WO2020259561A1

WO2020259561A1 - Color filter substrate, manufacturing method therefor, and display apparatus

Info

Publication number: WO2020259561A1
Application number: PCT/CN2020/098026
Authority: WO
Inventors: 曹军红
Original assignee: 惠科股份有限公司; 重庆惠科金渝光电科技有限公司
Priority date: 2019-06-26
Filing date: 2020-06-24
Publication date: 2020-12-30
Also published as: CN110231733A

Abstract

Disclosed is a color filter substrate, comprising a base substrate (100); black matrixes (200) arranged on the surface of the base substrate, and defining multiple light-transmitting areas on the base substrate; and a color resist layer (300) comprising a first color resist (310), a second color resist (320), a third color resist (330), and a fourth color resist (340). A first light-transmitting area is provided with the first color resist (310); a second light-transmitting area is provided with the second color resist (320); a third light-transmitting area is provided with the third color resist (330); a fourth light-transmitting area is provided with the first color resist (310) and the fourth color resist (340); a fifth light-transmitting area is provided with the second color resist (320) and the fourth color resist (340); a sixth light-transmitting area is provided with the third color resist (330) and the fourth color resist (340); and the light transmittance of the fourth color resist (340) is greater than that of the other color resists.

Description

Color film substrate, manufacturing method thereof and display device

Cross references to related applications

This application claims the priority of a Chinese patent application filed with the Chinese Patent Office on June 26, 2019. The application number is 2019105612505, and the application name is "color film substrate and its production method and display device". The entire content is incorporated by reference. In this application.

Technical field

This application relates to the field of display technology, and in particular to a color filter substrate, a manufacturing method thereof, and a display device.

Background technique

The statements here only provide background information related to this application, and do not necessarily constitute prior art. Currently, LCD (Liquid Crystal Display) is one of the most widely used displays. The LCD includes a pair of substrates provided with field generating electrodes such as pixel electrodes and common electrodes, and a liquid crystal layer provided between the two substrates. When a voltage is applied to the field generating electrode to generate an electric field in the liquid crystal layer, the liquid crystal molecules are deflected under the action of the electric field, so that the transmission of light can be controlled to make the LCD display an image. However, in view of the axial light transmittance of liquid crystal molecules, there has always been a problem of large visual role deviation in liquid crystal displays.

Summary of the invention

The application provides a color filter substrate, a manufacturing method thereof, and a display device.

A color film substrate, including:

Base substrate

The black matrix is arranged on the surface of the base substrate and defines a plurality of light-transmitting areas on the base substrate, wherein the first light-transmitting area, the second light-transmitting area, and the third light-transmitting area are distributed in the pixel area The fourth light-transmitting area, the fifth light-transmitting area and the sixth light-transmitting area are distributed in the bright area of the pixel area; and

The color resist layer includes a first color resist, a second color resist, a third color resist, and a fourth color resist, wherein the first light transmitting area is provided with the first color resist, and the second light transmitting area The second color resist is provided, the third light-transmitting area is provided with the third color resist, the fourth light-transmitting area is provided with the first color resist and the fourth color resist, the The fifth light transmitting area is provided with the second color resist and the fourth color resist, the sixth light transmitting area is provided with the third color resist and the fourth color resist, and the first color resist , The second color resist, the third color resist and the fourth color resist are arranged in the same layer, and the light transmittance of the fourth color resist is greater than that of other color resists.

A manufacturing method of a color film substrate includes:

A black matrix is formed on a base substrate, and the black matrix defines a plurality of light-transmitting areas on the base substrate, wherein the first light-transmitting area, the second light-transmitting area, and the third light-transmitting area are distributed in the pixel area The fourth light-transmitting area, the fifth light-transmitting area and the sixth light-transmitting area are distributed in the bright area of the pixel area; and

A color resist layer is formed on the base substrate on which the black matrix is formed, and the color resist layer includes a first color resist, a second color resist, a third color resist, and a fourth color resist. The area is provided with the first color resist, the second light transmitting area is provided with the second color resist, the third light transmitting area is provided with the third color resist, and the fourth light transmitting area is provided There are the first color resist and the fourth color resist, the fifth light transmitting area is provided with the second color resist and the fourth color resist, and the sixth light transmitting area is provided with the first The three color resists and the fourth color resist, the first color resist, the second color resist, the third color resist and the fourth color resist are arranged in the same layer, and the fourth color resist The light transmittance is greater than that of other color resists.

