WO2018228354A1 - 发射激光与目标探测光等焦性控制系统 - Google Patents

发射激光与目标探测光等焦性控制系统 Download PDF

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WO2018228354A1
WO2018228354A1 PCT/CN2018/090745 CN2018090745W WO2018228354A1 WO 2018228354 A1 WO2018228354 A1 WO 2018228354A1 CN 2018090745 W CN2018090745 W CN 2018090745W WO 2018228354 A1 WO2018228354 A1 WO 2018228354A1
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unit
light
target
defocus
defocus amount
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PCT/CN2018/090745
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English (en)
French (fr)
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廖周
莫德乐图
张永光
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成都安的光电科技有限公司
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Publication of WO2018228354A1 publication Critical patent/WO2018228354A1/zh

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0043—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target
    • F41H13/005—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target the high-energy beam being a laser beam
    • F41H13/0062—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target the high-energy beam being a laser beam causing structural damage to the target
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H11/00—Defence installations; Defence devices
    • F41H11/02—Anti-aircraft or anti-guided missile or anti-torpedo defence installations or systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J11/00—Measuring the characteristics of individual optical pulses or of optical pulse trains
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/1006—Beam splitting or combining systems for splitting or combining different wavelengths
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/287—Systems for automatic generation of focusing signals including a sight line detecting device
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus

