WO2024143479A1 - 防汚部材、及び、これを用いたディスプレイ、タッチパネル並びにセンサー、及び、防汚部材の製造方法 - Google Patents

防汚部材、及び、これを用いたディスプレイ、タッチパネル並びにセンサー、及び、防汚部材の製造方法 Download PDF

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Publication number
WO2024143479A1
WO2024143479A1 PCT/JP2023/046965 JP2023046965W WO2024143479A1 WO 2024143479 A1 WO2024143479 A1 WO 2024143479A1 JP 2023046965 W JP2023046965 W JP 2023046965W WO 2024143479 A1 WO2024143479 A1 WO 2024143479A1
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Prior art keywords
group
antifouling
member according
producing
integer
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PCT/JP2023/046965
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English (en)
French (fr)
Japanese (ja)
Inventor
正憲 木村
木田　信嗣
尚志 三橋
健 前平
香織 小澤
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Daikin Industries Ltd
Momentive Performance Materials Japan LLC
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Daikin Industries Ltd
Momentive Performance Materials Japan LLC
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Priority to CN202380089591.1A priority Critical patent/CN120418693A/zh
Priority to KR1020257024728A priority patent/KR20250126818A/ko
Priority to JP2024567938A priority patent/JPWO2024143479A1/ja
Publication of WO2024143479A1 publication Critical patent/WO2024143479A1/ja
Priority to US19/250,835 priority patent/US20260103422A1/en
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/02—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a matt or rough surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/76—Hydrophobic and oleophobic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/31—Pre-treatment

Definitions

  • the present invention relates to an anti-fouling member, a display, a touch panel, and a sensor that use the same, and a method for manufacturing the anti-fouling member.
  • Patent Document 1 JP 2014-218639 A
  • Patent Document 2 JP 2017-082194 A
  • a method for manufacturing an antifouling member includes a base formation step and an antifouling layer formation step.
  • a base layer may be formed on one surface of the substrate.
  • an antifouling layer containing a perfluoropolyether-containing silane compound may be formed on the base layer.
  • the base layer may have nano-order irregularities.
  • the anti-stain layer may be formed at least on the concave portions of the irregularities.
  • the base forming step may include a drying step and a step of forming irregularities.
  • the drying step the base resin composition may be applied to the substrate and dried.
  • irregularity forming step irregularities may be formed in the dried base resin composition.
  • the base resin composition may include a silicone resin containing a T unit structure and a Q unit structure.
  • the step of forming irregularities in the dried base resin composition may include pretreating the dried base resin composition to modify the T unit structure to silica.
  • the pretreatment may be performed by exposure to light with a wavelength of 150 to 200 nm.
  • the pretreatment may be performed by exposure so that the integrated illuminance is in the range of 200 to 6000 mJ/cm 2 .
  • the pretreatment may be performed by applying Ar/ O2 mixed gas plasma within the power range of 0.2 to 1.0 kW.
  • the pretreatment may be performed by applying Ar/ O2 mixed gas plasma at a flow rate of 2000 to 5000 sccm and an oxygen fraction in the range of 0.03 to 0.4.
  • the drying step in which the base resin composition is applied to the substrate and dried may be performed at a temperature of 100 to 150°C for 10 to 120 minutes.
  • the base formation step may further include a step of applying a primer composition onto the substrate prior to the step of applying and drying the base formation resin composition onto the substrate.
  • the substrate may be glass or resin.
  • the average pitch width of the convex portions of the unevenness may be 5 to 18 nm.
  • the surface roughness (Rz) of the unevenness may be 3 to 15 nm.
  • the contact angle when water comes into contact with one side may be 105 to 120°.
  • the pencil hardness of one side may be HB or higher.
  • the anti-fouling member may be used to cover at least a portion of the display area of the display.
  • the anti-fouling member may be used to cover at least a portion of the touch area of the touch panel.
  • an antifouling member comprising a substrate, a base layer provided on the substrate, and an antifouling layer provided on the base layer.
  • the ⁇ Haze of the antifouling layer side before and after the Taber abrasion test may be 8 or less.
  • the contact angle of water on the antifouling layer side after the Taber abrasion test may be 85° or more.
  • the base layer may contain a silicone resin.
  • the silicone resin may contain a Q unit structure and a T unit structure.
  • the antifouling member 10 comprises a substrate 110, a base layer 120, and an antifouling layer 130, and the surface of the base layer 120 has nano-order irregularities.
  • the substrate 110 has the role of supporting the unevenness and the antifouling layer 130 provided on the antifouling member 10.
  • the substrate 110 can be selected from various materials depending on the purpose for which the antifouling member 10 is used.
  • the substrate 110 may be formed of any material, including glass, resin, metal, ceramics, semiconductors, fiber materials, fur, leather, wood, porcelain, and stone.
  • the antifouling member 10 is provided on an optical product such as a display or touch panel or a component thereof, the substrate 110 may be formed of a transparent material such as glass or resin.
  • the substrate 110 may have any shape as long as there is a place where unevenness can be provided, and may be, for example, plate-shaped.
  • the underlayer 120 is provided on one side of the substrate 110 and is a layer that holds the antifouling layer 130.
  • the underlayer 120 may further function as a hard coat layer that provides abrasion resistance to the antifouling member 10.
  • the underlayer 120 may be made of a material that is abrasion resistant, and may be made of, for example, an inorganic material such as silica or a metal oxide, or a relatively hard organic material such as a silicone resin, an acrylic resin, a melamine resin, or a urethane resin.
