WO2021129238A1 - 薄膜光波导及其制备方法 - Google Patents
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- WO2021129238A1 WO2021129238A1 PCT/CN2020/129669 CN2020129669W WO2021129238A1 WO 2021129238 A1 WO2021129238 A1 WO 2021129238A1 CN 2020129669 W CN2020129669 W CN 2020129669W WO 2021129238 A1 WO2021129238 A1 WO 2021129238A1
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- optical waveguide
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- 230000003287 optical effect Effects 0.000 title claims abstract description 131
- 239000010409 thin film Substances 0.000 title claims abstract description 77
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000463 material Substances 0.000 claims abstract description 61
- 239000010408 film Substances 0.000 claims abstract description 52
- 239000010410 layer Substances 0.000 claims abstract description 30
- 239000011229 interlayer Substances 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000005253 cladding Methods 0.000 claims abstract description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 18
- 239000010703 silicon Substances 0.000 claims abstract description 18
- 239000012792 core layer Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 24
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 235000012239 silicon dioxide Nutrition 0.000 claims description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 12
- 239000004408 titanium dioxide Substances 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 6
- 239000011787 zinc oxide Substances 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- 230000008569 process Effects 0.000 abstract description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12038—Glass (SiO2 based materials)
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/1204—Lithium niobate (LiNbO3)
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12061—Silicon
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
- G02B2006/12076—Polyamide
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/1213—Constructional arrangements comprising photonic band-gap structures or photonic lattices
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
Definitions
- the invention relates to a thin film optical waveguide and a preparation method thereof.
- the two-dimensional lattice sub-wavelength thin film optical waveguide is a new type of single-mode optical waveguide that utilizes sub-wavelength characteristics.
- This optical waveguide is composed of a silicon dioxide film, an optical waveguide dielectric film, a two-dimensional lattice film material interlayer arranged in the center of the optical waveguide dielectric film, and a cladding of the optical waveguide dielectric film and a two-dimensional lattice film material
- the interlayer consists of a silica cladding layer.
- the lattice constant of the two-dimensional lattice in the optical waveguide is generally below 400nm, which is much lower than the wavelength of the propagating light, and the diffraction of light is suppressed.
- optical waveguide can be equivalent to a uniform dielectric optical waveguide, which is very suitable for traditional optical communications at 1310nm and 1550nm. Wavelength range.
- the low loss characteristics of the optical waveguide make it an ideal optical waveguide structure for various optoelectronic devices such as Mach-Zehnder modulators, micro-ring resonators and other devices.
- Common optical waveguide dielectric film materials such as silicon, doped silicon dioxide or lithium niobate, have positive thermo-optical coefficients, so their refractive index will increase when the temperature rises, causing the effective refractive index of the optical waveguide to increase .
- the effective refractive index of the optical waveguide is one of the important parameters of the device performance, the increase of the effective refractive index when the temperature rises will seriously affect the working efficiency of the device.
- thermal stability is one of the important factors that determine the practical application capability of an optical waveguide.
- Commonly used temperature control methods include a temperature control system that actively adjusts based on feedback. However, this method does not enhance the inherent thermal stability of the optical waveguide. It also increases the complexity of the system and cannot guarantee uniform temperature control.
- the non-thermosensitive optical waveguide structure using the negative thermo-optical coefficient coating requires an additional negative thermo-optical coefficient coating, which increases the complexity and cost of the process.
- the purpose of the present invention is to provide a two-dimensional lattice subwavelength thin film optical waveguide material with negative thermo-optical coefficient to compensate the optical waveguide dielectric film to obtain a thermally stable thin-film optical waveguide.
- a thin film optical waveguide comprising a silicon-based substrate, a cladding layer provided on the silicon-based substrate, and an optical waveguide provided on the silicon-based substrate
- the optical waveguide core layer is arranged in the cladding layer and the refractive index of the optical waveguide core layer is higher than the refractive index of the cladding layer.
- the optical waveguide core layer includes a double-layer optical waveguide dielectric film and A thin film material interlayer arranged between the double-layer optical waveguide dielectric films, the thin film material interlayer is a two-dimensional lattice sub-wavelength structure, and the thin film material interlayer is used to perform thermo-optical coefficients on the optical waveguide dielectric film Compensated negative thermo-optical coefficient material.
- the negative thermo-optical coefficient material is one of titanium dioxide, zinc oxide, and magnesium-doped zinc oxide.
- the effective thermo-optical coefficient of the negative thermo-optical coefficient material is negatively related to the thickness of the negative thermo-optical coefficient material.
- optical waveguide dielectric film is a positive thermo-optical coefficient material.
- optical waveguide dielectric film is doped silicon dioxide.
- the doped silica is 2% germanium doped silica.
- the two-dimensional lattice sub-wavelength structure is a Bravais lattice structure or a quasi lattice structure.
- the Bravais lattice structure is square or hexagonal.
- the quasi-lattice structure is octagonal, decagonal or dodecagonal.
- the two-dimensional lattice sub-wavelength structure includes lattice points, and the lattice points are one of a circle, an ellipse, a cross, a hexagon, and an octagon.
