WO2022224502A1 - 走査型顕微鏡ユニット、走査型顕微鏡、及び走査型顕微鏡ユニットの校正方法 - Google Patents
走査型顕微鏡ユニット、走査型顕微鏡、及び走査型顕微鏡ユニットの校正方法 Download PDFInfo
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- light
- calibration
- scanning microscope
- irradiation light
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0036—Scanning details, e.g. scanning stages
- G02B21/0048—Scanning details, e.g. scanning stages scanning mirrors, e.g. rotating or galvanomirrors, MEMS mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/008—Details of detection or image processing, including general computer control
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/0076—Optical details of the image generation arrangements using fluorescence or luminescence
Definitions
- One aspect of the present disclosure relates to a scanning microscope unit, a scanning microscope, and a method of calibrating the scanning microscope unit.
- Patent Document 1 describes a scanning microscope unit that is attached to a connection port of a microscope having a microscope optical system to constitute a scanning microscope.
- the scanning microscope unit described in Patent Document 1 includes a MEMS (Micro Electro Mechanical System) mirror that scans the observation object with the irradiation light output from the light source, and the irradiation light generated from the observation object according to the irradiation of the irradiation light. and a photodetector for detecting the observation light.
- MEMS Micro Electro Mechanical System
- a voltage is applied to the MEMS mirror so that the swing angle of the MEMS mirror with respect to the sampling timing of the photodetector is appropriate.
- drive signal is adjusted.
- the oscillation amplitude or phase of the MEMS mirror may change over time, and in this case, there is concern that the field of view may shift.
- one aspect of the present disclosure aims to provide a scanning microscope unit capable of suppressing the occurrence of field deviation, a scanning microscope, and a method for calibrating the scanning microscope unit.
- a scanning microscope unit is a scanning microscope unit that constitutes a scanning microscope by being attached to a connection port of a microscope having a microscope optical system, the scanning microscope unit comprising: a light source that outputs irradiation light; A photodetector for detecting observation light emitted from an observation object in response to irradiation with irradiation light; A MEMS mirror that guides observation light generated from the optical system toward a photodetector, guides irradiation light scanned by the MEMS mirror to the microscope optical system, and guides observation light that has been imaged by the microscope optical system to the MEMS mirror.
- a scan lens that emits light
- a frame member that is formed in a frame shape so as to define an aperture and is arranged on the microscope optical system side with respect to the scan lens so that the irradiation light and the observation light pass through the aperture.
- the member has a calibrating portion provided on a side portion defining the aperture and generating calibrating light including the sensitivity wavelength of the photodetector in response to incident illumination light.
- This scanning microscope unit includes a frame member that is formed in a frame shape so as to define an aperture, and is arranged on the microscope optical system side with respect to the scan lens so that the illumination light and the observation light pass through the aperture. Further, the frame member has a calibration portion provided on a side portion defining the opening and generating calibration light including the sensitivity wavelength of the photodetector according to incidence of the irradiation light.
- the MEMS mirror is used to scan the irradiation light within the scan area on the plane along the frame member, and the photodetector is used to detect the calibration light generated from the calibration unit according to the incidence of the irradiation light.
- At least one of the amplitude and phase of oscillation of the MEMS mirror can be adjusted based on the detection result of the photodetector.
- By adjusting (calibrating) at least one of the amplitude and the phase in this way it is possible to suppress the occurrence of the above-described field deviation. Therefore, according to this scanning microscope unit, it is possible to suppress the occurrence of field deviation.
- the frame member has a plate member that generates calibration light according to incidence of irradiation light, and a covering member that is arranged on the plate member and covers the plate member. It may be constituted by a portion of the plate member exposed from the opening. In this case, the edge of the calibration portion can be detected satisfactorily, and the accuracy of calibration can be improved. In addition, since the calibrating portion can be formed with high accuracy, the accuracy of calibration can be improved.
- the calibration unit may contain a fluorescent member. In this case, calibration can be performed in the scanning microscope unit for fluorescence observation.
- the photodetector may detect, as observation light, fluorescence emitted from the observed object in response to irradiation of the irradiation light. In this case, fluorescence observation can be performed.
- the frame member has a first side portion and a second side portion facing the first side portion across the opening. and a second calibration portion provided on the side portion. In this case, it is possible to reliably adjust both the amplitude and phase of the MEMS mirror.
- the calibration section may extend along the extending direction of the side section. In this case, the area that can be calibrated can be widened.
- the frame member has a first side portion and a third side portion extending along a direction intersecting the extending direction of the first side portion, and the calibration portion is provided on the first side portion.
- a first calibration section and a third calibration section provided on the third side may be included. In this case, it is possible to calibrate not only scanning along one direction, but also scanning along a direction intersecting with that direction.
- the MEMS mirror scans the irradiation light within the scan area on the plane along the frame member, and the width of the opening of the frame member may be narrower than the width of the scan area.
- calibration can be performed by positioning the calibration unit within the scan area.
