or equal to 30 pm, or any and all sub-ranges formed from any of these endpoints.

[0079] In embodiments, the layer 220 may comprise a metal layer. In such embodiments, the metal layer may comprise aluminum, aluminum alloys, stainless steel, nickel, nickel alloys, silver, silver alloys, titanium, titanium alloys, tungsten, tungsten alloys, gold, gold alloys, copper, copper alloys, bronze, iron, or a combination thereof. In embodiments, the layer 220 may comprise a metal layer in combination with another non-metal material.

[0080] In embodiments, the layer 220 may be a metal foil layer. In such embodiments, the metal foil layer may comprise a thickness less than or equal to 50 pm. In embodiments, the metal foil layer may have a thickness greater than or equal to 5 pm and less than or equal to 50 pm. In embodiments, the metal foil layer may comprise a thickness greater than or equal to 5 pm, greater than or equal to 10 pm, or even greater than or equal to 20 pm. In embodiments, the metal foil layer may comprise a thickness less than or equal to 50 pm, less than or equal to 40 pm, or even less than or equal to 30 pm. In embodiments, the metal foil layer may have a thickness greater than or equal to 5 pm and less than or equal to 50 pm, greater than or equal to 5 pm and less than or equal to 40 pm, greater than or equal to 5 pm and less than or equal to 30 pm, greater than or equal to 10 pm and less than or equal to 50 pm, greater than or equal to 10 pm and less than or equal to 40 pm, greater than or equal to 10 pm and less than or equal to 30 pm, greater than or equal to 20 pm and less than or equal to 50 pm, greater than or equal to 20 pm and less than or equal to 40 pm, or even greater than or equal to 20 pm and less than or equal to 30 pm, or any and all sub-ranges formed from any of these endpoints.

[0081] In other embodiments, the layer 220 may comprise a glass layer. In certain such embodiments, the glass layer may comprise similar or the same materials and/or similar or the same properties as the glass substrate 210.

[0082] In embodiments, the layer 220 may be formed from a material that has a melting point that allows for successful bonding to the glass substrate. In embodiments, the layer 220 may comprise a melting point less than or equal to 1600 °C, less than or equal to 1500 °C, or even less than or equal to 1400 °C. [0083] In embodiments, the layer 220 may be formed from a material that is chemically compatible (i.e., bond readily) to the glass substrate 210. For example, a glass substrate including aluminum may readily bond to an aluminum metal foil.

[0084] In embodiments, the layer 220 may be formed from a material that is substantially opaque to a selected wavelength of a laser beam.

[0085] In embodiments, the layer 220 may have a similar average surface roughness (Ra) as the glass substrate 210 to similarly allow the glass substrate 210 to be placed in close contact with the layer 220.

[0086] Referring back to FIG. 1 and as shown in FIG. 3, the method 100A continues at block 104 with disposing an optical element 230 optically upstream of the glass substrate 210, relative to a laser 240.

[0087] In embodiments, the laser 240 may include a light source and a focusing lens (not pictured). In embodiments, optical qualities of the focusing lens (e.g., a distance from the light source, a lens curvature, a lens thickness, or other optical qualities) may be configured according to optical qualities of the optical element 230, as described in further detail below.

[0088] The optical element 230 is configured to impart a wavefront aberration effect (i.e., the “optical element wavefront aberration effect”). In embodiments, the optical element 230 may comprise any optical device having optical qualities configurable to impart a particular wavefront aberration effect. In embodiments and as will be described in further detail below with reference to FIGs. 4-8, the optical element 230 may comprise an optical device such as a cylindrical lens, a spherical optic, a diffractive optical element, a plane having an oblique planar angle relative to the laser beam, a spatial light modulator, any other physical or geometrical optical element, or a combination thereof (e.g., in embodiments in which the optical element 230 comprises a plurality of optical devices).

[0089] The optical element 230 comprises optical qualities. At least one of the optical qualities of the optical element 230 may be configured to cause the optical element 230 to impart the optical element wavefront aberration effect such that the optical element wavefront aberration effect counteracts a wavefront aberration effect of the glass substrate 210 (i.e., the “substrate wavefront aberration effect”). Additionally, a distance between the optical element 230 and the laser 240 and/or the second surface 214 may also be configured to cause the optical element 230 to impart, separately from or in combination with optical qualities of the optical element 230, the optical element wavefront aberration effect such that the optical element wavefront aberration effect counteracts a wavefront aberration effect of the glass substrate 210.

[0090] Configuring the optical element 230 to impart a wavefront aberration effect such that the optical element wavefront aberration effect counteracts the substrate wavefront aberration effect requires having a mathematical representation of the substrate wavefront aberration effect, which, in turn, may require (e.g., to calculate the mathematical representation of the substrate wavefront aberration effect) measuring the wavefront of a laser beam passed through the glass substrate 210 at an angle of incidence (relative to the glass substrate 210) desired for welding. By creating a mathematical representation of a first wavefront aberration effect (e.g., the substrate wavefront aberration effect), the optical qualities of an optical element (e.g., the optical element 230) may be configured to impart a second wavefront aberration effect (e.g., the optical element wavefront aberration effect) that counteracts the first wavefront aberration.

[0091] It is noted that the present description and claims refer to various wavefront aberration effects “counteracting” one another. A first wavefront aberration effect “counteracting” a second wavefront aberration effect encompasses the first wavefront aberration effect at least reducing the deviation from an ideal wavefront caused by the second wavefront aberration effect. The deviation may be reduced to a degree that results in a cumulative wavefront aberration effect (i.e., the sum effect of the first wavefront aberration effect and the second wavefront aberration effect) having a deviation magnitude from the ideal wavefront of less than a maximum deviation magnitude threshold of an optical system of the first wavefront aberration effect and the second wavefront aberration effect. The maximum deviation magnitude threshold of the optical system may vary depending on the optical system. In the context of laser bonding glass to a material, the maximum deviation magnitude threshold indicates a maximum value (as calculated or represented by a mathematical representation of a wavefront) for a deviation of a wavefront of a laser bonding the glass to the material, where any deviation exceeding the maximum deviation value is insufficient for laser bonding (by lacking sufficient focus to sufficiently bond glass to a material due to, e.g., requiring too much time, not providing a hermetic seal, or not providing sufficient heat). [0092] One mathematical representation of a wavefront comprises Zernike polynomials (also described as, e.g., Zernike terms). Zernike polynomials, as described in Zernike Polynomials: A Guide (Lakshminarayan & Fleck; Journal of Modem Optics, April 2011), which is incorporated by reference herein, are, specifically, an infinite series of polynomials which may be applied to mathematically describe a three-dimensional wavefront deviation from what can be constructed as a plane (i.e., a unit circle) of a zero mean of the wavefront, defined as a surface for which the sum of deviations on either side (i.e., of positive and negative values) equals zero. Each polynomial of the series of Zernike polynomials describes a specific form of surface deviation, and each polynomial has a coefficient describing the magnitude of the polynomial in terms of the root mean square wavefront error attributable to that polynomial. The combined sum of the Zernike polynomials (and the form of surface deviation corresponding to each) can produce a large number of more complex surface shapes, and each surface shape can be fit to specific forms of wavefront deviations (i.e., deviations caused by different types of wavefront aberration effects). In principle, by including a sufficient number of Zernike polynomials in a mathematical representation of a wavefront or of a wavefront aberration effect, any wavefront deformation can be described to a desired degree of accuracy. Zernike polynomials may be applied to a specific wavefront shape, and, in doing so, the polynomials are reduced to a necessary or desired number of polynomials (as determined by, e.g., a desired or necessary level of precision of the resulting mathematical description of the wavefront) in order to determine the main forms of contributing deviations (i.e., the polynomial(s) having coefficients of the greatest magnitude).

