WO2021261477A1 - Method for regenerating catslyst, apparatus for regenerating catslyst and program - Google Patents

Method for regenerating catslyst, apparatus for regenerating catslyst and program Download PDF

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Publication number
WO2021261477A1
WO2021261477A1 PCT/JP2021/023556 JP2021023556W WO2021261477A1 WO 2021261477 A1 WO2021261477 A1 WO 2021261477A1 JP 2021023556 W JP2021023556 W JP 2021023556W WO 2021261477 A1 WO2021261477 A1 WO 2021261477A1
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Prior art keywords
catalyst
chemical solution
cleaning liquid
acid
water
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PCT/JP2021/023556
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French (fr)
Japanese (ja)
Inventor
和大 岩本
勝己 野地
将直 米村
大輔 向井
博 加古
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三菱パワー株式会社
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Priority to DE112021003382.4T priority Critical patent/DE112021003382T5/en
Publication of WO2021261477A1 publication Critical patent/WO2021261477A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/50Catalysts, in general, characterised by their form or physical properties characterised by their shape or configuration
    • B01J35/56Foraminous structures having flow-through passages or channels, e.g. grids or three-dimensional monoliths
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J38/00Regeneration or reactivation of catalysts, in general
    • B01J38/48Liquid treating or treating in liquid phase, e.g. dissolved or suspended
    • B01J38/60Liquid treating or treating in liquid phase, e.g. dissolved or suspended using acids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/02Other waste gases
    • B01D2258/0283Flue gases
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/8621Removing nitrogen compounds
    • B01D53/8625Nitrogen oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/8696Controlling the catalytic process

Definitions

  • the present disclosure relates to catalyst regeneration methods, catalyst regeneration devices and programs.
  • the present application claims priority with respect to Japanese Patent Application No. 2020-108620 filed in Japan on June 24, 2020, the contents of which are incorporated herein by reference.
  • Patent Document 1 a denitration catalyst washed with water is immersed in a chemical solution containing an inorganic acid and a fluorine compound, and water or sulfamic acid-containing water is washed as a finishing cleaning solution to efficiently remove deposits on the surface of the denitration catalyst.
  • Patent Document 2 describes that a denitration catalyst whose activity has been reduced by a silica-alumina-calcium sulfate-based toxic substance is washed with water in advance, and then the toxic substance is washed and removed using a mixed solution of an organic acid and a fluoride. Discloses a technique for improving catalytic activity.
  • An object of the present disclosure is to provide a catalyst regeneration method, a catalyst regeneration device, and a program that solve the above-mentioned problems.
  • the method for regenerating the catalyst according to the present disclosure is to wash the catalyst with water, to wet the washed catalyst with the first chemical solution that has been repeatedly used, and to wet the catalyst wet with the first chemical solution with the second chemical solution.
  • the catalyst is washed with water or a finish cleaning solution which is sulfamic acid-containing water
  • the first chemical solution and the second chemical solution contain at least an inorganic acid and a fluorine compound
  • the inorganic acids are hydrochloric acid, hydrochloric acid and boro. Contains acid, or sulfamic acid.
  • the catalyst regeneration device includes a support device for moving the catalyst in the vertical and horizontal directions while supporting the catalyst, and a control device for controlling the support device, and the control device repeatedly lowers the catalyst downward.
  • Controlled to be immersed in the used first chemical solution controlled to be immersed in the second chemical solution by lowering the catalyst, controlled to be immersed in the finish cleaning solution by lowering the catalyst downward, and controlled to be immersed in the finish cleaning solution.
  • the second chemical solution contains at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution is water or sulfamic acid-containing water.
  • the control device of the support device that moves the catalyst in the vertical and horizontal directions while supporting the catalyst is used to lower the catalyst downward and repeatedly immerse the catalyst in the used first chemical solution, and to lower the catalyst. It is a program to execute the lowering and immersing in the second chemical solution and the lowering and immersing the catalyst in the finishing cleaning solution.
  • the first and second chemical solutions contain at least an inorganic acid and a fluorine compound.
  • the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid
  • the finish cleaning solution is water or sulfamic acid-containing water.
  • the catalyst can be used while being replaced a smaller number of times, as compared with the case where the catalyst is wetted with a predetermined chemical solution once to remove the deposits, and a smaller amount of the chemical solution can be used. Can be used to remove deposits.
  • the catalyst 10 is used to remove nitrogen oxides (NO X ) from the exhaust gas generated during the combustion of the power generation fuel.
  • NO X nitrogen oxides
  • the catalyst regeneration device 100 removes deposits on the surface of the catalyst 10 to prevent the activity of the catalyst 10 from being significantly reduced.
  • FIG. 1 is a diagram showing an example of the catalyst 10 according to the first embodiment.
  • the catalyst 10 is a denitration catalyst that removes nitrogen oxides from exhaust gas generated by combustion of fuel.
  • Examples of the above fuel include fuel used in a boiler for power generation such as a coal-fired power plant.
  • the catalyst 10 has a honeycomb structure in which a plurality of cells 11 formed in a hollow polygonal prism are spatially filled.
  • the catalyst 10 may be plate-shaped.
  • the catalyst 10 has 64 cells 11, but the catalyst 10 may be composed of different numbers of cells 11.
  • the cross section of the cell 11 shown in FIG. 1 is a quadrangle, the cross section of the cell 11 may have a different shape such as a triangle, a pentagon, a rectangle, and a hexagon.
  • FIG. 2 is a schematic view showing an example of the configuration of the catalyst regeneration device 100 according to the first embodiment.
  • the catalyst regeneration device 100 includes a first washing tank 21, a second washing tank 22, a third washing tank 23, a fourth washing tank 24, a support device 40, a control device 50, and a drainage table 60.
  • the hot air blower 70 is provided.
  • the first washing tank 21 stores the first chemical solution 31 for removing the ash adhering to the cell 11 of the catalyst 10.
  • the first cleaning tank 21 include containers made of acrylic or SUS (Steel Special Use Stainless), and lining-treated ones are also included.
  • the first chemical solution 31 is a fluorine-based cleaning agent containing at least an inorganic acid and a fluorine compound.
  • inorganic acids include hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
  • a surfactant may be contained here.
  • the surfactant is more preferably a nonionic surfactant or an anionic surfactant.
  • the first chemical solution 31 which is approximately three times the volume of the catalyst 10, is stored in the first washing tank 21.
  • the first cleaning tank 21 is set directly below the rail 41 on which the support device 40 travels.
  • the first chemical solution 31 is a chemical solution that has been used repeatedly. That is, the first chemical solution 31 is a chemical solution in which the catalyst 10 has been immersed.
  • the first chemical solution 31 is a chemical solution in which the catalyst 10 has been immersed three times.
  • the second washing tank 22 stores the second chemical solution 32 for removing the ash adhering to the cell 11 of the catalyst 10.
  • the second washing tank 22 include containers made of acrylic, SUS, etc., and lining-treated ones are also included.
  • the second chemical solution 32 is a fluorine-based cleaning agent containing an inorganic acid and a fluorine compound.
  • inorganic acids include hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
  • a surfactant may be contained here.
  • the surfactant is more preferably a nonionic surfactant or an anionic surfactant.
  • the second chemical solution 32 which is approximately three times the volume of the catalyst 10, is stored in the second washing tank 22.
  • the second cleaning tank 22 is set directly below the rail 41 on which the support device 40 travels.
  • the number of times the second chemical solution 32 is repeatedly used is less than the number of times the first chemical solution 31 is repeatedly used.
  • the second chemical solution 32 is an unused chemical solution.
  • the third cleaning tank 23 stores the first finishing cleaning liquid 33.
  • the third washing tank 23 include containers made of acrylic, SUS, etc., and those treated with lining are also included.
  • the first finishing cleaning liquid 33 is water or sulfamic acid-containing water.
  • the first finishing cleaning liquid 33 which is approximately three times the volume of the catalyst 10, is stored in the third cleaning tank 23.
  • the third cleaning tank 23 is set directly below the rail 41 on which the support device 40 travels.
  • the first finish cleaning liquid 33 is a finish cleaning liquid that has been used repeatedly. That is, the first finishing cleaning liquid 33 is a chemical liquid in which the catalyst 10 has been immersed.
  • the first finishing cleaning liquid 33 is a chemical liquid in which the catalyst 10 has been immersed three times.
  • the fourth cleaning tank 24 stores the second finishing cleaning liquid 34.
  • the fourth washing tank 24 include containers made of acrylic, SUS, etc., and lining-treated ones are also included.
  • the second finishing cleaning liquid 34 is water or sulfamic acid-containing water.
  • the second finishing cleaning liquid 34 which is approximately three times the volume of the catalyst 10, is stored in the fourth cleaning tank 24.
  • the fourth cleaning tank 24 is set directly below the rail 41 on which the support device 40 travels.
  • the number of times the second finish cleaning liquid 34 is repeatedly used is less than the number of times the first finish cleaning liquid 33 is repeatedly used.
  • the second finishing cleaning solution 34 is an unused chemical solution.
  • the support device 40 is a device that moves the catalyst 10 in the vertical direction and the horizontal direction while supporting the catalyst 10.
  • Examples of the support device 40 include a hoist that is attached to a rail 41 installed on the ceiling of the facility and is capable of winding and unwinding a wire rope and moving along the rail 41.
  • the support device 40 supports the open surface of the catalyst 10 and the liquid level of the first chemical solution 31 so as to face each other, and supports the open surface of the catalyst 10 and the liquid level of the second chemical solution 32 so as to face each other. Further, the support device 40 supports the opening surface of the catalyst 10 and the liquid level of the first finishing cleaning liquid 33 so as to face each other, and the opening surface of the catalyst 10 and the liquid level of the second finishing cleaning liquid 34 face each other.
  • the liquid draining table 60 is a table on which the catalyst 10 is placed in order to remove the second finishing cleaning liquid 34 adhering to the catalyst 10.
  • the drainage table 60 may be used for removing the water adhering to the catalyst 10, the first chemical solution 31, the second chemical solution 32, and the first finishing cleaning liquid 33.
  • the liquid drain stand 60 is set, for example, directly below the rail 41 on which the support device 40 travels.
  • the hot air blower 70 generates hot air to dry the catalyst 10.
  • the hot air blower 70 generates hot air toward the catalyst 10 existing in the liquid drain table 60 to dry the catalyst 10.
  • the hot air blower 70 is set, for example, directly under the rail 41 on which the support device 40 travels.
  • the control device 50 receives an input from the user of the catalyst regeneration device 100, immerses the catalyst 10 in the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34, and immerses the catalyst 10 in the catalyst. It is a device that controls the catalyst regeneration device 100 so as to wash the 10.
  • FIG. 3 is a schematic block diagram showing the configuration of the control device 50.
  • the control device 50 includes a control unit 110 and an input receiving unit 120.
  • the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the first chemical solution 31. Further, the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the second chemical solution 32. Further, the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the first finishing cleaning liquid 33. Further, the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the second finishing cleaning liquid 34. Further, the control unit 110 controls to move the catalyst 10 to the liquid drain stand 60 and the hot air blower 70.
  • the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 and outputs a signal indicating the input to the control unit 110.
  • Examples of the input receiving unit 120 include a touch panel and an operation lever.
  • the input receiving unit 120 when the input receiving unit 120 is a touch panel, the input receiving unit 120 accepts the input of the position of the hoist on the rail 41 and the input of the winding and unwinding of the wire rope on the display device.
  • the input receiving unit 120 when the input receiving unit 120 is an operating lever, the input receiving unit 120 includes a hoist operating lever capable of inputting the position of the hoist on the rail 41 and a wire rope operating lever capable of inputting winding and unwinding of the wire rope.
  • FIG. 4 is a flowchart showing an example of the usage mode of the catalyst regeneration device 100.
  • the user of the catalyst regeneration device 100 washes the catalyst 10 with water (step S1).
  • the user wash the catalyst 10 with water by roughly washing the catalyst 10 with water, evacuating with water, and washing with jet water.
  • the user of the catalyst regeneration device 100 fixes the catalyst 10 to the support device 40 so that the support device 40 supports the catalyst 10 (step S2).
  • the user of the catalyst regeneration device 100 uses, for example, a nylon sling to fix the wire rope of the support device 40 to the catalyst 10.
  • the catalyst 10 is fixed so that the liquid level of the first chemical solution 31 and the opening surface of the catalyst 10 face each other when the first chemical solution 31 is injected into the first washing tank 21. It is done like this.
  • the user of the catalyst regeneration device 100 injects the first chemical solution 31 into the first cleaning tank 21 and injects the second chemical solution 32 into the second cleaning tank 22. Further, the user of the catalyst regeneration device 100 injects the first finishing cleaning liquid 33 into the third cleaning tank 23, and injects the second finishing cleaning liquid 34 into the fourth cleaning tank 24. (Step S3).
  • the user of the catalyst regeneration device 100 may perform the operation of step S3 in advance before step S1.
  • the number of times that the catalyst 10 of the first chemical solution 31 and the second chemical solution 32 has been immersed is, for example, the number of times the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32, and then the surface of the catalyst 10 is attached.
  • the number of times the removal rate of kimono (ash, etc.) is 95% or more.
  • the removal rate of the deposits on the surface of the catalyst 10 of the first chemical solution 31. Is over 95%. That is, when the catalyst 10 of the first chemical solution 31 has been immersed in the catalyst 10 once, twice, or three times, the user does not inject the second chemical solution 32 into the second washing tank 22. ..
  • the removal rate of the deposits on the surface of the catalyst 10 of the first chemical solution 31 is not 95% or more. .. That is, when the catalyst 10 of the first chemical solution 31 has been immersed four times or more, the user injects the second chemical solution 32 into the second washing tank 22.
  • the second chemical solution 32 to be injected here is a chemical solution such that the removal rate of deposits on the surface of the catalyst 10 becomes 95% or more after the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32.
  • the second chemical solution 32 is a chemical solution in which the catalyst 10 has been immersed once.
  • the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32 after the catalyst 10 is immersed.
  • the removal rate of deposits on the surface of the surface does not exceed 95%. Therefore, the first chemical solution 31 or the second chemical solution 32 in which the catalyst 10 has been immersed 6 times or more is not used.
  • the number of times that the catalyst 10 of the first chemical solution 31 and the second chemical solution 32 has been immersed is an example.
  • the above number of times may vary depending on the degree of clogging of the opening surface of the catalyst 10 by ash, the concentration and components of the first chemical solution 31 and the second chemical solution 32, and the like.
  • the number of times that the catalyst 10 of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 has been immersed is attached to the catalyst 10 after the catalyst 10 is immersed in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34.
  • the number of times the removal rate of the first chemical solution 31 or the second chemical solution 32 is 95% or more. Every time the catalyst 10 is immersed in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34, the removal rate of the first chemical liquid 31 or the second chemical liquid 32 attached to the catalyst 10 decreases.
  • the user of the catalyst regeneration device 100 immerses the catalyst 10 in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 every time the catalyst 10 of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 has been immersed.
  • the removal rate of the first chemical solution 31 or the second chemical solution 32 attached to the catalyst 10 when the catalyst 10 is allowed to be removed is checked in advance.
  • the first chemical solution 31 or the catalyst 10 of the first finishing cleaning liquid 33 has been immersed.
  • the removal rate of the second chemical solution 32 is 95% or more. That is, when the catalyst 10 of the first finishing cleaning liquid 33 has been immersed in the catalyst 10 once, twice, or three times, the user puts the second finishing cleaning liquid 34 in the fourth cleaning tank 24. Do not inject.
  • the catalyst 10 of the first finishing cleaning liquid 33 has been immersed 4 times or 5 times, the first chemical liquid 31 or the second chemical liquid 32 attached to the catalyst 10 of the first finishing cleaning liquid 33
  • the removal rate of is not more than 95%.
  • the second finishing cleaning liquid 34 injected here has a removal rate of 95 for the first chemical liquid 31 or the second chemical liquid 32 attached to the catalyst 10 after the catalyst 10 is immersed in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34. It is a finish cleaning liquid that becomes% or more.
  • the second finishing cleaning liquid 34 is a finishing cleaning liquid in which the catalyst 10 has been immersed once. Further, in the first finish cleaning liquid 33 or the second finish cleaning liquid 34 in which the catalyst 10 has been immersed 6 times or more, the catalyst 10 is immersed in the first finish cleaning liquid 33 and the second finish cleaning liquid 34.
  • the removal rate of the first chemical solution 31 or the second chemical solution 32 does not become 95% or more. Therefore, the first finishing cleaning liquid 33 or the second finishing cleaning liquid 34 in which the catalyst 10 has been immersed 6 times or more is not used.
  • the number of times that the catalyst 10 of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 has been immersed is an example. The above number of times may vary depending on the degree of clogging of the opening surface of the catalyst 10 by ash, the concentration and components of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34, and the like.
  • the user of the catalyst regeneration device 100 uses the control device 50 to immerse the catalyst 10 in the first chemical solution 31 (step S4).
  • the user of the catalyst regeneration device 100 immerses the catalyst 10 in the first chemical solution 31 by the following operations.
