WO2021109250A1 - 彩色滤光片及其制造方法和显示装置 - Google Patents

彩色滤光片及其制造方法和显示装置 Download PDF

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Publication number
WO2021109250A1
WO2021109250A1 PCT/CN2019/126207 CN2019126207W WO2021109250A1 WO 2021109250 A1 WO2021109250 A1 WO 2021109250A1 CN 2019126207 W CN2019126207 W CN 2019126207W WO 2021109250 A1 WO2021109250 A1 WO 2021109250A1
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Prior art keywords
area
signal
tin oxide
indium tin
oxide layer
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PCT/CN2019/126207
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English (en)
French (fr)
Inventor
任维
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深圳市华星光电半导体显示技术有限公司
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Priority to US16/626,543 priority Critical patent/US11513386B2/en
Publication of WO2021109250A1 publication Critical patent/WO2021109250A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134318—Electrodes characterised by their geometrical arrangement having a patterned common electrode
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light

Definitions

  • the present disclosure relates to the field of display technology, in particular to a color filter, a manufacturing method thereof, and a display device.
  • FIG. 1 shows a schematic diagram of laser output to the indium tin oxide layer on the color filter in the prior art.
  • the indium tin oxide layer CF ITO on the color filter side is outputted along the laser cutting line L1 by lasering the indium tin oxide layer CF on the color filter side ITO is divided into L zone and H zone, so that the low voltage signal L and the high voltage signal H are input to the L zone and the H zone on the indium tin oxide layer on the color filter (CF) side, respectively.
  • the laser cutting path and the divided area are limited by the layout of the black matrix (BM) of the boundary and the size of the vacant area between the chips.
  • Figure 2 shows the laser to the light shielding film during the laser output process. Schematic. When the laser 10 is output to the light-shielding film 20, in addition to destroying the integrity of the light-shielding film and causing light leakage, it will also affect the conductivity of the indium tin oxide layer.
  • the high-potential signal ITO area has a large area, which is only limited by the layout restrictions of the peripheral dummy space area.
  • the low-potential signal ITO area has a small area and the signal impedance is relatively large. Because the signal impedance in the low-potential ITO area is relatively large, the signal transmission speed is affected and delays are likely to occur.
  • FIG. 3 shows a schematic diagram of the distribution of the high-potential signal ITO area H and the low-potential signal ITO area L in the prior art.
  • the laser cutting path and the divided area are limited by the layout of the black matrix (BM) of the boundary and the size of the vacant area between the chips.
  • Figure 2 shows the laser to the light shielding film during the laser output process. Schematic. When the laser 10 is output to the light-shielding film 20, in addition to destroying the integrity of the light-shielding film and causing light leakage, it will also affect the conductivity of the indium tin oxide layer.
  • the high-potential signal ITO area has a large area, which is only limited by the layout restrictions of the peripheral dummy space area.
  • the low-potential signal ITO area has a small area and the signal impedance is relatively large. Because the signal impedance in the low-potential ITO area is relatively large, the signal transmission speed is affected and delays are likely to occur.
  • FIG. 3 shows a schematic diagram of the distribution of the high-potential signal ITO area H and the low-potential signal ITO area L in the prior art.
  • the present disclosure proposes a color filter, a manufacturing method thereof, and a display device, so as to improve the signal delay caused by the difference in the signal impedance of the indium tin oxide layer.
  • the present disclosure provides a color filter, including: a substrate; a plurality of sub-pixel areas, wherein each sub-pixel area includes a first signal area and a second signal area, and is arranged in the first signal area And the laser path of the second signal interval; a first light-shielding sheet arranged in the first signal area, the first light-shielding sheet covering a first indium tin oxide layer; and a second light-shielding sheet arranged on the The second signal area is covered with a second indium tin oxide layer on the second shading sheet; wherein the first signal area receives signals through the first indium tin oxide layer, and the second signal area passes through the second oxide layer.
  • the indium tin layer receives the signal.
  • the path width of the laser path is greater than 450um.
