WO2020019654A1 - Double-sided digitalized exposure system with parallel double platforms, and exposure method - Google Patents

Double-sided digitalized exposure system with parallel double platforms, and exposure method Download PDF

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Publication number
WO2020019654A1
WO2020019654A1 PCT/CN2018/122485 CN2018122485W WO2020019654A1 WO 2020019654 A1 WO2020019654 A1 WO 2020019654A1 CN 2018122485 W CN2018122485 W CN 2018122485W WO 2020019654 A1 WO2020019654 A1 WO 2020019654A1
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WIPO (PCT)
Prior art keywords
exposure
component
loading
double
area
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PCT/CN2018/122485
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French (fr)
Chinese (zh)
Inventor
汪孝军
廖平强
Original Assignee
中山新诺科技股份有限公司
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Priority to CN201810836041.2 priority Critical
Priority to CN201810836041.2A priority patent/CN108897197A/en
Application filed by 中山新诺科技股份有限公司 filed Critical 中山新诺科技股份有限公司
Publication of WO2020019654A1 publication Critical patent/WO2020019654A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2022Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Abstract

Provided is a double-sided exposure machine, comprising a mounting frame; a first exposure assembly (210) and a second exposure assembly (220), which are oppositely arranged and can both move along the mounting frame; and a first loading platform (310) and a second loading platform (320), which can both move along the mounting frame. Further provided is a double-sided exposure method applied to a double-sided exposure machine, the method comprising: providing a first exposure assembly (210) and a second exposure assembly (220), and forming a first exposure area in a first motion state; a first loading platform (310) moving within the first exposure area and exposing a first member to be exposed (311); at the same time, a second loading platform (320) loading a second member to be exposed; forming a second exposure area in a second motion state; the second loading platform (320) moving within the second exposure area and exposing the second member to be exposed; and at the same time, the first loading platform (310) unloading or loading the next first member to be exposed. The method can not only expose front and back faces without turning same over, but also fully use the time for an exposure process, thereby improving the exposure efficiency and facilitating automatic operation thereof.

Description

Parallel double-sided double-sided digital exposure system and exposure method Technical field

The invention relates to the technical field of double-sided exposure, in particular to a double-sided exposure machine and a double-sided exposure method.

Background technique

Conventional double-sided exposure machines usually use film transfer to expose double-sided circuit boards. Before the exposure, you need to make the film with the pattern to be transferred. Then, fix the film with the pattern on both sides to the upper and lower glass. Then, sandwich the circuit board with the pattern to be transferred between the upper and lower glass. The blue-violet high-brightness light source is exposed, and the circuit pattern is transferred to the circuit board to complete double-sided exposure. For laser direct writing exposure machines, single-sided exposure is usually used. First, one side of the circuit board is exposed, and after the exposure is completed, the other side is flipped, and then the other side of the circuit board is exposed, and finally the double-sided exposure of the circuit board is completed.

However, the laser direct writing exposure machine needs to perform a flip operation when performing double-sided exposure, and the flip operation will inevitably cause the problem of alignment after the flip, which not only increases the exposure process, but also affects the exposure accuracy due to the alignment accuracy problem. Thus affecting the final exposure effect.

Summary of the Invention

Based on this, it is necessary to provide a double-sided exposure machine and a double-sided exposure method. The double-sided exposure machine does not need to be reversed during exposure, reduces the exposure process, improves the exposure accuracy, and then improves the imaging quality of the exposure. The double-sided exposure method is applied to the aforementioned double-sided exposure machine, which has higher exposure efficiency and facilitates automated operations. .

Its technical scheme is as follows:

In one aspect, a double-sided exposure machine is provided, including a mounting bracket; an exposure mechanism, the exposure mechanism including a first exposure component and a second exposure component opposite to each other, the first exposure component and the second exposure component Both can move along the mounting frame; and a loading mechanism, the loading mechanism includes a first loading platform and a second loading platform, and both the first loading platform and the second loading platform can move along the mounting frame; The first exposure component and the second exposure component form a first exposure area in a first motion state, and the first loading stage moves in the first exposure area and performs exposure; the first exposure component And the second exposure component forms a second exposure area in a second motion state, and the second loading stage moves in the second exposure area and performs exposure.