- the MEMS mirror is configured to be able to swing about a first axis and a second axis, and resonates about the first axis to move the mirror along the first direction within a scan area on a plane along the frame member. and rotates around the second axis to change the scanning position in a second direction intersecting the first direction, and the calibration unit includes a side portion extending along the second direction.
- the calibration unit includes a side portion extending along the second direction.
- a scanning microscope unit of the present invention includes a housing to which a scan lens is fixed, an attachment section for attaching the housing to a connection port, and a housing that supports the housing so that the angle of the housing with respect to the attachment section can be changed. You may further have a movable part which carries out. In this case, by changing the angle of the housing with respect to the attachment section, the optical axis of the scan lens can be aligned with the direction of the optical axis of the microscope optical system. As a result, imaging with maintained signal intensity and resolution can be achieved.
- the frame member may be arranged on the imaging plane of the microscope optical system. In this case, it is possible to adjust at least one of the amplitude and phase of oscillation of the MEMS mirror by scanning the irradiation light within the scan area on the imaging plane using the MEMS mirror.
- a scanning microscope of the present invention includes the scanning microscope unit described above, and a microscope having a microscope optical system and a connection port. According to this scanning microscope, it is possible to suppress the occurrence of field shift for the reasons described above.
- a scanning microscope unit calibration method is the above-described scanning microscope unit calibration method, wherein a MEMS mirror is used to scan irradiation light within a scan area on a plane along a frame member. a first step in which at least part of the calibration unit is positioned within the scan area; and a third step of adjusting at least one of the oscillation amplitude and phase of the MEMS mirror based on the detection result of the photodetector.
- the MEMS mirror is used to scan the irradiation light within the scan area on the plane along the frame member, and the photodetector is used to generate from the calibration section according to the incident irradiation light.
- the calibration light is detected, and at least one of the amplitude and phase of the oscillation of the MEMS mirror is adjusted based on the detection result of the photodetector.
- a scanning microscope unit capable of suppressing the occurrence of field deviation, a scanning microscope, and a method for calibrating the scanning microscope unit.
- FIG. 1 is a schematic configuration diagram of a confocal microscope according to an embodiment
- FIG. FIG. 4 is a diagram showing how observation light is refracted by a dichroic mirror
- FIG. 4 is a cross-sectional view showing the mounting structure of the confocal microscope unit to the microscope
- 4 is a view of the peripheral portion of the frame member viewed from the scan lens side
- FIG. FIG. 5 is a cross-sectional view along line VV of FIG. 4; It is the figure which looked at the frame member from the light guide direction.
- FIG. 4 is a diagram showing the relationship between a drive signal applied to a MEMS mirror, a swing angle of the MEMS mirror, and a sampling timing of a photodetector; (a) is a graph showing changes in the deflection angle of the MEMS mirror over time of use, and (b) is a graph showing changes in the phase of the MEMS mirror over time of use.
- FIG. 4 is a diagram for explaining a method of calibrating the amplitude and phase of a MEMS mirror; (a) is a diagram showing a first modification, and (b) is a diagram showing a second modification. (a) is a figure which shows a 3rd modification, (b) is a figure which shows a 4th modification.
- Figure 1 shows a confocal microscope A, which is a type of scanning microscope.
- a confocal microscope A is used to acquire images that allow the construction of an optical tomogram of an object M to be observed.
- a confocal microscope A is configured by connecting a confocal microscope unit 1, which is a scanning microscope unit, to a connection port PT of a microscope 50 for connecting an external unit.
- a microscope 50 has a microscope optical system R including an imaging lens 51 and an objective lens 52 .
- the confocal microscope unit 1 irradiates an observation object M placed on a stage of a microscope 50 or the like with irradiation light through a microscope optical system R, and also emits light from the observation object M in response to the irradiation of the irradiation light.
- observation light is received (detected) through the microscope optical system R to generate and output an optical tomographic image.
- the observation object M is a sample that emits fluorescence as observation light when irradiated with irradiation light, and the irradiation light is excitation light for exciting the sample.
- the confocal microscope unit 1 includes a main housing 2, a lens barrel (housing) 3 that constitutes a part of the main housing 2, and is detachably connected to a connection port PT of a microscope 50, and the main housing 2.
- a MEMS (Micro Electro Mechanical System) mirror 4 fixed inside, a fixed mirror 5, first to fourth subunits 6a to 6d, and a scan lens 7 fixed inside the lens barrel 3 are provided.
- the scan lens 7 is arranged inside the lens barrel 3 .
- the scan lens 7 relays the reflecting surface of the MEMS mirror 4 to the pupil position of the objective lens 52 and converges the irradiation light on the primary imaging plane of the microscope optical system R of the microscope 50 .
- the scan lens 7 guides the irradiation light scanned by the MEMS mirror 4 to the microscope optical system R to irradiate the observation object M, and accordingly, the observation light generated from the observation object M is directed to the MEMS mirror 4. guide light.
- the scan lens 7 is configured to form an image of the pupil of the objective lens 52 on the MEMS mirror 4, and the observation light imaged by the objective lens 52 and the imaging lens 51 of the microscope 50 is transferred to the MEMS mirror. lead to 4.