[0093] As described hereinabove, each polynomial in the series of Zernike polynomials describes a specific form of surface deviation, and the coefficient of each polynomial describes a magnitude of each form of surface deviation. As such, each sequential Zernike polynomial describes a different type of aberrative effect (the cumulative aberrative effects collectively describing, e.g., the substrate wavefront effect), and the coefficient of each polynomial describes the degree to which that type of aberrative effect is present in a measured wavefront. For example, a coefficient of a first Zernike polynomial may describe the degree of a piston aberrative effect on the measured wavefront, a coefficient of a second Zernike polynomial may describe the degree of a horizontal tilt aberrative effect on the measured wavefront, a coefficient of a third Zernike polynomial may describe the degree of a vertical tilt aberrative effect on the measured wavefront, a coefficient of a fourth Zernike polynomial may describe the degree of a defocus aberrative effect on the measured wavefront, a coefficient of a fifth Zernike polynomial may describe the degree of an oblique astigmatism aberrative effect on the measured wavefront, a coefficient of a sixth Zernike polynomial may describe the degree of a vertical astigmatism aberrative effect on the measured wavefront, a coefficient of a seventh Zernike polynomial may describe the degree of a vertical coma aberrative effect on the measured wavefront, a coefficient of an eighth Zernike polynomial may describe the degree of a horizontal coma aberrative effect on the measured wavefront, and coefficients of further Zernike polynomials may describe the degree of further aberrative effects on the measured wavefront. A coefficient of a larger magnitude thereby indicates a greater contribution of the particular type of aberrative effect described by the polynomial of the coefficient to the total deviation of the measured wavefront from an ideal wavefront as a result of the totality of a wavefront aberration effect (e.g., the substrate wavefront aberration effect).

[0094] FIG. 4A depicts a table 410 detailing, in column 415, effect names ordered according to, in column 412, an exemplary indexing mechanism (in this table, the Noll Index, although other indices may be used). Columns 413 and 414 depict the radial degree and azimuthal degree, respectfully, of each effect, and the column 411 depicts notation for referencing the particular Zernike polynomial associated with the effect.

[0095] When using Zernike polynomials to describe the deviation of a measured wavefront from an ideal wavefront, the deviation may be measured in the difference (in terms of a number of waves, as determined by a wavelength of the wave of which the wavefront is measured) between a peak and valley of the measured wavefront (i.e., a “peak-to-valley value”). The peak-to- valley value of a measured wavefront may be calculated using coefficients of Zernike polynomial in the below formula:

where o is the peak-to-valley value, N is the number of measured Zernike polynomials, j is the sequential number of each Zernike polynomial, and C is the coefficient of the respective Zernike polynomial. The first three Zernike polynomials (i.e., j=0, j=l, and j=2) are ignored, as the aberrative effects described by each (i.e., the piston, horizontal tilt, and vertical tilt aberrative effects) may be attributed to the position and orientation of the source of the wave of the measured wavefront.

[0096] Zernike coefficients (i.e., coefficients of respective Zernike polynomials) may be determined by measuring a wavefront (e.g., a wavefront that has undergone a wavefront aberration effect). A wavefront aberration effect may be measured by a sensor, such as a Shack Hartmann wavefront sensor, an interferometer, an interferometric wavefront sensor, or another wavefront sensor.

[0097] Referring back to FIG. 3, optical qualities of the optical element 230 may be configured to cause the optical element 230 to impart an optical element wavefront aberration effect that “counteracts” the substrate wavefront aberration effect by configuring the optical element wavefront aberration effect to have Zernike coefficients that, when summed with Zernike coefficients of the substrate wavefront aberration effect, result in a cumulative wavefront aberration effect (i.e., a wavefront aberration effect comprising the optical element wavefront effect and the substrate wavefront effect) for which the peak-to-valley value of the resulting wavefront is less than a maximum deviation magnitude threshold. Because the optical element 230 is upstream of the glass substrate 210, the optical element 230 may be considered to impart an optical element wavefront aberration effect that “pre-compensates” for the substrate wavefront aberration effect when the optical element wavefront aberration effect “counteracts” the substrate wavefront aberration effect. Changing any optical quality of the optical element 230, or changing several optical qualities of the optical element 230, may affect the optical element wavefront aberration effect. Accordingly, at least one optical quality of the optical element 230 may be chosen to result in an optical element wavefront aberration effect that counteracts the substrate wavefront aberration effect.

[0098] To counteract the substrate wavefront aberration effect, the optical element wavefront effect need not reduce (i.e., bring an absolute value closer to 0 when summing the optical element wavefront aberration effect Zernike coefficient and a respective substrate wavefront aberration effect Zernike coefficient) every Zernike coefficient of the substrate wavefront aberration effect. Rather, in certain embodiments and depending on the magnitude of each Zernike coefficient of the substrate wavefront aberration effect, merely reducing, with the optical element wavefront aberration effect, one Zernike coefficient (if reduced by a sufficiently significant degree) of the substrate wavefront aberration effect may suffice to counteract the substrate wavefront aberration effect. While the substrate wavefront aberration effect may comprise nonzero values for a plurality of Zernike coefficients, the peak-to- valley value of a wavefront aberration effect (e.g. the cumulative wavefront aberration effect) is the result of a combination as a function of the Zernike coefficients of the wavefront aberration effect, and so merely reducing a combination of the cumulative Zernike coefficients below a threshold value may, in some embodiments, be sufficient for laser bonding. As such, in embodiments, the optical qualities of the optical element 230 may be configured to only impart (substantially or entirely) aberrative effects described by certain Zernike polynomials to, e.g., address only the Zernike coefficients of the substrate wavefront aberration effect of the greatest magnitude.

[0099] For example, referring to FIG. 4B, a table 420 depicts an embodiment wherein the optical element wavefront aberration effect comprises several aberrative effects including a first vertical astigmatism effect (as identified in a column 422), and the substrate wavefront aberration effect comprises several aberrative effects including a second vertical astigmatism effect. The first vertical astigmatism effect merely substantially reciprocates (i.e., reduce an absolute value of a Zernike coefficient corresponding to the second vertical astigmatism effect) the second vertical astigmatism effect, and thereby counteracts the substrate wavefront aberration effect despite not reciprocating other (much smaller in magnitude) aberrative effects. This can be seen in the table 420 by comparing values between columns 423 and 424, resulting in a cumulative wavefront effect, as seen in column 425, with a vertical astigmatism coefficient closer to 0 (i.e., closer to an ideal wavefront, with respect to the vertical astigmatism aberration effect). Despite the substrate wavefront effect comprising further aberrative effects (i.e., a defocus aberration and a vertical coma aberration), since the predominant aberrative effect of the substrate wavefront effect is the vertical stigmatism aberrative effect, the optical element may counteract the substrate wavefront aberration effect by merely isolating an inverse vertical astigmatism effect rather than by reciprocating each aberrative effect of the substrate wavefront aberration effect.

[00100] Individual Zernike coefficients of a first wavefront aberration effect (e.g., the optical element wavefront aberration effect) and of a second wavefront aberration effect (e.g., the 1 substrate wavefront aberration effect) are described herein as “correspond to” one another. As described herein, a Zernike coefficient of a first wavefront aberration effect corresponds to a Zernike coefficient of a second wavefront aberration effect if each Zernike coefficient is associated with the same aberrative effect. For example, referring again to FIG. 4B, the Zernike coefficients of columns 423 and 433 associated with the vertical astigmatism aberrative effect correspond to each other. As such, a Zernike coefficient of a first wavefront aberration effect corresponds to a Zernike coefficient of a second wavefront aberration effect if each coefficient is associated with the same aberrative effect (e.g., vertical astigmatism).

[00101] In embodiments, the maximum deviation magnitude threshold of a cumulative wavefront aberration effect comprises a peak-to-valley value of less than or equal to 0.3 waves, less than or equal to 0.26 waves, less than or equal to 0.25 waves, less than or equal to 0.20 waves, less than or equal to 0.18 waves, less than or equal to 0.16 waves, less than or equal to 0.14 waves, less than or equal to 0.12 waves, less than or equal to 0.10 waves, less than or equal to 0.08 waves, less than or equal to 0.04 waves less than or equal to 0.02 waves (wherein the cumulative wavefront aberration effect is cumulative of the optical element wavefront aberration effect and the substrate wavefront aberration effect, as discussed above). In other embodiments, a different maximum deviation magnitude threshold of a cumulative wavefront aberration effect may comprise a different peak-to-valley value, and the maximum deviation magnitude threshold may be determined by the contents, the use, and/or other contextual factors of an optical system in which the wave of the cumulative wavefront aberration is used.