  • the user of the catalyst regeneration device 100 inputs to the input receiving unit 120 that the hoist of the support device 40 is moved onto the first washing tank 21 after the support device 40 winds up the wire rope. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 that the catalyst regeneration device 100 lifts the catalyst 10 and moves it onto the first cleaning tank 21. Further, the user of the catalyst regeneration device 100 uses the operation lever, which is the input receiving unit 120, to input that the wire rope is wound up and that the hoist is moved onto the first cleaning tank 21.
  • the control unit 110 of the control device 50 receives the signal output by the input receiving unit 120, and controls the support device 40 to lift the catalyst 10 and move it onto the first cleaning tank 21.
  • the control unit 110 receives the signal output by the input receiving unit 120, winds the wire rope to the maximum height, and controls to lift the catalyst 10. After the lifting, the control unit 110 controls the hoist to move to the position of the rail 41 corresponding to the position on the first cleaning tank 21 stored in the control device 50.
  • the user of the catalyst regeneration device 100 inputs to the input receiving unit 120 to wind the wire rope toward the first washing tank 21. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 to the effect that the catalyst 10 is dropped into the first cleaning tank 21.
  • the control unit 110 receives the signal output by the input receiving unit 120, the support device 40 lowers the wire rope to the first cleaning tank 21, and the catalyst 10 fixed to the wire rope is the first cleaning tank 21. 1 Control so as to be immersed in the chemical solution 31.
  • the user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the first chemical solution 31 and immerse it in the second chemical solution 32 (step S5).
  • the user of the catalyst regeneration device 100 takes out the catalyst 10 from the first chemical solution 31 and immerses it in the second chemical solution 32 by the following operation.
  • the user of the catalyst regeneration device 100 inputs to the input receiving unit 120 to wind up the wire rope. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 to the effect that the catalyst regeneration device 100 lifts the catalyst 10.
  • the control unit 110 receives the signal output by the input receiving unit 120, and the support device 40 controls the wire rope to be wound up to the maximum height. That is, the support device 40 lifts the catalyst 10 and moves it onto the first cleaning tank 21.
  • the user of the catalyst regeneration device 100 inputs to the input receiving unit 120 to move the hoist of the support device 40 to the position of the rail 41 corresponding to the second cleaning tank 22.
  • the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 that the support device 40 moves the catalyst 10 onto the second cleaning tank 22.
  • the control unit 110 receives the signal output by the input receiving unit 120 and controls the support device 40 to move the hoist to the position of the rail 41 corresponding to the second cleaning tank 22.
  • the control device 50 stores the position of the rail 41 corresponding to the second cleaning tank 22 in advance.
  • the support device 40 moves the catalyst 10 onto the second cleaning tank 22.
  • the user of the catalyst regeneration device 100 makes an input to the input receiving unit 120 to wind the wire rope toward the second washing tank 22. That is, the input receiving unit 120 receives an input to lower the catalyst 10 into the second cleaning tank 22 from the user of the catalyst regeneration device 100.
  • the control unit 110 receives the signal output by the input receiving unit 120, the support device 40 lowers the wire rope to the second cleaning tank 22, and the catalyst 10 fixed to the wire rope is the second cleaning tank 22. 2 Control so as to immerse in the chemical solution 32.
  • the removal rate of the deposits on the surface of the catalyst 10 in the first chemical solution 31 in which the catalyst 10 has been immersed is the removal rate of the deposits on the surface of the catalyst 10 in the first chemical solution 31 in which the catalyst 10 has not been immersed. Lower. However, even if the removal rate is low, the first chemical solution 31 having the catalyst 10 immersed 5 times or less can remove certain deposits.
  • the second chemical solution 32 is compared with the case where the first chemical solution 31 is not used. It will remove less deposits. That is, by using the first chemical solution 31, the number of times that the second chemical solution 32 can be used increases.
  • the user of the catalyst regeneration device 100 can use the second chemical solution 32 while replacing it with a smaller number of times as compared with the case where the first chemical solution 31 is not used, and even if a smaller chemical solution is used, the catalyst 10 can be used.
  • the deposits on the surface can be removed.
  • the user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the second chemical solution 32 and immerse it in the first finishing cleaning solution 33 (step S6).
  • the user takes out the catalyst 10 from the second chemical solution 32, leaves it for a certain period of time, and then immerses it in the first finishing cleaning solution 33, so that the first chemical solution 31 and the second chemical solution 32 attached to the catalyst 10 are immersed. May be immersed in the first finishing cleaning liquid 33 after cutting.
  • the specific operation in which the user takes out the catalyst 10 from the second chemical solution 32 using the control device 50 and immerses the catalyst 10 in the first finishing cleaning liquid 33 is the same as in step S5.
  • the user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the first finishing cleaning liquid 33 and immerse it in the second finishing cleaning liquid 34 (step S7).
  • the specific operation in which the user takes out the catalyst 10 from the first finishing cleaning liquid 33 using the control device 50 and immerses the catalyst 10 in the second finishing cleaning liquid 34 is the same as in step S5.
  • the user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the second finishing cleaning liquid 34 and move it onto the drainage table 60 (step S8).
  • the specific operation in which the user takes out the catalyst 10 from the second finishing cleaning liquid 34 using the control device 50 and moves it onto the liquid drain table 60 is the same as in step S5.
  • the user of the catalyst regeneration device 100 leaves the catalyst 10 moved to the drainage table 60 (step S9).
  • the liquids of the first chemical liquid 31, the second chemical liquid 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 attached to the catalyst 10 are cut off.
  • the user of the catalyst regeneration device 100 uses the hot air blower 70 to blow hot air to the catalyst 10 to dry the catalyst 10 (step S10).
  • the liquids of the first chemical liquid 31, the second chemical liquid 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 attached to the catalyst 10 are cut off.
  • the method for regenerating the catalyst according to the present disclosure is to wash the catalyst 10 with water, to wet the washed catalyst 10 with the repeatedly used first chemical solution 31, and to wet the catalyst 10 with the first chemical solution 31 to the second. It comprises wetting the chemical solution 32 and washing the catalyst 10 with water or a finishing cleaning solution which is sulfamic acid-containing water, and the first chemical solution 31 and the second chemical solution 32 contain at least an inorganic acid and a fluorine compound.
  • Inorganic acids include hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
  • the catalyst regeneration method When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is wetted with the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can use the catalyst 10 while replacing it with a smaller number of times as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution, and the catalyst 10 can be used by using a smaller amount of the chemical solution. The deposits on the surface of the surface can be removed.
  • the catalyst 10 of the catalyst regeneration method is a denitration catalyst.
  • the user of the catalyst regeneration method can remove the deposits on the surface of the denitration catalyst by using a smaller amount of the chemical solution as compared with the case where the denitration catalyst is wetted once with a predetermined chemical solution.
  • the number of times of repeated use of the second chemical solution 32 in the catalyst regeneration method is less than the number of times of repeated use of the first chemical solution 31.
  • the catalyst regeneration method when the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 which is frequently used repeatedly, the catalyst 10 is wetted with the second chemical solution 32 which is used less frequently. Remove the kimono. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
  • the catalyst 10 is washed with the first finish cleaning liquid 33 which is a repeatedly used finish cleaning liquid, and the catalyst 10 washed with the first finish cleaning liquid 33 is used.
  • the present invention includes washing with a second finishing cleaning liquid 34, which is a finishing cleaning liquid.
  • the catalyst regeneration method When the catalyst regeneration method is used, after removing the deposits attached to the catalyst 10 by using the repeatedly used first finishing cleaning liquid 33, the catalyst 10 is wetted with the second finishing cleaning liquid 34, and the catalyst 10 is attached to the catalyst 10. Remove the kimono. Thereby, the user of the catalyst regeneration method can increase the number of times that the second finishing cleaning liquid 34 can be used. Therefore, the user of the catalyst regeneration method can remove the deposits attached to the catalyst 10 by using a smaller amount of the finish cleaning liquid than in the case where the catalyst 10 is wetted once with a predetermined finish cleaning liquid.
  • wetting the water-washed catalyst 10 in the catalyst regeneration method with the first chemical solution 31 means immersing the water-washed catalyst 10 in the first chemical solution 31, and the catalyst 10 wetted with the first chemical solution 31 is the first.
  • Wetting with the chemical solution 32 means immersing the catalyst 10 immersed in the first chemical solution 31 in the second chemical solution 32.
  • the catalyst regeneration method when the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is immersed in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
  • the first chemical solution 31 of the catalyst regeneration method is a chemical solution that has been used repeatedly one or more times.
  • the catalyst 10 is wetted with the second chemical solution 32 after removing the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been used repeatedly once or more.
  • the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
  • the catalyst regeneration device 100 includes a support device 40 that moves the catalyst 10 in the vertical and horizontal directions while supporting the catalyst 10, and a control device 50 that controls the support device 40.
  • the catalyst 10 is lowered and controlled to be repeatedly immersed in the used first chemical solution 31, the catalyst 10 is controlled to be lowered and immersed in the second chemical solution 32, and the catalyst 10 is lowered and finished.
  • the first chemical solution 31 and the second chemical solution 32 contain at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution contains at least an inorganic acid and a fluorine compound. , Water or sulfamic acid-containing water.
  • the catalyst regeneration device 100 removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the catalyst regeneration device 100 can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
  • the catalyst 10 is repeatedly immersed in the used first chemical solution 31 in the control device 50 of the support device 40 that moves the catalyst 10 in the vertical and horizontal directions while supporting the catalyst 10.
  • This is a program for executing the process of lowering the catalyst 10 and immersing it in the second chemical solution 32 and lowering the catalyst 10 and immersing it in the finishing cleaning liquid, wherein the first chemical solution 31 and the second chemical solution are executed.
  • Reference numeral 32 contains at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finishing cleaning solution is water or sulfamic acid-containing water.
  • the user of the program removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits.
  • the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the program can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
  • FIG. 5 is a diagram showing the configuration of the catalyst regeneration device 100 according to the second embodiment.
  • the configuration of the catalyst regeneration device 100 according to the second embodiment is based on the configuration of the catalyst regeneration device 100 according to the first embodiment, that is, the second cleaning tank 22, the third cleaning tank 23, and the fourth cleaning tank. It is a configuration that does not include 24.
  • the catalyst regeneration device 100 according to the second embodiment includes a nozzle 80, a first tank 90, a first pump 91, and the like, in addition to the configuration of the catalyst regeneration device 100 according to the first embodiment. It is configured to include a second tank 93 and a second pump 94.
  • first tank 90 Four separated storage spaces are provided inside the first tank 90, and the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 are provided in each storage space. It is stored.
  • the first pump 91 supplies the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 stored in the first tank 90 to the nozzle 80 by using air pressure or the like.
  • the nozzle 80 is a plurality of injection ports (not shown) provided on the side where the nozzle 80 faces the first cleaning tank 21 while moving in the A direction, and the first chemical solution 31, the second chemical solution 32, and the first chemical solution 32 are provided.
  • the finish cleaning liquid 33 and the second finish cleaning liquid 34 are sprayed so as to face the opening surface of the catalyst 10.
  • the amount of each of the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 to be sprayed is about half the volume of the catalyst 10.
  • the catalyst regeneration device 100 may include a plurality of nozzles 80. In this case, the catalyst regeneration device 100 moves the plurality of nozzles 80 above the catalyst 10 after the catalyst 10 is lowered into the first cleaning tank 21, and uses the plurality of nozzles 80 to move the opening surface of the catalyst 10. Inject against.
  • the second pump 94 moves the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 of the first cleaning tank 21 to the second tank 93 by using air pressure or the like.
  • the second tank 93 is provided with four separated storage spaces, and the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the first chemical solution 33 injected by the second pump 94 into each storage space are provided. 2
  • the finishing cleaning liquid 34 is stored.
  • the control device 50 receives input from the user of the catalyst regeneration device 100 and controls the first pump 91, the second pump 94, and the nozzle 80 to operate.
  • the control device may be attached to each of the first pump 91, the second pump 94, and the nozzle 80.
  • FIG. 6 is a flowchart showing an example of the usage mode of the catalyst regeneration device 100.
  • steps S1 and S2 of the usage mode of the catalyst regeneration device 100 according to the first embodiment are performed.
  • the user of the catalyst regeneration device 100 injects the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 into the first tank 90 (step S13).
  • the user of the catalyst regeneration device 100 moves the catalyst 10 to the first washing tank 21 by using the control device 50 (step S14).
  • the specific operation of moving the catalyst 10 to the first cleaning tank 21 is the same as step S8 of the usage mode of the catalyst regeneration device 100 according to the first embodiment.
  • the user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the first chemical solution 31 is supplied from the first tank 90 to the nozzle 80.
  • the nozzle 80 ejects the first chemical solution 31 facing the opening surface of the catalyst 10 while moving in the A direction (step S15).
  • the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S15.
  • the control device 50 operates the second pump 94 to move the first chemical solution 31 of the first cleaning tank 21 to the second tank 93.
  • the catalyst regeneration device 100 wets the catalyst 10 with a smaller amount of the chemical solution. be able to.
  • the user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the second chemical solution 32 is supplied from the first tank 90 to the nozzle 80.
  • the nozzle 80 ejects the second chemical solution 32 facing the opening surface of the catalyst 10 while moving in the A direction (step S16).
  • the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S16.
  • the control device 50 operates the second pump 94 to move the second chemical solution 32 of the first cleaning tank 21 to the second tank 93.
  • the user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the first finishing cleaning liquid 33 is supplied from the first tank 90 to the nozzle 80.
  • the nozzle 80 ejects the first finishing cleaning liquid 33 facing the opening surface of the catalyst 10 while moving in the A direction (step S17).
  • the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S17.
  • the control device 50 operates the second pump 94 to move the first finishing cleaning liquid 33 of the first cleaning tank 21 to the second tank 93.
  • the user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the second finishing cleaning liquid 34 is supplied from the first tank 90 to the nozzle 80.
  • the nozzle 80 ejects the second finishing cleaning liquid 34 facing the opening surface of the catalyst 10 while moving in the A direction (step S18).
  • the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S18.
  • the control device 50 operates the second pump 94 to move the second finishing cleaning liquid 34 of the first cleaning tank 21 to the second tank 93.
  • the user of the catalyst regeneration device 100 takes out the catalyst 10 from the first washing tank 21 and moves it to the liquid drain stand 60 by using the control device 50 (step S19).
  • the specific operation of taking out the catalyst 10 from the first washing tank 21 and moving it to the drainage table 60 is the same as step S8 of the usage mode of the catalyst regeneration device 100 according to the first embodiment.
  • steps S9 and S10 of the usage mode of the catalyst regeneration device 100 are performed.
  • a cleaning tank may be provided for each cleaning liquid, and the cleaning liquid may be sprayed on each cleaning tank.
  • the first tank 90, the first pump 91, the nozzle 80, and the second pump may be used.
  • the second tank 93 may be in each cleaning liquid.
  • the catalyst 10 of the catalyst regeneration method according to the present disclosure is a honeycomb structure or plate-shaped catalyst 10, and wetting the catalyst 10 washed with water with the first chemical solution 31 causes the opening surface of the honeycomb structure or plate-shaped catalyst 10 to be wetted.
  • the first chemical solution 31 and the second chemical solution 32 are sprayed from a position facing the opening surface of the honeycomb structure or the plate-shaped catalyst to wet the catalyst 10.
  • the user of the catalyst regeneration method can wet the catalyst 10 with a smaller amount of the first chemical solution 31 and the second chemical solution 32 as compared with the case of using another method for wetting the catalyst 10. Thereby, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10.
  • FIG. 7 is a schematic block diagram showing the configuration of a computer according to at least one embodiment.
  • the computer 1100 includes a processor 1110, a main memory 1120, a storage 1130, and an interface 1140.
  • the control device 50 described above is mounted on the computer 1100.
  • the operation of each of the above-mentioned processing units is stored in the storage 1130 in the form of a program.
  • the processor 1110 reads a program from the storage 1130, expands it into the main memory 1120, and executes the above processing according to the program. Further, the processor 1110 secures a storage area corresponding to each of the above-mentioned storage units in the main memory 1120 according to the program.
  • the program may be for realizing a part of the functions exerted by the computer 1100.
  • the program may exert its function in combination with another program already stored in the storage 1130, or in combination with another program mounted on another device.
  • the computer 1100 may include a custom LSI (Large Scale Integrated Circuit) such as a PLD (Programmable Logic Device) in addition to or in place of the above configuration.
  • PLDs include PAL (Programmable Array Logic), GAL (Generic Array Logic), CPLD (Complex Programmable Logic Device), and FPGA (Field Programmable Gate Array).
  • PLDs Programmable Logic Device
  • PAL Programmable Array Logic
  • GAL Generic Array Logic
  • CPLD Complex Programmable Logic Device
  • FPGA Field Programmable Gate Array
  • Examples of the storage 1130 include magnetic disks, magneto-optical disks, semiconductor memories, and the like.
  • the storage 1130 may be internal media directly connected to the bus of computer 1100, or external media connected to the computer via interface 1140 or a communication line.