- the present invention also provides a preparation method for preparing the thin film optical waveguide, and the preparation method is as follows:
- a silicon-based substrate is provided, and a lower optical waveguide dielectric film is formed on the silicon-based substrate;
- the thin film material interlayer of the thin film optical waveguide provided by the present invention is a negative thermo-optical coefficient material
- the negative thermo-optical coefficient material is used to compensate the optical waveguide dielectric film for thermo-optical coefficient, so no additional negative heat is required.
- the optical coefficient coating reduces the complexity and cost of the process, ensures uniform temperature control, simplifies the structure of the thin film optical waveguide and ensures the thermal stability of the thin film optical waveguide.
- FIG. 1 is a schematic diagram of the structure of a two-dimensional lattice sub-wavelength thin film optical waveguide in an embodiment of the present invention
- FIG. 2 is a schematic diagram of the structure of the two-dimensional lattice sub-wavelength thin film optical waveguide in another direction in FIG. 1;
- Fig. 3 is the effective refractive index of the two-dimensional lattice sub-wavelength thin film optical waveguide with thermo-optic coefficient compensation in Fig. 1 at different temperatures;
- Fig. 4 shows the effective thermo-optical coefficient of the thin film optical waveguide in Fig. 1 at different thicknesses of titanium dioxide.
- the thin-film optical waveguide shown in an embodiment of the present invention includes a silicon-based substrate 1, an optical waveguide core layer 2 provided on the silicon-based substrate 1, and an optical waveguide core layer 2 provided on the silicon-based substrate 1.
- a cladding layer (not shown) on the base substrate 1, the optical waveguide core layer 2 is provided in the cladding layer, and the refractive index of the optical waveguide core layer 2 is higher than the refractive index of the cladding layer.
- the optical waveguide core layer 2 includes a double-layer optical waveguide dielectric film 21 with the same thickness and a film material interlayer 22 arranged between the double-layer optical waveguide dielectric films 21.
- the optical waveguide dielectric film 21 generally uses doped silica with a positive thermo-optic coefficient.
- the thin film material interlayer 22 is a negative thermo-optical coefficient material used to compensate the thermo-optic coefficient of the optical waveguide dielectric film 21.
- the thin film material interlayer 22 is titanium dioxide, zinc oxide, and magnesium-doped zinc oxide negative thermo-optical One of the coefficient materials.
- the thin film material interlayer 22 has a two-dimensional lattice sub-wavelength structure, and the two-dimensional lattice sub-wavelength structure includes lattice points 221.
- the two-dimensional lattice sub-wavelength structure is a Bravais lattice structure or a quasi-lattice structure, the Bravais lattice is a square or a hexagon, and the quasi-lattice structure is an octagon or a decagon Or dodecagon.
- the two-dimensional lattice array is an abstract image.
- the lattice point 221 is the position of the center of mass of the unit cell.
- the lattice constant ⁇ is the side length of the unit cell. In Fig. 2, it can be regarded as two adjacent crystals.
- the lattice points 211 are one of a circle, an ellipse, a cross, a hexagon, and an octagon.
- the thin-film optical waveguide includes a silicon dioxide substrate 1, a 2% germanium-doped silicon dioxide double-layer optical waveguide dielectric film 21, a titanium dioxide thin film material interlayer 22, and a cladding double-layer optical waveguide dielectric film 21 and The silicon dioxide cladding of the thin film material sandwich 22.
- the titanium dioxide thin film material interlayer 22 uses a two-dimensional lattice sub-wavelength structure of a square Bravais lattice, and the lattice points 221 are circular.
- the optical waveguide dielectric film 21 in the thin-film optical waveguide is the main optical waveguide structure, which ensures the single-mode operating mode of the thin-film optical waveguide.
- the two-dimensional lattice sub-wavelength structure formed in the thin film material interlayer 22 can be regarded as a single-mode optical waveguide structure of a uniform medium.
- the lattice constant and the duty cycle of the two-dimensional lattice sub-wavelength structure can be obtained.
- this embodiment uses the scalar Heimholtz formula as a guide, namely:
- ⁇ can be any field component
- k 0 is the vacuum wave number
- n is the refractive index
- the z direction is the propagation direction
- x and y are the vertical and parallel directions of the cross section.
- F and G are mode distributions
- n eff is the effective refractive index
- ⁇ is the propagation constant.
- the incident light wavelength is selected as 1550 nm, and the effect of the thin-film material interlayer 22 made of the negative thermo-optical coefficient material titanium dioxide on the effective thermo-optical coefficient of the thin-film optical waveguide is described in detail.
- the effective thermo-optic coefficient of a thin film optical waveguide is the rate of change of the effective refractive index with temperature, which can be obtained from the slope of the curve prepared by the effective refractive index at different temperatures.
- the effective thermo-optic coefficient of the waveguide is 7.31 ⁇ 10 -6 .