Definitions

  • the invention relates to the field of counterfeiting of drones, in particular to a focal control system for transmitting laser and target detecting light applied to a laser slamming system of a drone.
  • UAVs to sneak shots and steal information, carrying substances that endanger public safety, and, for example, the emergence of drone black-fly events at an airport, resulting in a large number of flights delayed, resulting in significant losses.
  • the UAV laser slamming system is a system that uses a laser to strike a target (unmanned aerial vehicle).
  • a target unmanned aerial vehicle
  • the laser generated by the laser must be accurately focused on the target, ie, the laser and the target detection light. Satisfying the requirements of the isocentricity, therefore, ensuring the isocentricity of the emitted laser and the target detection light is a technical problem that must be solved to achieve a precise target strike.
  • the embodiments of the present invention provide the following technical solutions:
  • a focal control system for emitting laser and target detection light comprising a beam focus detection unit, a control unit, a target light defocus correction unit, and a laser defocus correction unit;
  • the beam isocentricity detecting unit is configured to detect a defocus amount of the target probe light and a defocus amount of the emitted laser light;
  • the control unit is configured to control the target light defocus correction unit according to the defocus amount of the target probe light, and control the emission laser defocus correction unit according to the defocus amount of the emitted laser;
  • the target light defocus correction unit is configured to adjust a defocus amount of the target probe light
  • the emission laser defocus correction unit is configured to adjust a defocus amount of the emitted laser light.
  • the difference between the defocused amount of the adjusted target detection light and the defocus amount of the emitted laser light is within a set range, preferably approaching zero.
  • Scheme 2 a focal control system for emitting laser and target detection light, including a beam focus detection unit, a control unit, and a target light defocus correction unit;
  • the beam isocentricity detecting unit is configured to detect a defocus amount of the target probe light and a defocus amount of the emitted laser light;
  • the control unit is configured to control the target light defocus correction unit according to the defocus amount of the target probe light and the defocus amount of the emitted laser light;
  • the target light defocusing correction unit is configured to adjust a defocus amount of the target probe light such that a difference between a defocus amount of the adjusted target probe light and a defocus amount of the emitted laser light is within a set range, preferably approaching At zero.
  • Scheme 3 a focal control system for emitting laser and target detection light, including a beam focus detection unit, a control unit, and a laser defocus correction unit;
  • the beam isocentricity detecting unit is configured to detect a defocus amount of the target probe light and a defocus amount of the emitted laser light;
  • the control unit is configured to control the emitted laser defocus correction unit according to the defocus amount of the target probe light and the defocus amount of the emitted laser light;
  • the emission laser defocus correction unit is configured to adjust a defocus amount of the emitted laser light, so that a difference between a defocus amount of the target detection light and a defocus amount of the adjusted emission laser is within a set range, preferably approaching zero.
  • An embodiment of the present invention further provides a beam isocentricity detecting apparatus, including a beam splitting unit, a retroreflector unit, and a beam defocusing detecting sensor unit; the beam splitting unit transmits a part of the emitted laser light to the retroreflector unit, after entering The laser light to the reflector unit is reflected back by the retroreflector, reflected by the spectroscopic unit, and then enters the beam defocusing detection sensor unit to obtain the defocus amount of the emitted laser light; the target probe light from the target is transmitted through the spectroscopic unit, and then enters The beam defocusing detection sensor unit obtains the defocus amount of the target probe light.
  • a beam isocentricity detecting apparatus including a beam splitting unit, a retroreflector unit, and a beam defocusing detecting sensor unit; the beam splitting unit transmits a part of the emitted laser light to the retroreflector unit, after entering The laser light to the reflector unit is reflected back by the retroreflector, reflected by the spect
  • the embodiment of the present invention further provides another structure of the beam isocentricity detecting device, comprising a beam splitting unit, a retroreflector unit and a beam defocusing detecting sensor unit; and the beam splitting unit transmits the target detecting light to the retroreflector unit.
  • the target probe light entering the retroreflector unit is reflected back by the retroreflector, reflected by the spectroscopic unit, and then enters the beam defocusing detection sensor unit to obtain the defocus amount of the target probe light; the spectroscopic unit transmits a part of the emitted laser light to The beam defocuss the detection sensor unit to obtain the amount of defocus of the emitted laser light.
  • the invention has the beneficial effects that the difference in defocus amount between the emitted laser light and the target detecting light can be detected by the beam isocentricity detecting unit, and is corrected by the correcting unit when the requirements are not met. It can guarantee the isocentricity of the emitted laser and the target detection light, so that the emitted laser can be accurately focused on the target.
  • FIG. 1 is a schematic diagram of an isosceles control system of a structure according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of an isosceles control system of another structure according to the embodiment of the present invention.
  • FIG. 3 is a schematic diagram of an isosceles control system of still another structure according to the embodiment of the present invention.
  • FIG. 4 is a schematic diagram of a beam isoelectricity detecting unit of the structure according to the embodiment of the present invention.
  • FIG. 5 is a schematic diagram of a beam isoelectricity detecting unit of another structure according to the embodiment of the present invention.