  • this program is distributed to the computer 1100 via a communication line, the distributed computer 1100 may expand the program to the main memory 1120 and execute the above processing.
  • the storage 1130 is a non-temporary tangible storage medium.
  • the program may be for realizing a part of the above-mentioned functions. Further, the program may be a so-called difference file (difference program) that realizes the above-mentioned function in combination with another program already stored in the storage 1130.
  • difference file difference program
  • the catalyst regeneration device 100 according to each embodiment is grasped as follows, for example.
  • the method for regenerating the catalyst according to the present disclosure is to wash the catalyst 10 with water, to wet the washed catalyst 10 with the repeatedly used first chemical solution 31, and to wet the catalyst 10 with the first chemical solution 31. ,
  • the second chemical solution 32 is wetted, and the catalyst 10 is washed with water or a finishing cleaning solution which is sulfamic acid-containing water.
  • the inorganic acid includes hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
  • the catalyst regeneration method When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is wetted with the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can use the catalyst 10 while replacing it with a smaller number of times as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution, and the catalyst 10 can be used by using a smaller amount of the chemical solution. The deposits on the surface of the surface can be removed.
  • the catalyst 10 of the catalyst regeneration method is a denitration catalyst.
  • the user of the catalyst regeneration method can remove the deposits on the surface of the denitration catalyst by using a smaller amount of the chemical solution as compared with the case where the denitration catalyst is wetted once with a predetermined chemical solution.
  • the number of times the second chemical solution 32 is repeatedly used is less than the number of times the first chemical solution 31 is repeatedly used.
  • the catalyst regeneration method when the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 which is frequently used repeatedly, the catalyst 10 is wetted with the second chemical solution 32 which is used less frequently. Remove the kimono. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
  • the catalyst 10 was washed with the first finish cleaning liquid 33, which is a repeatedly used finish cleaning liquid, and with the first finish cleaning liquid 33.
  • the catalyst 10 includes washing with a second finishing cleaning liquid 34, which is a finishing cleaning liquid.
  • the catalyst regeneration method When the catalyst regeneration method is used, after removing the deposits attached to the catalyst 10 by using the repeatedly used first finishing cleaning liquid 33, the catalyst 10 is wetted with the second finishing cleaning liquid 34, and the catalyst 10 is attached to the catalyst 10. Remove the kimono. Thereby, the user of the catalyst regeneration method can increase the number of times that the second finishing cleaning liquid 34 can be used. Therefore, the user of the catalyst regeneration method can remove the deposits attached to the catalyst 10 by using a smaller amount of the finish cleaning liquid than in the case where the catalyst 10 is wetted once with a predetermined finish cleaning liquid.
  • wetting the water-washed catalyst 10 in the catalyst regeneration method with the first chemical solution 31 means immersing the water-washed catalyst 10 in the first chemical solution 31, and the catalyst 10 wetted with the first chemical solution 31.
  • To wet the second chemical solution 32 is to immerse the catalyst 10 immersed in the first chemical solution 31 in the second chemical solution 32.
  • the catalyst regeneration method when the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is immersed in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
  • the first chemical solution 31 of the catalyst regeneration method is a chemical solution that has been used repeatedly one or more times.
  • the catalyst 10 is wetted with the second chemical solution 32 after removing the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been used repeatedly once or more.
  • the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
  • the catalyst regeneration device 100 includes a support device 40 that moves the catalyst 10 in the vertical direction while supporting the catalyst 10, and a control device 50 that controls the support device 40. Controls the catalyst 10 to be lowered and immersed in the used first chemical solution 31 repeatedly, and controls the catalyst 10 to be lowered and immersed in the second chemical solution 32, and lowers the catalyst 10 downward.
  • the first chemical solution 31 and the second chemical solution 32 contain at least an inorganic acid and a fluorine compound, and the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid for finishing.
  • the cleaning solution is water or sulfamic acid-containing water.
  • the catalyst regeneration device 100 removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the catalyst regeneration device 100 can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
  • the catalyst 10 is lowered downward in the control device 50 of the support device 40 that moves the catalyst 10 in the vertical direction while supporting the catalyst 10, and is repeatedly immersed in the used first chemical solution 31. It is a program for executing the process of lowering the catalyst 10 and immersing it in the second chemical solution 32, and lowering the catalyst 10 and immersing it in the finishing cleaning liquid.
  • the chemical solution 32 contains at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution is water or sulfamic acid-containing water.
  • the user of the program removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits.
  • the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the program can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
  • the catalyst 10 of the catalyst regeneration method according to the present disclosure is a honeycomb structure or plate-shaped catalyst 10, and wetting the water-washed catalyst 10 with the first chemical solution 31 is a honeycomb structure or plate-shaped catalyst 10.
  • Including spraying the first chemical solution 31 from a position facing the opening surface, and wetting the catalyst 10 wetted with the first chemical solution 31 with the second chemical solution 32 is the opening surface of the honeycomb structure or the plate-shaped catalyst 10. It includes injecting the second chemical solution 32 from the position facing the honeycomb.
  • the first chemical solution 31 and the second chemical solution 32 are sprayed from a position facing the opening surface of the honeycomb structure or the plate-shaped catalyst to wet the catalyst 10.
  • the user of the catalyst regeneration method can wet the catalyst 10 with a smaller amount of the first chemical solution 31 and the second chemical solution 32 as compared with the case of using another method for wetting the catalyst 10. Thereby, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10.
  • the present disclosure relates to catalyst regeneration methods, catalyst regeneration devices and programs.
  • the catalyst can be used while being replaced a smaller number of times as compared with the case where the catalyst is wetted with a predetermined chemical solution once to remove the deposits, and the deposits can be used by using a smaller amount of the chemical solution. Can be removed.
  • Catalyst 11 Cell 21 1st cleaning tank 22 2nd cleaning tank 23 3rd cleaning tank 24 4th cleaning tank 31 1st chemical liquid 32 2nd chemical liquid 33 1st finish cleaning liquid 34 2nd finish cleaning liquid 40 Support device 41 Rail 50 Control device 60 Drainer 70 Hot air blower 80 Nozzle 90 1st tank 91 1st pump 93 2nd tank 94 2nd pump 100 Catalyst regenerator 110 Control unit 120 Input receiving unit 1100 Computer 1110 Processor 1120 Main memory 1130 Storage 1140 Interface

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Abstract

This method for regenerating a catalyst comprises: a step wherein a catalyst is washed with water; a step wherein the water-washed catalyst is wetted with a first chemical agent that has been repeatedly used; a step wherein the catalyst, which has been wetted with the first chemical agent, is wetted with a second chemical agent; and a step wherein the catalyst is washed with a finish cleaning liquid that is water or sulfamic acid-containing water. With respect to this method for regenerating a catalyst, the first chemical agent and the second chemical agent contain at least an inorganic acid and a fluorine compound; and the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.

Description

触媒の再生方法、触媒の再生装置及びプログラムCatalyst regeneration methods, catalyst regeneration equipment and programs
 本開示は、触媒の再生方法、触媒の再生装置及びプログラムに関する。
 本願は、2020年6月24日に日本に出願された特願2020-108620号について優先権を主張し、その内容をここに援用する。
The present disclosure relates to catalyst regeneration methods, catalyst regeneration devices and programs.
The present application claims priority with respect to Japanese Patent Application No. 2020-108620 filed in Japan on June 24, 2020, the contents of which are incorporated herein by reference.
 特許文献1には、水洗いした脱硝触媒を無機酸とフッ素化合物とを含む薬液に浸漬させ、水又はスルファミン酸含有水を仕上げ洗浄液として洗うことにより、脱硝触媒の表面に付いた付着物を効率よく除去することができ、かつ触媒性能を高く回復することができる技術が開示されている。 In Patent Document 1, a denitration catalyst washed with water is immersed in a chemical solution containing an inorganic acid and a fluorine compound, and water or sulfamic acid-containing water is washed as a finishing cleaning solution to efficiently remove deposits on the surface of the denitration catalyst. Disclosed is a technique that can be removed and the catalytic performance can be restored to a high level.
 特許文献2には、シリカ・アルミナ・硫酸カルシウム系の被毒物質で活性が低下した脱硝触媒を予め水洗いした後、有機酸とフッ化物との混液を用いて上記被毒物質を洗浄除去することにより、触媒活性を改良する技術が開示されている。 Patent Document 2 describes that a denitration catalyst whose activity has been reduced by a silica-alumina-calcium sulfate-based toxic substance is washed with water in advance, and then the toxic substance is washed and removed using a mixed solution of an organic acid and a fluoride. Discloses a technique for improving catalytic activity.
特許第6298579号公報Japanese Patent No. 6298579 特許第4870217号公報Japanese Patent No. 4870217
 薬液の入った洗浄槽に触媒を浸漬させて触媒の表面を薬液で濡らし、触媒の表面の付着物を除去する技術が知られている。しかし、繰り返し使用済みの薬液に触媒を浸漬させた場合、未使用の薬液に触媒を浸漬させた場合に比べると、除去できる付着物の量が少ない。そのため、数回の使用ごとに薬液を取替える必要があり、付着物の除去に大量の薬液を使用している。
 本開示の目的は、上述した課題を解決する触媒の再生方法、触媒の再生装置及びプログラムを提供することにある。
A technique is known in which a catalyst is immersed in a washing tank containing a chemical solution to wet the surface of the catalyst with the chemical solution to remove deposits on the surface of the catalyst. However, when the catalyst is immersed in the used chemical solution repeatedly, the amount of deposits that can be removed is smaller than that in the case where the catalyst is immersed in the unused chemical solution. Therefore, it is necessary to replace the chemical solution after every few uses, and a large amount of chemical solution is used to remove the deposits.
An object of the present disclosure is to provide a catalyst regeneration method, a catalyst regeneration device, and a program that solve the above-mentioned problems.
 本開示に係る触媒の再生方法は、触媒を水洗いすることと、水洗いした触媒を、繰り返し使用済みの第1薬液に濡らすことと、第1薬液に濡らした触媒を、第2薬液に濡らすことと、触媒を、水又はスルファミン酸含有水である仕上げ洗浄液で洗うことと、を含み、第1薬液及び第2薬液は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含む。 The method for regenerating the catalyst according to the present disclosure is to wash the catalyst with water, to wet the washed catalyst with the first chemical solution that has been repeatedly used, and to wet the catalyst wet with the first chemical solution with the second chemical solution. , The catalyst is washed with water or a finish cleaning solution which is sulfamic acid-containing water, the first chemical solution and the second chemical solution contain at least an inorganic acid and a fluorine compound, and the inorganic acids are hydrochloric acid, hydrochloric acid and boro. Contains acid, or sulfamic acid.
 本開示に係る触媒の再生装置は、触媒を支持しながら触媒を上下左右方向に移動させる支持装置と、支持装置を制御する制御装置と、を備え、制御装置は、触媒を下方に下ろして繰り返し使用済みの第1薬液に浸漬させるように制御し、触媒を下方に下ろして第2薬液に浸漬させるように制御し、触媒を下方に下ろして仕上げ洗浄液に浸漬させるように制御し、第1薬液及び第2薬液は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、仕上げ洗浄液は、水又はスルファミン酸含有水である。 The catalyst regeneration device according to the present disclosure includes a support device for moving the catalyst in the vertical and horizontal directions while supporting the catalyst, and a control device for controlling the support device, and the control device repeatedly lowers the catalyst downward. Controlled to be immersed in the used first chemical solution, controlled to be immersed in the second chemical solution by lowering the catalyst, controlled to be immersed in the finish cleaning solution by lowering the catalyst downward, and controlled to be immersed in the finish cleaning solution. The second chemical solution contains at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution is water or sulfamic acid-containing water.
 本開示に係るプログラムは、触媒を支持しながら触媒を上下左右方向に移動させる支持装置の制御装置に、触媒を下方に下ろして繰り返し使用済みの第1薬液に浸漬させることと、触媒を下方に下ろして第2薬液に浸漬させることと、触媒を下方に下ろして仕上げ洗浄液に浸漬させることと、を実行させるプログラムであって、第1薬液及び第2薬液は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、仕上げ洗浄液は、水又はスルファミン酸含有水である。 In the program according to the present disclosure, the control device of the support device that moves the catalyst in the vertical and horizontal directions while supporting the catalyst is used to lower the catalyst downward and repeatedly immerse the catalyst in the used first chemical solution, and to lower the catalyst. It is a program to execute the lowering and immersing in the second chemical solution and the lowering and immersing the catalyst in the finishing cleaning solution. The first and second chemical solutions contain at least an inorganic acid and a fluorine compound. The inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution is water or sulfamic acid-containing water.
 上記態様のうち少なくとも1つの態様によれば、触媒に所定の薬液を1回濡らして付着物を除去する場合に比べ、薬液をより少ない回数で取り換えながら使用することができ、より少ない量の薬液を使用して付着物を除去することができる。 According to at least one of the above embodiments, the catalyst can be used while being replaced a smaller number of times, as compared with the case where the catalyst is wetted with a predetermined chemical solution once to remove the deposits, and a smaller amount of the chemical solution can be used. Can be used to remove deposits.
一実施形態に係る触媒の一例を示す図である。It is a figure which shows an example of the catalyst which concerns on one Embodiment. 一実施形態に係る触媒の再生装置の構成を示す図である。It is a figure which shows the structure of the catalyst regeneration apparatus which concerns on one Embodiment. 一実施形態に係る制御装置を示す概略ブロック図である。It is a schematic block diagram which shows the control device which concerns on one Embodiment. 一実施形態に係る触媒の再生装置の使用態様の一例を示すフローチャートである。It is a flowchart which shows an example of the use mode of the catalyst regeneration apparatus which concerns on one Embodiment. 一実施形態に係る触媒の再生装置の構成を示す図である。It is a figure which shows the structure of the catalyst regeneration apparatus which concerns on one Embodiment. 一実施形態に係る触媒の再生装置の使用態様の一例を示すフローチャートである。It is a flowchart which shows an example of the use mode of the catalyst regeneration apparatus which concerns on one Embodiment. 少なくとも1つの実施形態に係るコンピュータの構成を示す概略ブロック図である。It is a schematic block diagram which shows the structure of the computer which concerns on at least one Embodiment.
[第1の実施形態]
(触媒の再生装置の構成)
 以下、図面を参照しながら実施形態に係る触媒の再生装置100について詳しく説明する。
 発電燃料の燃焼時に発生する排ガスから窒素酸化物(NO)を除去するために、触媒10が使用される。しかし、触媒10は使用されることにより、排ガスから灰などの付着物が付着されて、窒素酸化物を除去する活性が低下する。
 触媒の再生装置100は触媒10の表面の付着物を除去して、触媒10の活性が大きく低下することを防止する。
[First Embodiment]
(Composition of catalyst regeneration device)
Hereinafter, the catalyst regeneration device 100 according to the embodiment will be described in detail with reference to the drawings.
The catalyst 10 is used to remove nitrogen oxides (NO X ) from the exhaust gas generated during the combustion of the power generation fuel. However, when the catalyst 10 is used, deposits such as ash adhere to the exhaust gas, and the activity of removing nitrogen oxides decreases.
The catalyst regeneration device 100 removes deposits on the surface of the catalyst 10 to prevent the activity of the catalyst 10 from being significantly reduced.
 図1は、第1の実施形態に係る触媒10の一例を示す図である。
 触媒10は、燃料の燃焼によって生ずる排ガスから窒素酸化物を除去する脱硝触媒である。上記燃料の例としては、石炭火力発電所などの発電用のボイラーで用いられる燃料が挙げられる。
FIG. 1 is a diagram showing an example of the catalyst 10 according to the first embodiment.
The catalyst 10 is a denitration catalyst that removes nitrogen oxides from exhaust gas generated by combustion of fuel. Examples of the above fuel include fuel used in a boiler for power generation such as a coal-fired power plant.
 触媒10は、中空の多角柱に形成された複数のセル11を空間充填したハニカム構造となっている。触媒10は板状のものであっても良い。図1の例では、触媒10がセル11を64個有するが、異なる数のセル11からなる触媒10であっても良い。
 図1に示すセル11の断面は四角形であるが、セル11の断面は三角形、五角形、長方形および六角形などの異なる形状であっても良い。
The catalyst 10 has a honeycomb structure in which a plurality of cells 11 formed in a hollow polygonal prism are spatially filled. The catalyst 10 may be plate-shaped. In the example of FIG. 1, the catalyst 10 has 64 cells 11, but the catalyst 10 may be composed of different numbers of cells 11.
Although the cross section of the cell 11 shown in FIG. 1 is a quadrangle, the cross section of the cell 11 may have a different shape such as a triangle, a pentagon, a rectangle, and a hexagon.
 図2は、第1の実施形態に係る触媒の再生装置100の構成の一例を示す概略図である。
 触媒の再生装置100は、第1洗浄槽21と、第2洗浄槽22と、第3洗浄槽23と、第4洗浄槽24と、支持装置40と、制御装置50と、液切り台60と、熱風送風機70を備える。
FIG. 2 is a schematic view showing an example of the configuration of the catalyst regeneration device 100 according to the first embodiment.
