WO2022270661A1

WO2022270661A1 - Dissolution precipitation device for ions or salt components present on substrate surface and dissolution precipitation method using same

Info

Publication number: WO2022270661A1
Application number: PCT/KR2021/008099
Authority: WO
Inventors: 최용규
Original assignee: 주식회사 선반도체
Priority date: 2021-06-25
Filing date: 2021-06-28
Publication date: 2022-12-29
Also published as: KR102645023B1; KR20230000785A

Abstract

The present invention relates to a dissolution precipitation device for ions and salt components present on the surface of a substrate and a dissolution method using same. Particularly, the dissolution precipitation device for ions and salt components present on the surface of a substrate, according to the present invention, comprises: a chamber in which cleaning treatment is performed on the substrate loaded; a grip device which is provided in the chamber and fixes the substrate; and a fan filter unit (FFU) which is installed at one side of the chamber to generate a blowing airflow of clean air in the chamber, wherein the chamber is composed of two regions divided around the substrate, so as to have a closed structure without mutual interference.

Description

Apparatus for dissolution and precipitation of ions or salt components present on the surface of a substrate and method for dissolution and precipitation using the same

The present invention relates to an apparatus for dissolving/precipitating ions or salt components present on the surface of a substrate and a method for dissolving/precipitating using the same, and more specifically, to a chamber in which a substrate is mounted is maintained at a temperature of the dew point to condense moisture into ions or salts. Ions present on the substrate surface configured to easily remove ions or salt components present on the substrate without desorption of the pellicle by evaporating moisture and ions by heating the substrate to a temperature above the dew point after the components are dissolved and liberated. Or it relates to a dissolution/precipitation device for a salt component and a dissolution/precipitation method using the same.

A photomask is an image of a microcircuit of a semiconductor on a quartz or glass substrate. For example, a semiconductor integrated circuit and an LCD pattern are made 1 to 5 times larger than the actual size by using a chromium thin film applied on a transparent quartz substrate. it is etched

In addition, the fine pattern of the photomask is formed on the substrate through a photolithography process. In the photolithography process, a photoresist is uniformly applied on a substrate, a pattern on a photomask is reduced, projected, and exposed using exposure equipment such as a stepper, and then a two-dimensional photoresist pattern is formed through a development process. say the process

If a foreign substance is attached to the photomask, a photoreaction such as scattering or absorption of light in an exposure process causes a decrease in photoresolution and a fatal defect in pattern formation on the substrate. Therefore, in order to protect the photomask from foreign substances, a protective means called a pellicle is mounted on the photomask during an exposure process.

By positioning the pellicle on the pattern of the photomask, even if foreign matter is attached to the pellicle, it is located at a height that does not affect the image of the substrate, and adverse effects caused by foreign matter in the exposure process can be excluded.

That is, a pellicle is installed above the pattern forming part of the photomask, and the pellicle is composed of a pellicle frame and a pellicle film.

Therefore, an adhesive is applied to the surface of the photomask, a pellicle frame is attached to the applied adhesive, and the pellicle film is positioned on the upper side of the pattern forming surface of the photomask to protect the fine pattern of the photomask.

Meanwhile, after using the photomask, the pellicle is removed from the photomask, and foreign substances including adhesives attached to the photomask are cleaned with cleaning equipment so that there is no problem in using the photomask again in the future.

If foreign substances such as adhesives remain on the photomask, when the photomask is reused, energy by the catalyst of light is added in the exposure process and acts as a haze defect that grows larger with each exposure. Since such growing foreign substances cause undesirable pattern transfer, foreign substances including adhesives must be effectively cleaned from the photomask.

Currently, photomask cleaning is mainly wet cleaning using a chemical such as a sulfuric acid-hydrogen peroxide mixture.

However, in the case of such wet cleaning, since fine particles of cleaning liquid or foreign substances may remain on the surface of the photomask, even after a drying process, these fine particles act as growth-producing foreign substances and cause pattern defects. .

