WO2022041701A1 - 原子磁强计及磁场成像系统 - Google Patents

原子磁强计及磁场成像系统 Download PDF

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Publication number
WO2022041701A1
WO2022041701A1 PCT/CN2021/081967 CN2021081967W WO2022041701A1 WO 2022041701 A1 WO2022041701 A1 WO 2022041701A1 CN 2021081967 W CN2021081967 W CN 2021081967W WO 2022041701 A1 WO2022041701 A1 WO 2022041701A1
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module
magnetic field
atomic
light
wavelength laser
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English (en)
French (fr)
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冯焱颖
李晓杰
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Tsinghua University
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Tsinghua University
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/032—Measuring direction or magnitude of magnetic fields or magnetic flux using magneto-optic devices, e.g. Faraday or Cotton-Mouton effect

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  • the present application relates to the technical field of precision measurement equipment, and in particular, to an atomic magnetometer and a magnetic field imaging system.
  • An atomic magnetometer is a sensor that precisely measures weak magnetic fields. Because the working condition of atomic magnetometer does not require ultra-low temperature environment and has extremely high magnetic measurement sensitivity, it has gradually become an extremely weak magnetic detection method comparable to superconducting quantum interference devices in the field of weak magnetic detection.
  • the atomic magnetometer has advantages in terms of system volume, distance from the measured body, power consumption, etc. It can be used in the field of magneto-brain imaging, the detection of extremely weak magnetic fields caused by the current of the heart and brain nerves, and the detection of coronary heart disease, epilepsy and other diseases. It has important application value in the assessment of children's heart and brain health.
  • the basic principle is to use light to prepare polarized alkali metal atoms through the interaction of light and atoms, and to detect the Lamor process of atomic electron spins under the action of an external magnetic field. move, so as to realize the sensing of the magnetic field.
  • the general atomic magnetometer works under the condition of no spin-exchange-relaxation-free (SERF).
  • the gas chamber of alkali metal atoms should be heated to a certain high temperature state to increase the number density of alkali metal atoms in the gas chamber, and reduce the ambient magnetic field to near zero magnetic field, and the final Larmor precession frequency is much smaller than the spin exchange relaxation, The spin-exchange relaxation is effectively suppressed. Therefore, the atomic magnetometer needs to be heated at a higher temperature on the one hand, and at the same time, it must be ensured that the heating process will not generate excessive magnetic noise and reduce the sensitivity of the magnetometer.
  • the heating methods of traditional atomic magnetometers mainly include hot air heating and electric heating.
  • Thermal airflow heating requires an external airflow source, and the airflow source will generate certain thermal airflow fluctuations and affect the stability of the system.
  • the electric heating method will inevitably introduce certain magnetic field noise due to the heating current and the remanence of the metal material. Therefore, the heating method of the traditional atomic magnetometer will still introduce interference factors, which will interfere with the magnetic field, resulting in a low detection accuracy of the atomic magnetometer.
  • the present application discloses an atomic magnetometer and a magnetic field imaging system.
  • the present application provides an atomic magnetometer.
  • the atomic magnetometer includes a laser light source, a frequency doubling module, an atomic gas chamber and a light absorption module.
  • the laser light source is used for emitting laser light of the first wavelength.
  • the frequency doubling module is arranged on the optical path of the first wavelength laser light, and is used for converting part of the first wavelength laser light into the second wavelength laser light.
  • the atomic gas chamber is arranged on the optical path of the first wavelength laser light.
  • the light absorption module is disposed on the optical path of the first wavelength laser light.
  • the light absorption module is arranged on the surface of the atomic gas chamber, and is used for absorbing the first wavelength laser light and converting it into thermal energy to heat the atomic gas chamber.
  • the second wavelength laser is used to enter the atomic gas chamber and interact with the atomic gas in the atomic gas chamber to detect magnetic field signals.
  • a part of the laser light is frequency doubled to form a frequency doubled laser whose wavelength is half the original wavelength.
  • the other part of the laser maintains the original wavelength, and the two parts of the laser are transmitted in the same optical path. That is, the wavelength of the first wavelength laser light is twice the wavelength of the second wavelength laser light.
  • the first wavelength laser light and the second wavelength laser light share the same optical path for transmission.
  • the frequency doubling module the wavelength of the original first wavelength laser is frequency doubled to form the second wavelength laser.
  • the second wavelength laser light formed after frequency doubling by the frequency doubling module corresponds to the resonance transition spectral line of the energy level of the sensitive gas.
  • the surface of the atomic gas chamber is provided with the light absorption module, which has strong absorption of the first wavelength laser light. It can be understood that the light absorption module absorbs laser light of a specific wavelength. The first wavelength laser light will be strongly absorbed after passing through the light absorption module, and converted into heat for heating the atomic gas chamber.
  • the output light is irradiated to the photoelectric detection module through the focusing lens for detection, so as to realize the detection of the magnetic field signal. Probe.
  • the optical power detected by the photoelectric detection module will change, so as to obtain the magnetic field measurement signal.
  • the laser light source with a fixed wavelength and the frequency doubling module can realize frequency doubling of the laser, and output the first wavelength laser (original wavelength laser) and the second wavelength laser (frequency doubled wavelength laser) ).
  • the first wavelength laser (original wavelength laser) is used to heat the atomic gas cell.
  • the second wavelength laser (frequency-doubled wavelength laser) is used to enter the atomic gas chamber to realize the pumping and detection of the atomic magnetometer.
  • the atomic magnetometer described in the present application can meet the requirements of optical heating and optical pumping detection through one of the laser light source and one of the frequency doubling modules.
  • the atomic magnetometer does not introduce an electrical part that interferes with the magnetic field around the atomic gas chamber, and avoids the introduction of magnetic field noise.
  • the atomic magnetometer has a simple structure, reduces the use of the number of devices, and is beneficial to reducing costs.
  • the first wavelength laser and the second wavelength laser in the atomic magnetometer share the same path, which reduces the complexity of the optical system and facilitates system integration.
  • FIG. 1 is a schematic structural diagram of an atomic magnetometer in an embodiment provided by the present application.
  • FIG. 2 is a schematic structural diagram of an atomic magnetometer in an embodiment provided by the present application.
  • FIG. 3 is a schematic diagram of a physical packaging structure of an atomic gas chamber in an embodiment provided by the present application.
  • FIG. 4 is a schematic structural diagram of an atomic magnetometer in an embodiment provided by the present application.
  • FIG. 5 is a schematic diagram of a connection structure of a magnetic field control phase-locked amplifying module and a magnetic field modulation coil in an embodiment provided by the present application.
  • FIG. 6 is a schematic structural diagram of an atomic magnetometer in an embodiment provided by the present application.
  • FIG. 7 is a schematic structural diagram of an atomic magnetometer in an embodiment provided by the present application.
  • FIG. 8 is a schematic diagram of a physical packaging structure of an atomic gas chamber in an embodiment provided by the present application.
  • FIG. 9 is a schematic structural diagram of a magnetic field imaging system according to an embodiment of the present application.
  • FIG. 10 is a schematic structural diagram of a position measurement control array and an atomic magnetometer probe in a magnetic field imaging system according to an embodiment of the present application.
  • the present application provides an atomic magnetometer 100 .
  • the atomic magnetometer 100 includes a laser light source 10 , a frequency doubling module 20 , an atomic gas chamber 510 and a light absorption module 520 .
  • the laser light source 10 is used for emitting laser light of the first wavelength.
  • the frequency doubling module 20 is disposed on the optical path of the first wavelength laser light, and is used for converting part of the first wavelength laser light into the second wavelength laser light.
  • the atomic gas chamber 510 is disposed on the optical path of the first wavelength laser light.
  • the light absorption module 520 is disposed on the optical path of the first wavelength laser light.
  • the light absorption module 520 is disposed on the surface of the atomic gas chamber 510 for absorbing the first wavelength laser light and converting it into thermal energy to heat the atomic gas chamber 510 .
  • the second wavelength laser is used to enter the atomic gas chamber 510 and interact with the atomic gas in the atomic gas chamber 510, so as to realize the detection of magnetic field signals.
  • a part of the laser light is frequency doubled to form a frequency doubled laser whose wavelength is half of the original wavelength.
  • the other part of the laser maintains the original wavelength, and the two parts of the laser are transmitted in the same optical path. That is, the wavelength of the first wavelength laser light is twice the wavelength of the second wavelength laser light.
  • the first wavelength laser light and the second wavelength laser light share the same optical path for transmission.
  • the atomic gas chamber 510 contains sensitive gas (eg, alkali metal atoms) and buffer gas (eg, nitrogen gas).
  • sensitive gas eg, alkali metal atoms
  • buffer gas eg, nitrogen gas.
  • the wavelength of the original first wavelength laser light eg, wavelength of 1590 nm
  • the second wavelength laser eg, wavelength of 795 nm
  • the second wavelength laser formed after 20 frequency doubling by the frequency doubling module corresponds to the resonance transition spectral line of the energy level of the sensitive gas (eg, rubidium atom).
  • the light absorption module 520 is disposed on the surface of the atomic gas chamber 510, and has strong absorption of the first wavelength laser light. It can be understood that the light absorption module 520 absorbs laser light of a specific wavelength. The first wavelength laser light will be strongly absorbed after passing through the light absorption module 520 , and converted into heat for heating the atomic gas chamber 510 .
  • the output light is irradiated to the photoelectric detection module through the focusing lens for detection.
  • the optical power detected by the photoelectric detection module will change, so as to obtain the magnetic field measurement signal.
  • the laser light source 10 and the frequency doubling module 20 with a fixed wavelength can realize frequency doubling of the laser, and output the first wavelength laser (original wavelength laser) and the second wavelength laser (after frequency doubling) wavelength laser).
  • the first wavelength laser original wavelength laser
  • the second wavelength laser frequency-doubled wavelength laser
  • the atomic magnetometer 100 of the present application can meet the requirements of optical heating and optical pumping detection through one of the laser light sources 10 and one of the frequency doubling modules 20 .
  • the atomic magnetometer 100 does not introduce an electrical part that interferes with the magnetic field around the atomic gas chamber, thereby avoiding the introduction of magnetic field noise.
  • the atomic magnetometer 100 has a simple structure, reduces the use of the number of devices, and is conducive to reducing costs.
  • the first wavelength laser and the second wavelength laser in the atomic magnetometer 100 share the same path, which reduces the complexity of the optical system and facilitates system integration.
  • the atomic gas chamber 510 is a closed glass chamber containing sensitive gases (eg, alkali metal atoms) and buffer gases (eg, nitrogen gas) or other closed chambers with light-transmitting windows.
  • sensitive gases eg, alkali metal atoms
  • buffer gases eg, nitrogen gas
  • the frequency doubling module 20 is a periodically polarized lithium niobate (PPLN) crystal.