[00102] Another mechanism for measuring a wavefront aberration effect may be measuring a root mean squared beam spot radius of a laser beam. For example, the substrate wavefront aberration effect may increase the size of a laser beam’s root mean squared beam spot radius (as measured at, e.g., the contact location 224), and the optical element wavefront aberration effect may result in a cumulative aberration effect wherein the root mean squared beam spot radius, when measured at, e.g., the contact location 224, is below a maximum deviation magnitude threshold. In some embodiments, the maximum deviation magnitude threshold may be such that the root mean squared beam spot radius, measured at the contact location 224, may be below 50 pm. In some embodiments, the maximum deviation magnitude threshold may be such that the root mean squared beam spot radius, measured at the contact location 224, may be below 25 pm. In some embodiments, the maximum deviation magnitude threshold may be such that the root mean squared beam spot radius, measured at the contact location 224, may be below 7 pm. Accordingly, in some embodiments, the root mean squared beam spot radius, measured at the contact location 224, may be between 2.5 pm and 25 pm, and, in other embodiments, the root mean squared beam spot radius, measured at the contact location 224, may be between 5 pm and 7 pm.

[00103] In some embodiments, the maximum deviation magnitude threshold may be measured as a function of an Airy disc of an optical system of the laser beam. In embodiments comprising an optical system using a Gaussian beam, an Airy disk of the optical system may be determined by the following formula:

where a is an Airy radius of the Airy disk, A is a wavelength of the laser beam, and D is an (effective) aperture diameter of the optical system. In some embodiments, the maximum deviation magnitude threshold may be such that the root mean squared beam spot radius, measured at the contact location 224, must be less than the Airy radius. In embodiments comprising an optical system using a non-Gaussian beam, another formula may be used to determine an Airy disk of the optical system.

[00104] As described above, the optical element 230 may comprise one of several types of optical elements. Referring to FIG. 5, in this embodiment, the optical element 230 comprises a cylindrical lens 230A. The cylindrical lens 230A comprises optical qualities including a lens curvature 232A, a lens thickness 234A (i.e., the distance from a front of the cylindrical lens 230A to a back of the cylindrical lens 230A), a refractive index of a lens material of the cylindrical lens 230A, a first distance 236A between the cylindrical lens 230 A and the second surface 214 of the glass substrate 210, and a second distance 238A between the cylindrical lens 230A and the laser 240. To impart an optical element wavefront aberration effect which counteracts the substrate wavefront aberration effect, at least one optical quality of the cylindrical lens 230A may be configured to cause the cylindrical lens 230A to impart the optical element wavefront aberration effect. In embodiments, any optical quality of the cylindrical lens 230A may be configured to impart an optical element wavefront aberration effect that counteracts the substrate wavefront effect. [00105] In embodiments, the refractive index of the lens material of the cylindrical lens 230A may comprise a refractive index greater than or equal to 1.4. In embodiments, the refractive index of the lens material may comprise a refractive index less than or equal to 2.7. In embodiments, the refractive index of the lens material may comprise a refractive index greater than or equal to

1.4 and less than or equal to 2.7. In embodiments, the lens material may comprise a refractive index greater than or equal to 1.4, greater than or equal to 1.5, greater than or equal to 1.6, greater than or equal to 1.7, greater than or equal to 1.8, or even greater than or equal to 1.9. In embodiments, the lens material may comprise a refractive index less than or equal to 2.7, less than or equal to 2.6, less than or equal to 2.5, less than or equal to 2.4, less than or equal to 2.3, or even less than or equal to 2.2. In embodiments, the lens material may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7, greater than or equal to 1.4 and less than or equal to 2.6, greater than or equal to 1.4 and less than or equal to 2.5, greater than or equal to 1.4 and less than or equal to 2.4, greater than or equal to 1.4 and less than or equal to 2.3, greater than or equal to 1.4 and less than or equal to 2.2, greater than or equal to 1.5 and less than or equal to 2.7, greater than or equal to 1.5 and less than or equal to 2.6, greater than or equal to 1.5 and less than or equal to 2.5, greater than or equal to 1.5 and less than or equal to 2.4, greater than or equal to

1.5 and less than or equal to 2.3, greater than or equal to 1.5 and less than or equal to 2.2, greater than or equal to 1.6 and less than or equal to 2.7, greater than or equal to 1.6 and less than or equal to 2.6, greater than or equal to 1.6 and less than or equal to 2.5, greater than or equal to 1.6 and less than or equal to 2.4, greater than or equal to 1.6 and less than or equal to 2.3, greater than or equal to 1.6 and less than or equal to 2.2, greater than or equal to 1.7 and less than or equal to 2.7, greater than or equal to 1.7 and less than or equal to 2.6 greater than or equal to 1.7 and less than or equal to 2.5, greater than or equal to 1.7 and less than or equal to 2.4, greater than or equal to 1.7 and less than or equal to 2.3, greater than or equal to 1.7 and less than or equal to 2.2, greater than or equal to 1.8 and less than or equal to 2.7, greater than or equal to 1.8 and less than or equal to 2.6, greater than or equal to 1.8 and less than or equal to 2.5, greater than or equal to 1.8 and less than or equal to 2.4, greater than or equal to 1.8 and less than or equal to 2.3, greater than or equal to 1.8 and less than or equal to 2.2, greater than or equal to 1.9 and less than or equal to 2.7, greater than or equal to 1.9 and less than or equal to 2.6, greater than or equal to 1.9 and less than or equal to 2.5, greater than or equal to 1.9 and less than or equal to 2.4, greater than or equal to 1.9 and less than or equal to 2.3, or even greater than or equal to 1.9 and less than or equal to 2.2, or any and all sub-ranges formed from any of these endpoints.

[00106] In embodiments, the lens curvature 232A may be greater than or equal to 0.0019 mm'¹ and less than or equal to 2.0000 mm'¹. In embodiments, the lens curvature 232A may be greater than or equal to 0.0019 mm'¹, greater than or equal to 0.0050 mm'¹, greater than or equal to 0.0100 mm'¹, greater than or equal to 0.0500 mm'¹, greater than or equal to 0.1000 mm'¹, greater than or equal to 0.5000 mm'¹, greater than or equal to 1.0000 mm'¹, or even greater than or equal to 1.5000 mm'¹. In embodiments, the lens curvature 232A may be less than or equal to 2.0000 mm'¹, less than or equal to 1.5000 mm'¹, less than or equal to 1.0000 mm'¹, less than or equal to 0.5000 mm' less than or equal to 0.1000 mm'¹, less than or equal to 0.0500 mm'¹, less than or equal to 0.0100 mm'¹, less than or equal to 0.0050 mm'¹, or even less than or equal to 0.0020 mm'¹. In embodiments, the lens curvature 232A may be greater than or equal to 0.0019 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 1.5000 mm' greater than or equal to 0.0019 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.5000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.1000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0500 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0100 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0050 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0020 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 1.5000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.5000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.1000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.0500 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.0100 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 1.5000 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 0.5000 mm'¹, greater than or equal to 0.5000 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.5000 mm'¹ and less than or equal to 1.5000 mm'¹, greater than or equal to 0.5000 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 1.0000 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 1.0000 mm'¹ and less than or equal to 1.5000 mm'¹, or even greater than or equal to 1.5000 mm'¹ and less than or equal to 2.0000 mm'¹, or any and all subranges formed from any of these endpoints.

[00107] In embodiments, the lens thickness 234A may be greater than or equal to 5 mm and less than or equal to 10 mm. In embodiments, the lens thickness 234A may be greater than or equal to 5 mm, greater than 6 mm, greater than or equal to 7 mm, greater than or equal to 8 mm, or even greater than or equal to 9 mm. In embodiments, the lens thickness 234A may be less than or equal to 9 mm, less than or equal to 8 mm, less than or equal to 7 mm, or even less than or equal to 6 mm. In embodiments, the lens thickness 234A may be greater than or equal to 5 mm and less than or equal to 10 mm, greater than or equal to 5 mm and less than 9 mm, greater than or equal to 5 mm and less than or equal to 8 mm, greater than or equal to 5 mm and less than or equal to 7 mm, greater than or equal to 5 mm and less than or equal to 6 mm, greater than 6 mm and less than or equal to 10 mm, greater than 6 mm and less than or equal to 9 mm, greater than 6 mm and less than or equal to 8 mm, greater than 6 mm and less than or equal to 7 mm, greater than 7 mm and less than or equal to 10 mm, greater than 7 mm and less than or equal to 9 mm, greater than 7 mm and less than or equal to 8 mm, greater than 8 mm and less than or equal to 10 mm, greater than 8 mm and less than or equal to 9 mm, or even greater than 9 mm and less than or equal to 10 mm, or any and all sub-ranges formed from any of these endpoints.