In addition, since expensive chemicals are used, there is also a problem in that the cost of the cleaning process increases.

On the other hand, when a high-energy light source such as DUV light such as ArF or KrF or EUV light is scanned to the photomask, salt is formed on the surface of the photomask due to the surface of the mask or ions around it.

For example, NH₄OH or SO₄ ions used in mask cleaning remain on the surface or in pores, and when exposed in an ArF exposure device, they combine with a small amount of surrounding ions to generate salt. (2NH₃+ H₂SO₄→(NH₄) ₂SO₄)

These salts are transferred onto the wafer in the same form as defects in the fine pattern of the photomask, thereby causing defects in the wafer device.

Therefore, in order to remove the growing salt, the photomask must be washed with ultrapure water to dissolve and remove the salt on the surface from time to time.

However, in order to remove the salt present in the photomask, the pellicle must be removed from the mask, cleaned, and reattached. In this process, an inspection work must be added after the cleaning work to check whether foreign substances are added.

That is, five or more operations, such as pellicle removal, cleaning, inspection, pellicle attachment, and final inspection, must be performed in sequence to remove salt or ions from the mask surface, which is a problem that requires a lot of cost and time. there is.

Therefore, there is no detachment of the pellicle, the cleaning operation must be performed in a clean environment, and it is carried out in a state without chemical reaction, so there is no need for a separate inspection process to see if foreign substances are added, and ions on the entire surface of the photomask can be effectively removed. Development of an apparatus for dissolving and precipitating ions or salt components of a substrate and a method for dissolving and precipitating using the same is required.

In order to solve the above problems, the present invention is divided into a first chamber and a second chamber so as to have a sealed structure without mutual interference around the substrate, and a chamber in which a cleaning process is performed on a loaded substrate and the air received in the chamber has a dew point By including a variable constant temperature control unit that maintains the temperature at a temperature equal to or below and controls the reversible state of condensation and evaporation of water vapor on the substrate to be maintained, ions or salt components are dissolved in the condensed moisture and then evaporated. An object of the present invention is to provide an apparatus for dissolving and precipitating ions or salt components present on the surface of a substrate and a method for dissolving and precipitating using the same, which can easily remove ions or salt components present in the substrate without detachment of the pellicle.

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface according to an embodiment of the present invention for achieving the above object includes a chamber in which a cleaning treatment is performed on a loaded substrate; a grip device provided in the chamber and fixing the substrate; And a fan filter unit (FFU, Fan Filter Unit) installed on one side of the chamber to generate a blowing airflow of clean air in the chamber, wherein the chamber is divided into two to have a sealed structure without mutual interference around the substrate It is characterized by consisting of two areas.

In addition, the chamber according to the present invention includes a first chamber accommodating the first surface of the substrate where the micropattern is located and filled with air containing moisture at constant temperature; and a second chamber accommodating the second surface of the substrate on which the micropattern is not located and filled with a dry gas having a variable temperature region.

In addition, the second chamber according to the present invention lowers the temperature of the second chamber below the dew point according to the relative humidity of the first chamber to maintain a reversible state of condensation and evaporation of water vapor on the first surface of the substrate. and a variable constant temperature control unit for controlling the temperature of the second chamber as much as possible.

In addition, the apparatus for dissolving and precipitating ions or salt components according to the present invention includes a substrate heating unit that heats the substrate to a temperature equal to or higher than the dew point to evaporate moisture condensed on the substrate and ions or salt components dissolved in the moisture. to be

In addition, the apparatus for dissolving and precipitating ions or salts according to the present invention includes a light source irradiation unit provided on one side of the first chamber and irradiating an IR light source to the substrate, wherein the IR light source has a wavelength of 1.4um or 1.9um It is characterized by consisting of.