  • the area of the first shading sheet is smaller than the area of the second shading sheet, the first signal area receives a low voltage signal through the first indium tin oxide layer, and the first The second signal area receives a high voltage signal through the second indium tin oxide layer.
  • the area of the first signal area is smaller than the area of the second signal area, and the first signal area receives the low voltage signal through the first indium tin oxide layer, so The second signal area receives a high voltage signal through the second indium tin oxide layer.
  • the present disclosure also provides a method for manufacturing a color filter, which includes: forming a substrate, the substrate including a plurality of sub-pixel regions; forming a first light-shielding sheet and a second light-shielding sheet on each of the substrates In the sub-pixel area; forming an indium tin oxide layer above the first and second light-shielding sheets; and applying laser to the indium-tin oxide layer to form a laser path; wherein, the laser path is The indium tin oxide layer is divided into a first indium tin oxide layer covering the first shading sheet and a second indium tin oxide layer covering the second shading sheet.
  • the sub-pixel area is divided into A light-shielding sheet and a first signal area of the first indium tin oxide layer and a second signal area that includes the second light-shielding sheet and the second indium tin oxide layer.
  • the path width of the laser path is greater than 450um.
  • the area of the first shading sheet is smaller than the area of the second shading sheet, the first signal area receives a low voltage signal through the first indium tin oxide layer, and the first The second signal area receives a high voltage signal through the second indium tin oxide layer.
  • the present disclosure further provides a display device, including: a first substrate; a plurality of metal layers disposed on the first substrate; a passivation layer disposed to cover the first substrate and the plurality of metal layers.
  • the laser path in the two signal sections; the first light-shielding sheet is arranged in the first signal area, and the first light-shielding sheet is covered by the first indium tin oxide layer; the second light-shielding sheet is arranged in the second signal area , The second light-shielding sheet is covered by
  • the area of the first shading sheet is smaller than the area of the second shading sheet, the first signal area receives a low voltage signal through the first indium tin oxide layer, and the first The second signal area receives a high voltage signal through the second indium tin oxide layer.
  • the plurality of color resists are stacked on the passivation layer, and the width of the overlapping portion of the plurality of color resists is greater than the width of the laser path.
  • the present disclosure provides a color filter, a manufacturing method thereof, and a display device.
  • the color filter includes: a substrate; a plurality of sub-pixel regions, wherein each sub-pixel region includes a first signal region and a display device.
  • FIG. 1 shows a schematic diagram showing the laser output to the indium tin oxide layer on the color filter in the prior art.
  • Figure 2 shows a schematic diagram of the laser output destroying the light shielding film.
  • Figure 3 shows a top view of a prior art color filter.
  • FIG. 4 shows a top view of a color filter according to an embodiment of the present disclosure.
  • FIG. 5 shows a flow chart of a method for manufacturing a color filter according to an embodiment of the present disclosure.
  • FIG. 6 shows a cross-sectional view of a display device according to an embodiment of the present disclosure.
  • the present disclosure proposes a color filter, a manufacturing method thereof, and a display device to improve the signal delay caused by the difference in the signal impedance of the indium tin oxide layer.
  • the present disclosure provides a color filter 100, including: a substrate; a plurality of sub-pixel regions are disposed on the substrate, wherein each sub-pixel region includes a first signal region 111 and a second signal region 112, and is disposed on the A laser path 113 between the signal area 111 and the second signal area 112; the first shading sheet 1111 is disposed in the first signal area 111, the first shading sheet 1111 is covered with a first indium tin oxide layer; and the second shading sheet 1112, arranged in the second signal area 112, the second shading sheet 1112 is covered with a second indium tin oxide layer; wherein the first signal area 111 receives signals through the first indium tin oxide layer, and the second signal area 112 passes through the second indium oxide The tin layer receives the signal.
  • the present invention provides the first signal area 111 and the second signal area 112 in the color filter.
  • the area difference is lower, and the signal delay problem caused by the difference in signal impedance between the first signal area 111 and the second signal area 112 is further improved.
  • the design of the laser path 113 prevents the laser from hitting the light shielding film and causing the light shielding film to be damaged. Destroy and reduce the electrical impact on the indium tin oxide layer.
