WO2022143223A1 - Dispositif de chauffage en ligne - Google Patents
Dispositif de chauffage en ligne Download PDFInfo
- Publication number
- WO2022143223A1 WO2022143223A1 PCT/CN2021/139135 CN2021139135W WO2022143223A1 WO 2022143223 A1 WO2022143223 A1 WO 2022143223A1 CN 2021139135 W CN2021139135 W CN 2021139135W WO 2022143223 A1 WO2022143223 A1 WO 2022143223A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chamber
- inlet pipe
- line heater
- cylindrical body
- cylinder
- Prior art date
Links
- 239000012530 fluid Substances 0.000 claims abstract description 26
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 238000005192 partition Methods 0.000 claims description 20
- 238000009434 installation Methods 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 239000012774 insulation material Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 description 13
- 239000007788 liquid Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/06—Heater elements structurally combined with coupling elements or holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
Definitions
- the present application belongs to the technical field of wafer cleaning equipment, and in particular relates to an in-line heater.
- the cleaning solution In the wafer cleaning process, various cleaning solutions are used, such as acid cleaning, alkali cleaning or water cleaning. At the same time, in order to improve the cleaning effect, the cleaning solution usually requires a certain temperature, such as 50-60 °C. Therefore, it is necessary to The cleaning solution is heated.
- the heater required for wafer cleaning requires a large space and takes a long heating time, which is not conducive to the continuous online operation of the equipment.
- the technical problem to be solved by the present invention is to provide an in-line heater in order to solve the deficiencies in the prior art.
- An in-line heater comprising:
- the cylinder has an inlet pipe and an outlet pipe at the top and bottom of the cylinder respectively, and a partition plate is arranged in the cylinder to divide the cylinder into several chambers in the axial direction.
- the chambers include a first chamber and a second chamber. A chamber and a third chamber, the bottom of the first chamber has an inlet pipe, the top of the first chamber is communicated with the second chamber, the bottom of the second chamber is communicated with the third chamber, and the third chamber is The bottom is communicated with the outlet pipe; the cylinder body is also provided with an installation cavity corresponding to each chamber, and the installation cavity has openings at the top and bottom of the cylinder body;
- a heater inserted into the installation cavity, for heating the fluid in the corresponding cavity
- the shell is arranged on the outside of the cylinder.
- the cross section of the first chamber is 1.40-1.60 times the cross-sectional area of the second chamber or the third chamber, and the cross-sectional area of the second chamber and the third chamber is 1.40-1.60 times. same.
- the first chamber is surrounded by a parabolic first partition plate and the cylindrical wall of the cylinder, and the second chamber and the third chamber are respectively formed by the first partition plate, the third chamber The two partitions are enclosed by the cylinder wall.
- the in-line heater of the present invention is the in-line heater of the present invention
- the inlet duct and the installation cavity are located on one side of the first chamber midline, the inlet duct is further away from the midline of the first chamber than the installation cavity, and the inlet duct is located in the first chamber
- the opening of the inlet pipe is aligned with the first baffle plate, and the angle of the normal line at the intersection of the central axis of the inlet pipe opening and the first baffle plate is 30-45°, so that the fluid flowing out of the inlet pipe flows through the side of the installation cavity, Reflections passing through the first baffle recirculate around the mounting cavity once.
- the heating power of the heater in the first chamber is twice the heating power of the heater in the second chamber or the third chamber.
- the barrel is made of stainless steel material that is resistant to acid and alkali corrosion.
- a thermal insulation material can be arranged in the casing.
- the cylinder is divided into chambers, each chamber is connected in sequence, the fluid must enter the chambers in sequence, each chamber can be heated, and the fluid can be heated in a limited space. Heating for a longer period of time.
- the first chamber is used as the main heating chamber.
- the chamber is large and can accommodate more fluids, and is also the chamber with the most violent fluid movement. Meanwhile, the second chamber and the third chamber can moderate the movement of the fluid, so that the outflowing fluid is gentle.
- FIG. 1 is a schematic structural diagram of an in-line heater according to an embodiment of the present application.
