WO2019119463A1 - 太阳能电池共蒸镀生产线 - Google Patents

太阳能电池共蒸镀生产线 Download PDF

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Publication number
WO2019119463A1
WO2019119463A1 PCT/CN2017/118219 CN2017118219W WO2019119463A1 WO 2019119463 A1 WO2019119463 A1 WO 2019119463A1 CN 2017118219 W CN2017118219 W CN 2017118219W WO 2019119463 A1 WO2019119463 A1 WO 2019119463A1
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Prior art keywords
substrate
line
evaporation
solar cell
production line
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PCT/CN2017/118219
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English (en)
French (fr)
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林健
齐维滨
朱凯
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北京铂阳顶荣光伏科技有限公司
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Priority to US16/068,663 priority Critical patent/US20210210652A1/en
Priority to EP17889524.9A priority patent/EP3528280A4/en
Priority to ZA201806270A priority patent/ZA201806270B/en
Publication of WO2019119463A1 publication Critical patent/WO2019119463A1/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/6773—Conveying cassettes, containers or carriers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • H01L31/188—Apparatus specially adapted for automatic interconnection of solar cells in a module
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/208—Particular post-treatment of the devices, e.g. annealing, short-circuit elimination
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Definitions

  • the invention relates to the technical field of solar cell manufacturing, and in particular to a solar cell co-evaporation production line.
  • the preparation process of copper indium gallium selenide (CIGS) thin film technology includes: substrate cleaning, magnetron sputtering molybdenum layer, laser scribing, CIGS co-evaporation, chemical water bath deposition, mechanical scribing and magnetron sputtering TCO layer.
  • the CIGS co-evaporation process and the chemical water bath deposition process are generally realized by a co-evaporation device and a chemical water bath device, respectively.
  • the silicon-based thin film solar cell production line does not have a co-evaporation device, a chemical water bath device, and a transfer line that transfers the substrate to the positions of the two process devices, the silicon-based thin film solar cell production line cannot satisfy the The production requirements of CIGS thin film solar cells require the production of silicon-based thin film solar cells and CIGS thin film batteries to pass through two different production lines, which greatly increases the production cost.
  • the co-evaporation process requires the coating surface of the TCO layer to face the ground direction
  • the coating surface of the TCO layer faces away from the ground, and the silicon-based thin film solar cell production line does not perform the substrate.
  • the structure of the flap, so the flip of the substrate is generally manually operated, thereby reducing production efficiency and increasing labor costs.
  • the object of the present invention is to provide a solar cell co-evaporation production line to solve the above problems in the prior art, and to realize the production of a silicon-based thin film battery and a CIGS thin film battery on the same revolving line, thereby improving production efficiency and reducing production cost.
  • the invention provides a solar cell co-evaporation production line, which comprises:
  • the substrate revolving line is connected to the co-evaporation device, and the substrate recirculation line is provided with an upper feed port and a lower feed opening, and the upper feed port and the lower feed opening are respectively connected with the bottom turnaround line Connected
  • the main control room is configured to control the bottom turn line and the substrate turn line action.
  • the substrate lowering device is configured to remove the substrate on the shoe.
  • the solar cell co-evaporation production line as described above wherein, preferably, further comprising a bottom wire uppering device and a bottoming wire lowering device, wherein the shoe upper wire device is connected to the bottom wire upper port for A shoe is conveyed on the bottom turn line, and the bottom wire lowering device is connected to the bottom wire lower port for recovering the bottom tray from the shoe turnaround line.
  • the shoe upper wire device is connected to the bottom wire lower wire device.
  • the substrate uppering device and the substrate lowering device are provided with a driving mechanism, a turning mechanism and a clamping mechanism, and an output end of the driving mechanism
  • One end of the turning mechanism is connected for driving the turning mechanism to rotate, and the turning mechanism is connected to the clamping mechanism.
  • the clamping mechanism is a vacuum chuck
  • the turning mechanism is provided with a vacuum pump, and the vacuum pump is connected to the vacuum chuck.
  • the shoe comprises vertical beams and beams which are perpendicular to each other, and the frame and the beam form a total of two or more for placing the substrate. Evaporation area.
  • the substrate turnover line comprises a substrate upper feed line and a substrate lower feed line, and the substrate upper feed line is connected to the input end of the co-evaporation device
  • the substrate blanking line is connected to an output end of the co-evaporation device; the loading port is disposed on the substrate loading line, and the feeding opening is disposed on the substrate blanking line.