  • the first signal area 111 and the second signal area 112 are respectively connected to a signal source 1110.
  • the signal source 1110 is marked between the first signal area 111 and the second signal area 112.
  • the present invention is not limited to this, and the signal source 1110 can also be arranged in other positions between the non-first signal area 111 and the second signal area 112, for example, outside the color filter 100.
  • the path width of the laser path is determined according to the accuracy of the laser and the length of the resonant cavity.
  • the path width of the laser path 113 is greater than 450 um.
  • the area of the first shading sheet 1111 is smaller than the area of the second shading sheet 1112, the first signal area 111 receives the low voltage signal through the first indium tin oxide layer, and the second signal area 112 passes through the second The indium tin oxide layer receives the high voltage signal.
  • the area with a smaller area of the shading sheet is a low-signal area, and the area with a larger area of the shading sheet is a high-signal area.
  • the area of the first signal area 111 is smaller than the area of the second signal area 112, the first signal area 111 receives the low voltage signal through the first indium tin oxide layer, and the second signal area 112 receives the high voltage signal through the second indium tin oxide layer.
  • an area with a smaller area is a low-signal area
  • an area with a larger area is a high-signal area.
  • FIG. 5 shows a flow chart of a method for manufacturing a color filter according to an embodiment of the present disclosure, including:
  • Process S1 forming a substrate, and the substrate includes a plurality of sub-pixel regions;
  • Process S2 forming a first shading sheet and a second shading sheet in each sub-pixel area of the substrate;
  • Process S3 forming an indium tin oxide layer on the first shading sheet and the second shading sheet;
  • Process S4 applying laser to the indium tin oxide layer to form a laser path
  • the laser path divides the indium tin oxide layer into a first indium tin oxide layer covering the first shading sheet and a second indium tin oxide layer covering the second shading sheet, and the sub-pixel area is divided into a first shading sheet and a second indium tin oxide layer covering the second shading sheet.
  • the first signal area of the first indium tin oxide layer and the second signal area including the second shading sheet and the second indium tin oxide layer.
  • the present disclosure also provides a display device 10, including: a first substrate 200; a plurality of metal layers 210 are provided on the first substrate 200; a passivation layer 220 is provided to cover the first substrate 200 and more A metal layer 210; a plurality of color resists 230 are arranged on the passivation layer 220; a planarization layer 240 is arranged to cover the plurality of color resists 230 and the passivation layer 220.
  • the metal layer 210 can be used to shield light.
  • the display device 10 further includes the above color filter 100, which is disposed on the other side of the first substrate 200, and includes the color filter substrate 110; a plurality of sub-pixel regions are disposed in Below the color filter substrate 110, each sub-pixel area includes a first signal area 111 and a second signal area 112, and a laser path 113 disposed between the first signal area 111 and the second signal area 112;
  • the shading sheet 1111 is arranged in the first signal area 111, and the first shading sheet 1111 is covered by the first indium tin oxide layer 11111;
  • the second shading sheet 1112 is arranged in the second signal area 112, and the second shading sheet 1112 is second oxidized Covered by an indium tin layer 11112; and a spacer layer 300 having a first end surface 301 and a second end surface 302, the first end surface 301 is in contact with the planarization layer 240, and the second end surface 302 is in contact with the first indium tin oxide layer and the second indium tin oxide
  • the first substrate 200 and the color filter substrate 110 are glass substrates.
  • the planarization layer 240 is made of organic materials.
  • the planarization layer 240 is made of a polymer film.
  • the path width of the laser path 113 is greater than 450 um.
  • the path width of the laser path 113 is greater than 450 um, which is not greater than the range of twice the accuracy of the applied laser.
  • the distance f between the adjacent first shading sheet 1111 and the second shading sheet 1112 in the laser path 113 is greater than 450 um.
  • the distance f between the adjacent first shading sheet 1111 and the second shading sheet 1112 in the laser path 113 is greater than 450 um, which is not greater than the range of twice the accuracy of the applied laser.