  • the base layer 120 is provided with projections and recesses.
  • the antifouling layer 130 is surrounded and protected by the projections, and the antifouling layer 130 fits into the recesses, so that the antifouling layer 130 is firmly bonded to the base layer 120.
  • the antifouling layer on the surface of the antifouling member is worn down due to friction such as wiping off dirt or long-term use, and the antifouling performance may not be sustained.
  • the antifouling layer 130 is firmly held by the projections and recesses, so that the antifouling performance can be sustained for a longer period of time. Furthermore, the nano-order projections and recesses ensure the transparency of the antifouling member 10.
  • the underlayer 120 may be made of a silicone resin having projections and recesses.
  • the silicone resin may contain Q unit structures and T unit structures.
  • the recesses of the projections may contain more T unit structures than the projections of the projections.
  • the underlayer 120 does not become too hard, and when applied to the substrate 110, the occurrence of cracks in deterioration tests such as heat resistance tests can be suppressed.
  • At least partially active silanol groups (Si-OH) may be exposed on the surfaces of the projections and recesses (especially the surface of the recesses). This can further strengthen the bond with the antifouling layer 130.
  • Si-OH silanol groups
  • the cross section of the convex parts of the unevenness may have a rectangular tip, a tapered or inversely tapered tip, a pointed tip, a curved tip such as a hemisphere, etc.
  • the average pitch width (average peak-to-peak length) of the convex portions of the unevenness may be 5 to 18 nm, and preferably 7 to 15 nm. If the average pitch width is equal to or less than a predetermined size, the transparency of the antifouling member 10 can be ensured. Furthermore, if the average pitch width is equal to or greater than a predetermined size, the antifouling layer 130 can be held more firmly.
  • the surface roughness (Rz) of the unevenness may be 3 to 15 nm, and preferably 5 to 15 nm. If the surface roughness (Rz) is equal to or less than a predetermined value, the transparency of the antifouling member 10 can be ensured. Furthermore, if the surface roughness (Rz) is equal to or greater than a predetermined value, the antifouling layer 130 can be held more firmly.
  • the anti-stain layer 130 is formed on the opposite side of the base material 110 of the underlayer 120 (i.e., the outermost surface of the anti-stain member 10) and prevents dirt and other deposits from adhering to the surface of the anti-stain member 10.
  • the anti-stain layer 130 may be formed at least in the concave portions of the unevenness of the underlayer 120. For example, as shown in FIG. 1, the anti-stain layer 130 may be formed only in the concave portions.
  • FIG. 3 shows an example of a flow of a method for manufacturing the antifouling member 10 of this embodiment.
  • the antifouling member 10 may be manufactured by performing at least a part of S100 to S200.
  • R f3 is a perfluoroalkyl group, preferably having 1 to 20 carbon atoms, more preferably 1 to 6.
  • R f3 may be linear or branched.
  • the linear group: CF 3 (CF 2 ) m3-1 (wherein m3 is 1 to 20, preferably 1 to 6) is preferred, more preferably CF 3 - or CF 3 (CF 2 ) 2 -, and particularly preferably CF 3 (CF 2 ) 2 -.
  • the -CxF2xO- unit may be linear or branched, and examples thereof include -CF2CF2CF2CF2CF2CF2CF2CF2O- , -CF2CF2CF2CF2CF2CF2O- , -CF2CF2CF2CF2CF2O- , -CF2CF2CF2CF2O- , -CF ( CF3) CF2O- , -CF2CF2O- , and -CF2O- .
  • y can be appropriately adjusted according to the desired number average molecular weight .
  • the preferred upper limit of y is 200 .
  • X2 is a hydroxyl group or a hydrolyzable group, and as the hydrolyzable group, the examples and preferred embodiments of the hydrolyzable group in X1 are applied.
  • r is an integer of 0 to 2, and from the viewpoint of excellent adhesion and durability, 0 or 1 is preferable, and 0 is more preferable.
  • X2 may be the same or different, but from the viewpoint of easy availability, it is preferable that they are the same.
  • the multiple groups B in the perfluoroalkyl group-containing silane compound may be the same or different.
  • the groups (B a ) may also be the same or different.
  • the sum of a, b, c, and d is preferably 30 or less, more preferably 20 or less, even more preferably 10 or less, and particularly preferably 5 or less.
  • the PFPE is -( OC4F8 ) c- (OC3F6 ) d- ( OC2F4 ) e- ( OCF2 ) f- (wherein c and d are each independently an integer of 0 to 30, e and f are each independently an integer of 1 to 200, preferably 5 to 200, more preferably 10 to 200, the sum of c, d, e and f is at least 5, preferably 10 or more, and the order of occurrence of each repeat unit in parentheses with the subscript c, d, e or f is arbitrary in the formula).
  • the PFPE is - ( OCF2CF2CF2CF2CF2 ) c- ( OCF2CF2CF2 ) d- ( OCF2CF2 ) e- ( OCF2 ) f- .
  • the j is an integer of 2 or more, preferably 3 or more, more preferably 5 or more, and 100 or less, preferably 50 or less.
  • OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 may be linear or branched, preferably linear.
  • the PFPE is preferably -(OC 2 F 4 -OC 3 F 6 ) j - or -(OC 2 F 4 -OC 4 F 8 ) j -.