  • a solar cell co-evaporation line as described above, wherein preferably, a plurality of input lines are disposed on the substrate upper feed line, and each of the input lines is connected to an input end of the co-evaporation device
  • the substrate blanking line is provided with a plurality of output lines, each of which is connected to an output end of one of the co-evaporation devices.
  • the solar cell co-evaporation production line provided by the invention realizes the automatic turnover and processing of the CIGS thin film battery in the co-evaporation process by setting the bottom turnaround line and the substrate turnover line, and realizes the automatic circulation circulation of the bottom support, thereby saving
  • the manpower has improved production efficiency and saved production costs.
  • FIG. 1 is a schematic structural view of a solar cell co-evaporation production line according to an embodiment of the present invention
  • FIG. 2 is a schematic structural view of a turning mechanism
  • Figure 3 is a schematic view showing the structure of the shoe
  • Fig. 4 is a view showing a state in which a substrate is placed on a shoe.
  • an embodiment of the present invention provides a solar cell co-evaporation production line, which includes a bottom turnaround line 100, a substrate turnaround line 200, and a main control room, wherein the bottom turnaround line 100 is provided with a bottom support line.
  • the bottom and bottom trays are connected to the bottom line; the substrate turnover line 200 is connected to the co-evaporation device 300, and the substrate turnover line 200 is provided with an upper feed opening 211 and a lower feed opening 221, and the upper feed opening 211 and the lower feed opening 221 are both rotated with the bottom tray.
  • the line 100 is connected; the main control room is used to control the action of the bottom turnaround line 100 and the substrate turnaround line 200.
  • the solar cell co-evaporation production line can be respectively connected to the upper process production line and the lower process production line, and thus, after the substrate 400 is processed in the previous process, it can be automatically transported to the embodiment of the present invention by the transmission device.
  • the solar cell co-evaporation line is provided for co-evaporation processing, and after the co-evaporation process is completed, it can be automatically transferred to the next process line by the transfer device for subsequent processing.
  • the shoe 500 When it is required to perform the co-evaporation processing on the substrate 400 that completes the previous process, the shoe 500 may be placed on the bottom turn 100 from the upper wire upper port, and the shoe 500 is transferred to the substrate turn line 200.
  • the substrate 400 can be transported to the shoe 500 by the transport device and flowed with the shoe turnaround line 100; when the shoe 500 carrying the substrate 400 is transferred to the substrate turn line 200
  • the shoe 500 carrying the substrate 400 can be transferred onto the substrate turnover line 200 and transferred to the co-evaporation device 300 along with the substrate rotation line 200 to perform co-evaporation processing on the substrate 400;
  • the substrate 500 carrying the substrate 400 After the substrate 400 is completely vapor-deposited, the substrate 500 carrying the substrate 400 can be output from the stock opening 221 to the substrate winding line 100 through the substrate turnover line 221, and the substrate 400 on the shoe 500 can be output through the transfer device.
  • the next process line is processed for subsequent processing, and the shoe 500 that has lost the substrate 400 can continue to flow with the shoe winding line 100 to the lower wire lower port for the bottom 500 recovery. Therefore, the solar cell co-evaporation production line provided by the embodiment of the invention is added to the existing silicon-based thin film solar cell production line, thereby realizing the production and processing of the CIGS thin film battery, thereby effectively saving the production cost and realizing the substrate 400. Automated turnover saves manpower.
  • the substrate turnover line 200 may include a substrate upper feed line 210 and a substrate lower feed line 220.
  • the substrate upper feed line 210 is connected to the input end of the co-evaporation device 300, and the substrate blank line 220 is co-steamed.
  • the output ends of the plating apparatus 300 are connected; the loading opening 211 is disposed on the substrate upper feed line 210, and the lower feeding opening 221 is disposed on the substrate lowering line 220.
  • the substrate 500 carrying the substrate 400 can be input to the co-evaporation device 300 through the substrate upper feed line 210. After the co-evaporation is completed, the substrate can be output from the co-evaporation device 300 to the substrate 400 offline device, and then rotated through the substrate.
  • Line 100 effects the cycling of the lower wire of substrate 400 and the shoe 500.
  • a plurality of input lines 212 may be disposed on the substrate upper feed line 210 .