  • the wavelength range of the periodically polarized lithium niobate (PPLN) crystal is 0.4 ⁇ m-5 ⁇ m. At this time, in the visible light and infrared band ranges, periodically polarized lithium niobate (PPLN) crystal has lower scattering and absorption, and can better achieve laser frequency doubling.
  • the light absorption module 520 includes a first light absorption structure 521 and a second light absorption structure 522 .
  • the first light absorbing structure 521 and the second light absorbing structure 522 are disposed on two opposite surfaces of the atomic gas chamber 510 .
  • the first wavelength laser light passes through the first light absorption structure 521 , the atomic gas chamber 510 and the second light absorption structure 522 in sequence.
  • heating can be performed from both sides of the atomic gas chamber 510 through the first light absorbing structure 521 and the second light absorbing structure 522 .
  • the first light absorbing structure 521 and the second light absorbing structure 522 strongly absorb the laser light of the first wavelength.
  • the sensitive gas in the atomic gas chamber 510 interacts with the second wavelength laser, and the first wavelength laser will not interfere with it.
  • the first light absorbing structure 521 and the second light absorbing structure 522 are disposed on the outer wall of the atomic gas chamber 510 (the surface away from the sensitive gas).
  • the first light absorbing structure 521 and the second light absorbing structure 522 are disposed on the outer walls of the two sides of the atomic gas chamber 510 by means of bonding.
  • the first light absorbing structure 521 and the second light absorbing structure 522 are heated glass.
  • the heated glass is bonded to the surface of the atomic gas chamber 510 .
  • the heated glass strongly absorbs the first wavelength laser (1590 nm laser), while the second wavelength laser can pass through the heated glass with high efficiency.
  • the thickness of the second light absorbing structure 522 is greater than the thickness of the first light absorbing structure 521 .
  • the first wavelength laser light passes through the first light absorption structure 521 , the atomic gas chamber 510 and the second light absorption structure 522 in sequence.
  • the second light absorbing structure 522 is disposed on the rear side of the atomic gas chamber 510 and is thicker than the thickness of the first light absorbing structure 521, so that the absorption and heating laser efficiency of the front and rear sides is the same, and the absorbed laser energy Converted into thermal energy, the atomic gas chamber is directly heated uniformly.
  • the atomic magnetometer 100 further includes a light attenuation module 30 , a temperature detection module 530 and a temperature control module 40 .
  • the light attenuation module 30 is disposed on the optical path of the first wavelength laser light, and is used to adjust the power of the first wavelength laser light.
  • the temperature detection module 530 is disposed on the surface of the atomic gas chamber 510 for monitoring the real-time measured temperature of the atomic gas chamber 510 .
  • the monitoring end of the temperature control module 40 is connected to the temperature detection module 530 for acquiring the real-time measured temperature.
  • the control end of the temperature control module 40 is connected to the optical attenuation module 30, and is used for adjusting the optical attenuation module 30 to change the power of the first wavelength laser light according to the real-time measurement temperature.
  • the optical attenuation module 30 is used to adjust the optical power of the first wavelength laser, which can be understood as the optical attenuation module 30 attenuating the laser of a specific wavelength.
  • the light power of the first wavelength laser injected into the light absorption module 520 can be adjusted by the light attenuation module 30 , so as to realize the temperature adjustment of the atomic gas chamber 510 .
  • the first wavelength laser light and the second wavelength laser light after passing through the frequency doubling module 20 pass through the optical attenuation module 30 with wavelength selectivity to adjust the power of the non-frequency doubling wavelength laser light.
  • the temperature detection module 530 can monitor the temperature of the atomic gas chamber 510 in real time, and convert the real-time measured temperature into an electrical signal and transmit it to the temperature control module 40 .
  • the temperature control module 40 compares with the target temperature based on the real-time measured temperature to obtain a temperature difference.
  • the temperature control module 40 regulates the light attenuation module 30 through a PID controller, so as to change the power of the first wavelength laser, so as to control the temperature of the atomic gas chamber 510 .
  • the temperature control module 40 includes a feedback control module (not shown in the figure).
  • the feedback control module is configured to compare the real-time measured temperature with the target temperature, and use a feedback control method to regulate the optical attenuation module 30 to change the power of the first wavelength laser.
  • the feedback control module includes, but is not limited to, a Microcontroller Unit (MCU), a Central Processing Unit (Center Processor Unit, CPU), an embedded microcontroller (Micro ControllerUnit, MCU), an embedded microprocessor (Micro Processor Unit) , MPU), embedded system on chip (System on Chip, SOC), etc.
  • the temperature control module 40 controls the angle of the 1590nm optical filter (variable optical attenuation plate) whose optical filtering efficiency is linearly variable.
  • the temperature control module 40 controls the polarization angle of the linearly polarized light in front of the polarizing beam splitting prism (PBS) beam splitter, so as to control the optical power (heating) of the first wavelength laser injected into the surface of the atomic gas chamber 510. laser light power) to achieve temperature control of the atomic gas chamber 510.
  • PBS polarizing beam splitting prism
  • the temperature detection module 530 may be a temperature sensor, such as a non-magnetic platinum resistance.
  • the atomic magnetometer 100 further includes a photodetection module 60 .
  • the photoelectric detection module 60 is disposed on the optical path of the second wavelength laser light, and is used for receiving the second wavelength laser light after passing through the atomic gas chamber 510 .
  • the output light is irradiated to the photoelectric detection module 60 through a focusing lens for detection. Probe.
  • the optical power detected by the photoelectric detection module 60 will change, so as to obtain a signal of magnetic field measurement.
  • the atomic magnetometer 100 further includes a heating chamber 540 , a magnetic field modulation coil 550 and a bias magnetic field coil 560 .
  • the heating chamber 540 surrounds and forms a heating space.
  • the light absorption module 520 , the atomic gas chamber 510 and the temperature detection module 530 are disposed in the heating space.
  • the magnetic field modulation coil 550 is disposed around the heating chamber 540 for modulating the magnetic field in a certain direction.
  • the bias magnetic field coil 560 is disposed around the heating chamber 540 for zeroing the magnetic field of the atomic gas chamber 510 when there is no magnetic signal.
  • the heating chamber 540 forms a heat shielding layer to ensure that the temperature of the heating space is stable.
  • the temperature detection module 530 is disposed in the heating chamber 540 and on the outer sidewall of the atomic gas chamber 510 , and can monitor the temperature of the atomic gas chamber 510 in real time.
  • the magnetic field modulation coil 550 may be a two-dimensional magnetic field modulation coil disposed around the heating chamber 540 for modulating the magnetic field in a certain direction.
  • the bias magnetic field coil 560 can be a three-dimensional bias magnetic field coil, which is arranged around the heating chamber 540 to compensate for the influence of the residual magnetic field (such as geomagnetism) in the atomic gas chamber 510, so that the atomic gas chamber The 510 zeroes the magnetic field in the absence of a magnetic signal.
  • the residual magnetic field such as geomagnetism
  • the magnetic field modulation coil 550 includes a first modulation coil 551 and a second modulation coil 552 .
  • both the first modulation coil 551 and the second modulation coil 552 are arranged in a direction perpendicular to the optical path of the second wavelength laser, and are modulated from two directions, as shown in FIG. 4 .
  • the atomic magnetometer 100 further includes a physical package outer cavity (not shown in the figure), and a non-metallic material with low thermal conductivity is selected.
  • the atomic gas chamber 510 , the heating chamber 540 , the magnetic field modulation coil 550 and the bias magnetic field coil 560 are fixed by physically encapsulating an outer cavity.
  • a high temperature working environment is provided for the atomic gas chamber 510 by physically encapsulating the outer cavity, so that the atomic magnetometer 100 can meet the SERF working conditions.
  • the magnetic field modulation coil 550 and the bias magnetic field coil 560 are fixed on the surface of the physical package outer cavity including the atomic gas chamber 510 .
  • the magnetic field modulation coil 550 and the bias magnetic field coil 560 are Helmholtz coil structures.
  • the atomic magnetometer 100 needs to work near zero magnetic field, and the bias magnetic field coil 560 is fixed on the surface of the physical package outer cavity of the atomic gas chamber 510 to compensate for the residual magnetic field in the atomic gas chamber 510 (eg Under the influence of geomagnetism), the magnetic field of the atomic gas chamber 510 is set to zero when there is no magnetic signal.
  • the atomic gas chamber 510, the first light absorption structure 521 (heating glass), the second light absorption structure 522 (heating glass), and the temperature detection module 530 (temperature sensor), the magnetic field modulation coil 550 (two-dimensional magnetic field modulation coil), and the bias magnetic field coil 560 (three-dimensional compensation coil) form sensitive components for realizing magnetic field measurement.
  • the atomic magnetometer 100 further includes a signal generating module 810 .
  • the signal generating module 810 is used for generating two modulated signals of the same frequency.
  • the signal generating module 810 is connected to the magnetic field modulation coil 550, and is used for modulating the magnetic field in a certain direction through a modulation signal.
  • the signal generating module 810 outputs two channels of sine wave or square wave signals of the same frequency to form two channels of modulation signals of the same frequency.
  • One of the modulation signals is outputted to one of the magnetic field modulation coils 550 (two-dimensional magnetic field modulation coils) to realize modulation of the magnetic field in a certain direction.
  • the signal generating module 810 is a signal generator for outputting a sine wave or square wave signal.
  • the atomic magnetometer 100 further includes a phase shifting module 820 and a low-pass filtering module 830 .
  • the first input terminal of the phase shifting module 820 is connected to the signal generating module 810 .
  • the second input terminal of the phase shifting module 820 is connected to the output terminal of the photoelectric detection module 60, and is used for modulating the magnetic field detection signal through another modulation signal.
  • the low-pass filtering module 830 is connected to the output end of the phase-shifting module 820, and is used for phase-locking amplifying and outputting the modulated magnetic field detection signal.
  • the magnetic field detection signal received by the photoelectric detection module 60 includes magnetic field information.
  • the other modulated signal output by the signal generation module 810 is multiplied by the magnetic field detection signal through the phase shift module 820 to realize modulation of the magnetic field detection signal.
  • the modulated magnetic field detection signal is passed through the low-pass filter module 830, the phase-locked amplification output of the magnetic field signal is realized. Therefore, the signal-to-noise ratio of the magnetic field detection signal is improved by the lock-in amplifying output.
  • the phase shifting module 820 is a phase shifter.
  • the low-pass filtering module 830 is a low-pass filter.
  • the atomic magnetometer 100 further includes an optical amplification module 710 , a collimation module 720 , a polarization module 730 and a first quarter wave plate 740 .
  • the optical amplification module 710 is disposed on the optical path of the first wavelength laser light, and is used for amplifying the first wavelength laser light.
  • the collimation module 720 is disposed on the optical path of the first wavelength laser light, and is used for collimating the first wavelength laser light and the second wavelength laser light formed by the frequency doubling module 20 .
  • the polarization module 730 is disposed on the optical path of the first wavelength laser light, and is used for polarizing the second wavelength laser light after passing through the light attenuation module 30 .