The catalyst regeneration device 100 includes a first washing tank 21, a second washing tank 22, a third washing tank 23, a fourth washing tank 24, a support device 40, a control device 50, and a drainage table 60. , The hot air blower 70 is provided.
 第1洗浄槽21は、触媒10のセル11の中に付着した灰を除去するための第1薬液31を貯留する。第1洗浄槽21の例としてはアクリル、SUS(Steel Special Use Stainless)製等の容器が挙げられ、ライニング処理したものも含まれる。第1薬液31は、少なくとも無機酸とフッ素化合物とを含むフッ素系洗浄剤である。無機酸の例としては、塩酸、塩酸及びホウ酸、又はスルファミン酸が挙げられる。ここに界面活性剤が含まれていても良い。界面活性剤は、ノニオン系界面活性剤またはアニオン系界面活性剤であることがより好ましい。この界面活性剤により、洗浄液中に溶解しているカルシウムや、ダスト中のカルシウムを高分散させることができ、触媒への再付着抑制効果がある。第1洗浄槽21には触媒10の体積の凡そ3倍の第1薬液31が貯留される。
 第1洗浄槽21は、支持装置40が走行するレール41の直下にセットされる。
 第1薬液31は繰り返し使用済みの薬液である。すなわち、第1薬液31は触媒10が浸漬されたことの有る薬液である。例えば、第1薬液31は触媒10が3回浸漬されたことの有る薬液である。
The first washing tank 21 stores the first chemical solution 31 for removing the ash adhering to the cell 11 of the catalyst 10. Examples of the first cleaning tank 21 include containers made of acrylic or SUS (Steel Special Use Stainless), and lining-treated ones are also included. The first chemical solution 31 is a fluorine-based cleaning agent containing at least an inorganic acid and a fluorine compound. Examples of inorganic acids include hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid. A surfactant may be contained here. The surfactant is more preferably a nonionic surfactant or an anionic surfactant. With this surfactant, calcium dissolved in the cleaning liquid and calcium in the dust can be highly dispersed, and there is an effect of suppressing reattachment to the catalyst. The first chemical solution 31, which is approximately three times the volume of the catalyst 10, is stored in the first washing tank 21.
The first cleaning tank 21 is set directly below the rail 41 on which the support device 40 travels.
The first chemical solution 31 is a chemical solution that has been used repeatedly. That is, the first chemical solution 31 is a chemical solution in which the catalyst 10 has been immersed. For example, the first chemical solution 31 is a chemical solution in which the catalyst 10 has been immersed three times.
 第2洗浄槽22は、触媒10のセル11の中に付着した灰を除去するための第2薬液32を貯留する。第2洗浄槽22の例としてはアクリル、SUS製等の容器が挙げられ、ライニング処理したものも含まれる。第2薬液32は、無機酸とフッ素化合物とを含むフッ素系洗浄剤である。無機酸の例としては、塩酸、塩酸及びホウ酸、又はスルファミン酸が挙げられる。ここに界面活性剤が含まれていても良い。界面活性剤は、ノニオン系界面活性剤またはアニオン系界面活性剤であることがより好ましい。この界面活性剤により、洗浄液中に溶解しているカルシウムや、ダスト中のカルシウムを高分散させることができ、触媒への再付着抑制効果がある。第2洗浄槽22には触媒10の体積の凡そ3倍の第2薬液32が貯留される。
 第2洗浄槽22は、支持装置40が走行するレール41の直下にセットされる。
 第2薬液32の繰り返し使用回数は、第1薬液31の繰り返し使用回数より少ない。例えば、第2薬液32は未使用の薬液である。
The second washing tank 22 stores the second chemical solution 32 for removing the ash adhering to the cell 11 of the catalyst 10. Examples of the second washing tank 22 include containers made of acrylic, SUS, etc., and lining-treated ones are also included. The second chemical solution 32 is a fluorine-based cleaning agent containing an inorganic acid and a fluorine compound. Examples of inorganic acids include hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid. A surfactant may be contained here. The surfactant is more preferably a nonionic surfactant or an anionic surfactant. With this surfactant, calcium dissolved in the cleaning liquid and calcium in the dust can be highly dispersed, and there is an effect of suppressing reattachment to the catalyst. The second chemical solution 32, which is approximately three times the volume of the catalyst 10, is stored in the second washing tank 22.
The second cleaning tank 22 is set directly below the rail 41 on which the support device 40 travels.
The number of times the second chemical solution 32 is repeatedly used is less than the number of times the first chemical solution 31 is repeatedly used. For example, the second chemical solution 32 is an unused chemical solution.
 第3洗浄槽23は第1仕上げ洗浄液33を貯留する。第3洗浄槽23の例としては、アクリル、SUS製等の容器が挙げられ、ライニング処理したものも含まれる。第1仕上げ洗浄液33は水又はスルファミン酸含有水である。第3洗浄槽23には触媒10の体積の凡そ3倍の第1仕上げ洗浄液33が貯留される。
 第3洗浄槽23は、支持装置40が走行するレール41の直下にセットされる。
 第1仕上げ洗浄液33は繰り返し使用済みの仕上げ洗浄液である。すなわち、第1仕上げ洗浄液33は触媒10が浸漬されたことの有る薬液である。例えば、第1仕上げ洗浄液33は触媒10が3回浸漬されたことの有る薬液である。
The third cleaning tank 23 stores the first finishing cleaning liquid 33. Examples of the third washing tank 23 include containers made of acrylic, SUS, etc., and those treated with lining are also included. The first finishing cleaning liquid 33 is water or sulfamic acid-containing water. The first finishing cleaning liquid 33, which is approximately three times the volume of the catalyst 10, is stored in the third cleaning tank 23.
The third cleaning tank 23 is set directly below the rail 41 on which the support device 40 travels.
The first finish cleaning liquid 33 is a finish cleaning liquid that has been used repeatedly. That is, the first finishing cleaning liquid 33 is a chemical liquid in which the catalyst 10 has been immersed. For example, the first finishing cleaning liquid 33 is a chemical liquid in which the catalyst 10 has been immersed three times.
 第4洗浄槽24は第2仕上げ洗浄液34を貯留する。第4洗浄槽24の例としては、アクリル、SUS製等の容器が挙げられ、ライニング処理したものも含まれる。第2仕上げ洗浄液34は水又はスルファミン酸含有水である。第4洗浄槽24には触媒10の体積の凡そ3倍の第2仕上げ洗浄液34が貯留される。
 第4洗浄槽24は、支持装置40が走行するレール41の直下にセットされる。
 第2仕上げ洗浄液34の繰り返し使用回数は、第1仕上げ洗浄液33の繰り返し使用回数より少ない。例えば、第2仕上げ洗浄液34は未使用の薬液である。
The fourth cleaning tank 24 stores the second finishing cleaning liquid 34. Examples of the fourth washing tank 24 include containers made of acrylic, SUS, etc., and lining-treated ones are also included. The second finishing cleaning liquid 34 is water or sulfamic acid-containing water. The second finishing cleaning liquid 34, which is approximately three times the volume of the catalyst 10, is stored in the fourth cleaning tank 24.
The fourth cleaning tank 24 is set directly below the rail 41 on which the support device 40 travels.
The number of times the second finish cleaning liquid 34 is repeatedly used is less than the number of times the first finish cleaning liquid 33 is repeatedly used. For example, the second finishing cleaning solution 34 is an unused chemical solution.
 支持装置40は、触媒10を支持しながら、触媒10を上下方向および左右方向に移動させる装置である。支持装置40の例としては、施設の天井に設置されたレール41に取り付けられ、ワイヤロープの巻き上げおよび巻き下げ、ならびにレール41に沿った移動が可能なホイストが挙げられる。
 支持装置40は、触媒10の開口面と第1薬液31の液面とが対向するように支持し、触媒10の開口面と第2薬液32の液面とが対向するように支持する。また、支持装置40は、触媒10の開口面と第1仕上げ洗浄液33の液面とが対向するように支持し、触媒10の開口面と第2仕上げ洗浄液34の液面とが対向するように支持する。
The support device 40 is a device that moves the catalyst 10 in the vertical direction and the horizontal direction while supporting the catalyst 10. Examples of the support device 40 include a hoist that is attached to a rail 41 installed on the ceiling of the facility and is capable of winding and unwinding a wire rope and moving along the rail 41.
The support device 40 supports the open surface of the catalyst 10 and the liquid level of the first chemical solution 31 so as to face each other, and supports the open surface of the catalyst 10 and the liquid level of the second chemical solution 32 so as to face each other. Further, the support device 40 supports the opening surface of the catalyst 10 and the liquid level of the first finishing cleaning liquid 33 so as to face each other, and the opening surface of the catalyst 10 and the liquid level of the second finishing cleaning liquid 34 face each other. To support.
 液切り台60は、触媒10に付着した第2仕上げ洗浄液34を除去するために触媒10を載置する台である。液切り台60は、上記に加え、触媒10に付着した水と、第1薬液31と、第2薬液32と、第1仕上げ洗浄液33を除去するためのものであっても良い。
 液切り台60は、例えば、支持装置40が走行するレール41の直下にセットされる。
The liquid draining table 60 is a table on which the catalyst 10 is placed in order to remove the second finishing cleaning liquid 34 adhering to the catalyst 10. In addition to the above, the drainage table 60 may be used for removing the water adhering to the catalyst 10, the first chemical solution 31, the second chemical solution 32, and the first finishing cleaning liquid 33.
The liquid drain stand 60 is set, for example, directly below the rail 41 on which the support device 40 travels.
 熱風送風機70は、触媒10を乾燥させるために熱風を発生させる。例えば、熱風送風機70は、液切り台60に存在する触媒10に向けて熱風を発生させて、触媒10を乾燥させる。
 熱風送風機70は、例えば、支持装置40が走行するレール41の直下にセットされる。
The hot air blower 70 generates hot air to dry the catalyst 10. For example, the hot air blower 70 generates hot air toward the catalyst 10 existing in the liquid drain table 60 to dry the catalyst 10.
The hot air blower 70 is set, for example, directly under the rail 41 on which the support device 40 travels.
 制御装置50は、触媒の再生装置100のユーザから入力を受け入れて、触媒10を第1薬液31と、第2薬液32と、第1仕上げ洗浄液33及び第2仕上げ洗浄液34に浸漬させて、触媒10を洗浄するように触媒の再生装置100を制御する装置である。 The control device 50 receives an input from the user of the catalyst regeneration device 100, immerses the catalyst 10 in the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34, and immerses the catalyst 10 in the catalyst. It is a device that controls the catalyst regeneration device 100 so as to wash the 10.
(制御装置の構成)
 図3は、制御装置50の構成を示す概略ブロック図である。
 制御装置50は、制御部110と、入力受入部120を備える。
(Control device configuration)
FIG. 3 is a schematic block diagram showing the configuration of the control device 50.
The control device 50 includes a control unit 110 and an input receiving unit 120.
 制御部110は、入力受入部120から信号を受け入れて、触媒10が第1薬液31に浸漬されるように支持装置40を制御する。また、制御部110は、入力受入部120から信号を受け入れて、触媒10が第2薬液32に浸漬されるように支持装置40を制御する。また、制御部110は、入力受入部120から信号を受け入れて、触媒10が第1仕上げ洗浄液33に浸漬されるように支持装置40を制御する。また、制御部110は、入力受入部120から信号を受け入れて、触媒10が第2仕上げ洗浄液34に浸漬されるように支持装置40を制御する。また、制御部110は、触媒10を液切り台60と、熱風送風機70へ移動させるように制御する。 The control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the first chemical solution 31. Further, the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the second chemical solution 32. Further, the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the first finishing cleaning liquid 33. Further, the control unit 110 receives a signal from the input receiving unit 120 and controls the support device 40 so that the catalyst 10 is immersed in the second finishing cleaning liquid 34. Further, the control unit 110 controls to move the catalyst 10 to the liquid drain stand 60 and the hot air blower 70.
 入力受入部120は、触媒の再生装置100のユーザから、入力を受け入れて制御部110に、当該入力を示す信号を出力する。入力受入部120の例としては、タッチパネルや操作レバーが挙げられる。 The input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 and outputs a signal indicating the input to the control unit 110. Examples of the input receiving unit 120 include a touch panel and an operation lever.
 例えば、入力受入部120がタッチパネルである場合、入力受入部120は、レール41におけるホイストの位置の入力やワイヤロープの巻き上げおよび巻き下げの入力をディスプレイ装置上の入力を受け入れる。例えば、入力受入部120が操作レバーである場合、入力受入部120は、レール41におけるホイストの位置を入力できるホイスト操作レバーと、ワイヤロープの巻き上げおよび巻き下げを入力できるワイヤロープ操作レバーを備える。 For example, when the input receiving unit 120 is a touch panel, the input receiving unit 120 accepts the input of the position of the hoist on the rail 41 and the input of the winding and unwinding of the wire rope on the display device. For example, when the input receiving unit 120 is an operating lever, the input receiving unit 120 includes a hoist operating lever capable of inputting the position of the hoist on the rail 41 and a wire rope operating lever capable of inputting winding and unwinding of the wire rope.
(触媒の再生装置の使用態様の一例)
 図4は、触媒の再生装置100の使用態様の一例を示すフローチャートである。
(Example of usage of catalyst regeneration device)
FIG. 4 is a flowchart showing an example of the usage mode of the catalyst regeneration device 100.
 触媒の再生装置100のユーザは触媒10を水洗いする(ステップS1)。例えば、ユーザは、触媒10を粗水洗し、真空引き水洗し、ジェット水洗することにより、触媒10を水洗いする。 The user of the catalyst regeneration device 100 washes the catalyst 10 with water (step S1). For example, the user wash the catalyst 10 with water by roughly washing the catalyst 10 with water, evacuating with water, and washing with jet water.
 触媒の再生装置100のユーザは、支持装置40が触媒10を支持するように触媒10を支持装置40に固定する(ステップS2)。触媒の再生装置100のユーザは、例えば、ナイロンスリングを用いて支持装置40のワイヤロープと触媒10とを固定する。触媒10の固定は、支持装置40が触媒10を支持した場合、第1洗浄槽21に第1薬液31が注入された場合の第1薬液31の液面と触媒10の開口面とが対向するように行われる。 The user of the catalyst regeneration device 100 fixes the catalyst 10 to the support device 40 so that the support device 40 supports the catalyst 10 (step S2). The user of the catalyst regeneration device 100 uses, for example, a nylon sling to fix the wire rope of the support device 40 to the catalyst 10. When the support device 40 supports the catalyst 10, the catalyst 10 is fixed so that the liquid level of the first chemical solution 31 and the opening surface of the catalyst 10 face each other when the first chemical solution 31 is injected into the first washing tank 21. It is done like this.
 触媒の再生装置100のユーザは第1洗浄槽21に第1薬液31を注入し、第2洗浄槽22に第2薬液32を注入する。また、触媒の再生装置100のユーザは第3洗浄槽23に第1仕上げ洗浄液33を注入し、第4洗浄槽24に第2仕上げ洗浄液34を注入する。(ステップS3)。
 触媒の再生装置100のユーザは、ステップS1の前に予めステップS3の動作を行っても良い。
The user of the catalyst regeneration device 100 injects the first chemical solution 31 into the first cleaning tank 21 and injects the second chemical solution 32 into the second cleaning tank 22. Further, the user of the catalyst regeneration device 100 injects the first finishing cleaning liquid 33 into the third cleaning tank 23, and injects the second finishing cleaning liquid 34 into the fourth cleaning tank 24. (Step S3).
The user of the catalyst regeneration device 100 may perform the operation of step S3 in advance before step S1.
 ここで、第1薬液31及び第2薬液32の触媒10が浸漬されたことの有る回数は、例えば触媒10が第1薬液31及び第2薬液32に浸漬された後に、触媒10の表面の付着物(灰など)の除去率が95%以上となるような回数である。
 第1薬液31及び第2薬液32に触媒10が浸漬される度に、触媒10の表面の付着物の除去率は下がる。触媒の再生装置100のユーザは、第1薬液31及び第2薬液32の触媒10が浸漬されたことのある回数ごとに、第1薬液31及び第2薬液32に触媒10を浸漬させた場合の、触媒10の表面の付着物の除去率を予め調べておく。
Here, the number of times that the catalyst 10 of the first chemical solution 31 and the second chemical solution 32 has been immersed is, for example, the number of times the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32, and then the surface of the catalyst 10 is attached. The number of times the removal rate of kimono (ash, etc.) is 95% or more.
Each time the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32, the removal rate of deposits on the surface of the catalyst 10 decreases. When the user of the catalyst regeneration device 100 immerses the catalyst 10 in the first chemical solution 31 and the second chemical solution 32 every time the catalyst 10 of the first chemical solution 31 and the second chemical solution 32 has been immersed. , The removal rate of deposits on the surface of the catalyst 10 is investigated in advance.
