WO2020231172A1 - 파인메탈마스크 제조용 몰드 제조방법 및 파인메탈마스크 제조방법 - Google Patents
파인메탈마스크 제조용 몰드 제조방법 및 파인메탈마스크 제조방법 Download PDFInfo
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- WO2020231172A1 WO2020231172A1 PCT/KR2020/006277 KR2020006277W WO2020231172A1 WO 2020231172 A1 WO2020231172 A1 WO 2020231172A1 KR 2020006277 W KR2020006277 W KR 2020006277W WO 2020231172 A1 WO2020231172 A1 WO 2020231172A1
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- Prior art keywords
- mold
- manufacturing
- forming
- fine metal
- metal mask
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 186
- 229910001111 Fine metal Inorganic materials 0.000 title claims abstract description 175
- 238000000034 method Methods 0.000 title claims abstract description 98
- 239000002184 metal Substances 0.000 claims abstract description 120
- 229910052751 metal Inorganic materials 0.000 claims abstract description 120
- 239000000758 substrate Substances 0.000 claims abstract description 73
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 61
- 238000009713 electroplating Methods 0.000 claims description 49
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 23
- 229910052759 nickel Inorganic materials 0.000 claims description 21
- 239000010949 copper Substances 0.000 claims description 10
- 229920002120 photoresistant polymer Polymers 0.000 claims description 10
- 239000011810 insulating material Substances 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 7
- 230000007547 defect Effects 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 description 22
- 238000005530 etching Methods 0.000 description 12
- 238000007747 plating Methods 0.000 description 8
- 239000011368 organic material Substances 0.000 description 7
- 238000005323 electroforming Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 229910001374 Invar Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 230000003362 replicative effect Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/0068—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for particular articles not mentioned below
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a method for manufacturing a mold for manufacturing a fine metal mask and a method for manufacturing a fine metal mask, and in detail, it is possible to obtain a mold capable of manufacturing a fine metal mask that can be used permanently, thereby reducing material cost and improving productivity.
- the present invention relates to a method for manufacturing a fine metal mask and a method for manufacturing a fine metal mask capable of manufacturing a fine metal mask with improved yield by reducing a process defect rate while being able to manufacture an area fine metal mask.
- OLED Organic Light Emitting Diodes
- OLED Organic Light Emitting Diodes
- flexible substrate OLED Organic Light Emitting Diodes
- It has features such as screen realization, high-speed response speed, self-luminescence, thin-walled fabrication, low power, and wide viewing angle, as well as the use of a flexible substrate, which has attracted great attention in the display and lighting fields.
- OLED devices use an organic material as a light emitting layer, and a plurality of organic material layers are formed between the lower electrode and the upper electrode, and when a voltage is applied between the lower electrode and the upper electrode, electrons and holes are injected from the cathode and the anode and recombine in the organic material layer. Use the principle of generating light.
- Fine Metal Mask FMM
- FMM Fine Metal Mask
- Fine metal masks are used by rolling INVAR alloys that have little thermal deformation in the organic multilayer deposition process. These fine metal masks are mainly applied to the manufacture of small OLED display devices, but the large display manufacturing glass has a problem in alignment with the fine metal mask because the central part falls downward when the size of the glass for large display manufacturing increases.
- the thickness of the fine metal mask should also be relatively thin, but there is a technical limitation to becoming thinner than a predetermined thickness by the conventional rolling process.
- fine metal masks are being manufactured using the electroplating process, but the fine metal masks have not been commercialized due to various difficulties in the manufacturing process due to the thinning of the fine metal masks.
- the present invention was conceived to solve the above problems, and an object of the present invention is to obtain a mold capable of producing a fine metal mask that can be used permanently, thereby reducing material costs and improving productivity, and has a large area
- the objective is to provide a method for manufacturing a fine metal mask and a method for manufacturing a fine metal mask capable of manufacturing a fine metal mask with improved yield by reducing a process defect rate while making a metal mask possible.
- a method for manufacturing a mold for manufacturing a fine metal mask includes forming an insulating portion corresponding to a slot shape of the fine metal mask on a manufacturing substrate; Forming a conductive layer on the surface of the insulating portion; Forming a pre-mold by forming and separating the first metal layer on the manufacturing substrate by an electroplating process; And forming a mold for manufacturing a fine metal mask by forming and separating the second metal layer on the pre-mold by an electroplating process.
