WO2020179557A1 - コロイダルシリカ及びその製造方法 - Google Patents
コロイダルシリカ及びその製造方法 Download PDFInfo
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- WO2020179557A1 WO2020179557A1 PCT/JP2020/007580 JP2020007580W WO2020179557A1 WO 2020179557 A1 WO2020179557 A1 WO 2020179557A1 JP 2020007580 W JP2020007580 W JP 2020007580W WO 2020179557 A1 WO2020179557 A1 WO 2020179557A1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0201—Oxygen-containing compounds
- B01J31/0204—Ethers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0235—Nitrogen containing compounds
- B01J31/0237—Amines
- B01J31/0238—Amines with a primary amino group
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0271—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds also containing elements or functional groups covered by B01J31/0201 - B01J31/0231
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/87—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by chromatography data, e.g. HPLC, gas chromatography
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
Definitions
- the present invention relates to colloidal silica and a method for producing the same, and more particularly to colloidal silica containing silica particles having a small average primary particle diameter and a method for producing the same.
- Colloidal silica is obtained by dispersing silica fine particles in a medium such as water, and is used as a physical property improving agent in the fields of paper, fiber, steel, etc., and also as an abrasive for electronic materials such as semiconductor wafers. Has been done.
- the silica particles dispersed in the colloidal silica used for such applications are required to have a high true specific gravity.
- Patent Document 1 a production method in which a hydrolysis solution obtained by hydrolyzing an alkoxysilane is added to a mother liquor containing an alkali catalyst or the like is disclosed (for example, Patent Document 1). reference).
- Patent Document 1 a method for producing colloidal silica by adding tetramethyl silicate or tetraethyl silicate to a mixed liquid of water and tetramethylammonium hydroxide, triethanolamine or aqueous ammonia is disclosed (for example, Patent Document 1). 2 and 3).
- Patent Document 4 discloses that by adding a dispersion stabilizer such as ammonia, a small particle diameter silica having excellent storage stability can be produced, but it is highly pure as an abrasive for electronic materials such as semiconductor wafers. Therefore, it is not desirable to add a dispersion stabilizer.
- a dispersion stabilizer such as ammonia
- An object of the present invention is to provide a colloidal silica having a small particle size (for example, an average primary particle size of 20 nm or less) containing silica particles containing an alkoxy group, and a method for producing the same. Further, the inventors of the present invention have noticed that colloidal silica containing silica particles having a small particle size tends to aggregate after storage, resulting in an increase in the average secondary particle size of the silica particles. Therefore, it is another object of the present invention to provide a colloidal silica having a small particle size and containing silica particles in which an increase in the average secondary particle size after storage is suppressed, and a method for producing the same.
- the present inventor has found that the average primary particle diameter of the silica particles is 20 nm or less, the alkoxy group content m (ppm) of the silica particles and the average primary particle diameter n (nm).
- the ratio of the ratio (m/n) to and is 300 or more, and the average secondary particle diameter increase rate by the storage stability test of the silica particles is 12% or less.
- the present invention has been completed and the present invention has been completed.
- a typical invention is as follows.
- Item 1 Colloidal silica
- the silica particles contained in the colloidal silica have an average primary particle diameter of 20 nm or less, The silica particles have a ratio (m/n) of the alkoxy group content m (ppm) to the average primary particle diameter n (nm) of 300 or more, The true specific gravity of the silica particles is 1.95 or more, and the true specific gravity is 1.95 or more.
- the silica particles have an average secondary particle size increase rate of 12% or less according to a storage stability test, Colloidal silica characterized by that.
- colloidal silica The silica particles contained in the colloidal silica have an average primary particle diameter of 20 nm or less, The true specific gravity of the silica particles is 1.95 or more and 2.20 or less, The silica particles have an average secondary particle size increase rate of 12% or less according to a storage stability test, Colloidal silica characterized by that.
- the silica particles contain at least one amine selected from the group consisting of primary amines, secondary amines and tertiary amines (provided that hydroxyl groups are excluded as substituents) in an amount of 5 ⁇ mol or more per 1 g of silica.
- the colloidal silica according to 1 or 2.
- Step 1 of preparing a mother liquor containing an alkali catalyst and water (2) Step 2 of preparing a mixed solution by adding alkoxysilane to the mother liquor, and (3) Step 3 of preparing colloidal silica by adding an alkali catalyst to the mixed solution
- the alkali catalyst is at least one amine selected from the group consisting of primary amine, secondary amine and tertiary amine (provided that the hydroxyl group is excluded as a substituent).
- a method for producing colloidal silica which is characterized by the above.
- the colloidal silica of the present invention has a small particle diameter of silica particles having an average primary particle diameter of 20 nm or less. Further, in the colloidal silica of the present invention, silica particles contain an alkoxy group. Furthermore, the colloidal silica of the present invention suppresses an increase in the average secondary particle size of silica particles after storage. Then, the method for producing colloidal silica of the present invention can easily produce the colloidal silica of the present invention.
- the colloidal silica of the present invention has a small particle size because the average primary particle size of the silica particles is 20 nm or less. Further, since the colloidal silica of the present invention has a high value of alkoxy group content (ppm)/average primary particle diameter (nm) of 300 or more in the silica particles, it can be used as a polishing agent for substrates such as substrates to be polished. Surface defects (scratches, etc.) can be reduced. In addition, the colloidal silica of the present invention has an average secondary particle diameter increase rate of 12% or less as determined by a storage stability test, so that it is possible to suppress aggregation of silica particles or increase in particle diameter after storage of colloidal silica, and thus storage stability. Excellent for. Further, in one embodiment of the present invention, the colloidal silica has a high true specific gravity, and therefore has excellent polishing power.