A display device including the color filter substrate as described above.

In this application, the first color resist and the fourth color resist are arranged in the fourth light transmission area, the second color resist and the fourth color resist are arranged in the fifth light transmission area, and the third color resist is arranged in the sixth light transmission area. And the fourth color resist, to change the light transmittance of the color resist layer in part of the light-transmitting area, thereby dividing the light transmission of the pixel into a bright area and a dark area, so as to improve the large viewing angle in the liquid crystal display.

Description of the drawings

In order to more clearly describe the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings needed in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained from these drawings without creative work.

1 is a schematic diagram of a cross-sectional structure of a color filter substrate provided by an embodiment of the application;

2 is a top view of a color filter substrate provided by an embodiment of the application;

3 is a schematic cross-sectional structure diagram of another color filter substrate provided by an embodiment of the application;

4 is a schematic flow chart of a method for manufacturing a color filter substrate provided by an embodiment of the application;

5 is a schematic flow chart of a specific manufacturing method of the color resist layer provided by an embodiment of the application;

FIG. 6 is a schematic flowchart of another method for manufacturing a color filter substrate provided by an embodiment of the application.

Detailed ways

In order to make the purpose, technical solutions, and advantages of this application clearer, the following further describes this application in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are used to explain the application, and are not used to limit the application.

In view of the problem of large-view role deviation, there are currently many mainstream solutions. Among them, the MVA (Multi-domain Vertical Alignment) type display panel adopts a voltage division method to divide the light transmission of each pixel into bright The area and the dark area are optically expressed as a mixture of two VT characteristics to suppress the problem of role deviation in large vision, but this method will cause the complexity of the gamma voltage adjustment.

In view of the above-mentioned problem of large-view role deviation, an embodiment of the present application provides a color filter substrate. Please refer to FIG. 1 and FIG. 2. The color filter substrate includes a base substrate 100, a black matrix 200 and a color resist layer 300.

The black matrix 200 is disposed on the surface of the base substrate 100, and defines a plurality of light-transmitting areas on the base substrate 100, wherein a first light-transmitting area, a second light-transmitting area, and a third light-transmitting area are defined on the base substrate 100 Distributed in the dark area of the pixel area, and the fourth light transmission area, the fifth light transmission area and the sixth light transmission area are distributed in the bright area of the pixel area.

The color resist layer 300 includes a first color resist 310, a second color resist 320, a third color resist 330, and a fourth color resist 340, wherein the first light-transmitting area is provided with the first color resist 310, The second light transmitting area is provided with the second color resist 320, the third light transmitting area is provided with the third color resist 330, and the fourth light transmitting area is provided with the first color resist 310 And the fourth color resist 340, the fifth light transmitting area is provided with the second color resist 320 and the fourth color resist 340, and the sixth light transmitting area is provided with the third color resist 330 and the The fourth color resist 340, the first color resist 310, the second color resist 320, the third color resist 330 and the fourth color resist 340 are arranged in the same layer, and the fourth color resist 340 The light transmittance of is greater than that of other color resists.

It can be understood that in this embodiment, the first color resist 310 and the fourth color resist 340 are arranged in the fourth light transmission area, the second color resist 320 and the fourth color resist 340 are arranged in the fifth light transmission area, and the Set up a third color resist 330 and a fourth color resist 340, use different color resist structures to change the light transmittance of part of the light-transmitting area, increase the brightness of this part of the light-transmitting area, and divide the pixel transmittance into bright and dark areas , In order to improve the problem of large viewing angle in the LCD display, suppressing the whitening of the middle gray level when the viewing angle is large.

In one of the embodiments, the first color resist 310 is a red color resist, the second color resist 320 is a green color resist, the third color resist 330 is a blue color resist, and the fourth color resist 340 It is a white color resist. In the fourth, fifth, and sixth light-transmitting regions, the area of the red/green/blue color resist and the area of the white color resist The ratio of 1.5 to 2.3.

In this embodiment, the first light-transmitting area is provided with a red color resist, the second light-transmitting area is provided with a green color resist, the third light-transmitting area is provided with a blue color resist, and the fourth light-transmitting area is provided with a blue color resist. A red color resist and a white color resist are arranged in the light area, a green color resist and a white color resist are arranged in the fifth light transmitting area, and a blue color resist and a white color resist are arranged in the sixth light transmitting area. Among them, in the fourth light transmission area, the fifth light transmission area and the sixth light transmission area, since the white color resist is added, the light transmittance of the white color resist is greater than the light transmittance of the other color resists. Therefore, the fourth The light-transmitting area, the fifth light-transmitting area and the sixth light-transmitting area all have a higher light transmittance, thereby forming a bright area, that is, by changing the color resistance structure of the part of the light-transmitting area, the pixel light transmission is divided into a bright area and a dark area. Area.

