WO2018097150A1 - Epoxy compound production method - Google Patents

Epoxy compound production method Download PDF

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WO2018097150A1
WO2018097150A1 PCT/JP2017/041914 JP2017041914W WO2018097150A1 WO 2018097150 A1 WO2018097150 A1 WO 2018097150A1 JP 2017041914 W JP2017041914 W JP 2017041914W WO 2018097150 A1 WO2018097150 A1 WO 2018097150A1
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group
compound
production method
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cyclopentene
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英良 土屋
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帝人ファーマ株式会社
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J31/00Catalysts comprising hydrides, coordination complexes or organic compounds
    • B01J31/02Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D301/00Preparation of oxiranes
    • C07D301/02Synthesis of the oxirane ring
    • C07D301/03Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
    • C07D301/12Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with hydrogen peroxide or inorganic peroxides or peracids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/38Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D303/40Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals

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  • the present invention relates to a method for stereoselectively epoxidizing a double bond of a mono-substituted 3-cyclopentene compound at the 1-position.
  • metachloroperbenzoic acid is known as an epoxidizing agent for olefins, but epoxidation of mono-substituted 3-cyclopentene compounds is not highly stereoselective.
  • mCPBA metachloroperbenzoic acid
  • the ratio is 3: 1 (Non-Patent Document 1)
  • the ratio is 3: 2 (Non-Patent Document 2).
  • the ratio is 8: 1.
  • Non-patent Document 3 Although the stereoselectivity is improved (Non-patent Document 3), in addition to using an expensive silyl compound, the molecular weight of the substrate increases. This increases the amount of waste and is not suitable for an industrial manufacturing method from the viewpoint of process conversion efficiency (Atom Economy).
  • Patent Document 1 a method for epoxidizing a cyclohexene compound using hydrogen peroxide as an oxidizing agent in the presence of a quaternary ammonium hydrogen sulfate salt, a phosphoric acid compound or a phosphonic acid compound, and a Group 6 metal compound is known (Patent Document 1). ).
  • this reaction is a multifunctional substrate in which the steric pathway to the olefin plane of the oxidant is controlled by replacing the two positions at positions 1 and 2 of the cyclohexene ring of the reaction substrate with an allyl ester group in the syn configuration. (Details will be described later).
  • An object of the present invention is to provide a method for producing a corresponding epoxy compound from a mono-substituted 3-cyclopentene compound with high anti / syn stereoselectivity.
  • phase transfer catalyst for example, a quaternary ammonium salt, a phosphoric acid compound and / or a phosphonic acid compound, and a Group 6 metal compound are used as a catalyst, and the 1-position is mono-substituted with a specific substituent. It was found that by reacting the 3-cyclopentene compound with hydrogen peroxide, the corresponding epoxy compound can be produced stereoselectively in a high yield.
  • the inventors of the present invention have continued research based on such knowledge and have completed the present invention.
  • the present invention includes a step of reacting a compound represented by the formula (1) by adding a phosphoric acid compound and / or a phosphonic acid compound, a Group 6 metal compound, a phase transfer catalyst, and hydrogen peroxide, and reacting them. It is a manufacturing method of the compound represented by 2).
  • R in the formula (1) and the formula (2) is a C 1 -C 6 alkoxy group which may be substituted with 1 to 2 (phenyl group and / or halogen atom), 1 to 2 C 1 ⁇ C 4 alkyl optionally benzyloxy group optionally substituted with a group, one to two (phenyl group and / or halogen atom) with optionally substituted C 1 to C 6 alkyl group or 1, Represents a phenyl group which may be substituted by ⁇ 2 C 1 -C 4 alkyl groups;
  • a corresponding epoxy compound can be produced with high anti / syn stereoselectivity and high yield from the reaction of 3-cyclopentene compound monosubstituted with a specific substituent at the 1-position with hydrogen peroxide. .
  • the cyclohexene ring is on the left side of the figure.
  • the cyclopentene ring is on the right side of the figure.
  • the compound represented by the above formula (1) is oxidized using hydrogen peroxide in the presence of a phosphoric acid compound and / or a phosphonic acid compound, a group 6 metal compound, and a phase transfer catalyst, and the above formula (2).
  • This is a method for producing a compound represented by
  • R is a C 1 -C 6 alkoxy group which may be substituted with 1 to 2 (phenyl group and / or halogen atom), 1 to two C 1 ⁇ C 4 alkyl group which may be substituted benzyloxy group, 1-2 (phenyl group and / or a halogen atom) alkyl ⁇ C 6 optionally C 1 optionally substituted with Or a phenyl group optionally substituted by 1 to 2 C 1 -C 4 alkyl groups.
  • R is preferably a C 1 -C 6 alkoxy group, a benzyloxy group, a C 1 -C 6 alkyl group, or a phenyl group, and particularly preferably a C 1 -C 6 alkoxy group.
  • the hydrogen peroxide source in the production method of the present invention for example, urea-hydrogen peroxide and hydrogen peroxide water are used.
  • hydrogen peroxide water is inexpensive and non-corrosive, and the by-product after the reaction is water. Therefore, the environmental load is small and it is excellent for industrial use.
  • the concentration thereof is not limited, but is generally selected from the range of 1 to 80%, preferably 20 to 80%.