- a mother liquor containing an alkali catalyst and water is prepared in step 1, and an alkoxysilane is added to the mother liquor in step 2 to prepare a mixed solution. It is not necessary to prepare a silicic acid aqueous solution by once hydrolyzing alkoxysilane as in the method, and it is possible to easily produce colloidal silica containing silica particles having a small particle size, a high alkoxy group content, and excellent storage stability. it can.
- the mother liquor prepared in step 1 and containing an alkali catalyst containing water as a main component is kept at a high temperature, alkoxysilane is added in step 2, and then an alkali catalyst is further added in step 3. Since the silica particles are prepared by adding the silica particles, the true specific gravity of the silica particles is increased, and colloidal silica excellent in polishing power can be easily produced.
- the silica particles contained in the colloidal silica have an average primary particle diameter of 20 nm or less, and the silica particles have an alkoxy group content m (ppm) and an average primary particle diameter n (nm).
- the value of the ratio (m/n) with respect to) is 300 or more, and the average secondary particle diameter increase rate by the storage stability test of the silica particles is 12% or less.
- the surface of the silica particles is preferably not modified with an organic functional group (eg, amino group, sulfo group). If the surface of the silica particle is not modified with an organic functional group, the silanol group density on the surface of the silica particle can be maintained at a high level, which is useful for polishing an object that interacts with the silanol group.
- an organic functional group eg, amino group, sulfo group
- the average primary particle diameter of the silica particles is preferably 20 nm or less, more preferably 18 nm or less, even more preferably 16 nm or less.
- the average primary particle diameter of the silica particles is preferably 6 nm or more, more preferably 8 nm or more, and further preferably 11 nm or more.
- storage stability is further improved.
- the average primary particle diameter of the silica particles can be measured by the following measuring method. That is, colloidal silica is pre-dried on a hot plate and then heat-treated at 800 ° C. for 1 hour to prepare a sample for measurement. The BET specific surface area is measured using the prepared measurement sample. With the true specific gravity of silica being 2.2, the value of 2727/BET specific surface area (m 2 /g) is converted into the average primary particle diameter (nm) of silica particles in colloidal silica.
- the average secondary particle diameter of the silica particles is preferably 10 nm or more, more preferably 15 nm or more.
- the average secondary particle diameter of the silica particles is preferably 100 nm or less, more preferably 70 nm or less.
- low defect property means that scratch occurs during polishing. (Which means that it is suppressed) is further improved.
- the average secondary particle size of the silica particles can be measured by the following measuring method. That is, as a sample for measurement of the dynamic light scattering method, colloidal silica is added to a 0.3 wt% citric acid aqueous solution to prepare a homogenized sample. Using the measurement sample, the average secondary particle size (unit: nm) is measured by the dynamic light scattering method (“ELSZ-2000S” manufactured by Otsuka Electronics Co., Ltd.).
- the association ratio of silica particles in colloidal silica is preferably 1.0 or more, more preferably 1.2 or more, and even more preferably 1.3 or more.
- the association ratio of the silica particles is preferably 4.0 or less, more preferably 3.0 or less.
- the upper limit of the association ratio of the silica particles is within the above range, the flatness when polishing with colloidal silica is further improved.
- the association ratio of the silica particles in the colloidal silica is a value obtained by calculating the average secondary particle diameter / average primary particle diameter of the silica particles in the colloidal silica.
- the silica particles may have a value (m / n) of the ratio (m / n) of the alkoxy group content m (unit: ppm) to the average primary particle diameter n (unit: nm) of 300 or more.
- This value represents the amount of alkoxy groups contained in the silica particles with respect to the silica particle size.
- the value is preferably 300 or more, more preferably 350 or more, and further preferably 400 or more.
- the lower limit of the value is within the above range, the low defectivity when polished with the colloidal silica of the present invention is further improved.
- the value is preferably 2000 or less, more preferably 1500 or less.
- the storage stability of the colloidal silica is further improved.
- the alkoxy group content m (unit: ppm) is preferably 1800 or more, more preferably 2400 or more, further preferably 4000 or more, particularly preferably 5000 or more.
- m is preferably 40,000 or less, more preferably 30,000 or less.
- the storage stability of the colloidal silica is further improved.
- the alkoxy group content m (unit: ppm) can be measured by the following measuring method. That is, the colloidal silica is centrifuged at 215,000 G for 90 minutes, the supernatant is discarded, and the solid content is vacuum dried at 60° C. for 90 minutes. 0.5 g of the obtained dried silica product is weighed and put in 50 mL of a 1 M aqueous sodium hydroxide solution, and the silica is dissolved by heating at 50° C. for 24 hours while stirring. The silica solution is analyzed by gas chromatography to determine the alcohol content. The determined alcohol content is the alkoxy group content. A hydrogen flame ionization detector (FID) is used as the detector of the gas chromatograph. Gas chromatograph analysis is performed according to JIS K0114.
- FID hydrogen flame ionization detector
- the above-mentioned silica particles may have an average secondary particle diameter increase rate of 12% or less according to a storage stability test.
- the rate of increase is preferably 12% or less, more preferably 10% or less, and further preferably 5% or less.
- the increase in particle size or the aggregation of particles of the silica particles in the colloidal silica of the present invention after storage is further suppressed.
- the increase rate is preferably -1% or more.
- the average secondary particle diameter increase rate (unit: %) of silica particles is determined by a storage stability test. The details of this test are as follows. That is, first, the average secondary particle diameter a of the target silica particles is measured. Next, a 100 mL polycontainer is filled with colloidal silica containing the silica particles at a concentration of 20% by mass and the dispersion medium is water, and the container is sealed and left standing in a constant temperature bath at 60°C. One week after standing still, the container is taken out from the thermostat and the average secondary particle diameter b of the silica particles is measured.