- the insulating portion may include any one of a photosensitive film resist (Dry Film Resist, DFR) and a photo resist (Photo Resist, PR).
- DFR Photosensitive film resist
- PR Photo Resist
- the insulating portion may be inclined toward the manufacturing substrate from the upper surface.
- the first metal layer and the second metal layer may have a thickness of 50 to 500 ⁇ m.
- the first metal layer and the second metal layer may include at least one of nickel (Ni), iron (Fe), and copper (Cu) as the first metal layer and the second metal layer.
- the steps of forming an insulating portion corresponding to the slot shape of the fine metal mask on the manufacturing substrate comprising; Forming a conductive layer on the surface of the insulating portion; Forming a pre-mold by forming and separating the first metal layer on the manufacturing substrate by an electroplating process; Forming a second metal layer on the pre-mold by an electroplating process and separating to form a mold for manufacturing a fine metal mask; Forming a non-conductive layer on the protrusion of a mold for manufacturing a fine metal mask;
- a method for manufacturing a fine metal mask comprising; forming a third metal layer on a mold for manufacturing a fine metal mask by electroplating and separating it to form a fine metal mask is provided.
- the third metal layer may include iron (Fe) and nickel (Ni).
- a method comprising: forming a first insulating portion corresponding to a slot shape of a fine metal mask on a first manufacturing substrate; Forming a first conductive layer on the surface of the first insulating portion; Forming a pre-mold by forming and separating a first metal layer on a first manufacturing substrate by an electroplating process; Forming a first mold by forming and separating a second metal layer on the pre-mold by an electroplating process; Forming a second insulating portion corresponding to the slot shape of the fine metal mask on the second manufacturing substrate; Forming a second conductive layer on the surface of the second insulating portion; Forming a second mold by forming and separating a third metal layer on a second manufacturing substrate by an electroplating process; Forming a non-conductive layer on the protrusion of the first mold; Forming a fourth metal layer on the first mold by electroplating; Contacting the first mold and the second mold and heat-treating the fourth metal layer
- the height of the second insulating portion may be lower than that of the first insulating portion by a thickness of the fine metal mask.
- the forming of the second insulating portion may include forming an insulating material portion on a second manufacturing substrate; And mechanically polishing the insulating material portion to form a second insulating portion having a height lower than that of the first insulating portion by a thickness of the fine metal mask.
- the surface of the second insulating portion may have roughness.
- the first insulating portion may have an inclination from the upper surface toward the first manufacturing substrate, and the second insulating portion may have an inclination from the upper surface toward the second manufacturing substrate.
- the third metal layer may include iron (Fe) and nickel (Ni), and the fourth metal layer may include iron (Fe) and nickel (Ni).
- a method comprising: forming a first insulating portion corresponding to a slot shape of a fine metal mask on a first manufacturing substrate; Forming a first conductive layer on the surface of the first insulating portion; Forming a pre-mold by forming and separating a first metal layer on a first manufacturing substrate by an electroplating process; Forming a first mold by forming and separating a second metal layer on the pre-mold by an electroplating process; Forming a non-conductive layer on the protrusion of the first mold; Forming a third metal layer on the first mold by electroplating; Contacting the pre-mold on the first mold and heat-treating the third metal layer; And removing the pre-mold and separating the third metal layer from the first mold to form a fine metal mask.
- the protrusion of the pre-mold may be removed by the thickness of the fine metal mask.
- the mold is permanently used by forming a pre-mold using electroplating and then forming a plating layer on the pre-mold again to produce a fine metal mask manufacturing mold. Accordingly, there is an effect that the manufacturing process cost of the fine metal mask can be reduced, and the fine metal mask having high reliability can be manufactured.
- a heat treatment mold is added to heat treatment.
- the fine metal mask is prevented from being deformed or warped, it is possible to manufacture a fine metal mask with improved reliability.
- 1 to 5 are views provided to explain a method of manufacturing a mold for manufacturing a fine metal mask according to an embodiment of the present invention.