  • a plurality of color resistors 230 are stacked on the passivation layer 220, and the width d of the overlapping portion of the plurality of color resistors 230 is greater than the width of the laser path 113.
  • a plurality of color resists 230 are stacked on the passivation layer 220, and the width d of the overlapping portion of the plurality of color resists 230 is larger than that of the adjacent first shading sheet in the laser path 113 The distance f between 1111 and the second shading sheet 1112.
  • the present disclosure provides a color filter, a manufacturing method thereof, and a display device, wherein the color filter includes: a substrate; a plurality of sub-pixel areas, wherein each sub-pixel area includes a first signal area and a second signal area , And the laser path arranged in the first signal area and the second signal interval; the first shading sheet is arranged in the first signal area, the first shading sheet is covered with the first indium tin oxide layer; and the second shading sheet is arranged in In the second signal area, the second shading sheet is covered with a second indium tin oxide layer; the first signal area receives signals through the first indium tin oxide layer, and the second signal area receives signals through the second indium tin oxide layer, thereby improving the oxidation The signal transmission delay problem caused by the difference of the signal impedance in the area of the indium tin layer.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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Abstract

一种彩色滤光片（100）及其制造方法和显示装置（10），其中彩色滤光片（100）包括：基板；多个子像素区，其中每一子像素区包含第一讯号区（111）及第二讯号区（112），以及设置于第一讯号区（111）及第二讯号区（112）间的雷射路径（113）；第一遮光片（1111），设置于第一讯号区（111），第一遮光片（1111）上覆盖第一氧化铟锡层（11111）；以及第二遮光片（1112），设置于第二讯号区（112），第二遮光片（1112）上覆盖第二氧化铟锡层（11112）；其中第一讯号区（111）通过第一氧化铟锡层（11111）接收讯号，第二讯号区（112）通过第二氧化铟锡层（11112）接收讯号，从而改善由于氧化铟锡层的区域讯号阻抗差异而导致的讯号传输延迟问题。

