WO2024255658A1 - UV照射耦合原位产氯技术去除水中ARB和ARGs的方法 - Google Patents

UV照射耦合原位产氯技术去除水中ARB和ARGs的方法 Download PDF

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WO2024255658A1
WO2024255658A1 PCT/CN2024/097468 CN2024097468W WO2024255658A1 WO 2024255658 A1 WO2024255658 A1 WO 2024255658A1 CN 2024097468 W CN2024097468 W CN 2024097468W WO 2024255658 A1 WO2024255658 A1 WO 2024255658A1
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water
args
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左四进
张银巧
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China Pharmaceutical University
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
    • C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical

Definitions

  • the invention belongs to the technical field of water treatment, and in particular relates to a method for removing resistant bacteria and resistance genes in water by using UV irradiation coupled with in-situ chlorine production technology.
  • Antibiotic-resistant bacteria ARB and ARGs have been detected in various environmental media, especially in sewage treatment plants. ARB and ARGs in sewage can spread to drinking water sources, including groundwater and surface water systems, through water discharge and runoff.
  • UV irradiation and hypochlorous acid disinfection are two commonly used disinfection technologies.
  • nucleic acids in microbial cells can form pyrimidine dimers, leading to gene mutations and structural damage, thereby inactivating bacteria.
  • pyrimidine dimers can be repaired by photolyases produced in the cells, causing the genes to return to normal, thereby reviving the bacteria from a sublethal state.
  • ARGs with different base sequences have different sensitivities to chlorine. In order to effectively remove all ARGs, a high dose of chlorine (>80mg Cl 2 min L –1 ) needs to be added.
  • the purpose of the present invention is to provide a method for removing ARB and ARGs in water by using UV irradiation coupled with in-situ chlorine generation technology (UV/E-Cl 2 ), wherein current is applied to electrodes in the water body, and chloride ions lose electrons on the electrode surface to generate Cl 2 , which continues to react with water and/or ammonia to generate HClO, ClO – or/and chloramines, and further photolyzes under UV irradiation to generate ⁇ OH and RCS (such as Cl ⁇ , Cl 2 – ⁇ and ClO ⁇ ), thereby efficiently removing ARB and ARGs in the water body.
  • UV/E-Cl 2 in-situ chlorine generation technology
  • UV/E-Cl 2 UV irradiation coupled with in-situ chlorine generation technology
  • an electrode group including at least one pair of anode electrodes and cathode electrodes in a water body to be treated, and connecting the anode electrodes and the cathode electrodes to a power source respectively;
  • Connecting a power source to form an electric field between the anode electrode and the cathode electrode causes chloride ions in the water to be treated to lose electrons on the surface of the anode electrode to generate Cl 2 , which reacts with water and/or ammonia to generate HClO, ClO – or/and chloramine; under the irradiation of the UV lamp, HClO, ClO – or/and chloramine are photolyzed to generate active species including ⁇ OH and RCS, which inactivate ARB and ARGs in the water to be treated;
  • the water to be treated contains chloride ions, ARBs and/or ARGs.
  • the anode electrode is a titanium-plated ruthenium-iridium electrode, a titanium dioxide electrode, a titanium dioxide nanotube electrode or a boron-doped diamond electrode.
  • the cathode electrode is a platinum electrode, a stainless steel electrode or a titanium electrode.
  • the current I of the anode electrode and the cathode electrode is selected to be 10 ⁇ I ⁇ 1000mA.
  • the UV lamp is a mercury lamp or a UV-LED lamp.
  • the ARGs include intracellular ARGs (i-ARGs) and extracellular ARGs (e-ARGs).
  • the ARB is a bacterium containing ARGs on a plasmid.
  • water body to be treated is treated by batch treatment or continuous flow treatment.
  • the time used for each liter of water to be treated is 5s to 10min.
  • the method of the present invention cooperates with the effects of electrochemical oxidation and UV to efficiently and quickly inactivate ARB and ARGs; the treatment method is simple and easy, and the disinfection effect of the effluent can be flexibly controlled by adjusting the current size; there is no need to store and consume a large amount of oxidants, and it is green and safe.
  • Figure 1a shows the removal effect of ARB by different technologies
  • Figure 1b shows the photoreactivation of ARB after UV irradiation.
  • Figure 2 shows the removal effects of different technologies on i-ARGs (a) and e-ARGs (b).
  • Figure 3 shows the morphology of the plasmid containing ARGs in ARB after treatment with different techniques observed by atomic force microscopy.
  • Figure 3a shows the morphology of the plasmid before treatment
  • Figure 3b shows the morphology of the plasmid after electrolysis
  • Figure 3c shows the morphology of the plasmid after chlorine oxidation
  • Figure 3d shows the morphology of the plasmid after UV irradiation