It can be understood that since the pixels are divided into dark areas (corresponding to area A in Figure 2) and bright areas (corresponding to area B in Figure 2), the chromaticity of the pixels is determined by the chromaticity of the bright area and the dark area. The chromaticity is determined together, so the chromaticity of the pixel area should be calculated according to the actual design. For example, the chromaticity of the pixel area in this embodiment is S(x, y), where x _mix = ax _RA + bx _RB , y _mix = a′y _RA + b′y _RB , a, b, a′ and b′ is the chromaticity coefficient, x _RA and x _RB are the chromaticities of the dark and bright regions on R _x , respectively, and y _RA and y _RB are the chromatics of the dark and bright regions on R _y , respectively. The luminous flux of the pixel area is Y _mix = a "Y _RA + b" Y _RB , where Y _RA and Y _RB are the luminous fluxes of the dark and bright areas, respectively, and a" and b" are the luminous flux coefficients of the dark and bright areas, respectively . According to calculation and simulation, the ratio of the area of the red/green/blue color resistance to the area of the white color resistance is controlled within 1.5-2.3, which can effectively improve the problem of large-vision role deviation without being affected by excessive white light. The chroma of the picture affects the vividness.

In one of the embodiments, the thickness of the color resist layer 300 is 2 to 4 μm. In this embodiment, the thickness of the color resist layer 300 is controlled in the range of 2 to 4 μm, which not only can ensure the light transmittance without causing the brightness of the picture to be dark, but also can affect the vividness of the picture because the color resist layer 300 is too thin .

In one of the embodiments, referring to FIG. 3, the color filter substrate further includes a planarization layer 400 disposed on a side of the color resist layer 300 facing away from the base substrate 100, And cover the color resist layer 300. It can be understood that in the process of manufacturing the color resist layer 300, in order to prevent light leakage, the color resist layer 300 overlaps the black matrix 200, thereby forming a height difference. In addition, red, green, and blue color resists with the same film thickness have different light transmittance. In order to compensate for the difference in light transmittance of the three color resist materials, red color resist and green color resist Generally, different film thicknesses are used for the color resistance and blue color resistance. In the actual process, the film thickness of the red color resistance and the green color resistance are almost the same, while the blue color resistance adopts a slightly thicker film thickness than the red color resistance and the green color resistance. Therefore, a certain height difference will also be formed between the color resistors, which will affect the flatness of the color filter substrate. Since the subsequent alignment film production and rubbing orientation and other processes will be carried out on this basis, the flatness of the color film substrate will have a great impact on the display, and the poor flatness of the color film substrate will cause various types of uneven displays. area. In this embodiment, the black matrix 200, the color resist layer 300, and the planarization layer 400 are arranged on the same side of the base substrate 100. The planarization layer 400 can be used to planarize the height difference to improve color The flatness of the film substrate further improves the display quality of the picture.

In one of the embodiments, the color filter substrate further includes a transparent electrode layer 500. The transparent electrode layer 500 is provided on the side of the planarization layer 400 facing away from the color resist layer 300, and is a transparent conductive electrode layer. . It can be understood that after the cell matching process is completed, an electric field is formed through the pixel electrode layers in the transparent electrode layer 500 and the array substrate to drive the deflection of the liquid crystal molecules to realize image display.

In one of the embodiments, the ratio of the area of the dark area to the area of the bright area is 1.5 to 2.3. In this embodiment, the ratio of the area of the dark area to the area of the bright area is controlled within the range of 1.5 to 2.3, and the overall brightness of the pixel area is reduced, so as to solve the problem of mid-gray whitening at large viewing angles. At the same time, avoid excessively high light intensity in bright areas and affect the chromaticity of the picture.