  • Rf represents an alkyl group having 1 to 16 carbon atoms which may be substituted with one or more fluorine atoms.
  • Rf is preferably an alkyl group having 1 to 16 carbon atoms substituted with one or more fluorine atoms, more preferably a CF 2 H—C 1-15 fluoroalkylene group, and even more preferably a perfluoroalkyl group having 1 to 16 carbon atoms.
  • the perfluoroalkyl group having 1 to 16 carbon atoms may be linear or branched, and is preferably a linear or branched perfluoroalkyl group having 1 to 6 carbon atoms, particularly preferably 1 to 3 carbon atoms , and more preferably a linear perfluoroalkyl group having 1 to 3 carbon atoms, specifically -CF3 , -CF2CF3 , or -CF2CF2CF3 .
  • R 22 each occurrence independently represents a hydrogen atom or an alkyl group having 1 to 22 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms.
  • n1 is independently an integer of 0 to 3 for each (-SiR 21 n1 R 22 3-n1 ) unit, preferably an integer of 1 to 3, and more preferably an integer of 3. However, in the formula, all n1s are not 0 at the same time. In other words, at least one R 21 is present in the formula.
  • ⁇ is an integer of 1 to 9
  • ⁇ ' is an integer of 1 to 9.
  • ⁇ and ⁇ ' are determined according to the valence of X3
  • formula (A1) the sum of ⁇ and ⁇ ' is the same as the valence of X5 .
  • X5 is a decavalent organic group
  • the sum of ⁇ and ⁇ ' is 10, and for example, ⁇ is 9 and ⁇ ' is 1, ⁇ is 5 and ⁇ ' is 5, or ⁇ is 1 and ⁇ ' is 9.
  • ⁇ and ⁇ ' are 1.
  • ⁇ is a value obtained by subtracting 1 from the value of the valence of X5 .
  • the above X5 is preferably a divalent to heptavalent, more preferably a divalent to tetravalent, and even more preferably a divalent organic group.
  • X 5 is a divalent to tetravalent organic group
  • ⁇ is 1 to 3
  • ⁇ ′ is 1.
  • X5 is a divalent organic group
  • ⁇ is 1
  • ⁇ ' is 1.
  • formulas (A1) and (A2) are represented by the following formulas (A1') and (A2').
  • Examples of X5 are not particularly limited, but include a single bond or the following formula: -(R 31 ) p ' -(X a ) q ' - [Wherein: R 31 independently at each occurrence represents a single bond, -(CH 2 ) s' -, or an o-, m-, or p-phenylene group, preferably -(CH 2 ) s' -; s' is an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3, even more preferably 1 or 2; X a independently at each occurrence represents -(X b ) l' -; X b independently in each occurrence represents a group selected from the group consisting of -O-, -S-, o-, m- or p-phenylene group, -C(O)O-, -Si(R 33 ) 2 -, -(Si(R 33 ) 2 O) m'
  • R 31 and X a (typically the hydrogen atoms of R 31 and X a ) may be substituted with one or more substituents selected from a fluorine atom, a C 1-3 alkyl group, and a C 1-3 fluoroalkyl group.
  • l' is 1.
  • X 5 is -(R 31 ) p' -(X a ) q' -R 32 -.
  • R 32 represents a single bond, -(CH 2 ) t' -, or an o-, m-, or p-phenylene group, and is preferably -(CH 2 ) t' -.
  • t' is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3.
  • R 32 (typically the hydrogen atom of R 32 ) may be substituted with one or more substituents selected from a fluorine atom, a C 1-3 alkyl group, and a C 1-3 fluoroalkyl group.
  • X5 is -Xf- , —X f —C 1-20 alkylene group, -Xf- ( CH2 ) s'- Xc- , -Xf- ( CH2 ) s'- Xc- ( CH2 ) t'- -Xf - Xd- , or -Xf-Xd- ( CH2 ) t'-
  • s′ and t′ are as defined above.
  • Xf is an alkylene group having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, more preferably 1 to 2 carbon atoms, such as a methylene group.
  • the hydrogen atoms in Xf may be, and are preferably, substituted with one or more substituents selected from a fluorine atom, a C1-3 alkyl group, and a C1-3 fluoroalkyl group.
  • Xf may be linear or branched, and is preferably linear.
  • X5 is A single bond, or -Rf'-X 13 -
  • X 13 is a C 1-20 alkylene group, -( CH2 ) s'- Xc- , -( CH2 ) s'- Xc- ( CH2 ) t'- , -X d -, or -Xd- ( CH2 ) t'-
  • s′ and t′ are as defined above.
  • Rf' is a single bond or -(C l' F 2l' )-; l' is an integer from 1 to 4. It may be a group represented by the formula:
  • Xc is -O-, -S-, -C(O)O-, -CONR 34- , -O-CONR 34 -, -Si( R33 ) 2- , -(Si(R 33 ) 2 O) m ' -Si(R 33 ) 2 -, —O—(CH 2 ) u′ -(Si(R 33 ) 2 O) m′ -Si(R 33 ) 2 —, —O—(CH 2 ) u′ —Si(R 33 ) 2 —O—Si(R 33 ) 2 —CH 2 CH 2 —Si(R 33 ) 2 —O—Si(R 33 ) 2 —, -O-(CH 2 ) u ' -Si(OCH 3 ) 2 OSi(OCH 3 ) 2 -, —CONR 34 —(CH 2 ) u ′ -(Si(R 33 ) 2- ,
  • X5 is -Xf- , —X f —C 1-20 alkylene group, -Xf- ( CH2 ) s'- Xc- , -Xf- ( CH2 ) s' - Xc- ( CH2 ) t'- , -Xf - Xd- , or -Xf-Xd- ( CH2 ) t'-
  • X f , s′, and t′ are as defined above.