In the above-mentioned double-sided exposure machine, the first exposure area is formed in the first motion state by the setting of the first exposure component and the second exposure component, and the first loading stage moves in the first exposure area and exposes the first to-be-exposed piece. At the same time, the second loading stage loads the second to-be-exposed piece, and a second exposure zone is formed in the second movement state. The second loading stage moves in the second exposure zone and performs the exposure of the second to-be-exposed piece, and at the same time, the first loading The table unloads or loads the next first to-be-exposed piece, which not only realizes front and back exposure without reversing, but also makes full use of the time of the exposure process, improves exposure efficiency, and facilitates automated operations.

The technical solution is further described below:

In one embodiment, the mounting frame is further provided with a worktable provided with an exposure through-hole, the exposure through-hole is corresponding to the first exposure area and the second exposure area, and the first exposure component and the second exposure component are respectively provided. On both sides of the worktable, the first loading platform and the second loading platform are moved along the worktable.

In one embodiment, the workbench is provided with a first track and a second track, the first loading stage moves along the first track, and the second loading stage moves along the second track.

In one embodiment, the exposure through-hole includes a first exposure through-hole and a second exposure through-hole, the first exposure through-hole is disposed corresponding to the first exposure area, and the second exposure through-hole is disposed corresponding to the second exposure area.

In one embodiment, the mounting frame is further provided with a moving guide rod and a moving frame that moves in cooperation with the moving guide rod, and the first exposure component and the second exposure component are provided on the moving frame.

In one embodiment, the first exposure module and the second exposure module both move in the first direction, and the first loading stage and the second loading stage both move in the second direction.

In one embodiment, a control mechanism is further included. The control mechanism includes a controller for controlling the movement of the first exposure module, the second exposure module, the first loading stage and the second loading stage.

In one embodiment, a detection mechanism is further included. The detection mechanism includes a first detection component, a second detection component, and a third detection component. The first detection component, the second detection component, and the third detection component are electrically connected to the controller. Connected, the first detection component is used to detect the movement position of the first loading platform, the second detection component is used to detect the movement position of the second loading platform, and the third detection component is used to detect the movement of the first exposure component and the second exposure component position.

In one embodiment, it further includes a driving mechanism. The driving mechanism includes a first driver, a second driver, and a third driver. The first driver, the second driver, and the third driver are electrically connected to the controller. For driving the first loading table to move, the second driver is used to drive the second loading table to move, and the third driver is used to drive the first exposure module and the second exposure module to move.

On the other hand, a double-sided exposure method is also provided, which can be applied to the double-sided exposure machine according to any one of the above technical solutions, including the following steps:

(S1), the first loading stage is located at the first initial position, the second loading stage is located at the second initial position, and the first to-be-exposed part is loaded on the first loading stage;

(S2), the first exposure component and the second exposure component move to the first area and form a first exposure area;

(S3): The first loading table is moved, the first to-be-exposed part is exposed through the first exposure area, and the exposure is completed to obtain the first exposure finished product; at the same time, the second to-be-exposed part is loaded on the second loading table;

(S4), the first exposure component and the second exposure component move to the second area and form a second exposure area; at the same time, the first loading stage moves to the first initial position and unloads the first exposure finished product;

(S5), the second loading table moves, the second to-be-exposed part is exposed through the second exposure area, and the exposure is completed to obtain the second exposure finished product; at the same time, the next first to-be-exposed part is loaded on the first loading table;

(S6), the first exposure unit and the second exposure unit move to the first area to form the first exposure area, and at the same time, the second loading stage moves to the second initial position, and the second exposure finished product is unloaded.

In the above-mentioned double-sided exposure method, loading of the second to-be-exposed member is performed when the first to-be-exposed member is exposed, and loading of the first-to-be-exposed member is performed when the second to-be-exposed member is exposed, thereby improving exposure efficiency and completing double-sided exposure at one time. The exposure accuracy is high, which is convenient for automatic operation.

BRIEF DESCRIPTION OF THE DRAWINGS

1 is an exposure flowchart of a double-sided exposure method in an embodiment;

2 is a front view of the overall structure of a double-sided exposure machine in the embodiment;

FIG. 3 is a plan view of the overall structure of the double-sided exposure machine in the embodiment.