  • the first quarter wave plate 740 is disposed on the optical path of the first wavelength laser light, and is used for converting the second wavelength laser light after passing through the polarization module 730 to form circularly polarized light.
  • the first wavelength laser (eg, 1590 nm laser) output by the laser light source 10 generally has a small output optical power.
  • the optical amplification module 710 amplifies the laser power of the first wavelength laser (eg, 1590 nm laser).
  • the amplified first wavelength laser (eg, 1590 nm laser) is input into the frequency doubling module 20 .
  • the wavelength of the first wavelength laser (eg, 1590 nm laser) is frequency doubled by the frequency doubling module 20 to form the second wavelength laser (795 nm laser).
  • the frequency-doubling laser light of the second wavelength corresponds to the resonance transition spectral line of the energy level of the sensitive gas (eg, rubidium atom) in the atomic gas chamber 510 .
  • the first wavelength laser and the second wavelength laser after passing through the frequency doubling module 20 are collimated into parallel beams by the collimation module 720 , so that the parallel beams are irradiated to the atomic gas chamber 510 .
  • the optical power of the first wavelength laser light and the second wavelength laser light after passing through the collimation module 720 are regulated by the light attenuation module 30 .
  • the first wavelength laser and the second wavelength laser are coupled by an optical fiber, and then pass through the polarization module 730 (the polarizer of the second wavelength laser) and the second wavelength laser in sequence.
  • the polarization module 730 the polarizer of the second wavelength laser
  • the second wavelength laser light enters the atomic gas chamber 510 through the polarization module 730 and the first quarter-wave plate 740 in sequence, forming an optical path structure in which the probe light and the pump light share a common path.
  • the second wavelength laser light (eg, 795 nm laser light) passing through the optical attenuation module 30 passes through the polarization module 730 and the first quarter-wave plate of the corresponding wavelength. 740, converted to circularly polarized light.
  • the spin polarization direction of the circularly polarized light is the same as the direction of the light beam transmission.
  • the second wavelength laser (eg, 795 nm laser) passes through the first light absorbing structure 521 (heating glass) and the glass gas chamber window of the atomic gas chamber 510 in sequence with high efficiency, and enters the atomic gas chamber 510 .
  • the second wavelength laser (eg, 795 nm laser) interacts with the rubidium atomic gas in the atomic gas chamber 510 .
  • the interaction between the atomic spin and the probe light changes the polarization characteristics of the atomic gas, the polarization direction of the light is deflected, and the optical power changes. Therefore, the circularly polarized light passing through the atomic gas cell 510 (ie, the output light of the atomic gas cell 510 ) is received by the photodetection module 60 through a focusing lens. Alternatively, the output light of the atomic gas cell 510 is coupled into the optical fiber through a fiber coupling head.
  • the photoelectric detection module 60 is used for detection at the other end of the optical fiber.
  • the photoelectric detection module 60 converts the optical signal into an electrical signal, which is used for analysis and calculation to obtain a signal of magnetic field measurement.
  • the atomic magnetometer 100 in the present application can output the laser component including the original wavelength and the laser component after the frequency doubled wavelength through one of the laser light sources 10 and one of the frequency doubling modules 20 .
  • the laser component of the original wavelength is used to heat the atomic gas chamber.
  • the laser component of the frequency doubled wavelength is used to realize the pumping and detection of the atomic magnetometer.
  • the laser light source 10 is a laser.
  • the polarizing module 730 is a polarizer.
  • the optical amplifier module 710 is an optical amplifier, which may be an erbium-doped fiber amplifier or the like.
  • the collimation module 720 is a non-magnetic fiber collimator.
  • the laser, the optical amplifier and the frequency doubling crystal can all use the crystal-fiber integrated structure. Connect the laser and other amplification and frequency doubling components through fiber optic adapters.
  • the broadband high-power single-mode polarization-maintaining fiber can simultaneously satisfy the transmission of the first wavelength laser (1590 nm laser) and the second wavelength laser (795 nm laser), and the structure is simple and convenient for integrated packaging.
  • the atomic magnetometer 100 further includes a first spectroscopic module 910 , a half-wave plate 920 and a second quarter-wave plate 930 .
  • the first light splitting module 910 is disposed on the optical path of the second wavelength laser light, and is used for dividing the second wavelength laser light after passing through the light attenuation module 30 into mutually perpendicular pump light and probe light.
  • the half-wave plate 920 is disposed on the optical path of the probe light, and is used to adjust the polarization angle of the probe light.
  • the probe light after passing through the half-wave plate 920 enters the atomic gas chamber 510 .
  • the second quarter wave plate 930 is disposed on the optical path of the pump light, and is used for converting the pump light into pump circularly polarized light.
  • the pump light after passing through the second quarter wave plate 930 enters the atomic gas chamber 510 .
  • the second wavelength laser passes through the first light splitting module 910 to form two mutually perpendicular light paths.
  • One path is probe light, which enters the atomic gas chamber 510 through the half-wave plate 920 .
  • the other path is pump light, which enters the atomic gas chamber 510 through the second quarter-wave plate 930. Therefore, a light path structure perpendicular to the probe light and the pump light is formed by the first light splitting module 910 , the half wave plate 920 and the second quarter wave plate 930 .
  • the second wavelength laser light (eg, 795 nm laser light) passing through the light attenuation module 30 is divided into two paths by the first light splitting module 910 of the corresponding wavelength.
  • one pump light is converted into circularly polarized light by the second quarter wave plate 930 and irradiated into the atomic gas cell 510 for optical pumping.
  • the other probe light perpendicular to the pump light is used to adjust the polarization angle of the linearly polarized light entering the atomic gas chamber 510 through the half-wave plate 920 .
  • the probe light after passing through the half-wave plate 920 is irradiated on the atomic gas pumped and polarized by the pump light, and then detected and received by the photoelectric detection module 60 .
  • the atomic magnetometer 100 adopts an optical path structure in which the detection light and the pumping light are perpendicular, and enters the atomic gas chamber 510 from two directions, thereby improving the detection accuracy of the magnetic field.
  • the first light splitting module 910 is a light splitting prism, which has wavelength selectivity and is used to split the second wavelength laser light (eg, 795 nm laser light).
  • the optical amplification module 710 for the optical path structure of the probe light and the pump light perpendicular to the laser light source 10, the optical amplification module 710, the frequency doubling module 20, the collimation module 720, the optical attenuation module 30, the temperature
  • the relative positional relationship of the control module 40 , the magnetic field control phase-locked amplifying module 80 , and the photoelectric detection module 60 is the same as the optical path structure in which the detection light and the pumping light share the same path, and can refer to the above embodiments.
  • the magnetic field modulation coil 550 is arranged perpendicular to the probe light direction, and modulates from one direction, as shown in FIG. 7 and FIG. 8 .
  • the signal generating module 810 is connected to the magnetic field modulation coil 550 for modulating the magnetic field in a certain direction through a modulation signal.
  • the bias magnetic field coil 560 includes a first bias coil 561, a second bias coil 562 and a third bias coil 563, which are respectively arranged perpendicular to the optical path and distributed in different directions.
  • the bias magnetic field coil 560 is connected to a steady current source.
  • the steady current source is output to the bias magnetic field coil 560 (three-dimensional bias magnetic field coil) for magnetic field reset.
  • the spin polarization direction of the pump light is consistent with the light transmission direction.
  • the scanning magnetic field is scanned near zero magnetic field, which affects the polarization properties of light according to the Hanle effect.
  • the photoelectric detection module 60 receives the output light from the atomic gas chamber 510, it will detect the absorption peak at the zero magnetic field position.
  • the magnitude of the magnetic field is modulated by the signal generating module 810, and then demodulated by the phase-locked amplification loop, and the PID feedback control is performed to the zero-field position.
  • accurate magnetic field measurements are made using the calibration magnetic field and the feedback signal.
  • the present application provides a magnetic field imaging system 200 .
  • the magnetic field imaging system 200 includes a laser light source 10 , a frequency doubling module 20 , a second light splitting module 201 , and a plurality of atomic magnetometer probes 206 .
  • the laser light source 10 is used for emitting laser light of the first wavelength.
  • the frequency doubling module 20 is disposed on the optical path of the first wavelength laser light, and is used for converting part of the first wavelength laser light into the second wavelength laser light.
  • the second light splitting module 201 is disposed on the optical path of the first wavelength laser light, and is used to divide the first wavelength laser light into a plurality of first wavelength sub-beams, and the second wavelength laser light into a plurality of second wavelength sub-beams sub-beam. Wherein, one of the first wavelength sub-beams and one of the second wavelength sub-beams share an optical path.
  • Each of the atomic magnetometer probes 206 includes a light attenuation module 30 , an atomic gas chamber 510 and a light absorption module 520 .
  • the atomic gas chamber 510 is disposed on the optical path of the first wavelength sub-beam.
  • Each of the light attenuation modules 30 is disposed on the optical path of the first wavelength sub-beam, and is used to adjust the power of the first wavelength sub-beam.
  • the light absorption module 520 is disposed on the optical path of the first wavelength sub-beam.
  • the light absorption module 520 is disposed on the surface of the atomic gas chamber 510 for absorbing the first wavelength sub-beam and converting it into thermal energy to heat the atomic gas chamber 510 .
  • the second wavelength sub-beam is used to enter the atomic gas chamber 510 and interact with the atomic gas in the atomic gas chamber 510 .
  • one of the laser light sources 10 outputs laser light of the first wavelength.
  • the first wavelength laser and the second wavelength laser are formed after passing through the frequency doubling module 20 .
  • the second wavelength laser corresponds to the resonance transition of the atomic energy level, which is half the wavelength of the first wavelength laser.
  • the first wavelength laser and the second wavelength laser share an optical path, and are transmitted in the same optical path.
  • the second beam splitting module 201 forms multiple optical paths, and the multiple optical channels are connected to a plurality of the atomic magnetometer probes 206 . Therefore, a plurality of the atomic magnetometer probes 206 jointly use the same laser as a light source.
  • the laser light source 10 outputs the first wavelength laser light (1590 nm laser light). After the first wavelength laser (1590 nm laser) passes through the frequency doubling module 20, it is formed to contain both the first wavelength laser (1590 nm) component and the second wavelength laser (795 nm laser) component. Two different wavelengths of laser light are split through the second beam splitting module 201 to form multiple optical channels, and are connected to a plurality of the atomic magnetometer probes 206 . The second wavelength laser (795 nm laser) enters the atomic gas chamber 510 in the atomic magnetometer probe 206 to interact with the atoms, so as to measure the magnetic field signal.
  • a helmet worn on the head for fixing the plurality of atomic magnetometer probes 206 can be prepared according to the shape of the brain.
  • a plurality of the atomic magnetometer probes 206 are fixed with mechanical support at the position where the magnetic field measurement is required.
  • an atomic magnetometer probe array is formed on the surface of the brain to measure the magnetic field at the position of the probe.