- the ratio of the increase in the average secondary particle diameter b after the test to the average secondary particle diameter a before the test is calculated from the following formula, and is defined as the average secondary particle diameter increase rate (%) in the storage stability test.
- (Ba)/a ⁇ 100 average secondary particle size increase rate (%)
- the silica particles contained in the colloidal silica of the present invention preferably have a true specific gravity of 1.95 or more, more preferably 2.00 or more.
- the true specific gravity is preferably 2.20 or less, more preferably 2.16 or less.
- the upper limit of the true specific gravity is within the above range, scratches on the object to be polished are further reduced.
- the true specific gravity can be measured by a liquid phase substitution method using ethanol after colloidal silica is dried on a hot plate at 150° C. to dryness and then kept in a 300° C. furnace for 1 hour.
- the silica particles preferably contain at least one amine selected from the group consisting of primary amines, secondary amines and tertiary amines (however, hydroxyl groups are excluded as substituents).
- the amine is not particularly limited, and the amine represented by the following general formula (1) is preferable.
- NR a R b R c (1) (In the formula, R a , R b , and R c represent an optionally substituted alkyl group having 1 to 12 carbon atoms or hydrogen. provided that all of R a , R b , and R c are hydrogen, that is, Ammonia is excluded.)
- R a , R b , and R c may be the same or different.
- R a , R b and R c may be linear or branched.
- the carbon number of the linear or branched alkyl group may be 1 to 12, preferably 1 to 8, and more preferably 1 to 6.
- Examples of the linear alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group and the like.
- Examples of the branched alkyl group include an isopropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1,1-dimethylpropyl group, a 1,2-dimethylpropyl group, and a 2,2-dimethylpropyl group.
- Preferred linear or branched alkyl groups are n-propyl group, n-hexyl group, 2-ethylhexyl group, n-octyl group and the like.
- the alkyl group in R a , R b , and R c in the general formula (1) may be substituted.
- the number of substituents may be, for example, 0, 1, 2, 3, 4, etc., preferably 0, 1 or 2, and more preferably 0 or 1. ..
- An alkyl group having 0 substituents is an alkyl group that is not substituted.
- the substituent is, for example, 1 substituted with an alkoxy group having 1 to 3 carbon atoms (eg, methoxy group, ethoxy group, propoxy group, isopropoxy group), amino group, or a linear alkyl group having 1 to 4 carbon atoms.
- Examples thereof include a secondary amino group, an amino group di-substituted with a linear alkyl group having 1 to 4 carbon atoms (for example, a dimethylamino group, a din-butylamino group, etc.), an amino group not substituted, and the like.
- a hydroxyl group is excluded as a substituent.
- the substituents may be the same or different.
- R a , R b and R c in the above general formula (1) are linear or branched alkyl groups which may be substituted and have 1 to 8 carbon atoms (preferably 1 to 6 carbon atoms).
- R a , R b and R c are linear or branched alkyl groups having 1 to 8 carbon atoms (preferably 1 to 6 carbon atoms) which may be substituted with an alkoxy group having 1 to 3 carbon atoms. Is.
- R a , R b , and R c may not be substituted.
- R a , R b and R c are each an unsubstituted linear or branched alkyl group having 1 to 12 carbon atoms, or a linear or branched carbon atom having 1 to 12 carbon atoms substituted with an alkoxy group. It is an alkyl group of 12.
- the amine in one embodiment include at least one amine selected from the group consisting of 3-ethoxypropylamine, pentylamine, hexylamine, dipropylamine, triethylamine and the like. Of these, 3-ethoxypropylamine, dipropylamine, and triethylamine are more preferable. Further, 3-ethoxypropylamine is preferable in order to further improve the storage stability of colloidal silica.
- the above amine may be used alone or in combination of two or more.
- the content of at least one amine selected from the group consisting of primary amines, secondary amines and tertiary amines (excluding hydroxyl groups as substituents) in the silica particles is 1 particle g of silica. 5 ⁇ mol or more is preferable, and 10 ⁇ mol or more is more preferable.
- the content of the amine is preferably 100 ⁇ mol or less, and more preferably 90 ⁇ mol or less, per 1 g of silica particles.
- the upper limit of the amine content is in the above range, the storage stability of colloidal silica is further improved.
- the amine content can be measured by the following method. That is, after centrifuging the colloidal silica at 215000 G for 90 minutes, the supernatant is discarded and the solid content is vacuum dried at 60 ° C. for 90 minutes. 0.5 g of the obtained dry silica product is weighed, placed in 50 ml of a 1 M aqueous sodium hydroxide solution, and heated at 50 ° C. for 24 hours with stirring to dissolve the silica. The silica solution is analyzed by ion chromatography to determine the amount of amine. Ion chromatographic analysis is performed according to JIS K0127.
- the boiling point of the amine is preferably 85 ° C. or higher, more preferably 90 ° C. or higher.
- the upper limit of the boiling point of the amine is not particularly limited and is preferably 500°C or lower, more preferably 300°C or lower.
- the method for producing colloidal silica of the present invention is: (1) Step 1 of preparing a mother liquor containing an alkali catalyst and water, (2) Step 2 of preparing a mixed solution by adding alkoxysilane to the mother liquor, and (3) Step 3 of preparing colloidal silica by adding an alkali catalyst to the mixed solution Is a method for producing colloidal silica having the above in this order.
- the alkaline catalyst is at least one amine selected from the group consisting of primary amines, secondary amines and tertiary amines (provided that a hydroxyl group is excluded as a substituent).