  • Figure 3e shows the morphology of the plasmid after UV/E-Cl 2 treatment.
  • Figure 4 shows the removal of i-ARGs by UV/E-Cl 2 technology under different currents (a) and different chloride ion concentrations (b).
  • An electrode group including at least one pair of anode and cathode is fixed vertically and parallelly in a reaction device and immersed in the water body to be treated.
  • the anode and cathode are respectively connected to the positive electrode and negative electrode of a power supply.
  • the anode electrode can be a titanium-plated ruthenium-iridium electrode, a titanium dioxide electrode, a titanium dioxide nanotube electrode, a boron-doped diamond electrode, etc.
  • the cathode electrode can be a platinum electrode, a stainless steel electrode or a titanium electrode, etc.
  • the UV lamp can be selected from various types of mercury lamps or UV-LED lamps. One embodiment is to insert the UV lamp into the water to be treated; another embodiment is to place the UV lamp above the water to be treated.
  • the wastewater containing chloride ions, ARBs and/or ARGs is injected into the reaction device.
  • the reaction device can be a batch device or a continuous flow device, and the residence time per liter of water to be treated is 5s to 10min.
  • the water samples to be treated in the embodiments are all the same groundwater with a pH value of 7.5.
  • the initial ARB (E. coli TOP10) concentration of the water sample is ⁇ 10 7 CFU/mL
  • the initial concentration of each i-ARG (tetA, sul1, sul2, ermB) is ⁇ 10 8 copies/ ⁇ L DNA
  • the chloride ion concentration is 55-300 mg/L.
  • the chloride ion concentration is adjusted by adding different amounts of sodium chloride, potassium chloride, etc.
  • the ARB concentration was determined by the dilution plate method, and the ARGs concentration was determined by the q-PCR method.
  • the initial chloride ion concentration in the water sample to be treated is 150 mg/L.
  • 0.7L of the water sample to be treated is added to the batch reactor, and a set of titanium-plated ruthenium-iridium anodes and stainless steel cathodes are vertically and parallelly inserted into the reactor to immerse them in water.
  • the electrodes are connected to a DC power supply correspondingly, and a UV lamp is inserted for irradiation.
  • the distance between the two electrodes is 1 cm, and the distance between the UV lamp and the anode is 1 cm.
  • the reactor is placed on a magnetic stirrer to mix the treated water sample evenly.
  • the anode is a titanium-plated ruthenium-iridium electrode, with a size of 4cm ⁇ 12cm;
  • the cathode is a stainless steel electrode, with a size of 4cm ⁇ 12cm; when the DC power supply is turned on, the current at both ends of the anode and cathode is 200mA.
  • the UV lamp is a 10W low-pressure mercury lamp, and the emission wavelength is 254nm.
  • the cathode and anode settings and the current size at both ends are the same as the above-mentioned UV/E-Cl 2 treatment conditions, except that there is no need to insert UV lamp irradiation.
  • the plasmid in the ARB was a complete long chain or ring; after electrolysis, chlorine oxidation and UV irradiation treatment alone, the plasmid containing ARGs was interrupted, but some fragments were still relatively long and may carry more resistance gene information; after UV/E-Cl 2 treatment, the plasmid containing ARGs was almost completely broken into small fragments, which can effectively prevent the horizontal transfer of resistance genes.
  • Embodiment 1 the anode and cathode currents in Embodiment 1 are replaced with 100 mA.
  • the treatment time was 5 min, and the removal effects of the four i-ARGs, sul2, sul1, tetA and ermB, were 4.8-log, 5.7-log, 5.4-log and 5.7-log, respectively.
  • Embodiment 1 the anode and cathode currents in Embodiment 1 are replaced with 400 mA.
  • the treatment time was 5 min, and the removal effects of the four i-ARGs, sul2, sul1, tetA and ermB, were 5.3-log, 6.5-log, 6.3-log and 6.7-log, respectively.
  • Example 2 the chloride ion concentration in Example 2 is replaced with 55 mg/L.
  • the treatment time was 5 min, and the removal effects of the four i-ARGs, sul2, sul1, tetA and ermB, were 4.5-log, 5.1-log, 5.1-log and 5.3-log, respectively.
  • Example 2 the chloride ion concentration in Example 2 is replaced with 300 mg/L.
  • the treatment time was 5 min, and the removal efficiencies of the four i-ARGs, sul2, sul1, tetA, and ermB, were 4.9-log, 5.9-log, 6.5-log, and 6.5-log, respectively.
  • UV irradiation coupled in-situ chlorine generation technology (UV/E-Cl 2 ) of the present invention has a significant removal effect on ARB and ARGs.
  • Figures 1 to 3 show the comparison of the treatment effects of several methods, indicating that the treatment effect of the UV/E-Cl 2 method of the present invention is significantly better than that of electrolysis, chlorine oxidation or UV irradiation alone.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Electrochemistry (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
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Abstract