  • the magnetic field imaging system 200 forms an atomic magnetometer array by using a single laser light source, the frequency doubling module 20 , the second light splitting module 201 and a plurality of the atomic magnetometer probes 206 , which can be realized at the same time.
  • Light heating and magnetic field detection At the same time, since the lasers in the plurality of atomic magnetometer probes 206 all come from the same laser light source, the magnetic field imaging system 200 has good common mode noise rejection, and can obtain magnetic field images with lower noise.
  • a plurality of the atomic magnetometer probes 206 share one of the laser light source 10 and the frequency doubling module 20, which can reduce the manufacturing cost.
  • the second optical splitting module 201 is an optical fiber beam splitter. After the second wavelength laser light (795 nm laser light) enters the atomic gas chamber 510 of the atomic magnetometer probe 206 and interacts with the atoms, the output laser light is received by the photoelectric detection module 60 .
  • the photoelectric detection module 60 may be integrated into the atomic magnetometer probe 206 .
  • the laser light output from the atomic gas chambers 510 in the plurality of atomic magnetometer probes 206 is coupled out of the probes through an optical fiber coupling head, and is connected to the plurality of the photoelectric detection modules 60 .
  • the magnetic field imaging system 200 further includes a temperature control array 202 .
  • the temperature control array 202 is respectively connected with a plurality of the atomic magnetometer probes 206 for regulating and controlling the atomic magnetometer probes 206 to change the power of the first wavelength sub-beam.
  • a plurality of the temperature control modules 40 form the temperature control array 202 .
  • Each of the temperature control modules 40 is connected to each of the atomic magnetometer probes 206 in a one-to-one correspondence, and is used for regulating and controlling the atomic magnetometer probes 206 to change the power of the first wavelength sub-beam.
  • the power of the first wavelength sub-beam is the optical power of the heating laser that heats the atomic gas chamber 510 .
  • each atomic magnetometer probe 206 further includes at least the polarization module 730, the first quarter-wave plate 740, and the temperature detection module 530 involved in the above embodiment , the heating chamber 540, the magnetic field modulation coil 550, the bias magnetic field coil 560, and the like.
  • each of the atomic magnetometer probes 206 further includes at least the first spectroscopic module 910, the half-wave plate 920, and the second quarter-wave plate involved in the above embodiments 930, the temperature detection module 530, the heating chamber 540, the magnetic field modulation coil 550, the bias magnetic field coil 560, and the like.
  • each temperature control module 40 is connected to the temperature detection module 530 for acquiring the real-time measured temperature.
  • the control end of each temperature control module 40 is connected to the light attenuation module 30 for comparing the real-time measured temperature with the target temperature, and using feedback control to adjust the light attenuation module 30 to change The power of the first wavelength sub-beam realizes temperature adjustment.
  • each of the atomic magnetometer probes 206 is provided in a one-to-one correspondence with each of the temperature control modules 40 .
  • a plurality of the temperature control modules 40 constitute the temperature control array 202 to actively control the temperature of the plurality of atomic magnetometer probes 206 as a whole, that is, to actively control the temperature of the atomic gas chamber 510 to be stable within a certain range .
  • the magnetic field imaging system 200 further includes a position measurement control array 207 .
  • the position measurement control array 207 includes a plurality of position sensing modules 2071 and a plurality of displacement control modules 2072 .
  • Each of the position sensing modules 2071 is disposed on each of the atomic magnetometer probes 206 for measuring the spatial position of the atomic magnetometer probes 206 .
  • Each of the displacement control modules 2072 is disposed on each of the atomic magnetometer probes 206 for controlling the displacement of the atomic magnetometer probes 206 .
  • a plurality of the atomic magnetometer probes 206 are fixed and arranged in a probe array.
  • the spatial position of the magnetic field measured by the atomic magnetometer probe 206 is measured by the position sensing module 2071 .
  • the micro-displacement adjustment of the atomic magnetometer probe 206 is performed by the displacement control module 2072 .
  • Each of the atomic magnetometer probes 206 is provided with the position sensing module 2071 and the displacement control module 2072 to measure and adjust the spatial position of the magnetic field measured by the atomic magnetometer probe 206 . Therefore, the space in the magnetic field imaging process can be located by the spatial position of the measured magnetic field.
  • the position sensing module 2071 is a position sensor, such as a photoelectric position sensor.
  • the displacement control module 2072 is a displacement controller.
  • the magnetic field imaging system 200 further includes a signal acquisition and processing array 204 .
  • the signal acquisition and processing array 204 includes a plurality of signal acquisition and processing modules (not marked in the figure). Each of the signal acquisition and processing modules is connected to each of the position sensing modules 2071 for acquiring the spatial position of the atomic magnetometer probe 206 . Each of the signal acquisition and processing modules is connected to each of the displacement control modules 2072 for regulating the displacement of the atomic magnetometer probe 206 . Each of the signal acquisition and processing modules is connected to the output end of each of the atomic magnetometer probes 206 for collecting magnetic field signals detected by the atomic magnetometer probes 206 .
  • the magnetic field signal detected by each of the atomic magnetometer probes 206 and the spatial position information of each of the atomic magnetometer probes 206 are transmitted to each of the signal acquisition and processing modules.
  • the signal acquisition and processing module includes, but is not limited to, a Microcontroller Unit (MCU), a Central Processing Unit (Center Processor Unit, CPU), an embedded microcontroller (Micro Controller Unit, MCU), an embedded microprocessor (Micro Processor Unit, MPU), embedded system on chip (System on Chip, SOC), etc.
  • the magnetic field imaging system 200 further includes a magnetic field coil driving array 203 .
  • the magnetic field coil driving array 203 includes a plurality of magnetic field controlled lock-in amplifying modules 80 .
  • Each of the magnetic field control lock-in amplifying modules 80 is disposed correspondingly to each of the atomic magnetometer probes 206 , and is used for regulating the surrounding magnetic field, and performing lock-in amplification on the magnetic field signals detected by the atomic magnetometer probes 206 .
  • each of the magnetic field control phase-locked amplifying modules 80 includes the signal generating module 810 , the phase shifting module 820 and the low-pass filtering module 830 .
  • the magnetic field in a certain direction is modulated by the signal generating module 810.
  • the phase shifting module 820 and the low-pass filtering module 830 the magnetic field signal detected by the photoelectric detection module 60 is phase-locked and amplified and output.
  • a series of specific output waveforms can be generated by the magnetic field coil driving array 203 , which are input to the magnetic field modulation coil 550 and the bias magnetic field coil 560 in the atomic magnetometer probe 206 . Therefore, the required two-dimensional magnetic field modulation coil and three-dimensional compensation coil are driven by the magnetic field coil driving array 203 to generate a specific magnetic field to compensate the influence of the residual magnetic field of the atomic gas chamber 510 . At the same time, the detected magnetic field signal is phase-locked and amplified and output by the magnetic field coil driving array 203 .
  • the magnetic field imaging system 200 further includes a micro-control module 205 .
  • the micro-control module 205 is respectively connected to the position measurement control array 207 , the signal acquisition and processing array 204 , the magnetic field coil driving array 203 and the temperature control array 202 for controlling and reconstructing magnetic field images.
  • the micro control module 205 includes but is not limited to a micro control unit (Micro controller Unit, MCU), a central processing unit (Center Processor Unit, CPU), an embedded microcontroller (Micro Controller Unit, MCU), embedded Microprocessor Unit (MPU), embedded System on Chip (SOC), computer, etc.
  • MCU micro control unit
  • CPU Central Processing Unit
  • MCU Central Processing Unit
  • MPU embedded Microprocessor Unit
  • SOC System on Chip
  • the position measurement control array 207 , the signal acquisition and processing array 204 , the magnetic field coil drive array 203 , and the temperature control array 202 are respectively controlled by the micro-control module 205 outputting the regulation timing. Therefore, the control of the entire magnetic field imaging system is realized through the micro-control module 205 .
  • an FPGA-based control program can be used to realize unified control of processes such as temperature control, magnetic field modulation, position control, signal acquisition and processing, and the like.
  • the output end of the signal acquisition and processing array 204 is connected to the micro-control module 205 for connecting the magnetic field signal detected by each of the atomic magnetometer probes 206 with each of the atomic magnetometers
  • the spatial position information of the probe 206 is transmitted to the micro-control module 205 .
  • the micro-control module 205 presents the reconstructed image of the magnetic field to be measured through the display according to the magnetic field signal detected by each of the atomic magnetometer probes 206 .
  • the magnetic field imaging system 200 only uses one of the laser light sources 10 to drive a plurality of the atomic magnetometer probes 206 , which is beneficial to the common mode of the noise of each probe and performs differential processing of magnetic field signals. Therefore, the common mode noise is suppressed by differential processing, which can effectively eliminate the common mode noise of each probe and reduce the noise of the magnetic field image. Meanwhile, the magnetic field imaging system 200 can reconstruct a high-resolution magnetic field image according to the corresponding relationship between the magnetic field signal and the position signal, and the system cost is reduced.

