WO2020104699A1 - Beschichtete etfe-folie, verfahren zur herstellung und verwendung derselben - Google Patents
Beschichtete etfe-folie, verfahren zur herstellung und verwendung derselbenInfo
- Publication number
- WO2020104699A1 WO2020104699A1 PCT/EP2019/082357 EP2019082357W WO2020104699A1 WO 2020104699 A1 WO2020104699 A1 WO 2020104699A1 EP 2019082357 W EP2019082357 W EP 2019082357W WO 2020104699 A1 WO2020104699 A1 WO 2020104699A1
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- etfe film
- coating
- coated
- film
- film according
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0084—Producing gradient compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2518/00—Other type of polymers
- B05D2518/10—Silicon-containing polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08J2327/18—Homopolymers or copolymers of tetrafluoroethylene
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A40/00—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
- Y02A40/10—Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in agriculture
- Y02A40/25—Greenhouse technology, e.g. cooling systems therefor
Definitions
- the present invention relates to a coated ETFE (ethylene-tetrafluoroethylene copolymer) film, the static water contact angle on the surface of the coating being> 60 and on the surface of the coating, measured with XPS, at least 1 atom% of silicon, Titanium, zinc and / or aluminum is present, based on the total number of atoms measured with XPS.
- ETFE ethylene-tetrafluoroethylene copolymer
- the invention further relates to the use of the ETFE film coated according to the invention for coating buildings, in particular houses and very particularly greenhouses, and to a method for producing the ETFE film according to the invention.
- ETFE (ethylene-tetrafluoroethylene copolymer) films are often used in architecture because of their durability, their good UV resistance and their good transparency, especially in the UV range, and their good mechanical and thermal properties. These foils have a low surface energy. Low surface energies are advantageous outdoors to ensure that water and dirt roll off. The low surface energy is often undesirable indoors because it can cause condensation, usually in the form of drops, to form on the film surface. This can lead to undesired dripping of condensed water. In addition, it cannot be ruled out that there is a burning glass effect when sunlight is focused by the drop.
- condensation water drops is particularly harmful when using films for greenhouse roofs, because both the hanging drops and dripping onto the plants lead to a "burning" of the plant leaves and thus significantly reduce the growth and yield of the plants.
- mold formation is made possible and promoted. Therefore, especially with roof pitches greater than 20 °, no water drops should drip down or remain permanently due to condensation on the inside of the roof surface. According to the prior art, this is not possible in the long term when using ETFE films without impairing the good UV permeability of the films. State of the art:
- ETFE foils on the surface e.g. by a corona treatment (compare e.g. EP 2 530 1 12 A1) or a plasma treatment, e.g. can be hydrophilized with oxygen, nitrogen or argon plasmas.
- Oxygen atoms are primarily installed on the film surface. As a result, their polarity increases and water can better wet the surface.
- the ETFE polymer chains have chain segment mobility which is not restricted by cross-linking or side chains.
- the ETFE film system also aims to minimize surface energy. This means that the activated hydrophilic chain segments “dip” into the material and untreated or weakly treated chain segments appear on the surface. As a result, the surface energy of the treated ETFE film decreases again during aging. This effect of minimizing the surface energy is accelerated especially when the temperature is increased, because this increases the chain segment mobility.
- ETFE films can be coated wet-chemically, for example by lacquers (compare, for example, EP 2 397 029 B1), sol-gel systems or else by coextrusion.
- lacquers compare, for example, EP 2 397 029 B1
- sol-gel systems sol-gel systems or else by coextrusion.
- the UV resistance suffers, the UV permeability is reduced and the mechanical properties of the film are changed (for example higher basis weight, reduction in shrinkage of the film under the influence of temperature).
- the mechanical properties of the ETFE films should preferably remain unchanged and / or the effect of the drop reduction should remain as long as possible and / or also withstand elevated temperatures. It is furthermore preferred that the desired effects remain even if the typical film shrinkage of an ETFE film occurs after exposure to temperature.