 例えば、第1薬液31の触媒10が浸漬されたことの有る回数が、1回、2回、3回の何れかである場合、第1薬液31の、触媒10の表面の付着物の除去率は95%以上である。すなわち、第1薬液31の触媒10が浸漬されたことの有る回数が、1回、2回、3回の何れかである場合、ユーザは、第2薬液32を第2洗浄槽22に注入しない。他方、第1薬液31の触媒10が浸漬されたことの有る回数が、4回又は5回である場合、第1薬液31の、触媒10の表面の付着物の除去率は95%以上ではない。すなわち、第1薬液31の触媒10が浸漬されたことの有る回数が4回以上である場合、ユーザは、第2薬液32を第2洗浄槽22に注入する。ここで注入する第2薬液32は、触媒10が第1薬液31及び第2薬液32に浸漬された後に、触媒10の表面の付着物の除去率が95%以上となるような薬液である。例えば、第2薬液32は、触媒10が1回浸漬されたことの有る薬液である。また、触媒10が浸漬されたことの有る回数が、6回以上である第1薬液31又は第2薬液32は、触媒10が第1薬液31及び第2薬液32に浸漬された後に、触媒10の表面の付着物の除去率が95%以上とならない。そのため、触媒10が浸漬されたことの有る回数が6回以上の第1薬液31又は第2薬液32は使用しない。
 上記の説明における、第1薬液31及び第2薬液32の触媒10が浸漬されたことのある回数は一例である。上記の回数は、灰による触媒10の開口面の目詰まり具合や第1薬液31及び第2薬液32の濃度や成分などにより変わり得る。
For example, when the catalyst 10 of the first chemical solution 31 has been immersed once, twice, or three times, the removal rate of the deposits on the surface of the catalyst 10 of the first chemical solution 31. Is over 95%. That is, when the catalyst 10 of the first chemical solution 31 has been immersed in the catalyst 10 once, twice, or three times, the user does not inject the second chemical solution 32 into the second washing tank 22. .. On the other hand, when the catalyst 10 of the first chemical solution 31 has been immersed four or five times, the removal rate of the deposits on the surface of the catalyst 10 of the first chemical solution 31 is not 95% or more. .. That is, when the catalyst 10 of the first chemical solution 31 has been immersed four times or more, the user injects the second chemical solution 32 into the second washing tank 22. The second chemical solution 32 to be injected here is a chemical solution such that the removal rate of deposits on the surface of the catalyst 10 becomes 95% or more after the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32. For example, the second chemical solution 32 is a chemical solution in which the catalyst 10 has been immersed once. Further, in the first chemical solution 31 or the second chemical solution 32 in which the catalyst 10 has been immersed 6 times or more, the catalyst 10 is immersed in the first chemical solution 31 and the second chemical solution 32 after the catalyst 10 is immersed. The removal rate of deposits on the surface of the surface does not exceed 95%. Therefore, the first chemical solution 31 or the second chemical solution 32 in which the catalyst 10 has been immersed 6 times or more is not used.
In the above description, the number of times that the catalyst 10 of the first chemical solution 31 and the second chemical solution 32 has been immersed is an example. The above number of times may vary depending on the degree of clogging of the opening surface of the catalyst 10 by ash, the concentration and components of the first chemical solution 31 and the second chemical solution 32, and the like.
 また、第1仕上げ洗浄液33及び第2仕上げ洗浄液34の触媒10が浸漬されたことの有る回数は、触媒10が第1仕上げ洗浄液33及び第2仕上げ洗浄液34に浸漬された後に、触媒10に付いた第1薬液31又は第2薬液32の除去率が95%以上となるような回数である。
 第1仕上げ洗浄液33及び第2仕上げ洗浄液34に触媒10が浸漬される度に、触媒10に付いた第1薬液31又は第2薬液32の除去率は下がる。触媒の再生装置100のユーザは、第1仕上げ洗浄液33及び第2仕上げ洗浄液34の触媒10が浸漬されたことのある回数ごとに、第1仕上げ洗浄液33及び第2仕上げ洗浄液34に触媒10を浸漬させた場合の、触媒10に付いた第1薬液31又は第2薬液32の除去率を予め調べておく。
Further, the number of times that the catalyst 10 of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 has been immersed is attached to the catalyst 10 after the catalyst 10 is immersed in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34. The number of times the removal rate of the first chemical solution 31 or the second chemical solution 32 is 95% or more.
Every time the catalyst 10 is immersed in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34, the removal rate of the first chemical liquid 31 or the second chemical liquid 32 attached to the catalyst 10 decreases. The user of the catalyst regeneration device 100 immerses the catalyst 10 in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 every time the catalyst 10 of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 has been immersed. The removal rate of the first chemical solution 31 or the second chemical solution 32 attached to the catalyst 10 when the catalyst 10 is allowed to be removed is checked in advance.
 例えば、第1仕上げ洗浄液33の触媒10が浸漬されたことの有る回数が、1回、2回、3回の何れかである場合、第1仕上げ洗浄液33の、触媒10について第1薬液31又は第2薬液32の除去率は95%以上である。すなわち、第1仕上げ洗浄液33の触媒10が浸漬されたことの有る回数が、1回、2回、3回の何れかである場合、ユーザは、第2仕上げ洗浄液34を第4洗浄槽24に注入しない。他方、第1仕上げ洗浄液33の触媒10が浸漬されたことの有る回数が、4回又は5回である場合、第1仕上げ洗浄液33の、触媒10に付いた第1薬液31又は第2薬液32の除去率は95%以上ではない。すなわち、第1仕上げ洗浄液33の触媒10が浸漬されたことの有る回数が4回以上である場合、ユーザは、第2仕上げ洗浄液34を第4洗浄槽24に注入する。ここで注入する第2仕上げ洗浄液34は、触媒10が第1仕上げ洗浄液33及び第2仕上げ洗浄液34に浸漬された後に、触媒10に付いた第1薬液31又は第2薬液32の除去率が95%以上となるような仕上げ洗浄液である。例えば、第2仕上げ洗浄液34は、触媒10が1回浸漬されたことの有る仕上げ洗浄液である。また、触媒10が浸漬されたことの有る回数が、6回以上である第1仕上げ洗浄液33又は第2仕上げ洗浄液34は、触媒10が第1仕上げ洗浄液33及び第2仕上げ洗浄液34に浸漬された後に、触媒10に付いて第1薬液31又は第2薬液32の除去率が95%以上とならない。そのため、触媒10が浸漬されたことの有る回数が6回以上の第1仕上げ洗浄液33又は第2仕上げ洗浄液34は使用しない。
 上記の説明における、第1仕上げ洗浄液33及び第2仕上げ洗浄液34の触媒10が浸漬されたことのある回数は一例である。上記の回数は、灰による触媒10の開口面の目詰まり具合や第1仕上げ洗浄液33及び第2仕上げ洗浄液34の濃度や成分などにより変わり得る。
For example, when the catalyst 10 of the first finishing cleaning liquid 33 has been immersed once, twice, or three times, the first chemical solution 31 or the catalyst 10 of the first finishing cleaning liquid 33 has been immersed. The removal rate of the second chemical solution 32 is 95% or more. That is, when the catalyst 10 of the first finishing cleaning liquid 33 has been immersed in the catalyst 10 once, twice, or three times, the user puts the second finishing cleaning liquid 34 in the fourth cleaning tank 24. Do not inject. On the other hand, when the catalyst 10 of the first finishing cleaning liquid 33 has been immersed 4 times or 5 times, the first chemical liquid 31 or the second chemical liquid 32 attached to the catalyst 10 of the first finishing cleaning liquid 33 The removal rate of is not more than 95%. That is, when the catalyst 10 of the first finishing cleaning liquid 33 has been immersed four times or more, the user injects the second finishing cleaning liquid 34 into the fourth cleaning tank 24. The second finishing cleaning liquid 34 injected here has a removal rate of 95 for the first chemical liquid 31 or the second chemical liquid 32 attached to the catalyst 10 after the catalyst 10 is immersed in the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34. It is a finish cleaning liquid that becomes% or more. For example, the second finishing cleaning liquid 34 is a finishing cleaning liquid in which the catalyst 10 has been immersed once. Further, in the first finish cleaning liquid 33 or the second finish cleaning liquid 34 in which the catalyst 10 has been immersed 6 times or more, the catalyst 10 is immersed in the first finish cleaning liquid 33 and the second finish cleaning liquid 34. Later, with respect to the catalyst 10, the removal rate of the first chemical solution 31 or the second chemical solution 32 does not become 95% or more. Therefore, the first finishing cleaning liquid 33 or the second finishing cleaning liquid 34 in which the catalyst 10 has been immersed 6 times or more is not used.
In the above description, the number of times that the catalyst 10 of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34 has been immersed is an example. The above number of times may vary depending on the degree of clogging of the opening surface of the catalyst 10 by ash, the concentration and components of the first finishing cleaning liquid 33 and the second finishing cleaning liquid 34, and the like.
 触媒の再生装置100のユーザは制御装置50を用いて、触媒10を第1薬液31に浸漬させる(ステップS4)。
 例えば、触媒の再生装置100のユーザは以下のような動作により、触媒10を第1薬液31に浸漬させる。
The user of the catalyst regeneration device 100 uses the control device 50 to immerse the catalyst 10 in the first chemical solution 31 (step S4).
For example, the user of the catalyst regeneration device 100 immerses the catalyst 10 in the first chemical solution 31 by the following operations.
 触媒の再生装置100のユーザは、入力受入部120に、支持装置40がワイヤロープを巻き上げた後、支持装置40のホイストを第1洗浄槽21の上に移動させる旨の入力をする。つまり、入力受入部120は、触媒の再生装置100が触媒10を持ち上げて、第1洗浄槽21の上に移動させる旨の入力を触媒の再生装置100のユーザから受け入れる。また、触媒の再生装置100のユーザは、入力受入部120である操作レバーを用いて、ワイヤロープの巻き上げる旨の入力と、ホイストを第1洗浄槽21の上に移動させる旨の入力をする。制御装置50の制御部110は、入力受入部120が出力した信号を受け入れて、支持装置40が触媒10を持ち上げて、第1洗浄槽21の上に移動させるように制御する。制御部110は、入力受入部120が出力した信号を受け入れて、ワイヤロープを最大高さまで巻き上げて、触媒10を持ち上げるように制御する。当該持ち上げの後、制御部110は、制御装置50が記憶している第1洗浄槽21の上に相当するレール41の位置まで、ホイストが移動するように制御する。
 触媒の再生装置100のユーザは、入力受入部120に、第1洗浄槽21に向けてワイヤロープを巻き下げる旨の入力をする。つまり、入力受入部120は、触媒の再生装置100のユーザから、触媒10を、第1洗浄槽21に下ろす旨の入力を受け入れる。制御部110は、入力受入部120が出力した信号を受け入れて、支持装置40がワイヤロープを第1洗浄槽21に下ろして、ワイヤロープに固定されている触媒10が第1洗浄槽21の第1薬液31に浸漬させるように制御する。
The user of the catalyst regeneration device 100 inputs to the input receiving unit 120 that the hoist of the support device 40 is moved onto the first washing tank 21 after the support device 40 winds up the wire rope. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 that the catalyst regeneration device 100 lifts the catalyst 10 and moves it onto the first cleaning tank 21. Further, the user of the catalyst regeneration device 100 uses the operation lever, which is the input receiving unit 120, to input that the wire rope is wound up and that the hoist is moved onto the first cleaning tank 21. The control unit 110 of the control device 50 receives the signal output by the input receiving unit 120, and controls the support device 40 to lift the catalyst 10 and move it onto the first cleaning tank 21. The control unit 110 receives the signal output by the input receiving unit 120, winds the wire rope to the maximum height, and controls to lift the catalyst 10. After the lifting, the control unit 110 controls the hoist to move to the position of the rail 41 corresponding to the position on the first cleaning tank 21 stored in the control device 50.
The user of the catalyst regeneration device 100 inputs to the input receiving unit 120 to wind the wire rope toward the first washing tank 21. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 to the effect that the catalyst 10 is dropped into the first cleaning tank 21. The control unit 110 receives the signal output by the input receiving unit 120, the support device 40 lowers the wire rope to the first cleaning tank 21, and the catalyst 10 fixed to the wire rope is the first cleaning tank 21. 1 Control so as to be immersed in the chemical solution 31.
 触媒の再生装置100のユーザは制御装置50を用いて、触媒10を第1薬液31から取り出して第2薬液32に浸漬させる(ステップS5)。
 例えば、触媒の再生装置100のユーザは以下のような動作により、触媒10を第1薬液31から取り出して第2薬液32に浸漬させる。
The user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the first chemical solution 31 and immerse it in the second chemical solution 32 (step S5).
For example, the user of the catalyst regeneration device 100 takes out the catalyst 10 from the first chemical solution 31 and immerses it in the second chemical solution 32 by the following operation.
 触媒の再生装置100のユーザは、入力受入部120に、ワイヤロープを巻き上げる旨の入力をする。つまり、入力受入部120は、触媒の再生装置100のユーザから、触媒の再生装置100が触媒10を持ち上げる旨の入力を受け入れる。制御部110は、入力受入部120が出力した信号を受け入れて、支持装置40が、ワイヤロープを最大高さまで巻き上げるように制御する。つまり、支持装置40は、触媒10を持ち上げて、第1洗浄槽21の上に移動させる。触媒の再生装置100のユーザは、入力受入部120に、支持装置40のホイストを第2洗浄槽22に相当するレール41の位置に移動させる旨の入力をする。つまり、入力受入部120は、支持装置40が触媒10を第2洗浄槽22の上に移動させる旨の入力を触媒の再生装置100のユーザから受け入れる。制御部110は、入力受入部120が出力した信号を受け入れて、支持装置40がホイストを第2洗浄槽22に相当するレール41の位置に移動させるように制御する。この場合、第2洗浄槽22に相当するレール41の位置は予め制御装置50が記憶している。制御部110の制御により、支持装置40は触媒10を第2洗浄槽22の上に移動させる。触媒の再生装置100のユーザは、第2洗浄槽22に向けてワイヤロープを巻き下げる旨の入力を入力受入部120にする。つまり、入力受入部120は、触媒10を第2洗浄槽22に下ろす旨の入力を触媒の再生装置100のユーザから受け入れる。制御部110は、入力受入部120が出力した信号を受け入れて、支持装置40がワイヤロープを第2洗浄槽22に下ろして、ワイヤロープに固定されている触媒10が第2洗浄槽22の第2薬液32に浸漬させるように制御する。 The user of the catalyst regeneration device 100 inputs to the input receiving unit 120 to wind up the wire rope. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 to the effect that the catalyst regeneration device 100 lifts the catalyst 10. The control unit 110 receives the signal output by the input receiving unit 120, and the support device 40 controls the wire rope to be wound up to the maximum height. That is, the support device 40 lifts the catalyst 10 and moves it onto the first cleaning tank 21. The user of the catalyst regeneration device 100 inputs to the input receiving unit 120 to move the hoist of the support device 40 to the position of the rail 41 corresponding to the second cleaning tank 22. That is, the input receiving unit 120 receives an input from the user of the catalyst regeneration device 100 that the support device 40 moves the catalyst 10 onto the second cleaning tank 22. The control unit 110 receives the signal output by the input receiving unit 120 and controls the support device 40 to move the hoist to the position of the rail 41 corresponding to the second cleaning tank 22. In this case, the control device 50 stores the position of the rail 41 corresponding to the second cleaning tank 22 in advance. Under the control of the control unit 110, the support device 40 moves the catalyst 10 onto the second cleaning tank 22. The user of the catalyst regeneration device 100 makes an input to the input receiving unit 120 to wind the wire rope toward the second washing tank 22. That is, the input receiving unit 120 receives an input to lower the catalyst 10 into the second cleaning tank 22 from the user of the catalyst regeneration device 100. The control unit 110 receives the signal output by the input receiving unit 120, the support device 40 lowers the wire rope to the second cleaning tank 22, and the catalyst 10 fixed to the wire rope is the second cleaning tank 22. 2 Control so as to immerse in the chemical solution 32.
 触媒10が浸漬されたことの有る第1薬液31における触媒10の表面の付着物の除去率は、触媒10が浸漬されたことの無い第1薬液31における触媒10の表面の付着物の除去率より低い。しかし、除去率が低くても、触媒10が浸漬されたことの有る回数が5回以下の第1薬液31は一定の付着物を除去できる。
 ステップS4において第1薬液31に触媒10を浸漬させた後に、ステップS5において触媒10を第2薬液32に浸漬させることにより、第2薬液32は、第1薬液31を使用しない場合に比べて、より少ない付着物を除去することになる。すなわち、第1薬液31を使用することにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生装置100のユーザは第1薬液31を使用しない場合に比べ、第2薬液32をより少ない回数で取り換えながら使用することができ、より少ない薬液を使用しても、触媒10の表面の付着物を除去することができる。
The removal rate of the deposits on the surface of the catalyst 10 in the first chemical solution 31 in which the catalyst 10 has been immersed is the removal rate of the deposits on the surface of the catalyst 10 in the first chemical solution 31 in which the catalyst 10 has not been immersed. Lower. However, even if the removal rate is low, the first chemical solution 31 having the catalyst 10 immersed 5 times or less can remove certain deposits.