  • 10-beam isotope detection unit 20-control unit; 30-target light defocus correction unit; 40-launch laser defocus correction unit; 50-target detection light; 60-launch laser; 101-splitting unit; Retroreflector unit; 103-beam out-of-focus detection sensor unit; 105-signal line; 106-partially-reflected laser reflected by the splitting unit; 107-partially transmitted laser transmitted by the splitting unit; 108-reflected by the retroreflector unit Laser; 109-target reflected light reflected by the retroreflector unit.
  • a focus control system for emitting laser light and target probe light.
  • the system includes a beam focus detection unit 10, a control unit 20, a target light defocus correction unit 30, and / or emit laser defocus correction unit 40.
  • the beam isocentricity detecting unit 10 is for detecting the amount of defocus of the target probe light and the amount of defocusing of the emitted laser light.
  • the control unit 20 is configured to perform data processing and fusion on the target probe light defocus amount and the emission laser defocus amount output by the beam isocentricity detecting unit 10, and then respectively control the target light defocus correction unit 30 and the emission laser defocus correction unit. 40, or according to the difference between the defocus amount of the target probe light and the defocus amount of the emitted laser light, one of the target light defocus correction unit 30 and the laser defocus correction unit 40 is controlled to ensure the equal focus of the emitted laser and the target probe light. Sex.
  • the target light defocus correction unit 30 and the emission laser defocus correction unit 40 may employ a deformed mirror or a component that can change the amount of defocus of the light beam (for example, a secondary mirror of a telescope for target light reception, or a laser beam expander)
  • the secondary mirror of the beam expanding optical system, the control unit issues a control signal to control the target light defocus correction unit 30 and/or the emission laser defocus correction unit 40 for corresponding adjustment.
  • the isocenter control system includes a beam isocentricity detecting unit 10, a control unit 20, a target optical defocusing correction unit 30, and a laser defocusing correction unit 40, and the beam isocentricity detecting unit 10 respectively
  • the defocus amount of the target probe light and the defocus amount of the emitted laser light are detected, and the control unit 20 controls the target light defocus correction unit 30 according to the defocus amount of the target probe light to realize the adjustment of the defocus amount of the target probe light, so that After the adjustment, the defocus amount of the target detection light is within a set range, preferably approaches zero, and on the other hand, the defocusing correction unit 40 is controlled according to the defocus amount of the emitted laser to realize the adjustment of the defocus amount of the emitted laser light. Therefore, the amount of defocusing of the emitted laser light after adjustment is within a set range, preferably approaching zero.
  • the isocenter control system includes a beam isocentricity detecting unit 10, a control unit 20, and a target optical defocusing correction unit 30, and the beam isocentricity detecting unit 10 detects the defocus amount of the target probe light, respectively.
  • the control unit 20 calculates the difference between the defocus amounts between the two beams according to the two defocus amounts, and controls the target light defocus correction unit 30 to achieve the defocus amount adjustment of the target probe light. Therefore, the difference between the defocus amount of the target probe light and the defocus amount of the emitted laser light is within a set range, preferably approaching zero.
  • the isocenter control system includes a beam isocentricity detecting unit 10, a control unit 20, and a laser defocusing correction unit 40, and the beam isocentricity detecting unit 10 detects the defocus amount of the target probe light, respectively. And the defocus amount of the emitted laser light, the control unit 20 calculates the difference between the defocus amounts between the two beams according to the two defocus amounts, and controls the emitted laser defocus correction unit 40 to achieve the defocus amount correction of the emitted laser light.
  • the difference between the defocus amount of the target probe light and the defocus amount of the emitted laser light is within a set range, preferably close to zero.
  • the beam isocentricity detecting unit 10 includes a beam splitting unit 101, a retroreflector unit 102, and a beam defocusing detecting sensor unit 103 (such as a Hartmann wavefront sensor or a curvature wavefront sensor, which can directly detect The amount of defocus of the beam).
  • a beam defocusing detecting sensor unit 103 such as a Hartmann wavefront sensor or a curvature wavefront sensor, which can directly detect The amount of defocus of the beam).
  • one surface of the spectroscopic unit 101 is plated with an optical film having a high reflectance for emitting laser light 60 and an optical film having a high transmittance for the target detecting light 50, and the other surface is plated with the emitted laser light 60 and
  • the target detection light 50 is an optical film having a high transmittance.
  • the target probe light 50 is transmitted through the beam splitting unit 101, it enters the beam focus detection sensor unit 103 to obtain the amount of defocus of the target probe light.
  • one surface of the light splitting unit 101 is plated with an optical film that transmits the target probe light 50 and an optical film that emits a high reflectance for the laser light 60, and the other surface is plated with the emitted laser light 60 and the target detection.
  • the light 50 has a high transmittance optical film.
  • the sensor unit 103 obtains the defocus amount of the emitted laser light; the target probe light 50 passes through the beam splitting unit 101 and enters the retroreflector unit 102, and the target probe light 50 entering the retroreflector unit 102 is reflected back, and the retroreflector The target detection light 109 reflected by the unit is reflected by the beam splitting unit 101, and then enters the beam defocusing detecting sensor unit 103 to obtain the defocus amount of the target detecting light.
  • the retroreflector unit 102 includes a retroreflector array of a plurality of retroreflectors for aperture separation and reflection of the input beam.