  • Xc is —O— or —CONR 34 —
  • Xd is -CONR 34 -
  • R 34 independently represents a hydrogen atom, a phenyl group, or a C 1-6 alkyl group (preferably a methyl group) in each occurrence. It is a group represented by the following formula:
  • X5 is -Xf- ( CH2 ) s'- Xc- , -Xf- ( CH2 ) s' - Xc- ( CH2 ) t'- , -Xf - Xd- , or -Xf-Xd- ( CH2 ) t'-
  • X f , s′, and t′ are as defined above.
  • Xc is -CONR 34 -
  • Xd is -CONR 34 -
  • R 34 at each occurrence, independently represents a hydrogen atom, a phenyl group, or a C 1-6 alkyl group (preferably a methyl group). It is a group represented by the following formula:
  • X5 is Single bond, a C 1-20 alkylene group, -( CH2 ) s'- Xc- ( CH2 ) t'- , or -Xd- ( CH2 ) t'- [In the formula, each symbol has the same meaning as above.] It could be.
  • --(C v H 2v )-- may be a straight chain or a branched chain, for example, --CH 2 CH 2 --, --CH 2 CH 2 CH 2 --, --CH(CH 3 )--, or --CH(CH 3 )CH 2 --.
  • the above X5 group may be substituted with one or more substituents selected from a fluorine atom, a C1-3 alkyl group and a C1-3 fluoroalkyl group (preferably a C1-3 perfluoroalkyl group).
  • X5 groups include, for example, the following groups:
  • each R 41 independently represents a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group;
  • D is -Rf'-X 15 -
  • X 15 is -CH2O ( CH2 ) 2- , -CH2O ( CH2 ) 3- , -CF2O ( CH2 ) 3- , -( CH2 ) 2- , -( CH2 ) 3- , -( CH2 ) 4- , -CONH-( CH2 )-, -CONH-( CH2 ) 2- , -CONH-( CH2 ) 3- , -CON( CH3 )-( CH2 ) 3- , -CON(Ph)-(CH 2 ) 3 - (wherein Ph means phenyl), and
  • each R 42 independently represents a hydrogen atom, a C 1-6 alkyl group or a C 1-6 alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group.
  • Rf' is a single bond or -(C l' F 2l' )-; l' is an integer from 1 to 4.
  • is a group represented by E is -(CH 2 ) n - (n is an integer from 2 to 6); D is bonded to the PFPE of the molecular backbone, and E is bonded to the group opposite the PFPE.
  • X5 include: A single bond, or -Rf'-X 10 - [In the formula, X10 is -CH2OCH2- , -CH2O ( CH2 ) 2- , -CH2O ( CH2 ) 3- , -CH2O ( CH2 ) 6- , —CF 2 —CH 2 —O—CH 2 —, -CF2 - CH2 -O-( CH2 ) 2- , -CF2 - CH2- O-( CH2 ) 3- , -CF2 - CH2- O-( CH2 ) 6- , -CH2O ( CH2 ) 3Si ( CH3 ) 2OSi ( CH3 ) 2 ( CH2 ) 2- , -CH2O ( CH2 ) 3Si ( CH3 ) 2OSi ( CH3 ) 2 ( CH2 ) 2- , -CH2O ( CH2 ) 3Si ( CH3 ) 2OSi ( CH3 ) 2 ( CH2 ) 2-
  • Rf' is a single bond or -(C l' F 2l' )-; l' is an integer from 1 to 4. and the like.
  • X5 represents Xe' .
  • Xe' is a single bond, an alkylene group having 1 to 6 carbon atoms , -R51 - C6H4 - R52- , -R51 -CONR4 - R52- , -R51-CONR4- C6H4 - R52- , -R51 - CO -R52-, -R51-CO-C6H4-R52-, -R51-SO2NR4-R52- , -R51 - SO2NR4 - C6H4 - R52- , -R51 - SO2 - R52- or -R51 - SO2 - C6H4 - R52- .
  • R 51 and R 52 each independently represent a single bond or an alkylene group having 1 to 6 carbon atoms, preferably a single bond or an alkylene group having 1 to 3 carbon atoms.
  • R 4 has the same meaning as above.
  • the alkylene group is substituted or unsubstituted, preferably unsubstituted. Examples of the substituent of the alkylene group include a halogen atom, preferably a fluorine atom.
  • the alkylene group is linear or branched, preferably linear.