  • Each input line 212 is connected to an input end of a co-evaporation device 300 , and a plurality of substrate blank lines 220 are disposed on the substrate.
  • Output lines 222 each connected to the output of a co-evaporation apparatus 300.
  • the solar cell co-evaporation production line further includes a substrate on-line device 600 and a substrate off-line device 700.
  • the substrate on-line device 600 and the substrate off-line device 700 are both connected to the substrate extension line 100, and the substrate on-line device 600 is used for the bottom.
  • the substrate 500 is transported on the tray 500, and the substrate lower line device 700 is used to remove the substrate 400 on the shoe 500.
  • the substrate uppering device 600 is connected to the upper process production line, so that the substrate 400 processed by the previous process can be transferred to the solar cell co-evaporation production line through the substrate uppering device 600; accordingly, the substrate offline device 700 It can be connected to the next process production line, and thus can be transferred to the next process line through the substrate off-line device 700 after the substrate 400 is co-evaporated for subsequent processing.
  • the solar cell co-evaporation production line further comprises a bottom support device 800 and a bottom support device 900, and the bottom support device 800 is connected to the bottom support upper line for conveying the bottom support 500 to the bottom transfer line 100.
  • the bottom tray lowering device 900 is coupled to the lower tray lower end for recovering the shoe 500 from the shoe top turn line 100.
  • the employee can manually place the bottom bracket 500 on the upper threading device 800, or manually remove the bottom tray 500 from the bottom tray lowering device 900, thereby facilitating the operation of the employee and at the same time keeping the employee away from the running bottom.
  • the turnover line 100 guarantees the personal safety of employees.
  • the shoe upper wire device 800 can be connected to the bottom wire lowering device 900 , thereby allowing the bottom plate 500 to be returned to the bottom wire lowering device 900 .
  • the 500-flow step improves the flow efficiency.
  • the substrate uppering device 600 and the substrate lowering device 700 may be provided with a driving mechanism, a turning mechanism and a clamping mechanism 30, and the output end of the driving mechanism is One end of the turning mechanism is connected for driving the turning mechanism to rotate, and the turning mechanism is connected to the clamping mechanism 30.
  • the clamping mechanism 30 can be a mechanical clamp to realize the clamping and lowering of the substrate 400 by controlling the opening and closing of the clamp, but the clamping force of the mechanical clamp is difficult to control, and the substrate 400 is easily damaged; and the vacuum suction cup is adopted.
  • the principle of the air pressure is controlled to realize the picking up of the substrate 400, so that the substrate 400 is not easily damaged and is easy to control. Therefore, in the embodiment, the clamping mechanism 30 is preferably a vacuum chuck, and the turning mechanism may be provided with a vacuum pump, a vacuum pump and The vacuum cups are connected.
  • the driving mechanism may be a motor
  • the turning mechanism may include a rotating arm 10 and a rotating shaft 20, one end of the rotating arm 10 is perpendicularly connected to the rotating shaft 20, the vacuum suction cup is disposed on the rotating arm 10, and one end of the rotating shaft 20 is connected to the driving motor to drive
  • the motor can drive the rotating shaft 20 to rotate, thereby driving the rotating arm 10 to reverse, as shown in FIG.
  • the solar cell co-evaporation production line may further include position detecting devices respectively disposed on the substrate upper device 600 and the substrate.
  • the position detecting device can send the position signal of the shoe 500 to the main control room, so that the shoe 500 stays at the position of the substrate wire device 600.
  • the driving mechanism is activated to control the turning mechanism to place the substrate 400 on the substrate 500, thereby achieving precise control of the substrate 400 turning, transferring and flowing.
  • the shoe 500 may include a vertical beam 510 and a beam 520 which are perpendicular to each other, and two or more co-deposited regions 530 for placing the substrate 400 are formed between the stringer 510 and the beam 520 .
  • the co-deposited region 530 is of a hollow design, and the substrate 400 can be placed on the symmetrically disposed stringers 510 so that the lower surface of the substrate 400 can be co-evaporated by the co-evaporation region 530.
  • the design of two or more co-evaporation regions 530 can improve the carrier capability of the shoe 500 and achieve the flow of the plurality of substrates 400.
  • the number of the co-evaporation regions 530 may be two.