- this object is achieved by a coated ETFE film, the static water contact angle on the surface of the coating being ⁇ 60 ° and on the surface of the coating, measured with XPS, at least 1 at% silicon, 1 at% titanium, 1 at% Zinc and / or 1 at% aluminum is present, based on the total number of atoms measured with XPS, with the proviso that if only aluminum is covered on the surface by silicon, titanium, zinc and aluminum, the following applies: on the surface of the Coating is comprised between 1 at% and 18 at%, preferably between 3 at% and 15 at% and particularly preferably between 6 at% and 10 at% fluorine, which is not bound in the form of tetrafluoroethylene units, based on the total number of the atoms measured with XPS.
- the ETFE film coated with a silicon-containing layer (and / or a titanium-containing layer and / or a zinc-containing layer and / or an aluminum-containing layer) with the corresponding static water contact angle over a long period of time has the positive properties of the ETFE film Maintains period of time and under the conditions of use and which reduces and in the best case prevents the tendency to drip when condensation forms.
- the static water contact angle is described in Example 3 in
- the XPS X-Ray photoelectrons spectroscopy, also called electron spectroscopy for chemical analysis, ESCA
- ESCA electron spectroscopy for chemical analysis
- a coated ETFE film is preferred, with a surface of the coating irrespective of whether only aluminum on the surface is comprised of silicon, titanium, zinc and aluminum, between 1 at% and 18 at%, preferably between 3 at% and 15 at% and particularly preferably between 6 at% and 10 at%, fluorine, which is not bound in the form of tetrafluoroethylene units, is included, based on the total number of atoms measured with XPS.
- fluorine which is not bound to tetrafluoro units means that it is fluorine, which may, but does not have to, come from the tetrafluoroethylene units of the ETFE. It is preferred according to the invention that the fluorine comes at least predominantly from the tetrafluoroethylene units of the ETFE. This fluorine, which is not bound to tetrafluoroethylene units, is also referred to below as “Fluor Extra O or F Extra . It has been found in the course of the development of the present invention that it is advantageous to have a certain amount of fluorine on the surface, the fluorine being present differently than to ETFE.
- ETFE film coated according to the invention a ratio of> 0.5, preferably> 1, more preferably> 2 greater on the surface of the coating compared to the interior of the ETFE film, which is not bound in the form of tetrafluoroethylene units and the proportion of fluorine which is bound in the form of tetrafluoroethylene units is present.
- the "interior of the ETFE film” in the context of this text is to be understood as the middle area of the ETFE film (without coating). If in doubt, the value of the respective atomic concentration is "inside the ETFE film” in the middle of the ETFE film to determine perpendicular to their surface, it being preferred that the coating for determining the respective center is not included. However, since in many cases it is not easy to determine the concrete boundary between the coating and the original film in the ETFE film coated according to the invention, in the case of doubt the thickness of the coating is not subtracted when determining the center, in other words, it applies as the destination for the values in the “interior of the ETFE film”, the middle between the two surfaces of the coated ETFE film according to the invention.
- An ETFE film coated according to the invention is preferred, wherein on the surface of the coating compared to the interior of the ETFE film between 0.5 at% and 18 at%, preferably between 1 at% and 15 at% and particularly preferably between 2 at % and 10 at% more fluorine, which is not bound to tetrafluoroethylene units, is included, based on the total number of atoms measured with XPS.
- the above-described ratios of fluorine not bound to tetrafluoroethylene units or the absolute concentrations of fluorine not bound to tetrafluoroethylene units are a good indication ensure that the coating has good or excellent adhesion to the originally uncoated ETFE film. If a suitable application process is selected, it is the case that parts of the ETFE units are chemically changed during the application process, in particular by removing fluorine or fluorine-containing parts of the molecule, so that the bond between the coating and the original ETFE film is promoted.
- the fluorine-containing parts of the molecule interact with the medium to be deposited during the layer application, are thus also separated and form a particularly adhesive mixed layer.
- the application methods are plasma processes or processes with a radiation component with wavelengths ⁇ 250 nm, preferably 200 nm.