- Fig. 2 is the structural representation that Fig. 1 removes shell
- Fig. 3 is the structural representation of the cylinder of the embodiment of the present application.
- FIG. 4 is a transverse cross-sectional view of FIG. 3 .
- the terms “installed”, “connected” and “connected” should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; can be mechanical connection, can also be electrical connection; can be directly connected, can also be indirectly connected through an intermediate medium, can be internal communication between two elements.
- installed should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; can be mechanical connection, can also be electrical connection; can be directly connected, can also be indirectly connected through an intermediate medium, can be internal communication between two elements.
- This embodiment provides an in-line heater, as shown in FIG. 1 , including:
- the cylinder body 3, the top and bottom ends of the cylinder body 3 respectively have an inlet pipe 31 and an outlet pipe 32, a partition plate is arranged in the cylinder body 3 to divide the cylinder body 3 into several chambers in the axial direction, and the chambers include The first chamber 41, the second chamber 42 and the third chamber 43, the bottom of the first chamber 41 has the inlet pipe 31, the top of the first chamber 41 communicates with the second chamber 42, the second chamber 42 The bottom of the third chamber 43 is communicated with the third chamber 43 (by means of opening on the partition), and the bottom of the third chamber 43 is communicated with the outlet pipe 32; the cylinder 3 is also provided with a mounting cavity corresponding to each chamber. 33, the installation cavity 33 has openings at the top and bottom of the cylinder body 3;
- the heater 2 inserted into the mounting cavity 33, is used to heat the fluid (cleaning liquid for wafer cleaning) in the corresponding chamber;
- the outer casing 1 is arranged outside the cylindrical body 3 .
- the first chamber 41 is further provided with a thermocouple installation chamber 5 for installing a thermocouple, and the temperature in the first chamber 41 can be known in time after the thermocouple is installed.
- the fluid to be heated (various cleaning liquids) enters the first chamber 41 from the inlet pipe 31 , flows through the second chamber 42 and the third chamber 43 and flows out from the outlet pipe 32 .
- the cross-section of the first chamber 41 is 1.40-1.60 times the cross-sectional area of the second chamber 42 or the third chamber 43 , and the second chamber 42 and the third chamber 43 have the same cross-sectional area.
- the first chamber 41 is surrounded by the parabolic first partition 35 and the wall of the cylinder 3 , and the second chamber 42 and the third chamber 43 are respectively formed by the first partition 35 and the second partition 36 It is enclosed with the cylinder body 3 cylinder wall.
- the inlet pipe 31 and the installation cavity 33 are located on the side of the middle line (L in the figure) of the first chamber 41 , and the inlet pipe 31 is further away from the middle line of the first chamber 41 , and the opening of the inlet pipe 31 is aligned with (the central axis of the inlet pipe 31 ) the first partition 35 , the angle (90- ⁇ ) of the normal at the intersection of the central axis of the opening of the inlet pipe 31 and the first partition 35 is 30 -45°, so that the fluid flowing out of the inlet pipe 31 flows from the side of the installation cavity 33 (the upper part in FIG. 4 ), and the reflection through the first partition 35 flows back around the installation cavity 33 for one round (marked by the dotted line in FIG. 4 ). for the fluid flow direction), thereby improving the heat exchange efficiency.
- the cylinder body 3 is divided into 3 chambers, each chamber is connected in turn, the fluid must enter the 3 chambers in sequence, and each chamber can be heated, and can be heated in a limited space.
- the fluid is heated for a longer period of time.
- the first chamber 41 is used as the main heating chamber.
- the chamber is large and can accommodate more fluids, and is also the chamber where the fluid moves most violently.
- the second chamber 42 and the third chamber 43 can moderate the movement of the fluid, so that the outflowing fluid is gentle.
- the heating power of the heater 2 in the first chamber 41 is twice the heating power of the heater 2 in the second chamber 42 or the third chamber 43 .
- the entire cylinder body 3 is made of stainless steel material that is resistant to acid and alkali corrosion, and a thermal insulation material can be provided in the outer casing 1 to prevent excessive heat dissipation in the cylinder body 3 .