Drawings description:

100, working table, 110, first exposure through hole, 210, first exposure module, 220, second exposure module, 310, first loading table, 311, first to-be-exposed piece, 320, second loading table.

detailed description

The embodiments of the present invention will be described in detail below with reference to the drawings:

It should be noted that when the element referred to in the text is “fixed” with another element, it may be directly on the other element or a centered element may exist. When an element is considered to be "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and are not meant to be the only implementations.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terms used herein in the description of the present invention are only for the purpose of describing specific embodiments, and are not intended to limit the present invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

As shown in the embodiment shown in FIG. 1 to FIG. 3, a double-sided exposure machine is provided, which includes a mounting frame; an exposure mechanism, the exposure mechanism includes a first exposure module 210 and a second exposure module 220 which are oppositely arranged, and Both the first exposure module 210 and the second exposure module 220 can move along the mounting frame; and a loading mechanism, the loading mechanism includes a first loading stage 310 and a second loading stage 320, and the first loading stage 310 And the second loading stage 320 can move along the mounting frame; the first exposure module 210 and the second exposure module 220 form a first exposure zone in a first movement state, and the first loading stage 310 moves in the first exposure area and performs exposure; the first exposure component 210 and the second exposure component 220 form a second exposure area in a second motion state, and the second loading stage 320 is in The second exposure area is moved and exposed.

Through the setting of the first exposure module 210 and the second exposure module 220, a first exposure area is formed in the first motion state, and the first loading stage 310 moves in the first exposure area and performs exposure of the first to-be-exposed piece 311, and at the same time, The second loading stage 320 loads the second to-be-exposed part, and forms a second exposure area in the second movement state. The second loading stage 320 moves in the second exposure area and performs the exposure of the second to-be-exposed part, and at the same time, the first loading The stage 310 unloads or loads the next first to-be-exposed piece 311, which not only realizes front and back exposure without reversing, but also makes full use of the time of the exposure process, improves exposure efficiency, and facilitates automatic operation.

The traditional laser direct writing exposure machine can only be exposed on one side, and cannot be exposed on both sides at the same time. After exposing one side, it needs to be flipped to expose the other side. Due to the need for flipping, not only the process flow is too much, but the flipping wastes time. Exposure efficiency is low, and alignment is required after flipping, which easily affects exposure accuracy due to alignment accuracy issues. At the same time, traditional double-sided exposure mostly uses film transfer, film production also increases the process flow, and film production costs are high, and film use It must be replaced after a period of time.

In this embodiment, the first exposure component 210 and the second exposure component 220 are arranged, and the first exposure component 210 and the second exposure component 220 are oppositely disposed, so that the first exposure component 210 and the second exposure component 220 can form an exposure area. Used for exposure. The relative setting here refers to a person skilled in the art using existing technologies to set the light-emitting end of the first exposure component 210 and the light-emitting end surface of the second exposure component 220 opposite to each other and set them at a distance, so that the first exposure component 210 and the first exposure component 210 An exposure area is formed between the two exposure components 220.

Since the first exposure component 210 and the second exposure component 220 can move, the first exposure component 210 and the second exposure component 220 can form a plurality of exposure areas, so that the first exposure component 210 and the second exposure component 220 can Full exposure can improve the utilization rate of the first exposure module 210 and the second exposure module 220 and improve the exposure efficiency.

As shown in FIG. 2 and FIG. 3, the first exposure component 210 and the second exposure component 220 can form a first exposure area when the first motion state is moved to the front, and move to the rear side when the second motion state is used. A second exposure area is formed, so that when the first exposure area is formed, the first loading stage 310 moves and passes through the first exposure area to expose the first to-be-exposed member 311, and when the second exposure area is formed, the second exposure area The loading stage 320 moves and passes through the second exposure area to expose the second to-be-exposed part. At the same time, the first loading stage 310 can return to the original position, unload and load, and improve exposure efficiency.

Compared with the traditional double-sided exposure method that requires flipping and realignment, this embodiment does not require flipping and realignment. Not only does the exposure process decrease, but more exposure work can be completed in the same time. Both exposure efficiency and exposure accuracy are obtained. A substantial increase.