Description

彩色滤光片及其制造方法和显示装置 技术领域
本揭示涉及显示技术领域,具体涉及一种彩色滤光片及其制造方法和显示装置。
 背景技术
随着液晶显示器(Liquid Crystal Display, LCD)器件的飞速发展，采用在彩色滤光片(Color Filter, CF)侧多晶片同步固化(Curing)的技术需求越来越迫切。在现有技术中，通过在彩色滤光片(Color Filter, CF)侧对氧化铟锡(Indium Tin Oxides, ITO)层进行镭射，将产品分区而后进行给电固化。请参阅图1，图1显示现有技术中对彩色滤光片上的氧化铟锡层输出镭射的镭射示意图。其中，通过对彩色滤光片侧的氧化铟锡层CF ITO沿着镭射切割线L1输出镭射将彩色滤光片侧的氧化铟锡层CF ITO分成L区及H区，以便在彩色滤光片(Color Filter, CF)侧氧化铟锡层上L区及H区分别输入低电压讯号L和高电压讯号H。
其中，镭射切割路径及分割的区域面积受限于边界遮光区域(black matrix, BM)的排版及晶片之间空置区域大小，请参阅图2，图2显示镭射输出的过程中镭射到遮光膜的示意图。当镭射10输出到遮光膜20，除了会破坏遮光膜完整性，导致漏光的问题之外，还会影响到氧化铟锡层的导电性。
除此之外，现有技术中，高电位讯号ITO区域面积大，仅受限外围空置(dummy)空间区域的排版限制，然而，低电位讯号ITO区域面积小，讯号阻抗相对大。由于低电位ITO区域讯号阻抗相对大，使讯号传输速度受影响，易发生延迟。详细而言，请参阅图3，图3显示现有技术中，高电位讯号ITO区域H与低电位讯号ITO区域L的分布示意图。
故,有需要提供一种彩色滤光片及其制造方法和显示装置,以解决现有技术存在的问题。
 技术问题
其中，镭射切割路径及分割的区域面积受限于边界遮光区域(black matrix, BM)的排版及晶片之间空置区域大小，请参阅图2，图2显示镭射输出的过程中镭射到遮光膜的示意图。当镭射10输出到遮光膜20，除了会破坏遮光膜完整性，导致漏光的问题之外，还会影响到氧化铟锡层的导电性。
除此之外，现有技术中，高电位讯号ITO区域面积大，仅受限外围空置(dummy)空间区域的排版限制，然而，低电位讯号ITO区域面积小，讯号阻抗相对大。由于低电位ITO区域讯号阻抗相对大，使讯号传输速度受影响，易发生延迟。详细而言，请参阅图3，图3显示现有技术中，高电位讯号ITO区域H与低电位讯号ITO区域L的分布示意图。
 技术解决方案
为解决上述问题,本揭示提出一种彩色滤光片及其制造方法和显示装置，从而改善由于氧化铟锡层的区域讯号阻抗差异而导致的讯号延迟问题。
为达成上述目的，本揭示提供一种彩色滤光片,包括:基板；多个子像素区，其中每一子像素区包含第一讯号区及第二讯号区，以及设置于所述第一讯号区及所述第二讯号区间的雷射路径；第一遮光片，设置于所述第一讯号区，所述第一遮光片上覆盖第一氧化铟锡层；以及第二遮光片，设置于所述第二讯号区，所述第二遮光片上覆盖第二氧化铟锡层；其中所述第一讯号区通过所述第一氧化铟锡层接收讯号，所述第二讯号区通过所述第二氧化铟锡层接收讯号。
于本揭示其中的一实施例中，所述雷射路径的路径宽度大于450um。
于本揭示其中的一实施例中，所述第一遮光片的面积小于所述第二遮光片的面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
于本揭示其中的一实施例中，所述第一讯号区的区域面积小于所述第二讯号区的区域面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
为达成上述目的，本揭示还提供一种彩色滤光片的制造方法，包括:形成基板，所述基板包含多个子像素区；形成第一遮光片与第二遮光片于所述基板的每一子像素区中；形成氧化铟锡层于所述第一遮光片与所述第二遮光片上方；以及施加镭射于所述氧化铟锡层形成雷射路径；其中，所述雷射路径将所述氧化铟锡层区分为覆盖所述第一遮光片的第一氧化铟锡层与覆盖所述第二遮光片的第二氧化铟锡层，将所述子像素区区分为包含所述第一遮光片及所述第一氧化铟锡层的第一讯号区及包含所述第二遮光片及所述第二氧化铟锡层的第二讯号区。
于本揭示其中的一实施例中，所述雷射路径的路径宽度大于450um。