- the MEMS mirror 4 is arranged inside the main housing 2 .
- the MEMS mirror 4 is, for example, an optical scanning element (scanning mirror) having a reflecting plate configured to be swingable about a first axis and a second axis that are perpendicular to each other.
- the MEMS mirror 4 is formed by processing a semiconductor substrate using MEMS technology (patterning, etching, etc.). By continuously changing the angle of the reflector plate, the MEMS mirror 4 causes the irradiation light output from the first to fourth subunits 6a to 6d to scan the observation object M, and also to the irradiation of the irradiation light. Accordingly, the observation light emitted from the observation object M is guided toward the first to fourth subunits 6a to 6d.
- the fixed mirror 5 is fixed inside the main housing 2 .
- the fixed mirror 5 reflects the irradiation light output from the first to fourth subunits 6a to 6d toward the MEMS mirror 4, and directs the observation light reflected by the MEMS mirror 4 to the first to fourth subunits coaxially with the irradiation light. It reflects toward the fourth subunits 6a-6d.
- the fixed mirror 5 may include two fixed mirrors 5a, 5b, as shown in FIG.
- the first subunit 6a includes a base plate 8a, a dichroic mirror (first beam splitter) 9a arranged on the base plate 8a, a light source 10a, a dichroic mirror 11a, a pinhole plate (first aperture member) 12a, and a photodetector. device (first photodetector) 13a.
- the dichroic mirror 9a is fixed on the side of the fixed mirror 5 in the reflection direction of the observation light.
- the dichroic mirror 9a reflects the first irradiation light with the wavelength ⁇ 1 emitted by the first subunit 6a and the first observation light with the wavelength range ⁇ 1 generated from the observed object M accordingly, and reflects the first irradiation light and Light having a wavelength longer than that of the first observation light is transmitted.
- the dichroic mirror 11a is provided on the reflection direction side of the first observation light of the dichroic mirror 9a, transmits the first observation light, and reflects the first irradiation light.
- the light source 10a outputs the first irradiation light.
- the light source 10a is a laser diode and the first irradiation light is laser light.
- the light source 10a is arranged such that the first irradiation light is reflected by the dichroic mirror 11a coaxially with the first observation light toward the dichroic mirror 9a.
- the pinhole plate 12a is arranged so that its pinhole position coincides with the conjugate position of the spot of the first irradiation light on the observed object M, and limits the luminous flux of the first observation light.
- the pinhole plate 12a constitutes a confocal optical system together with the light source 10a and the like.
- the pinhole plate 12a is configured so that the diameter of the pinhole can be adjusted from the outside, so that the resolution and signal intensity of the image detected by the photodetector 13a can be changed.
- the photodetector 13a has a detection surface arranged to face the pinhole plate 12a, and receives and detects the first observation light that has passed through the pinhole plate 12a.
- the photodetector 13a is a photomultiplier tube, photodiode, avalanche photodiode, MPPC (Multi-Pixel Photon Counter), HPD (Hybrid Photo Detector), area image sensor, or the like.
- the second to fourth subunits 6b to 6d have the same construction as the first subunit 6a. That is, the second subunit 6b includes a base plate 8b, a dichroic mirror (second beam splitter) 9b, a light source 10b, a dichroic mirror 11b, a pinhole plate (second aperture member) 12b, and a photodetector (second photodetector). ) 13b.
- the dichroic mirror 9b reflects the second irradiation light with a wavelength ⁇ 2 (> ⁇ 1 ) emitted by the second subunit 6b and the second observation light with a wavelength range ⁇ 2 generated from the observed object M accordingly, Light having a wavelength longer than that of the second irradiation light and the second observation light is transmitted.
- the dichroic mirror 11b transmits the second observation light in the wavelength range ⁇ 2 and reflects the second illumination light in the wavelength ⁇ 2 shorter than the wavelength range ⁇ 2.
- the light source 10b outputs the second irradiation light.
- the pinhole plate 12b is arranged so that its pinhole position coincides with the conjugate position of the spot of the second irradiation light on the observed object M, and limits the luminous flux of the second observation light.
- the photodetector 13b has a detection surface arranged to face the pinhole plate 12b, and receives and detects the second observation light that has passed through the pinhole plate 12b.
- the third subunit 6c includes a base plate 8c, a dichroic mirror (third beam splitter) 9c, a light source 10c, a dichroic mirror 11c, a pinhole plate (third diaphragm member) 12c, and a photodetector (third photodetector) 13c. have.
- the dichroic mirror 9c reflects the third illumination light with a wavelength ⁇ 3 (> ⁇ 2 ) emitted by the third subunit 6c and the third observation light with a wavelength range ⁇ 3 generated from the observation object M accordingly, Light having a wavelength longer than that of the third irradiation light and the third observation light is transmitted.
- the dichroic mirror 11c transmits the third observation light in the wavelength range ⁇ 3 and reflects the third irradiation light in the wavelength ⁇ 3 shorter than the wavelength range ⁇ 3.