Further, the first exposure component 210 is disposed on an upper portion of the mounting frame, and the second exposure component 220 is disposed on a lower portion of the mounting frame, so that a first exposure area or a second exposure area is formed in a middle portion of the mounting frame.

Furthermore, the first loading table 310 is provided with a first loading section, and the second loading table 320 is provided with a second loading section. The first loading section is provided to facilitate loading or unloading the first to-be-exposed piece 311, and the second loading The part is arranged to facilitate loading or unloading of the second to-be-exposed piece, and improve the loading and unloading efficiency.

Optionally, the first exposure module 210 and the second exposure module 220 form a maskless exposure system (Digital Micromirror Device, DMD exposure system for short). The maskless exposure system enlarges an image through a projection objective to realize a one-time exposure. DMD The arrangement number of the first light source element and the second light source element of the exposure system is determined according to the size of the exposure pattern, and the exposure accuracy is higher.

It should be noted that the settings of the first loading stage 310 and the second loading stage 320 are respectively used to place the first to-be-exposed member 311 and the second to-be-exposed member, and when exposing, the light emitted by the first exposure module 210 and the The light emitted by the second exposure module 220 all reaches the front and back panel areas of the corresponding first to-be-exposed member 311 or the front-back panel areas of the second to-be-exposed member. Therefore, the middle of the first loading table 310 It should be a through-hole structure or an unblocked structure so that the front and back plate areas of the first to-be-exposed member 311 are leaked out to achieve normal exposure. Those skilled in the art can use any existing technology to implement the first The specific setting structure of a loading platform 310 meets this requirement; the setting of the second loading platform 320 is the same, and is not repeated here.

As shown in the embodiment shown in FIG. 2 and FIG. 3, the mounting frame is further provided with a workbench 100, and the workbench 100 is provided with an exposure through-hole, and the exposure through-hole is set corresponding to the first exposure area and the second exposure area, and the first exposure component 210 and a second exposure module 220 are respectively disposed on two sides of the workbench 100, and the first loading stage 310 and the second loading stage 320 are moved along the workbench 100.

The workbench 100 is fixedly disposed in the middle of the mounting frame, and the first exposure module 210 and the second exposure module 220 are respectively provided on the upper and lower portions of the workbench 100. The exposure through holes are provided to facilitate the first exposure module 210 and the second exposure. The light of the component 220 can pass through and reach the first to-be-exposed member 311 or the second to-be-exposed member for exposure.

As shown in the embodiment shown in FIGS. 2 and 3, the workbench 100 is provided with a first track and a second track, the first loading table 310 moves along the first track, and the second loading table 320 moves along the second track.

The arrangement of the first track and the second track is convenient for improving the movement stability of the first loading stage 310 and the second loading stage 320 and improving the exposure accuracy.

As shown in the embodiment shown in FIG. 2 and FIG. 3, the exposure through hole includes a first exposure through hole 110 and a second exposure through hole. The first exposure through hole 110 is disposed corresponding to the first exposure area, and the second exposure through hole and the first exposure through hole are disposed correspondingly. Corresponding settings for the two exposure areas.

The first exposure through-hole 110 and the second exposure through-hole are respectively disposed corresponding to the first exposure area and the second exposure area, thereby improving the structural installation stability.

As shown in the embodiment shown in FIG. 2 and FIG. 3, the mounting frame is further provided with a moving guide rod and a moving frame that moves in cooperation with the moving guide rod. The first exposure component 210 and the second exposure component 220 are provided on the moving frame.

The first exposure module 210 and the second exposure module 220 are respectively arranged on the upper and lower parts of the moving frame. The moving frame cooperates with the moving guide rod. When the moving frame moves along the moving guide rod, the first exposure module 210 and the second exposure module 220 are synchronized. Move to improve the movement accuracy and movement synchronization of the first exposure component 210 and the second exposure component 220 and increase the exposure accuracy.

As shown in the embodiment shown in FIG. 2 and FIG. 3, the first exposure module 210 and the second exposure module 220 both move in the first direction, and the first loading stage 310 and the second loading stage 320 both move in the second direction.