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)
- Resistance Heating (AREA)
Abstract
Dispositif de chauffage en ligne. Un cylindre (3) est divisé en trois chambres ; chaque chambre est en communication l'une avec l'autre en séquence ; un fluide doit passer à travers les trois chambres en séquence ; et chaque chambre peut chauffer, de telle sorte que le fluide peut être chauffé pendant une longue période dans un espace limité. Une première chambre (41) est utilisée comme chambre de chauffage principale, qui est grande et peut recevoir davantage de fluide, et est également la chambre où le mouvement de fluide est le plus drastique. De plus, une deuxième chambre (42) et une troisième chambre (43) peuvent modérer le mouvement du fluide, de telle sorte que la sortie du fluide n'est pas violente.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020237021838A KR20230127232A (ko) | 2020-12-30 | 2021-12-17 | 인라인 히터 |
CN202180077561.XA CN116686075B (zh) | 2020-12-30 | 2021-12-17 | 一种在线加热器筒体结构 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011615735.7A CN112616206B (zh) | 2020-12-30 | 2020-12-30 | 一种在线加热器 |
CN202011615735.7 | 2020-12-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2022143223A1 true WO2022143223A1 (fr) | 2022-07-07 |
Family
ID=75249558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CN2021/139135 WO2022143223A1 (fr) | 2020-12-30 | 2021-12-17 | Dispositif de chauffage en ligne |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20230127232A (fr) |
CN (2) | CN112616206B (fr) |
WO (1) | WO2022143223A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112616206B (zh) * | 2020-12-30 | 2023-04-21 | 江苏亚电科技有限公司 | 一种在线加热器 |
CN114935211B (zh) * | 2022-02-22 | 2024-04-30 | 江苏亚电科技股份有限公司 | 一种清洗液加热筒 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2913935Y (zh) * | 2006-05-11 | 2007-06-20 | 龚智勇 | 流体微波加热装置 |
CN106839407A (zh) * | 2016-12-29 | 2017-06-13 | 芜湖市易众电器有限公司 | 一种多段加热型电加热器 |
CN106839396A (zh) * | 2016-12-29 | 2017-06-13 | 芜湖市易众电器有限公司 | 一种防爆电加热器 |
CN112616206A (zh) * | 2020-12-30 | 2021-04-06 | 江苏亚电科技有限公司 | 一种在线加热器 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4395618A (en) * | 1980-03-03 | 1983-07-26 | Emerson Electric Co. | Electric circulation heater for heating fluids such as oil |
CN104807190A (zh) * | 2015-05-07 | 2015-07-29 | 华能无锡电热器材有限公司 | 高效电加热器 |
CN108266890B (zh) * | 2016-12-30 | 2021-06-25 | 杭州三花研究院有限公司 | 电加热器 |
CN213984012U (zh) * | 2020-12-30 | 2021-08-17 | 江苏亚电科技有限公司 | 一种在线加热器 |
-
2020
- 2020-12-30 CN CN202011615735.7A patent/CN112616206B/zh active Active
-
2021
- 2021-12-17 CN CN202180077561.XA patent/CN116686075B/zh active Active
- 2021-12-17 WO PCT/CN2021/139135 patent/WO2022143223A1/fr active Application Filing
- 2021-12-17 KR KR1020237021838A patent/KR20230127232A/ko unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2913935Y (zh) * | 2006-05-11 | 2007-06-20 | 龚智勇 | 流体微波加热装置 |
CN106839407A (zh) * | 2016-12-29 | 2017-06-13 | 芜湖市易众电器有限公司 | 一种多段加热型电加热器 |
CN106839396A (zh) * | 2016-12-29 | 2017-06-13 | 芜湖市易众电器有限公司 | 一种防爆电加热器 |
CN112616206A (zh) * | 2020-12-30 | 2021-04-06 | 江苏亚电科技有限公司 | 一种在线加热器 |
Also Published As
Publication number | Publication date |
---|---|
CN116686075A (zh) | 2023-09-01 |
KR20230127232A (ko) | 2023-08-31 |
CN112616206A (zh) | 2021-04-06 |
CN112616206B (zh) | 2023-04-21 |
CN116686075B (zh) | 2024-04-30 |
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