- the light source 10c outputs third irradiation light.
- the pinhole plate 12c is arranged such that its pinhole position coincides with the conjugate position of the spot of the third irradiation light on the observed object M, and limits the luminous flux of the third observation light.
- the photodetector 13c has a detection surface arranged to face the pinhole plate 12c, and receives and detects the third observation light that has passed through the pinhole plate 12c.
- the fourth subunit 6d has a base plate 8d, a total reflection mirror 9d, a light source 10d, a dichroic mirror 11d, a pinhole plate (fourth diaphragm member) 12d, and a photodetector (fourth photodetector) 13d.
- the total reflection mirror 9d reflects the fourth illumination light of wavelength ⁇ 4 (> ⁇ 3 ) emitted by the fourth subunit 6d and the fourth observation light of wavelength range ⁇ 4 emitted from the observed object M accordingly.
- the dichroic mirror 11d transmits the fourth observation light in the wavelength range ⁇ 4 and reflects the fourth illumination light in the wavelength ⁇ 4 shorter than the wavelength range ⁇ 4.
- the light source 10d outputs fourth irradiation light.
- the pinhole plate 12d is arranged such that its pinhole position coincides with the conjugate position of the spot of the fourth irradiation light on the observation object M, and limits the luminous flux of the fourth observation light.
- the photodetector 13d has a detection surface arranged to face the pinhole plate 12d, and receives and detects the fourth observation light that has passed through the pinhole plate 12d.
- the first to fourth subunits 6a to 6d are aligned in this order in the direction away from the fixed mirror 5 along the light guiding direction of the first to fourth observation lights by the MEMS mirror 4 and the fixed mirror 5, and , the dichroic mirrors 9a to 9c and the total reflection mirror 9d are fixed in the main housing 2 so as to be positioned on the optical paths of the first to fourth observation lights.
- the second to fourth subunits 6b to 6d are arranged relative to the first to third subunits 6a to 6c, respectively, based on the center positions of the dichroic mirrors 9a to 9c and the total reflection mirror 9d. They are arranged so as to be shifted by a shift distance d in a direction perpendicular to the guiding direction of the second to fourth observation lights.
- the shift distance d is set so as to be substantially equal to the shift amount ⁇ in the direction perpendicular to the optical path of the observation light transmitted by the dichroic mirrors 9a to 9c caused by the refraction of the observation light at each of the dichroic mirrors 9a to 9c. is set to In the present embodiment, the thicknesses of the mirror members constituting the dichroic mirrors 9a to 9c are set to be the same, so that the shift amounts produced by the dichroic mirrors 9a to 9c are substantially the same. Therefore, the shift distance d between two adjacent subunits among the first to fourth subunits 6a to 6d is also set to be the same.
- the shift distance d is set according to the thickness and refractive index of the mirror members forming the dichroic mirrors 9a to 9c. Specifically, if the thickness of the mirror member is t, the refractive index of the mirror member is n, the incident angle of the observation light incident on the mirror member is ⁇ , and the refraction angle into the mirror member is ⁇ , the observation light by the mirror member is has the relationship shown in FIG. 2 and is calculated by the following formula (1).
- the scan lens 7 is fixed inside the lens barrel 3, and inside the tip of the lens barrel 3 is a tilt adjustment mechanism 23 having an attachment section 21 and a movable section 22 integrated with each other. is provided. Although shown in simplified form in FIG. 3, the scan lens 7 is actually composed of a plurality of lenses.
- the attachment part 21 is formed in a ring shape and protrudes from the tip of the lens barrel 3, and has a structure (for example, a structure corresponding to a C mount) that can be attached to the connection port PT for connecting the camera of the microscope 50 on the tip side. have.
- the movable portion 22 is continuous with the base end side of the attachment portion 21 .
- the movable portion 22 is formed in a substantially ring shape, and the outer surface of the movable portion 22 forms a spherical sliding surface.
- a spherical sliding surface 24 corresponding to the outer surface shape of the movable portion 22 is formed on the inner surface of the tip portion of the lens barrel 3 .
- the outer surface of the movable portion 22 and the inner surface of the lens barrel 3 include their shapes when the movable portion 22 is fitted in the lens barrel 3 and the attachment portion 21 is connected to the connection port PT of the microscope 50. It has a shape such that the center C of the spherical surface is located on the imaging plane FS of the microscope optical system R of the microscope 50 .
- the movable portion 22 is placed against the sliding surface 24 of the lens barrel 3 when the confocal microscope unit 1 is attached to the microscope 50.
- the angle of the lens barrel 3 with respect to the attachment portion 21 can be changed by sliding it.
- the lens barrel 3 can be rotated with respect to the attachment portion 21, and the lens barrel 3 can rotate relative to the central axis of the attachment portion 21.
- the angle of the central axis of can be adjusted two-dimensionally. That is, the tilt adjustment mechanism 23 is configured to change the angle of the lens barrel 3 with respect to the attachment section 21 so that the optical axis of the microscope optical system R of the microscope 50 and the optical axis of the scan lens 7 are parallel. .