By immersing the catalyst 10 in the first chemical solution 31 in step S4 and then immersing the catalyst 10 in the second chemical solution 32 in step S5, the second chemical solution 32 is compared with the case where the first chemical solution 31 is not used. It will remove less deposits. That is, by using the first chemical solution 31, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration device 100 can use the second chemical solution 32 while replacing it with a smaller number of times as compared with the case where the first chemical solution 31 is not used, and even if a smaller chemical solution is used, the catalyst 10 can be used. The deposits on the surface can be removed.
 触媒の再生装置100のユーザは制御装置50を用いて、触媒10を第2薬液32から取り出して第1仕上げ洗浄液33に浸漬させる(ステップS6)。
 この場合、ユーザは触媒10を第2薬液32から取り出してから一定時間放置した後に、第1仕上げ洗浄液33に浸漬させることにより、触媒10に付いた第1薬液31と、第2薬液32の液を切ってから第1仕上げ洗浄液33に浸漬させても良い。
 ユーザが制御装置50を用いて触媒10を第2薬液32から取り出して第1仕上げ洗浄液33に浸漬させる具体的な動作は、ステップS5と同様である。
The user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the second chemical solution 32 and immerse it in the first finishing cleaning solution 33 (step S6).
In this case, the user takes out the catalyst 10 from the second chemical solution 32, leaves it for a certain period of time, and then immerses it in the first finishing cleaning solution 33, so that the first chemical solution 31 and the second chemical solution 32 attached to the catalyst 10 are immersed. May be immersed in the first finishing cleaning liquid 33 after cutting.
The specific operation in which the user takes out the catalyst 10 from the second chemical solution 32 using the control device 50 and immerses the catalyst 10 in the first finishing cleaning liquid 33 is the same as in step S5.
 触媒の再生装置100のユーザは、制御装置50を用いて、触媒10を第1仕上げ洗浄液33から取り出して第2仕上げ洗浄液34に浸漬させる(ステップS7)。
 ユーザが制御装置50を用いて触媒10を第1仕上げ洗浄液33から取り出して第2仕上げ洗浄液34に浸漬させる具体的な動作は、ステップS5と同様である。
The user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the first finishing cleaning liquid 33 and immerse it in the second finishing cleaning liquid 34 (step S7).
The specific operation in which the user takes out the catalyst 10 from the first finishing cleaning liquid 33 using the control device 50 and immerses the catalyst 10 in the second finishing cleaning liquid 34 is the same as in step S5.
 触媒の再生装置100のユーザは制御装置50を用いて、触媒10を第2仕上げ洗浄液34から取り出して液切り台60の上に移動させる(ステップS8)。
 ユーザが制御装置50を用いて触媒10を第2仕上げ洗浄液34から取り出して液切り台60の上に移動させる具体的な動作は、ステップS5と同様である。
The user of the catalyst regeneration device 100 uses the control device 50 to take out the catalyst 10 from the second finishing cleaning liquid 34 and move it onto the drainage table 60 (step S8).
The specific operation in which the user takes out the catalyst 10 from the second finishing cleaning liquid 34 using the control device 50 and moves it onto the liquid drain table 60 is the same as in step S5.
 触媒の再生装置100のユーザは、液切り台60に移動させられた触媒10を、放置する(ステップS9)。これにより、触媒10に付いている第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34の液が切られる。 The user of the catalyst regeneration device 100 leaves the catalyst 10 moved to the drainage table 60 (step S9). As a result, the liquids of the first chemical liquid 31, the second chemical liquid 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 attached to the catalyst 10 are cut off.
 触媒の再生装置100のユーザは、熱風送風機70を用いて、触媒10に熱風を送風して、触媒10を乾燥させる(ステップS10)。これにより、触媒10に付いている第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34の液が切られる。 The user of the catalyst regeneration device 100 uses the hot air blower 70 to blow hot air to the catalyst 10 to dry the catalyst 10 (step S10). As a result, the liquids of the first chemical liquid 31, the second chemical liquid 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 attached to the catalyst 10 are cut off.
(作用・効果)
 本開示に係る触媒の再生方法は、触媒10を水洗いすることと、水洗いした触媒10を、繰り返し使用済みの第1薬液31に濡らすことと、第1薬液31に濡らした触媒10を、第2薬液32に濡らすことと、触媒10を、水又はスルファミン酸含有水である仕上げ洗浄液で洗うことと、を含み、第1薬液31及び第2薬液32は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含む。
(Action / effect)
The method for regenerating the catalyst according to the present disclosure is to wash the catalyst 10 with water, to wet the washed catalyst 10 with the repeatedly used first chemical solution 31, and to wet the catalyst 10 with the first chemical solution 31 to the second. It comprises wetting the chemical solution 32 and washing the catalyst 10 with water or a finishing cleaning solution which is sulfamic acid-containing water, and the first chemical solution 31 and the second chemical solution 32 contain at least an inorganic acid and a fluorine compound. Inorganic acids include hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
 触媒の再生方法を用いると、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を濡らして付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回濡らした場合に比べ、薬液をより少ない回数で取り換えながら使用することができ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is wetted with the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can use the catalyst 10 while replacing it with a smaller number of times as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution, and the catalyst 10 can be used by using a smaller amount of the chemical solution. The deposits on the surface of the surface can be removed.
 また、触媒の再生方法の触媒10は、脱硝触媒である。
 これにより、触媒の再生方法のユーザは、脱硝触媒を所定の薬液に1回濡らした場合に比べ、より少ない量の薬液を使用して脱硝触媒の表面の付着物を除去することができる。
Further, the catalyst 10 of the catalyst regeneration method is a denitration catalyst.
Thereby, the user of the catalyst regeneration method can remove the deposits on the surface of the denitration catalyst by using a smaller amount of the chemical solution as compared with the case where the denitration catalyst is wetted once with a predetermined chemical solution.
 また、触媒の再生方法の第2薬液32の繰り返し使用回数は、第1薬液31の繰り返し使用回数より少ない。 Further, the number of times of repeated use of the second chemical solution 32 in the catalyst regeneration method is less than the number of times of repeated use of the first chemical solution 31.
 触媒の再生方法を用いると、繰り返し使用回数が多い第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、繰り返し使用回数が少ない第2薬液32に触媒10を濡らして付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回濡らす場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 which is frequently used repeatedly, the catalyst 10 is wetted with the second chemical solution 32 which is used less frequently. Remove the kimono. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
 また、触媒の再生方法の触媒10を仕上げ洗浄液で洗うことは、触媒10を、繰り返し使用済みの仕上げ洗浄液である第1仕上げ洗浄液33で洗うことと、第1仕上げ洗浄液33で洗った触媒10を、仕上げ洗浄液である第2仕上げ洗浄液34で洗うことと、を含む。 Further, to wash the catalyst 10 of the catalyst regeneration method with the finish cleaning liquid, the catalyst 10 is washed with the first finish cleaning liquid 33 which is a repeatedly used finish cleaning liquid, and the catalyst 10 washed with the first finish cleaning liquid 33 is used. The present invention includes washing with a second finishing cleaning liquid 34, which is a finishing cleaning liquid.
 触媒の再生方法を用いると、繰り返し使用済みの第1仕上げ洗浄液33を用いて触媒10に付いた付着物を除去した後に、第2仕上げ洗浄液34に触媒10を濡らして、触媒10に付いた付着物を除去する。これにより、触媒の再生方法のユーザは、第2仕上げ洗浄液34の使用できる回数を増やすことができる。そのため、触媒の再生方法のユーザは、触媒10を所定の仕上げ洗浄液に1回濡らす場合に比べ、より少ない量の仕上げ洗浄液を使用して触媒10に付いた付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits attached to the catalyst 10 by using the repeatedly used first finishing cleaning liquid 33, the catalyst 10 is wetted with the second finishing cleaning liquid 34, and the catalyst 10 is attached to the catalyst 10. Remove the kimono. Thereby, the user of the catalyst regeneration method can increase the number of times that the second finishing cleaning liquid 34 can be used. Therefore, the user of the catalyst regeneration method can remove the deposits attached to the catalyst 10 by using a smaller amount of the finish cleaning liquid than in the case where the catalyst 10 is wetted once with a predetermined finish cleaning liquid.
 また、触媒の再生方法の水洗いした触媒10を、第1薬液31に濡らすことは、水洗いした触媒10を第1薬液31に浸漬させることであり、第1薬液31に濡らした触媒10を、第2薬液32に濡らすことは、第1薬液31に浸漬させた触媒10を第2薬液32に浸漬させることである。 Further, wetting the water-washed catalyst 10 in the catalyst regeneration method with the first chemical solution 31 means immersing the water-washed catalyst 10 in the first chemical solution 31, and the catalyst 10 wetted with the first chemical solution 31 is the first. 2 Wetting with the chemical solution 32 means immersing the catalyst 10 immersed in the first chemical solution 31 in the second chemical solution 32.
 触媒の再生方法を用いると、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を浸漬させて付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回浸漬させる場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is immersed in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
 また、触媒の再生方法の第1薬液31は、1回以上の繰り返し使用済みの薬液である。
 触媒の再生方法を用いると、繰り返し使用回数が1回以上である第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を濡らして付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回濡らす場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。
Further, the first chemical solution 31 of the catalyst regeneration method is a chemical solution that has been used repeatedly one or more times.
When the catalyst regeneration method is used, the catalyst 10 is wetted with the second chemical solution 32 after removing the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been used repeatedly once or more. To remove. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
 本開示に係る触媒の再生装置100は、触媒10を支持しながら触媒10を上下左右方向に移動させる支持装置40と、支持装置40を制御する制御装置50と、を備え、制御装置50は、触媒10を下方に下ろして繰り返し使用済みの第1薬液31に浸漬させるように制御し、触媒10を下方に下ろして第2薬液32に浸漬させるように制御し、触媒10を下方に下ろして仕上げ洗浄液に浸漬させるように制御し、第1薬液31及び第2薬液32は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、仕上げ洗浄液は、水又はスルファミン酸含有水である。 The catalyst regeneration device 100 according to the present disclosure includes a support device 40 that moves the catalyst 10 in the vertical and horizontal directions while supporting the catalyst 10, and a control device 50 that controls the support device 40. The catalyst 10 is lowered and controlled to be repeatedly immersed in the used first chemical solution 31, the catalyst 10 is controlled to be lowered and immersed in the second chemical solution 32, and the catalyst 10 is lowered and finished. The first chemical solution 31 and the second chemical solution 32 contain at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution contains at least an inorganic acid and a fluorine compound. , Water or sulfamic acid-containing water.
 触媒の再生装置100は、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を浸漬させて付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生装置100は、触媒10を所定の薬液に1回浸漬させる場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 The catalyst regeneration device 100 removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the catalyst regeneration device 100 can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
 本開示に係るプログラムは、触媒10を支持しながら触媒10を上下左右方向に移動させる支持装置40の制御装置50に、触媒10を下方に下ろして繰り返し使用済みの第1薬液31に浸漬させることと、触媒10を下方に下ろして第2薬液32に浸漬させることと、触媒10を下方に下ろして仕上げ洗浄液に浸漬させることと、を実行させるプログラムであって、第1薬液31及び第2薬液32は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、仕上げ洗浄液は、水又はスルファミン酸含有水である。 In the program according to the present disclosure, the catalyst 10 is repeatedly immersed in the used first chemical solution 31 in the control device 50 of the support device 40 that moves the catalyst 10 in the vertical and horizontal directions while supporting the catalyst 10. This is a program for executing the process of lowering the catalyst 10 and immersing it in the second chemical solution 32 and lowering the catalyst 10 and immersing it in the finishing cleaning liquid, wherein the first chemical solution 31 and the second chemical solution are executed. Reference numeral 32 contains at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finishing cleaning solution is water or sulfamic acid-containing water.
 プログラムのユーザは、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を浸漬させて付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、プログラムのユーザは、触媒10を所定の薬液に1回浸漬させる場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 The user of the program removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the program can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
[第2の実施形態]
 以下、第2の実施形態に係る触媒の再生装置100について説明する。
[Second Embodiment]
Hereinafter, the catalyst regeneration device 100 according to the second embodiment will be described.
(触媒の再生装置の構成)
 図5は、第2の実施形態に係る触媒の再生装置100の構成を示す図である。
 第2の実施形態に係る触媒の再生装置100の構成は、第1の実施形態に係る触媒の再生装置100の構成から、第2洗浄槽22と、第3洗浄槽23と、第4洗浄槽24を備えない構成である。また、第2の実施形態に係る触媒の再生装置100は、第1の実施形態に係る触媒の再生装置100の構成に加えて、ノズル80と、第1タンク90と、第1ポンプ91と、第2タンク93と、第2ポンプ94を備える構成である。
(Composition of catalyst regeneration device)
FIG. 5 is a diagram showing the configuration of the catalyst regeneration device 100 according to the second embodiment.
The configuration of the catalyst regeneration device 100 according to the second embodiment is based on the configuration of the catalyst regeneration device 100 according to the first embodiment, that is, the second cleaning tank 22, the third cleaning tank 23, and the fourth cleaning tank. It is a configuration that does not include 24. Further, the catalyst regeneration device 100 according to the second embodiment includes a nozzle 80, a first tank 90, a first pump 91, and the like, in addition to the configuration of the catalyst regeneration device 100 according to the first embodiment. It is configured to include a second tank 93 and a second pump 94.
 第1タンク90の内部には、分離された4つの貯留空間が設けられ、それぞれの貯留空間に第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34が貯留されている。 Four separated storage spaces are provided inside the first tank 90, and the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 are provided in each storage space. It is stored.
 第1ポンプ91は、空気圧などを用いて第1タンク90に貯留された第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34をノズル80に供給する。 The first pump 91 supplies the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 stored in the first tank 90 to the nozzle 80 by using air pressure or the like.
 ノズル80は、A方向に移動しながら、ノズル80が第1洗浄槽21に対向する側に設けられる複数の噴射口(図示省略)で、第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34を、触媒10の開口面に対向して噴射する。
 噴射する第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34のそれぞれの量は、触媒10の体積の凡そ半分である。
 触媒の再生装置100は複数のノズル80を備えても良い。この場合、触媒の再生装置100は、触媒10が第1洗浄槽21に下ろされた後、複数のノズル80を触媒10の上方に移動させて、複数のノズル80を用いて触媒10の開口面に対向して噴射する。
The nozzle 80 is a plurality of injection ports (not shown) provided on the side where the nozzle 80 faces the first cleaning tank 21 while moving in the A direction, and the first chemical solution 31, the second chemical solution 32, and the first chemical solution 32 are provided. The finish cleaning liquid 33 and the second finish cleaning liquid 34 are sprayed so as to face the opening surface of the catalyst 10.
The amount of each of the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 to be sprayed is about half the volume of the catalyst 10.
The catalyst regeneration device 100 may include a plurality of nozzles 80. In this case, the catalyst regeneration device 100 moves the plurality of nozzles 80 above the catalyst 10 after the catalyst 10 is lowered into the first cleaning tank 21, and uses the plurality of nozzles 80 to move the opening surface of the catalyst 10. Inject against.
 第2ポンプ94は、空気圧などを用いて第1洗浄槽21の第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34を第2タンク93に移動させる。
 第2タンク93は、分離された4つの貯留空間が設けられそれぞれの貯留空間に、第2ポンプ94により注入された第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34を貯留する。
The second pump 94 moves the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 of the first cleaning tank 21 to the second tank 93 by using air pressure or the like.
The second tank 93 is provided with four separated storage spaces, and the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the first chemical solution 33 injected by the second pump 94 into each storage space are provided. 2 The finishing cleaning liquid 34 is stored.
 第2の実施形態に係る制御装置50は、触媒の再生装置100のユーザの入力を受けて、第1ポンプ91と、第2ポンプ94と、ノズル80が動作するように制御する。なお、制御装置は第1ポンプ91と第2ポンプ94と、ノズル80のそれぞれに取り付けられていても良い。 The control device 50 according to the second embodiment receives input from the user of the catalyst regeneration device 100 and controls the first pump 91, the second pump 94, and the nozzle 80 to operate. The control device may be attached to each of the first pump 91, the second pump 94, and the nozzle 80.
(触媒の再生装置の使用態様の一例)
 図6は、触媒の再生装置100の使用態様の一例を示すフローチャートである。
(Example of usage of catalyst regeneration device)
FIG. 6 is a flowchart showing an example of the usage mode of the catalyst regeneration device 100.
 第1の実施形態に係る触媒の再生装置100の使用態様のステップS1及びステップS2の動作を行う。
 触媒の再生装置100のユーザは第1タンク90に、第1薬液31と、第2薬液32と、第1仕上げ洗浄液33と、第2仕上げ洗浄液34を注入する(ステップS13)。
The operations of steps S1 and S2 of the usage mode of the catalyst regeneration device 100 according to the first embodiment are performed.
The user of the catalyst regeneration device 100 injects the first chemical solution 31, the second chemical solution 32, the first finishing cleaning liquid 33, and the second finishing cleaning liquid 34 into the first tank 90 (step S13).
