WO2018219798A1 - Nozzle device and a method of manufacturing the same - Google Patents

Nozzle device and a method of manufacturing the same Download PDF

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Publication number
WO2018219798A1
WO2018219798A1 PCT/EP2018/063769 EP2018063769W WO2018219798A1 WO 2018219798 A1 WO2018219798 A1 WO 2018219798A1 EP 2018063769 W EP2018063769 W EP 2018063769W WO 2018219798 A1 WO2018219798 A1 WO 2018219798A1
Authority
WO
WIPO (PCT)
Prior art keywords
spray
sieve
cavity portion
membrane
orifices
Prior art date
Application number
PCT/EP2018/063769
Other languages
French (fr)
Inventor
Daniel SÄLL
Johan MIDBJER
Original Assignee
Shl Medical Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shl Medical Ag filed Critical Shl Medical Ag
Priority to EP18727006.1A priority Critical patent/EP3630365B1/en
Priority to JP2019566305A priority patent/JP6944544B2/en
Priority to CN201880031702.2A priority patent/CN110621411B/en
Priority to KR1020197035298A priority patent/KR102366748B1/en
Priority to US16/616,359 priority patent/US11383251B2/en
Publication of WO2018219798A1 publication Critical patent/WO2018219798A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/08—Flat membrane modules
    • B01D63/089—Modules where the membrane is in the form of a bag, membrane cushion or pad
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/40—Filters located upstream of the spraying outlets

Definitions

  • the present disclosure generally relates to nozzle devices.
  • it relates to a nozzle device for atomisation of a liquid and to a method of manufacturing such a nozzle device.
  • a nozzle device may be configured to atomise a liquid, i.e. to make an aerosol of the liquid.
  • a nozzle device of this type may comprise a substrate having a filter side provided with a filter for filtering out any undesired larger particles contained in the liquid to be atomised.
  • the substrate may also have a spray- side provided with a spray-membrane having a plurality of orifices.
  • the spray-membrane and the filter are configured to be in liquid communication.
  • the liquid first passes the filter where a slight pressure drop is obtained.
  • the filtered liquid subsequently passes through the orifices of the membrane, whereby the liquid is atomised.
  • the nozzle device has a filtration plate provided with at least one filtration orifice and a micro-machined reinforced nozzle plate, which may produce small liquid droplets in air or into a liquid with a narrow droplet size distribution and make small air bubbles into a liquid.
  • the pressure drop over the nozzle device may for certain applications, for example for spraying drugs having a high viscosity, be required to be relatively large, typically a plurality of bar, such as 30-50 bar.
  • the nozzle device disclosed in US2005/0178862 may not be robust enough for such applications, and the nozzle plate may therefore suffer breakage.
  • a general object of the present disclosure is to provide a nozzle device which solves or at least mitigates problems of the prior art.
  • the nozzle device comprises: a substrate, a sieve-side membrane comprising a plurality of sieve-side orifices, the sieve-side membrane being provided on a sieve-side of the substrate, a spray-side membrane comprising a plurality of spray-side orifices, the spray-side membrane being provided on a spray-side of the substrate, wherein the substrate has a first cavity portion extending to the sieve-side membrane, and a second cavity portion extending from the first cavity portion to the spray-side membrane, thereby providing fluid communication, along a fluid communication axis, between the sieve-side orifices and the spray-side orifices, the first cavity portion having a larger cross-sectional area than a cross-sectional area of the second
  • the second cavity portion and the first cavity portion hence define a channel extending through the substrate, with a decreasing cross-sectional area as the channel transitions from the first cavity portion to the second cavity portion.
  • the second cavity portion is smaller in cross-sectional area than the first cavity portion the area of the spray-side membrane which is exposed to pressure can be made substantially smaller than the corresponding area of the sieve-side membrane. A more robust nozzle device may thus be provided.
  • any cross-sectional area of the first cavity portion is larger than any cross-sectional area of the second cavity portion.
  • any cross-sectional area of the first cavity portion along the length of the first cavity portion, with respect to the fluid communication axis is larger than any cross-sectional area of the second cavity portion along the length of the second cavity portion, with respect to the fluid communication axis.
  • the cross-sectional area of the first cavity may be constant along the fluid communication axis.
  • the cross-sectional area of the second cavity may be constant along the fluid communication axis.
  • the second cavity portion may according to one example be in fluid communication with only a single spray-side orifice.
  • the second cavity portion may according to another example be configured so that each spray-side orifice is arranged adjacent to two oppositely arranged inner walls of the second cavity portion. This means that between the edge of a wall of the second cavity portion and the opposite edge of a wall of the second cavity portion there is only provided a single spray-side orifice. There may however be a plurality of spray-side orifices arranged in a single row parallel with the longitudinal extension of the second cavity portion along the surface of the spray-side membrane.
  • each spray-side orifice has a cross-sectional area greater than or equal to the cross-sectional area of any of the sieve-side orifices. This reduces the risk that a large molecule present in the liquid will clog the spray-side orifices. Such a molecule could in certain applications theoretically be able to travel through a sieve-side orifice, for example if the orientation of the molecule was in a certain direction, in which the cross- sectional area is smaller, when reaching the sieve-side membrane.
  • the number of sieve-side orifices is greater than the number of spray-side orifices. In this way, a lower pressure drop over the sieve-side membrane may be obtained.
  • the higher pressure drop over the spray-side membrane is compensated by its increased mechanical strength obtained due to it having a much smaller active area than the active area of the sieve-side membrane.
  • active area is here meant the area of the respective membrane provided with spray-side orifices and sieve-side orifices.
  • an axial length, along the fluid communication axis, of the first cavity portion is equal to an axial length of the second cavity portion.
  • the thickness of the walls provided by the second cavity portion(s) towards the spray-side membrane can hence have the same length dimension as the first cavity portion.
  • the sieve-side orifices occupy a larger area on the sieve-side membrane than the spray-side orifices occupy on the spray- side membrane.
  • the substrate comprises a first wafer provided with the first cavity portion and a second wafer provided with the second cavity portion, the first wafer and the second wafer being bonded to each other to form the substrate.
  • the substrate is made of a semiconductor material.
  • the semiconductor material may for example be silicon.
  • the sieve-side membrane and the spray-side membrane comprise one of a non-oxide ceramic, an oxide, silicon or metal.
  • a suitable non-oxide ceramic is silicone nitride.