[00108] Referring to FIG. 6, in this embodiment, the optical element 230 comprises a spherical optic 230B. The spherical optic 230B comprises optical qualities including a lens curvature 232B, a lens thickness 234B, a refractive index of a material of the spherical optic 230B, a first distance 236B between the spherical optic 230B and the second surface 214 of the glass substrate 210, and a second distance 238B between the spherical optic 230B and the laser 240. To impart an optical element wavefront aberration effect which counteracts the substrate wavefront aberration effect, at least one optical quality of the spherical optic 230B may be configured to cause the spherical optic 230B to impart the optical element wavefront aberration effect. In embodiments, any optical quality of the spherical optic 230B may be configured to impart an optical element wavefront aberration effect that counteracts the substrate wavefront effect.

[00109] In embodiments, the refractive index of the lens material of the spherical optic 230B may comprise a refractive index greater than or equal to 1.4. In embodiments, the refractive index of the lens material may comprise a refractive index less than or equal to 2.7. In embodiments, the refractive index of the lens material may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7. In embodiments, the lens material may comprise a refractive index greater than or equal to 1.4, greater than or equal to 1.5, greater than or equal to 1.6, greater than or equal to 1.7, greater than or equal to 1.8, or even greater than or equal to 1.9. In embodiments, the lens material may comprise a refractive index less than or equal to 2.7, less than or equal to 2.6, less than or equal to 2.5, less than or equal to 2.4, less than or equal to 2.3, or even less than or equal to 2.2. In embodiments, the lens material may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7, greater than or equal to 1.4 and less than or equal to 2.6, greater than or equal to 1.4 and less than or equal to 2.5, greater than or equal to 1.4 and less than or equal to 2.4, greater than or equal to 1.4 and less than or equal to 2.3, greater than or equal to 1.4 and less than or equal to 2.2, greater than or equal to 1.5 and less than or equal to 2.7, greater than or equal to 1.5 and less than or equal to 2.6, greater than or equal to 1.5 and less than or equal to 2.5, greater than or equal to 1.5 and less than or equal to 2.4, greater than or equal to 1.5 and less than or equal to 2.3, greater than or equal to 1.5 and less than or equal to 2.2, greater than or equal to 1.6 and less than or equal to 2.7, greater than or equal to 1.6 and less than or equal to 2.6, greater than or equal to 1.6 and less than or equal to 2.5, greater than or equal to 1.6 and less than or equal to 2.4, greater than or equal to 1.6 and less than or equal to 2.3, greater than or equal to 1.6 and less than or equal to 2.2, greater than or equal to 1.7 and less than or equal to 2.7, greater than or equal to 1.7 and less than or equal to 2.6 greater than or equal to 1.7 and less than or equal to 2.5, greater than or equal to 1.7 and less than or equal to 2.4, greater than or equal to 1.7 and less than or equal to 2.3, greater than or equal to 1.7 and less than or equal to 2.2, greater than or equal to 1.8 and less than or equal to 2.7, greater than or equal to 1.8 and less than or equal to 2.6, greater than or equal to 1.8 and less than or equal to 2.5, greater than or equal to 1.8 and less than or equal to 2.4, greater than or equal to 1.8 and less than or equal to 2.3, greater than or equal to 1.8 and less than or equal to 2.2, greater than or equal to 1.9 and less than or equal to 2.7, greater than or equal to 1.9 and less than or equal to 2.6, greater than or equal to 1.9 and less than or equal to 2.5, greater than or equal to 1.9 and less than or equal to 2.4, greater than or equal to 1.9 and less than or equal to 2.3, or even greater than or equal to 1.9 and less than or equal to 2.2, or any and all sub-ranges formed from any of these endpoints. [00110] In embodiments, the lens curvature 232B may be greater than or equal to 0.0019 mm'¹ and less than or equal to 2.0000 mm'¹. In embodiments, the lens curvature 232B may be greater than or equal to 0.0019 mm'¹, greater than or equal to 0.0050 mm'¹, greater than or equal to 0.0100 mm'¹, greater than or equal to 0.0500 mm'¹, greater than or equal to 0.1000 mm'¹, greater than or equal to 0.5000 mm'¹, greater than or equal to 1.0000 mm'¹, or even greater than or equal to 1.5000 mm'¹. In embodiments, the lens curvature 232B may be less than or equal to 2.0000 mm'¹, less than or equal to 1.5000 mm'¹, less than or equal to 1.0000 mm'¹, less than or equal to 0.5000 mm' less than or equal to 0.1000 mm'¹, less than or equal to 0.0500 mm'¹, less than or equal to 0.0100 mm'¹, less than or equal to 0.0050 mm'¹, or even less than or equal to 0.0020 mm'¹. In embodiments, the lens curvature 232B may be greater than or equal to 0.0019 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 1.5000 mm' greater than or equal to 0.0019 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.5000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.1000 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0500 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0100 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0050 mm'¹, greater than or equal to 0.0019 mm'¹ and less than or equal to 0.0020 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 1.5000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.5000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.1000 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.0500 mm'¹, greater than or equal to 0.0050 mm'¹ and less than or equal to 0.0100 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 1.5000 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 0.0100 mm'¹ and less than or equal to 0.5000 mm'¹, greater than or equal to 0.5000 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 0.5000 mm'¹ and less than or equal to 1.5000 mm'¹, greater than or equal to 0.5000 mm'¹ and less than or equal to 1.0000 mm'¹, greater than or equal to 1.0000 mm'¹ and less than or equal to 2.0000 mm'¹, greater than or equal to 1.0000 mm'¹ and less than or equal to 1.5000 mm'¹, or even greater than or equal to 1.5000 mm'¹ and less than or equal to 2.0000 mm'¹, or any and all subranges formed from any of these endpoints. [00111] In embodiments, the lens thickness 234B may be greater than or equal to 5 mm and less than or equal to 10 mm. In embodiments, the lens thickness 234B may be greater than or equal to 5 mm, greater than 6 mm, greater than or equal to 7 mm, greater than or equal to 8 mm, or even greater than or equal to 9 mm. In embodiments, the lens thickness 234B may be less than or equal to 9 mm, less than or equal to 8 mm, less than or equal to 7 mm, or even less than or equal to 6 mm. In embodiments, the lens thickness 234B may be greater than or equal to 5 mm and less than or equal to 10 mm, greater than or equal to 5 mm and less than 9 mm, greater than or equal to 5 mm and less than or equal to 8 mm, greater than or equal to 5 mm and less than or equal to 7 mm, greater than or equal to 5 mm and less than or equal to 6 mm, greater than 6 mm and less than or equal to 10 mm, greater than 6 mm and less than or equal to 9 mm, greater than 6 mm and less than or equal to 8 mm, greater than 6 mm and less than or equal to 7 mm, greater than 7 mm and less than or equal to 10 mm, greater than 7 mm and less than or equal to 9 mm, greater than 7 mm and less than or equal to 8 mm, greater than 8 mm and less than or equal to 10 mm, greater than 8 mm and less than or equal to 9 mm, or even greater than 9 mm and less than or equal to 10 mm, or any and all sub-ranges formed from any of these endpoints.

[00112] In embodiments, any optical quality of the spherical lens 230B may be configured to impart an optical element wavefront aberration effect that counteracts the substrate wavefront effect.

[00113] Referring to FIG. 7, in this embodiment, the optical element 230 comprises a diffractive optical element 230C. In embodiments, the diffractive optical element 230C may be a digital phase mask. In other embodiments, the diffractive optical element 230C may be a physical phase mask. In the embodiment of FIG. 7, the diffractive optical element 230C comprises optical qualities including a surface grating 232C, a refractive index of a material of the diffractive optical element 230C, a first distance 236C between the diffractive optical element 230C and the second surface 214 of the glass substrate 210, and a second distance 238C between the diffractive optical element 230C and the laser 240. To impart an optical element wavefront aberration effect which counteracts the substrate wavefront aberration effect, at least one optical quality of the diffractive optical element 230C may be configured to cause the diffractive optical element 230C to impart the optical element wavefront aberration effect. In embodiments, the surface grating 232C may be a pattern. In other embodiments, the surface grating 232C may be non-periodic. In embodiments, any optical quality of the diffractive optical element 23 OC may be configured to impart an optical element wavefront aberration effect that counteracts the substrate wavefront effect.