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  • Engineering & Computer Science (AREA)
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  • Spectroscopy & Molecular Physics (AREA)
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Abstract

一种发射激光与目标探测光等焦性控制系统，包括光束等焦性检测单元（10）、控制单元（20）、目标光离焦校正单元（30）和发射激光离焦校正单元（40）；光束等焦性检测单元（10），用于检测目标探测光（50）的离焦量和发射激光（60）的离焦量；控制单元（20），用于根据目标探测光（50）的离焦量控制目标光离焦校正单元（30），根据发射激光（60）的离焦量控制发射激光离焦校正单元，使得校正后的目标探测光（50）与校正后的发射激光（60）的离焦量之差在设定范围内。通过光束等焦性检测单元（10）可以检测出发射激光（60）与目标探测光（50）之间的离焦量之差，在不符合要求时通过目标光离焦校正单元（30）和/或发射激光校正单元（40）进行校正，从而保障发射激光（60）与目标探测光（50）的等焦性，保障发射激光（60）精确聚焦在目标上。

Description

发射激光与目标探测光等焦性控制系统 技术领域
本发明涉及无人机反制领域，特别是一种应用于无人机激光狙击系统的发射激光与目标探测光等焦性控制系统。
背景技术
无人机违规飞行会对国家公共安全、飞行安全甚至是空防安全构成威胁。比如，利用无人机进行偷拍和窃取信息，携带危害公共安全的物质，再比如，某机场出现无人机黑飞事件，导致大量航班被延误，产生了重大损失。
无人机激光狙击系统，是一种利用激光打击目标(无人机)的系统，为了实现目标被准确击中，就必须使激光器产生的激光准确聚焦到目标上，即发射激光与目标探测光满足等焦性的要求，因此，保障发射激光与目标探测光的等焦性，是实现目标被精确打击所必须解决的技术难题。
发明内容
本发明的目的在于提供一种应用于无人机激光狙击系统的发射激光与目标探测光等焦性控制系统。为此，本发明实施例提供了以下技术方案：
方案一：一种发射激光与目标探测光等焦性控制系统，包括光束等焦性检测单元、控制单元、目标光离焦校正单元和发射激光离焦校正单元；
所述光束等焦性检测单元，用于检测目标探测光的离焦量和发射激光的离焦量；
所述控制单元，用于根据目标探测光的离焦量控制目标光离焦校正单元，根据发射激光的离焦量控制发射激光离焦校正单元；
所述目标光离焦校正单元，用于调节目标探测光的离焦量；
所述发射激光离焦校正单元，用于调节发射激光的离焦量。通过对目标探测光和发射激光进行调节，使得调节后的目标探测光的离焦量与发射激光的离焦量之差在设定范围内，最好趋近于零。
方案二：一种发射激光与目标探测光等焦性控制系统，包括光束等焦性检测单元、控制单元、目标光离焦校正单元；
所述光束等焦性检测单元，用于检测目标探测光的离焦量和发射激光的离焦量；
所述控制单元，用于根据目标探测光的离焦量和发射激光的离焦量，控制目标光离焦校正单元；
所述目标光离焦校正单元，用于调节目标探测光的离焦量，使得调节后的目标探测光的离焦量与发射激光的离焦量之差在设定范围内，最好趋近于零。
方案三：一种发射激光与目标探测光等焦性控制系统，包括光束等焦性检测单元、控制单元、发射激光离焦校正单元；
所述光束等焦性检测单元，用于检测目标探测光的离焦量和发射激光的离焦量；
所述控制单元，用于根据目标探测光的离焦量和发射激光的离焦量，控制发射激光离焦校正单元；
所述发射激光离焦校正单元，用于调节发射激光的离焦量，使得目标探测光的离焦量与调节后的发射激光的离焦量之差在设定范围内，最好趋近于零。
本发明实施例还提供了一种光束等焦性检测装置，包括分光单元、后向反 射器单元和光束离焦探测传感器单元；分光单元将发射激光的一部分透射至后向反射器单元，进入后向反射器单元的激光被后向反射器反射回来，经分光单元反射后，进入光束离焦探测传感器单元，得到发射激光的离焦量；来自目标的目标探测光，经过分光单元透射后，进入光束离焦探测传感器单元，得到目标探测光的离焦量。
本发明实施例还提供了另一种结构的光束等焦性检测装置，包括分光单元、后向反射器单元和光束离焦探测传感器单元；分光单元将目标探测光透射至后向反射器单元，进入后向反射器单元的目标探测光被后向反射器反射回来，经分光单元反射后，进入光束离焦探测传感器单元，得到目标探测光的离焦量；分光单元将发射激光的一部分透射至光束离焦探测传感器单元，得到发射激光的离焦量。
与现有技术相比，本发明的有益效果：本发明通过光束等焦性检测单元可以检测出发射激光与目标探测光之间的离焦量之差，在不符合要求时通过校正单元进行校正，可以保障发射激光与目标探测光的等焦性，实现发射激光可以精确聚焦到目标上。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，应当理解，以下附图仅示出了本发明的某些实施例，因此不应被看作是对范围的限定，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他相关的附图。
图1为本发明实施例中所述一种结构的等焦性控制系统示意图。
图2为本发明实施例中所述另一种结构的等焦性控制系统示意图。
图3为本发明实施例中所述又一种结构的等焦性控制系统示意图。