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Abstract

一种原子磁强计（100）及磁场成像系统（200）。通过一个激光光源（10）与倍频模块（20）形成第一波长激光与第二波长激光。通过光衰减模块（30）调节第一波长激光的光功率，实现原子气室（510）的无磁光加热，并调节衰减量进行温度控制。通过第二波长激光进入原子气室（510），以实现磁场探测。从而，原子磁强计（100）不需要进行加热激光和泵浦激光的耦合，就可以实现无磁加热和原子泵浦检测，降低了光路复杂程度。磁场成像系统（200）中一个激光光源（10）与多个原子磁强计探头（206）连接。通过多个原子磁强计探头（206）的位置信息和探测到磁场信息，可以实现对磁场位置的准确定位，以实现多维磁场空间重构。

Description

原子磁强计及磁场成像系统
相关申请
本申请要求2020年08月24日申请的，申请号为202010856052.4，名称为“原子磁强计及磁场成像系统”的中国专利申请的优先权，在此将其全文引入作为参考。
技术领域
本申请涉及精密测量设备技术领域，特别是涉及一种原子磁强计及磁场成像系统。
背景技术
原子磁强计是一种精密测量微弱磁场的传感器。因为原子磁强计工作条件不要求超低温环境，并具有极高的磁测灵敏度，因此在弱磁探测领域，逐渐成为可与超导量子干涉器件相媲美的极弱磁探测方式。原子磁强计在系统体积、与被测体间距、功耗等方面具有优势，可以在心脑磁成像领域，心脑神经电流引起的极弱磁场探测对于冠心病、癫痫等疾病的检测，新生儿心脑健康的评估等具有重要的应用价值。
原子磁强计的工作模式很多，其基本原理是通过光与原子的相互作用，利用光来制备极化的碱金属原子和检测原子电子自旋在外加磁场作用下的拉莫尔(Lamor)进动，从而实现磁场的传感。为了使得原子磁强计达到灵敏度，一般原子磁强计工作在无自旋交换弛豫(Spin-exchange-relaxation-free，SERF)条件下。此时，碱金属原子的气室要加热到一定的高温状态以提升气室中碱金属原子数密度，并使环境磁场降低到接近零磁场，最终Larmor进动频率远小于自旋交换弛豫，自旋交换弛豫受到有效抑制。因此，原子磁强计一方面需要较高温度的加热，同时又要保证加热过程不会产生过大的磁噪声而降低磁强计的灵敏度。
然而，传统原子磁强计的加热方式主要包括热气流加热和电加热方式。热气流加热需要外加气流源，气流源会产生一定的热气流波动而影响系统稳定性。电加热方式不可避免地由于加热电流和金属材料的剩磁会引入一定的磁场噪声。因此，传统原子磁强计的加热方式仍然会引入干扰因素，对磁场产生干扰，导致原子磁强计的检测精度偏低。
申请内容
有鉴于此，本申请公开一种原子磁强计及磁场成像系统。
本申请提供一种原子磁强计。所述原子磁强计包括激光光源、倍频模块、原子气室以及光吸收模块。所述激光光源用于发出第一波长激光。所述倍频模块设置于所述第一波长激光的光路上，用于将部分所述第一波长激光转换为第二波长激光。所述原子气室设置于所述第一波长激光的光路上。所述光吸收模块设置于所述第一波长激光的光路上。且所述光吸收模块设置于所述原子气室表面，用于吸收所述第一波长激光，并转换为热能对所述原子气室进行加热。所述第二波长激光用于进入所述原子气室，并与所述原子气室中原子气体发生相互作用，用以实现磁场信号的探测。
上述原子磁强计及磁场成像系统，经过所述倍频模块倍频后，一部分激光被倍频，形成波长为原先波长一半的倍频激光。另一部分激光保持原先的波长，两部分激光在同一个光路进行传输。即，所述第一波长激光的波长为所述第二波长激光的波长的两倍。并且，所述第一波长激光与所述第二波长激光共用同一条光路进行传输。通过所述倍频模块，使得原始的所述第一波长激光的波长倍频，形成所述第二波长激光。此时，经过所述倍频模块倍频后形成的所述第二波长激光对应了敏感气体能级的共振跃迁谱线。
所述原子气室表面设置有所述光吸收模块，对所述第一波长激光具有强吸收。可以理解为，所述光吸收模块对特定波长的激光进行吸收。所述第一波长激光通过所述光吸收模块后会被强烈吸收，转化为热量用于加热所述原子气室。
所述第二波长激光进入所述原子气室的气室内，并与气室中的敏感气体原子发生相互作用后，输出光通过聚焦透镜照射到光电探测模块进行探测，用以实现对磁场信号的探测。当磁场变化时，光电探测模块探测到的光功率会发生变化，从而获得磁场测量的信号。
因此，通过一个固定波长的所述激光光源与所述倍频模块可以实现将激光倍频，并输出所述第一波长激光(原波长激光)与所述第二波长激光(倍频后波长激光)。所述第一波长激光(原波长激光)用于对所述原子气室进行加热。所述第二波长激光(倍频后波长激光)用于进入所述原子气室，实现原子磁强计的泵浦和探测。
从而，本申请所述原子磁强计通过一个所述激光光源与一个所述倍频模块可以实现光加热和光泵浦检测的需求。相比于传统原子磁强计，所述原子磁强计不会引入干扰原子气室周围磁场的电学部分，避免了磁场噪声的引入。同时，所述原子磁强计结构简单，减少了器件个数的使用，有利于降低成本。并且，所述原子磁强计中所述第一波长激光与所述第二波长激光共路，降低了光学系统复杂程度，便于系统集成化。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面将对实施例或现有技 术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据公开的附图获得其他的附图。
图1为本申请提供的一实施例中原子磁强计的结构示意图。
图2为本申请提供的一实施例中原子磁强计的结构示意图。
图3为本申请提供的一实施例中原子气室的物理封装结构示意图。
图4为本申请提供的一实施例中原子磁强计的结构示意图。
图5为本申请提供的一实施例中磁场控制锁相放大模块与磁场调制线圈的连接结构示意图。
图6为本申请提供的一实施例中原子磁强计的结构示意图。
图7为本申请提供的一实施例中原子磁强计的结构示意图。
图8为本申请提供的一实施例中原子气室的物理封装结构示意图。
图9为本申请提供的一实施例中磁场成像系统的结构示意图。
图10为本申请提供的一实施例中磁场成像系统中位置测量控制阵列与原子磁强计探头的结构示意图。
具体实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
为了使本申请的目的、技术方案及优点更加清楚明白，以下通过实施例，并结合附图，对本申请进行进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本申请，并不用于限定本申请。
请参阅图1，本申请提供一种原子磁强计100。所述原子磁强计100包括激光光源10、倍频模块20、原子气室510以及光吸收模块520。所述激光光源10用于发出第一波长激光。所述倍频模块20设置于所述第一波长激光的光路上，用于将部分所述第一波长激光转换为第二波长激光。所述原子气室510设置于所述第一波长激光的光路上。所述光吸收模块520设置于所述第一波长激光的光路上。且所述光吸收模块520设置于所述原子气室510表面，用于吸收所述第一波长激光，并转换为热能对所述原子气室510进行加热。所述第二波长激光用于进入所述原子气室510，并与所述原子气室510中原子气体发生相互 作用，用以实现磁场信号的探测。
本实施例中，经过所述倍频模块20倍频后，一部分激光被倍频，形成波长为原先波长一半的倍频激光。另一部分激光保持原先的波长，两部分激光在同一个光路进行传输。即，所述第一波长激光的波长为所述第二波长激光的波长的两倍。并且，所述第一波长激光与所述第二波长激光共用同一条光路进行传输。
所述原子气室510中包含有敏感气体(如碱金属原子)和缓冲气体(如氮气)。通过所述倍频模块20使得原始的所述第一波长激光(如波长为1590nm)的波长倍频形成所述第二波长激光(如波长为795nm)。此时，经过所述倍频模块20倍频后形成的所述第二波长激光(如波长为795nm)对应了敏感气体(如铷原子)能级的共振跃迁谱线。
所述原子气室510表面设置有所述光吸收模块520，对所述第一波长激光具有强吸收。可以理解为，所述光吸收模块520对特定波长的激光进行吸收。所述第一波长激光通过所述光吸收模块520后会被强烈吸收，转化为热量用于加热所述原子气室510。
所述第二波长激光进入所述原子气室510的气室内，并与气室中的敏感气体原子发生相互作用后，输出光通过聚焦透镜照射到光电探测模块进行探测。当磁场变化时，光电探测模块探测到的光功率会发生变化，从而获得磁场测量的信号。
因此，通过一个固定波长的所述激光光源10与所述倍频模块20可以实现将激光倍频，并输出所述第一波长激光(原波长激光)与所述第二波长激光(倍频后波长激光)。所述第一波长激光(原波长激光)用于对所述原子气室510进行加热。所述第二波长激光(倍频后波长激光)用于进入所述原子气室510，实现原子磁强计的泵浦和探测。
从而，本申请所述原子磁强计100通过一个所述激光光源10与一个所述倍频模块20可以实现光加热和光泵浦检测的需求。相比于传统原子磁强计，所述原子磁强计100不会引入干扰原子气室周围磁场的电学部分，避免了磁场噪声的引入。同时，所述原子磁强计100结构简单，减少了器件个数的使用，有利于降低成本。并且，所述原子磁强计100中所述第一波长激光与所述第二波长激光共路，降低了光学系统复杂程度，便于系统集成化。
在一个实施例中，所述原子气室510为包含有敏感气体(如碱金属原子)和缓冲气体(如氮气)的封闭玻璃腔室或者其它有透光窗口的封闭腔室。
在一个实施例中，所述倍频模块20为周期性极化铌酸锂(PPLN)晶体。周期性极化铌酸锂(PPLN)晶体的通光波长范围在0.4μm-5μm。此时，在可见光和红外波段范围内，周期性极化铌酸锂(PPLN)晶体具有较低的散射和吸收，可以较好地实现激光倍频。
在一个实施例中，所述光吸收模块520包括第一光吸收结构521与第二光吸收结构522。所述第一光吸收结构521与所述第二光吸收结构522设置于所述原子气室510的两 个相对表面。所述第一波长激光依次经过所述第一光吸收结构521、所述原子气室510以及所述第二光吸收结构522。
本实施例中，通过所述第一光吸收结构521与所述第二光吸收结构522可以从所述原子气室510的两侧进行加热。所述第一光吸收结构521和所述第二光吸收结构522对所述第一波长激光具有强吸收。当所述第一波长激光依次经过所述第一光吸收结构521和所述第二光吸收结构522后，会依次被所述第一光吸收结构521和所述第二光吸收结构522吸收。同时，所述原子气室510中敏感气体与所述第二波长激光进行相互作用，所述第一波长激光不会对其产生干扰。
在一个实施例中，所述原子气室510的腔室外壁(远离敏感气体的表面)设置有所述第一光吸收结构521与所述第二光吸收结构522。通过粘接的方式，将所述第一光吸收结构521与所述第二光吸收结构522设置于所述原子气室510的两侧腔室外壁上。
在一个实施例中，所述第一光吸收结构521与所述第二光吸收结构522为加热玻璃。加热玻璃粘接在所述原子气室510表面。加热玻璃对所述第一波长激光(1590nm激光)具有强吸收，而所述第二波长激光则可以较高效率地穿过加热玻璃。
在一个实施例中，所述第二光吸收结构522的厚度大于所述第一光吸收结构521的厚度。