- 6 to 8 are views provided to explain a method of manufacturing a fine metal mask according to another embodiment of the present invention.
- 9 to 21 are views provided to explain a method of manufacturing a fine metal mask according to another embodiment of the present invention.
- 1 to 5 are views provided to explain a method of manufacturing a mold for manufacturing a fine metal mask according to an embodiment of the present invention.
- the mold for manufacturing a fine metal mask manufactured according to the method for manufacturing a mold for manufacturing a fine metal mask according to the present invention is a mold for manufacturing a fine metal mask for manufacturing an OLED device.
- the formation of an organic light emitting layer manufactured by depositing a multilayer organic material on a transparent insulating substrate is performed as follows. That is, the organic light-emitting layer is formed by selectively supplying through the opening of the fine metal mask to a predetermined sub-pixel area from a supply unit including an organic light-emitting material emitting a predetermined color.
- the principle of forming the organic light emitting layer is evaporation, and the organic light emitting material is supplied in an evaporated state so that deposition is performed on the exposed substrate.
- the organic electroluminescent device to be formed is provided with an organic light emitting layer that emits R, G, and B colors, respectively, a separate supply unit is provided for each color, and the organic light emitting layer is formed for each color. This is going on.
- the fine metal mask has a structure in which slots of a predetermined pattern are formed for forming a plurality of organic films or electrodes on a thin plate for manufacturing an OLED device.
- Methods for manufacturing such a mask include an etching method and an electroforming method.
- a resist layer having a slot pattern is formed on a thin plate by a photoresist method or a film having a slot pattern is attached to the thin plate, and then the thin plate is etched.
- the manufacturing method of a mask by etching has a problem in that the width tolerance and the tolerance of the slot edge cannot be accurately matched as the mask becomes larger and the pattern of the slot becomes fine.
- the slot size could not be uniform.
- the electro forming method solves the problem caused by the etching method, in which metal is deposited to the required thickness by electrolysis on a model by electrolysis of a metal salt solution in an operation such as electroplating. After peeling from the model, it becomes an electroformed product in which the model and the irregularities are opposite.
- a metal layer is formed by an electroforming method, that is, an electroplating method, to manufacture a fine metal mask.
- an insulating portion 120 corresponding to a slot shape of a fine metal mask is formed on a manufacturing substrate 110.
- the manufacturing substrate 110 is a substrate capable of electroplating, and, for example, a stainless steel substrate having an advantageous release of the plating layer may be used.
- the insulating part 120 is a structure formed on the surface of the manufacturing substrate 110 and is for forming a slot of the fine metal mask. Accordingly, the insulating portion 120 is formed to correspond to the slot shape of the fine metal mask.
- the insulating portion 120 may include any one of a photosensitive film resist (Dry Film Resist, DFR) and a photo resist (Photo Resist, PR).
- DFR photosensitive film resist
- PR photo resist
- the insulating part 120 may be formed on the manufacturing substrate 110 in a desired shape by etching DFR or PR.
- the insulating part 120 may be inclined toward the manufacturing substrate 110 on the upper surface.
- the insulating part 120 is implemented in a trapezoidal shape, and may be formed differently in consideration of the shape of the slot of the fine metal mask to be formed or the inclination of the inside of the slot.
- a conductive layer 130 is formed on the surface of the insulating part 120.
- the conductive layer 130 is formed to be electroplated because the insulating portion 120 is made of an insulating material.
- the first metal layer 140 is formed on the surface of the manufacturing substrate 110 by electroplating (FIG. 3).
- the first metal layer 140 is for forming a pre-mold, and is for replicating the surface shape of the manufacturing substrate 110.
- a preliminary mold 140 for forming a mold for manufacturing a fine metal mask can be obtained (FIG. 4).
- the first metal layer 140 and the second metal layer 150 may have a thickness of 50 to 500 ⁇ m.
- the first metal layer 140 and the second metal layer 150 may include at least one of nickel (Ni), iron (Fe), and copper (Cu).
- FIGS. 6 to 8 are views provided to explain a method of manufacturing a fine metal mask according to another embodiment of the present invention. Hereinafter, a description will be made with reference to FIGS. 1 to 8, but the above description will be omitted.