Based on the same technical concept, an embodiment of the present application also provides a manufacturing method of a color filter substrate. Please refer to FIG. 4, and the manufacturing method includes:

In step S410, a black matrix 200 is formed on the base substrate 100. The black matrix 200 defines a plurality of light-transmitting areas on the base substrate 100, wherein the first light-transmitting area, the second light-transmitting area and the third The light transmission area is distributed in the dark area of the pixel area, and the fourth light transmission area, the fifth light transmission area and the sixth light transmission area are distributed in the bright area of the pixel area;

In step S420, a color resist layer 300 is formed on the base substrate 100 on which the black matrix 200 is formed. The color resist layer 300 includes a first color resist 310, a second color resist 320, a third color resist 330, and a fourth color resist. 340, wherein the first transparent region is provided with the first color resist 310, the second transparent region is provided with the second color resist 320, and the third transparent region is provided with the The third color resist 330, the fourth light transmitting area is provided with the first color resist 310 and the fourth color resist 340, and the fifth light transmitting area is provided with the second color resist 320 and the The fourth color resist 340, the sixth light-transmitting area is provided with a third color resist 330 and the fourth color resist 340, the first color resist 310, the second color resist 320, and the third color resist The resist 330 and the fourth color resist 340 are arranged in the same layer, and the light transmittance of the fourth color resist 340 is greater than that of other color resists.

In this embodiment, the first color resist 310 and the fourth color resist 340 are arranged in the fourth light-transmitting area, the second color resist 320 and the fourth color resist 340 are arranged in the fifth light-transmitting area, and the sixth light-transmitting area is arranged. The third color resist 330 and the fourth color resist 340 use different color resist structures to change the light transmittance of a part of the light-transmitting area, improve the brightness of the light-transmitting area, and use different color resist structures to divide the light transmission of the pixel into Bright and dark areas, to improve the problem of large-view role deviation in liquid crystal displays, and suppress mid-gray whitening at large viewing angles.

Referring to FIG. 5, in one of the embodiments, forming the color resist layer 300 on the base substrate 100 on which the black matrix 200 is formed includes:

Step S421, coating a first color resist 310 material on the base substrate 100, and forming the first color resist in the first light-transmitting area and the fourth light-transmitting area through a first patterning process 310;

Step S422, coating a second color resist 320 material on the base substrate 100, and forming the second color resist in the second light-transmitting area and the fifth light-transmitting area through a second patterning process 320;

Step S423, coating a third color resist 330 material on the base substrate 100, and forming the third color resist in the third light-transmitting area and the sixth light-transmitting area through a third patterning process 330;

Step S424, coating a fourth color resist 340 material on the base substrate 100, and forming the fourth light-transmitting area, the fifth light-transmitting area and the sixth light-transmitting area through a fourth patterning process The fourth color resistance 340 in the.

In this embodiment, the specific process of the patterning process includes processes such as coating, mask exposure, and development. The steps in this process are all known technologies and will not be repeated here. Compared with the usual production process of the color filter substrate, the production process of the color filter substrate in this embodiment adopts an increased number of three exposure and development processes, so that the pixel area has a different color resist structure to form a dark with different light transmittance. Area and bright area, that is, under the same gamma driving voltage, the pixel area will also show a bright area and a dark area. Therefore, there is no need to set up an additional voltage divider circuit. The voltage division method is used to form a dark area and a dark area in the pixel area. Bright area.

In one of the embodiments, the first color resist 310 is a red color resist, the second color resist 320 is a green color resist, the third color resist 330 is a blue color resist, and the fourth color resist 340 Is a white color resist; in the fourth light-transmitting area, the fifth light-transmitting area, and the sixth light-transmitting area, the area of the red color resist, the green color resist or the blue color resist is the same as the white The ratio of the area of the color resistance is 1.5 to 2.3. In this embodiment, the ratio of the area of the red/green/blue color resistance to the area of the white color resistance is controlled within 1.5 to 2.3, which can effectively improve the problem of large-vision role deviation, and it will not be caused by excessive white light. Affect the chromaticity of the picture, and thus the vividness.

In one of the embodiments, referring to FIG. 6, the manufacturing method further includes:

In step S430, a planarization layer 400 is formed on the base substrate 100 on which the color resist layer 300 is formed, and the planarization layer 400 is disposed on the side of the color resist layer 300 facing away from the base substrate 100, and Cover the color resist layer 300. In this embodiment, the black matrix 200, the color resist layer 300 and the planarization layer 400 are arranged on the same side of the base substrate 100, and the planarization layer 400 can overlap the color resist layer 300 and the black matrix 200. The resulting height difference and the like are flattened to improve the flatness of the color filter substrate, thereby improving the image display quality.