本实施例中，所述第一波长激光依次经过所述第一光吸收结构521、所述原子气室510以及所述第二光吸收结构522。所述第二光吸收结构522设置于所述原子气室510的后侧，比所述第一光吸收结构521的厚度更厚，可使前后两侧的吸收加热激光效率相同，吸收的激光能量转换成热能直接对原子气室进行均匀加热。
请参阅图2，在一个实施例中，所述原子磁强计100还包括光衰减模块30、温度检测模块530以及温度控制模块40。所述光衰减模块30设置于所述第一波长激光的光路，用于调节所述第一波长激光的功率。所述温度检测模块530设置于所述原子气室510表面，用于监测所述原子气室510的实时测量温度。所述温度控制模块40的监控端与所述温度检测模块530连接，用于获取所述实时测量温度。所述温度控制模块40的控制端与所述光衰减模块30连接，用于根据所述实时测量温度，对所述光衰减模块30进行调控以改变所述第一波长激光的功率。
本实施例中，所述光衰减模块30用于调节所述第一波长激光的光功率，可以理解为所述光衰减模块30对特定波长的激光进行衰减。通过所述光衰减模块30可以调节注入到所述光吸收模块520的所述第一波长激光的光功率，从而实现对所述原子气室510的温度调节。
经所述倍频模块20后的所述第一波长激光与所述第二波长激光，经过具有波长选择性的所述光衰减模块30来调节未倍频波长激光的功率。所述温度检测模块530可以实时监测所述原子气室510的温度，并将所述实时测量温度转化成电学信号传输到所述温度控制模块40。所述温度控制模块40基于所述实时测量温度，与目标温度进行对比获得温度差值。同时，所述温度控制模块40通过PID控制器调控所述光衰减模块30，以改变所述第一波长激光的功率，实现所述原子气室510的控温。
在一个实施例中，所述温度控制模块40包括反馈控制模块(图中未标出)。所述反馈控制模块用于根据所述实时测量温度与目标温度进行对比，并采用反馈控制方法调控所述光衰减模块30，以改变所述第一波长激光的功率。所述反馈控制模块包括但不限于微控制单元(Micro controller Unit，MCU)、中央处理器(Center Processor Unit，CPU)、嵌入式微控制器(Micro ControllerUnit，MCU)、嵌入式微处理器(Micro Processor Unit，MPU)、嵌入式片上系统(System on Chip，SOC)等。
在一个实施例中，所述温度控制模块40通过控制滤光效率线性可变的1590nm滤光片(可变光衰减片)的角度。或者，所述温度控制模块40控制偏振分光棱镜(PBS)分光片前线性偏振光的偏振角度，以此来调控注入到所述原子气室510表面的所述第一波长激光的光功率(加热激光光功率)，实现所述原子气室510的控温。
在一个实施例中，所述温度检测模块530可以为温度传感器，如无磁铂电阻。
在一个实施例中，所述原子磁强计100还包括光电探测模块60。所述光电探测模块60设置于所述第二波长激光的光路上，用于接收经所述原子气室510后的所述第二波长激光。
本实施例中，所述第二波长激光进入所述原子气室510的气室内，并与气室中的敏感气体原子发生相互作用后，输出光通过聚焦透镜照射到所述光电探测模块60进行探测。当磁场变化时，所述光电探测模块60探测到的光功率会发生变化，从而获得磁场测量的信号。
请参阅图3，在一个实施例中，所述原子磁强计100还包括加热腔室540、磁场调制线圈550以及偏置磁场线圈560。所述加热腔室540包围形成加热空间。所述光吸收模块520、所述原子气室510以及所述温度检测模块530设置于所述加热空间。所述磁场调制线圈550围绕所述加热腔室540设置，用于对某一方向的磁场进行调制。所述偏置磁场线圈560围绕所述加热腔室540设置，用于将所述原子气室510在无磁信号时磁场置零。
本实施例中，所述加热腔室540形成热屏蔽层，保证所述加热空间的温度稳定。所述温度检测模块530设置于所述加热腔室540内，并设置于所述原子气室510的外侧壁上， 可以实时监测所述原子气室510的温度。所述磁场调制线圈550可以为二维磁场调制线圈，设置于所述加热腔室540周围，用于对某一方向的磁场进行调制。所述偏置磁场线圈560可以为三维偏置磁场线圈，设置于所述加热腔室540周围，用于补偿所述原子气室510中剩余磁场(如地磁)的影响，使所述原子气室510在无磁信号时磁场置零。
请参阅图3、图4与图5，在一个实施例中，所述磁场调制线圈550包括第一调制线圈551与第二调制线圈552。
本实施例中，所述第一调制线圈551与所述第二调制线圈552均设置在垂直于所述第二波长激光的光路方向上，从两个方向进行调制，如图4所示。
在一个实施例中，所述原子磁强计100还包括物理封装外腔(图中未显示)，选用具有低导热性的非金属材料。通过物理封装外腔将所述原子气室510、所述加热腔室540、所述磁场调制线圈550以及所述偏置磁场线圈560进行固定。同时，通过物理封装外腔为所述原子气室510提供高温工作环境，使所述原子磁强计100满足SERF工作条件。其中，所述磁场调制线圈550与所述偏置磁场线圈560固定在包含所述原子气室510的物理封装外腔表面。所述磁场调制线圈550与所述偏置磁场线圈560为亥姆霍兹线圈结构。
所述原子磁强计100需要工作在零磁场附近，所述偏置磁场线圈560固定在所述原子气室510的物理封装外腔表面，用于补偿所述原子气室510中剩余磁场(如地磁)的影响，使所述原子气室510在无磁信号时磁场置零。
此时，所述原子磁强计100中所述原子气室510、所述第一光吸收结构521(加热玻璃)、所述第二光吸收结构522(加热玻璃)、所述温度检测模块530(温度传感器)、所述磁场调制线圈550(二维磁场调制线圈)以及所述偏置磁场线圈560(三维补偿线圈)形成了敏感部件，用于实现磁场测量。
请参阅图5，在一个实施例中，所述原子磁强计100还包括信号发生模块810。所述信号发生模块810用于产生两路同一频率的调制信号。所述信号发生模块810与所述磁场调制线圈550连接，用于通过一路调制信号对某一方向的磁场进行调制。
本实施例中，所述信号发生模块810输出两路同一频率的正弦波或者方波信号，形成两路同一频率的调制信号。其中，一路调制信号输出到所述磁场调制线圈550(二维磁场调制线圈)中的一个，用来实现对某一方向磁场的调制。
在一个实施例中，所述信号发生模块810为信号发生器，用于输出正弦波或者方波信号。
在一个实施例中，所述原子磁强计100还包括移相模块820与低通滤波模块830。所述移相模块820的第一输入端与所述信号发生模块810连接。所述移相模块820的第二输 入端与所述光电探测模块60的输出端连接，用于通过另一路调制信号对所述磁场探测信号进行调制。所述低通滤波模块830与所述移相模块820的输出端连接，用于对调制后的所述磁场探测信号进行锁相放大输出。
本实施例中，所述光电探测模块60接收到的所述磁场探测信号中包含了磁场信息。所述信号发生模块810输出的另一路调制信号，经过所述移相模块820与所述磁场探测信号相乘，实现对所述磁场探测信号进行调制。调制后的所述磁场探测信号，经所述低通滤波模块830后，实现磁场信号的锁相放大输出。从而，通过锁相放大输出，提高了所述磁场探测信号的信噪比。
在一个实施例中，所述移相模块820为移相器。所述低通滤波模块830为低通滤波器。
请参阅图4，在一个实施例中，所述原子磁强计100还包括光放大模块710、准直模块720、偏振模块730以及第一四分之一波片740。所述光放大模块710设置于所述第一波长激光的光路上，用于对所述第一波长激光进行放大。所述准直模块720设置于所述第一波长激光的光路上，用于对经所述倍频模块20后形成的所述第一波长激光与所述第二波长激光进行准直。所述偏振模块730设置于所述第一波长激光的光路上，用于对经所述光衰减模块30后的所述第二波长激光进行偏振。所述第一四分之一波片740设置于所述第一波长激光的光路上，用于对经所述偏振模块730后的所述第二波长激光进行转换，形成圆偏振光。
本实施例中，所述激光光源10输出的所述第一波长激光(如1590nm的激光)，一般输出光功率较小。通过所述光放大模块710放大，进而增加所述第一波长激光(如1590nm的激光)的激光功率。放大后的所述第一波长激光(如1590nm的激光)输入到所述倍频模块20中。通过所述倍频模块20使得所述第一波长激光(如1590nm的激光)的波长倍频，形成所述第二波长激光(795nm的激光)。此时，倍频后的所述第二波长激光(795nm的激光)对应了所述原子气室510中的敏感气体(如铷原子)能级的共振跃迁谱线。
经所述倍频模块20后的所述第一波长激光与所述第二波长激光，通过所述准直模块720准直成平行光束，以使得平行光束照射至所述原子气室510。
经所述准直模块720后的所述第一波长激光与所述第二波长激光，通过所述光衰减模块30对所述第一波长激光的光功率进行调控。通过所述光衰减模块30后的所述第一波长激光与所述第二波长激光经光纤耦合后，依次经过所述偏振模块730(所述第二波长激光的起偏器)以及所述第一四分之一波片740后，穿过所述原子气室510的窗口注入到所述原子气室510内部，并与敏感气体发生相互作用。
所述第二波长激光依次经过所述偏振模块730与所述第一四分之一波片740进入所述 原子气室510，形成了探测光和泵浦光共路的光路结构。
对于探测光和泵浦光共路的光路结构，通过光衰减模块30的所述第二波长激光(如795nm激光)经过相应波长的所述偏振模块730和所述第一四分之一波片740，转换成圆偏振光。此时，圆偏振光自旋极化方向与光束传输的方向同向。所述第二波长激光(如795nm激光)较高效率地依次通过所述第一光吸收结构521(加热玻璃)和所述原子气室510的玻璃气室窗口，进入所述原子气室510内。所述第二波长激光(如795nm激光)与所述原子气室510内的铷原子气体发生相互作用。
在磁场作用下，原子自旋与探测光相互作用使原子气体的极化特性发生变化，光的偏振方向发生偏转，光功率发生改变。从而，穿过所述原子气室510的圆偏振光(即所述原子气室510的输出光)通过聚焦透镜被所述光电探测模块60接收。或者，通过光纤耦合头将所述原子气室510的输出光耦合进光纤。在光纤的另一端用所述光电探测模块60探测。所述光电探测模块60将光信号转换成电信号，用于分析计算获得磁场测量的信号。
因此，本申请中所述原子磁强计100，通过一个所述激光光源10与一个所述倍频模块20，可以输出包含原波长的激光成分和倍频后波长的激光成分。原波长的激光成分用于加热原子气室。倍频后波长的激光成分用于实现原子磁强计的泵浦和探测。
在一个实施例中，所述激光光源10为激光器。所述偏振模块730为起偏器。所述光放大模块710为光放大器，可以为掺铒光纤放大器等。所述准直模块720为无磁光纤准直器。
在一个实施例中，激光器、光放大器以及倍频晶体都可选用晶体-光纤一体结构。通过光纤转接头连接激光器以及其他放大倍频组件。其中，宽波带的高功率单模保偏光纤可以同时满足所述第一波长激光(1590nm激光)和所述第二波长激光(795nm激光)的传输，结构简单便于集成化封装。
请参阅图6，在一个实施例中，所述原子磁强计100还包括第一分光模块910、二分之一波片920与第二四分之一波片930。所述第一分光模块910设置于所述第二波长激光的光路上，用于将经所述光衰减模块30后的所述第二波长激光分成相互垂直的泵浦光与探测光。所述二分之一波片920设置于所述探测光的光路上，用于调整所述探测光的偏振角。经所述二分之一波片920后的所述探测光进入所述原子气室510。所述第二四分之一波片930设置于所述泵浦光的光路上，用于将所述泵浦光转换为泵浦圆偏振光。经所述第二四分之一波片930后的所述泵浦光进入所述原子气室510。