[00114] Referring to FIG. 8, in this embodiment, the optical element 230 comprises a plane 230D at a first oblique planar angle 232D relative to a potential laser beam 240D of the laser 240, wherein the potential laser beam 240D is configured to pass through the first plane 230D. As such, in this embodiment, the laser 240 may emit a laser beam having a wavelength and/or the first plane 230D may comprise a material such that the first plane 230D is substantially transparent to the wavelength of the laser beam. The first plane 230D comprises optical qualities including a thickness 234D, a refractive index of a material of the plane first 230D, the angle of the first oblique planar angle 232D, a first distance 236D between the plane 230D and the second surface 214 of the glass substrate 210, and a second distance 238D between the plane 230D and the laser 240. To impart an optical element wavefront aberration effect which counteracts the substrate wavefront aberration effect, at least one optical quality of the first plane 230D and/or the first oblique planar angle 232D may be configured to cause the first plane 230D to impart the optical element wavefront aberration effect. In embodiments, any optical quality of the first plane 230D and/or the first oblique planar angle 232D may be configured to impart an optical element wavefront aberration effect that counteracts the substrate wavefront effect.

[00115] In embodiments, optical qualities of the plane 230D may further include a curvature. In certain such embodiments, the optical qualities of the plane 230D include a curvature of an optically upstream side of the plane 230D and/or a curvature of an optically downstream side of the plane 230D). In embodiments, the plane 230D may have a non-planar shape, such as a wedge shape (i.e., wherein an optically upstream side of the plane 230D is not parallel to an optically downstream side of the plane 230D), and the optical qualities of the plane 230D, in such embodiments, includes the shape and/or an angle of the optically upstream side of the plane 230D relative to the optically downstream side of the plane 230D. In embodiments, the plane 230D has a non-planar shape and one or more curvatures.

[00116] In embodiments, the refractive index of the lens material of the plane 230D may comprise a refractive index greater than or equal to 1.4. In embodiments, the refractive index of the lens material may comprise a refractive index less than or equal to 2.7. In embodiments, the refractive index of the lens material may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7. In embodiments, the lens material may comprise a refractive index greater than or equal to 1.4, greater than or equal to 1.5, greater than or equal to 1.6, greater than or equal to 1.7, greater than or equal to 1.8, or even greater than or equal to 1.9. In embodiments, the lens material may comprise a refractive index less than or equal to 2.7, less than or equal to 2.6, less than or equal to 2.5, less than or equal to 2.4, less than or equal to 2.3, or even less than or equal to 2.2. In embodiments, the lens material may comprise a refractive index greater than or equal to 1.4 and less than or equal to 2.7, greater than or equal to 1.4 and less than or equal to 2.6, greater than or equal to 1.4 and less than or equal to 2.5, greater than or equal to 1.4 and less than or equal to 2.4, greater than or equal to 1.4 and less than or equal to 2.3, greater than or equal to 1.4 and less than or equal to 2.2, greater than or equal to 1.5 and less than or equal to 2.7, greater than or equal to 1.5 and less than or equal to 2.6, greater than or equal to 1.5 and less than or equal to 2.5, greater than or equal to 1.5 and less than or equal to 2.4, greater than or equal to 1.5 and less than or equal to 2.3, greater than or equal to 1.5 and less than or equal to 2.2, greater than or equal to 1.6 and less than or equal to 2.7, greater than or equal to 1.6 and less than or equal to 2.6, greater than or equal to 1.6 and less than or equal to 2.5, greater than or equal to 1.6 and less than or equal to 2.4, greater than or equal to 1.6 and less than or equal to 2.3, greater than or equal to 1.6 and less than or equal to 2.2, greater than or equal to 1.7 and less than or equal to 2.7, greater than or equal to 1.7 and less than or equal to 2.6 greater than or equal to 1.7 and less than or equal to 2.5, greater than or equal to 1.7 and less than or equal to 2.4, greater than or equal to 1.7 and less than or equal to 2.3, greater than or equal to 1.7 and less than or equal to 2.2, greater than or equal to 1.8 and less than or equal to 2.7, greater than or equal to 1.8 and less than or equal to 2.6, greater than or equal to 1.8 and less than or equal to 2.5, greater than or equal to 1.8 and less than or equal to 2.4, greater than or equal to 1.8 and less than or equal to 2.3, greater than or equal to 1.8 and less than or equal to 2.2, greater than or equal to 1.9 and less than or equal to 2.7, greater than or equal to 1.9 and less than or equal to 2.6, greater than or equal to 1.9 and less than or equal to 2.5, greater than or equal to 1.9 and less than or equal to 2.4, greater than or equal to 1.9 and less than or equal to 2.3, or even greater than or equal to 1.9 and less than or equal to 2.2, or any and all sub-ranges formed from any of these endpoints. [00117] Referring to FIG. 9, in this embodiment, the optical element 230 comprises a plane 230E at a second oblique planar angle 232E relative to a potential laser beam 240E of the laser 240. However, contrary to the embodiment of FIG. 8, in the embodiment of FIG. 9, the potential laser beam 240E is configured to reflect off of the plane 230E. As such, in this embodiment, the laser 240 may emit a laser beam having a wavelength and/or the plane 230E may comprise a material such that the laser beam reflects (at least partially) off of at least a portion of the plane 230E. The plane 230E comprises optical qualities including a plane thickness 234E, a refractive index of a material of the plane 230E, the second oblique planar angle 232E, a first distance 236E between the plane 230E and the second surface 214 of the glass substrate 210, and a second distance 238E between the plane 230E and the laser 240. To impart an optical element wavefront aberration effect which counteracts the substrate wavefront aberration effect, at least one optical quality of the plane 230E and/or the second oblique planar angle 232E may be configured to cause the plane 230E to impart the optical element wavefront aberration effect. In embodiments, any optical quality of the plane 230E and/or the second oblique planar angle 232E may be configured to impart an optical element wavefront aberration effect that counteracts the substrate wavefront effect.

[00118] In embodiments, the material of the plane 230E is chosen based on the oblique planar angle 232E, the wavelength of the potential laser beam 240E, and/or spatial constraints of an optical system of FIG. 9. In embodiments, the material of the plane 230E comprises a glass. In embodiments, the plane 230E comprises a metal substrate.

[00119] In embodiments, the plane 230E and/or a substrate of the plane 230E is coated with an optical coating, such as, e.g., a high reflectance optical coating. Examples of such coatings are described in U.S. Pat. No. 9,335,444, entitled “DURABLE AND SCRATCH-RESISTANT ANTI- REFLECTIVE ARTICLES” filed on May 7, 2015, which is incorporated herein in its entirety by reference, and in U.S. Patent Application Ser. No. 13/690,904 (U.S. Pub. No. 2014/0113083A1), entitled “PROCESS FOR MAKING OF GLASS ARTICLES WITH OPTICAL AND EASY-TO- CLEAN COATINGS” filed on Nov. 30, 2012, which is incorporated herein in its entirety by reference.

[00120] In embodiments, optical qualities of the plane 230E may further include a curvature. In certain such embodiments, the optical qualities of the plane 230E include a curvature of an optically upstream side of the plane 230E and/or a curvature of an optically downstream side of the plane 230E). In embodiments, the plane 230E may have a non-planar shape, such as a wedge shape (i.e., wherein an optically upstream side of the plane 230E is not parallel to an optically downstream side of the plane 23 OE), and the optical qualities of the plane 23 OE, in such embodiments, includes the shape and/or an angle of the optically upstream side of the plane 230E relative to the optically downstream side of the plane 23 OE. In embodiments, the plane 23 OE has a non-planar shape and one or more curvatures.

[00121] In embodiments, the optical element 230, as in the embodiment of FIG. 9, is configured to reflect the potential laser beam 240E but does not comprise the plane 23 OE but rather comprises a different optical element, such as, e.g., a spatial light modulator, a cylindrical lens, a prism, or another reflective optical device.