  • X e′ is Single bond, -Xf- , an alkylene group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms; -Xf - C1-6 alkylene group, preferably -Xf - C1-3 alkylene group, more preferably -X f -C 1-2 alkylene group, —C 6 H 4 —R 52′ —, -CONR4' - R52'- , -CONR 4 ' -C 6 H 4 -R 52 ' -, -Xf- CONR4' - R52'- , -Xf- CONR4' - C6H4 - R52'- , -CO-R 52 ' -, —CO—C 6 H 4 —R 52′ —, -SO2NR4' - R52'- , -SO2NR4' - C6H4 - R52'- , -SO2 - R52''
  • X e′ is preferably -Xf- , an alkylene group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms; -Xf - C1-6 alkylene group, preferably -Xf - C1-3 alkylene group, more preferably -X f -C 1-2 alkylene group, -CONR4' - R52'- , -CONR4' - C6H4 - R52'- , -Xf- CONR4' - R52'- , -Xf- CONR4' - C6H4 - R52'- , -R 51 ' -CONR 4 ' -, -R51' - CONR4' - C6H4- , -CONR 4 ' -, -CONR 4 ' -, -CONR 4 ' -C 6 H 4 -, -Xf - CONR4'-, -Xf- CONR4' -
  • X e′ is more preferably -CONR4' - R52'- , -CONR4' - C6H4 - R52'- , -Xf- CONR4' - R52'- , -Xf- CONR4' - C6H4 - R52'- , -R 51 ' -CONR 4 ' -, -R51' - CONR4' - C6H4- , -CONR 4 ' -, -CONR 4 ' -C 6 H 4 -, -X f -CONR 4 ' -, or -Xf- CONR4' -C6H4- , It could be.
  • preferred X e′ are an alkylene group having 1 to 6 carbon atoms, perfluoroalkylene groups having 1 to 6 carbon atoms (for example, -CF2- , -( CF2 ) 2- , etc.); -CF2 - C1-6 alkylene group, -CONH-, -CONH- CH2- , -CONH-( CH2 ) 2- , -CONH-( CH2 ) 3- , -CF2CONH- , -CF2CONHCH2- , -CF2CONH ( CH2 ) 2- , -CF2CONH ( CH2 ) 3- , -CON( CH3 )-, -CON( CH3 ) -CH2- , -CON( CH3 )-( CH2 ) 2- , -CON( CH3 )-( CH2 ) 3- , -CF2- CON( CH3 )-, -CF2 -CON( CH3 ) CH2- , -CF2 CON(
  • more preferred X e′ are -CONH-, -CONH- CH2- , -CONH-( CH2 ) 2- , -CONH-( CH2 ) 3- , -CF2CONH- , -CF2CONHCH2- , -CF2CONH ( CH2 ) 2- , -CF2CONH ( CH2 ) 3- , -CON( CH3 )-, -CON( CH3 ) -CH2- , -CON( CH3 )-( CH2 ) 2- , -CON( CH3 )-( CH2 ) 3- , -CF2- CON( CH3 )-, -CF2 -CON( CH3 ) CH2- , -CF2 -CON( CH3 )-( CH2 ) 2- , -CF2 -CON( CH3 )-( CH2 ) 3- , —CH 2 —CONH—, —CH 2 —CONH—CH 2 —, --
  • Rf and PFPE are defined as in the above formulas (A1) and (A2).
  • X 7 each independently represents a single bond or a divalent to decavalent organic group.
  • X 7 is understood to be a linker that connects the perfluoropolyether portion (Rf-PFPE portion or -PFPE- portion) that mainly provides water repellency and surface slipperiness, and the silane portion (specifically, -SiR a k1 R b l1 R c m1 group) that provides the ability to bond to the substrate. Therefore, X 7 may be any organic group as long as the compounds represented by formulas (B1) and (B2) can exist stably.
  • ⁇ is an integer of 1 to 9
  • ⁇ ' is an integer of 1 to 9.
  • ⁇ and ⁇ ' are determined according to the valence of X7
  • formula (B1) the sum of ⁇ and ⁇ ' is the same as the valence of X7 .
  • X7 is a decavalent organic group
  • the sum of ⁇ and ⁇ ' is 10, and for example, ⁇ is 9 and ⁇ ' is 1, ⁇ is 5 and ⁇ ' is 5, or ⁇ is 1 and ⁇ ' is 9.
  • ⁇ and ⁇ ' are 1.
  • ⁇ is a value obtained by subtracting 1 from the value of the valence of X7 .
  • the above X7 is preferably a divalent to heptavalent, more preferably a divalent to tetravalent, and even more preferably a divalent organic group.
  • X 7 is a divalent to tetravalent organic group, ⁇ is 1 to 3, and ⁇ ′ is 1.
  • X7 is a divalent organic group
  • ⁇ is 1
  • ⁇ ' is 1.
  • formulas (B1) and (B2) are represented by the following formulas (B1') and (B2').
  • Z 1 above is preferably a C 1-6 alkylene group, -(CH 2 ) g -O-(CH 2 ) h - (wherein g is an integer from 1 to 6 and h is an integer from 1 to 6) or -phenylene-(CH 2 ) i - (wherein i is an integer from 0 to 6), and is more preferably a C 1-3 alkylene group.
  • These groups may be substituted by one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group.
  • R 71 independently represents R a′ at each occurrence, where R a′ has the same meaning as R a .
  • the number of Si atoms linearly linked via Z 1 groups is a maximum of 5. That is, when at least one R 71 is present in the above R a , there are two or more Si atoms linearly linked via Z 1 groups in R a , and the number of Si atoms linearly linked via such Z 1 groups is a maximum of 5. Note that the "number of Si atoms linearly linked via Z 1 groups in R a " is equal to the number of repetitions of -Z 1 -Si- linearly linked in R a .
  • Z a Z 1 group
  • R 72 in each occurrence independently represents a hydroxyl group or a hydrolyzable group.
  • hydrolyzable group means a group that can undergo a hydrolysis reaction.
  • R 72 is --OR, where R represents a substituted or unsubstituted C 1-3 alkyl group, more preferably a methyl group.