 触媒の再生装置100のユーザは、制御装置50を用いて触媒10を第1洗浄槽21に移動させる(ステップS14)。
 触媒10を第1洗浄槽21に移動させる具体的な動作は、第1の実施形態に係る触媒の再生装置100の使用態様のステップS8と同様である。
The user of the catalyst regeneration device 100 moves the catalyst 10 to the first washing tank 21 by using the control device 50 (step S14).
The specific operation of moving the catalyst 10 to the first cleaning tank 21 is the same as step S8 of the usage mode of the catalyst regeneration device 100 according to the first embodiment.
 触媒の再生装置100のユーザは、制御装置50を用いて第1ポンプ91を動作させて第1薬液31が第1タンク90からノズル80に供給されるようにする。ノズル80は、A方向に移動しながら、触媒10の開口面に対向して第1薬液31を噴射させる(ステップS15)。ステップS15の動作の後、ノズル80はA方向の逆方向に移動してステップS15の前の位置に戻る。また、ステップS15の動作の後、制御装置50が第2ポンプ94を動作させて、第1洗浄槽21の第1薬液31を第2タンク93に移動させる。 The user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the first chemical solution 31 is supplied from the first tank 90 to the nozzle 80. The nozzle 80 ejects the first chemical solution 31 facing the opening surface of the catalyst 10 while moving in the A direction (step S15). After the operation of step S15, the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S15. Further, after the operation of step S15, the control device 50 operates the second pump 94 to move the first chemical solution 31 of the first cleaning tank 21 to the second tank 93.
 ノズル80を用いて、触媒10の開口面に対向して第1薬液31を噴射させることにより、触媒10の開口面は第1薬液31により濡らされることになる。そのため、第1の実施形態に係る触媒の再生装置100のように、触媒10を第1薬液31に浸漬させる場合と比べ、触媒の再生装置100は、少ない量の薬液を用いて触媒10を濡らすことができる。 By injecting the first chemical solution 31 toward the opening surface of the catalyst 10 using the nozzle 80, the opening surface of the catalyst 10 is wetted by the first chemical solution 31. Therefore, as compared with the case where the catalyst 10 is immersed in the first chemical solution 31 as in the catalyst regeneration device 100 according to the first embodiment, the catalyst regeneration device 100 wets the catalyst 10 with a smaller amount of the chemical solution. be able to.
 触媒の再生装置100のユーザは、制御装置50を用いて第1ポンプ91を動作させて第2薬液32を第1タンク90からノズル80に供給されるようにする。ノズル80は、A方向に移動しながら、触媒10の開口面に対向して第2薬液32を噴射させる(ステップS16)。ステップS16の動作の後、ノズル80はA方向の逆方向に移動してステップS16の前の位置に戻る。また、ステップS16の動作の後、制御装置50が第2ポンプ94を動作させて、第1洗浄槽21の第2薬液32を第2タンク93に移動させる。 The user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the second chemical solution 32 is supplied from the first tank 90 to the nozzle 80. The nozzle 80 ejects the second chemical solution 32 facing the opening surface of the catalyst 10 while moving in the A direction (step S16). After the operation of step S16, the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S16. Further, after the operation of step S16, the control device 50 operates the second pump 94 to move the second chemical solution 32 of the first cleaning tank 21 to the second tank 93.
 触媒の再生装置100のユーザは、制御装置50を用いて第1ポンプ91を動作させて第1仕上げ洗浄液33を第1タンク90からノズル80に供給されるようにする。ノズル80は、A方向に移動しながら、触媒10の開口面に対向して第1仕上げ洗浄液33を噴射させる(ステップS17)。ステップS17の動作の後、ノズル80はA方向の逆方向に移動してステップS17の前の位置に戻る。また、ステップS17の動作の後、制御装置50が第2ポンプ94を動作させて、第1洗浄槽21の第1仕上げ洗浄液33を第2タンク93に移動させる。 The user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the first finishing cleaning liquid 33 is supplied from the first tank 90 to the nozzle 80. The nozzle 80 ejects the first finishing cleaning liquid 33 facing the opening surface of the catalyst 10 while moving in the A direction (step S17). After the operation of step S17, the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S17. Further, after the operation of step S17, the control device 50 operates the second pump 94 to move the first finishing cleaning liquid 33 of the first cleaning tank 21 to the second tank 93.
 触媒の再生装置100のユーザは、制御装置50を用いて第1ポンプ91を動作させて第2仕上げ洗浄液34を第1タンク90からノズル80に供給されるようにする。ノズル80は、A方向に移動しながら、触媒10の開口面に対向して第2仕上げ洗浄液34を噴射させる(ステップS18)。ステップS18の動作の後、ノズル80はA方向の逆方向に移動してステップS18の前の位置に戻る。また、ステップS18の動作の後、制御装置50が第2ポンプ94を動作させて、第1洗浄槽21の第2仕上げ洗浄液34を第2タンク93に移動させる。 The user of the catalyst regeneration device 100 operates the first pump 91 by using the control device 50 so that the second finishing cleaning liquid 34 is supplied from the first tank 90 to the nozzle 80. The nozzle 80 ejects the second finishing cleaning liquid 34 facing the opening surface of the catalyst 10 while moving in the A direction (step S18). After the operation of step S18, the nozzle 80 moves in the opposite direction of the A direction and returns to the position before step S18. Further, after the operation of step S18, the control device 50 operates the second pump 94 to move the second finishing cleaning liquid 34 of the first cleaning tank 21 to the second tank 93.
 触媒の再生装置100のユーザは、制御装置50を用いて、触媒10を第1洗浄槽21から取り出して液切り台60に移動させる(ステップS19)。触媒10を第1洗浄槽21から取り出して液切り台60に移動させる具体的な動作は、第1の実施形態に係る触媒の再生装置100の使用態様のステップS8と同様である。 The user of the catalyst regeneration device 100 takes out the catalyst 10 from the first washing tank 21 and moves it to the liquid drain stand 60 by using the control device 50 (step S19). The specific operation of taking out the catalyst 10 from the first washing tank 21 and moving it to the drainage table 60 is the same as step S8 of the usage mode of the catalyst regeneration device 100 according to the first embodiment.
 第1の実施形態に係る触媒の再生装置100の使用態様のステップS9及びステップS10の動作を行う。なお、第1の実施形態と同様に、洗浄液毎に洗浄槽を設け、洗浄液を各々の洗浄槽上で噴射する使用形態でもよく、第1タンク90と第1ポンプ91、ノズル80、第2ポンプ94、第2タンク93が洗浄液毎にあってもよい。 The operations of steps S9 and S10 of the usage mode of the catalyst regeneration device 100 according to the first embodiment are performed. As in the first embodiment, a cleaning tank may be provided for each cleaning liquid, and the cleaning liquid may be sprayed on each cleaning tank. The first tank 90, the first pump 91, the nozzle 80, and the second pump may be used. 94, the second tank 93 may be in each cleaning liquid.
(作用・効果)
 本開示に係る触媒の再生方法の触媒10はハニカム構造又は板状の触媒10であり、水洗いした触媒10を、第1薬液31に濡らすことは、ハニカム構造又は板状の触媒10の開口面に対向する位置から、第1薬液31を噴射させることを含み、第1薬液31に濡らした触媒10を、第2薬液32に濡らすことは、ハニカム構造又は板状の触媒10の開口面に対向する位置から、第2薬液32を噴射させることを含む。
(Action / effect)
The catalyst 10 of the catalyst regeneration method according to the present disclosure is a honeycomb structure or plate-shaped catalyst 10, and wetting the catalyst 10 washed with water with the first chemical solution 31 causes the opening surface of the honeycomb structure or plate-shaped catalyst 10 to be wetted. Wetting the catalyst 10 wetted with the first chemical solution 31 with the second chemical solution 32, including injecting the first chemical solution 31 from the opposite positions, faces the opening surface of the honeycomb structure or the plate-shaped catalyst 10. It includes injecting the second chemical solution 32 from the position.
 触媒の再生方法を用いると、ハニカム構造又は板状の触媒の開口面に対向する位置から第1薬液31及び第2薬液32を噴射して、触媒10を濡らす。触媒の再生方法のユーザは、触媒10を濡らす他の方法を用いる場合に比べて、少ない量の第1薬液31及び第2薬液32を用いて、触媒10を濡らすことができる。これにより、触媒の再生方法のユーザは、触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, the first chemical solution 31 and the second chemical solution 32 are sprayed from a position facing the opening surface of the honeycomb structure or the plate-shaped catalyst to wet the catalyst 10. The user of the catalyst regeneration method can wet the catalyst 10 with a smaller amount of the first chemical solution 31 and the second chemical solution 32 as compared with the case of using another method for wetting the catalyst 10. Thereby, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10.
[コンピュータ構成]
 図7は、少なくとも1つの実施形態に係るコンピュータの構成を示す概略ブロック図である。
 コンピュータ1100は、プロセッサ1110、メインメモリ1120、ストレージ1130、インタフェース1140を備える。
 上述の制御装置50は、コンピュータ1100に実装される。そして、上述した各処理部の動作は、プログラムの形式でストレージ1130に記憶されている。プロセッサ1110は、プログラムをストレージ1130から読み出してメインメモリ1120に展開し、当該プログラムに従って上記処理を実行する。また、プロセッサ1110は、プログラムに従って、上述した各記憶部に対応する記憶領域をメインメモリ1120に確保する。
[Computer configuration]
FIG. 7 is a schematic block diagram showing the configuration of a computer according to at least one embodiment.
The computer 1100 includes a processor 1110, a main memory 1120, a storage 1130, and an interface 1140.
The control device 50 described above is mounted on the computer 1100. The operation of each of the above-mentioned processing units is stored in the storage 1130 in the form of a program. The processor 1110 reads a program from the storage 1130, expands it into the main memory 1120, and executes the above processing according to the program. Further, the processor 1110 secures a storage area corresponding to each of the above-mentioned storage units in the main memory 1120 according to the program.
 プログラムは、コンピュータ1100に発揮させる機能の一部を実現するためのものであってもよい。例えば、プログラムは、ストレージ1130に既に記憶されている他のプログラムとの組み合わせ、または他の装置に実装された他のプログラムとの組み合わせによって機能を発揮させるものであってもよい。なお、他の実施形態においては、コンピュータ1100は、上記構成に加えて、または上記構成に代えてPLD(Programmable Logic Device)などのカスタムLSI(Large Scale Integrated Circuit)を備えてもよい。PLDの例としては、PAL(Programmable Array Logic)、GAL(Generic Array Logic)、CPLD(Complex Programmable Logic Device)、FPGA(Field Programmable Gate Array)が挙げられる。この場合、プロセッサ1110によって実現される機能の一部または全部が当該集積回路によって実現されてよい。 The program may be for realizing a part of the functions exerted by the computer 1100. For example, the program may exert its function in combination with another program already stored in the storage 1130, or in combination with another program mounted on another device. In another embodiment, the computer 1100 may include a custom LSI (Large Scale Integrated Circuit) such as a PLD (Programmable Logic Device) in addition to or in place of the above configuration. Examples of PLDs include PAL (Programmable Array Logic), GAL (Generic Array Logic), CPLD (Complex Programmable Logic Device), and FPGA (Field Programmable Gate Array). In this case, some or all of the functions realized by the processor 1110 may be realized by the integrated circuit.
 ストレージ1130の例としては、磁気ディスク、光磁気ディスク、半導体メモリ等が挙げられる。ストレージ1130は、コンピュータ1100のバスに直接接続された内部メディアであってもよいし、インタフェース1140または通信回線を介してコンピュータに接続される外部メディアであってもよい。また、このプログラムが通信回線によってコンピュータ1100に配信される場合、配信を受けたコンピュータ1100が当該プログラムをメインメモリ1120に展開し、上記処理を実行してもよい。少なくとも1つの実施形態において、ストレージ1130は、一時的でない有形の記憶媒体である。 Examples of the storage 1130 include magnetic disks, magneto-optical disks, semiconductor memories, and the like. The storage 1130 may be internal media directly connected to the bus of computer 1100, or external media connected to the computer via interface 1140 or a communication line. When this program is distributed to the computer 1100 via a communication line, the distributed computer 1100 may expand the program to the main memory 1120 and execute the above processing. In at least one embodiment, the storage 1130 is a non-temporary tangible storage medium.
 また、当該プログラムは、前述した機能の一部を実現するためのものであってもよい。さらに、当該プログラムは、前述した機能をストレージ1130に既に記憶されている他のプログラムとの組み合わせで実現するもの、いわゆる差分ファイル(差分プログラム)であってもよい。 Further, the program may be for realizing a part of the above-mentioned functions. Further, the program may be a so-called difference file (difference program) that realizes the above-mentioned function in combination with another program already stored in the storage 1130.
[付記]
 各実施形態に記載の触媒の再生装置100は、例えば以下のように把握される。
[Additional Notes]
The catalyst regeneration device 100 according to each embodiment is grasped as follows, for example.
 (1)本開示に係る触媒の再生方法は、触媒10を水洗いすることと、水洗いした触媒10を、繰り返し使用済みの第1薬液31に濡らすことと、第1薬液31に濡らした触媒10を、第2薬液32に濡らすことと、触媒10を、水又はスルファミン酸含有水である仕上げ洗浄液で洗うことと、を含み、第1薬液31及び第2薬液32は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含む。 (1) The method for regenerating the catalyst according to the present disclosure is to wash the catalyst 10 with water, to wet the washed catalyst 10 with the repeatedly used first chemical solution 31, and to wet the catalyst 10 with the first chemical solution 31. , The second chemical solution 32 is wetted, and the catalyst 10 is washed with water or a finishing cleaning solution which is sulfamic acid-containing water. The inorganic acid includes hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
 触媒の再生方法を用いると、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を濡らして付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回濡らした場合に比べ、薬液をより少ない回数で取り換えながら使用することができ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is wetted with the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can use the catalyst 10 while replacing it with a smaller number of times as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution, and the catalyst 10 can be used by using a smaller amount of the chemical solution. The deposits on the surface of the surface can be removed.
 (2)また、触媒の再生方法の触媒10は、脱硝触媒である。
 これにより、触媒の再生方法のユーザは、脱硝触媒を所定の薬液に1回濡らした場合に比べ、より少ない量の薬液を使用して脱硝触媒の表面の付着物を除去することができる。
(2) Further, the catalyst 10 of the catalyst regeneration method is a denitration catalyst.
Thereby, the user of the catalyst regeneration method can remove the deposits on the surface of the denitration catalyst by using a smaller amount of the chemical solution as compared with the case where the denitration catalyst is wetted once with a predetermined chemical solution.
 (3)また、第2薬液32の繰り返し使用回数は、第1薬液31の繰り返し使用回数より少ない。 (3) Further, the number of times the second chemical solution 32 is repeatedly used is less than the number of times the first chemical solution 31 is repeatedly used.
 触媒の再生方法を用いると、繰り返し使用回数が多い第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、繰り返し使用回数が少ない第2薬液32に触媒10を濡らして付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回濡らす場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 which is frequently used repeatedly, the catalyst 10 is wetted with the second chemical solution 32 which is used less frequently. Remove the kimono. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
 (4)また、触媒の再生方法の触媒10を仕上げ洗浄液で洗うことは、触媒10を、繰り返し使用済みの仕上げ洗浄液である第1仕上げ洗浄液33で洗うことと、第1仕上げ洗浄液33で洗った触媒10を、仕上げ洗浄液である第2仕上げ洗浄液34で洗うことと、を含む。 (4) Further, in order to wash the catalyst 10 of the catalyst regeneration method with the finish cleaning liquid, the catalyst 10 was washed with the first finish cleaning liquid 33, which is a repeatedly used finish cleaning liquid, and with the first finish cleaning liquid 33. The catalyst 10 includes washing with a second finishing cleaning liquid 34, which is a finishing cleaning liquid.
 触媒の再生方法を用いると、繰り返し使用済みの第1仕上げ洗浄液33を用いて触媒10に付いた付着物を除去した後に、第2仕上げ洗浄液34に触媒10を濡らして、触媒10に付いた付着物を除去する。これにより、触媒の再生方法のユーザは、第2仕上げ洗浄液34の使用できる回数を増やすことができる。そのため、触媒の再生方法のユーザは、触媒10を所定の仕上げ洗浄液に1回濡らす場合に比べ、より少ない量の仕上げ洗浄液を使用して触媒10に付いた付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits attached to the catalyst 10 by using the repeatedly used first finishing cleaning liquid 33, the catalyst 10 is wetted with the second finishing cleaning liquid 34, and the catalyst 10 is attached to the catalyst 10. Remove the kimono. Thereby, the user of the catalyst regeneration method can increase the number of times that the second finishing cleaning liquid 34 can be used. Therefore, the user of the catalyst regeneration method can remove the deposits attached to the catalyst 10 by using a smaller amount of the finish cleaning liquid than in the case where the catalyst 10 is wetted once with a predetermined finish cleaning liquid.