一种UV照射耦合原位产氯技术去除水中ARB和ARGs的方法，将包括至少一对阳极电极和阴极电极的电极组置于待处理水体中，且阳极电极和阴极电极分别与电源连接，待处理水体中含有氯离子、ARB和/或ARGs；将待处理水体置于UV灯照射范围内；连通电源，阳极电极和阴极电极之间形成电场，使待处理水体中的氯离子在阳极电极表面失去电子产生Cl 2，Cl 2与水或/和氨继续反应生成HClO、ClO –或/和氯胺，并进一步在UV照射下使自由氯分解生成·OH和RCS(如Cl·，Cl 2 -·和ClO·)，从而能够快速高效地灭活水体中抗性细菌和抗性基因。

Description

UV照射耦合原位产氯技术去除水中ARB和ARGs的方法 技术领域
本发明属于水处理技术领域，具体涉及一种UV照射耦合原位产氯技术去除水中抗性细菌和抗性基因的方法。
背景技术
随着抗生素的广泛使用，抗生素耐药性已在微生物中出现，其对环境安全和人类健康构成潜在威胁，已成为全球关注的问题。抗性细菌(ARB)和抗性基因(ARGs)已在各种环境介质中被检测到，尤其是污水处理厂等。污水中的ARB和ARGs通过水体排放、径流等过程会传播到饮用水水源中，包括地下水和地表水系统。
在实际水处理中，UV照射和次氯酸消毒是两种常用的消毒技术。在UV照射下，微生物细胞中的核酸可形成嘧啶二聚体，导致基因突变和结构破坏，从而灭活细菌。然而，在可见光下，嘧啶二聚体可以被细胞内产生的光解酶修复，导致基因恢复正常，从而使细菌从亚致死状态复活。在氯消毒过程中，不同碱基序列的ARGs对氯的敏感性不同。为了有效去除所有ARGs，需要添加高剂量的氯(>80mg Cl2min L–1)。高剂量的氯与水中的天然有机质反应，很容易产生高浓度的消毒副产物，造成二次污染。因此，为保障人体健康和环境安全，需要开发一种有效去除水体中ARB和ARGs的技术方法。
发明内容
本发明的目的是提供一种UV照射耦合原位产氯技术(UV/E-Cl2)去除水中ARB和ARGs的方法，通过对水体中的电极施加电流，氯离子在电极表面失去电子产生Cl2，Cl2与水或/和氨继续反应生成HClO、ClO–或/和氯胺，并进一步在UV照射下光解产生·OH和RCS(如Cl·，Cl2 -·和ClO·)，从而高效地去除水体中的ARB和ARGs。
本发明通过以下技术方案实现：
UV照射耦合原位产氯技术(UV/E-Cl2)去除水中ARB和ARGs的方法，具体为：
将包括至少一对阳极电极和阴极电极的电极组置于待处理水体中，且所述阳极电极和所述阴极电极分别与电源连接；
将待处理水体置于UV灯照射范围内；
连通电源，使得所述阳极电极、阴极电极之间形成电场，使待处理水体中的氯离子在所述阳极电极表面失去电子产生Cl2，Cl2与水或/和氨继续反应生成HClO、ClO–或/和氯胺；在所述UV灯照射下，HClO、ClO–或/和氯胺光解生成活性物种包括·OH和RCS，将待处理水体中的ARB和ARGs灭活；
所述待处理水体中含有氯离子、ARB和/或ARGs。
进一步地，所述阳极电极为钛镀钌铱电极、二氧化钛电极、二氧化钛纳米管电极或硼掺金刚石电极。
进一步地，所述阴极电极为铂电极、不锈钢电极或钛电极。
进一步地，所述阳极电极和阴极电极的电流I选用10≤I≤1000mA。
进一步地，所述UV灯为汞灯或UV-LED灯。
进一步地，所述ARGs包括胞内ARGs(i-ARGs)和胞外ARGs(e-ARGs)。
进一步地，所述ARB为质粒上含有ARGs的细菌。
进一步地，所述待处理水体采用批次处理或连续流处理。
更进一步地，每升待处理水体采用的时间为5s～10min。
本发明的方法协同电化学氧化和UV的作用，可以高效快速地灭活ARB和ARGs；处理方法简便易行，可通过调节电流大小灵活控制出水消毒效果；无需存储和消耗大量氧化剂，绿色安全。
附图说明
图1a为不同技术对ARB的去除效果图，图1b为UV照射后ARB的光复活情况。
图2为不同技术对i-ARGs(a)和e-ARGs(b)的去除效果图。
图3为通过原子力显微镜观察到的经不同技术处理后ARB中含ARGs的质粒的形貌。其中，图3a为处理前质粒形貌，图3b为电解后质粒形貌，图3c为氯氧化后质粒形貌，图3d为UV照射后质粒形貌，图3e为UV/E-Cl2处理后质粒形貌。
图4为不同电流(a)和不同氯离子浓度(b)下，UV/E-Cl2技术对i-ARGs的去除情况。
实施方式
下面结合附图对本发明的具体实施方式及工作过程作进一步的说明。
将包括至少一对阳极和阴极的电极组竖直平行地固定在反应装置中，并没入待处理水体中，阳极和阴极分别与电源的正极和负极连接。
阳极电极选用钛镀钌铱电极、二氧化钛电极、二氧化钛纳米管电极、硼掺金刚石电极等。阴极电极选用铂电极、不锈钢电极或钛电极等。