图4为本发明实施例中所述一种结构的光束等焦性检测单元的示意图。
图5为本发明实施例中所述另一种结构的光束等焦性检测单元的示意图
图中标记说明
10-光束等焦性检测单元；20-控制单元；30-目标光离焦校正单元；40-发射激光离焦校正单元；50-目标探测光；60-发射激光；101-分光单元；102-后向反射器单元；103-光束离焦探测传感器单元；105-信号线；106-分光单元反射的部分发射激光；107-分光单元透射的部分发射激光；108-后向反射器单元反射的发射激光；109-后向反射器单元反射的目标探测光。
具体实施方式
下面将结合本发明实施例中附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。通常在此处附图中描述和示出的本发明实施例的组件可以以各种不同的配置来布置和设计。因此，以下对在附图中提供的本发明的实施例的详细描述并非旨在限制要求保护的本发明的范围，而是仅仅表示本发明的选定实施例。基于本发明的实施例，本领域技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
请参阅图1-3，本实施例中提供了一种发射激光与目标探测光等焦性控制系统，该系统包括光束等焦性检测单元10、控制单元20、目标光离焦校正单元30和/或发射激光离焦校正单元40。
光束等焦性检测单元10用于检测目标探测光的离焦量和发射激光的离焦量。控制单元20用于对光束等焦性检测单元10输出的目标探测光离焦量和发射激光离焦量进行数据处理和融合，然后分别控制目标光离焦校正单元30和发射激光离焦校正单元40，或者根据目标探测光的离焦量和发射激光的离焦量之 差，控制目标光离焦校正单元30和发射激光离焦校正单元40之一，保证发射激光和目标探测光的等焦性。
目标光离焦校正单元30和发射激光离焦校正单元40可以采用变形反射镜或可以改变光束离焦量的部件(例如用于目标光接收的望远镜的次镜，或用于发射激光扩束的扩束光学系统的次镜)，控制单元发出控制信号控制目标光离焦校正单元30和/或发射激光离焦校正单元40进行相应调整。
在图1所示方案中，等焦性控制系统包括光束等焦性检测单元10、控制单元20、目标光离焦校正单元30和发射激光离焦校正单元40，光束等焦性检测单元10分别检测目标探测光的离焦量和发射激光的离焦量，控制单元20一方面根据目标探测光的离焦量控制目标光离焦校正单元30，实现对目标探测光的离焦量调节，使得调节后目标探测光的离焦量在设定范围内，最好趋近于零，另一方面根据发射激光的离焦量控制发射激光离焦校正单元40，实现对发射激光的离焦量调节，使得调节后发射激光的离焦量在设定范围内，最好趋近于零。
在图2所示方案中，等焦性控制系统包括光束等焦性检测单元10、控制单元20、目标光离焦校正单元30，光束等焦性检测单元10分别检测目标探测光的离焦量和发射激光的离焦量，控制单元20根据这两个离焦量计算两个光束之间的离焦量之差，控制目标光离焦校正单元30，实现对目标探测光的离焦量调节，使得目标探测光的离焦量与发射激光的离焦量之差在设定范围内，最好趋近于零。
在图3所示方案中，等焦性控制系统包括光束等焦性检测单元10、控制单元20、发射激光离焦校正单元40，光束等焦性检测单元10分别检测目标探测光的离焦量和发射激光的离焦量，控制单元20根据这两个离焦量计算两个光束之间的离焦量之差，控制发射激光离焦校正单元40，实现对发射激光的离焦量 校正，使得目标探测光的离焦量与发射激光的离焦量之差在设定范围内，最好趋近于零。
请参阅图4-5，光束等焦性检测单元10包括分光单元101、后向反射器单元102、光束离焦探测传感器单元103(比如哈特曼波前传感器或曲率波前传感器，直接可以探测光束的离焦量)。
在图4所示结构中，分光单元101的一个表面镀制对发射激光60高反射率的光学膜和对目标探测光50高透过率的光学膜，另外一个表面镀制对发射激光60和目标探测光50都高透过率的光学膜。发射激光60经过分光单元101后，一部分能量，即分光单元反射的部分发射激光106被反射出去打击目标，另一部分能量，即分光单元透射的部分发射激光107透过分光单元101，进入后向反射器单元102，进入后向反射器单元102的激光被反射回来，即后向反射器单元反射的发射激光108，经分光单元101反射后，进入光束离焦探测传感器单元103得到发射激光的离焦量；目标探测光50经过分光单元101透射后，进入光束离焦探测传感器单元103得到目标探测光的离焦量。
在图5所示结构中，分光单元101的一个表面镀制对目标探测光50透过的光学膜和对发射激光60高反射率的光学膜，另外一个表面镀制对发射激光60和目标探测光50都高透过率的光学膜。发射激光60经过分光单元101后，一部分能量，分光单元反射的部分发射激光106被反射出去打击目标，另一部分能量，即分光单元透射的部分发射激光107透过分光单元101，进入光束离焦探测传感器单元103，得到发射激光的离焦量；目标探测光50透过分光单元101后进入后向反射器单元102，进入后向反射器单元102的目标探测光50被反射回来，后向反射器单元反射的目标探测光109，经分光单元101反射后，进入光 束离焦探测传感器单元103，得到目标探测光的离焦量。
后向反射器单元102包括一个由多个后向反射器组成的后向反射器阵列，用于实现对对输入光束的孔径分割和反射。
以上所述，仅为本发明的具体实施方式，但本发明的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到变化或替换，都应涵盖在本发明的保护范围之内。