In addition, the IR director for irradiating the light source irradiation unit according to the present invention; a lens disposed on one side of the IR director to concentrate the irradiated light source; and a scanner disposed on the other side of the IR director and sliding the IR director.

In addition, the light source irradiation unit according to the present invention is characterized in that it comprises an IR detector for analyzing light absorbance with a reflected IR light source and deriving the moisture content on the substrate.

In addition, the first chamber according to the present invention, the constant temperature and humidity control unit for controlling to maintain a constant temperature and humidity of the air containing moisture; and an air pressure control unit for controlling the partial pressure of water vapor in the received air.

In addition, the dry gas of the second chamber according to the present invention is characterized in that it is composed of dry air (Dry Air), dry carbon dioxide (Dry CO2), dry helium (Dry He) or dry nitrogen (Dry N2).

In addition, the chamber according to the present invention is characterized in that it is composed of a quartz (Qz, Quartz) material or a Teflon (Polytetrafluoroethylene) material.

Meanwhile, a method for dissolving and depositing ions or salt components present on a substrate surface according to the present invention includes a substrate mounting step of mounting the substrate in a chamber so that the first surface of the substrate is accommodated in the first chamber; a cooling step of operating a variable constant temperature control unit to cool the second chamber to the dew point of the first chamber or less; a glass step in which moisture is condensed on the first surface of the substrate, and ions or salt components present on the surface of the substrate are dissolved in the condensed moisture and released from the substrate; and an evaporation step of evaporating moisture and ions or salt components dissolved in the moisture by raising the substrate to a temperature equal to or higher than the dew point.

In addition, the evaporation step according to the present invention includes a substrate heating step in which a substrate heating unit heats the substrate; and an IR light source irradiation step of irradiating an IR light source from the IR director of the light source irradiation unit to the substrate to perform a secondary evaporation action.

According to the dissolution/precipitation device for ions or salt components present on the substrate surface and the dissolution/precipitation method using the same, the air contained in the chamber is maintained at a temperature below the dew point to prevent condensation and evaporation of water vapor on the substrate. By controlling the reversible state to be maintained so that the ion or salt component is dissolved in the condensed moisture and then evaporating the moisture and ion, the ion or salt component present on the substrate can be easily removed without detaching the pellicle. there is.

In addition, there is no detachment of the pellicle, the cleaning operation is performed in a clean environment, and the process is performed without chemical reaction, so there is no need for a separate inspection process to see if foreign substances are added, and ions on the entire surface of the photomask can be effectively removed. let it be

In addition, by providing a light source irradiation unit on one side of the first chamber, there is an effect of more efficiently evaporating condensed water and ions or salt components dissolved therein.

In addition, by evaporating and sublimating moisture and foreign substances present on the substrate surface with an IR light source having high water absorption, there is an effect of increasing the ability to remove foreign substances.

1 is a block diagram showing the overall configuration of an apparatus for dissolving and precipitating ions or salt components present on a substrate surface according to the present invention.

Figure 2 is a state diagram showing the use state of the IR director and IR detector according to the present invention.

3 is a block diagram showing a method for dissolving and precipitating ions or salt components present on a substrate surface according to the present invention.

4 is a block diagram showing the configuration of an evaporation step according to the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. First of all, it should be noted that identical components or parts in the drawings are denoted by the same reference numerals as much as possible. In describing the present invention, detailed descriptions of related known functions or configurations are omitted so as not to obscure the gist of the present invention.

As shown in FIG. 1, the apparatus 1 for dissolving and precipitating ions or salt components present on the surface of a substrate according to the present invention includes a chamber 100, a grip device unit 200, a fan filter unit 300, and a substrate heating It may include a unit 400, a light source irradiation unit 500 and a pellicle frame heating unit 600.

The chamber 100 is configured to perform a cleaning process on the loaded substrate 10 .

In addition, the chamber 100 is composed of two areas divided into two to have a closed structure without mutual interference around the substrate 10 .