  • R 73 each independently represents a hydrogen atom or a lower alkyl group.
  • the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group.
  • the hydroxyl group is not particularly limited, and may be one generated by hydrolysis of a hydrolyzable group. More preferably, R b is -OR (wherein R represents a substituted or unsubstituted C 1-3 alkyl group, and more preferably a methyl group).
  • R d independently at each occurrence represents -Z 2 -CR 81 p2 R 82 q2 R 83 r2 .
  • R 85 independently represents a hydroxyl group or a hydrolyzable group at each occurrence.
  • R 85 is --OR, where R represents a substituted or unsubstituted C 1-3 alkyl group, more preferably an ethyl group or a methyl group, especially a methyl group.
  • R 86 independently represents a hydrogen atom or a lower alkyl group.
  • the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group.
  • n2 independently represents an integer of 0 to 3 for each (—Y—SiR 85 n2 R 86 3-n2 ) unit, and is preferably an integer of 1 to 3, more preferably 2 or 3, and further preferably 3.
  • the sum of p2, q2, and r2 is 3.
  • the above q2 is preferably 2 or more, for example, 2 or 3, and more preferably 3.
  • At least one of the terminal portions of R d may be -C(-Y-SiR 85 q2 R 86 r2 ) 2 or -C(-Y-SiR 85 q2 R 86 r2 ) 3 , preferably -C(-Y-SiR 85 q2 R 86 r2 ) 3.
  • the (-Y-SiR 85 q2 R 86 r2 ) unit is preferably (-Y-SiR 85 3 ).
  • all of the terminal portions of R d may be -C(-Y-SiR 85 q2 R 86 r2 ) 3 , preferably -C(-Y-SiR 85 3 ) 3 .
  • R e each occurrence independently represents -Y-SiR 85 n2 R 86 3-n2 , where Y, R 85 , R 86 and n2 are as defined above for R 82 .
  • Rf each occurrence independently represents a hydrogen atom, a hydroxyl group, or a lower alkyl group.
  • the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and even more preferably a methyl group.
  • Rf each occurrence independently represents a hydrogen atom or a lower alkyl group.
  • l2 is 2 or 3, preferably 3.
  • At least one q2 is 2 or 3, or at least one l is 2 or 3. That is, there are at least two -Y-SiR 85 n2 R 86 3-n2 groups in the formula.
  • the perfluoro(poly)ether group-containing silane compound represented by formula (C1) or formula (C2) can be produced by combining known methods.
  • the compound represented by formula (C1') in which X is divalent can be produced as follows, although this is not a limitation.
  • Rf' in each of the above embodiments can be a single bond.
  • the perfluoro(poly)ether group-containing silane compounds represented by the above formulae (A1), (A2), (B1), (B2), (C1) and (C2) may have a number average molecular weight of, but not limited to, 5 ⁇ 10 2 to 1 ⁇ 10 5.
  • the number average molecular weight may be preferably 2,000 to 30,000, more preferably 3,000 to 10,000, and even more preferably 3,000 to 8,000.
  • Such a "number average molecular weight” is measured by GPC (gel permeation chromatography) analysis.
  • the upper limit of the content of both-end compounds with respect to the total amount of one-end compounds and both-end compounds may be preferably 35 mol%, more preferably 30 mol%, even more preferably 20 mol%, even more preferably 15 mol% or 10 mol%.
  • the ratio of the both-end compounds to the total of the one-end compounds and the both-end compounds is preferably 0.1 mol% to 30 mol%, more preferably 0.1 mol% to 20 mol%, even more preferably 0.2 mol% to 10 mol%, even more preferably 0.5 mol% to 10 mol%, particularly preferably 1 mol% to 10 mol%, for example, 2 mol% to 10 mol% or 5 mol% to 10 mol%.
  • R F1 is, independently at each occurrence, Rf 1 -R F -O q -;
  • R F2 is -Rf 2 p -R F -O q -;
  • Rf 1 at each occurrence, is independently a C 1-16 alkyl group optionally substituted by one or more fluorine atoms;
  • Rf2 is a C 1-6 alkylene group optionally substituted by one or more fluorine atoms;
  • R F is, independently at each occurrence, a divalent fluoropolyether group;
  • p is 0 or 1;
  • q independently at each occurrence, is 0 or 1;
  • R Si in each occurrence, is independently a monovalent group containing a Si atom having a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group bonded thereto; At least one R Si is
  • the isocyanuric skeleton-containing silane compound for example, the following compound having an isocyanuric skeleton described in WO2018/056413 can be used.
  • R 1 represents a monovalent organic group containing a polyether chain
  • X 1 and X 2 each independently represent a monovalent group
  • the polyether chain is a chain represented by the formula: -(OC 6 F 12 ) m11 -(OC 5 F 10 ) m12 -(OC 4 F 8 ) m13 -(OC 3 X 10 6 ) m14 -(OC 2 F 4 ) m15 -(OCF 2 ) m16 -
  • m11, m12, m13, m14, m15 and m16 each independently represent 0 or an integer of 1 or more
  • X 10 each independently represent H, F or Cl, and the order of occurrence of each repeating unit is arbitrary).
  • the antifouling layer 130 may be formed by depositing a fluorine-containing silane compound into an uneven surface using a deposition process such as PVD (such as vacuum deposition, sputtering, or resistance heating deposition) or CVD.
  • a deposition process such as PVD (such as vacuum deposition, sputtering, or resistance heating deposition) or CVD.