[00122] In embodiments, the first distance (236A, 236B, 236C, 236D, 236E) may be greater than or equal to 30 mm and less than or equal to 40 mm. In embodiments, the first distance may be greater than or equal 30 mm, greater than or equal 32 mm, greater than or equal 34 mm, greater than or equal 36 mm, or even greater than or equal 38 mm. In embodiments, the first distance may be less than or equal to 40 mm, less than or equal to 38 mm, less than or equal to 36 mm, less than or equal to 34 mm, or even less than or equal to 32 mm. In embodiments, the first distance may be greater than or equal to 30 mm and less than or equal to 38 mm. In embodiments, the first distance may be greater than or equal to 30 mm and less than or equal to 36 mm, greater than or equal to 30 mm and less than or equal to 34 mm, greater than or equal to 30 mm and less than or equal to 32 mm, greater than or equal to 32 mm and less than or equal to 40 mm, greater than or equal to 32 mm and less than or equal to 38 mm, greater than or equal to 32 mm and less than or equal to 36 mm, greater than or equal to 32 mm and less than or equal to 34 mm, greater than or equal to 34 mm and less than or equal to 40 mm, greater than or equal to 34 mm and less than or equal to 38 mm, greater than or equal to 34 mm and less than or equal to 36 mm, greater than or equal to 36 mm and less than or equal to 40 mm, greater than or equal to 36 mm and less than or equal to 38 mm, or even greater than or equal to 38 mm and less than or equal to 40 mm, or any and all sub-ranges formed from any of these endpoints. [00123] In embodiments, the second distance (238 A, 238B, 238C, 238B, 238E) may be greater than or equal to 35 mm and less than or equal to 45 mm. In embodiments, the second distance may be greater than or equal to 35 mm, greater than or equal to 37 mm, greater than or equal to 39 mm, greater than or equal to 41 mm, or even greater than or equal to 43 mm. In embodiments, the second distance may be less than or equal to 45 mm, less than or equal to 43 mm, less than or equal to 41 mm, less than or equal to 39 mm, or even less than or equal to 37 mm. In embodiments, the second distance may be greater than or equal to 35 mm and less than or equal to 43 mm, greater than or equal to 35 mm and less than or equal to 41 mm, greater than or equal to 35 mm and less than or equal to 39 mm, greater than or equal to 35 mm and less than or equal to 37 mm, greater than or equal to 37 mm and less than or equal to 45 mm, greater than or equal to 37 mm and less than or equal to 43 mm, greater than or equal to 37 mm and less than or equal to 41 mm, greater than or equal to 37 mm and less than or equal to 39 mm, greater than or equal to 39 mm and less than or equal to 45 mm, greater than or equal to 39 mm and less than or equal to 43 mm, greater than or equal to 39 mm and less than or equal to 41 mm, greater than or equal to 41 mm and less than or equal to 45 mm, greater than or equal to 41 mm and less than or equal to 43 mm, or even greater than or equal to 43 mm and less than or equal to 45 mm, or any and all sub-ranges formed from any of these endpoints.

[00124] Referring back to FIG. 1 and as shown in FIGs. 10 and 11, the method 100A continues at block 106 with conducting a first welding step by directing a laser beam 242 of the laser 240 on the optical element 230 such that the laser beam 242 contacts the optical element 230, passes through the glass substrate 210 at a first oblique angle 244 relative to the second surface 214 of the glass substrate 210, and is directed on at least a portion of the contact location 224 to bond the glass substrate 210 to the layer 220 and form a first bond location 226. As described above, directing the laser beam 242 on the optical element 230 imparts the optical element wavefront aberration effect and passing the laser beam 242 through the glass substrate imparts a second substrate wavefront aberration effect. The first optical element wavefront aberration effect counteracts the substrate second wavefront aberration effect, thereby enabling the laser 240 to bond the glass substrate 210 to the layer 220.

[00125] In some embodiments, directing the laser beam 240 may, as shown in the embodiment of FIG. 10, comprise the laser beam 240 passing through the optical element 230. In other embodiments, directing the laser beam 240 may, as shown in the embodiment of FIG. 11, comprise the laser beam 240 reflecting off of the optical element 230, which, in the embodiment of FIG. 11, comprises the plane 230E.

[00126] In embodiments, the laser 240 comprises a pulsed laser. In embodiments, the pulsed laser may be a nanosecond pulsed laser, a picosecond pulsed laser, or a femtosecond pulsed laser.

[00127] In embodiments, the pulsed laser may comprise a pulse energy greater than or equal to 2.8 pj and less than or equal to 1000 pj. In embodiments, the pulsed laser may comprise a pulse energy greater than or equal to 2.8 pj, greater than or equal to 10 pj, greater than or equal to 25 pj, or even greater than or equal to 50 pj. In embodiments, the pulsed laser may comprise a pulse energy of less than or equal to 1000 pj, less than or equal to 750 pj, less than or equal to 500 pj, or even less than or equal to 250 pj. In embodiments, the pulsed laser may comprise a pulse energy greater than or equal to 2.8 pj and less than or equal to 1000 pj, greater than or equal to 2.8 pj and less than or equal to 750 pj, greater than or equal to 2.8 pj and less than or equal to 500 pj, greater than or equal to 2.8 pj and less than or equal to 250 pj, greater than or equal to 10 pj and less than or equal to 1000 pj, greater than or equal to 10 pj and less than or equal to 750 pj, greater than or equal to 10 pj and less than or equal to 500 pj, greater than or equal to 10 p J and less than or equal to 250 p J, greater than or equal to 25 p J and less than or equal to 1000 p J, greater than or equal to 25 pj and less than or equal to 750 pj, greater than or equal to 25 pj and less than or equal to 500 pj, greater than or equal to 25 pj and less than or equal to 250 pj, greater than or equal to 50 pj and less than or equal to 1000 pj, greater than or equal to 50 pj and less than or equal to 750 pj, greater than or equal to 50 pj and less than or equal to 500 pj, or even greater than or equal to 50 pj and less than or equal to 250 pj, or any and all sub-ranges formed from any of these endpoints.

[00128] In embodiments, the pulsed laser may have a wavelength such that the glass substrate 210 is substantially transparent to the wavelength of the laser beam and the layer 220 is substantially opaque to the wavelength of the laser beam. For example, in embodiments the pulsed laser may have a wavelength greater than or equal to 300 nm and less than or equal to 1100 nm. In embodiments, the pulsed laser may have a wavelength greater than or equal to 300 nm, greater than or equal to 325 nm, or even greater than or equal to 350 nm. In embodiments, the pulsed laser may have a wavelength less than or equal to 1100 nm, less than or equal to 900 nm, or even less than or equal to 700 nm. In embodiments, the pulsed laser may have a wavelength greater than or equal to 300 nm and less than or equal to 1100 nm, greater than or equal to 300 nm and less than or equal to 900 nm, greater than or equal to 300 nm and less than or equal to 700 nm, greater than or equal to 325 nm and less than or equal to 1100 nm, greater than or equal to 325 nm and less than or equal to 900 nm, greater than or equal to 325 nm and less than or equal to 700 nm, greater than or equal to 350 nm and less than or equal to 1100 nm, greater than or equal to 350 nm and less than or equal to 900 nm, or even greater than or equal to 350 nm and less than or equal to 700 nm, or any and all sub-ranges formed from any of these endpoints.

[00129] In embodiments, the pulsed laser may comprise a high-repetition pulsed UV laser operating at about 355 nm, 532 nm, 750 nm, 1064 nm or any other wavelength that is suitable, depending on the transmission of the glass.

[00130] In embodiments, the pulsed laser may have a repetition rate greater than or equal to 5 kHz and less than or equal to 1 MHz. In embodiments, the pulsed laser may have a repetition rate greater than or equal to 5 kHz, greater than or equal to 50 kHz, greater than or equal to 100 kHz, or even greater than or equal to 250 kHz. In embodiments, the pulsed laser may have a repetition rate less than or equal to 1 MHz, less than or equal to 750 kHz, or even less than or equal to 500 KHz. In embodiments, the pulsed laser may have a repetition rate greater than or equal to 5 kHz and less than or equal to 1 MHz, greater than or equal to 5 kHz and less than or equal to 750 kHz, greater than or equal to 5 kHz and less than or equal to 500 kHz, greater than or equal to 50 kHz and less than or equal to 1 MHz, greater than or equal to 50 kHz and less than or equal to 750 kHz, greater than or equal to 50 kHz and less than or equal to 500 kHz, greater than or equal to 100 kHz and less than or equal to 1 MHz, greater than or equal to 100 kHz and less than or equal to 750 kHz, greater than or equal to 100 kHz and less than or equal to 500 kHz, greater than or equal to 250 kHz and less than or equal to 1 MHz, greater than or equal to 250 kHz and less than or equal to 750 kHz, or even greater than or equal to 250 kHz and less than or equal to 500 kHz, or any and all sub-ranges formed from any of these endpoints.