  • the substrate uppering device 600 may also be provided with two, and the two upper wire devices are kept at a certain distance in the flow direction of the shoe rotation line 100, whereby the shoe 500 can be transmitted along with the substrate rotation line 100.
  • the two substrates 400 are respectively transferred to the same shoe 500 by the two substrate uppering devices 600; correspondingly, the substrate lowering device 700 can also be provided with two, so that two of the same shoe 500 can be respectively removed.
  • Substrate 400 may also be provided with two, and the two upper wire devices are kept at a certain distance in the flow direction of the shoe rotation line 100, whereby the shoe 500 can be transmitted along with the substrate rotation line 100.
  • the two substrates 400 are respectively transferred to the same shoe 500 by the two substrate uppering devices 600; correspondingly, the substrate lowering device 700 can also be provided with two, so that two of the same shoe 500 can be respectively removed.
  • Substrate 400 may also be provided with two, and the two upper wire devices are kept at a certain distance in the flow direction of the shoe rotation line 100, where
  • the solar cell co-evaporation production line provided by the embodiment of the invention realizes the automatic turnover and processing of the CIGS thin film battery in the co-evaporation process by setting the bottom turnaround line and the substrate turnover line, and realizes the automatic circulation circulation of the bottom support. , saving manpower, improving production efficiency and saving production costs.

Abstract

一种太阳能电池共蒸镀生产线，其包括底托周转线（100）、基板周转线（200）和主控室，其中底托周转线上设置有底托上线口和底托下线口；基板周转线与共蒸镀设备（300）相连，基板周转线上设置有上料口（211）和下料口（221），上料口和下料口均与底托周转线相连；主控室用于控制底托周转线和基板周转线动作。该太阳能电池共蒸镀生产线通过设置底托周转线和基板周转线实现了对CIGS薄膜电池在共蒸镀工序的自动化周转和加工，同时实现了底托的自动循环流转，节省了人力，提高了生产效率，节约了生产成本。

Description

太阳能电池共蒸镀生产线 技术领域
本发明涉及太阳能电池制造技术领域，尤其涉及一种太阳能电池共蒸镀生产线。
背景技术
铜铟镓硒(CIGS)薄膜技术制备工艺包括：基板清洗，磁控溅射钼层，激光划刻，CIGS共蒸镀，化学水浴沉积，机械划刻以及磁控溅射TCO层。其中，CIGS共蒸镀工艺和化学水浴沉积工艺一般分别通过共蒸镀设备及化学水浴设备来实现。而在现有技术中，由于硅基薄膜太阳能电池生产线没有共蒸镀设备、化学水浴设备以及将基板传输到此两种工艺设备位置处的周转线，因此，硅基薄膜太阳能电池生产线无法满足对CIGS薄膜太阳能电池的生产要求，使对硅基薄膜太阳能电池和CIGS薄膜电池的生产需要通过两条不同的生产线，极大地增加了生产成本。