- the production method of the present invention is suitable for producing the colloidal silica of the present invention.
- Step 1 is a step of preparing a mother liquor containing an alkaline catalyst and water.
- the alkali catalyst may be at least one amine selected from the group consisting of primary amine, secondary amine and tertiary amine (provided that the hydroxyl group is excluded as a substituent).
- the amine the amine described in the colloidal silica may be used.
- the amine content in the mother liquor is preferably 0.30 mmol or more, more preferably 0.50 mmol or more per 1 kg of the mother liquor.
- the amine content in the mother liquor is preferably 20.0 mmol or less, more preferably 15.0 mmol or less per 1 kg of the mother liquor.
- the upper limit of the amine content is in the above range, the storage stability of colloidal silica is further improved.
- the method for preparing the mother liquor is not particularly limited, and an alkaline catalyst may be added to water by a conventionally known method and stirred.
- the pH of the mother liquor is not particularly limited and is preferably 9.5 or higher, more preferably 10.0 or higher.
- the pH of the mother liquor is preferably 12.0 or less, more preferably 11.5 or less.
- the storage stability of the colloidal silica is further improved.
- Step 2 is a step of adding alkoxysilane to the mother liquor to prepare a mixed solution.
- the alkoxysilane is not particularly limited, and the following general formula (2) Si(OR d ) 4 (2) (In the formula, R d represents an alkyl group.)
- R d represents an alkyl group.
- R d is not particularly limited as long as it is an alkyl group, and is preferably a lower alkyl group having 1 to 8 carbon atoms, and more preferably a lower alkyl group having 1 to 4 carbon atoms.
- Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, and a hexyl group.
- Examples of the alkoxysilane represented by the general formula (2) include tetramethoxysilane (tetramethyl orthosilicate) in which R d is a methyl group, tetraethoxysilane (tetraethyl orthosilicate) in which R d is an ethyl group, and R d.
- R d is preferably an isopropyl group, tetraisopropoxysilane is preferred, R d is a methyl group, tetramethoxysilane is more preferred, and R d is an ethyl group, tetraethoxysilane is more preferred, and tetramethoxysilane is even more preferred.
- the alkoxysilane represented by the general formula (2) may be a derivative.
- a low condensate obtained by partially hydrolyzing the alkoxysilane represented by the general formula (2) can be exemplified.
- the alkoxysilanes may be used alone or in combination of two or more.
- the alkoxysilane may be added all at once or may be added several times (for example, twice or three times).
- the amount of the alkoxysilane added in step 2 is not particularly limited, and is a molar ratio to the amount of the alkali catalyst in the mother liquor prepared in step 1, that is, (the amount of alkoxysilane added (mole))/(the amount of alkali catalyst in the mother liquor). (Mol)) is preferably 10 or more, more preferably 100 or more, still more preferably 150 or more. When the lower limit of the amount of alkoxysilane added is within the above range, the content of silica particles in the colloidal silica can be further increased.
- the amount of alkoxysilane added is preferably 8500 or less, more preferably 8000 or less, in molar ratio with respect to the amount of the alkali catalyst in the mother liquor prepared in Step 1.
- the upper limit of the amount of alkoxysilane added is within the above range, gelation is difficult during the reaction.
- the time required to add the alkoxysilane is preferably 5 minutes or longer, more preferably 10 minutes or longer.
- the time required for adding the alkoxysilane is preferably 1000 minutes or less, more preferably 600 minutes or less.
- the productivity is improved and the manufacturing cost can be suppressed.
- the pH of the mixed solution is preferably 8.5 or less, more preferably 8.0 or less.
- the pH of the mixed solution is preferably 4.5 or higher, more preferably 4.9 or higher.
- the lower limit of pH of the mixed solution is within the above range, gelation is difficult.
- the temperature of the mixed solution in step 2 is preferably 70 ° C. or higher, more preferably 75 ° C. or higher.
- the temperature of the mixed solution is preferably 95 ° C. or lower, more preferably 90 ° C. or lower.
- the upper limit of the temperature of the mixed solution is within the above range, the alkoxysilane is difficult to vaporize.
- Step 3 is a step of preparing colloidal silica by adding an alkaline catalyst to the mixed solution.
- the time from the end of addition of the alkoxysilane to the start of addition of the alkaline catalyst in step 3 (hereinafter referred to as "aging time") is preferably 0 minutes or more and 1440 minutes or less.
- the degree of irregularity can be controlled by the aging time, and when the aging time is within the above range, it is possible to obtain the particles having the desired degree of irregularity while ensuring the productivity.
- the alkaline catalyst is at least one amine selected from the group consisting of primary amines, secondary amines and tertiary amines (however, the hydroxyl group is excluded as a substituent).
- the amine the amine described in the colloidal silica may be used.
- the alkaline catalyst used in step 3 may be the same as or different from the alkaline catalyst used in step 1.
- the addition amount of the alkali catalyst in step 3 is not particularly limited, and is 30 or more in a molar ratio calculated by (addition amount of alkoxysilane in step 2 (mol))/(addition amount of alkali catalyst in step 3). Is preferable, and 35 or more is more preferable.
- the amount of the alkaline catalyst added is preferably 500 or less, more preferably 400 or less, and even more preferably 300 or less in terms of the molar ratio.
- the lower limit of the addition amount of the alkali catalyst is within the above range, the particle size can be easily controlled.
- the alkaline catalyst may be added in a total amount at one time, or may be added in several times (for example, twice or three times).
- the alkali catalyst may be added as a diluent after being diluted with a solvent such as water.
- the pH of the liquid after mixing with the alkaline catalyst in step 3 is preferably 8.0 or higher, more preferably 8.5 or higher.