  • the substrate comprises a plurality of second cavity portions extending from the first cavity portion to the spray-side membrane, thereby providing fluid communication, along a respective fluid communication axis, between the sieve-side orifices and the spray-side orifices, the first cavity portion having a larger cross-sectional area than a cross-sectional area of any of the second cavity portions.
  • Each second cavity portion may hence be in fluid connection with a respective set of a plurality of spray-side orifices of the spray-side membrane.
  • more spray-side orifices may be provided in the spray-side membrane, and thus a higher throughput may be provided, while maintaining the higher mechanical strength of the spray-side membrane, provided by the smaller cross-sectional area of the second cavity portions.
  • any cross-sectional area of any of the first cavity portions is larger than any cross-sectional area, with respect to the fluid communication axis, of the second cavity portion.
  • the substrate may be provided with a plurality of second cavity portions and a plurality of first cavity portions.
  • Each first cavity portion may be in fluid communication with only one second cavity portion.
  • each first cavity portion is thus connected with a respective one of the second cavity portions.
  • the number of fluid communication channels through the substrate, from the sieve-side orifices of the sieve-side membrane to spray-side orifices of the spray-side membrane can in this case be equal to the number of first cavity portions, which can be equal to the number of second cavity portions.
  • a total cross-sectional area of the second cavity portions with respect to the fluid communication axes is smaller than an area of the sieve-side membrane provided with the sieve-side orifices.
  • the sieve-side membrane does not require the same mechanical strength as the spray-side membrane does, because the forces acting on the sieve-side membrane are small relative to those acting on the spray-side membrane.
  • a medicament delivery device comprising a nozzle device according to the first aspect.
  • the nozzle device is the delivery member of the medicament delivery device.
  • the medicament delivery device is configured such that medicament passes through the nozzle device during administration to thereby atomise the medicament, creating an aerosol.
  • the medicament delivery device is an inhaler or an eye dispenser.
  • a third aspect of the present disclosure provided a method of manufacturing a nozzle device for atomisation of a liquid, wherein the method comprises: a) providing a first wafer, c) providing a sieve-side membrane layer onto a first side of the first wafer, d) providing sieve-side orifices in the sieve-side membrane layer thereby obtaining a sieve-side membrane, e) providing a first cavity portion in the first wafer, extending to the sieve-side membrane, f) providing a second wafer, h) providing a spray- side membrane layer onto a first side of the second wafer, i) providing spray- side orifices in the spray-side membrane layer thereby obtaining a spray-side membrane, j) providing a second cavity portion in the second wafer, extending to the spray-side membrane, and k) bonding a second side of the first wafer with a second side of the second wafer,
  • Steps f) to j) may for example be carried out prior to steps a) to e).
  • steps d), e), i) and j) involves etching.
  • step j) involves providing a plurality of second cavity portions in the second wafer, each extending to the spray-side membrane.
  • Fig. l is a perspective view of a schematic example of a nozzle device
  • Fig. 2a is a section along lines A-A through the nozzle device in Fig. l;
  • Figs 2b and 2c are sections along lines B-B and C-C, respectively;
  • Fig. 3 is a perspective view of another schematic example of a nozzle device;
  • Fig. 4 depicts a section through the nozzle device in Fig. 3 along lines D-D;
  • Fig. 5 is a perspective view of yet another schematic example of a nozzle device
  • Fig. 6a depicts a section through the nozzle device in Fig. 5 along lines E-E
  • Fig. 6b depicts a section through the nozzle device in Fig. 5 along lines E-E, in a perspective view from a sieve-side of the nozzle device;
  • Fig. 7 is a flowchart of a method of manufacturing a nozzle device.
  • Fig. 8 is schematic example of a longitudinal section of a medicament delivery device comprising a nozzle device.
  • Fig. l shows a first example of a nozzle device configured to atomise liquids.
  • the nozzle device l-i comprises a substrate 3.
  • the substrate 3 comprises a first wafer 3a and a second wafer 3b which have been bonded together, thus forming the substrate 3.
  • the substrate 3 has a sieve-side 3c, or filter side, and a spray-side 3d arranged opposite to the sieve-side 3c.
  • the nozzle device 1-1 further comprises a sieve-side membrane 5 provided on the sieve-side 3c of the substrate 3.
  • the nozzle device 1-1 also comprises a spray-side membrane 7 provided on the spray-side 3d of the substrate 3.
  • the sieve-side membrane 5 is provided with a plurality of sieve-side orifices 5a.
  • the spray-side membrane 7 is provided with a plurality of spray-side orifices 7a.
  • Each sieve-side orifice 5a has a cross-section, with respect to its axial extension, which is smaller or equal to a cross-section of any of the spray-side orifices 7a, with respect to the axial extension of the spray-side orifices 7a.
  • the substrate 3 has a first cavity portion 4a extending to the sieve-side membrane 5.
  • the first cavity portion 4a extends to the sieve-side orifices 5a.
  • the substrate 3 has a second cavity portion 4b extending from the first cavity portion 4a to the spray-side membrane 7.
  • the second cavity portion 4b has a mouth 4c which opens into the first cavity portion 4a.
  • the second cavity portion 4b extends from the first cavity portion 4a to the spray-side orifices 7a.
  • the sieve-side membrane 5, and in particular the sieve-side orifices 5a is hence in fluid communication with the spray-side membrane 7, in particular with the spray-side orifices 7a via the first cavity portion 4a and the second cavity portion 4b. This fluid communication is provided along a fluid communication axis 9 extending from the sieve-side membrane 5 to the spray-side membrane 7.
  • the axial length li of the first cavity portion 4a, along the fluid communication axis 9, is equal to the axial length I2 of the second cavity portion 4b.
  • the first wafer 3a and the second wafer 3b are hence equally thick. According to one variation, the thickness of the first wafer 3a and the second wafer 3b may differ.
  • a liquid to be atomised first penetrates the sieve-side orifices 5a of the sieve-side membrane 5 thereby entering the first cavity portion 4a.
  • a small pressure drop is obtained.
  • the liquid travels through the first cavity portion 4a and into the second cavity portion 4b and finally penetrates through the spray-side orifices 7a of the spray-side membrane 7. Jet streams are thus created, which due to Rayleigh instability break up into small droplets forming an aerosol.
  • Fig. 2b shows a section of the nozzle device 1-1 along lines B-B. This section is a cross-section with respect to the fluid communication axis 9, and thus corresponds to a cut parallel to the main surface extensions of the sieve-side membrane 5a and the spray-side membrane 7a.