 (5)また、触媒の再生方法の水洗いした触媒10を、第1薬液31に濡らすことは、水洗いした触媒10を第1薬液31に浸漬させることであり、第1薬液31に濡らした触媒10を、第2薬液32に濡らすことは、第1薬液31に浸漬させた触媒10を第2薬液32に浸漬させることである。 (5) Further, wetting the water-washed catalyst 10 in the catalyst regeneration method with the first chemical solution 31 means immersing the water-washed catalyst 10 in the first chemical solution 31, and the catalyst 10 wetted with the first chemical solution 31. To wet the second chemical solution 32 is to immerse the catalyst 10 immersed in the first chemical solution 31 in the second chemical solution 32.
 触媒の再生方法を用いると、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を浸漬させて付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回浸漬させる場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, after removing the deposits adhering to the surface of the catalyst 10 using the first chemical solution 31 that has been repeatedly used, the catalyst 10 is immersed in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
 (6)また、触媒の再生方法の第1薬液31は、1回以上の繰り返し使用済みの薬液である。
 触媒の再生方法を用いると、繰り返し使用回数が1回以上である第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を濡らして付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生方法のユーザは、触媒10を所定の薬液に1回濡らす場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。
(6) Further, the first chemical solution 31 of the catalyst regeneration method is a chemical solution that has been used repeatedly one or more times.
When the catalyst regeneration method is used, the catalyst 10 is wetted with the second chemical solution 32 after removing the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been used repeatedly once or more. To remove. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is wetted once with a predetermined chemical solution.
 (7)本開示に係る触媒の再生装置100は、触媒10を支持しながら触媒10を上下方向に移動させる支持装置40と、支持装置40を制御する制御装置50と、を備え、制御装置50は、触媒10を下方に下ろして繰り返し使用済みの第1薬液31に浸漬させるように制御し、触媒10を下方に下ろして第2薬液32に浸漬させるように制御し、触媒10を下方に下ろして仕上げ洗浄液に浸漬させるように制御し、第1薬液31及び第2薬液32は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、仕上げ洗浄液は、水又はスルファミン酸含有水である。 (7) The catalyst regeneration device 100 according to the present disclosure includes a support device 40 that moves the catalyst 10 in the vertical direction while supporting the catalyst 10, and a control device 50 that controls the support device 40. Controls the catalyst 10 to be lowered and immersed in the used first chemical solution 31 repeatedly, and controls the catalyst 10 to be lowered and immersed in the second chemical solution 32, and lowers the catalyst 10 downward. The first chemical solution 31 and the second chemical solution 32 contain at least an inorganic acid and a fluorine compound, and the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid for finishing. The cleaning solution is water or sulfamic acid-containing water.
 触媒の再生装置100は、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を浸漬させて付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、触媒の再生装置100は、触媒10を所定の薬液に1回浸漬させる場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 The catalyst regeneration device 100 removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the catalyst regeneration device 100 can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
 (8)本開示に係るプログラムは、触媒10を支持しながら触媒10を上下方向に移動させる支持装置40の制御装置50に、触媒10を下方に下ろして繰り返し使用済みの第1薬液31に浸漬させることと、触媒10を下方に下ろして第2薬液32に浸漬させることと、触媒10を下方に下ろして仕上げ洗浄液に浸漬させることと、を実行させるプログラムであって、第1薬液31及び第2薬液32は、少なくとも無機酸とフッ素化合物とを含み、無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、仕上げ洗浄液は、水又はスルファミン酸含有水である。 (8) In the program according to the present disclosure, the catalyst 10 is lowered downward in the control device 50 of the support device 40 that moves the catalyst 10 in the vertical direction while supporting the catalyst 10, and is repeatedly immersed in the used first chemical solution 31. It is a program for executing the process of lowering the catalyst 10 and immersing it in the second chemical solution 32, and lowering the catalyst 10 and immersing it in the finishing cleaning liquid. 2 The chemical solution 32 contains at least an inorganic acid and a fluorine compound, the inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid, and the finish cleaning solution is water or sulfamic acid-containing water.
 プログラムのユーザは、繰り返し使用済みの第1薬液31を用いて触媒10の表面に付着した付着物を除去した後に、第2薬液32に触媒10を浸漬させて付着物を除去する。これにより、第2薬液32を使用できる回数が増えることになる。そのため、プログラムのユーザは、触媒10を所定の薬液に1回浸漬させる場合に比べ、より少ない量の薬液を使用して触媒10の表面の付着物を除去することができる。 The user of the program removes the deposits adhering to the surface of the catalyst 10 by using the first chemical solution 31 that has been repeatedly used, and then immerses the catalyst 10 in the second chemical solution 32 to remove the deposits. As a result, the number of times that the second chemical solution 32 can be used increases. Therefore, the user of the program can remove the deposits on the surface of the catalyst 10 by using a smaller amount of the chemical solution as compared with the case where the catalyst 10 is immersed in the predetermined chemical solution once.
 (9)本開示に係る触媒の再生方法の触媒10はハニカム構造又は板状の触媒10であり、水洗いした触媒10を、第1薬液31に濡らすことは、ハニカム構造又は板状の触媒10の開口面に対向する位置から、第1薬液31を噴射させることを含み、第1薬液31に濡らした触媒10を、第2薬液32に濡らすことは、ハニカム構造又は板状の触媒10の開口面に対向する位置から、第2薬液32を噴射させることを含む。 (9) The catalyst 10 of the catalyst regeneration method according to the present disclosure is a honeycomb structure or plate-shaped catalyst 10, and wetting the water-washed catalyst 10 with the first chemical solution 31 is a honeycomb structure or plate-shaped catalyst 10. Including spraying the first chemical solution 31 from a position facing the opening surface, and wetting the catalyst 10 wetted with the first chemical solution 31 with the second chemical solution 32 is the opening surface of the honeycomb structure or the plate-shaped catalyst 10. It includes injecting the second chemical solution 32 from the position facing the honeycomb.
 触媒の再生方法を用いると、ハニカム構造又は板状の触媒の開口面に対向する位置から第1薬液31及び第2薬液32を噴射して、触媒10を濡らす。触媒の再生方法のユーザは、触媒10を濡らす他の方法を用いる場合に比べて、少ない量の第1薬液31及び第2薬液32を用いて、触媒10を濡らすことができる。これにより、触媒の再生方法のユーザは、触媒10の表面の付着物を除去することができる。 When the catalyst regeneration method is used, the first chemical solution 31 and the second chemical solution 32 are sprayed from a position facing the opening surface of the honeycomb structure or the plate-shaped catalyst to wet the catalyst 10. The user of the catalyst regeneration method can wet the catalyst 10 with a smaller amount of the first chemical solution 31 and the second chemical solution 32 as compared with the case of using another method for wetting the catalyst 10. Thereby, the user of the catalyst regeneration method can remove the deposits on the surface of the catalyst 10.
 本開示は、触媒の再生方法、触媒の再生装置及びプログラムに関する。
 本開示によれば、触媒に所定の薬液を1回濡らして付着物を除去する場合に比べ、薬液をより少ない回数で取り換えながら使用することができ、より少ない量の薬液を使用して付着物を除去することができる。
The present disclosure relates to catalyst regeneration methods, catalyst regeneration devices and programs.
According to the present disclosure, the catalyst can be used while being replaced a smaller number of times as compared with the case where the catalyst is wetted with a predetermined chemical solution once to remove the deposits, and the deposits can be used by using a smaller amount of the chemical solution. Can be removed.
 10 触媒
 11 セル
 21 第1洗浄槽
 22 第2洗浄槽
 23 第3洗浄槽
 24 第4洗浄槽
 31 第1薬液
 32 第2薬液
 33 第1仕上げ洗浄液
 34 第2仕上げ洗浄液
 40 支持装置
 41 レール
 50 制御装置
 60 液切り台
 70 熱風送風機
 80 ノズル
 90 第1タンク
 91 第1ポンプ
 93 第2タンク
 94 第2ポンプ
 100 触媒の再生装置
 110 制御部
 120 入力受入部
 1100 コンピュータ
 1110 プロセッサ
 1120 メインメモリ
 1130 ストレージ
 1140 インタフェース
10 Catalyst 11 Cell 21 1st cleaning tank 22 2nd cleaning tank 23 3rd cleaning tank 24 4th cleaning tank 31 1st chemical liquid 32 2nd chemical liquid 33 1st finish cleaning liquid 34 2nd finish cleaning liquid 40 Support device 41 Rail 50 Control device 60 Drainer 70 Hot air blower 80 Nozzle 90 1st tank 91 1st pump 93 2nd tank 94 2nd pump 100 Catalyst regenerator 110 Control unit 120 Input receiving unit 1100 Computer 1110 Processor 1120 Main memory 1130 Storage 1140 Interface

Claims (9)

  1.  触媒を水洗いすることと、
     水洗いした前記触媒を、繰り返し使用済みの第1薬液に濡らすことと、
     前記第1薬液に濡らした前記触媒を、第2薬液に濡らすことと、
     前記触媒を、水又はスルファミン酸含有水である仕上げ洗浄液で洗うことと、
     を含み、
     前記第1薬液及び前記第2薬液は、少なくとも無機酸とフッ素化合物とを含み、
     前記無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含む、
     触媒の再生方法。
    Washing the catalyst with water and
    Wetting the catalyst washed with water with the used first chemical solution repeatedly
    Wetting the catalyst wet with the first chemical solution with the second chemical solution
    Washing the catalyst with water or a finishing cleaning solution containing sulfamic acid can be used.
    Including
    The first chemical solution and the second chemical solution contain at least an inorganic acid and a fluorine compound.
    The inorganic acid includes hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
    How to regenerate the catalyst.
  2.  前記触媒は、脱硝触媒である、
     請求項1に記載の触媒の再生方法。
    The catalyst is a denitration catalyst.
    The method for regenerating a catalyst according to claim 1.
  3.  前記第2薬液の繰り返し使用回数は、前記第1薬液の繰り返し使用回数より少ない、
     請求項1に記載の触媒の再生方法。
    The number of times the second chemical solution is repeatedly used is less than the number of times the first chemical solution is repeatedly used.
    The method for regenerating a catalyst according to claim 1.
  4.  前記触媒を前記仕上げ洗浄液で洗うことは、
     前記触媒を、繰り返し使用済みの仕上げ洗浄液である第1仕上げ洗浄液で洗うことと、
     前記第1仕上げ洗浄液で洗った前記触媒を、仕上げ洗浄液である第2仕上げ洗浄液で洗うことと、
     を含む請求項1から請求項3の何れか1項に記載の触媒の再生方法。
    Washing the catalyst with the finishing cleaning solution is not possible.
    Washing the catalyst with the first finish cleaning solution, which is a repeatedly used finish cleaning solution,
    The catalyst washed with the first finishing cleaning liquid is washed with the second finishing cleaning liquid which is a finishing cleaning liquid.
    The method for regenerating a catalyst according to any one of claims 1 to 3, which comprises.
  5.  水洗いした前記触媒を、前記第1薬液に濡らすことは、水洗いした前記触媒を前記第1薬液に浸漬させることであり、
     前記第1薬液に濡らした前記触媒を、前記第2薬液に濡らすことは、前記第1薬液に浸漬させた前記触媒を前記第2薬液に浸漬させることである、
     請求項1から請求項4の何れか1項に記載の触媒の再生方法。
    Wetting the catalyst washed with water with the first chemical solution means immersing the catalyst washed with water in the first chemical solution.
    Wetting the catalyst wet with the first chemical solution with the second chemical solution means immersing the catalyst immersed in the first chemical solution with the second chemical solution.
    The method for regenerating a catalyst according to any one of claims 1 to 4.
  6.  前記触媒はハニカム構造または板状の触媒であり、
     水洗いした前記触媒を、前記第1薬液に濡らすことは、前記ハニカム構造又は板状の触媒の開口面に対向する位置から、前記第1薬液を噴射させることを含み、
     前記第1薬液に濡らした前記触媒を、前記第2薬液に濡らすことは、前記ハニカム構造の触媒又は板状の開口面に対向する位置から、前記第2薬液を噴射させることを含む、
     請求項1から請求項4の何れか1項に記載の触媒の再生方法。
    The catalyst is a honeycomb structure or plate-shaped catalyst.
    Wetting the catalyst washed with water with the first chemical solution includes injecting the first chemical solution from a position facing the opening surface of the honeycomb structure or the plate-shaped catalyst.
    Wetting the catalyst wet with the first chemical solution with the second chemical solution includes injecting the second chemical solution from a position facing the catalyst of the honeycomb structure or the plate-shaped opening surface.
    The method for regenerating a catalyst according to any one of claims 1 to 4.
  7.  前記第1薬液は、1回以上の繰り返し使用済みの薬液である、
     請求項1から請求項6の何れか1項に記載の触媒の再生方法。
    The first chemical solution is a chemical solution that has been used repeatedly one or more times.
    The method for regenerating a catalyst according to any one of claims 1 to 6.
  8.  触媒を支持しながら前記触媒を上下左右方向に移動させる支持装置と、
     前記支持装置を制御する制御装置と、
     を備え、
     前記制御装置は、前記触媒を下方に下ろして繰り返し使用済みの第1薬液に浸漬させるように制御し、前記触媒を下方に下ろして第2薬液に浸漬させるように制御し、前記触媒を下方に下ろして仕上げ洗浄液に浸漬させるように制御し、
     前記第1薬液及び前記第2薬液は、少なくとも無機酸とフッ素化合物とを含み、
     前記無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、
     前記仕上げ洗浄液は、水又はスルファミン酸含有水である、
     触媒の再生装置。
    A support device that moves the catalyst in the vertical and horizontal directions while supporting the catalyst,
    A control device that controls the support device and
    Equipped with
    The control device controls the catalyst to be lowered and immersed in the used first chemical solution repeatedly, and the catalyst is controlled to be lowered and immersed in the second chemical solution, and the catalyst is lowered. Control to lower and immerse in finish cleaning solution,
    The first chemical solution and the second chemical solution contain at least an inorganic acid and a fluorine compound.
    The inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
    The finish cleaning liquid is water or sulfamic acid-containing water.
    Catalyst regenerator.
  9.  触媒を支持しながら前記触媒を上下方向に移動させる支持装置の制御装置に、
     前記触媒を下方に下ろして繰り返し使用済みの第1薬液に浸漬させることと、
     前記触媒を下方に下ろして第2薬液に浸漬させることと、
     前記触媒を下方に下ろして仕上げ洗浄液に浸漬させることと、
     を実行させるプログラムであって、
     前記第1薬液及び前記第2薬液は、少なくとも無機酸とフッ素化合物とを含み、
     前記無機酸は、塩酸、塩酸及びホウ酸、又はスルファミン酸を含み、
     前記仕上げ洗浄液は、水又はスルファミン酸含有水である、
     プログラム。
    For the control device of the support device that moves the catalyst in the vertical direction while supporting the catalyst,
    By lowering the catalyst downward and repeatedly immersing it in the used first chemical solution,
    By lowering the catalyst downward and immersing it in the second chemical solution,
    By lowering the catalyst and immersing it in the finishing cleaning solution,
    Is a program that executes
    The first chemical solution and the second chemical solution contain at least an inorganic acid and a fluorine compound.
    The inorganic acid contains hydrochloric acid, hydrochloric acid and boric acid, or sulfamic acid.
    The finish cleaning liquid is water or sulfamic acid-containing water.
    program.
PCT/JP2021/023556 2020-06-24 2021-06-22 Method for regenerating catslyst, apparatus for regenerating catslyst and program WO2021261477A1 (en)

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Citations (4)

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JPH10337483A (en) * 1997-06-09 1998-12-22 Ishikawajima Harima Heavy Ind Co Ltd Method and device for regenerating activity of denitrification catalyst
JP2011031237A (en) * 2009-07-10 2011-02-17 Kyuden Sangyo Co Inc Method for improving activity of denitrification catalyst in flue gas denitrification apparatus
WO2017010402A1 (en) * 2015-07-10 2017-01-19 三菱日立パワーシステムズ株式会社 Denitration catalyst regeneration method, denitration catalyst regeneration system, and cleaning agent for denitration catalyst
WO2019004123A1 (en) * 2017-06-30 2019-01-03 三菱日立パワーシステムズ株式会社 Regeneration method for denitration catalyst and regeneration system for denitration catalyst

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Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
JPH10337483A (en) * 1997-06-09 1998-12-22 Ishikawajima Harima Heavy Ind Co Ltd Method and device for regenerating activity of denitrification catalyst
JP2011031237A (en) * 2009-07-10 2011-02-17 Kyuden Sangyo Co Inc Method for improving activity of denitrification catalyst in flue gas denitrification apparatus
WO2017010402A1 (en) * 2015-07-10 2017-01-19 三菱日立パワーシステムズ株式会社 Denitration catalyst regeneration method, denitration catalyst regeneration system, and cleaning agent for denitration catalyst
WO2019004123A1 (en) * 2017-06-30 2019-01-03 三菱日立パワーシステムズ株式会社 Regeneration method for denitration catalyst and regeneration system for denitration catalyst

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