As shown in FIG. 2 and FIG. 3, the first exposure unit 210 and the second exposure unit 220 are arranged in an up-down position, the first loading stage 310 and the second loading stage 320 are arranged side by side in front and back, and the first loading stage 310 and the second loading stage The stage 320 can be moved left and right. The first exposure unit 210 and the second exposure unit 220 form a first exposure area in the middle of the front. The first loading stage 310 moves left and right to realize exposure and return. The first exposure unit 210 and the second exposure unit. 220 forms a second exposure area in the middle of the rear, the second loading stage 320 moves left and right to realize exposure and return, the first direction refers to forward and backward movement, the second direction refers to left and right movement, and the first direction and the second direction are arranged at a vertical angle.

Of course, the first direction and the second direction can also be set at other angles as required. Those skilled in the art can set other angles that meet the requirements as long as the first loading platform 310 and the second loading platform 320 can be moved and returned. Therefore, it is only necessary to complete the exposure requirements in the first exposure area and the second exposure area, which will not be repeated here.

Based on any one of the above embodiments, a control mechanism is further included. The control mechanism includes a controller, and the controller is configured to control the movement of the first exposure module 210, the second exposure module 220, the first loading stage 310, and the second loading stage 320. .

Based on any one of the above embodiments, a detection mechanism is further included. The detection mechanism includes a first detection component, a second detection component, and a third detection component. The first detection component, the second detection component, and the third detection component are all related to control. The detector is electrically connected, the first detection component is used to detect the moving position of the first loading platform 310, the second detection component is used to detect the moving position of the second loading platform 320, and the third detection component is used to detect the first exposure component 210 and The moving position of the second exposure component 220.

Further, the first detection component, the second detection component, and the third detection component are all position sensor components or trigger sensor components.

The setting of the detection mechanism facilitates the precise control of the movement of the first exposure module 210, the second exposure module 220, the first loading stage 310, and the second loading stage 320 to improve the exposure accuracy.

On the basis of any of the above embodiments, a driving mechanism is further included. The driving mechanism includes a first driver, a second driver, and a third driver. The first driver, the second driver, and the third driver are electrically connected to the controller. A driver is used to drive the first loading table 310 to move, a second driver is used to drive the second loading table 320 to move, and a third driver is used to drive the first exposure module 210 and the second exposure module 220 to move.

The embodiment shown in FIG. 1 further provides a double-sided exposure method, which can be applied to the double-sided exposure machine according to any one of the foregoing embodiments, and includes the following steps:

(S1), the first loading platform 310 is located at the first initial position, the second loading platform 320 is located at the second initial position, and the first to-be-exposed piece 311 is loaded on the first loading platform 310;

(S2), the first exposure component 210 and the second exposure component 220 move to a first area and form a first exposure area;

(S3): The first loading table 310 moves to expose the first to-be-exposed member 311 through the first exposure area, and completes the exposure to obtain a first exposure finished product. At the same time, the second to-be-exposed member is loaded on the second loading table 320. ;

(S4), the first exposure module 210 and the second exposure module 220 move to the second area and form a second exposure area; at the same time, the first loading stage 310 moves to the first initial position and unloads the first exposure finished product;

(S5), the second loading stage 320 is moved, the second to-be-exposed part is exposed through the second exposure area, and the exposure is completed to obtain a second exposure finished product; at the same time, the next first to-be-exposed is loaded on the first loading stage 310 Piece 311;

(S6), the first exposure unit 210 and the second exposure unit 220 move to the first area and form a first exposure area; at the same time, the second loading stage 320 moves to a second initial position and unloads the second exposure product.

When the first to-be-exposed member 311 is exposed, the second to-be-exposed member is loaded, and when the second to-be-exposed member is exposed, the first to-be-exposed member 311 is loaded, thereby improving the exposure efficiency, and performing double-sided exposure at one time with high exposure accuracy. Facilitate automation.

It should be noted that the writing of steps (S1) to (S6) is for convenience of description. In the specific implementation, those skilled in the art can appropriately adjust the sequence according to the needs of implementation, such as the need to implement automated operations, such as steps ( In step S4), the steps of moving the first loading platform 310 to the first initial position and unloading the first exposed finished product can be performed in step (S5), and need not be performed in step (S4).

In addition, the initial positions of the first exposure component 210 and the second exposure component 220 may be in the first area, or may be in other positions.