In addition, the chamber 100 may be made of quartz (Qz, Quartz) material or Teflon (Polytetrafluoroethylene) material.

Specifically, the chamber 100 performs loading/unloading of a photomask and cleaning processing for the loaded photomask, and is composed of two areas divided into two to have a closed structure without mutual interference, and the two areas are substrates. It may be divided around the first chamber 110 and the second chamber 120.

The first chamber 110 accommodates the first surface of the substrate 10 where the fine pattern of the photo mask is located, and is configured to be filled with air containing moisture at constant temperature.

In addition, the first chamber 110 is configured to be filled with air at a fixed temperature containing moisture, and the constant temperature and humidity control unit 111 controls the constant temperature and humidity of the charged air to be maintained and the partial pressure of water vapor in the received air. It may include an air pressure adjusting unit 112 for adjusting.

The constant temperature and humidity control unit 111 controls the temperature of the first chamber 110 so that the humidity and temperature of air containing moisture contained in the first chamber 110 are kept constant.

Specifically, the constant temperature and humidity control unit 111 is provided in the first chamber 110 accommodating the first surface of the substrate on which condensation of water vapor is required, so that the condensation of water vapor is implemented on the substrate 10. By controlling the humidity to be kept constant, the relative humidity of the first chamber 110 is maintained at 95% or less (70 to 80% relative humidity), and the temperature at room temperature is maintained.

Therefore, when the temperature of the second chamber 120 is lowered below the dew point of the first chamber 110 by the variable constant temperature control unit 121 to be described later, the substrate is cooled and the substrate 10 adjacent to the air containing moisture Condensation of water vapor occurs on the first surface of the

In addition, since the second surface of the substrate 10 is accommodated in the second chamber 120 filled with dry gas, condensation does not occur even when the temperature of the second chamber 120 decreases.

The air pressure control unit 112 is configured to adjust the partial pressure of water vapor in the air contained in the first chamber 110, and when ions or salt components are dissolved in the water formed at the dew point, the water is evaporated to remove the ions and salt components. For this purpose, the partial pressure of water vapor in the first chamber 110 is adjusted so that moisture and dissolved ions can be smoothly evaporated into the air atmosphere.

In addition, the air pressure control unit 112 adjusts the total air pressure of the surface where the dew point is formed so that the dissolution of water and the removal of ions can be controlled.

The second chamber 120 accommodates the second surface of the substrate 10 on which the fine pattern is not located, and is filled with a dry gas having a variable temperature region.

In addition, the dry gas of the second chamber 120 may be composed of dry air, dry carbon dioxide (dry CO2), dry helium (dry He), or dry nitrogen (dry N2).

Specifically, the second chamber 120 is a region accommodating the surface of the photomask where the fine pattern is not located, that is, the second surface of the substrate without the pellicle 20, where surface salt is a problem. It can be filled with a dry gas to avoid condensation.

In addition, the second chamber 120 lowers the temperature of the second chamber 120 below the dew point according to the relative humidity of the first chamber 110, so that the water vapor on the first surface of the substrate 10 A variable constant temperature control unit 121 may be included to control the temperature of the second chamber 120 so that a reversible state of condensation and evaporation is maintained.

The variable constant temperature control unit 121 lowers the temperature of the second chamber 120 below the dew point (according to the relative humidity) of the first chamber 110 so that the temperature of the substrate 10 is lowered to a temperature below the dew point. control so that it can be maintained.

Therefore, since the variable constant temperature control unit 121 lowers the temperature of the second chamber 120, condensation occurs only on the first surface of the substrate 10 and condensation does not occur in other spaces within the first chamber 110. Avoid.

In addition, even when the temperature of the second chamber 120 is lowered by the variable constant temperature control unit 121, condensation does not occur in the second chamber 120 filled with dry gas and on the second surface of the substrate.