[00131] As described herein, a “spot size” (i.e., coo) refers to a beam spot radius where an intensity value of the beam falls to (e²)'¹ of an axial value of the beam’s intensity. In embodiments, the

31 pulsed laser may have a spot size greater than or equal to 5 pm and less than or equal to 50 pm. In embodiments, the pulsed laser may have a spot size greater than or equal to 5 pm or even greater than or equal to 10 pm. In embodiments, the pulsed laser may have a spot size less than or equal to 50 pm, less than or equal to 35 pm, or even less than or equal to 20 pm. In embodiments, the pulsed laser may have a spot size greater than or equal to 5 pm and less than or equal to 50 pm, greater than or equal to 5 pm and less than or equal to 35 pm, greater than or equal to 5 pm and less than or equal to 20 pm, greater than or equal to 10 pm and less than or equal to 50 pm, greater than or equal to 10 pm and less than or equal to 35 pm, or even greater than or equal to 10 pm and less than or equal to 20 pm, or any and all sub-ranges formed from any of these endpoints.

[00132] In embodiments, as shown in FIGs. 10 and 11, during the first welding step, the layer 220 is disposed optically downstream of the glass substrate 210 such that the laser beam 242 passes through the glass substrate 210 before being incident on the contact location 224. The laser beam 242 may be traversed along the contact location 224 to facilitate a line bond between the glass substrate 210 and the layer 220. For example, the laser beam 242 may be traversed along the contact location 224 (e.g., into and/or out of the page and/or transverse to the plane of the page in FIG. 10 or in FIG. 11) to facilitate a line bond between the glass substrate 210 and layer 220.

[00133] In FIGs. 10 and 11, the laser beam 242 is incident upon the second surface 214 at the first oblique angle 244. The first oblique angle 244 may be, in different embodiments, one of many differing non-normal (i.e., non- perpendicular or not equal to 90 degrees) angles, including, e.g., any angle between 0 and 90 degrees, any angle less than or equal to 60 degrees, any angle less than or equal to 40 degrees, an angle between 15 and 45 degrees, or any other angular subrange within the angular range of 0 to 90 degrees.

[00134] Referring now to FIGS. 12 and 13, a method of laser bonding glass to a material 100B is similar to the method of laser bonding glass to a material 100 A, however the method 100B additionally comprises block 103.

[00135] The method of laser bonding glass to a material 100B begins at block 102 with contacting a first surface 212 of the glass substrate 210 with a first surface 222 of a layer 220 to create a contact location 224 between at least a portion of the first surface 212 of the glass substrate 210 and the first surface 222 of the layer 220. In embodiments, the layer 220 may be in contact with only a portion of the first surface 212. In other embodiments, the layer 220 may be in contact with an entirety of the first surface 212.

[00136] Referring to FIG. 12 and as shown in FIG. 14, the method 100B continues at block 103, with disposing an optical flat 250 optically upstream of the glass substrate 210 such that a first surface 252 of the optical flat 250 forms optical contact with the second surface 214 of the glass substrate 210.

[00137] In the embodiment depicted in FIG. 14 (and in the embodiments depicted in subsequent FIGs.) both the first surface 252 and the second surface 254 of the optical flat 250 are depicted as being substantially flat, with the cross-sectional view of the embodiments of FIGs. 13-15 depicting the optical flat 250 as a substantially rectangular plane. However, in other embodiments, the glass substrate may have a different shape or general geometry, and may instead be, e.g., flat, triangular, spherical, non-planar, a combination thereof, or some other shape. As such, either or both of the first surface 252 and the second surface 254 may not be substantially planar (i.e., as in the embodiments of FIG. 14 and subsequent FIGs.) but may instead be jagged, non-uniform, arced, ridged, or have some other surface geometry. In such embodiments, the optical flat 250 may not lay flat against the glass substrate 210, and, in such embodiments, the first surface 252 of the optical flat 250 may instead form an intermediate angle with the second surface 214 of the glass substrate 210.

[00138] Referring to FIG. 12 and as shown in FIG. 15, the method 100B continues at block 104, with disposing an optical element 230 optically upstream of the glass substrate 210 and the optical flat 250, relative to a laser 240.

[00139] As in the embodiments of FIGs. 3 and 5-11, the optical element 230 is configured to impart a wavefront aberration effect that counteracts the substrate wavefront aberration effect. However, since the optical flat 250 is optically upstream of the glass substrate 220 and contrary to the embodiments of FIGs. 3 and 5-11, a laser beam of the laser 240 may pass through the second surface 254 of the optical flat and the second surface 254 may thereby further impart the substrate wavefront aberration effect (i.e., the substrate wavefront aberration effect becomes a cumulative wavefront aberration effect comprising a wavefront aberration effect imparted by the glass substrate 220 and a wavefront aberration effect imparted by the optical flat 250. As such, in the embodiments of FIGs. 13-15, while the mathematics used for configuring optical qualities of the optical element 230 to impart an optical element wavefront aberration effect that counteracts the substrate wavefront aberration effect may remain similar as the mathematics used in the embodiments of FIGs. 3 and 5-11, the composition of the substrate wavefront aberration effect changes in the embodiments of FIGs. 13-15 due to the presence of the optical flat 250 optically upstream of the glass substrate 220.

[00140] In embodiments, the optical flat 250 may comprise a refractive index, and, in embodiments, a refractive index of the optical flat may be less than a refractive index of the glass substrate 220. In embodiments, the optical flat 250 may comprise a refractive index of greater than or equal to 1.3, greater than or equal to 1.4, or even greater than 1.5. In embodiments, the optical flat 250 may comprise a refractive index of less than or equal to 2.0, less than or equal to 1.9, less than or equal to 1.8, or even less than 1.7. In embodiments, the optical flat 250 may comprise a refractive index of greater than or equal to 1.3 and less than or equal to 2.0, greater than or equal to 1.3 and less than or equal to 1.9, greater than or equal to 1.3 and less than or equal to 1.8, greater than or equal to 1.3 and less than or equal to 1.7, greater than or equal to 1.4 and less than or equal to 2.0, greater than or equal to 1.4 and less than or equal to 1.9, greater than or equal to 1.4 and less than or equal to 1.8, greater than or equal to 1.4 and less than or equal to 1.7, greater than or equal to 1.5 and less than or equal to 2.0, greater than or equal to 1.5 and less than or equal to 1.9, greater than or equal to 1.5 and less than or equal to 1.8, or even greater than or equal to 1.5 and less than or equal to 1.7, or any and all sub-ranges formed from any of these endpoints.

[00141] In embodiments, the optical flat 250 may comprise similar or the same materials and/or similar or the same properties as the glass substrate 210.

[00142] In embodiments, a thickness of the optical flat 250 will affect optical aberrations of the laser beam 242, and so optical qualities of the optical element 230 will depend, at least in part, on the thickness of the optical flat 250. In embodiments, the optical flat 250 may comprise a thickness greater than or equal to 10 mm, greater than or equal to 15 mm, greater than or equal to 20 mm, or even greater than 25 mm. In embodiments, the optical flat 250 may comprise a thickness less than or equal to 50 mm, less than or equal to 45 mm, or even less than 40 mm. In embodiments, the optical flat 250 may comprise a thickness greater than or equal to 10 mm and less than or equal to 50 mm, greater than or equal to 10 mm and less than or equal to 45 mm, greater than or equal to 10 mm and less than or equal to 40 mm, greater than or equal to 15 mm and less than or equal to 50 mm, greater than or equal to 15 mm and less than or equal to 45 mm, greater than or equal to 15 mm and less than or equal to 40 mm, greater than or equal to 20 mm and less than or equal to 50 mm, greater than or equal to 20 mm and less than or equal to 45 mm, greater than or equal to 20 mm and less than or equal to 40 mm, greater than or equal to 25 mm and less than or equal to 50 mm, greater than or equal to 25 mm and less than or equal to 45 mm, or even greater than or equal to 25 mm and less than or equal to 40 mm, or any and all sub-ranges formed from any of these endpoints.

[00143] Referring back to FIG. 12 and as shown in FIG. 16, the method 100B continues at block 106 with conducting a first welding step by directing a laser beam 242 of the laser 240 on the optical element 230 such that the laser beam 242 contacts the optical element 230, passes through the optical flat 250 at a second oblique angle 246 relative to the second surface 254 of the optical flat 250, passes through the glass substrate 210, and is directed on at least a portion of the contact location 224 to bond the glass substrate 210 to the layer 220 and form a first bond location 226. As described above, directing the laser beam 242 on the optical element 230 imparts the optical element wavefront aberration effect. Passing the laser beam 242 through the glass substrate 220 and through the optical flat 250 imparts a substrate wavefront aberration effect. The first optical element wavefront aberration effect counteracts the substrate second wavefront aberration effect, thereby enabling the laser 240 to bond the glass substrate 210 to the layer 220.