- the coated ETFE film according to the invention comprises fluorine (F), oxygen (O) and carbon (C). It is particularly preferred that the coating to be used according to the invention consists of> 95% of the elements silicon, aluminum, zinc, titanium, oxygen, carbon, fluorine and hydrogen, more preferably> 98 atom%, each measured by XPS.
- the ETFE film surface coated according to the invention, measured with XPS on the side of the coating, preferably has the following element composition (acceptance angle 0 °, ie orthogonal to the sample surface or 0 ° to the surface normal):
- the ETFE film surface coated according to the invention further preferably has the following element composition on the side of the coating measured with XPS, with a take-off angle of 0 (i.e. orthogonal to the sample surface or 0 ° to the surface normal):
- the concentration of fluorine [Fextra], which is not bound in the form of tetrafluoroethylene units, is calculated from the difference between the measured fluorine concentration of the coated ETFE film surface [Fo ° ] and the calculated fluorine concentration of the tetrafluoroethylene units of the ETFE at the Surface.
- This species is, without being bound by theory, by the action of the coating process, in particular z. B. a plasma or the associated radiation component on the ETFE film and / or by redeposition of the fluorine during the layer deposition and causes a transition from the ETFE film to the coating. In this transition area there are concentration gradients that do not form a sharp interface but an interphase that enables the coating to adhere particularly well to the ETFE film.
- the concentration [Fextra] is preferably between 1 at% and 18 at%, particularly preferably between 3 at% and 15 at% and particularly preferably between 6 at% and 10 at%, in each case based on the total number of atoms detected with XPS.
- [Fextra] [F] - [FTFE]
- the fluorine concentration FTFE is calculated as follows:
- an ETFE film coated according to the invention is preferred, the coating having a concentration gradient for the concentration of the fluorine which is not bound to tetrafluoroethylene units, the concentration preferably decreasing towards the depth.
- This fluorine concentration gradient indicates a particularly suitable coating process, in particular a plasma polymer coating process.
- an ETFE film coated according to the invention is preferred, the coating having a concentration gradient for the concentration of the elements O and / or C and / or Si and / or Ti and / or Zn and / or Al, with preference
- the Si concentration decreases towards the depth and / or - the Ti concentration decreases towards the depth and / or
- the XPS measurements at a take-off angle of 70 ° preferably result in the following concentration differences compared to the XPS measurements at a take-off angle of 0 °:
- D values ⁇ 0 mean a decrease in the concentration of the respective element towards the depth and D values> 0 mean an increase in the concentration of the respective element towards the depth.
- an ETFE film coated according to the invention is an ETFE film coated according to the invention, the applied coating on the surface, measured with XPS, containing at least 0.5 at% fluorine; preferably at least 1 at%, based on the total number of atoms measured with XPS.
- the fluorine on the surface of the coating is not in the form of tetrafluoroethylene units. -5 at% ⁇ AF extra ⁇ - 0.25 at%, each based on the total number of XPS detected atoms DR extra— [F extra, 0 °] ⁇ [F extra, 70 °].
- compositions of the coating in particular the preferred ones, have good properties in the sense of the task.
- a coated ETFE film is preferred according to the invention, the applied coating having a static contact angle with respect to water of ⁇ 60 °, preferably ⁇ 50 °, particularly preferably ⁇ 40 °.
- the applied coating having a disperse proportion of the surface energy in the range from 25 to 45 mN / m, preferably between 28 to 40 mN / m.
- the disperse proportion of the surface energy is determined as in Example 3 listed.
- An ETFE film according to the invention is preferred, the coated ETFE film compared to the uncoated ETFE film in the wavelength range between 300 nm and 400 nm having a UV reduced by less than 3%, particularly preferably less than 2%, more preferably less than 1% -Light transmission.
- the above-described features which can be achieved according to the invention are particularly advantageous for the use of the coated ETFE film according to the invention. It is easily possible for the person skilled in the art to achieve particularly favorable properties for the application desired by him on the basis of the information given, in particular by means of the preferred substance compositions, within the technical scope spanned by the invention.