In addition, the variable constant temperature control unit 121 monitors the state of the substrate 10 through the IR detector 540 of the light source irradiation unit 500 to be described later so that evaporation and condensation of water vapor can be reversed (simultaneously). Control.

In addition, the variable constant temperature control unit 121 may monitor the state of the substrate and control the temperature of the second chamber to have an environment in which evaporation and condensation of water vapor are repeatedly performed at a predetermined time.

More specifically, the variable constant temperature control unit 111 maintains the photomask at the temperature of the dew point, so that moisture is generated on the photomask surface, and ions or salts on the photomask surface are dissolved in the generated moisture to form a surface on the photomask. make it advantageous

After the ions or salt components are sufficiently released, the temperature of the second chamber is maintained at a temperature equal to or higher than the dew point, thereby evaporating and removing moisture and dissolved ions or salt components, and drying is completed.

In addition, since the above process must be performed on the fine pattern surface of the photomask, where surface salt is a problem, condensation of water vapor can occur on the surface where the pellicle 20 is located, that is, on the first surface of the substrate 10.

The grip device 200 is provided in the chamber 100 and fixes the substrate 10 .

In addition, the grip device 200 is configured to allow attachment and detachment of the substrate 10 .

The fan filter unit (FFU) 300 is installed on one side of the chamber 100 and is configured to generate a blowing air flow of clean air in the chamber 100 .

In addition, as shown in FIG. 1, the fan filter unit 300 is installed in each of the first chamber 110 and the second chamber 120 so that clean air suitable for each chamber environment can be circulated. .

In addition, the fan filter unit (FFU) 300 sideways blows the clean air up to a predetermined maximum distance during normal operation, and the sidewardly blown air is installed on the upper part of the opposite end of the side of the chamber 100 or in the front and rear parts. It is allowed to be discharged through an inlet (not shown).

In addition, the fan filter unit 300 may include a HEPA filter as shown in FIG. 1 .

The substrate heating unit 400 is configured to heat the substrate 10 to a temperature equal to or higher than the dew point to evaporate moisture condensed on the substrate and ions or salt components dissolved in the moisture.

Specifically, the substrate heating unit 400 raises the substrate temperature above the dew point in order to evaporate and remove the condensed water and ions dissolved in the water when the dissolution of ions or salt components in the water condensed on the substrate 10 is completed. As a configuration for raising the temperature, it may be provided in the grip mounting portion 200 or the chamber 100 adjacent to the substrate.

The light source irradiation unit 500 is provided on one side of the first chamber 110 facing the first surface, and irradiates an IR light source to the first surface to evaporate moisture and ions or salt components dissolved in the moisture. is a composition

Specifically, the light source irradiation unit 500 is an auxiliary component provided to make the evaporation action by the substrate heating unit 400 more quickly or to increase the evaporation efficiency, and directs an IR light source to one side or the front side of the substrate. structured to investigate.

In addition, the light source irradiation unit 500 enables rapid evaporation or sublimation of moisture and ions formed at the dew point by using an IR light source having a wavelength of 1.4um or 1.9um.

In addition, the light source irradiated to the first surface of the light source irradiation unit 500 may be an LED or a laser light source.

Therefore, the light source irradiation unit 500 includes an IR director 510 for irradiating a light source to the substrate 10, a lens 520 disposed on one side of the IR director 510 and concentrating the irradiated light source, and the IR director A scanner 530 may be disposed on the other side of the substrate 10 and slide the IR director 510 so that the IR light source is radiated to one side or the front side of the substrate 10 .

Therefore, the light source irradiation unit 500 concentrates the irradiated light source using the lens 520 and slides the IR director 510 using the scanner 530 to move the entire surface or a specific surface of the substrate 10. to allow the light source to be irradiated.

In addition, as shown in FIG. 2 , the light source irradiation unit 500 may include an IR detector 540 for deriving moisture content by analyzing light absorbance with an irradiated IR light source.