  • the first cavity portion 4a can thus be seen in a section.
  • the cross-sectional area 11 of the exemplified first cavity portion 4a is determined by the product of the dimensions di and d2.
  • Fig. 2c shows a section of the nozzle device 1-1 along lines C-C. This section is parallel with the section along lines B-B.
  • the second cavity portion 4b can be seen in a section.
  • the cross-sectional area 13 of the exemplified second cavity portion 4b is essentially determined by the product of the dimensions d3 and d4.
  • the cross-sectional area 11 of the first cavity portion 4a is greater than the cross-sectional area 13 of the second cavity portion 4b.
  • the cross-sectional area 13 of the second cavity portion 4b is constant along the fluid communication axis 9.
  • Fig. 3 shows a second example of a nozzle device configured to atomise a liquid.
  • the nozzle device 1-2 is similar to the first example.
  • the second example however includes a plurality of second cavity portions and a plurality of first cavity portions. Each such second cavity portion extends to the spray- side membrane 7 from a respective first cavity portion.
  • Each pair of interconnected second cavity portion and first cavity portion provides fluid communication between spray-side orifices 7a of the spray-side membrane 7 and sieve-side orifices 5a of the sieve-side membrane 5.
  • Fig. 4 shows the fluid communication configuration between the spray-side membrane 7 and the sieve-side membrane 5.
  • the substrate 3 comprises a plurality of first cavity portions 4a and a plurality of second cavity portions 4b.
  • the number of first cavity portions 4a is equal to the number of second cavity portions 4b.
  • Each pair of first cavity portion 4a and second cavity portion 4b defines a respective channel which provides fluid communication between sieve-side orifices 5a of the sieve-side membrane 5 and spray-side orifices 7a of the spray-side membrane 7.
  • Each such channel has a respective fluid communication axis 9 extending from the sieve-side 3c to the spray-side 3d of the substrate 3.
  • each first cavity portion 4a is greater than the cross-sectional area of the corresponding second cavity portion 4b.
  • Fig. 5 depicts a third example of a nozzle device.
  • the nozzle device 1-3 is similar to the second example.
  • the nozzle device 1-3 includes a plurality of second cavity portions and a plurality of first cavity portions.
  • a plurality of second cavity portions extends to the spray-side membrane 7 from a single first cavity portion.
  • the plurality of second cavity portions interconnected with a first cavity portion provides fluid communication between spray-side orifices 7a of the spray-side membrane 7 and sieve-side orifices 5a of the sieve-side membrane 5.
  • Fig. 6a illustrates a section along lines E-E. It can be seen that a plurality of second cavity portions 4b extend from the spray-side membrane 7 to one first cavity portion 4a-i and a plurality of second cavity portions 4b extend from the spray-side membrane 7 to another first cavity portion 4a-2.
  • the two first cavity portions are in liquid isolation from each other. They are hence not in fluid communication.
  • Each first cavity portion 4a extends to the sieve-side membrane 5.
  • fluid communication may be provided from the sieve-side 3c to the spray-side 3d.
  • fluid communication is provided between sieve-side orifices 5a of the sieve-side membrane 5 and spray-side orifices 7a of the spray-side membrane 7.
  • Fig. 6b shows the configuration of the sieve-side orifices 5a, which are arranged in a pie-like manner, corresponding to the configuration of the spray-side orifices 7a shown in Fig. 6a.
  • the layout or configuration of the sieve-side orifices may be essentially any suitable for the particular application.
  • the layout or configuration of the spray-side orifices may be essentially any suitable for the particular configuration. It is however beneficial to provide second cavity portion(s) that extends parallel with the corresponding fluid communication axis along its/their entire extension. The same generally also applies to the first cavity portion(s).
  • a nozzle device 1-1, 1-2, 1-3 An example of manufacturing a nozzle device 1-1, 1-2, 1-3 will now be described with reference to Fig. 7. It should be noted that the nozzle device 1- 1, 1-2, 1-3 may be manufactured according to a plurality of different processes.
  • a first wafer 3a is provided.
  • the first wafer 3a can be made of a semiconducting material.
  • An example of a suitable semiconducting material is silicon.
  • the first wafer 3a may be double side polished.
  • each of a first side and a second side opposite to the first side of the first wafer 3a is provided with a protective layer and/or an adhesive layer.
  • the protective layer may for example be silicon oxide.
  • the protective layer may for example be deposited onto the first wafer 3a by means of thermal oxide deposition.
  • a sieve-side membrane layer is provided onto the protective layer provided on the first side of the first wafer 3a.
  • the sieve-side membrane layer may for example be deposited onto the protective layer by means of plasma- enhanced chemical vapour deposition.
  • the sieve-side membrane layer may for example be silicon nitride.
  • a step d) the sieve-side orifices 5a are provided in the sieve-side membrane layer thereby obtaining the sieve-side membrane 5.
  • the sieve-side orifices 5a may for example be obtained using photolithography by providing a suitably patterned photoresist and etching the pattern of sieve-side orifices 5a into the sieve-side membrane layer using for instance reactive ion etching.
  • Step d) may also involve removing of the photoresist after the patterning of the sieve- side membrane layer.
  • the first cavity portion 4a is provided in the first wafer 3a, extending through the protective layer on the first side of the first wafer 3 a to the sieve-side membrane 5. In case of several first cavity portions 4a, each first cavity portion 4a is provided in this step.
  • Step e) may involve providing a photoresist onto the second side of the first wafer 3a with a pattern/through-hole to provide the first cavity portion.
  • etching techniques to remove a portion of the first wafer 3a for example deep reactive ion etching, the first cavity portion 4a or cavities 4a may be created.
  • the photoresist is thereafter removed from the second side of the first wafer 3a.
  • Part of the protective or adhesive layer, exposed by the pattern in the photoresist, is also removed from the second side during step e).
  • the removal of this layer may for example be performed using reactive ion etching
  • the protective layer may be removed from below the sieve-side membrane 5 using for example hydrogen fluoride etching.
  • the remaining protective or adhesive layer still remaining after step e) is also removed from the second side.
  • the removal of this layer may for example be performed using reactive ion etching.
  • a second wafer 3b is provided.
  • the second wafer 3b can be made of a semiconducting material.
  • An example of a suitable semiconducting material is silicon.
  • the second wafer 3b may be double side polished.