- the mold 150 for manufacturing the fine metal mask described with reference to FIGS. 1 to 5 is manufactured, and the fine metal mask 180 is manufactured using this.
- the fine metal mask 180 is formed by using the mold 150 for manufacturing the fine metal mask.
- the shape of the protrusion 160 of the fine metal mask manufacturing mold 150 that is, the shape of the insulating part 120 formed to correspond to the shape of the fine metal mask slot 181 on the manufacturing substrate 110, is duplicated.
- a non-conductive layer 170 is formed on the protrusion 160 (FIG. 6).
- the non-conductive layer 170 is formed only on the protrusion 160 of the mold 150 for manufacturing the fine metal mask. Accordingly, in a subsequent process, the fine metal mask slot 181 is not formed with a plating layer by the non-conductive layer 170 of the protrusion 160, so that the fine metal mask slot 181 is easily formed.
- the third metal layer 180 is formed by electroplating on the fine metal mask manufacturing mold 150 in which the non-conductive layer 170 is formed on the protrusion 160, the protrusion 160 due to the non-conductive layer 170 The plating layer is not formed, and the third metal layer 180 is formed only between the protrusions 160. Accordingly, the fine metal mask slot 181 in the shape of the protrusion 160 is formed (FIG. 7).
- the third metal layer 180 for manufacturing the fine metal mask 180 may include iron (Fe) and nickel (Ni). It is preferable that the metal used for the fine metal mask 180 has a very low coefficient of thermal expansion in order to have durability against high temperature deformation in the organic material deposition process, which is a post process.
- the third metal layer 180 may contain iron (Fe) and nickel (Ni), and the so-called Invar alloy containing iron (Fe) and nickel (Ni) is very low depending on the ratio of iron and nickel. It shows the coefficient of thermal expansion.
- the third metal layer 180 may have a thickness of 5 to 30 ⁇ m.
- the process of removing the insulating part from the fine metal mask again is omitted by forming an insulating part and performing a plating process immediately to separate the fine metal mask and the insulating part from the manufacturing substrate, Since the protrusion corresponding to the part can be formed of metal by the plating process, the mold for manufacturing the fine metal mask can be used semi-permanently, enabling economical process to be performed.
- FIG. 9 to 21 are views provided to explain a method of manufacturing a fine metal mask according to an embodiment of the present invention.
- a mold for manufacturing a fine metal mask is manufactured, and a mold for heat treatment is produced in the same manner to form a fine metal mask with a mold for manufacturing the fine metal mask, and then the mold for heat treatment is covered and heat treated.
- the process is carried out to manufacture a fine metal mask.
- the fine metal mask manufactured by the method for manufacturing the fine metal mask according to the present invention is a mask for manufacturing an OLED device.
- the formation of an organic light emitting layer manufactured by depositing a multilayer organic material on a transparent insulating substrate is performed as follows. That is, the organic light-emitting layer is formed by selectively supplying through the opening of the fine metal mask to a predetermined sub-pixel area from a supply unit including an organic light-emitting material emitting a predetermined color.
- the principle of forming the organic light emitting layer is evaporation, and the organic light emitting material is supplied in an evaporated state so that deposition is performed on the exposed substrate.
- the organic electroluminescent device to be formed is provided with an organic light emitting layer that emits R, G, and B colors, respectively, a separate supply unit is provided for each color, and the organic light emitting layer is formed for each color. This is going on.
- the fine metal mask has a structure in which slots of a predetermined pattern are formed for forming a plurality of organic films or electrodes on a thin plate for manufacturing an OLED device.
- Methods for manufacturing such a mask include an etching method and an electroforming method.
- a resist layer having a slot pattern is formed on a thin plate by a photoresist method or a film having a slot pattern is attached to the thin plate, and then the thin plate is etched.
- the manufacturing method of a mask by etching has a problem in that the width tolerance and the tolerance of the slot edge cannot be accurately matched as the mask becomes larger and the pattern of the slot becomes fine.
- the slot size could not be uniform.
- the electro forming method solves the problem caused by the etching method, in which metal is deposited to the required thickness by electrolysis on a model by electrolysis of a metal salt solution in an operation such as electroplating. After peeling from the model, it becomes an electroformed product in which the model and the irregularities are opposite.