Therefore, the IR detector 540 transmits the detected moisture content information of the substrate 10 to the variable constant temperature control unit 121, and the variable constant temperature control unit 121 monitors the state of the substrate 10. The environment of the second chamber 110 can be controlled to maintain a state in which condensation and evaporation of water vapor can be reversible, or to have an environment in which evaporation and condensation are repeatedly performed over time.

The pellicle frame heating unit 600 may be configured to heat the pellicle frame 21 to evaporate moisture condensed on the substrate 10 .

In addition, the pellicle frame heating unit 600 may be configured to irradiate a light source for heating the pellicle frame 21 at a predetermined distance from the pellicle frame 21 .

Hereinafter, a method for dissolving and precipitating ions and salt components present on a substrate surface according to the present invention will be described.

3 is a block diagram showing the configuration of a method for dissolving and precipitating ions or salt components present on a substrate surface according to the present invention, and FIG. 4 is a block diagram showing the configuration of an evaporation step according to the present invention.

The method for dissolving and depositing ions or salt components present on the surface of a substrate according to the present invention includes a substrate mounting step (S100), a cooling step (S200), a glass step (S300) and an evaporation step (S400) as shown in FIG. can include

Specifically, the method of dissolving and depositing ions or salt components present on the surface of a substrate according to the present invention includes mounting the substrate 10 in the chamber so that the first surface of the substrate 10 is accommodated in the first chamber 110. A substrate mounting step (S100), a cooling step in which the variable constant temperature control unit 111 is operated to cool the second chamber 110 below the dew point of the first chamber and control the substrate to maintain a temperature below the dew point (S200). ), a glass step (S300) in which moisture is condensed on the first surface of the substrate 10 and ions or salt components present on the surface of the substrate are dissolved in the condensed moisture to be released from the substrate (S300) and the substrate is heated to a temperature above the dew point It may include an evaporation step (S400) of evaporating water and ions or salt components dissolved in water by rising.

In addition, the evaporation step (S400) is a substrate heating step (S410) in which the substrate heating unit 400 heats the substrate 10 and the IR director 510 of the light source irradiation unit 500, as shown in FIG. An IR light source irradiation process (S420) of irradiating an IR light source to the substrate 10 to perform an auxiliary evaporation action may be included.

According to the dissolution/precipitation device for ions or salt components present on the substrate surface and the dissolution/precipitation method using the same, the air contained in the chamber is maintained at a temperature below the dew point to prevent condensation and evaporation of water vapor on the substrate. The reversible state is maintained so that the ions or salt components are dissolved in the condensed moisture to be released, and then the moisture and ions are evaporated so that the ions or salt components present on the substrate can be easily removed without detachment of the pellicle.

In addition, since there is no detachment of the pellicle, the cleaning operation is performed in a clean environment, and the process is performed without chemical reaction, a process of inspecting whether or not a separate foreign substance is added is not required, and ions on the entire surface of the photomask can be effectively removed. let it be

In addition, by providing a light source irradiation unit on one side of the first chamber, the condensed water and ions or salt components dissolved therein are evaporated efficiently.

The terms and words used in this specification and claims described herein should not be construed as being limited to ordinary or dictionary meanings, and the present inventors appropriately use the concept of terms in order to explain their invention in the best way. It should be interpreted as a meaning and concept consistent with the technical idea of the present invention based on the principle that it can be defined.

Therefore, the configurations shown in the drawings and embodiments described in this specification are only one of the most preferred embodiments of the present invention, and do not represent all of the technical ideas of the present invention, so they can be replaced at the time of the present application. It should be understood that there may be many equivalents and variations.

According to the present invention, by maintaining the temperature of the air received in the chamber at a temperature below the dew point to maintain the reversible state of condensation and evaporation of water vapor on the substrate, dissolving ions or salt components in the condensed moisture, and then evaporating the moisture and ions , There is no detachment of the pellicle, the cleaning operation is performed in a clean environment, and proceeds without chemical reaction, so that a separate inspection process is not required and ions on the entire surface of the photomask can be effectively removed. do.