Specifically, as shown in FIG. 3, at the initial moment, the first exposure module 210 and the second exposure module 220 are both located at the first exposure area in the middle of the front, the first loading stage 310 is located at the right side of the front, and the second loading stage 320 is located at Rear right

Loading the first to-be-exposed piece 311 on the first loading table 310;

The first loading table 310 is moved to the left, and the first to-be-exposed member 311 is exposed, and the exposure is completed to obtain the first exposure finished product. At this time, the first loading table 310 has been moved to the left and front, and at the same time, the second loading table 310 The loading stage 320 loads the second to-be-exposed piece;

The first exposure component 210 and the second exposure component 220 move backward and reach a second exposure area in the middle of the rear;

The second loading stage 320 is moved to the left, and the second to-be-exposed part is exposed, and the exposure is completed to obtain a second exposure finished product. At this time, the second loading stage 320 has been moved to the left and rear, and at the same time, the first loading stage 310 Move right to the front left, and load the next first component to be exposed;

The first exposure module 210 and the second exposure module 220 return to the first exposure area in the middle of the front, and at the same time, the second loading stage 320 moves right to the right on the rear and unloads the exposed products;

The first loading stage 310 moves to the left and performs exposure;

This cycle operation.

Here, it should be noted that after the exposure of the second to-be-exposed member is completed, the first exposure component 210 and the second exposure component 220 will return to the first exposure area, so the first exposure component 210 and the second exposure component 220 return Before the first exposure area, the first loading stage 310 should be returned to the right and left (that is, the first initial position); the second loading stage 320 is the same when moving back, and those skilled in the art can set and control accordingly. To meet the actual needs, I will not repeat them here.

Further, in step (S4), the first loading platform 310 returns to the first initial position at high speed, and in step (S6), the second loading platform 320 returns to the second initial position at high speed.

This setting is to meet the coordination needs of each process node, and those skilled in the art can perform specific time-point control and process arrangement according to the needs to meet the actual exposure needs and automation operation requirements, which will not be repeated here.

The technical features of the embodiments described above can be arbitrarily combined. In order to simplify the description, all possible combinations of the technical features in the above embodiments have not been described. However, as long as there is no contradiction in the combination of these technical features, It should be considered as the scope described in this specification.

The above-mentioned embodiments only express several implementation manners of the present invention, and their descriptions are more specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be noted that, for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the invention patent shall be subject to the appended claims.

Claims (10)