- the applied coating is a plasma polymer coating. Plasma polymers can be controlled particularly well with regard to the layer properties and can be varied well for the person skilled in the art within the scope of the invention, in particular on the basis of the information described in the examples below. Basically, the coatings of the invention can also be produced in a different way than plasma polymer coatings. However, these are particularly well accessible to a person skilled in the art.
- Alternative preferred coating methods for the production of the ETFE film coated according to the invention are, in addition to the plasma polymeric coating (which is particularly preferred), also application methods such as reactive sputtering of aluminum, zinc or titanium or their oxides. It is particularly preferred that in these cases the film is in a direct line of sight to the sputter source (line-of-sight) and further preferably the distance between the sputter source and the film is small, so that the ETFE film is present due to the plasma and / or high-energy radiation with wavelengths preferably ⁇ 250 nm, more preferably ⁇ 200 nm is influenced.
- the distances between the sputtering source and the film are preferably ⁇ 10 cm, more preferably ⁇ 5 cm, more preferably ⁇ 2 cm, more preferably ⁇ 1 cm. It is particularly preferred for all application methods according to the invention that the coating material (ie the material that is applied to the ETFE film) does not include fluorine.
- An ETFE film according to the invention is preferred, the coating applied after heating for 5 minutes to 90 ° C. and subsequent cooling to room temperature having a static water contact angle of ⁇ 60 ° and / or a surface energy of> 45 mN / m being further preferred > 50 mN / m, particularly preferably> 55 mN / m.
- the values for the water contact angle and / or the surface energy mentioned in the preceding paragraph are even more preferred even when heated for 5 minutes to 95 ° C., preferably to 100 ° C., more preferably to 105 ° C. to 110 ° C., particularly preferably to 115 ° C. and very particularly preferably to 120 ° C. and subsequent cooling to room temperature.
- These properties are particularly important for many uses of the film according to the invention, since it is often necessary to heat the film briefly in order to apply it to the target surface.
- the transmission at a wavelength of 400 nm in the film according to the invention with a film thickness of 100 pm is preferably at least 0.75, more preferably at least 0.80, and even more preferably at least 0.82, and preferably at most 0.95, more preferably at most 0.90, and even more preferably at most 0.87.
- the applied coating preferably has a layer thickness of less than 50 nm, particularly preferably less than 35 nm, more preferably less than 25 nm, particularly preferably less than 15 nm.
- Part of the invention is also the use of a coated ETFE film according to the invention for the equipment, in particular in the form of coating buildings, preferably houses, particularly preferably greenhouses.
- an ETFE film to be used according to the invention which, after heating up to its softening and subsequent cooling to room temperature, preferably shrinks by at least one spatial direction of> 0.5% > 1%. This is helpful in order to apply the film as the outer skin of a building (or in the case of glass houses also as an internal coating) by means of sufficient film tension.
- the mechanical properties of these ETFE films, which are preferably used correlate particularly well with those of the coating to be used according to the invention.
- Part of the invention is also a method for producing the coated ETFE film according to the invention, comprising the steps a) providing an ETFE film, preferably in a preferred variant described above, b) applying a coating as defined above, preferably likewise a preferred one Variant on the ETFE film.
- a method according to the invention is preferred, in which a plasma-polymeric coating is applied in step b), preferably with hexamethyldisiloxane (HDMSO) as the precursor and / or in a subsequent step c), plasma activation is preferably carried out using oxygen-containing gases, preferably using oxygen.
- the plasma treatment process preferably consists of several process steps, particularly preferably it includes a coating step and a subsequent activation step, further preferably a process step for simultaneous drying and activation is carried out before the coating step.
- a compound which forms a layer under the action of plasma preferably as a gas (with) is introduced into the plasma chamber in at least one process step (coating).
- This compound is preferably a silicon-containing, more preferably organosilicon, even more preferably a compound selected from the group consisting of silanes, siloxanes, silazanes and very particularly preferably HDMSO.