Claims (8)

  1. 一种发射激光与目标探测光等焦性控制系统，其特征在于，包括光束等焦性检测单元、控制单元、目标光离焦校正单元和发射激光离焦校正单元；
    所述光束等焦性检测单元，用于检测目标探测光的离焦量和发射激光的离焦量；
    所述控制单元，用于根据目标探测光的离焦量控制目标光离焦校正单元，根据发射激光的离焦量控制发射激光离焦校正单元；
    所述目标光离焦校正单元，用于调节目标探测光的离焦量；
    所述发射激光离焦校正单元，用于调节发射激光的离焦量。
  2. 根据权利要求1所述的发射激光与目标探测光等焦性控制系统，其特征在于，所述光束等焦性检测单元，包括分光单元、后向反射器单元和光束离焦探测传感器单元；分光单元将发射激光的一部分透射至后向反射器单元，进入后向反射器单元的激光被后向反射器反射回来，经分光单元反射后，进入光束离焦探测传感器单元，得到发射激光的离焦量；来自目标的目标探测光，经过分光单元透射后，进入光束离焦探测传感器单元，得到目标探测光的离焦量。
  3. 根据权利要求1所述的发射激光与目标探测光等焦性控制系统，其特征在于，所述光束等焦性检测单元，包括分光单元、后向反射器单元和光束离焦探测传感器单元；分光单元将目标探测光透射至后向反射器单元，进入后向反射器单元的目标探测光被后向反射器反射回来，经分光单元反射后，进入光束离焦探测传感器单元，得到目标探测光的离焦量；分光单元将发射激光的一部分透射至光束离焦探测传感器单元，得到发射激光的离焦量。
  4. 根据权利要求2或3所述的发射激光与目标探测光等焦性控制系统，其 特征在于，所述后向反射器单元包括一个由多个后向反射器组成的后向反射器阵列。
  5. 一种发射激光与目标探测光等焦性控制系统，其特征在于，包括光束等焦性检测单元、控制单元和目标光离焦校正单元；
    所述光束等焦性检测单元，用于检测目标探测光的离焦量和发射激光的离焦量；
    所述控制单元，用于根据目标探测光的离焦量和发射激光的离焦量，控制目标光离焦校正单元；
    所述目标光离焦校正单元，用于调节目标探测光的离焦量，使得调节后的目标探测光的离焦量与发射激光的离焦量之差在设定范围内。
  6. 一种发射激光与目标探测光等焦性控制系统，其特征在于，包括光束等焦性检测单元、控制单元和发射激光离焦校正单元；
    所述光束等焦性检测单元，用于检测目标探测光的离焦量和发射激光的离焦量；
    所述控制单元，用于根据目标探测光的离焦量和发射激光的离焦量，控制发射激光离焦校正单元；
    所述发射激光离焦校正单元，用于调节发射激光的离焦量，使得目标探测光的离焦量与调节后的发射激光的离焦量之差在设定范围内。
  7. 一种光束等焦性检测装置，其特征在于，包括分光单元、后向反射器单元和光束离焦探测传感器单元；分光单元将发射激光的一部分透射至后向反射器单元，进入后向反射器单元的激光被后向反射器反射回来，经分光单元反射 后，进入光束离焦探测传感器单元，得到发射激光的离焦量；来自目标的目标探测光经过分光单元透射后，进入光束离焦探测传感器单元，得到目标探测光的离焦量。
  8. 一种光束等焦性检测装置，其特征在于，包括分光单元、后向反射器单元和光束离焦探测传感器单元；分光单元将目标探测光透射至后向反射器单元，进入后向反射器单元的目标探测光被后向反射器反射回来，经分光单元反射后，进入光束离焦探测传感器单元，得到目标探测光的离焦量；分光单元将发射激光的一部分透射至光束离焦探测传感器单元，得到发射激光的离焦量。
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