  • each of a first side and a second side opposite to the first side of the second wafer 3b is provided with a protective layer and/or adhesive layer.
  • the protective layer may for example be silicon oxide.
  • the protective layer may for example be deposited onto the second wafer 3b by means of thermal oxide deposition.
  • a spray-side membrane layer is provided onto the protective layer provided on the first side of the second wafer 3b.
  • the spray-side membrane layer may for example be deposited onto the protective layer by means of plasma-enhanced chemical vapour deposition.
  • the spray-side membrane layer may for example be silicon nitride.
  • a step i) the spray-side orifices 7a are provided in the spray-side membrane layer thereby obtaining the spray-side membrane 7.
  • the spray- side orifices 7a may for example be obtained using photolithography by providing a suitably patterned photoresist and etching the pattern of spray- side orifices 7a into the spray-side membrane layer using for instance reactive ion etching.
  • Step i) may also involve removing of the photoresist after the patterning of the spray-side membrane layer.
  • Step j) the second cavity portion 4b is provided in the second wafer 3b, extending through the protective layer on the first side of the second wafer 3b to the spray-side membrane 7.
  • each second cavity portion 4b is provided in this step.
  • Step j) may involve providing a photoresist onto the second side of the second wafer 3b with a pattern to provide the second cavity portion(s). Using for example etching techniques to remove a portion of the second wafer 3b, for example deep reactive ion etching, the second cavity portion 4b or second cavity portions 4b may be created. The photoresist is thereafter removed from the second side of the second wafer 3b.
  • Part of the protective or adhesive layer, exposed by the pattern in the photoresist, is also removed from the second side during step e).
  • the removal of this layer may for example be performed using reactive ion etching.
  • the protective layer may be removed from below the spray-side membrane 7 using for example hydrogen fluoride etching.
  • the remaining protective or adhesive layer still remaining after step j) is also removed from the second side.
  • the removal of this layer may for example be performed using reactive ion etching.
  • the second side of the first wafer 3a is bonded with the second side of the second wafer 3b thereby forming the substrate 3.
  • the sieve-side membrane 5 forms a sieve-side
  • the spray-side membrane 7 forms a spray-side of the nozzle device 1-1, 1-2, 1-3.
  • the nozzle device 1-1, 1-2, 1-3 may for example be used in medical applications.
  • the nozzle device 1-1, 1-2, 1-3 may be provided in a medicament delivery device such as an inhaler or an eye dispenser.
  • Fig. 8 shows an example of a medicament delivery device 15 in a longitudinal section comprising a nozzle device 1-1, 1-2, 1-3 attached to a nozzle device holder.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nozzles (AREA)
  • Medical Preparation Storing Or Oral Administration Devices (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Abstract

The present disclosure relates to a nozzle device (1-1) for atomisation of a liquid, wherein the nozzle device (1-1) comprises: a substrate (3), a sieve-side membrane (5) comprising a plurality of sieve-side orifices (5a), the sieve-side membrane (5) being provided on a sieve-side (3c) of the substrate (3), a spray-side membrane (7) comprising a plurality of spray-side orifices (7a), the spray-side membrane (7) being provided on a spray-side (3d) of the substrate (3), wherein the substrate (3) has a first cavity portion (4a) extending to the sieve-side membrane (5), and a second cavity portion (4b) extending from the first cavity portion (4a) to the spray-side membrane (7), thereby providing fluid communication, along a fluid communication axis (9), between the sieve-side orifices (5a) and the spray-side orifices (7a), the first cavity portion (4a) having a larger cross-sectional area (11) than a cross-sectional area (13) of the second cavity portion (4b), the cross-sections being with respect to the fluid communication axis (9).

Description

NOZZLE DEVICE AND A METHOD OF MANUFACTURING THE SAME
TECHNICAL FIELD
The present disclosure generally relates to nozzle devices. In particular, it relates to a nozzle device for atomisation of a liquid and to a method of manufacturing such a nozzle device.
BACKGROUND
A nozzle device may be configured to atomise a liquid, i.e. to make an aerosol of the liquid. A nozzle device of this type may comprise a substrate having a filter side provided with a filter for filtering out any undesired larger particles contained in the liquid to be atomised. The substrate may also have a spray- side provided with a spray-membrane having a plurality of orifices. The spray-membrane and the filter are configured to be in liquid communication. In the process of atomisation, the liquid first passes the filter where a slight pressure drop is obtained. The filtered liquid subsequently passes through the orifices of the membrane, whereby the liquid is atomised.
An example of such a nozzle device is disclosed in US2005/0178862 Ai. The nozzle device has a filtration plate provided with at least one filtration orifice and a micro-machined reinforced nozzle plate, which may produce small liquid droplets in air or into a liquid with a narrow droplet size distribution and make small air bubbles into a liquid.
The pressure drop over the nozzle device may for certain applications, for example for spraying drugs having a high viscosity, be required to be relatively large, typically a plurality of bar, such as 30-50 bar. The nozzle device disclosed in US2005/0178862 may not be robust enough for such applications, and the nozzle plate may therefore suffer breakage.
SUMMARY
In view of the above, a general object of the present disclosure is to provide a nozzle device which solves or at least mitigates problems of the prior art. There is hence according to a first aspect of the present disclosure provided a nozzle device for atomisation of a liquid, wherein the nozzle device comprises: a substrate, a sieve-side membrane comprising a plurality of sieve-side orifices, the sieve-side membrane being provided on a sieve-side of the substrate, a spray-side membrane comprising a plurality of spray-side orifices, the spray-side membrane being provided on a spray-side of the substrate, wherein the substrate has a first cavity portion extending to the sieve-side membrane, and a second cavity portion extending from the first cavity portion to the spray-side membrane, thereby providing fluid communication, along a fluid communication axis, between the sieve-side orifices and the spray-side orifices, the first cavity portion having a larger cross-sectional area than a cross-sectional area of the second cavity portion, the cross-sections being with respect to the fluid communication axis.
The second cavity portion and the first cavity portion hence define a channel extending through the substrate, with a decreasing cross-sectional area as the channel transitions from the first cavity portion to the second cavity portion.
Since the second cavity portion is smaller in cross-sectional area than the first cavity portion the area of the spray-side membrane which is exposed to pressure can be made substantially smaller than the corresponding area of the sieve-side membrane. A more robust nozzle device may thus be provided.