- An alternative preferred method according to the invention is one in which in step b) a Ti-containing and / or Al-containing and / or Zn-containing metal oxide layer is preferably applied by reactive gas sputtering, in which the ETFE film is in a direct view of the sputtering source and / or the distance between the sputtering source and the film is preferably ⁇ 10 cm, more preferably ⁇ 5 cm, more preferably ⁇ 2 cm, more preferably ⁇ 1 cm and / or wherein preferably in a subsequent step c) plasma activation by means of oxygen-containing gases , preferably by means of oxygen.
- the film for coating is preferably guided at least partially at a distance of at least 4 mm and at most 200 mm in front of a plate electrode; wherein the film preferably has a web width of at least 350 mm and the plate electrode is at least 5 mm wider than the web width of the film.
- the fluoropolymer film is preferably guided in front of the electrode at a speed between 0.5 m / min and 150 m / min, particularly preferably between 1.5 m / min and 50 m / min.
- the film is preferably guided along at least 0.3 m, particularly preferably at least 1 m, in front of a plate electrode in the web direction.
- the film is guided along at least two plate electrodes with a total length (in the direction of the web) of at least 0.3 m, particularly preferably at least 1 m, when coating.
- the film is guided in the plasma chamber at least one meter (web length) at a distance of more than 250 mm from the electrode at least before and / or after a distance with a maximum distance of 150 mm in front of the electrode.
- the plate electrode is preferably a high-frequency plate electrode.
- a self-BIAS of less than 50 V, particularly preferably less than 30 V, more preferably less than 10 V is preferably present during the coating process.
- the coating is preferably applied in a roll-to-roll process in a low-pressure plasma reactor.
- the low-pressure plasma reactor is particularly preferably operated at pressures between 0.01 and 0.5 mbar, preferably between 0.02 and 0.1 mbar.
- the surface of the ETFE film preferably has a surface energy of> 50 mN / m, preferably> 60 mN / m, particularly preferably> 68 mN / m (measured according to Owens Wendt with values of Ra at Kaelble).
- metal oxide-containing, particularly preferably aluminum oxide-containing, titanium oxide-containing and or zinc oxide-containing coatings can be deposited.
- the person skilled in the art uses, for example, PE-CVD technologies or reactive sputtering techniques for this.
- the ETFE film has a shrinkage of 1% in the direction of the film web with a relative error of 12% both with plasma coating from Example 5 and without coating.
- the XPS investigations were carried out with a Thermo K-Alpha K1102 system with an upstream argon glovebox for handling air-sensitive samples.
- Parameters Acquisition angle of the photoelectrons 0 or 70 °, monochromatized AI Ka excitation, constant analyzer energy mode (CAE) with 150 eV pass energy in overview spectra (increment 0.5 eV, 2 scans with a recording time of 9 min 4.2 sec. ) and 40 eV pass energy in the energetically high-resolution spectra (step size 0.05 eV, 10 scans with a recording time of 12 minutes and 21 seconds).
- CAE constant analyzer energy mode
- the quantification takes place on the basis of documented relative sensitivity factors of the elements taking into account the specific analyzer transmission function based on the assumption of a homogeneous distribution of the elements within the XPS information depth (approx. 10 nm with a decrease angle of the photoelectrons of 0 and 3.5 nm respectively a decrease angle of the photoelectrons of 70 °).
- the detection limit of the method is element-specific and is approx. 0.1 at%.
- Ci FE portion calculated from the results of the XPS measurements:
- Example 3 Measurement of surface energies A "Mobile Surface Analyzer (MSA)" from Krüss GmbH, Hamburg, was used to measure the surface energies. This is a contact angle measuring device in which two parallel drops are dosed onto the sample surface with one click. The test drop is metered onto the sample surface at room temperature without contact and has a volume of approx. 1 pl. 5 seconds after dosing the drop, a picture is taken and the static contact angle is first determined automatically using the "lying drop (double)" procedure. The automatic evaluation of the recordings is later visually checked and, if necessary, the baseline is manually corrected and recordings that cannot be evaluated are sorted out.
- MSA Mobile Surface Analyzer
- test liquids water and diiodomethane are carried out at at least ten different locations on the same sample. The mean value is formed from this.