In one of the embodiments, the manufacturing method further includes:

In step S440, a transparent electrode layer 500 is formed on the base substrate 100 on which the planarization layer 400 is formed, and the transparent electrode layer 500 is disposed on the side of the planarization layer 400 facing away from the color resist layer 300. In this embodiment, a magnetron sputtering method is used to form a transparent conductive material layer on the surface of the flat layer, such as ITO (Indium tin oxide, indium tin oxide) and other transparent conductive materials, and then the plate is formed by a laser etching process The transparent electrode layer 500 in a shape. It can be understood that after the cell matching process is completed, an electric field is formed through the pixel electrode layers in the transparent electrode layer 500 and the array substrate to drive the deflection of the liquid crystal molecules to realize image display.

Based on the same technical concept, an embodiment of the present application also provides a display device, which includes the color filter substrate described in any of the foregoing embodiments.

In summary, the embodiments of the present application provide a color filter substrate, a manufacturing method thereof, and a display device. The color filter substrate includes a base substrate 100, a black matrix 200 and a color resist layer 300. The black matrix 200 is disposed on the surface of the base substrate 100, and defines a plurality of light-transmitting areas on the base substrate 100, wherein a first light-transmitting area, a second light-transmitting area, and a third light-transmitting area are defined on the base substrate 100 Distributed in the dark area of the pixel area, and the fourth light transmission area, the fifth light transmission area and the sixth light transmission area are distributed in the bright area of the pixel area. The color resist layer 300 includes a first color resist 310, a second color resist 320, a third color resist 330, and a fourth color resist 340, wherein the first light-transmitting area is provided with the first color resist 310, The second light transmitting area is provided with the second color resist 320, the third light transmitting area is provided with the third color resist 330, and the fourth light transmitting area is provided with the first color resist 310 And the fourth color resist 340, the fifth light transmitting area is provided with the second color resist 320 and the fourth color resist 340, and the sixth light transmitting area is provided with the third color resist 330 and the The fourth color resist 340, the first color resist, the second color resist, the third color resist and the fourth color resist are arranged in the same layer, and the light transmittance of the fourth color resist The light transmittance is greater than other color resists. In this application, the first color resist 310 and the fourth color resist 340 are arranged in the fourth light transmission area, the second color resist 320 and the fourth color resist 340 are arranged in the fifth light transmission area, and the second color resist is arranged in the sixth light transmission area. The three-color resist 330 and the fourth color resist 340 change the light transmittance of the color resist layer 300 in part of the light-transmitting area, thereby dividing the light transmission of the pixel into bright and dark areas, so as to improve the problem of large-view role deviation in liquid crystal displays .

The technical features of the above-mentioned embodiments can be combined arbitrarily. In order to make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, All should be considered as the scope of this specification.

The above-mentioned embodiments only express a few implementation modes of the present application, and their description is relatively specific and detailed, but they should not be understood as a limitation on the scope of the patent application. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of this application, several modifications and improvements can be made, and these all fall within the protection scope of this application. Therefore, the scope of protection of the patent of this application shall be subject to the appended claims.

Claims

A color film substrate, including:

Base substrate

The black matrix is arranged on the surface of the base substrate and defines a plurality of light-transmitting areas on the base substrate, wherein the first light-transmitting area, the second light-transmitting area, and the third light-transmitting area are distributed in the pixel area The fourth light-transmitting area, the fifth light-transmitting area and the sixth light-transmitting area are distributed in the bright area of the pixel area; and