本实施例中，所述第二波长激光通过所述第一分光模块910形成两路互相垂直的光路。一路为探测光，经过所述二分之一波片920进入所述原子气室510。另一路为泵浦光，经 过所述第二四分之一波片930进入所述原子气室510。从而，通过所述第一分光模块910、所述二分之一波片920以及所述第二四分之一波片930形成了探测光和泵浦光垂直的光路结构。
对于探测光和泵浦光垂直的光路结构，通过所述光衰减模块30的所述第二波长激光(如795nm激光)被相应波长的所述第一分光模块910分成两路。其中，一路泵浦光被所述第二四分之一波片930转变成圆偏振光照射到所述原子气室510中，用于光泵浦。另一路垂直于泵浦光的探测光，通过所述二分之一波片920调整进入所述原子气室510前线偏振光的偏振角。经所述二分之一波片920后的探测光照射到被泵浦光泵浦极化过的原子气体上，进而被所述光电探测模块60探测接收。
当磁场变化时，所述光电探测模块60探测到的光功率会发生变化，从而获得磁场测量的信号。所述原子磁强计100采用探测光和泵浦光垂直的光路结构，从两路方向进入所述原子气室510内，提高了磁场探测精度。
在一个实施例中，所述第一分光模块910为分光棱镜，具有波长选择性，用于对所述第二波长激光(如795nm激光)进行分束。
请参阅图7，在一个实施例中，对于探测光和泵浦光垂直的光路结构，所述激光光源10、光放大模块710、倍频模块20、准直模块720、光衰减模块30、温度控制模块40、磁场控制锁相放大模块80、光电探测模块60的相对位置关系，与探测光和泵浦光共路的光路结构相同，可参见上述实施例。
在一个实施例中，对于探测光和泵浦光垂直的光路结构，所述磁场调制线圈550设置于垂直于探测光方向上，从一个方向上进行调制，如图7和图8所示。通过所述信号发生模块810与所述磁场调制线圈550连接，用于通过一路调制信号对某一方向的磁场进行调制。
在一个实施例中，所述偏置磁场线圈560包括第一偏置线圈561、第二偏置线圈562以及第三偏置线圈563，分别垂直于光路进行设置，分布于不同方向上。所述偏置磁场线圈560与稳流源连接。通过稳流源输出到所述偏置磁场线圈560(三维偏置磁场线圈)，用于磁场清零。
泵浦光的自旋极化方向是与光传输方向一致。扫描磁场在零磁场附近扫描，根据汉勒(Hanle)效应，磁场会影响光的偏振特性。所述光电探测模块60接收到经所述原子气室510的输出光后，会检测到零磁场位置的吸收峰。通过所述信号发生模块810对磁场大小进行调制，后经过锁相放大环路的解调，PID反馈控制到零场位置。从而，利用标定磁场和反馈信号进行准确的磁场测量。
请参阅图9，在一个实施例中，本申请提供一种磁场成像系统200。所述磁场成像系统200包括激光光源10、倍频模块20、第二分光模块201、多个原子磁强计探头206。所述激光光源10用于发出第一波长激光。所述倍频模块20设置于所述第一波长激光的光路上，用于将部分所述第一波长激光转换为第二波长激光。所述第二分光模块201设置于所述第一波长激光的光路上，用于将所述第一波长激光分成多个第一波长子光束，将所述第二波长激光分成多个第二波长子光束。其中，一个所述第一波长子光束与一个所述第二波长子光束共光路。
每个所述原子磁强计探头206包括光衰减模块30、原子气室510与光吸收模块520。所述原子气室510设置于所述第一波长子光束的光路上。每个所述光衰减模块30设置于所述第一波长子光束的光路上，用于调节所述第一波长子光束的功率。所述光吸收模块520设置于所述第一波长子光束的光路上。且所述光吸收模块520设置于所述原子气室510表面，用于吸收所述第一波长子光束，并转换为热能对所述原子气室510进行加热。所述第二波长子光束用于进入所述原子气室510，并与所述原子气室510中原子气体发生相互作用。
本实施例中，一个所述激光光源10输出所述第一波长激光。通过所述倍频模块20后形成所述第一波长激光与所述第二波长激光。所述第二波长激光对应原子能级共振跃迁，为所述第一波长激光的波长的二分之一。所述第一波长激光与所述第二波长激光共光路，在同一个光路进行传输。通过所述第二分光模块201形成多束光路，多光通道连接到多个所述原子磁强计探头206。因此，多个所述原子磁强计探头206，共同使用同一个激光器作为光源。
所述激光光源10输出所述第一波长激光(1590nm激光)。所述第一波长激光(1590nm激光)经过所述倍频模块20后，形成既含有所述第一波长激光(1590nm)成分，又含有所述第二波长激光(795nm激光)成分。两种不同波长的激光通过所述第二分光模块201分束形成多光通道，并连接到多个所述原子磁强计探头206。所述第二波长激光(795nm激光)进入所述原子磁强计探头206中所述原子气室510内与原子发生相互作用，用于实现磁场信号的测量。
当通过所述磁场成像系统200进行脑磁成像时，可以根据脑部形状制备佩戴在头部用来固定多个所述原子磁强计探头206的头盔。在需要进行磁场测量的位置处用机械加持的方式固定多个所述原子磁强计探头206。此时，在脑部表面形成原子磁强计探头阵列，用于测量探头所在位置处的磁场大小。
因此，所述磁场成像系统200通过单一激光光源、所述倍频模块20、所述第二分光模 块201以及多个所述原子磁强计探头206，形成了原子磁强计阵列，可同时实现光加热和磁场探测。同时，由于多个所述原子磁强计探头206中的激光都来自于同一激光光源，使得所述磁场成像系统200具有良好的共模噪声抑制性，能够获得更低噪声的磁场图像。并且，多个所述原子磁强计探头206共用一个所述激光光源10与所述倍频模块20，可以降低制备成本。
在一个实施例中，所述第二分光模块201为光纤分束器。所述第二波长激光(795nm激光)进入所述原子磁强计探头206中所述原子气室510内与原子发生相互作用后，输出的激光被所述光电探测模块60接收。
在一个实施例中，所述光电探测模块60可以集成于所述原子磁强计探头206内。或者，通过光纤耦合头将多个所述原子磁强计探头206内所述原子气室510输出的激光耦合出探头，并与多个所述光电探测模块60连接。
请参阅图9，在一个实施例中，所述磁场成像系统200还包括温度控制阵列202。所述温度控制阵列202分别与多个所述原子磁强计探头206连接，用于对所述原子磁强计探头206进行调控以改变所述第一波长子光束的功率。
本实施例中，多个所述温度控制模块40形成所述温度控制阵列202。每个所述温度控制模块40与每个所述原子磁强计探头206一一对应连接，用于对所述原子磁强计探头206进行调控以改变所述第一波长子光束的功率。所述第一波长子光束的功率为对所述原子气室510进行加热的加热激光的光功率。
在一个实施例中，每个所述原子磁强计探头206至少还包括上述实施例中涉及到的所述偏振模块730、所述第一四分之一波片740、所述温度检测模块530、所述加热腔室540、所述磁场调制线圈550、所述偏置磁场线圈560等。
或者，每个所述原子磁强计探头206至少还包括上述实施例中涉及到的所述第一分光模块910、所述二分之一波片920、所述第二四分之一波片930、所述温度检测模块530、所述加热腔室540、所述磁场调制线圈550、所述偏置磁场线圈560等。
每个所述温度控制模块40的监控端与所述温度检测模块530连接，用于获取所述实时测量温度。每个所述温度控制模块40的控制端与所述光衰减模块30连接，用于根据所述实时测量温度与所述目标温度进行对比，利用反馈控制对所述光衰减模块30进行调控以改变所述第一波长子光束的功率，实现温度调节。
因此，每个所述原子磁强计探头206与每个所述温度控制模块40一一对应设置。多个所述温度控制模块40构成所述温度控制阵列202，以整体主动调控多个所述原子磁强计探头206的温度，即主动调控所述原子气室510的温度稳定于某一范围内。
请参阅图10，在一个实施例中，所述磁场成像系统200还包括位置测量控制阵列207。所述位置测量控制阵列207包括多个位置传感模块2071与多个位移控制模块2072。每个所述位置传感模块2071设置于每个所述原子磁强计探头206，用于对所述原子磁强计探头206的空间位置进行测量。每个所述位移控制模块2072设置于每个所述原子磁强计探头206，用于对所述原子磁强计探头206的位移进行控制移动。
本实施例中，在进行磁场测量及成像时，根据待测对象的磁场空间结构，多个所述原子磁强计探头206被固定并排布成探头阵列。同时，通过所述位置传感模块2071对所述原子磁强计探头206所测磁场的空间位置进行测量。通过所述位移控制模块2072对所述原子磁强计探头206进行微小位移调整。
每个所述原子磁强计探头206设置有所述位置传感模块2071与所述位移控制模块2072，对所述原子磁强计探头206所测磁场的空间位置进行测量及调整。从而，通过所测磁场的空间位置可以对磁场成像过程中的空间进行定位。
在一个实施例中，所述位置传感模块2071为位置传感器，如光电位置传感器。所述位移控制模块2072为位移控制器。
请参阅图9，在一个实施例中，所述磁场成像系统200还包括信号采集处理阵列204。所述信号采集处理阵列204包括多个信号采集处理模块(图中未标出)。每个所述信号采集处理模块与每个所述位置传感模块2071连接，用于采集所述原子磁强计探头206的空间位置。每个所述信号采集处理模块与每个所述位移控制模块2072连接，用于调控所述原子磁强计探头206的位移。每个所述信号采集处理模块与每个所述原子磁强计探头206的输出端连接，用于采集所述原子磁强计探头206探测的磁场信号。
本实施例中，每个所述原子磁强计探头206探测的磁场信号与每个所述原子磁强计探头206的空间位置信息，传输至每个所述信号采集处理模块。所述信号采集处理模块包括但不限于微控制单元(Micro controller Unit，MCU)、中央处理器(Center Processor Unit，CPU)、嵌入式微控制器(Micro Controller Unit，MCU)、嵌入式微处理器(Micro Processor Unit，MPU)、嵌入式片上系统(System on Chip，SOC)等。
请参阅图9，在一个实施例中，所述磁场成像系统200还包括磁场线圈驱动阵列203。所述磁场线圈驱动阵列203包括多个磁场控制锁相放大模块80。每个所述磁场控制锁相放大模块80与每个所述原子磁强计探头206对应设置，用于调控周围磁场，且将所述原子磁强计探头206探测的磁场信号进行锁相放大。
本实施例中，每个所述磁场控制锁相放大模块80包括所述信号发生模块810、所述移相模块820以及所述低通滤波模块830。通过所述信号发生模块810对某一方向的磁场进 行调制。通过所述移相模块820与所述低通滤波模块830，对所述光电探测模块60探测的磁场信号进行锁相放大输出。具体调控过程可参考上述实施例。
因此，通过所述磁场线圈驱动阵列203可以产生一系列特定的输出波形，输入到所述原子磁强计探头206中的所述磁场调制线圈550与所述偏置磁场线圈560。从而，通过所述磁场线圈驱动阵列203驱动所需的二维磁场调制线圈和三维补偿线圈产生特定磁场，补偿所述原子气室510剩余磁场的影响。同时，通过所述磁场线圈驱动阵列203对探测的磁场信号进行锁相放大输出。