此外，由于共蒸镀工艺要求TCO层的镀膜面朝向地面方向，但在共蒸镀的上道工序上，TCO层的镀膜面朝向背离地面的方向，而硅基薄膜太阳能电池生产线没有对基板进行翻片的结构，因此对基板的翻片一般通过手动操作，由此降低了生产效率，提高了人工成本。
发明内容
本发明的目的是提供一种太阳能电池共蒸镀生产线，以解决上述现有技术中的问题，实现在同一条周转线上生产硅基薄膜电池及CIGS薄膜电池，提高生产效率，降低生产成本。
本发明提供了一种太阳能电池共蒸镀生产线，其中，包括：
底托周转线，所述底托周转线上设置有底托上线口和底托下线口；
基板周转线，所述基板周转线与共蒸镀设备相连，所述基板周转线上设置有上料口和下料口，所述上料口和所述下料口均与所述底托周转线相连；
主控室，用于控制所述底托周转线和所述基板周转线动作。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，还包括与所述底托周转线相连的基板上线装置和基板下线装置，所述基板上线装置用于向底托上输送基板，所述基板下线装置用于取走所述底托上的基板。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，还包括底托上线装置和底托下线装置，所述底托上线装置与所述底托上线口相连，用于向所述底托周转线上输送底托，所述底托下线装置与所述底托下线口相连，用于从所述底托周转线上回收所述底托。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，所述底托上线装置与所述底托下线装置相连。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，所述基板上线装置和基板下线装置上均设置有驱动机构、翻转机构和夹持机构，所述驱动机构的输出端与所述翻转机构的一端相连，用于驱动所述翻转机构转动，所述翻转机构与所述夹持机构相连。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，所述夹持机构为真空吸盘，所述翻转机构上设置有真空泵，所述真空泵与所述真空吸盘相连。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，还包括位置检测装置，所述位置检测装置分别设置在所述基板上线装置和基板下线装置上。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，所述底托包括相互垂直的纵梁和横梁，所述纵梁和所述横梁之间构成两个以上用于放置基板的共蒸镀区域。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，所述基板周转线包括基板上料线和基板下料线，所述基板上料线与所述共蒸镀设备的输入端相连，所述基板下料线与所述共蒸镀设备的输出端相连；所述上料口设置在所述基板上料线上，所述下料口设置在所述基板下料线上。
如上所述的太阳能电池共蒸镀生产线，其中，优选的是，所述基板上料线上设置有多个输入线，每个所述输入线均与一个所述共蒸镀设备的输 入端相连，所述基板下料线上设置有多个输出线，每个所述输出线均与一个所述共蒸镀设备的输出端相连。
本发明提供的太阳能电池共蒸镀生产线，通过设置底托周转线和基板周转线，实现了对CIGS薄膜电池在共蒸镀工序的自动化周转和加工，同时实现了底托的自动循环流转，节省了人力，提高了生产效率，节约了生产成本。
附图说明
图1为本发明实施例提供的太阳能电池共蒸镀生产线的结构示意图；
图2为翻转机构的结构示意图；
图3为底托的结构示意图；
图4为基板放置在底托上的状态图。
附图标记说明：
100-底托周转线       200-基板周转线       210-基板上料线
211-上料口           212-输入线           220-基板下料线
221-下料口           222-输出线           300-共蒸镀设备
400-基板             500-底托             510-纵梁
520-横梁             530-共蒸镀区域       600-基板上线装置
700-基板下线装置     800-底托上线装置     900-底托下线装置
10-转动臂            20-转轴              30-夹持机构
具体实施方式
下面详细描述本发明的实施例，所述实施例的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的，仅用于解释本发明，而不能解释为对本发明的限制。
如图1所示，本发明实施例提供了一种太阳能电池共蒸镀生产线，其包括底托周转线100、基板周转线200和主控室，其中底托周转线100上设置有底托上线口和底托下线口；基板周转线200与共蒸镀设备300相连， 基板周转线200上设置有上料口211和下料口221，上料口211和下料口221均与底托周转线100相连；主控室用于控制底托周转线100和基板周转线200动作。