[00144] In some embodiments, directing the laser beam 240 may, as shown in the embodiment of FIG. 16, comprise the laser beam 240 passing through the optical element 230. In other embodiments, directing the laser beam 240 may comprise the laser beam 240 reflecting off of the optical element 230.

[00145] In FIG. 16, the laser beam 242 is incident upon the second surface 254 at the second oblique angle 246. However, in some embodiments and due to, e.g., differing refractive indices between the optical flat 250 and the glass substrate 220, the second oblique angle 246 may differ from an angle of incidence of the laser beam 242 upon the second surface 214 of the glass substrate 220. In other embodiments, the second oblique angle 246 may be the same as the third oblique angle 248.

[00146] The second oblique angle 246 may be, in different embodiments, one of many differing non-normal (i.e., non-perpendicular or not equal to 90 degrees) angles, including, e.g., any angle between 0 and 90 degrees, any angle less than or equal to 60 degrees, any angle less than or equal to 40 degrees, or any angle between 15 and 45 degrees.

[00147] The third oblique angle 248 may be, in different embodiments, one of many differing non-normal (i.e., non-perpendicular or not equal to 90 degrees) angles, including, e.g., any angle between 0 and 90 degrees, any angle less than or equal to 60 degrees, any angle less than or equal to 40 degrees, or any angle between 15 and 45 degrees.

[00148] It will be apparent to those skilled in the art that various modifications and variations may be made to the embodiments described herein without departing from the spirit and scope of the claimed subject matter. Thus, it is intended that the specification cover the modifications and variations of the various embodiments described herein provided such modification and variations come within the scope of the appended claims and their equivalents.

Claims

CLAIMS What is claimed is:

1. A method of bonding glass to a material, the method comprising: contacting a first surface of a glass substrate with a first surface of a layer to create a contact location between at least a portion of the first surface of the glass substrate and the first surface of the layer, the glass substrate comprising a second surface opposing the first surface of the glass substrate; disposing an optical element optically upstream of the glass substrate; and conducting a first welding step by directing a laser beam on the optical element such that the laser beam contacts the optical element, passes through the glass substrate at a first oblique angle relative to the second surface of the glass substrate, and contacts at least a portion of the contact location to bond the first surface of the glass substrate to the first surface of the layer, wherein: directing the laser beam on the optical element imparts an optical element wavefront aberration effect, passing the laser beam through the glass substrate imparts a substrate wavefront aberration effect, and the optical element wavefront aberration effect counteracts the substrate wavefront aberration effect such that a maximum deviation threshold of a cumulative wavefront effect, which is cumulative of the optical element wavefront aberration effect and the substrate wavefront aberration effect, is less than or equal to 0.3 waves.

2. The method of claim 1, wherein the maximum deviation threshold of the cumulative wavefront effect is a peak-to-valley value of the cumulative wavefront effect and is greater than or equal to 0 waves and less than or equal to 0.3 waves.

3. The method of claim 1 or claim 2, wherein the maximum deviation threshold of the cumulative wavefront effect is less than or equal to 0.26 waves.

4. The method of claim 3, wherein the maximum deviation threshold of the cumulative wavefront effect is less than or equal to 0.25 waves.

5. The method of any of claims 1-4, wherein the optical element is configured to impart the optical element wavefront aberration effect.

6. The method of any of claims 1-5, wherein the optical element comprises a cylindrical lens, a spherical optic, a diffractive optical element, a plane having an oblique planar angle relative to the laser beam, a spatial light modulator, or a combination thereof.

7. The method of claim 6, wherein: the optical element is a cylindrical lens, the cylindrical lens comprises optical qualities including a lens curvature, a refractive index of a lens material, a lens thickness, a first distance between the cylindrical lens and the second surface of the glass substrate, and a second distance between the cylindrical lens and a source of the laser beam, and at least one of the optical qualities is configured to cause the optical element to impart the optical element wavefront aberration effect.

8. The method of claim 7, wherein the curvature of the cylindrical lens is greater than or equal to 0.0019 mm'¹ and less than or equal to 2.0000 mm'¹.

9. The method of claim 7 or claim 8, wherein the first distance is greater than or equal to 30 mm and less than or equal to 40 mm.

10. The method of any of claims 7-9, wherein the second distance is greater than or equal to 35 mm and less than or equal to 45 mm.

11. The method of any of claims 1-10, wherein the directing the laser beam on the optical element comprises the laser beam passing through the optical element.

12. The method of any of claims 1-10, wherein the directing the laser beam on the optical element comprises the laser beam reflecting off of at least a portion of the optical element.

13. The method of any of claims 1-12, wherein: the optical element wavefront aberration effect comprises a first vertical astigmatism effect; the substrate wavefront aberration effect comprises a second vertical astigmatism effect; the first vertical astigmatism effect counteracts the second vertical astigmatism effect.

14. The method of any of claims 1-13, wherein the laser beam comprises a root mean squared beam spot radius, measured at the contact location, greater than or equal to 2.5 pm and less than or equal to 50 pm.

15. The method of claim 14, wherein the laser beam comprises a root mean squared beam spot radius, measured at the contact location, greater than or equal to 5 pm and less than or equal to 7 pm.

16. The method of any of claims 1-15, wherein the laser beam comprises a root mean squared beam spot radius, measured at the contact location, less than an Airy radius.

17. The method of any of claims 1-16, further comprising, prior to conducting the first welding step, disposing an optical flat optically upstream of the glass substrate, a first surface of the optical flat forming optical contact with the second surface of the glass substrate, the optical flat further comprising a second surface, wherein, during the first welding step, the laser beam passes through the optical flat.

18. The method of claim 17, wherein the laser beam passes through the second surface of the optical flat at a second oblique angle.

19. The method of claim 18, wherein laser beam passing through the second surface of the optical flat further imparts the substrate wavefront aberration effect.

20. The method of any of claims 17-19, wherein the optical flat comprises an optical flat refractive index and wherein the glass substrate comprises a substrate refractive index.

21. The method of claim 20, wherein the optical flat refractive index is less than the glass substrate refractive index.

22. The method of any of claims 17-21, wherein the first surface of the optical flat and the second surface of the glass substrate form an intermediate angle.

23. The method of any of claims 17-22, wherein the optical flat has a thickness greater than or equal to 10 mm.

24. The method of any of claims 1-23, wherein the first oblique angle is greater than or equal to 15 degrees and less than or equal to 45 degrees.

25. The method of any of claims 1-24, wherein the layer has a thickness greater than or equal to 5 pm and less than or equal to 50 pm.

26. The method of any of claims 1-25, wherein the layer comprises a metal layer.

27. The method of claim 26, wherein the metal layer comprises aluminum, aluminum alloys, stainless steel, nickel, nickel alloys, silver, silver alloys, titanium, titanium alloys, tungsten, tungsten alloys, gold, gold alloys, copper, copper alloys, bronze, iron, or a combination thereof.

28. The method of claim 26, wherein the layer is a metal foil layer having a thickness greater than or equal to 5 pm and 50 pm.

29. The method of any of claims 1-25, wherein the layer comprises a glass layer.

30. The method of claim 29, wherein the glass layer comprises a glass or glass-ceramic comprising borate glass, silicoborate glass, phosphate-based glass, silicon carbide glass, soda-lime silicate glass, aluminosilicate glass, alkali-aluminosilicate glass, borosilicate glass, alkali- borosilicate glass, aluminoborosilicate glass, alkali-alumino-borosilicate glass, silicon-dioxide glass, calcium fluoride glass, alkali-aluminosilicate glass, or niobium tungsten lanthanum boron glass.

31. The method of claim 29 or claim 30, wherein the glass layer has a thickness greater than or equal to 10 mm.

32. The method of any of claims 1-31, wherein the glass substrate is flat, triangular, spherical, non-planar, or a combination thereof.

33. The method of any of claims 1-32, wherein the glass substrate has a thickness greater than or equal to 10 mm.

34. The method of any of claims 1-33, wherein the glass substrate comprises a glass or glassceramic comprising borate glass, silicoborate glass, phosphate-based glass, silicon carbide glass, soda-lime silicate glass, aluminosilicate glass, alkali-aluminosilicate glass, borosilicate glass, alkali-borosilicate glass, aluminoborosilicate glass, alkali-alumino-borosilicate glass, silicondioxide glass, calcium fluoride glass, alkali-aluminosilicate glass, or niobium tungsten lanthanum boron glass.

35. The method of any of claims 1 -34, wherein the glass substrate comprises a refractive index greater than or equal to 1.4 and less than or equal to 2.7.