According to one embodiment any cross-sectional area of the first cavity portion is larger than any cross-sectional area of the second cavity portion. Thus any cross-sectional area of the first cavity portion along the length of the first cavity portion, with respect to the fluid communication axis, is larger than any cross-sectional area of the second cavity portion along the length of the second cavity portion, with respect to the fluid communication axis.
The cross-sectional area of the first cavity may be constant along the fluid communication axis. The cross-sectional area of the second cavity may be constant along the fluid communication axis. The second cavity portion may according to one example be in fluid communication with only a single spray-side orifice.
The second cavity portion may according to another example be configured so that each spray-side orifice is arranged adjacent to two oppositely arranged inner walls of the second cavity portion. This means that between the edge of a wall of the second cavity portion and the opposite edge of a wall of the second cavity portion there is only provided a single spray-side orifice. There may however be a plurality of spray-side orifices arranged in a single row parallel with the longitudinal extension of the second cavity portion along the surface of the spray-side membrane.
The spray-side orifice configurations according to the examples above reduces the risk of aerosol droplets colliding, thereby forming larger droplets. It is in certain applications, for example medical applications, desirable to maintain the fine droplets of the aerosol. According to one embodiment each spray-side orifice has a cross-sectional area greater than or equal to the cross-sectional area of any of the sieve-side orifices. This reduces the risk that a large molecule present in the liquid will clog the spray-side orifices. Such a molecule could in certain applications theoretically be able to travel through a sieve-side orifice, for example if the orientation of the molecule was in a certain direction, in which the cross- sectional area is smaller, when reaching the sieve-side membrane.
According to one embodiment the number of sieve-side orifices is greater than the number of spray-side orifices. In this way, a lower pressure drop over the sieve-side membrane may be obtained. The higher pressure drop over the spray-side membrane is compensated by its increased mechanical strength obtained due to it having a much smaller active area than the active area of the sieve-side membrane. With active area is here meant the area of the respective membrane provided with spray-side orifices and sieve-side orifices. According to one embodiment an axial length, along the fluid communication axis, of the first cavity portion is equal to an axial length of the second cavity portion. The thickness of the walls provided by the second cavity portion(s) towards the spray-side membrane can hence have the same length dimension as the first cavity portion.
According to one embodiment the sieve-side orifices occupy a larger area on the sieve-side membrane than the spray-side orifices occupy on the spray- side membrane.
According to one embodiment the substrate comprises a first wafer provided with the first cavity portion and a second wafer provided with the second cavity portion, the first wafer and the second wafer being bonded to each other to form the substrate.
According to one embodiment the substrate is made of a semiconductor material. The semiconductor material may for example be silicon. According to one embodiment the sieve-side membrane and the spray-side membrane comprise one of a non-oxide ceramic, an oxide, silicon or metal. An example of a suitable non-oxide ceramic is silicone nitride.
According to one embodiment the substrate comprises a plurality of second cavity portions extending from the first cavity portion to the spray-side membrane, thereby providing fluid communication, along a respective fluid communication axis, between the sieve-side orifices and the spray-side orifices, the first cavity portion having a larger cross-sectional area than a cross-sectional area of any of the second cavity portions.
Each second cavity portion may hence be in fluid connection with a respective set of a plurality of spray-side orifices of the spray-side membrane.
By providing a substrate having a plurality of second cavity portions, more spray-side orifices may be provided in the spray-side membrane, and thus a higher throughput may be provided, while maintaining the higher mechanical strength of the spray-side membrane, provided by the smaller cross-sectional area of the second cavity portions.
According to one embodiment any cross-sectional area of any of the first cavity portions is larger than any cross-sectional area, with respect to the fluid communication axis, of the second cavity portion.
According to one example, the substrate may be provided with a plurality of second cavity portions and a plurality of first cavity portions. Each first cavity portion may be in fluid communication with only one second cavity portion. In this example, each first cavity portion is thus connected with a respective one of the second cavity portions. The number of fluid communication channels through the substrate, from the sieve-side orifices of the sieve-side membrane to spray-side orifices of the spray-side membrane can in this case be equal to the number of first cavity portions, which can be equal to the number of second cavity portions. According to one embodiment a total cross-sectional area of the second cavity portions with respect to the fluid communication axes is smaller than an area of the sieve-side membrane provided with the sieve-side orifices.
The sieve-side membrane does not require the same mechanical strength as the spray-side membrane does, because the forces acting on the sieve-side membrane are small relative to those acting on the spray-side membrane.
There is according to a second aspect of the present disclosure provided a medicament delivery device comprising a nozzle device according to the first aspect.
The nozzle device is the delivery member of the medicament delivery device. The medicament delivery device is configured such that medicament passes through the nozzle device during administration to thereby atomise the medicament, creating an aerosol.
According to one embodiment the medicament delivery device is an inhaler or an eye dispenser. There is according to a third aspect of the present disclosure provided a method of manufacturing a nozzle device for atomisation of a liquid, wherein the method comprises: a) providing a first wafer, c) providing a sieve-side membrane layer onto a first side of the first wafer, d) providing sieve-side orifices in the sieve-side membrane layer thereby obtaining a sieve-side membrane, e) providing a first cavity portion in the first wafer, extending to the sieve-side membrane, f) providing a second wafer, h) providing a spray- side membrane layer onto a first side of the second wafer, i) providing spray- side orifices in the spray-side membrane layer thereby obtaining a spray-side membrane, j) providing a second cavity portion in the second wafer, extending to the spray-side membrane, and k) bonding a second side of the first wafer with a second side of the second wafer thereby forming a substrate, with the sieve-side membrane forming a sieve-side of the nozzle device and the spray-side membrane forming a spray-side of the nozzle device, whereby the second cavity portion extends from the first cavity portion to the spray-side membrane, thereby providing fluid communication, along a fluid communication axis, between the sieve-side orifices and the spray-side orifices, the first cavity portion having a larger cross-sectional area than the cross-sectional area of the second cavity portion, the cross-section being with respect to the fluid communication axis.
The steps of the method may not necessarily have to be carried out in the order above. Steps f) to j) may for example be carried out prior to steps a) to e).
According to one embodiment steps d), e), i) and j) involves etching. According to one embodiment step j) involves providing a plurality of second cavity portions in the second wafer, each extending to the spray-side membrane.
Generally, all terms used in the claims are to be interpreted according to their ordinary meaning in the technical field, unless explicitly defined otherwise herein. All references to "a/an/the element, apparatus, component, means, etc. are to be interpreted openly as referring to at least one instance of the element, apparatus, component, means, etc., unless explicitly stated otherwise.