于本揭示其中的一实施例中，所述第一遮光片的面积小于所述第二遮光片的面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
为达成上述目的，本揭示再提供一种显示装置，包括:第一基板；多个金属层，设置在所述第一基板上；钝化层，设置为覆盖所述第一基板及所述多个金属层；多个色阻，设置在所述钝化层上；平坦化层，设置为包覆所述多个色阻及所述钝化层；第二基板，设置在相对所述第一基板的另一侧；多个子像素区，设置在所述第二基板下方，其中每一子像素区包含第一讯号区及第二讯号区，以及设置于所述第一讯号区及所述第二讯号区间的雷射路径；第一遮光片，设置于所述第一讯号区，所述第一遮光片被第一氧化铟锡层覆盖；第二遮光片，设置于所述第二讯号区，所述第二遮光片被第二氧化铟锡层覆盖；以及间隔层，具有第一端面及第二端面，所述第一端面接触所述平坦化层，所述第二端面接触所述第一氧化铟锡层及所述第二氧化铟锡层；其中所述第一讯号区通过所述第一氧化铟锡层接收讯号，所述第二讯号区通过所述第二氧化铟锡层接收讯号，所述多个色阻的设置位置对准在所述雷射路径的设置位置下方。
于本揭示其中的一实施例中，所述第一遮光片的面积小于所述第二遮光片的面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
于本揭示其中的一实施例中，所述多个色阻堆叠的设置在所述钝化层上，其中所述多个色阻重叠部份的宽度大于所述雷射路径的宽度。
 有益效果
相较于现有技术，本揭示提供一种彩色滤光片及其制造方法和显示装置，其中彩色滤光片包括:基板；多个子像素区，其中每一子像素区包含第一讯号区及第二讯号区，以及设置于第一讯号区及第二讯号区间的雷射路径；第一遮光片，设置于第一讯号区，第一遮光片上覆盖第一氧化铟锡层；以及第二遮光片，设置于第二讯号区，第二遮光片上覆盖第二氧化铟锡层；其中第一讯号区通过第一氧化铟锡层接收讯号，第二讯号区通过第二氧化铟锡层接收讯号，从而改善由于氧化铟锡层的区域讯号阻抗差异而导致的讯号传输延迟问题。
 附图说明
图1显示显示现有技术中对彩色滤光片上的氧化铟锡层输出镭射的镭射示意图。
图2显示镭射输出破坏遮光膜的示意图。
图3显示现有技术的彩色滤光片上视图。
图4显示根据本揭示的一实施例的彩色滤光片上视图。
图5显示根据本揭示的一实施例提供的一种彩色滤光片制造方法流程图。
图6显示根据本揭示的一实施例的显示装置横截面图。
 本发明的实施方式
以下实施例的说明是参考附加的图示,用以例示本揭示可用以实施的特定实施例。本揭示所提到的方向用语,例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本揭示,而非用以限制本揭示。
在图中,结构相似的单元是以相同标号表示。
为解决上述问题,本揭示提出一种彩色滤光片及其制造方法和显示装置，以改善由于氧化铟锡层的区域讯号阻抗差异而导致的讯号延迟问题。
请参阅图4，图4显示根据本揭示的一实施例的彩色滤光片上视图。其中，本揭示提供一种彩色滤光片100,包括:基板；多个子像素区，设置在基板上，其中每一子像素区包含第一讯号区111及第二讯号区112，以及设置于第一讯号区111及第二讯号区112间的雷射路径113；第一遮光片1111，设置于第一讯号区111，第一遮光片1111上覆盖第一氧化铟锡层；以及第二遮光片1112，设置于第二讯号区112，第二遮光片1112上覆盖第二氧化铟锡层；其中第一讯号区111通过第一氧化铟锡层接收讯号，第二讯号区112通过第二氧化铟锡层接收讯号，通过上述设置，相较于图3揭示的高电位讯号ITO区域H与低电位讯号ITO区域L，本发明提供彩色滤光片中第一讯号区111及第二讯号区112的区域面积差异更低，进一步改善第一讯号区111及第二讯号区112的区域讯号阻抗差异而导致的讯号延迟问题，同时通过雷射路径113的设计，避免镭射到遮光膜而致使遮光膜被破坏以及降低对氧化铟锡层的电性影响。
其中，第一讯号区111及第二讯号区112分别连接讯号源1110，其中图4是为标明讯号源而将讯号源1110标示在第一讯号区111与第二讯号区112之间，然而，本发明不限于此，讯号源1110也可设置在非第一讯号区111与第二讯号区112之间的其他位置，例如，彩色滤光片100之外。
其中，雷射路径的路径宽度是根据雷射的精度及共振腔长度而决定。举例而言，于本揭示其中的一实施例中，雷射路径113的路径宽度大于450um。