- the effective thermo-optical coefficient of thin film optical waveguides made of titanium dioxide of different thicknesses decreases with the increase of the thickness of titanium dioxide, and the effective thermo-optical coefficient is kept below 10 -5 , which shows that the negative thermo-optical coefficient material
- the effective thermo-optic coefficient of the film is negatively correlated with the thickness of the negative thermo-optic coefficient material, and the effective thermo-optic coefficient of the thin film optical waveguide is greatly reduced and close to 0, so that the effective refractive index of the thin film optical waveguide changes with temperature greatly.
- the self-structure of the two-dimensional lattice sub-wavelength structure thin film optical waveguide is used to prepare the thin film material sandwich 22 from the negative thermo-optic coefficient material, so that the positive thermo-optic coefficient of the double-layer optical waveguide dielectric film 21 is compensated, and the thin film optical waveguide effectively heats The optical coefficient is greatly reduced to close to zero, and the thermal stability of the thin film optical waveguide is improved.
- the present invention also provides a preparation method for preparing the above-mentioned thin-film optical waveguide, and the preparation method is as follows:
- a silicon-based substrate 1 specifically a silicon dioxide substrate 1, on which a plasma-enhanced chemical vapor deposition (PECVD) method is used to coat the doped silicon dioxide material to form a lower optical waveguide Dielectric film, wherein the doped silicon dioxide material is 2% germanium doped silicon dioxide;
- PECVD plasma-enhanced chemical vapor deposition
- the titanium dioxide thin film material interlayer is prepared into the two-dimensional lattice subwavelength structure by nanoimprinting (NIL) or electron beam lithography or optical lithography, wherein
- NIL nanoimprinting
- the two-dimensional lattice sub-wavelength structure includes lattice points 221, and the lattice points 221 are circular;
- PECVD plasma-enhanced chemical vapor deposition
- a silicon dioxide cladding is prepared on the outer circumference of the double-layer optical waveguide dielectric film 21 and the film material interlayer 22.
- the film material interlayer of the thin film optical waveguide provided by the present invention is a negative thermo-optical coefficient material, and the negative thermo-optical coefficient material is used to compensate the optical waveguide dielectric film, so there is no need to provide an additional negative thermo-optical coefficient coating.
- the complexity and cost of the process are reduced, uniform temperature control is ensured, the structure of the thin film optical waveguide is simplified, and the thermal stability of the thin film optical waveguide is ensured.
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Abstract
Description
Claims (11)
- 一种薄膜光波导,包括硅基衬底以及设置在所述硅基衬底上的包层,其特征在于,所述薄膜光波导还包括设置在所述硅基衬底上的光波导芯层,所述光波导芯层设于所述包层之中并且所述光波导芯层折射率高于所述包层的折射率,所述光波导芯层包括双层光波导介质薄膜以及设置于所述双层光波导介质薄膜之间的薄膜材料夹层,所述薄膜材料夹层为二维晶格亚波长结构,所述薄膜材料夹层为用以对所述光波导介质薄膜进行热光系数补偿的负热光系数材料。
- 如权利要求1所述的薄膜光波导,其特征在于,所述负热光系数材料为二氧化钛、氧化锌和镁掺杂氧化锌中的一种。
- 如权利要求1所述的薄膜光波导,其特征在于,所述负热光系数材料的有效热光系数与所述负热光系数材料的厚度负相关。
- 如权利要求1所述的薄膜光波导,其特征在于,所述光波导介质薄膜为正热光系数材料。
- 如权利要求1所述的薄膜光波导,其特征在于,所述光波导介质薄膜为掺杂二氧化硅。
- 如权利要求5所述的薄膜光波导,其特征在于,所述掺杂二氧化硅为2%锗掺杂二氧化硅。
- 如权利要求1所述的薄膜光波导,其特征在于,所述二维晶格亚波长结构为布拉维晶格结构或准晶格结构。
- 如权利要求7所述的薄膜光波导,其特征在于,所述布拉维晶格结构为正方形或六角形。
- 如权利要求7所述的薄膜光波导,其特征在于,所述准晶格结构为八边形或十边形或十二边形。
- 如权利要求1所述的薄膜光波导,其特征在于,所述二维晶格亚波长结构包括晶格点,所述晶格点为圆形、椭圆形、十字交叉形、六角形、八角形中的一种。
- 一种用以制备权利要求1至10项中任一项所述的薄膜光波导的制备方法,其特征在于,所述制备方法如下:S1、提供硅基衬底,在所述硅基衬底上形成下层光波导介质薄膜;S2、使用负热光系数材料制备所述薄膜材料夹层;S3、将所述薄膜材料夹层制备成所述二维晶格亚波长结构;S4、制备上层光波导介质薄膜,所述下层光波导介质薄膜和所述下层光波导介质薄膜形成所述双层光波导介质薄膜;S5、制备所述包层。
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CN110989078A (zh) * | 2019-12-25 | 2020-04-10 | 易锐光电科技(安徽)有限公司 | 薄膜光波导及其制备方法 |
CN110989077A (zh) * | 2019-12-25 | 2020-04-10 | 易锐光电科技(安徽)有限公司 | 薄膜光波导及其制备方法 |
CN114355508B (zh) * | 2022-01-24 | 2023-12-05 | 吉林大学 | 一种基于定向耦合结构的少模波导功率分配器及其制备方法 |
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