  1. A double-sided exposure machine, comprising:
    Mount;
    An exposure mechanism comprising a first exposure component and a second exposure component opposite to each other, each of the first exposure component and the second exposure component being movable along the mounting frame; and
    A loading mechanism, the loading mechanism comprising a first loading platform and a second loading platform, both of the first loading platform and the second loading platform can move along the mounting frame;
    The first exposure component and the second exposure component form a first exposure area in a first motion state, and the first loading stage moves in the first exposure area and performs exposure;
    The first exposure component and the second exposure component form a second exposure area in a second motion state, and the second loading stage moves in the second exposure area and performs exposure.
  2. The double-sided exposure machine according to claim 1, wherein the mounting frame is further provided with a table, the table is provided with an exposure through hole, the exposure through hole and the first exposure area and the exposure area. The second exposure area is correspondingly arranged, the first exposure component and the second exposure component are respectively disposed on both sides of the workbench, and the first loading stage and the second loading stage are all along the work Taiwan moves.
  3. The double-sided exposure machine according to claim 2, wherein the table is provided with a first track and a second track, the first loading stage moves along the first track, and the second loading stage Moving along the second track.
  4. The double-sided exposure machine according to claim 2, wherein the exposure through-hole comprises a first exposure through-hole and a second exposure through-hole, and the first exposure through-hole is provided corresponding to the first exposure area , The second exposure through hole is disposed corresponding to the second exposure area.
  5. The double-sided exposure machine according to claim 1, wherein the mounting frame is further provided with a moving guide rod and a moving frame that moves in cooperation with the moving guide rod, the first exposure component and the second exposure component. The exposure module is disposed on the moving frame.
  6. The double-sided exposure machine according to claim 1, wherein the first exposure unit and the second exposure unit both move in a first direction, and the first loading stage and the second loading stage are both Move in the second direction.
  7. The double-sided exposure machine according to any one of claims 1-6, further comprising a control mechanism, wherein the control mechanism includes a controller, the controller is used to control the first exposure component, the first Movement of two exposure units, the first loading stage and the second loading stage.
  8. The double-sided exposure machine according to claim 7, further comprising a detection mechanism, the detection mechanism comprising a first detection component, a second detection component, and a third detection component, the first detection component, the A second detection component and the third detection component are electrically connected to the controller, the first detection component is used to detect the moving position of the first loading platform, and the second detection component is used to detect all The moving position of the second loading platform, and the third detecting component is used to detect the moving positions of the first exposure component and the second exposure component.
  9. The double-sided exposure machine according to claim 7, further comprising a driving mechanism, the driving mechanism including a first driver, a second driver, and a third driver, the first driver, the second driver, and The third driver is electrically connected to the controller, the first driver is used to drive the first loading platform to move, and the second driver is used to drive the second loading platform to move, the first driver Three drivers are used to drive the first exposure component and the second exposure component to move.
  10. A double-sided exposure method, which can be applied to the double-sided exposure machine according to any one of claims 1 to 9, is characterized by comprising the following steps:
    (S1), the first loading stage is located at the first initial position, the second loading stage is located at the second initial position, and the first to-be-exposed piece is loaded on the first loading stage;
    (S2), the first exposure component and the second exposure component move to the first area and form a first exposure area;
    (S3), the first loading stage moves, the first to-be-exposed part is exposed through the first exposure area, and the exposure is completed to obtain a first exposure finished product; at the same time, loading is performed on the second loading stage Second piece to be exposed;
    (S4), the first exposure component and the second exposure component move to a second area and form a second exposure area; at the same time, the first loading stage moves to the first initial position and unloads the Said first exposure finished product;
    (S5), the second loading table moves, the second to-be-exposed piece is exposed through the second exposure area, and the exposure is completed to obtain a second exposure finished product; at the same time, loading is performed on the first loading table The next first item to be exposed;
    (S6), the first exposure component and the second exposure component move to the first area and form the first exposure area; at the same time, the second loading stage moves to the second initial position And unloading the second exposure finished product.
PCT/CN2018/122485 2018-07-26 2018-12-20 Double-sided digitalized exposure system with parallel double platforms, and exposure method WO2020019654A1 (en)

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Publication number Priority date Publication date Assignee Title
CN108897197A (en) * 2018-07-26 2018-11-27 中山新诺科技股份有限公司 Sided exposure machine and double-faced exposure method
CN108983556A (en) * 2018-07-26 2018-12-11 中山新诺科技股份有限公司 Sided exposure machine and double-faced exposure method
CN108873622B (en) * 2018-07-26 2020-03-31 中山新诺科技股份有限公司 Double-side exposure machine with double loading parts and double-side exposure method

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CN103913955A (en) * 2013-01-06 2014-07-09 上海华虹宏力半导体制造有限公司 Double-sided photoetching machine and double-sided photoetching method
CN204790310U (en) * 2015-05-27 2015-11-18 中山新诺科技股份有限公司 Crane span structure formula does not have mask digital laser printing device
CN206920817U (en) * 2017-03-31 2018-01-23 苏州微影激光技术有限公司 It is a kind of to have dual stage face direct write exposure machine that is independent and merging both of which concurrently
CN207198551U (en) * 2017-09-11 2018-04-06 杭州西风半导体有限公司 A kind of sided exposure machine
CN108897197A (en) * 2018-07-26 2018-11-27 中山新诺科技股份有限公司 Sided exposure machine and double-faced exposure method

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CN103913955A (en) * 2013-01-06 2014-07-09 上海华虹宏力半导体制造有限公司 Double-sided photoetching machine and double-sided photoetching method
CN204790310U (en) * 2015-05-27 2015-11-18 中山新诺科技股份有限公司 Crane span structure formula does not have mask digital laser printing device
CN206920817U (en) * 2017-03-31 2018-01-23 苏州微影激光技术有限公司 It is a kind of to have dual stage face direct write exposure machine that is independent and merging both of which concurrently
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