UV灯能够选用各种类型的汞灯或UV-LED灯。其中一种实施方式为，将UV灯插入待处理水体中；另一种实施方式为，将UV灯置于待处理水体上方。
将含有氯离子、ARB和/或ARGs的污水注入反应装置中。
接通电源，使得阳极电极和阴极电极的电流I为10≤I≤1000mA，此时水体中的氯离子在阳极电极表面失去电子产生Cl2，Cl2与水或/和氨继续反应生成HClO、ClO–或/和氯胺，并进一步在UV照射下分解产生·OH和RCS(如Cl·，Cl2 -·和ClO·)，从而高效地灭活水体中的ARB和ARGs。
反应装置可以为批次装置，也可以为连续流装置，每升待处理水体的停留时间为5s～10min。
以下通过实施例进一步说明本发明所述方法的实施效果。
实施例中所述待处理水样，均为同一种地下水，pH值为7.5，所述水样初始ARB(E.coliTOP10)浓度为～107CFU/mL，每种i-ARG(tetA、sul1、sul2、ermB)的初始浓度为～108copies/μL DNA，氯离子浓度为55～300mg/L，氯离子浓度通过添加不同量的氯化钠、氯化钾等来调节。
在以下实施例中，所ARB浓度测定采用稀释涂布平板法，ARGs浓度测定采用q-PCR法。
实施例1
待处理水样中初始氯离子浓度为150mg/L。将0.7L待处理水样加入到批次反应器中，在反应器中竖直且平行地插入一组钛镀钌铱阳极和不锈钢阴极使其浸没水中，将电极对应地与直流电源接通，同时插入UV灯照射。两电极间距为1cm，UV灯与阳极间距为1cm。同时反应器放置在磁力搅拌器上，使处理水样混合均匀。
UV/E-Cl2处理中，阳极为钛镀钌铱电极，大小为4cm×12cm；阴极不锈钢电极，大小为4cm×12cm；在直流电源通电下，阴阳极两端电流为200mA。UV灯为10W低压汞灯，发射光波长为254nm。
单独UV照射处理中，只需打开上述UV灯，不需要插入阴阳极，不需要接通连接电极的直流电源。
单独电解处理中，阴阳极设置以及两端电流大小与上述UV/E-Cl2处理条件相同，只是不需要插入UV灯照射。
单独氯氧化处理中，只需在批次反应器中的待处理水样中投加次氯酸钠溶液，使反应器中初始氯浓度为2.35mg Cl2/L。不需要插入阴阳极，不需要插入UV灯照射。
在单独UV照射和UV/E-Cl2处理时间约5s时，ARB达到5-log以上的灭活(图1a)。但单独UV照射的出水在可见光下放置48h后，ARB的浓度显著升高(图1b)，说明ARB经单独UV照射后存在明显的光复活现象，而经UV/E-Cl2处理后没有发现ARB光复活现象。
经UV/E-Cl2处理5min后，四种i-ARGs达到～5-log以上的灭活(图2a)，且e-ARGs的浓度没有增加，而是几乎完全去除(图2b)。
如图3所示，未经处理前，ARB体内的质粒是一条完整的长链或环；单独电解、氯氧化和UV照射处理后，含ARGs的质粒虽被打断，但一些碎片仍较长，可能会携带更多的抗性基因信息；而经UV/E-Cl2处理后，含ARGs的质粒几乎被完全打断成细小的碎片，可有效防止抗性基因的水平转移。
实施例2
本实施例将实施例1中阴阳极电流大小替换为100mA。
处理时间5min，sul2、sul1、tetA和ermB四种i-ARGs的去除效果分别为4.8-log、5.7-log、5.4-log和5.7-log。
实施例3
本实施例将实施例1中阴阳极电流大小替换为400mA。
处理时间5min，sul2、sul1、tetA和ermB四种i-ARGs的去除效果分别为5.3-log、6.5-log、6.3-log和6.7-log。
实施例4
本实施例将实施例2中氯离子浓度替换为55mg/L。
处理时间5min，sul2、sul1、tetA和ermB四种i-ARGs的去除效果分别为4.5-log、5.1-log、5.1-log和5.3-log。
实施例5
本实施例将实施例2中氯离子浓度替换为300mg/L。
处理时间5min，sul2、sul1、tetA和ermB四种i-ARGs的去除效果分别为4.9-log、5.9-log、6.5-log和6.5-log。
从以上实施例可以看出，本发明所述UV照射耦合原位产氯技术(UV/E-Cl2)对ARB和ARGs具有显著去除效果。图1～图3显示了几种方法处理效果的对比，说明本发明所述UV/E-Cl2方法处理效果明显优于单独电解、氯氧化或UV照射。
以上所述仅为本发明的优选实施例而已，并不用于限制本发明，对于本领域的技术人员来说，本发明可以有各种更改和变化。凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (9)