The color resist layer includes a first color resist, a second color resist, a third color resist, and a fourth color resist, wherein the first light transmitting area is provided with the first color resist, and the second light transmitting area The second color resist is provided, the third light-transmitting area is provided with the third color resist, the fourth light-transmitting area is provided with the first color resist and the fourth color resist, the The fifth light transmitting area is provided with the second color resist and the fourth color resist, the sixth light transmitting area is provided with the third color resist and the fourth color resist, and the first color resist , The second color resist, the third color resist and the fourth color resist are arranged in the same layer, and the light transmittance of the fourth color resist is greater than that of other color resists.
The color filter substrate of claim 1, wherein the first color resist is a red color resist, the second color resist is a green color resist, the third color resist is a blue color resist, and the fourth color resist is The color resistance is white color resistance.
The color filter substrate of claim 2, wherein in the fourth light-transmitting area, the fifth light-transmitting area, and the sixth light-transmitting area, the red color resist, the green color resist or the blue color resist The ratio of the area of the color resistance to the area of the white color resistance is 1.5 to 2.3.
3. The color filter substrate of claim 1, wherein the pixel area includes a plurality of pixels, and the chromaticity of the pixels is determined by the chromaticity of the bright area and the chromaticity of the dark area.
3. The color filter substrate of claim 1, wherein the color resist layer has a thickness of 2 to 4 μm.
3. The color filter substrate of claim 1, further comprising a planarization layer, the planarization layer is disposed on a side of the color resist layer facing away from the base substrate and covers the color resist layer.
8. The color filter substrate of claim 1, wherein the color resist layer and the black matrix overlap to form a height difference.
8. The color filter substrate according to claim 6, further comprising a transparent electrode layer disposed on a side of the planarization layer facing away from the color resist layer.
7. The color filter substrate of claim 6, wherein the black matrix, the color resist layer and the planarization layer are arranged on the same side of the base substrate.
3. The color filter substrate of claim 2, wherein the film thickness of the blue color resist is greater than the film thickness of the red color resist or the green color resist.
3. The color filter substrate of claim 2, wherein the red color resist and the green color resist have the same film thickness.
3. The color filter substrate of claim 1, wherein the ratio of the area of the dark area to the area of the bright area is 1.5 to 2.3.
A manufacturing method of a color film substrate includes:

A black matrix is formed on a base substrate, and the black matrix defines a plurality of light-transmitting areas on the base substrate, wherein the first light-transmitting area, the second light-transmitting area, and the third light-transmitting area are distributed in the pixel area The dark area of the pixel area, the fourth light transmitting area, the fifth light transmitting area and the sixth light transmitting area are distributed in the bright area of the pixel area;

A color resist layer is formed on the base substrate on which the black matrix is formed, and the color resist layer includes a first color resist, a second color resist, a third color resist, and a fourth color resist. The area is provided with the first color resist, the second light transmitting area is provided with the second color resist, the third light transmitting area is provided with the third color resist, and the fourth light transmitting area is provided There are the first color resist and the fourth color resist, the fifth light transmitting area is provided with the second color resist and the fourth color resist, and the sixth light transmitting area is provided with the first The three color resists and the fourth color resist, the first color resist, the second color resist, the third color resist and the fourth color resist are arranged in the same layer, and the fourth color resist The light transmittance is greater than that of other color resists.
15. The method of manufacturing a color filter substrate according to claim 13, wherein said forming said color resist layer on a base substrate forming said black matrix comprises:

Coating a first color resist material on the base substrate, and forming the first color resist in the first light-transmitting area and the fourth light-transmitting area through a first patterning process;

Coating a second color resist material on the base substrate, and forming the second color resist in the second light-transmitting area and the fifth light-transmitting area through a second patterning process;

Coating a third color resist material on the base substrate, and forming the third color resist in the third light-transmitting area and the sixth light-transmitting area through a third patterning process; and

A fourth color resist material is coated on the base substrate, and the fourth light-transmitting area, the fifth light-transmitting area, and the sixth light-transmitting area are formed by a fourth patterning process. Four color resistance.
The method of manufacturing a color filter substrate according to claim 13, wherein the first color resist is a red color resist, the second color resist is a green color resist, and the third color resist is a blue color resist. The fourth color resistance is white color resistance.
The method of manufacturing a color filter substrate according to claim 15, wherein in the fourth light-transmitting area, the fifth light-transmitting area, and the sixth light-transmitting area, the red color resist, the green color The ratio of the area of the blue color resist or the area of the white color resist is 1.5 to 2.3.
A display device, the display device includes a color filter substrate, and the color filter substrate includes a base substrate;

The black matrix is arranged on the surface of the base substrate and defines a plurality of light-transmitting areas on the base substrate, wherein the first light-transmitting area, the second light-transmitting area, and the third light-transmitting area are distributed in the pixel area The fourth light transmission area, the fifth light transmission area and the sixth light transmission area are distributed in the bright area of the pixel area;

The color resist layer includes a first color resist, a second color resist, a third color resist, and a fourth color resist, wherein the first light transmitting area is provided with the first color resist, and the second light transmitting area The second color resist is provided, the third light-transmitting area is provided with the third color resist, the fourth light-transmitting area is provided with the first color resist and the fourth color resist, the The fifth light transmitting area is provided with the second color resist and the fourth color resist, the sixth light transmitting area is provided with the third color resist and the fourth color resist, and the first color resist , The second color resist, the third color resist and the fourth color resist are arranged in the same layer, and the light transmittance of the fourth color resist is greater than that of other color resists.