可以理解的是，该太阳能电池共蒸镀生产线可以分别与上道工序生产线和下道工序生产线相连，由此，当基板400完成上道工序加工后，可以通过传输设备自动输送至本发明实施例提供的太阳能电池共蒸镀生产线上，以进行共蒸镀加工，而在完成共蒸镀加工后，可以通过传输设备自动传输至下道工序生产线上，以进行后续加工。
在需要对完成上道工序的基板400进行共蒸镀加工时，可以先从底托上线口处将底托500放置到底托周转线100上，当底托500被传输到基板周转线200上的上料口211处时，基板400可以通过传输设备输送至底托500上，并随着底托周转线100流转；当载有基板400的底托500被传输至基板周转线200上的上料口211处时，载有基板400的底托500可以被传输至基板周转线200上，并随着基板周转线200传输至共蒸镀设备300中，以对基板400进行共蒸镀加工；当基板400共蒸镀完成后，可以通过基板周转线200从下料口221将载有基板400的底托500输出至底托周转线100上，并通过传输设备将底托500上的基板400输出至下道工序生产线上，以进行后续加工，而失去基板400的底托500可以继续随着底托周转线100流转至底托下线口处，以进行底托500回收。由此，在现有硅基薄膜太阳能电池生产线上增设本发明实施例提供的太阳能电池共蒸镀生产线，实现了对CIGS薄膜电池的生产加工，从而有效节约了生产成本，同时实现了基板400的自动化周转，节省了人力。
具体而言，如图1所示，基板周转线200可以包括基板上料线210和基板下料线220，基板上料线210与共蒸镀设备300的输入端相连，基板下料线220与共蒸镀设备300的输出端相连；上料口211设置在基板上料线210上，下料口221设置在基板下料线220上。载有基板400的底托500可以通过基板上料线210输入到共蒸镀设备300，待共蒸镀完成后，可以从共蒸镀设备300输出至基板400下线设备，进而通过底托周转线100实现基板400的下线和底托500的循环。
其中，如图1所示，基板上料线210上可以设置有多个输入线212，每个输入线212均与一个共蒸镀设备300的输入端相连，基板下料线220上设置有多个输出线222，每个输出线222均与一个共蒸镀设备300的输出端相连。由此可以实现多个基板400同时进行共蒸镀，提高了生产效率。
进一步地，该太阳能电池共蒸镀生产线还包括基板上线装置600和基板下线装置700，基板上线装置600和基板下线装置700均与底托周转线100相连，基板上线装置600用于向底托500上输送基板400，基板下线装置700用于取走底托500上的基板400。其中，基板上线装置600与上道工序生产线相连，由此可以使经过上道工序加工的基板400通过该基板上线装置600传输到该太阳能电池共蒸镀生产线上；相应地，基板下线装置700可以与下道工序生产线相连，由此可以在基板400完成共蒸镀后，通过基板下线装置700传输到下道工序生产线上，以便进行后续加工。
进一步地，该太阳能电池共蒸镀生产线还包括底托上线装置800和底托下线装置900，底托上线装置800与底托上线口相连，用于向底托周转线100上输送底托500，底托下线装置900与底托下线口相连，用于从底托周转线100上回收底托500。员工可以手动将底托500放到底托上线装置800上，或者手动从底托下线装置900上将底托500取下，由此方便了员工的操作，同时可以使员工远离运行中的底托周转线100，保证员工人身安全。
进一步地，如图1所示，为了实现底托500自动循环流转，底托上线装置800可以与底托下线装置900相连，由此可以使回流至底托下线装置900上的底托500自动流转至底托上线装置800，以进行下一轮流转，从而可以使员工无需将底托500从底托下线装置900上取下，再放置到底托上线装置800上，由此简化了底托500流转步骤，提高了流转效率。
需要说明的是，在共蒸镀工序的上道工序，基板400上需要进行共蒸镀的面朝上设置，而在共蒸镀工序要求加工面朝下设置，在现有技术中，通常通过手动来对经过上道工序的基板400进行翻片，导致生产效率较低，员工劳动强度大。而在本实施例中，为了解决上述问题，如图2所示，基板上线装置600和基板下线装置700上均可以设置有驱动机构、翻转机构 和夹持机构30，驱动机构的输出端与翻转机构的一端相连，用于驱动翻转机构转动，翻转机构与夹持机构30相连。当底托500传输至基板上线装置600位置处时，驱动机构可以驱动翻转机构向基板400所在方向转动，以便夹持机构30将经过上道工序的基板400夹起，然后驱动夹持有基板400的翻转机构向相反的方向转动180°，从而可以将基板400翻转180°，并放置到底托500上；然后夹持机构30释放基板400，以便于基板400随底托500进入流转，由此实现了基板400的自动翻片和流转，提高了生产效率，节约了劳动力。