- a metal layer is formed by an electroforming method, that is, an electroplating method, to manufacture a fine metal mask.
- a mold for manufacturing a fine metal mask is manufactured. Referring to FIG. 9, a first insulating portion 121 corresponding to a slot shape of a fine metal mask is formed on the first manufacturing substrate 111.
- the first manufacturing substrate 111 is a substrate capable of electroplating, and, for example, a stainless steel substrate having an advantageous mold release may be used.
- the first insulating portion 121 is a structure formed on the surface of the first manufacturing substrate 111 and is for forming a slot of the fine metal mask. Accordingly, the first insulating portion 121 is formed to correspond to the slot shape of the fine metal mask.
- the first insulating part 121 may include any one of a photosensitive film resist (Dry Film Resist, DFR) and a photo resist (Photo Resist, PR).
- DFR photosensitive film resist
- PR Photo Resist
- the first insulating portion 121 may be inclined toward the first manufacturing substrate 111 from the upper surface. Referring to FIG. 9, the first insulating portion 121 is implemented in a trapezoidal shape, and may be formed differently in consideration of the shape of the slot of the fine metal mask to be formed or the inclination of the inside of the slot.
- a first conductive layer 131 is formed on the surface of the first insulating part 121.
- the first conductive layer 131 is formed to be electroplated because the first insulating portion 121 is made of an insulating material.
- the first metal layer 141 is formed on the surface of the first manufacturing substrate 111 by electroplating (FIG. 11).
- the first metal layer 141 is for forming a pre-mold and is for replicating the surface shape of the first manufacturing substrate 111.
- a preliminary mold 141 for forming a mold for manufacturing a fine metal mask can be obtained (FIG. 12).
- the fine metal mask is manufactured by replicating the surface shape of the first manufacturing substrate 111 on which the first insulating part 121 is formed in FIG.
- a first mold 151 which is a mold is obtained (Fig. 13).
- the first metal layer 141 and the second metal layer 151 may have a thickness of 50 to 500 ⁇ m.
- the first metal layer 141 and the second metal layer 151 may include at least one of nickel (Ni), iron (Fe), and copper (Cu).
- a process of manufacturing a heat treatment mold for heat treatment of the fine metal mask is performed.
- a second insulating portion 122 corresponding to the slot shape of the fine metal mask is formed on the second manufacturing substrate 112, wherein the height of the second insulating portion 122 is the first insulating portion ( It is preferable that the thickness of the fine metal mask 180 is lower than 121). That is, since a mold for heat treatment of the fine metal mask is manufactured, in order to prevent deformation or warpage during heat treatment by covering the upper surface of the fine metal mask and heat treatment, the thickness of the fine metal mask is greater than that of the first insulating part 121.
- the second insulating portion 122 is formed with a low thickness.
- the forming of the second insulating portion 122 may include forming an insulating material portion on the second manufacturing substrate 112; And mechanically polishing the insulating material portion to form a second insulating portion 122 having a height lower than that of the first insulating portion 121 by a thickness of the fine metal mask.
- the surface of the second insulating portion 122 may exhibit roughness due to the mechanical polishing process.
- a second conductive layer 132 for electroplating is formed on the surface of the second insulating part 122 to form a heat treatment mold (FIG. 15). As described above, if the roughness is formed on the surface of the second insulating portion 122, after forming the second conductive layer 132, dropping or separation may be prevented.
- a third metal layer 142 is formed on the second manufacturing substrate 112 by an electroplating process (FIG. 16), and the second mold 142, which is a heat treatment mold, is obtained by separating it (FIG. 17).
- the third metal layer 142 may include at least one of nickel (Ni), iron (Fe), and copper (Cu).
- a non-conductive layer 170 is formed on the protrusion 160 in which the shape of the first insulating portion 121 was duplicated (FIG. 18).
- the non-conductive layer 170 is formed only on the protrusion 160 of the first mold 151. Accordingly, in a subsequent process, the fine metal mask slot 181 is not formed with a plating layer by the non-conductive layer 170 of the protrusion 160, so that the fine metal mask slot 181 is easily formed.