- the test liquids used are water (surface tension: 72.80 mN / m; disperse fraction: 21.80 mN / m; polar fraction: 51.00 mN / m) and diiodomethane (surface tension: 50.80 mN / m; disperse fraction: 50 , 80 mN / m; polar fraction: 0.00 mN / m) was used.
- surface energy of the test liquids e.g. check with the Wilhelm scales and always check for fresh and pure test liquid.
- the program "Advance" version 1.6.2.0.) From Krüss GmbH is used as measuring software.
- Table 4 Results of the contact angle measurements As can be seen from the results in Tables 3 and 4, the coating is not only characterized by a high surface energy, which is still clear even after tempering for 5 minutes at 90 ° C and for one minute at 125 ° C is present, but also due to a high disperse proportion. In organosilicon plasma polymer coatings, the disperse fraction is an indicator of the density and thus a high degree of crosslinking of the coating. These values also ensure that the film is completely covered with the coating.
- the layer integrity is not affected by the film shrinkage associated with the tempering.
- the layer does not come off and is smudge-resistant (dry, moderate manual pressure with a cotton cloth, wiped 5 times in one direction).
- the ETFE film coated according to Example 5 was wiped in one area in a 6x area with moderate pressure using a four-fold profix all-purpose cloth. No change in the film surface could be seen with the naked eye. The surface energy was then measured with the MSA in this area (see Table 5).
- deionized water was sprayed onto the wiped area and next to it with a 30 ml spray bottle with a pump sprayer. In both cases, the deionized water shows no tendency to form drops - a clear sign of an unchanged hydrophilic surface.
- a film according to the prior art the film F-Clean from AGC Chemicals Europe, Ltd. wiped as well.
- a 100 pm thick film of ethylene-tetrafluoroethylene copolymer (ETFE; manufacturer: PATI, SpA, product etfect) was rolled in a rectangular low-pressure plasma reactor with a volume of 15 m 3 and a chamber wall made of stainless steel -Roller process coated.
- the side walls of the system are equipped with water-cooled, flat high-frequency electrodes.
- the film is guided past this at a distance of 40 mm during wrapping.
- the length of this area is 1650 mm in the film winding direction on each chamber side.
- a web guide is selected which takes into account that the same side of the film is oriented towards the electrode on both sides of the system.
- the gap that forms with the film results in a particularly intensive discharge, which is visually noticeable by a significantly lighter plasma.
- the film is open in one less during the wrapping process strong spatial plasma discharge. Accordingly, the influence of plasma also takes place here, especially since the free length of the goods is a total of 14.3 m.
- the system is designed in such a way that the high-frequency power can be fully coupled in without any significant reverse power.
- the film was dried in a first step by wrapping it in a vacuum, plasma-coated in the second step and plasma-activated in the third step.
- the film was fed as a 1000 mm wide web in three completely successive steps alternately from a take-up to a take-up roll and back again.
- the surface described in the examples always refers to the side of the film that is oriented towards the electrode when the web is guided.
- the device used is a Specord 210plus from analytikjena. A wavelength resolution of 1 nm was used.
- the transmission spectra of the uncoated ETFE film, the coated ETFE film according to Example 5 and the F-Clean film were recorded in the UV-VIS range using a Specord 210plus two-beam measuring device from Analytik Jena. The films were measured against air as a reference in the wavelength range from 200 nm to 800 nm. measured.
- the spectra are shown in FIG. 1.
- the coated ETFE film according to Example 5 has almost the same transmission as the uncoated film, while the spectrum of the F-Clean film has a significantly lower transmission.
- the coated ETFE film shows a transmission that is reduced by a maximum of 1% in the range between 280 and 800 nm compared to the uncoated ETFE film.