请参阅图9，在一个实施例中，所述磁场成像系统200还包括微控制模块205。所述微控制模块205分别与所述位置测量控制阵列207、所述信号采集处理阵列204、所述磁场线圈驱动阵列203以及所述温度控制阵列202连接，用于控制并进行磁场图像重建。
本实施例中，所述微控制模块205包括但不限于微控制单元(Micro controller Unit，MCU)、中央处理器(Center Processor Unit，CPU)、嵌入式微控制器(Micro Controller Unit，MCU)、嵌入式微处理器(Micro Processor Unit，MPU)、嵌入式片上系统(System on Chip，SOC)、计算机等。
通过所述微控制模块205输出调控时序，分别控制所述位置测量控制阵列207、所述信号采集处理阵列204、所述磁场线圈驱动阵列203以及所述温度控制阵列202。从而，通过所述微控制模块205实现对整个磁场成像系统的控制。其中，所述微控制模块205输出调控时序时，可以使用基于FPGA的控制程序实现对温度控制、磁场调制、位置控制、信号采集与处理等过程的统一控制。
在一个实施例中，所述信号采集处理阵列204输出端与所述微控制模块205连接，用于将每个所述原子磁强计探头206探测的磁场信号与每个所述原子磁强计探头206的空间位置信息传输至所述微控制模块205。所述微控制模块205根据每个所述原子磁强计探头206探测的磁场信号，通过显示器呈现出重建的待测磁场图像。
因此，所述磁场成像系统200只采用一个所述激光光源10驱动多个所述原子磁强计探头206，有利于各个探头噪声的共模性，进行磁场信号差分处理。从而，通过差分处理获得共模噪声的抑制，可以有效地消除各个探头共模噪声，降低磁场图像的噪声。同时，所述磁场成像系统200根据磁场信号和位置信号的对应关系可以重建出高分辨率的磁场图像，且降低了系统成本。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对本申请专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。因此，本申请专利的保护范围应以所附权利要求为准。
最后，还需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
本说明书中各个实施例采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分互相参见即可。
对所公开的实施例的上述说明，使本领域专业技术人员能够实现或使用本申请。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的，本文中所定义的一般原理可以在不脱离本申请的精神或范围的情况下，在其它实施例中实现。因此，本申请将不会被限制于本文所示的这些实施例，而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。

Claims (17)

  1. 一种原子磁强计，其特征在于，包括：
    激光光源(10)，用于发出第一波长激光；
    倍频模块(20)，设置于所述第一波长激光的光路，用于将部分所述第一波长激光转换为第二波长激光，所述第二波长激光的光路与所述第一波长激光的光路共光路；
    原子气室(510)，设置于所述第一波长激光的光路；
    光吸收模块(520)，设置于所述原子气室(510)表面，用于吸收所述第一波长激光，并转换为热能对所述原子气室(510)进行加热；
    所述第二波长激光进入所述原子气室(510)，并与所述原子气室(510)中原子气体发生相互作用，用以实现磁场信号的探测。
  2. 根据权利要求1所述的原子磁强计，其特征在于，所述光吸收模块(520)包括第一光吸收结构(521)与第二光吸收结构(522)；
    所述第一光吸收结构(521)与所述第二光吸收结构(522)设置于所述原子气室(510)相对的两个表面；
    所述第一波长激光依次经过所述第一光吸收结构(521)、所述原子气室(510)以及所述第二光吸收结构(522)。
  3. 根据权利要求2所述的原子磁强计，其特征在于，所述第二光吸收结构(522)的厚度大于所述第一光吸收结构(521)的厚度。
  4. 根据权利要求1所述的原子磁强计，其特征在于，还包括：
    光衰减模块(30)，设置于所述第一波长激光的光路，用于调节所述第一波长激光的功率；
    温度检测模块(530)，设置于所述原子气室(510)表面，用于监测所述原子气室(510)的实时测量温度；
    温度控制模块(40)，所述温度控制模块(40)的监控端与所述温度检测模块(530)连接，用于获取所述实时测量温度；
    所述温度控制模块(40)的控制端与所述光衰减模块(30)连接，用于根据所述实时测量温度，对所述光衰减模块(30)进行调控以改变所述第一波长激光的功率。
  5. 根据权利要求4所述的原子磁强计，其特征在于，所述温度控制模块(40)包括反馈控制模块；
    所述反馈控制模块用于根据所述实时测量温度与目标温度进行对比，并采用反馈控制 方法调控所述光衰减模块(30)，以改变所述第一波长激光的功率。
  6. 根据权利要求5所述的原子磁强计，其特征在于，所述原子磁强计还包括：
    光电探测模块(60)，设置于所述第二波长激光的光路上，用于接收经所述原子气室(510)后的所述第二波长激光。
  7. 根据权利要求6所述的原子磁强计，其特征在于，所述原子磁强计还包括：
    加热腔室(540)，包围形成加热空间，所述光吸收模块(520)、所述原子气室(510)以及所述温度检测模块(530)设置于所述加热空间；
    磁场调制线圈(550)，围绕所述加热腔室(540)设置，用于对某一方向的磁场进行调制；
    偏置磁场线圈(560)，围绕所述加热腔室(540)设置，用于将所述原子气室(510)在无磁信号时磁场置零。
  8. 根据权利要求7所述的原子磁强计，其特征在于，所述原子磁强计还包括：
    信号发生模块(810)，用于产生两路同一频率的调制信号；
    所述信号发生模块(810)与所述磁场调制线圈(550)连接，用于通过一路调制信号对某一方向的磁场进行调制。
  9. 根据权利要求8所述的原子磁强计，其特征在于，所述原子磁强计还包括：
    移相模块(820)，所述移相模块(820)的第一输入端与所述信号发生模块(810)连接，所述移相模块(820)的第二输入端与所述光电探测模块(60)的输出端连接，用于通过另一路调制信号对所述磁场探测信号进行调制；
    低通滤波模块(830)，与所述移相模块(820)的输出端连接，用于对调制后的所述磁场探测信号进行锁相放大输出。
  10. 根据权利要求4所述的原子磁强计，其特征在于，所述原子磁强计还包括：
    光放大模块(710)，设置于所述第一波长激光的光路上，用于对所述第一波长激光进行放大；
    准直模块(720)，设置于所述第一波长激光的光路上，用于对经所述倍频模块(20)后形成的所述第一波长激光与所述第二波长激光进行准直；
    偏振模块(730)，设置于所述第一波长激光的光路上，用于对经所述光衰减模块(30)后的所述第二波长激光进行偏振；
    第一四分之一波片(740)，设置于所述第一波长激光的光路上，用于对经所述偏振模块(730)后的所述第二波长激光进行转换，形成圆偏振光。
  11. 根据权利要求4所述的原子磁强计，其特征在于，所述原子磁强计还包括：
    第一分光模块(910)，设置于所述第二波长激光的光路上，用于将经所述光衰减模块(30)后的所述第二波长激光分成相互垂直的泵浦光与探测光；
    二分之一波片(920)，设置于所述探测光的光路上，用于调整所述探测光的偏振角；
    经所述二分之一波片(920)后的所述探测光进入所述原子气室(510)；
    第二四分之一波片(930)，设置于所述泵浦光的光路上，用于将所述泵浦光转换为泵浦圆偏振光；
    经所述第二四分之一波片(930)后的所述泵浦光进入所述原子气室(510)。
  12. 一种磁场成像系统，其特征在于，包括：
    激光光源(10)，用于发出第一波长激光；
    倍频模块(20)，设置于所述第一波长激光的光路上，用于将部分所述第一波长激光转换为第二波长激光；
    第二分光模块(201)，设置于所述第一波长激光的光路上，用于将所述第一波长激光分成多个第一波长子光束，将所述第二波长激光分成多个第二波长子光束；其中，一个所述第一波长子光束与一个所述第二波长子光束共光路；
    多个原子磁强计探头(206)，每个所述原子磁强计探头(206)包括光衰减模块(30)、原子气室(510)以及光吸收模块(520)；
    每个所述光衰减模块(30)设置于所述第一波长子光束的光路上，用于调节所述第一波长子光束的功率；
    所述原子气室(510)设置于所述第一波长子光束的光路上；
    所述光吸收模块(520)设置于所述第一波长子光束的光路上，且所述光吸收模块(520)设置于所述原子气室(510)表面，用于吸收所述第一波长子光束，并转换为热能对所述原子气室(510)进行加热；
    所述第二波长子光束用于进入所述原子气室(510)，并与所述原子气室(510)中原子气体发生相互作用。
  13. 根据权利要求12所述的磁场成像系统，其特征在于，所述磁场成像系统还包括：
    温度控制阵列(202)，分别与多个所述原子磁强计探头(206)连接，用于对所述原子磁强计探头(206)进行调控以改变所述第一波长子光束的功率。
  14. 根据权利要求13所述的磁场成像系统，其特征在于，所述磁场成像系统还包括：
    位置测量控制阵列(207)，包括多个位置传感模块(2071)与多个位移控制模块(2072)；
    每个所述位置传感模块(2071)设置于每个所述原子磁强计探头(206)，用于对所述原子磁强计探头(206)的空间位置进行测量；
    每个所述位移控制模块(2072)设置于每个所述原子磁强计探头(206)，用于对所述原子磁强计探头(206)的位移进行控制移动。
  15. 根据权利要求14所述的磁场成像系统，其特征在于，所述磁场成像系统还包括：
    信号采集处理阵列(204)，分别与多个所述位置传感模块(2071)连接，用于采集多个所述原子磁强计探头(206)的空间位置；
    所述信号采集处理阵列(204)分别与多个所述位移控制模块(2072)连接，用于调控多个所述原子磁强计探头(206)的位移；
    所述信号采集处理阵列(204)分别与多个所述原子磁强计探头(206)的输出端连接，用于采集多个所述原子磁强计探头(206)探测的磁场信号。
  16. 根据权利要求15所述的磁场成像系统，其特征在于，所述磁场成像系统还包括：
    磁场线圈驱动阵列(203)，分别与多个所述原子磁强计探头(206)连接，用于调控周围磁场，且将所述原子磁强计探头(206)探测的磁场信号进行锁相放大。
  17. 根据权利要求16所述的磁场成像系统，其特征在于，所述磁场成像系统还包括：
    微控制模块(205)，分别与所述位置测量控制阵列(207)、所述信号采集处理阵列(204)、所述磁场线圈驱动阵列(203)以及所述温度控制阵列(202)连接，用于控制并进行磁场图像重建。
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