  1. UV照射耦合原位产氯技术去除水中ARB和ARGs的方法，其特征在于，
    将包括至少一对阳极电极和阴极电极的电极组置于待处理水体中，且所述阳极电极和所述阴极电极分别与电源连接，所述待处理水体中含有氯离子、ARB和/或ARGs；
    将待处理水体置于UV灯照射范围内；
    连通电源，使得所述阳极电极、阴极电极之间形成电场，使待处理水体中的氯离子在所述阳极电极表面失去电子产生Cl2，Cl2与水或/和氨继续反应生成HClO、ClO–或/和氯胺；在所述UV灯照射下，HClO、ClO–或/和氯胺光解生成活性物种包括·OH和RCS，将待处理水体中的ARB和ARGs灭活。
  2. 根据权利要求1所述的方法，其特征在于，所述阳极电极为钛镀钌铱电极、二氧化钛电极、二氧化钛纳米管电极或硼掺金刚石电极。
  3. 根据权利要求1所述的方法，其特征在于，所述阴极电极为铂电极、不锈钢电极或钛电极。
  4. 根据权利要求1所述的方法，其特征在于，所述阳极电极和阴极电极的电流I选用10≤I≤1000mA。
  5. 根据权利要求1所述的方法，其特征在于，所述UV灯为汞灯或UV-LED灯。
  6. 根据权利要求1所述的方法，其特征在于，所述ARGs包括胞内ARGs和胞外ARGs。
  7. 根据权利要求1所述的方法，其特征在于，所述ARB为质粒上含有ARGs的细菌。
  8. 根据权利要求1所述的方法，其特征在于，所述待处理水体采用批次处理或连续流处理。
  9. 根据权利要求8所述的方法，其特征在于，每升待处理水体采用的时间为5s～10min。
PCT/CN2024/097468 2023-06-16 2024-06-05 UV照射耦合原位产氯技术去除水中ARB和ARGs的方法 Ceased WO2024255658A1 (zh)

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