BRIEF DESCRIPTION OF THE DRAWINGS
The specific embodiments of the inventive concept will now be described, by way of example, with reference to the accompanying drawings, in which:
Fig. l is a perspective view of a schematic example of a nozzle device;
Fig. 2a is a section along lines A-A through the nozzle device in Fig. l;
Figs 2b and 2c are sections along lines B-B and C-C, respectively; Fig. 3 is a perspective view of another schematic example of a nozzle device;
Fig. 4 depicts a section through the nozzle device in Fig. 3 along lines D-D;
Fig. 5 is a perspective view of yet another schematic example of a nozzle device;
Fig. 6a depicts a section through the nozzle device in Fig. 5 along lines E-E; Fig. 6b depicts a section through the nozzle device in Fig. 5 along lines E-E, in a perspective view from a sieve-side of the nozzle device;
Fig. 7 is a flowchart of a method of manufacturing a nozzle device; and
Fig. 8 is schematic example of a longitudinal section of a medicament delivery device comprising a nozzle device. DETAILED DESCRIPTION
The inventive concept will now be described more fully hereinafter with reference to the accompanying drawings, in which exemplifying
embodiments are shown. The inventive concept may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided by way of example so that this disclosure will be thorough and complete, and will fully convey the scope of the inventive concept to those skilled in the art. Like numbers refer to like elements throughout the description.
Fig. l shows a first example of a nozzle device configured to atomise liquids. The nozzle device l-i comprises a substrate 3. The substrate 3 comprises a first wafer 3a and a second wafer 3b which have been bonded together, thus forming the substrate 3. The substrate 3 has a sieve-side 3c, or filter side, and a spray-side 3d arranged opposite to the sieve-side 3c.
Turning now to Fig. 2a, the exemplified nozzle device 1-1 will be described in more detail. The nozzle device 1-1 further comprises a sieve-side membrane 5 provided on the sieve-side 3c of the substrate 3. The nozzle device 1-1 also comprises a spray-side membrane 7 provided on the spray-side 3d of the substrate 3.
The sieve-side membrane 5 is provided with a plurality of sieve-side orifices 5a. The spray-side membrane 7 is provided with a plurality of spray-side orifices 7a. Each sieve-side orifice 5a has a cross-section, with respect to its axial extension, which is smaller or equal to a cross-section of any of the spray-side orifices 7a, with respect to the axial extension of the spray-side orifices 7a.
The substrate 3 has a first cavity portion 4a extending to the sieve-side membrane 5. The first cavity portion 4a extends to the sieve-side orifices 5a. The substrate 3 has a second cavity portion 4b extending from the first cavity portion 4a to the spray-side membrane 7. The second cavity portion 4b has a mouth 4c which opens into the first cavity portion 4a. The second cavity portion 4b extends from the first cavity portion 4a to the spray-side orifices 7a. The sieve-side membrane 5, and in particular the sieve-side orifices 5a, is hence in fluid communication with the spray-side membrane 7, in particular with the spray-side orifices 7a via the first cavity portion 4a and the second cavity portion 4b. This fluid communication is provided along a fluid communication axis 9 extending from the sieve-side membrane 5 to the spray-side membrane 7.
According to the example shown in Fig. 2a, the axial length li of the first cavity portion 4a, along the fluid communication axis 9, is equal to the axial length I2 of the second cavity portion 4b. The first wafer 3a and the second wafer 3b are hence equally thick. According to one variation, the thickness of the first wafer 3a and the second wafer 3b may differ.
In use, a liquid to be atomised first penetrates the sieve-side orifices 5a of the sieve-side membrane 5 thereby entering the first cavity portion 4a. Here, a small pressure drop is obtained. The liquid travels through the first cavity portion 4a and into the second cavity portion 4b and finally penetrates through the spray-side orifices 7a of the spray-side membrane 7. Jet streams are thus created, which due to Rayleigh instability break up into small droplets forming an aerosol. Fig. 2b shows a section of the nozzle device 1-1 along lines B-B. This section is a cross-section with respect to the fluid communication axis 9, and thus corresponds to a cut parallel to the main surface extensions of the sieve-side membrane 5a and the spray-side membrane 7a. The first cavity portion 4a can thus be seen in a section. The cross-sectional area 11 of the exemplified first cavity portion 4a is determined by the product of the dimensions di and d2.
Fig. 2c shows a section of the nozzle device 1-1 along lines C-C. This section is parallel with the section along lines B-B. Here, the second cavity portion 4b can be seen in a section. The cross-sectional area 13 of the exemplified second cavity portion 4b is essentially determined by the product of the dimensions d3 and d4.
The cross-sectional area 11 of the first cavity portion 4a is greater than the cross-sectional area 13 of the second cavity portion 4b. The cross-sectional communication axis 9. The cross-sectional area 13 of the second cavity portion 4b is constant along the fluid communication axis 9.
Fig. 3 shows a second example of a nozzle device configured to atomise a liquid. The nozzle device 1-2 is similar to the first example. The second example however includes a plurality of second cavity portions and a plurality of first cavity portions. Each such second cavity portion extends to the spray- side membrane 7 from a respective first cavity portion. Each pair of interconnected second cavity portion and first cavity portion provides fluid communication between spray-side orifices 7a of the spray-side membrane 7 and sieve-side orifices 5a of the sieve-side membrane 5.
Fig. 4 shows the fluid communication configuration between the spray-side membrane 7 and the sieve-side membrane 5. The substrate 3 comprises a plurality of first cavity portions 4a and a plurality of second cavity portions 4b. The number of first cavity portions 4a is equal to the number of second cavity portions 4b. Each pair of first cavity portion 4a and second cavity portion 4b defines a respective channel which provides fluid communication between sieve-side orifices 5a of the sieve-side membrane 5 and spray-side orifices 7a of the spray-side membrane 7. Each such channel has a respective fluid communication axis 9 extending from the sieve-side 3c to the spray-side 3d of the substrate 3.
The cross-sectional area, with respect to the fluid communication axis 9, of each first cavity portion 4a is greater than the cross-sectional area of the corresponding second cavity portion 4b.
Fig. 5 depicts a third example of a nozzle device. The nozzle device 1-3 is similar to the second example. The nozzle device 1-3 includes a plurality of second cavity portions and a plurality of first cavity portions. A plurality of second cavity portions extends to the spray-side membrane 7 from a single first cavity portion. The plurality of second cavity portions interconnected with a first cavity portion provides fluid communication between spray-side orifices 7a of the spray-side membrane 7 and sieve-side orifices 5a of the sieve-side membrane 5.