- a support member 30 that supports the frame member 40 is provided inside the lens barrel 3 .
- the support member 30 constitutes a housing that accommodates the scan lens 7 together with the lens barrel 3 .
- the support member 30 has a tubular portion 31 and an annular flange portion 32 extending outward from the base end portion of the tubular portion 31 .
- the support member 30 is fixed to the inner surface of the lens barrel 3 at the flange portion 32 so as to be positioned on the imaging plane FS side of the microscope optical system R with respect to the scan lens 7 .
- a distal end portion of the cylindrical portion 31 is located inside the movable portion 22 .
- the frame member 40 is fixed to the tip of the cylindrical portion 31 and positioned inside the movable portion 22 .
- the frame member 40 has a plate member 41 and a covering member 42.
- the plate member 41 is, for example, a fluorescent plate (fluorescent member) formed in a plate shape from a fluorescent material, and generates fluorescence in response to incidence of irradiation light. Fluorescence emitted from the plate member 41 is used as calibration light in calibrating the confocal microscope unit 1, as will be described later.
- the covering member 42 is a mask member arranged on the plate member 41 to cover the surface of the plate member 41 on the support member 30 side.
- the covering member 42 is formed in a plate shape (layer shape) from aluminum, iron, or stainless steel, for example.
- the surface of the covering member 42 is subjected to black treatment (non-reflection treatment) for suppressing reflection of light.
- the frame member 40 has an opening 43. That is, the frame member 40 (the plate member 41 and the covering member 42 ) is formed in a frame shape so as to define the opening 43 .
- the frame member 40 is arranged on the optical axis of the scan lens 7 on the microscope optical system R side (opposite side to the MEMS mirror 4 ) with respect to the scan lens 7 so that the irradiation light and the observation light pass through the opening 43 .
- the frame member 40 is arranged on the imaging plane FS of the microscope optical system R, and the surface of the plate member 41 on the scan lens 7 side is positioned on the imaging plane FS.
- the opening 43 is formed in, for example, a rectangular shape whose length along the first direction D1 is longer than its length along the second direction D2.
- the frame member 40 has a first side portion 40 a , a second side portion 40 b , a third side portion 40 c and a fourth side portion 40 d that define an opening 43 .
- the first side portion 40a and the second side portion 40b extend along the second direction D2 and face each other with the opening 43 interposed therebetween.
- the third side portion 40c and the fourth side portion 40d extend along the first direction D1 perpendicular to the second direction D2 and face each other with the opening 43 interposed therebetween.
- the covering member 42 is formed with two rectangular openings (exposed openings) 42a.
- the two openings 42a are formed in portions of the covering member 42 that constitute the first side portion 40a and the second side portion 40b. Since the opening 42 a is formed, part of the plate member 41 is exposed to the scan lens 7 side, so that irradiation light can be incident on the part of the plate member 41 .
- the calibration portion 44 includes a first calibration portion 44a provided on the first side portion 40a and a second calibration portion 44b provided on the second side portion 40b.
- the first calibration portion 44a and the second calibration portion 44b are positioned on the same straight line parallel to the first direction D1.
- Each of the first calibration portion 44a and the second calibration portion 44b is formed in a rectangular shape (square shape in this example).
- a plane along the frame member 40 (in this example, a plane along the surface of the plate member 41 on the side of the scan lens 7, on the imaging plane FS ) is scanned with irradiation light.
- the irradiation light is scanned along the first direction D1 within the scan area A1 on the imaging plane FS.
- the scanning position in the second direction D2 is changed by rotating the MEMS mirror 4 around the second axis.
- the entire scan area A1 can be scanned with the irradiation light.
- the MEMS mirror 4 resonates about the first axis (that is, oscillates at high speed at the resonance frequency level) and linearly moves (non-resonant) about the second axis.
- the width of the opening 43 of the frame member 40 in the first direction D1 is narrower than the width of the scan area A1 in the first direction D1, and part of the inside of the calibration section 44 is located within the scan area A1.
- the MEMS mirror 4 is driven so that the calibration light is scanned within the scan area A1 wider than the aperture 43 and at least part of the calibration section 44 is positioned within the scan area A1.
- the swing angle of the MEMS mirror 4 is adjusted with respect to the sampling timings of the photodetectors 13a to 13d.
- the MEMS mirror 4 operates with a deflection angle corresponding to the strength of the drive signal S1 and a constant phase difference from the drive signal S1.
- the drive signal S1 is a pulse signal.
- the sampling timings of the photodetectors 13a-13d are synchronized with the horizontal synchronizing signal S2, and in this example, the photodetectors 13a-13d detect the observation light over the range indicated by the arrows in FIG. Note that FIG. 7 shows the swing angle of the MEMS mirror 4 around the first axis.
- the deflection angle (amplitude) and phase of the oscillation of the MEMS mirror 4 may change due to aging deterioration or the like as the usage time elapses.