于本揭示其中的一实施例中，第一遮光片1111的面积小于第二遮光片1112的面积，第一讯号区111通过第一氧化铟锡层接收低压讯号，第二讯号区112通过第二氧化铟锡层接收高压讯号。换言之，遮光片面积较小的区域为低讯号区，遮光片面积较大的区域为高讯号区。
或者，于本揭示其中的一实施例中，第一讯号区111的区域面积小于第二讯号区112的区域面积，第一讯号区111通过第一氧化铟锡层接收低压讯号，第二讯号区112通过第二氧化铟锡层接收高压讯号。换言之，区域面积较小的区域为低讯号区，区域面积较大的区域为高讯号区。
请参照图5，图5显示本揭示的一实施例提供的一种彩色滤光片制造方法流程图，包括:
流程S1:形成基板，基板包含多个子像素区；
流程S2:形成第一遮光片与第二遮光片于基板的每一子像素区中；
流程S3:形成氧化铟锡层于第一遮光片与第二遮光片上方；以及
流程S4:施加镭射于氧化铟锡层形成雷射路径；
其中，雷射路径将氧化铟锡层区分为覆盖第一遮光片的第一氧化铟锡层与覆盖第二遮光片的第二氧化铟锡层，将子像素区区分为包含第一遮光片及第一氧化铟锡层的第一讯号区及包含第二遮光片及第二氧化铟锡层的第二讯号区。
请参照图6，本揭示还提出一种显示装置10，包括:第一基板200；多个金属层210，设置在第一基板200上；钝化层220，设置为覆盖第一基板200及多个金属层210；多个色阻230，设置在钝化层220上；平坦化层240，设置为包覆多个色阻230及钝化层220。其中，金属层210可用于遮光。
请一并参照图4与图6，显示装置10还包括如上的彩色滤光片100，设置在相对第一基板200的另一侧，包含彩色滤光片基板110；多个子像素区，设置在彩色滤光片基板110下方，其中每一子像素区包含第一讯号区111及第二讯号区112，以及设置于第一讯号区111及第二讯号区112间的雷射路径113；第一遮光片1111，设置于第一讯号区111，第一遮光片1111被第一氧化铟锡层11111覆盖；第二遮光片1112，设置于第二讯号区112，第二遮光片1112被第二氧化铟锡层11112覆盖；以及间隔层300，具有第一端面301及第二端面302，第一端面301接触平坦化层240，第二端面302接触第一氧化铟锡层及第二氧化铟锡层；其中第一讯号区111通过第一氧化铟锡层接收讯号，第二讯号区112通过第二氧化铟锡层接收讯号，多个色阻230的设置位置对准在雷射路径113的设置位置下方。
于本揭示的一实施例中，第一基板200与彩色滤光片基板110为玻璃基板。
于本揭示的一实施例中，平坦化层240是由有机材料构成。
于本揭示的一实施例中，平坦化层240是由聚合物薄膜构成。
于本揭示的一实施例中，雷射路径113的路径宽度大于450um。
于本揭示的一实施例中，雷射路径113的路径宽度大于450um，不大于所施加雷射精度的2倍范围。
于本揭示的一实施例中，在雷射路径113中相邻的第一遮光片1111与第二遮光片1112的间距f大于450um。
于本揭示的一实施例中，在雷射路径113中相邻的第一遮光片1111与第二遮光片1112的间距f大于450um，不大于所施加雷射精度的2倍范围。
于本揭示的一实施例中，多个色阻230堆叠的设置在钝化层220上，其中多个色阻230重叠部份的宽度d大于雷射路径113的宽度。
于本揭示的一实施例中，多个色阻230堆叠的设置在钝化层220上，其中多个色阻230重叠部份的宽度d大于在雷射路径113中相邻的第一遮光片1111与第二遮光片1112的间距f。
由于本揭示所提供的一种彩色滤光片及其制造方法和显示装置，其中彩色滤光片包括:基板；多个子像素区，其中每一子像素区包含第一讯号区及第二讯号区，以及设置于第一讯号区及第二讯号区间的雷射路径；第一遮光片，设置于第一讯号区，第一遮光片上覆盖第一氧化铟锡层；以及第二遮光片，设置于第二讯号区，第二遮光片上覆盖第二氧化铟锡层；其中第一讯号区通过第一氧化铟锡层接收讯号，第二讯号区通过第二氧化铟锡层接收讯号，从而改善由于氧化铟锡层的区域讯号阻抗差异而导致的讯号传输延迟问题。
以上仅是本揭示的优选实施方式,应当指出,对于本领域普通技术人员,在不脱离本揭示原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本揭示的保护范围。

Claims (16)

  1. 一种彩色滤光片，其包括:
    彩色滤光片基板；