- the fourth metal layer 180 is formed on the first mold 151 in which the non-conductive layer 170 is formed on the protrusion 160 by electroplating, the plating layer is formed on the protrusion 160 due to the non-conductive layer 170. Without being formed, the fourth metal layer 180 is formed only between the protrusions 160. Accordingly, the fine metal mask slot 181 in the shape of the protrusions 160 may be formed (FIG. 19).
- the second mold 142 which is a heat treatment mold, is placed on the first mold 151 to form the first mold 151 and the second mold. 142) is brought into contact and the fourth metal layer 180 is heat-treated (FIG. 20).
- the fourth metal layer 180 for manufacturing the fine metal mask 180 may include iron (Fe) and nickel (Ni). It is preferable that the metal used for the fine metal mask 180 has a very low coefficient of thermal expansion in order to have durability against high temperature deformation in the organic material deposition process, which is a post process.
- the fourth metal layer 180 may contain iron (Fe) and nickel (Ni), and the so-called Invar alloy containing iron (Fe) and nickel (Ni) is very low depending on the ratio of iron and nickel. It shows the coefficient of thermal expansion.
- the fourth metal layer 180 may have a thickness of 5 to 30 ⁇ m.
- the second mold 142 for heat treatment of the fourth metal layer 180 it is preferable to select the third metal layer 142 in consideration of the thermal expansion coefficients of the fourth metal layer 180 and the second mold 142. Do. That is, if there is a difference in the coefficient of thermal expansion of the fourth metal layer 180 and the second mold 142 during heat treatment, the second mold 142 cannot withstand the heat treatment process and may be separated as the fourth metal layer 180 is warped or bent. I can.
- the first mold 151 and the second mold 142 positioned above and below the fourth metal layer 180 use a metal having the same coefficient of thermal expansion.
- 2nd deformation due to interference between the fine metal mask (the fourth metal layer) and the first mold 151 and the second mold 142 (the second metal layer and the third metal layer) in the heat treatment process May occur, and as a result, the possibility of losing the function of the fine metal mask may increase.
- the fourth metal layer 180, the first mold 151, and the second mold 142 may include a metal having the same coefficient of thermal expansion, or most preferably, the same metal.
- the second and third metal layers may include iron (Fe) and nickel (Ni), and the fourth metal layer may also include iron (Fe) and nickel (Ni).
- a method comprising: forming a first insulating portion corresponding to a slot shape of a fine metal mask on a first manufacturing substrate; Forming a first conductive layer on the surface of the first insulating portion; Forming a pre-mold by forming and separating a first metal layer on a first manufacturing substrate by an electroplating process; Forming a first mold by forming and separating a second metal layer on the pre-mold by an electroplating process; Forming a non-conductive layer on the protrusion of the first mold; Forming a third metal layer on the first mold by electroplating; Contacting the pre-mold on the first mold and heat-treating the third metal layer; And removing the pre-mold and separating the third metal layer from the first mold to form a fine metal mask. Description of the contents described above will be omitted.
- a pre-mold for manufacturing the first mold is used as a mold for heat treatment. That is, as in the above-described embodiment, the second mold, which is a mold for heat treatment, is not separately manufactured, but heat treatment is performed using a pre-mold manufactured in manufacturing the first mold.
- the height of the protrusion of the pre-mold must be removed by the thickness of the fine metal mask so that the fine metal mask is formed on the first mold, and then the top is accurately covered to perform heat treatment efficiently.
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- Mechanical Engineering (AREA)
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- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electrochemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (15)
- 제조기판 상에 파인메탈마스크의 슬롯형상에 대응하는 절연부를 형성하는 단계;절연부의 표면에 전도성층을 형성하는 단계;제조기판 상에 전주도금공정으로 제1금속층을 형성하고 분리하여 예비몰드를 형성하는 단계; 및예비몰드 상에 전주도금공정으로 제2금속층을 형성하고 분리하여 파인메탈마스크 제조용 몰드를 형성하는 단계;를 포함하는 파인메탈마스크 제조용 몰드 제조방법.
- 청구항 1에 있어서,절연부는 감광성 필름 레지스트(Dry Film Resist, DFR) 및 포토레지스트(Photo Resist, PR) 중 어느 하나를 포함하는 것을 특징으로 하는 파인메탈마스크 제조용 몰드 제조방법.