其中，夹持机构30可以为机械夹钳，以通过控制夹钳的开合来实现基板400的夹起与放下，但是机械夹钳的夹紧力不易控制，容易损伤基板400；而真空吸盘采用控制气压的原理来实现基板400的拾取，因此不易对基板400造成损伤，容易控制；因此，在本实施例中，夹持机构30优选为为真空吸盘，翻转机构上可以设置有真空泵，真空泵与真空吸盘相连。具体地，驱动机构可以为电机，翻转机构可以包括转动臂10和转轴20，转动臂10的一端与转轴20垂直连接，真空吸盘设置在转动臂10上，转轴20的一端与驱动电机相连，驱动电机可以驱动转轴20转动，进而带动转动臂10翻转，如图2所示。
为了精确控制底托500分别在基板上线装置600和基板下线装置700的传输位置，该太阳能电池共蒸镀生产线还可以包括位置检测装置，该位置检测装置分别设置在基板上线装置600和基板下线装置700上；当底托500传输至基板上线装置600位置处时，位置检测装置可以向主控室发送底托500位置信号，以使底托500停留在基板上线装置600位置处设定时间，同时触发驱动机构启动，以控制翻转机构将基板400放置到底托500上，由此实现了对基板400翻片、传输和流转的精确控制。
其中，参照图1、图3和图4，底托500可以包括相互垂直的纵梁510和横梁520，纵梁510和横梁520之间构成两个以上用于放置基板400的共蒸镀区域530。共蒸镀区域530为镂空的设计，基板400可以搭设在对称设置的纵梁510上，从而可以通过共蒸镀区域530对基板400的下表面进行共蒸镀加工。而设计两个以上的共蒸镀区域530可以提高底托500的 载片能力，实现多个基板400的流转。在本实施例中，共蒸镀区域530的数量可以为两个。另外，基板上线装置600也可以设置有两个，且两个上线装置在底托周转线100的流转方向上保持有一定间距，由此，底托500随着底托周转线100的传输，可以通过两个基板上线装置600分别将两个基板400传输到同一个底托500上；相应地，基板下线装置700也可以设置有两个，由此可以分别取下同一底托500上的两个基板400。
本发明实施例提供的太阳能电池共蒸镀生产线，通过设置底托周转线和基板周转线，实现了对CIGS薄膜电池在共蒸镀工序的自动化周转和加工，同时实现了底托的自动循环流转，节省了人力，提高了生产效率，节约了生产成本。
以上依据图式所示的实施例详细说明了本发明的构造、特征及作用效果，以上所述仅为本发明的较佳实施例，但本发明不以图面所示限定实施范围，凡是依照本发明的构想所作的改变，或修改为等同变化的等效实施例，仍未超出说明书与图示所涵盖的精神时，均应在本发明的保护范围内。

Claims (10)

  1. 一种太阳能电池共蒸镀生产线，其特征在于，包括：
    底托周转线，所述底托周转线上设置有底托上线口和底托下线口；
    基板周转线，所述基板周转线与共蒸镀设备相连，所述基板周转线上设置有上料口和下料口，所述上料口和所述下料口均与所述底托周转线相连；
    主控室，用于控制所述底托周转线和所述基板周转线动作。
  2. 根据权利要求1所述的太阳能电池共蒸镀生产线，其特征在于，还包括与所述底托周转线相连的基板上线装置和基板下线装置，所述基板上线装置用于向底托上输送基板，所述基板下线装置用于取走所述底托上的基板。
  3. 根据权利要求1所述的太阳能电池共蒸镀生产线，其特征在于，还包括底托上线装置和底托下线装置，所述底托上线装置与所述底托上线口相连，用于向所述底托周转线上输送底托，所述底托下线装置与所述底托下线口相连，用于从所述底托周转线上回收所述底托。
  4. 根据权利要求3所述的太阳能电池共蒸镀生产线，其特征在于，所述底托上线装置与所述底托下线装置相连。
  5. 根据权利要求1所述的太阳能电池共蒸镀生产线，其特征在于，所述基板上线装置和基板下线装置上均设置有驱动机构、翻转机构和夹持机构，所述驱动机构的输出端与所述翻转机构的一端相连，用于驱动所述翻转机构转动，所述翻转机构与所述夹持机构相连。
  6. 根据权利要求5所述的太阳能电池共蒸镀生产线，其特征在于，所述夹持机构为真空吸盘，所述翻转机构上设置有真空泵，所述真空泵与所述真空吸盘相连。
  7. 根据权利要求5所述的太阳能电池共蒸镀生产线，其特征在于，还包括位置检测装置，所述位置检测装置分别设置在所述基板上线装置和基板下线装置上。
  8. 根据权利要求5所述的太阳能电池共蒸镀生产线，其特征在于，所 述底托包括相互垂直的纵梁和横梁，所述纵梁和所述横梁之间构成两个以上用于放置基板的共蒸镀区域。
  9. 根据权利要求1所述的太阳能电池共蒸镀生产线，其特征在于，所述基板周转线包括基板上料线和基板下料线，所述基板上料线与所述共蒸镀设备的输入端相连，所述基板下料线与所述共蒸镀设备的输出端相连；所述上料口设置在所述基板上料线上，所述下料口设置在所述基板下料线上。
  10. 根据权利要求9所述的太阳能电池共蒸镀生产线，其特征在于，所述基板上料线上设置有多个输入线，每个所述输入线均与一个所述共蒸镀设备的输入端相连，所述基板下料线上设置有多个输出线，每个所述输出线均与一个所述共蒸镀设备的输出端相连。
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