    多个子像素区，其中每一子像素区包含第一讯号区及第二讯号区，以及设置于所述第一讯号区及所述第二讯号区间的雷射路径；
    第一遮光片，设置于所述第一讯号区，所述第一遮光片上覆盖第一氧化铟锡层；以及
    第二遮光片，设置于所述第二讯号区，所述第二遮光片上覆盖第二氧化铟锡层；
    其中所述第一讯号区通过所述第一氧化铟锡层接收讯号，所述第二讯号区通过所述第二氧化铟锡层接收讯号。
  2. 如权利要求1所述之彩色滤光片，其中，所述雷射路径的路径宽度大于450um。
  3. 如权利要求1所述之彩色滤光片，其中，所述第一遮光片的面积小于所述第二遮光片的面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
  4. 如权利要求1所述之彩色滤光片，其中，所述第一讯号区的区域面积小于所述第二讯号区的区域面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
  5. 一种彩色滤光片的制造方法，其包括:
    形成基板，所述基板包含多个子像素区；
    形成第一遮光片与第二遮光片于所述基板的每一子像素区中；
    形成氧化铟锡层于所述第一遮光片与所述第二遮光片上方；以及
    施加镭射于所述氧化铟锡层形成雷射路径；
    其中，所述雷射路径将所述氧化铟锡层区分为覆盖所述第一遮光片的第一氧化铟锡层与覆盖所述第二遮光片的第二氧化铟锡层，将所述子像素区区分为包含所述第一遮光片及所述第一氧化铟锡层的第一讯号区及包含所述第二遮光片及所述第二氧化铟锡层的第二讯号区。
  6. 如权利要求5所述之彩色滤光片的制造方法，其中，所述雷射路径的路径宽度大于450um。
  7. 如权利要求5所述之彩色滤光片的制造方法，其中，所述第一遮光片的面积小于所述第二遮光片的面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
  8. 如权利要求5所述之彩色滤光片的制造方法，其中，所述第一讯号区的区域面积小于所述第二讯号区的区域面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
  9. 一种显示装置，其包括:
    第一基板；
    多个金属层，设置在所述第一基板上；
    钝化层，设置为覆盖所述第一基板及所述多个金属层；
    多个色阻，设置在所述钝化层上；
    平坦化层，设置为包覆所述多个色阻及所述钝化层；
    如权利要求1所述的彩色滤光片，设置在相对所述第一基板的另一侧；以及
    间隔层，具有第一端面及第二端面，所述第一端面接触所述平坦化层，所述第二端面接触所述第一氧化铟锡层及所述第二氧化铟锡层；
    其中所述多个色阻的设置位置对准在所述雷射路径的设置位置下方。
  10. 如权利要求9所述之显示装置，其中，所述雷射路径的路径宽度大于450um。
  11. 如权利要求9所述之显示装置，其中，所述多个色阻堆叠的设置在所述钝化层上，其中所述多个色阻重叠部份的宽度大于所述雷射路径的宽度。
  12. 如权利要求9所述之显示装置，其中，所述第一遮光片的面积小于所述第二遮光片的面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
  13. 如权利要求9所述之显示装置，其中，所述第一讯号区的区域面积小于所述第二讯号区的区域面积，所述第一讯号区通过所述第一氧化铟锡层接收低压讯号，所述第二讯号区通过所述第二氧化铟锡层接收高压讯号。
  14. 如权利要求9所述之显示装置，其中，所述第一基板与彩色滤光片基板为玻璃基板。
  15. 如权利要求9所述之显示装置，其中，所述雷射路径中相邻的所述第一遮光片与所述第二遮光片的间距大于450um，不大于所施加雷射精度的2倍。
  16. 如权利要求9所述之显示装置，其中，所述多个色阻堆叠的设置在所述钝化层上，其中所述多个色阻重叠部份的宽度大于在所述雷射路径中相邻的所述第一遮光片与所述第二遮光片的间距。
PCT/CN2019/126207 2019-12-02 2019-12-18 彩色滤光片及其制造方法和显示装置 WO2021109250A1 (zh)

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