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Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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EP19809061.5A EP3883990A1 (de) | 2018-11-23 | 2019-11-25 | Beschichtete etfe-folie, verfahren zur herstellung und verwendung derselben |
CA3120783A CA3120783A1 (en) | 2018-11-23 | 2019-11-25 | Coated etfe film, method for producing same, and use of same |
AU2019385725A AU2019385725A1 (en) | 2018-11-23 | 2019-11-25 | Coated ETFE film, method for producing same, and use of same |
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DE102018129644.4 | 2018-11-23 | ||
DE102018129644 | 2018-11-23 |
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WO2020104699A1 true WO2020104699A1 (de) | 2020-05-28 |
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PCT/EP2019/082357 WO2020104699A1 (de) | 2018-11-23 | 2019-11-25 | Beschichtete etfe-folie, verfahren zur herstellung und verwendung derselben |
Country Status (4)
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EP (1) | EP3883990A1 (de) |
AU (1) | AU2019385725A1 (de) |
CA (1) | CA3120783A1 (de) |
WO (1) | WO2020104699A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4091437A1 (de) * | 2021-05-20 | 2022-11-23 | Hueck Folien Gesellschaft m.b.H. | Verfahren zur herstellung einer hydrophilen beschichtung eines fluorpolymermaterials |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1829916A1 (de) * | 2004-12-03 | 2007-09-05 | Asahi Glass Company, Limited | Ethylen-tetrafluorethylen-copolymer-formkörper und herstellungsverfahren dafür |
EP2096191A1 (de) * | 2006-11-02 | 2009-09-02 | Asahi Glass Company, Limited | Formprodukt aus ethylen-tetrafluorethylen-copolymer und herstellungsverfahren dafür |
EP2530112A1 (de) | 2010-01-29 | 2012-12-05 | Asahi Glass Company, Limited | Oberflächenbehandlungsverfahren für einen fluorharz-formkörper und fluorharz-formkörper |
EP2546054A1 (de) * | 2010-03-12 | 2013-01-16 | Asahi Glass Company, Limited | Laminat und herstellungsverfahren dafür |
EP2397029B1 (de) | 2009-02-13 | 2013-09-18 | Asahi Glass Company, Limited | Landwirtschaftliche folie |
WO2017153782A2 (en) | 2016-03-11 | 2017-09-14 | Evolve Growing Solutions Limited | Structures |
-
2019
- 2019-11-25 CA CA3120783A patent/CA3120783A1/en active Pending
- 2019-11-25 WO PCT/EP2019/082357 patent/WO2020104699A1/de unknown
- 2019-11-25 AU AU2019385725A patent/AU2019385725A1/en not_active Abandoned
- 2019-11-25 EP EP19809061.5A patent/EP3883990A1/de active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1829916A1 (de) * | 2004-12-03 | 2007-09-05 | Asahi Glass Company, Limited | Ethylen-tetrafluorethylen-copolymer-formkörper und herstellungsverfahren dafür |
EP2096191A1 (de) * | 2006-11-02 | 2009-09-02 | Asahi Glass Company, Limited | Formprodukt aus ethylen-tetrafluorethylen-copolymer und herstellungsverfahren dafür |
EP2397029B1 (de) | 2009-02-13 | 2013-09-18 | Asahi Glass Company, Limited | Landwirtschaftliche folie |
EP2530112A1 (de) | 2010-01-29 | 2012-12-05 | Asahi Glass Company, Limited | Oberflächenbehandlungsverfahren für einen fluorharz-formkörper und fluorharz-formkörper |
EP2546054A1 (de) * | 2010-03-12 | 2013-01-16 | Asahi Glass Company, Limited | Laminat und herstellungsverfahren dafür |
WO2017153782A2 (en) | 2016-03-11 | 2017-09-14 | Evolve Growing Solutions Limited | Structures |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4091437A1 (de) * | 2021-05-20 | 2022-11-23 | Hueck Folien Gesellschaft m.b.H. | Verfahren zur herstellung einer hydrophilen beschichtung eines fluorpolymermaterials |
WO2022243162A1 (de) * | 2021-05-20 | 2022-11-24 | Hueck Folien Gesellschaft M.B.H. | Verfahren zur herstellung einer hydrophilen beschichtung eines fluorpolymermaterials |
Also Published As
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AU2019385725A1 (en) | 2021-06-17 |
EP3883990A1 (de) | 2021-09-29 |
CA3120783A1 (en) | 2020-05-28 |
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