- the pH of the liquid after mixing with the alkali catalyst is preferably 12.0 or less, more preferably 11.0 or less.
- the silica is difficult to dissolve.
- the temperature of the liquid after mixing the alkali catalyst in step 3 is preferably 70°C or higher, more preferably 75°C or higher.
- the temperature of the liquid after mixing the alkali catalyst is preferably 95°C or lower, more preferably 90°C or lower.
- gelation is difficult.
- the production method of the present invention may further include a step of concentrating colloidal silica after the step 3.
- the method of concentration is not particularly limited, and the concentration can be performed by a conventionally known method. Examples of such a concentration method include a method of concentrating by heating at a temperature of about 65 to 100°C.
- the concentration of the silica particles of the colloidal silica after concentration is not particularly limited, and is preferably about 10 to 50% by mass based on 100% by mass of the colloidal silica.
- the colloidal silica obtained in the step 3 contains the alcohol by-produced during the reaction and the organic solvent added in the step 3. Therefore, the step 3 may be followed by a step of distilling these organic solvents out of the system.
- the method of distilling the organic solvent out of the system is not particularly limited, and examples thereof include a method in which pure water is dropped while heating colloidal silica and the volume is kept constant to replace the dispersion medium with pure water. .. Further, as another method, a method of redispersing in water after precipitating and separating colloidal silica or after separating from a solvent by centrifugation or the like can be exemplified.
- the colloidal silica of the present invention has a content of metal impurities such as sodium, potassium, iron, aluminum, calcium, magnesium, titanium, nickel, chromium, copper, zinc, lead, silver, manganese, and cobalt of 1 ppm or less. Is preferred. When the content of metal impurities is 1 ppm or less, it can be suitably used for polishing electronic materials and the like.
- the colloidal silica of the present invention can be used as a physical property improver in the fields of paper, fiber, steel, etc., and can also be used as an abrasive for electronic materials such as semiconductor wafers. Further, by drying to obtain a powder, it can be used as a filler additive, a toner external additive, or the like.
- an abrasive containing the colloidal silica is one aspect of the present invention.
- the silica particles have an average primary particle diameter of 20 nm or less, and the ratio (m/n) of the alkoxy group content m (ppm) to the average primary particle diameter n (nm) is 300 or more. Since the average secondary particle diameter increase rate by the storage stability test is 12% or less, it can be suitably used as an abrasive for chemical mechanical polishing of semiconductor wafers.
- Example 1 7500 g of pure water as a solvent was placed in a flask, and 11.64 g of 3-ethoxypropylamine (3-EOPA) was added as an alkali catalyst to prepare a mother liquor. The pH of the mother liquor was 11.3.
- Step 2 After heating the mother liquor to an internal temperature of 85° C., 2740 g of tetramethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 120 minutes while controlling the temperature so as not to change the internal temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution.
- Step 3 Colloidal silica was prepared by adding 7.00 g of 3-ethoxypropylamine to the mixed solution. Its pH was 8.7.
- Example 2 7500 g of pure water as a solvent was placed in a flask, and 0.7737 g of 3-ethoxypropylamine as an alkali catalyst was added to prepare a mother liquor. The pH of the mother liquor was 10.7.
- Step 2 After heating the mother liquor to an inner temperature of 85° C., 2740 g of tetramethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 60 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 60 minutes to prepare a mixed solution.
- Step 3 28.0 g of 3-ethoxypropylamine was added to the mixed solution to prepare colloidal silica. Its pH was 9.6.
- Example 3 7500 g of pure water as a solvent was put in a flask, and 1.083 g of 3-ethoxypropylamine was added as an alkali catalyst to prepare a mother liquor.
- Step 2 After heating the mother liquor to an inner temperature of 85° C., 2740 g of tetramethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 60 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution.
- Step 3 24.00 g of 3-ethoxypropylamine was added to the mixed solution to prepare colloidal silica. Its pH was 9.3.
- Example 4 7500 g of pure water as a solvent was put in a flask, and 1.776 g of 3-ethoxypropylamine was added as an alkali catalyst to prepare a mother liquor.
- Step 2 After heating the mother liquor to an inner temperature of 85° C., 2740 g of tetramethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 60 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution.
- Step 3 Colloidal silica was prepared by adding 24.0 g of 3-ethoxypropylamine to the mixed solution. Its pH was 9.2.
- Step 1 6253 g of pure water as a solvent was placed in a flask, and 28.8 g of a 25% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) as an alkali catalyst was added to prepare a mother liquor.
- the pH of the mother liquor was 12.2.
- Step 2 After heating the mother liquor to an inner temperature of 80° C., 3330 g of tetramethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 240 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution. 800 mL of the obtained colloidal silica was sampled as a base amount under normal pressure, and heated and concentrated until the silica concentration became 20 mass %. At the end of heating and concentration, gelation occurred.
- TMAH tetramethylammonium hydroxide
- Comparative example 2 A mother liquor was prepared by placing 8543 g of pure water as a solvent in a flask and adding 2.9475 g of triethanolamine (TEA) as an alkali catalyst. The pH of the mother liquor was 8.6. (Step 2) After heating the mother liquor to an inner temperature of 80° C., 1533 g of tetramethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 180 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution. 800 mL of the obtained colloidal silica was sampled as a base amount under normal pressure, and heated and concentrated until the silica concentration became 20 mass %.
- TSA triethanolamine
- Step 1 5908 g of pure water as a solvent was placed in a flask, and 11.606 g of 25% by mass aqueous solution of tetramethylammonium hydroxide was added as an alkali catalyst to prepare a mother liquor.
- the pH of the mother liquor was 11.9.