Fig. 6a illustrates a section along lines E-E. It can be seen that a plurality of second cavity portions 4b extend from the spray-side membrane 7 to one first cavity portion 4a-i and a plurality of second cavity portions 4b extend from the spray-side membrane 7 to another first cavity portion 4a-2. The two first cavity portions are in liquid isolation from each other. They are hence not in fluid communication. Each first cavity portion 4a extends to the sieve-side membrane 5. In this manner, fluid communication may be provided from the sieve-side 3c to the spray-side 3d. In particular, fluid communication is provided between sieve-side orifices 5a of the sieve-side membrane 5 and spray-side orifices 7a of the spray-side membrane 7.
Fig. 6b shows the configuration of the sieve-side orifices 5a, which are arranged in a pie-like manner, corresponding to the configuration of the spray-side orifices 7a shown in Fig. 6a.
In general, the layout or configuration of the sieve-side orifices may be essentially any suitable for the particular application. The layout or configuration of the spray-side orifices may be essentially any suitable for the particular configuration. It is however beneficial to provide second cavity portion(s) that extends parallel with the corresponding fluid communication axis along its/their entire extension. The same generally also applies to the first cavity portion(s).
An example of manufacturing a nozzle device 1-1, 1-2, 1-3 will now be described with reference to Fig. 7. It should be noted that the nozzle device 1- 1, 1-2, 1-3 may be manufactured according to a plurality of different processes.
In a step a) a first wafer 3a is provided. The first wafer 3a can be made of a semiconducting material. An example of a suitable semiconducting material is silicon. The first wafer 3a may be double side polished. In a step b) each of a first side and a second side opposite to the first side of the first wafer 3a is provided with a protective layer and/or an adhesive layer.
The protective layer may for example be silicon oxide. The protective layer may for example be deposited onto the first wafer 3a by means of thermal oxide deposition.
In a step c) a sieve-side membrane layer is provided onto the protective layer provided on the first side of the first wafer 3a. The sieve-side membrane layer may for example be deposited onto the protective layer by means of plasma- enhanced chemical vapour deposition. The sieve-side membrane layer may for example be silicon nitride.
In a step d) the sieve-side orifices 5a are provided in the sieve-side membrane layer thereby obtaining the sieve-side membrane 5. The sieve-side orifices 5a may for example be obtained using photolithography by providing a suitably patterned photoresist and etching the pattern of sieve-side orifices 5a into the sieve-side membrane layer using for instance reactive ion etching. Step d) may also involve removing of the photoresist after the patterning of the sieve- side membrane layer.
In a step e) the first cavity portion 4a is provided in the first wafer 3a, extending through the protective layer on the first side of the first wafer 3 a to the sieve-side membrane 5. In case of several first cavity portions 4a, each first cavity portion 4a is provided in this step.
Step e) may involve providing a photoresist onto the second side of the first wafer 3a with a pattern/through-hole to provide the first cavity portion. Using for example etching techniques to remove a portion of the first wafer 3a, for example deep reactive ion etching, the first cavity portion 4a or cavities 4a may be created. The photoresist is thereafter removed from the second side of the first wafer 3a. Part of the protective or adhesive layer, exposed by the pattern in the photoresist, is also removed from the second side during step e). The removal of this layer may for example be performed using reactive ion etching Finally, the protective layer may be removed from below the sieve-side membrane 5 using for example hydrogen fluoride etching. The remaining protective or adhesive layer still remaining after step e) is also removed from the second side. The removal of this layer may for example be performed using reactive ion etching.
In a step f) a second wafer 3b is provided. The second wafer 3b can be made of a semiconducting material. An example of a suitable semiconducting material is silicon. The second wafer 3b may be double side polished.
In a step g) each of a first side and a second side opposite to the first side of the second wafer 3b is provided with a protective layer and/or adhesive layer.
The protective layer may for example be silicon oxide. The protective layer may for example be deposited onto the second wafer 3b by means of thermal oxide deposition.
In a step h) a spray-side membrane layer is provided onto the protective layer provided on the first side of the second wafer 3b. The spray-side membrane layer may for example be deposited onto the protective layer by means of plasma-enhanced chemical vapour deposition. The spray-side membrane layer may for example be silicon nitride.
In a step i) the spray-side orifices 7a are provided in the spray-side membrane layer thereby obtaining the spray-side membrane 7. The spray- side orifices 7a may for example be obtained using photolithography by providing a suitably patterned photoresist and etching the pattern of spray- side orifices 7a into the spray-side membrane layer using for instance reactive ion etching. Step i) may also involve removing of the photoresist after the patterning of the spray-side membrane layer.
In a step j) the second cavity portion 4b is provided in the second wafer 3b, extending through the protective layer on the first side of the second wafer 3b to the spray-side membrane 7. In case of several second cavity portions 4b, each second cavity portion 4b is provided in this step. Step j) may involve providing a photoresist onto the second side of the second wafer 3b with a pattern to provide the second cavity portion(s). Using for example etching techniques to remove a portion of the second wafer 3b, for example deep reactive ion etching, the second cavity portion 4b or second cavity portions 4b may be created. The photoresist is thereafter removed from the second side of the second wafer 3b. Part of the protective or adhesive layer, exposed by the pattern in the photoresist, is also removed from the second side during step e). The removal of this layer may for example be performed using reactive ion etching. Finally, the protective layer may be removed from below the spray-side membrane 7 using for example hydrogen fluoride etching. The remaining protective or adhesive layer still remaining after step j) is also removed from the second side. The removal of this layer may for example be performed using reactive ion etching. In a step k) the second side of the first wafer 3a is bonded with the second side of the second wafer 3b thereby forming the substrate 3. The sieve-side membrane 5 forms a sieve-side and the spray-side membrane 7 forms a spray-side of the nozzle device 1-1, 1-2, 1-3.
The nozzle device 1-1, 1-2, 1-3 may for example be used in medical applications. For instance, the nozzle device 1-1, 1-2, 1-3 may be provided in a medicament delivery device such as an inhaler or an eye dispenser. Fig. 8 shows an example of a medicament delivery device 15 in a longitudinal section comprising a nozzle device 1-1, 1-2, 1-3 attached to a nozzle device holder. The inventive concept has mainly been described above with reference to a few examples. However, as is readily appreciated by a person skilled in the art, other embodiments than the ones disclosed above are equally possible within the scope of the inventive concept, as defined by the appended claims.