  • the anti-fouling layer 130 may be formed by dissolving a fluorine-containing silane compound in an organic solvent, applying the solution to the uneven surface, and drying the solution.
  • organic solvents include acetone, methyl ethyl ketone, methyl amyl ketone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (PGMEA), dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol monomethyl ether acetate, dipropylene glycol diacetate, tripropylene glycol, 3-methoxybutyl acetate (MBA), 1,3-butylene glycol diacetate, cyclohexanol acetate, dimethylformamide, dimethyl sulfoxide, methyl cellosolve, cellosol.
  • solvents examples include butyl acetate, butyl cellosolve, butyl carbitol, carbitol acetate, ethyl lactate, isopropyl alcohol, methanol, ethanol, chloroform, HFC141b, HCHC225, hydrofluoroether, pentane, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, petroleum ether, tetrahydrofuran, 1,4-dioxane, methyl isobutyl ketone, butyl acetate, 1,1,2,2-tetrachloroethane, 1,1,1-trichloroethane, trichloroethylene, perchloroethylene, tetrachlorodifluoroethane, and trichlorotrifluoroethane, and one or more of these may be selected and used.
  • Application methods include various coating methods such as dip coating, spin coating, flow coating, spray coating, roll coating, and gravure coating, or printing methods such as letterpress printing and inkjet printing.
  • Drying may be performed under conditions that allow the organic solvent to evaporate and form a solid film of the antifouling layer 130. For example, it may be performed by heating at 100 to 200°C for 1 to 60 minutes. Note that since the condensation reaction itself proceeds even at low temperatures, drying may be performed under milder conditions than these (temperatures below 100°C for more than 60 minutes). For example, drying may be performed by leaving it at room temperature for a long period of time.
  • the antifouling layer 130 may be formed using a monomer, oligomer, polymer, filler such as silica, and other additives (catalyst, surfactant, polymerization inhibitor, sensitizer, etc.).
  • (A) Polymerizable coating agent monomers such as monofunctional and/or polyfunctional acrylates and methacrylates (hereinafter, acrylates and methacrylates are collectively referred to as "(meth)acrylates"), monofunctional and/or polyfunctional urethane (meth)acrylates, and monofunctional and/or polyfunctional epoxy (meth)acrylates, or (B) (b-1) thermosetting resins such as acrylic polymers, polycarbonate polymers, polyester polymers, polyamide polymers, polyimide polymers, polyethersulfone polymers, cyclic polyolefin polymers, fluorine-containing polyolefin polymers (PTFE, etc.), fluorine-containing cyclic amorphous polymers (CYTOP (registered trademark), Teflon (registered trademark) AF, etc.), and (b-2) curable monomers
  • the antifouling layer 130 may be formed by further using a fluoroalkyl silane oligomer mixture in addition to the perfluoroalkyl group-containing silane compound.
  • Q1 is a single bond or a divalent hydrocarbon group having 1 to 6 carbon atoms
  • the hydrocarbon group include linear or branched alkylene groups and groups having an amide group or an etheric oxygen atom between carbon atoms in a linear or branched alkylene group having 2 to 6 carbon atoms.
  • a linear alkylene group having 1 to 6 carbon atoms: -( CH2 ) t- (where t is an integer of 1 to 6) is preferred, more preferably -( CH2 ) 2- , -( CH2 ) 3- or -( CH2 ) 4- , and particularly preferably -( CH2 ) 2- .
  • R 1 is a monovalent hydrocarbon group having 1 to 6 carbon atoms, and examples of such groups include linear or branched alkyl groups. Among these, from the viewpoint of availability, linear or branched alkyl groups having 1 to 4 carbon atoms are preferred, and a methyl group or an ethyl group is more preferred. When multiple R 1s are present, they may be the same or different, but from the viewpoint of availability, they are preferably the same.
  • R examples include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl, and isobutyl groups; and substituted alkyl groups such as chloromethyl groups.
  • alkyl groups, particularly unsubstituted alkyl groups, are preferred, and methyl or ethyl groups are more preferred.
  • the hydroxyl group is not particularly limited, and may be one that is generated by hydrolysis of a hydrolyzable group.
  • X 1 is a chlorine atom
  • the reactivity is high and the hydrolysis reaction proceeds sufficiently without the addition of an acid catalyst.
  • a compound in which X 1 is a chlorine atom is preferably used.
  • p is an integer from 0 to 2, and is preferably 0 or 1, more preferably 0, in terms of excellent adhesion and durability.
  • Examples of the compound represented by formula (II) include the following: In the formula, examples and preferred embodiments of l, t, X 1 and R 1 are as described above.
  • Formula (I-1) CF 3 (CF 2 ) l-1 -(CH 2 ) t -SiX 1 3
  • Formula (I-2) CF 3 (CF 2 ) l-1 -(CH 2 ) t -SiR 1 X 1 2
  • the fluoroalkylsilane compound represented by formula (II) may be used alone or in combination of two or more kinds.
  • the fluoroalkylsilane compound represented by formula (II) can be produced by a general production method and is commercially available.
  • the fluoroalkylsilane oligomer is a product of hydrolysis of the (SiX 1 ) portions of two or more fluoroalkylsilane compounds represented by the above formula (II) and condensation with each other.
  • the fluoroalkylsilane oligomer may usually be a mixture mainly containing 2- to 14-mer polymers.