- Step 2 After heating the mother liquor to an inner temperature of 80° C., 713.3 g of tetraethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 96 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution.
- Step 1 5940 g of pure water as a solvent was placed in a flask, and 13.8033 g of a 27 mass% aqueous solution of ammonia (NH 3 ) was added as an alkali catalyst to prepare a mother liquor.
- the pH of the mother liquor was 11.2.
- Step 2 After heating the mother liquor to an inner temperature of 80° C., 713.3 g of tetraethyl orthosilicate was added dropwise to the mother liquor at a constant rate over 84 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution.
- Step 1 10862 g of methanol as a solvent and 552.9 g of pure water as a solvent were placed in a flask, and 124.17 g of 27% by mass aqueous ammonia solution was added as an alkali catalyst to prepare a mother liquor.
- the pH of the mother liquor was 11.2.
- Step 2 After heating the mother liquor to an inner temperature of 60° C., a mixture of 1331 g of tetramethyl orthosilicate and 630.7 g of methanol was added dropwise to the mother liquor at a constant rate over 127 minutes while controlling the temperature so as not to change the inner temperature. After completion of the dropping, the mixture was stirred for 15 minutes to prepare a mixed solution. 800 mL of the obtained colloidal silica was sampled as a base amount under normal pressure, and heated and concentrated until the silica concentration became 20 mass %. At the end of heating and concentration, gelation occurred.
- Comparative Example 7 A mother liquor was prepared by adding 8102.3 g of methanol, 2359.0 g of pure water, and 469.9 g of 28 mass% ammonia water to the flask. After heating the mother liquor to an internal temperature of 35° C., a mixed solution of tetramethyl orthosilicate 2214.1 g and methanol 600.7 g was adjusted to the mother liquor under stirring for 240 minutes while controlling the temperature so that the internal temperature did not change. Rapidly dropped. After the dropping was completed, stirring was continued for 30 minutes to obtain a colloidal silica dispersion liquid. 800 mL of the obtained colloidal silica dispersion was sampled as a base amount under normal pressure, and concentrated by heating until the silica concentration became 20% by mass.
- colloidal silica was pre-dried on a hot plate and then heat-treated at 800 ° C. for 1 hour to prepare a sample for measurement.
- the BET specific surface area was measured using the prepared measurement sample.
- the true specific gravity of silica was set to 2.2, and the value of 2727/BET specific surface area (m 2 /g) was converted to the average primary particle diameter (nm) of silica particles in colloidal silica.
- the true specific gravity was measured by a measuring method in which colloidal silica was dried on a hot plate at 150° C. and kept in a furnace at 300° C. for 1 hour, and then a liquid phase replacement method using ethanol was used.
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Abstract
Description
項1.
コロイダルシリカであって、
前記コロイダルシリカに含まれるシリカ粒子は、平均一次粒子径が20nm以下であり、
前記シリカ粒子は、アルコキシ基含有量m(ppm)と平均一次粒子径n(nm)との比(m/n)の値が300以上であり、
前記シリカ粒子の真比重は1.95以上であり、
前記シリカ粒子は、保存安定性試験による平均二次粒子径増大率が12%以下である、
ことを特徴とするコロイダルシリカ。
項2.
コロイダルシリカであって、
前記コロイダルシリカに含まれるシリカ粒子は、平均一次粒子径が20nm以下であり、
前記シリカ粒子の真比重は1.95以上2.20以下であり、
前記シリカ粒子は、保存安定性試験による平均二次粒子径増大率が12%以下である、