- 청구항 1에 있어서,절연부는 상부표면에서 제조기판을 향하여 경사가 형성된 것을 특징으로 하는 파인메탈마스크 제조용 몰드 제조방법.
- 청구항 1에 있어서,제1금속층 및 제2금속층은 두께가 50 내지 500㎛인 것을 특징으로 하는 파인메탈마스크 제조용 몰드 제조방법.
- 청구항 1에 있어서,제1금속층 및 제2금속층은 니켈(Ni), 철(Fe) 및 구리(Cu) 중 적어도 하나를 포함하는 것을 특징으로 하는 파인메탈마스크 제조용 몰드 제조방법.
- 제조기판 상에 파인메탈마스크의 슬롯형상에 대응하는 절연부를 형성하는 단계;절연부의 표면에 전도성층을 형성하는 단계;제조기판 상에 전주도금공정으로 제1금속층을 형성하고 분리하여 예비몰드를 형성하는 단계;예비몰드 상에 전주도금공정으로 제2금속층을 형성하고 분리하여 파인메탈마스크 제조용 몰드를 형성하는 단계;파인메탈마스크 제조용 몰드의 돌출부 상에 비전도성층을 형성하는 단계;파인메탈마스크 제조용 몰드 상에 전주도금공정으로 제3금속층을 형성하고 분리하여 파인메탈마스크를 형성하는 단계;를 포함하는 파인메탈마스크 제조방법.
- 청구항 6에 있어서,제3금속층은 철(Fe) 및 니켈(Ni)을 포함하는 것을 특징으로 하는 파인메탈마스크 제조방법.
- 제1제조기판 상에 파인메탈마스크의 슬롯형상에 대응하는 제1절연부를 형성하는 단계;제1절연부의 표면에 제1전도성층을 형성하는 단계;제1제조기판 상에 전주도금공정으로 제1금속층을 형성하고 분리하여 예비몰드를 형성하는 단계;예비몰드 상에 전주도금공정으로 제2금속층을 형성하고 분리하여 제1몰드를 형성하는 단계;제2제조기판 상에 파인메탈마스크의 슬롯형상에 대응하는 제2절연부를 형성하는 단계;제2절연부의 표면에 제2전도성층을 형성하는 단계;제2제조기판 상에 전주도금공정으로 제3금속층을 형성하고 분리하여 제2몰드를 형성하는 단계;제1몰드의 돌출부 상에 비전도성층을 형성하는 단계;제1몰드 상에 전주도금공정으로 제4금속층을 형성하는 단계;제1몰드 및 제2몰드를 접촉시키고 제4금속층을 열처리하는 단계; 및제2몰드를 제거하고, 제1몰드로부터 제4금속층을 분리하여 파인메탈마스크를 형성하는 단계;를 포함하는 파인메탈마스크 제조방법.
- 청구항 8에 있어서,제2절연부의 높이는 제1절연부보다 파인메탈마스크 두께만큼 낮은 것을 특징으로 하는 파인메탈마스크 제조방법.
- 청구항 8에 있어서,제2절연부를 형성하는 단계는 제2제조기판 상에 절연물질부를 형성하는 단계; 및절연물질부를 기계적 폴리싱하여 제1절연부보다 파인메탈마스크 두께만큼 낮은 높이의 제2절연부를 형성하는 단계;를 포함하는 것을 특징으로 하는 파인메탈마스크 제조방법.
- 청구항 10에 있어서,제2절연부 표면은 조도를 갖는 것을 특징으로 하는 파인메탈마스크 제조방법.
- 청구항 8에 있어서,제1절연부는 상부표면에서 제1제조기판을 향하여 경사가 형성되고,제2절연부는 상부표면에서 제2제조기판을 향하여 경사가 형성된 것을 특징으로 하는 파인메탈마스크 제조방법.
- 청구항 8에 있어서,제3금속층은 철(Fe) 및 니켈(Ni)을 포함하고,제4금속층은 철(Fe) 및 니켈(Ni)을 포함하는 것을 특징으로 하는 파인메탈마스크 제조방법.