  • the degree of oligomerization/condensation can be measured by 29 Si-NMR and is represented by the integrals of the T0 species (40-48 ppm in 29 Si-NMR), T1 species (48-54 ppm), T2 species (54-63 ppm), and T3 species (63-75 ppm), respectively.
  • the oligomers are formed by hydrolysis of the compound of formula (II).
  • the oligomers may be formed by hydrolysis of the same or different compounds of formula (II).
  • the hydrolysis reaction of the compound of formula (II) with water may be carried out in the presence or absence of a catalyst.
  • Suitable catalysts include, but are not limited to, acid catalysts, alkali catalysts, organic amine catalysts, or metal catalysts.
  • the catalyst is selected from hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid, sodium hydroxide, potassium hydroxide, ammonia, triethylamine, titanium isopropoxide, or dibutyltin dilaurate. It will be appreciated that water may be provided as part of the aqueous catalyst composition.
  • the structure and composition of the above-mentioned fluoroalkylsilane oligomer can be analyzed by 1H -NMR, 29Si -NMR, GC (gas chromatography), and LC (liquid chromatography) analysis, and the composition and ratio of the mixture containing 2- to 14-mer polymers, the ratio and residual rate of hydrolyzable groups, the degree of condensation, etc. can be measured.
  • the number average molecular weight of the fluoroalkylsilane oligomer mixture may be preferably 300 or more, preferably 400 or more, more preferably 500 or more, and even more preferably 800 or more.
  • the number average molecular weight of the fluoroalkylsilane oligomer mixture may be preferably 4,500 or less, more preferably 4,000 or less, even more preferably 3,500 or less, and even more preferably 3,000 or less.
  • the "number average molecular weight" is measured by GPC (gel permeation chromatography) analysis.
  • the content ratio (OCH 3 /Si, molar ratio) of methoxy group (OCH 3 ) to silicon (Si) can be preferably 1.5 or more, more preferably 2.0 or more, and even more preferably 2.2 or more. By making this ratio 1.5 or more, the friction durability can be further improved.
  • the content ratio of methoxy group to silicon can be preferably 2.8 or less, more preferably 2.7 or less, and even more preferably 2.5 or less. By making this ratio 2.8 or less, the wear durability can be further improved.
  • the ratio of methoxy groups to silicon can be measured by 29 Si-NMR.
  • the amount of the fluoroalkylsilane oligomer mixture may be preferably 20% by mass or less, more preferably 10% by mass or less, based on the total amount of the fluoroalkylsilane oligomer mixture and the perfluoroalkyl group-containing silane compound.
  • the amount of the fluoroalkylsilane oligomer mixture may be preferably 0.1% by mass or more, more preferably 0.5% by mass or more, based on the total amount of the fluoroalkylsilane oligomer mixture and the perfluoroalkyl group-containing silane compound.
  • the anti-stain layer 130 is formed on the unevenness (unevenness of the substrate 110 or the undercoat layer 120) by carrying out steps S100 to S200. This allows the anti-stain layer 130 to be firmly bonded to the unevenness, thereby improving the abrasion resistance and durability of the anti-stain layer 130.
  • a polycarbonate substrate was used as the substrate, and the primer composition was applied onto the substrate and dried at 120°C for 30 minutes. After that, the undercoat resin composition was applied to the surface of the substrate to which the primer composition had been applied by dip coating to a thickness of 8 ⁇ m. After that, it was dried in a hot air drying oven at 120°C for 60 minutes.

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1033321A (ja) * 1996-07-24 1998-02-10 Sumitomo Chem Co Ltd 防汚性ディスプレイ用透明板及びその成形品
JP2005208290A (ja) * 2004-01-22 2005-08-04 Konica Minolta Opto Inc 防汚性光学薄膜、防汚性反射防止フィルム及びそれを用いた偏光板、表示装置
JP2013003383A (ja) * 2011-06-17 2013-01-07 Nissan Motor Co Ltd 耐摩耗性微細構造体及びその製造方法
US20170197896A1 (en) * 2014-08-27 2017-07-13 3M Innovative Properties Company Novel polyfluoroalkylated alkenes and silicon compounds prepared therefrom
WO2021177350A1 (ja) * 2020-03-04 2021-09-10 デクセリアルズ株式会社 光学積層体、物品、光学積層体の製造方法

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KR101743851B1 (ko) 2012-11-05 2017-06-05 다이킨 고교 가부시키가이샤 퍼플루오로(폴리)에테르기 함유 실란 화합물
EP3333172B1 (en) 2015-07-31 2020-10-21 Daikin Industries, Ltd. Silane compound containing perfluoro(poly)ether group

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1033321A (ja) * 1996-07-24 1998-02-10 Sumitomo Chem Co Ltd 防汚性ディスプレイ用透明板及びその成形品
JP2005208290A (ja) * 2004-01-22 2005-08-04 Konica Minolta Opto Inc 防汚性光学薄膜、防汚性反射防止フィルム及びそれを用いた偏光板、表示装置
JP2013003383A (ja) * 2011-06-17 2013-01-07 Nissan Motor Co Ltd 耐摩耗性微細構造体及びその製造方法
US20170197896A1 (en) * 2014-08-27 2017-07-13 3M Innovative Properties Company Novel polyfluoroalkylated alkenes and silicon compounds prepared therefrom
WO2021177350A1 (ja) * 2020-03-04 2021-09-10 デクセリアルズ株式会社 光学積層体、物品、光学積層体の製造方法

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