Claims

1. A nozzle device (l-i; 1-2; 1-3) for atomisation of a liquid, wherein the nozzle device (1-1; 1-2; 1-3) comprises: a substrate (3), a sieve-side membrane (5) comprising a plurality of sieve-side orifices
(5a), the sieve-side membrane (5) being provided on a sieve-side (3c) of the substrate (3), a spray-side membrane (7) comprising a plurality of spray-side orifices (7a), the spray-side membrane (7) being provided on a spray-side (3d) of the substrate (3), wherein the substrate (3) has a first cavity portion (4a) extending to the sieve-side membrane (5), and a second cavity portion (4b) extending from the first cavity portion (4a) to the spray-side membrane (7), thereby providing fluid communication, along a fluid communication axis (9), between the sieve-side orifices (5a) and the spray-side orifices (7a), the first cavity portion (4a) having a larger cross-sectional area (11) than a cross- sectional area (13) of the second cavity portion (4b), the cross-sections being with respect to the fluid communication axis (9).
2. The nozzle device (1-1; 1-2; 1-3) as claimed in claim 1, wherein any cross-sectional area of the first cavity portion (4a) is larger than any cross- sectional area of the second cavity portion (4b).
3. The nozzle device (1-1; 1-2; 1-3) as claimed in claim 1 or 2, wherein each spray-side orifice (7a) has a cross-sectional area greater than or equal to the cross-sectional area of any of the sieve-side orifices (5a).
4. The nozzle device (1-1; 1-2; 1-3) as claimed in any of the preceding claims, wherein the number of sieve-side orifices (5a) is greater than the number of spray-side orifices (7a).
5. The nozzle device (1-1; 1-2; 1-3) as claimed in any of the preceding claims, wherein the sieve-side orifices (5a) occupy a larger area on the sieve- side membrane (5) than the spray-side orifices (7a) occupy on the spray-side membrane (7).
6. The nozzle device (1-1; 1-2; 1-3) as claimed in any of the preceding claims, wherein the substrate (3) comprises a first wafer (3a) provided with the first cavity portion (4a) and a second wafer (3b) provided with the second cavity portion (4b), the first wafer (3a) and the second wafer (3b) being bonded to each other to form the substrate (3).
7. The nozzle device (1-1; 1-2; 1-3) as claimed in any of the preceding claims, wherein the substrate (3) is made of a semiconductor material.
8. The nozzle device (1-1; 1-2; 1-3) as claimed in any of the preceding claims, wherein the sieve-side membrane (5) and the spray-side membrane (7) comprise one of a non-oxide ceramic, an oxide, silicon or metal.
9. The nozzle device (1-1; 1-3) as claimed in any of the preceding claims, wherein the substrate (3) comprises a plurality of second cavity portions (4b) extending from the first cavity portion (4a) to the spray-side membrane (7), thereby providing fluid communication, along a respective fluid
communication axis (9), between the sieve-side orifices (5a) and the spray- side orifices (7a), the first cavity portion (4a) having a larger cross-sectional area than a cross-sectional area of any of the second cavity portions (4b).
10. The nozzle device (1-1; 1-3) as claimed in claim 9, wherein a total cross- sectional area of the second cavity portions (4b) with respect to the fluid communication axes (9) is smaller than an area of the sieve-side membrane (5) provided with the sieve-side orifices (5a).
11. A medicament delivery device (15) comprising a nozzle device (1-1; 1-2; 1-3) as claimed in any of claims 1-10.
12. The medicament delivery device (15) as claimed in claim 11, wherein the medicament delivery device (15) is an inhaler or an eye dispenser.
13. A method of manufacturing a nozzle device (1-1; 1-2; 1-3) for atomisation of a liquid, wherein the method comprises: a) providing a first wafer (3a), c) providing a sieve-side membrane layer onto a first side of the first wafer (3a), d) providing sieve-side orifices (5a) in the sieve-side membrane layer thereby obtaining a sieve-side membrane (5), e) providing a first cavity portion (4a) in the first wafer (3a), extending to the sieve-side membrane (5), f) providing a second wafer (3b), h) providing a spray-side membrane layer onto a first side of the second wafer (3b), i) providing spray-side orifices (7a) in the spray-side membrane layer thereby obtaining a spray-side membrane (7), j) providing a second cavity portion (4b) in the second wafer (3b), extending to the spray-side membrane (7), and k) bonding a second side of the first wafer (3a) with a second side of the second wafer (3b) thereby forming a substrate (3), with the sieve-side membrane (5) forming a sieve-side of the nozzle device (1-1; 1-2; 1-3) and the spray-side membrane (7) forming a spray-side of the nozzle device (1-1; 1-2; 1-3), whereby the second cavity portion (4b) extends from the first cavity portion (4a) to the spray-side membrane (7), thereby providing fluid communication, along a fluid communication axis (9), between the sieve-side orifices (5a) and the spray-side orifices (7a), the first cavity portion (4a) having a larger cross-sectional area (11) than the cross-sectional area (13) of the second cavity portion (4b), the cross-section being with respect to the fluid communication axis (9).
14. The method as claimed in claim 13, wherein steps d), e), i) and j) involves etching.
15. The method as claimed in claim 13 or 14, wherein step j) involves providing a plurality of second cavity portions (4b) in the second wafer (3b), each extending to the spray-side membrane (7).
PCT/EP2018/063769 2017-05-31 2018-05-25 Nozzle device and a method of manufacturing the same WO2018219798A1 (en)

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CN201880031702.2A CN110621411B (en) 2017-05-31 2018-05-25 Nozzle device and method for manufacturing the same
KR1020197035298A KR102366748B1 (en) 2017-05-31 2018-05-25 Nozzle device and manufacturing method thereof
US16/616,359 US11383251B2 (en) 2017-05-31 2018-05-25 Nozzle device and a method of manufacturing the same

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US20200094268A1 (en) 2020-03-26
EP3630365B1 (en) 2021-06-23
TW201902523A (en) 2019-01-16
US11383251B2 (en) 2022-07-12
EP3630365A1 (en) 2020-04-08
CN110621411A (en) 2019-12-27
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JP2020521633A (en) 2020-07-27
KR102366748B1 (en) 2022-02-23

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