Claims

a chamber in which a cleaning process is performed on the loaded substrate;

a grip device provided in the chamber and fixing the substrate; and

A fan filter unit (FFU) installed on one side of the chamber to generate a blowing airflow of clean air in the chamber; includes,

the chamber,

An apparatus for dissolving and precipitating ions or salt components present on the substrate surface, characterized in that it consists of two areas divided to have a closed structure without mutual interference around the substrate.
According to claim 1,

the chamber,

a first chamber accommodating the first surface of the substrate where the micropattern is located and filled with air containing moisture at constant temperature; and

a second chamber accommodating the second surface of the substrate on which the micropattern is not located and filled with dry gas having a variable temperature region;

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that it comprises a.
According to claim 2,

The second chamber,

A variable for controlling the temperature of the second chamber to maintain a reversible state of condensation and evaporation of water vapor on the first surface of the substrate by lowering the temperature of the second chamber below the dew point according to the relative humidity of the first chamber. constant temperature control unit;

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that it comprises a.
According to claim 1,

a substrate heating unit that heats the substrate to a temperature equal to or higher than the dew point to evaporate moisture condensed on the substrate and ions or salt components dissolved in the moisture;

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that it comprises a.
According to claim 2,

A light source irradiation unit provided at one side of the first chamber and irradiating an IR light source to the substrate;

The IR light source,

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that composed of a wavelength of 1.4um or 1.9um.
According to claim 5,

The light source irradiation unit,

IR director irradiating the light source;

a lens disposed on one side of the IR director to concentrate the irradiated light source; and

a scanner disposed on the other side of the IR director and sliding the IR director;

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that it comprises a.
According to claim 5,

The light source irradiation unit,

An IR detector that analyzes light absorbance with a reflected IR light source and derives the moisture content on the substrate;

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that it comprises a.
According to claim 2,

The first chamber,

a constant temperature and humidity control unit that controls the constant temperature and humidity of air containing moisture to be maintained; and

an air pressure control unit for adjusting the partial pressure of water vapor in the received air;

An apparatus for dissolving and precipitating ions or salt components present on a substrate surface, characterized in that it comprises a.
According to claim 2,

The dry gas in the second chamber,

An apparatus for dissolving and precipitating ions or salt components present on the surface of a substrate, characterized in that it is composed of dry air, dry carbon dioxide (Dry CO₂), dry helium (Dry He) or dry nitrogen (Dry N₂).
According to claim 1,

the chamber,

An apparatus for dissolving and precipitating ions or salt components present on the surface of a substrate, characterized in that it is composed of a quartz (Qz, Quartz) material or a Teflon (Polytetrafluoroethylene) material.
In the method of dissolution and precipitation of ions or salt components present on the substrate surface according to any one of claims 1 to 10,

a substrate mounting step of mounting the substrate in the chamber so that the first surface of the substrate is accommodated in the first chamber;

a cooling step of operating a variable constant temperature control unit to cool the second chamber to the dew point of the first chamber or less;

a glass step in which moisture is condensed on the substrate, and ions or salt components present on the surface of the substrate are dissolved in the condensed moisture and released from the substrate; and

an evaporation step of evaporating moisture and ions or salt components dissolved in the moisture by raising the substrate to a temperature equal to or higher than the dew point;

A method for dissolving and precipitating ions or salt components present on the surface of a substrate, characterized in that it comprises a.
According to claim 11,

The evaporation step is

a substrate heating step in which a substrate heating unit heats the substrate; and

an IR light source irradiation step of irradiating an IR light source from the IR director of the light source irradiation unit to the substrate to perform a secondary evaporation;

A method for dissolution and precipitation of ions or salt components present on the surface of a substrate, characterized in that it comprises a.