ことを特徴とするコロイダルシリカ。
項3.
前記シリカ粒子は1級アミン、2級アミン及び3級アミンからなる群より選択される少なくとも1種のアミン(ただし、置換基として、ヒドロキシル基は除外する)をシリカ1g当たり5μmol以上含有する、項1又は2に記載のコロイダルシリカ。
項4.
(1)アルカリ触媒及び水を含む母液を調製する工程1、
(2)アルコキシシランを前記母液に添加して混合液を調製する工程2、及び、
(3)前記混合液にアルカリ触媒を添加して、コロイダルシリカを調製する工程3
をこの順に有するコロイダルシリカの製造方法であって、
前記アルカリ触媒は1級アミン、2級アミン及び3級アミンからなる群より選択される少なくとも1種のアミン(ただし、置換基として、ヒドロキシル基は除外する)である、
ことを特徴とするコロイダルシリカの製造方法。
本発明のコロイダルシリカは、コロイダルシリカ中に含まれるシリカ粒子は、平均一次粒子径が20nm以下であり、前記シリカ粒子は、アルコキシ基含有量m(ppm)と平均一次粒子径n(nm)との比(m/n)の値が300以上であり、前記シリカ粒子は、保存安定性試験による平均二次粒子径増大率が12%以下である、ことを特徴とする。
(b-a)/a×100=平均二次粒子径増大率(%)
NRaRbRc (1)
(式中、Ra、Rb、Rcは置換されてもよい炭素数1~12のアルキル基、又は水素を示す。ただし、Ra、Rb、Rcのすべてが水素の場合、つまりアンモニアは除外する。)
Ra、Rb、Rcは、同一でも異なっていてもよい。Ra、Rb、Rcは直鎖状、分岐状のいずれであってもよい。
好ましくはRa、Rb、Rcは、置換されていない直鎖状又は分岐状の炭素数1~12のアルキル基、またはアルコキシ基で置換された直鎖状又は分岐状の炭素数1~12のアルキル基である。一実施形態におけるアミンとして、3-エトキシプロピルアミン、ペンチルアミン、ヘキシルアミン、ジプロピルアミン、トリエチルアミンからなる群から選択される少なくとも1種のアミン等が挙げられる。
これらの中でも、より好ましくは、3-エトキシプロピルアミン、ジプロピルアミン、トリエチルアミンが好ましい。更に、コロイダルシリカの保存安定性をより一層向上させる上で、3-エトキシプロピルアミンが好ましい。
本発明のコロイダルシリカの製造方法は、
(1)アルカリ触媒及び水を含む母液を調製する工程1、
(2)アルコキシシランを前記母液に添加して混合液を調製する工程2、及び、
(3)前記混合液にアルカリ触媒を添加して、コロイダルシリカを調製する工程3
をこの順に有するコロイダルシリカの製造方法であって、
前記アルカリ触媒は1級アミン、2級アミン及び3級アミンからなる群より選択される少なくとも1種のアミン(ただし、置換基として、ヒドロキシル基は除外する)であることを特徴とする。本発明の製造方法は前記本発明のコロイダルシリカの製造に好適である。
工程1は、アルカリ触媒及び水を含む母液を調製する工程である。
工程2は、アルコキシシランを前記母液に添加して混合液を調製する工程である。
Si(ORd)4 (2)
(式中、Rdはアルキル基を示す。)
で表されるアルコキシシランが挙げられる。
工程3は、混合液にアルカリ触媒を添加して、コロイダルシリカを調製する工程である。
(工程1)フラスコに、溶媒として純水7500gを入れ、アルカリ触媒として3-エトキシプロピルアミン(3-EOPA)11.64gを添加することにより母液を調製した。母液のpHは11.3であった。
(工程2)母液を内温85℃まで加熱した後、当該母液にテトラメチルオルトシリケート2740gを内温変動しないよう温調しつつ、120分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
(工程3)混合液に3-エトキシプロピルアミン7.00gを添加して、コロイダルシリカを調製した。そのpHは8.7であった。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、純水750mLにて分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒として純水7500gを入れ、アルカリ触媒として3-エトキシプロピルアミン0.7737gを添加することにより母液を調製した。母液のpHは10.7であった。
(工程2)母液を内温85℃まで加熱した後、当該母液にテトラメチルオルトシリケート2740gを内温変動しないよう温調しつつ、60分かけて定速滴下した。滴下終了後60分間撹拌して、混合液を調製した。
(工程3)混合液に3-エトキシプロピルアミン28.0gを添加して、コロイダルシリカを調製した。そのpHは9.6であった。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、純水480mLにて分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒として純水7500gを入れ、アルカリ触媒として3-エトキシプロピルアミン1.083gを添加することにより母液を調製した。
(工程2)母液を内温85℃まで加熱した後、当該母液にテトラメチルオルトシリケート2740gを内温変動しないよう温調しつつ、60分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
(工程3)混合液に3-エトキシプロピルアミン24.00gを添加して、コロイダルシリカを調製した。そのpHは9.3であった。
得られたコロイダルシリカを常圧下、ベース量として850mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、純水1084mLにて分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒として純水7500gを入れ、アルカリ触媒として3-エトキシプロピルアミン1.776gを添加することにより母液を調製した。
(工程2)母液を内温85℃まで加熱した後、当該母液にテトラメチルオルトシリケート2740gを内温変動しないよう温調しつつ、60分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
(工程3)混合液に3-エトキシプロピルアミン24.0gを添加して、コロイダルシリカを調製した。そのpHは9.2であった。
得られたコロイダルシリカを常圧下、ベース量として850mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、純水1084mLにて分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒として純水6253gを入れ、アルカリ触媒としてテトラメチルアンモニウムヒドロキシド(TMAH)25質量%水溶液28.8gを添加することにより母液を調製した。母液のpHは12.2であった。
(工程2)母液を内温80℃まで加熱した後、当該母液にテトラメチルオルトシリケート3330gを内温変動しないよう温調しつつ、240分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。加熱濃縮終了時点でゲル化した。
(工程1)フラスコに、溶媒として純水8543gを入れ、アルカリ触媒としてトリエタノールアミン(TEA)2.9475gを添加することにより母液を調製した。母液のpHは8.6であった。
(工程2)母液を内温80℃まで加熱した後、当該母液にテトラメチルオルトシリケート1533gを内温変動しないよう温調しつつ、180分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、液温が100℃になるまで純水で分散媒を置換し、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒として純水5908gを入れ、アルカリ触媒としてテトラメチルアンモニウムヒドロキシド25質量%水溶液11.606gを添加することにより母液を調製した。母液のpHは11.9であった。