- 8(a) and 8(b) show the measurement results of the deflection angle and the phase when the MEMS mirror 4 is continuously driven with the constant drive signal S1 for one month (30 days). .
- the deflection angle decreases and the phase changes over time. If the deflection angle and phase change, there is concern that the field of view will deviate from the effective area A2.
- the amplitude and phase of the MEMS mirror 4 are calibrated based on the calibration light from the calibration section 44. This calibration is performed, for example, each time the confocal microscope unit 1 is activated.
- the MEMS mirror 4 is used to scan the irradiation light within the scan area A1 on the imaging plane FS, which is a plane along the frame member 40 (first step).
- the MEMS mirror 4 is driven so that at least part of the calibration section 44 is positioned within the scan area A1.
- the photodetectors 13a to 13d are used to detect the calibration light generated from the calibration unit 44 in response to the incidence of the irradiation light (second step).
- the calibration light may be detected by at least one of the photodetectors 13a to 13d, and for example, the calibration light may be detected by only the photodetector 13a.
- at least one of the oscillation amplitude and phase of the MEMS mirror 4 is adjusted based on the detection results of the photodetectors 13a to 13d (third step).
- FIG. 9 shows the horizontal synchronizing signal S2 and the effective area A2. Also, examples of calibration light intensity signals in states C1 to C5 are shown.
- the pulse P1 is formed by calibration light from the first calibration section 44a
- the pulse P2 is formed by calibration light from the second calibration section 44b.
- a state C1 is an appropriate state (target state), for example, a state immediately after the drive signal S1 is adjusted during manufacturing.
- both the deflection angle and the phase of the MEMS mirror 4 are shifted from state C1.
- the deflection angle of the MEMS mirror 4 corresponds to the distance between the pulses P1 and P2
- the phase of the MEMS mirror 4 corresponds to rising positions of the pulses P1 and P2.
- the phase of the driving signal S1 is changed, and the rising position of the pulse P1 is adjusted to the position in the state C1 as shown in the state C3.
- the amplitude of the driving signal S1 is changed to match the distance between the pulses P1 and P2 to the distance in the state C1 as shown in the state C4.
- the phase of the driving signal S1 is changed again, and the rising position of the pulse P1 is adjusted to the position in the state C1 as shown in the state C5.
- the deflection angle and phase of the MEMS mirror 4 can be adjusted (calibrated) to the same state as the target state C1.
- adjustment is performed so that the width W between the rising positions of the pulses P1 and P2 and the reference position based on the horizontal synchronizing signal S2 matches the target value (stored value stored as the target value at the time of manufacture). be done.
- the confocal microscope unit 1 is formed in a frame shape so as to define an aperture 43.
- the frame member 40 is arranged on the microscope optical system R side with respect to the scan lens 7 so that the irradiation light and the observation light pass through the aperture 43. It has Further, the frame member 40 has a first calibration portion 44a that is provided on a first side portion 40a that defines the opening 43 and that generates calibration light according to incidence of irradiation light.
- the MEMS mirror 4 is used to scan the irradiation light within the scan area A1 on the imaging plane FS (the plane along the frame member 40), and the photodetectors 13a to 13d are used to detect the incidence of the irradiation light.
- the calibration section 44 is configured by a part of the plate member 41 exposed from an opening (exposed opening) 42a formed in the covering member 42. As a result, the edge of the calibration portion 44 can be detected satisfactorily, and the accuracy of calibration can be improved. Further, since the opening 42a can be formed in the covering member 42 with high accuracy, the calibrating portion 44 can be formed with high accuracy. This also makes it possible to improve the accuracy of calibration.
- a calibration unit 44 includes a plate member 41 that is a fluorescent member. This makes it possible to calibrate the confocal microscope unit 1 for fluorescence observation.
- the photodetectors 13a to 13d detect, as observation light, fluorescence generated from the observation object M in response to irradiation of the irradiation light. This makes it possible to perform fluorescence observation.
- the calibration section 44 includes a first calibration section 44a provided on the first side section 40a and a second calibration section 44b provided on the second side section 40b. This makes it possible to reliably adjust both the amplitude and phase of the MEMS mirror 4 even if there is a deviation in the arrangement of each part due to, for example, a manufacturing error.
- the width of the opening 43 of the frame member 40 is narrower than the width of the scan area A1. As a result, calibration can be performed by positioning the calibration unit 44 within the scan area A1.
- the MEMS mirror 4 is configured to be able to swing about a first axis and a second axis, and by performing a resonant operation about the first axis, scanning on the imaging plane FS (a plane along the frame member 40) is performed. By scanning the irradiation light along the first direction D1 in the area A1 and rotating around the second axis, the scanning position in the second direction D2 intersecting with the first direction D1 is changed.
- a calibrating portion 44 is provided on the first side portion 40a extending along the second direction D2. Although the amplitude and phase of oscillation about the first axis (resonance axis) for resonant operation are likely to change, the confocal microscope unit 1 can calibrate scanning due to oscillation about the first axis.