- 제1제조기판 상에 파인메탈마스크의 슬롯형상에 대응하는 제1절연부를 형성하는 단계;제1절연부의 표면에 제1전도성층을 형성하는 단계;제1제조기판 상에 전주도금공정으로 제1금속층을 형성하고 분리하여 예비몰드를 형성하는 단계;예비몰드 상에 전주도금공정으로 제2금속층을 형성하고 분리하여 제1몰드를 형성하는 단계;제1몰드의 돌출부 상에 비전도성층을 형성하는 단계;제1몰드 상에 전주도금공정으로 제3금속층을 형성하는 단계;제1몰드 상에 예비몰드를 접촉시키고 제3금속층을 열처리하는 단계; 및예비몰드를 제거하고, 제1몰드로부터 제3금속층을 분리하여 파인메탈마스크를 형성하는 단계;를 포함하는 파인메탈마스크 제조방법.
- 청구항 14에 있어서,제1몰드 상에 예비몰드를 접촉시키기 전에, 예비몰드의 돌출부를 파인메탈마스크 두께만큼 제거하는 것을 특징으로 하는 파인메탈마스크 제조방법.
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110048395A (ko) * | 2009-11-02 | 2011-05-11 | 엘지이노텍 주식회사 | 액정표시장치용 클리체 및 그 제조방법, 이를 이용한 복제용마스터몰드 및 복제 클리체의 제조방법 |
KR20160117798A (ko) * | 2015-03-31 | 2016-10-11 | 삼성디스플레이 주식회사 | 마스크 제조 방법 및 이를 이용하여 제조된 증착용 마스크 |
KR20170040862A (ko) * | 2015-10-05 | 2017-04-14 | 삼성디스플레이 주식회사 | 증착용 마스크 제조 방법 |
KR20180080582A (ko) * | 2017-01-04 | 2018-07-12 | 주식회사 티지오테크 | 마스크의 제조 방법 및 이에 사용되는 모판 |
KR20180122173A (ko) * | 2017-05-02 | 2018-11-12 | 주식회사 티지오테크 | 프레임 일체형 마스크의 제조 방법 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1392905A (zh) * | 2000-09-26 | 2003-01-22 | 伊斯曼柯达公司 | 金属掩膜的制造方法及金属掩模 |
JP2005154879A (ja) * | 2003-11-28 | 2005-06-16 | Canon Components Inc | 蒸着用メタルマスク及びそれを用いた蒸着パターンの製造方法 |
WO2016129534A1 (ja) * | 2015-02-10 | 2016-08-18 | 大日本印刷株式会社 | 蒸着マスクの製造方法および蒸着マスク |
WO2017132908A1 (en) * | 2016-02-03 | 2017-08-10 | Applied Materials, Inc. | A shadow mask with tapered openings formed by double electroforming using positive/negative photoresists |
KR102081191B1 (ko) * | 2016-06-24 | 2020-02-26 | 에이피시스템 주식회사 | 전주도금법을 이용한 미세 금속 마스크 제조방법 |
KR101871956B1 (ko) * | 2016-11-28 | 2018-07-02 | 주식회사 티지오테크 | 모판, 모판의 제조 방법, 및 마스크의 제조 방법 |
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110048395A (ko) * | 2009-11-02 | 2011-05-11 | 엘지이노텍 주식회사 | 액정표시장치용 클리체 및 그 제조방법, 이를 이용한 복제용마스터몰드 및 복제 클리체의 제조방법 |
KR20160117798A (ko) * | 2015-03-31 | 2016-10-11 | 삼성디스플레이 주식회사 | 마스크 제조 방법 및 이를 이용하여 제조된 증착용 마스크 |
KR20170040862A (ko) * | 2015-10-05 | 2017-04-14 | 삼성디스플레이 주식회사 | 증착용 마스크 제조 방법 |
KR20180080582A (ko) * | 2017-01-04 | 2018-07-12 | 주식회사 티지오테크 | 마스크의 제조 방법 및 이에 사용되는 모판 |
KR20180122173A (ko) * | 2017-05-02 | 2018-11-12 | 주식회사 티지오테크 | 프레임 일체형 마스크의 제조 방법 |
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