(工程2)母液を内温80℃まで加熱した後、当該母液にテトラエチルオルトシリケート713.3gを内温変動しないよう温調しつつ、96分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、液温が95℃になるまで純水で分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒として純水5940gを入れ、アルカリ触媒としてアンモニア(NH3)27質量%水溶液13.5803gを添加することにより母液を調製した。母液のpHは11.2であった。
(工程2)母液を内温80℃まで加熱した後、当該母液にテトラエチルオルトシリケート713.3gを内温変動しないよう温調しつつ、84分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、液温が95℃になるまで純水で分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
水891gにテトラメチルアンモニウムヒドロキシド1mol/L水溶液0.16gを加え撹拌して母液を調製し、還流するまで加熱した。また、水2494.8gにテトラメチルオルトシリケート205.2gを添加してケイ酸水溶液を調製した。還流下で、母液にケイ酸水溶液を4.5時間かけて連続滴下した。滴下中はpHを8程度に維持するように、テトラメチルアンモニウムヒドロキシド1mol/L溶液を合計で10.0g添加した。
得られたコロイダルシリカを常圧下、ベース量として400mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、純水200mLにて分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
(工程1)フラスコに、溶媒としてメタノール10862g、純水552.9gを入れ、アルカリ触媒としてアンモニア27質量%水溶液124.17gを添加することにより母液を調製した。母液のpHは11.2であった。
(工程2)母液を内温60℃まで加熱した後、当該母液にテトラメチルオルトシリケート1331gとメタノール630.7gの混合物を内温変動しないよう温調しつつ、127分かけて定速滴下した。滴下終了後15分間撹拌して、混合液を調製した。
得られたコロイダルシリカを常圧下、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。加熱濃縮終了時点でゲル化した。
フラスコに、メタノール8102.3g、純水2359.0g、28質量%のアンモニア水469.9gを入れ、母液を調製した。母液を内温35℃まで加熱した後、当該母液にテトラメチルオルトシリケート2214.1gとメタノール600.7gの混合溶液を内温が変動しないように温調しつつ、240分かけて攪拌下で定速滴下した。滴下終了後、30分間撹拌を継続し、コロイダルシリカ分散液を得た。得られたコロイダルシリカ分散液を常圧下にて、ベース量として800mL採取し、シリカ濃度が20質量%となるまで加熱濃縮した。次いで、メタノールを系外留去するために、容量を一定に保ちながら、純水1200mLにて分散媒を置換して、水分散コロイダルシリカを調製した。得られた水分散コロイダルシリカの物性を表1に示す。
コロイダルシリカをホットプレートの上で予備乾燥後、800℃で1時間熱処理して測定用サンプルを調製した。調製した測定用サンプルを用いて、BET比表面積を測定した。シリカの真比重を2.2として、2727/BET比表面積(m2/g)の値を換算して、コロイダルシリカ中のシリカ粒子の平均一次粒子径(nm)とした。
動的光散乱法の測定用サンプルとして、コロイダルシリカを0.3重量%クエン酸水溶液に加えて均一化したものを調製した。当該測定用サンプルを用いて、動的光散乱法(大塚電子株式会社製「ELSZ-2000S」)により平均二次粒子径(nm)を測定した。
平均二次粒子径/平均一次粒子径により算出される値を会合比とした。
対象となるシリカ粒子の平均二次粒子径aを測定した。次いで当該シリカ粒子を濃度20質量%で含み且つ分散媒が水であるコロイダルシリカを100mLポリ容器に満量入れて密封し、60℃の恒温槽内に静置した。静置1週間後に容器を恒温槽からとりだし、シリカ粒子の平均二次粒子径bを測定した。試験前の平均二次粒子径aに対する、試験後の平均二次粒子径bの増加の割合(b-a)を、次式から算出した値を、保存安定性試験による平均二次粒子径増大率(%)とする。
(b-a)/a×100=平均二次粒子径増大率(%)
コロイダルシリカを150℃のホットプレート上で乾固後、300℃炉内で1時間保持した後、エタノールを用いた液相置換法で測定する測定方法により、真比重を測定した。
コロイダルシリカを215000G、90分の条件で遠心分離後、上澄みを廃棄して固形分を60℃、90分の条件で真空乾燥させた。得られたシリカ乾固物0.5gを秤量し、1M水酸化ナトリウム水溶液50mLに入れ、撹拌させながら50℃で24時間加熱することでシリカを溶解させた。シリカ溶解液をイオンクロマトグラフにより分析し、アミン含有量を求めた。イオンクロマトグラフ分析は、JIS K0127に従った。
コロイダルシリカを215000G、90分の条件で遠心分離後、上澄みを廃棄して固形分を60℃、90分の条件で真空乾燥させた。得られたシリカ乾固物0.5gを秤量し、1M水酸化ナトリウム水溶液50mLに入れ、撹拌させながら50℃で24時間加熱することでシリカを溶解させた。前記シリカ溶解液をガスクロマトグラフにより分析し、アルコール含有量を求めた。求めたアルコール含有量をアルコキシ基含有量とした。ガスクロマトグラフの検出器は水素炎イオン化検出器(FID)を用いた。ガスクロマトグラフ分析は、JIS K0114に従った。
Claims (4)
- コロイダルシリカであって、
前記コロイダルシリカに含まれるシリカ粒子は、平均一次粒子径が20nm以下であり、
前記シリカ粒子は、アルコキシ基含有量m(ppm)と平均一次粒子径n(nm)との比(m/n)の値が300以上であり、
前記シリカ粒子の真比重は1.95以上であり、
前記シリカ粒子は、保存安定性試験による平均二次粒子径増大率が12%以下である、
ことを特徴とするコロイダルシリカ。 - コロイダルシリカであって、
前記コロイダルシリカに含まれるシリカ粒子は、平均一次粒子径が20nm以下であり、
前記シリカ粒子の真比重は1.95以上2.20以下であり、
前記シリカ粒子は、保存安定性試験による平均二次粒子径増大率が12%以下である、
ことを特徴とするコロイダルシリカ。 - 前記シリカ粒子は1級アミン、2級アミン及び3級アミンからなる群より選択される少なくとも1種のアミン(ただし、置換基として、ヒドロキシル基は除外する)をシリカ1g当たり5μmol以上含有する、請求項1又は2に記載のコロイダルシリカ。
- (1)アルカリ触媒及び水を含む母液を調製する工程1、
(2)アルコキシシランを前記母液に添加して混合液を調製する工程2、及び、
(3)前記混合液にアルカリ触媒を添加して、コロイダルシリカを調製する工程3
をこの順に有するコロイダルシリカの製造方法であって、
前記アルカリ触媒は1級アミン、2級アミン及び3級アミンからなる群より選択される少なくとも1種のアミン(ただし、置換基として、ヒドロキシル基は除外する)である、
ことを特徴とするコロイダルシリカの製造方法。
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