- the confocal microscope unit 1 includes an attachment portion 21 for attaching the lens barrel 3 to the connection port PT, a movable portion 22 supporting the lens barrel 3 so that the angle of the lens barrel 3 with respect to the attachment portion 21 can be changed, It has As a result, the optical axis of the scan lens 7 can be aligned with the optical axis of the microscope optical system R by changing the angle of the lens barrel 3 with respect to the attachment portion 21 . As a result, imaging with maintained signal intensity and resolution can be achieved.
- a frame member 40 is arranged on the imaging plane FS of the microscope optical system R. As shown in FIG. This makes it possible to adjust at least one of the oscillation amplitude and phase of the MEMS mirror 4 by scanning the irradiation light within the scan area A1 on the imaging plane FS using the MEMS mirror 4 .
- the first calibration portion 44a and the second calibration portion 44b do not have to be positioned on the same straight line parallel to the first direction D1. That is, the positions of the first calibration portion 44a and the second calibration portion 44b may be different in the second direction D2. According to the first modified example as described above, calibration can be performed in the same manner as in the above-described embodiment, and the occurrence of visual field deviation can be suppressed.
- the first calibration portion 44a extends along the extending direction (second direction D2) of the first side portion 40a provided with the first calibration portion 44a. May be extended.
- the second calibration portion 44b may extend along the extending direction (second direction D2) of the second side portion 40b provided with the second calibration portion 44b.
- the first calibration portion 44a and the second calibration portion 44b extend straight along the second direction D2.
- each of the first calibration portion 44a and the second calibration portion 44b is formed in a rectangular shape having long sides along the second direction. According to such a second modification, calibration can be performed in the same manner as in the above-described embodiment, and the occurrence of visual field shift can be suppressed. In addition, it is possible to widen the area that can be calibrated.
- the calibration section 44 includes a third calibration section 44c provided on the third side section 40c and a fourth calibration section 44d provided on the fourth side section 40d. , further includes The third calibration portion 44c and the fourth calibration portion 44d are positioned on the same straight line parallel to the second direction D2. According to such a third modification, calibration can be performed in the same manner as in the above-described embodiment, and the occurrence of visual field shift can be suppressed. In addition, it is possible to calibrate not only scanning along one direction (first direction D1), but also scanning along a direction (second direction D2) intersecting with that direction. .
- the calibration section 44 may include only the first calibration section 44a. According to such a first modification, it is also possible to adjust at least one of the amplitude and phase of the oscillation of the MEMS mirror 4, and it is possible to suppress the occurrence of field deviation.
- the present disclosure is not limited to the above embodiments and modifications.
- the material and shape of each configuration are not limited to the materials and shapes described above, and various materials and shapes can be adopted.
- the frame member 40 is arranged on the imaging plane FS of the microscope optical system R, but the frame member 40 may be arranged along a predetermined plane perpendicular to the optical axis of the scan lens 7. It does not necessarily have to be arranged on the imaging plane FS.
- the calibration unit 44 generates fluorescence in response to the incidence of the irradiation light. Any device may be used as long as it generates calibration light including at least one of the sensitivity wavelengths of the devices 13a to 13d. From a different point of view, the calibration unit 44 should just generate calibration light including the wavelength of the observation light.
- the observation object M may generate light other than fluorescence as observation light according to the irradiation light.
- the calibration unit may also generate light other than fluorescence according to the irradiation light.
- the observation light may be reflected light generated from the observed object M in response to irradiation of the irradiation light.
- the scanning microscope unit of the present invention is not limited to the confocal microscope A, and may be applied to a general fluorescence microscope, reflection microscope, or the like as long as it is a scanning microscope using a MEMS mirror.
- the tilt adjustment mechanism 23 may be omitted.
- a pinhole plate is used as the diaphragm member to constitute the confocal optical system.
- the position of the fiber core end face may be set as the aperture position (the position where the luminous flux is restricted).
- Laser light sources such as solid-state lasers and diode lasers may also be used. In this case, the position of the beam waist of these laser light sources may be set as the diaphragm position, and the light source itself will play the role of the diaphragm member.
- the configurations of the frame member 40 and the calibration section 44 are not limited to the above examples.
- the calibration section 44 may be configured by a fluorescent member attached to the surface of a frame member made of a metal material.
- the frame member 40 may be formed integrally with a housing that accommodates the scan lens 7 . That is, the frame member 40 and the housing that accommodates the scan lens 7 may be configured by one member.
- the calibration unit 44 may be configured by attaching a fluorescent member to a frame-shaped portion (frame member) that is provided in the housing and defines the opening.
- SYMBOLS 1 Confocal microscope unit (scanning microscope unit), 3... Barrel (housing), 4... MEMS mirror, 7... Scan lens, 10a-10d... Light source, 13a-13d... Photodetector, 21... Attachment part , 22... Movable part 40... Frame member 40a... First side part 40b... Second side part 40c... Third side part 41... Plate member 42... Covering member 42a... Opening (exposed opening), 43... aperture, 44... calibration section, 44a... first calibration section, 44b... second calibration section, 44c... third calibration section, 50... microscope, A... confocal microscope (scanning microscope), A1... scan area, D1...first direction, D2...second direction, FS...imaging plane, M...object to be observed, PT...connection port, R...microscope optical system.
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Abstract
Description
δ=t・sin(θ‐φ)/cosφ …(1)
[作用及び効果]
[変形例]
Claims (13)
- 顕微鏡光学系を有する顕微鏡の接続ポートに取り付けられることにより、走査型顕微鏡を構成する走査型顕微鏡ユニットであって、
照射光を出力する光源と、
前記照射光の照射に応じて観察対象物から発生する観察光を検出する光検出器と、
前記光源から出力された前記照射光を前記観察対象物上で走査させると共に、前記照射光の照射に応じて前記観察対象物から発生する前記観察光を前記光検出器に向けて導くMEMSミラーと、
前記MEMSミラーによって走査された前記照射光を前記顕微鏡光学系に導光すると共に、前記顕微鏡光学系によって結像された前記観察光を前記MEMSミラーに導光するスキャンレンズと、
開口を画定するように枠状に形成され、前記開口を前記照射光及び前記観察光が通るように前記スキャンレンズに対して前記顕微鏡光学系側に配置された枠部材と、を備え、
前記枠部材は、前記開口を画定する辺部に設けられ、前記照射光の入射に応じて前記光検出器の感度波長を含む校正光を発生させる校正部を有する、走査型顕微鏡ユニット。 - 前記枠部材は、前記照射光の入射に応じて前記校正光を発生させる板部材と、前記板部材上に配置されて前記板部材を覆う被覆部材と、を有し、
前記校正部は、前記被覆部材に形成された露出開口から露出した前記板部材の一部によって構成されている、請求項1に記載の走査型顕微鏡ユニット。 - 前記校正部は、蛍光部材を含んでいる、請求項1又は2に記載の走査型顕微鏡ユニット。
- 前記光検出器は、前記照射光の照射に応じて前記観察対象物から発生する蛍光を前記観察光として検出する、請求項1~3のいずれか一項に記載の走査型顕微鏡ユニット。
- 前記枠部材は、第1辺部と、前記第1辺部と前記開口を挟んで向かい合う第2辺部と、を有し、
前記校正部は、前記第1辺部に設けられた第1校正部と、前記第2辺部に設けられた第2校正部と、を含む、請求項1~4のいずれか一項に記載の走査型顕微鏡ユニット。 - 前記校正部は、前記辺部の延在方向に沿って延在している、請求項1~5のいずれか一項に記載の走査型顕微鏡ユニット。
- 前記枠部材は、第1辺部と、前記第1辺部の延在方向と交差する方向に沿って延在する第3辺部と、を有し、
前記校正部は、前記第1辺部に設けられた第1校正部と、前記第3辺部に設けられた第3校正部と、を含む、請求項1~6のいずれか一項に記載の走査型顕微鏡ユニット。 - 前記MEMSミラーは、前記枠部材に沿った平面におけるスキャンエリア内において前記照射光を走査し、
前記枠部材の前記開口の幅は、前記スキャンエリアの幅よりも狭い、請求項1~7のいずれか一項に記載の走査型顕微鏡ユニット。 - 前記MEMSミラーは、第1軸線及び第2軸線周りに揺動可能に構成されており、前記第1軸線の周りに共振動作することにより、前記枠部材に沿った平面におけるスキャンエリア内において第1方向に沿って前記照射光を走査すると共に、前記第2軸線の周りに回転することにより、前記第1方向と交差する第2方向における走査位置を変化させ、
前記校正部は、前記第2方向に沿って延在する前記辺部に設けられている、請求項1~8のいずれか一項に記載の走査型顕微鏡ユニット。 - 前記スキャンレンズが固定された筐体と、
前記筐体を前記接続ポートに取り付けるためのアタッチメント部と、
前記アタッチメント部に対する前記筐体の角度が変更可能となるように前記筐体を支持する可動部と、を更に備える、請求項1~9のいずれか一項に記載の走査型顕微鏡ユニット。 - 前記枠部材は、前記顕微鏡光学系の結像面に配置されている、請求項1~10のいずれか一項に記載の走査型顕微鏡ユニット。
- 請求項1~11のいずれか一項に記載の走査型顕微鏡ユニットと、
前記顕微鏡光学系及び前記接続ポートを有する顕微鏡と、を備える、走査型顕微鏡。 - 請求項1~11のいずれか一項に記載の走査型顕微鏡ユニットの校正方法であって、
前記MEMSミラーを用いて前記枠部材に沿った平面におけるスキャンエリア内において前記照射光を走査させる第1工程であって、前記スキャンエリア内に前記校正部の少なくとも一部が位置する、前記第1工程と、
前記光検出器を用いて前記照射光の入射に応じて前記校正部から発生する前記校正光を検出する第2工程と、
前記光検出器の検出結果に基づいて前記MEMSミラーの揺動の振幅及び位相の少なくとも一方を調整する第3工程と、を含む、走査型顕微鏡ユニットの校正方法。
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