  • the amount of hydrogen peroxide used at that time is not limited, but it is generally selected from the range of 0.8 to 3.0 equivalents, preferably 1.0 to 2.0 equivalents, relative to the olefins.
  • phase transfer catalyst used in the production method of the present invention a quaternary ammonium salt is suitable.
  • Such quaternary ammonium salts include, for example, methyltri n-octylammonium chloride, tetra n-butylammonium chloride, tetra n-butylammonium bromide, tetra n-butylammonium hydroxide, tetra n-hexylammonium hydrogen sulfate, tetrahydrogen hydrogen sulfate.
  • n-Octylammonium hydrogen, methyltri-n-octylammonium hydrogensulfate, tetra-n-butylammonium hydrogensulfate, and ethyltri-n-octylammonium hydrogensulfate are preferred, for example, tetra-n-butylammonium hydrogensulfate and methyltri-n-octylammonium hydrogensulfate
  • a quaternary ammonium hydrogen sulfate salt such as These quaternary ammonium salts may be used alone or in combination of two or more. The amount used is generally selected from the range of 0.0001 to 10 mol%, preferably 0.01 to 5 mol%, based on the olefins of the substrate.
  • molybdenum or tungsten is preferable.
  • the molybdenum compound used in the production method of the present invention is a compound that generates molybdate anions in water.
  • molybdic acid molybdenum oxide, molybdenum sulfide, molybdenum chloride, phosphomolybdic acid, molybdic acid Ammonium, potassium molybdate, and sodium molybdate.
  • the tungsten compound used in the production method of the present invention is a compound that generates a tungstate anion in water.
  • tungstic acid tungsten oxide, tungsten sulfide, tungsten chloride, phosphotungstic acid, tungstic acid Ammonium, potassium tungstate (including hydrate), and sodium tungstate (including hydrate).
  • molybdic acid, molybdenum oxide, phosphomolybdic acid, molybdate, tungstic acid, tungsten oxide, phosphotungstic acid, and tungstate are preferable.
  • molybdate and tungstate are preferable, and tungstate is more preferable, and sodium tungstate is particularly preferable, but sodium tungstate dihydrate is most preferable.
  • These group 6 metal compounds may be used alone or in combination of two or more.
  • the amount used is generally selected from the range of 0.0001 to 20 mol%, preferably 0.01 to 20 mol%, based on the olefins of the substrate.
  • a phosphoric acid compound and / or a phosphonic acid compound as a cocatalyst in order to improve the catalytic activity.
  • Such phosphoric acid compounds and / or phosphonic acid compounds include phosphoric acid, polyphosphoric acid, pyrophosphoric acid, ⁇ -aminomethylphosphonic acid, ⁇ -aminoethylphosphonic acid, nitrilotris (methylenephosphonic acid), phenylphosphonic acid, and these Sodium salts and potassium salts are mentioned, among which phosphoric acid and phenylphosphonic acid are preferable.
  • the amount of the phosphoric acid compound and / or phosphonic acid compound used is generally selected from the range of 0.0001 to 20 mol%, preferably 0.01 to 20 mol%, based on the olefins of the substrate.
  • sulfates such as sodium sulfate, sodium sulfate decahydrate, lithium sulfate, potassium sulfate, ammonium sulfate, or magnesium sulfate may be used as the additive, such an additive is the stereoselective object of the present invention. There is no particular influence on the properties, and forms without using such additives are also included in the embodiments of the present invention.
  • the solvent used in the production method of the present invention is not particularly limited, and examples thereof include toluene, xylene, chloroform, dichloromethane, 1,2-dichloroethane, acetonitrile, hexane, and heptane.
  • a mixture of these solvents and water can be used, and the reaction can be performed without using a solvent, but a reaction without using a solvent is particularly preferable.
  • the epoxidation reaction is usually performed in the range of 20 to 100 ° C, preferably in the range of 20 to 70 ° C.
  • the range of 40 to 60 ° C. is preferable.
  • Example 1 of Patent Document 1 shows the most stable conformation of the compound (1) which is the starting material described in Example 1 of Patent Document 1 by molecular mechanics calculation.
  • the configuration of the two allyl ester groups in this compound is not specified, the two allyl groups in compound (1) are determined from the three-dimensional structure of product (2) and compound (3). It is clear that the steric configuration of the ester group was a syn configuration.
  • the most stable conformation of compound (1) has two of the same energy level (potential energy: both 23.353 kcal / mol).
  • potential energy both 23.353 kcal / mol.
  • one of the substituents at the 1,2-position of the cyclohexene ring is always in the axial position, and the side on which the substituent exists is present with respect to the ring surface containing the double bond of the cyclohexene ring. Will be crowded in three dimensions. Therefore, it is strongly suggested that the oxidizing agent as an epoxidizing agent is selectively approached from the surface opposite to the substituent, and therefore high anti / syn stereoselectivity can be expected.
  • FIG. 2 shows the most stable conformation of ethyl 3-cyclopentene-1-carboxylate used in Example 1 as an example of the starting material in the present invention by molecular mechanics calculation under the same conditions (potential energy: -31.69 kcal / mol). Since the ethyl ester group, which is the 1-position substituent, is located in parallel with the cyclopentene ring, it strongly suggests that there is almost no steric difference on either side of the ring surface containing the double bond of the cyclopentene ring. Is done.
  • ethyl 3-cyclopentene-1-carboxylate (10.00 g, 71.34 mmol), sodium molybdate dihydrate (174 mg, 0.72 mmol), phenylphosphonic acid (57 mg, 0.36 mmol) ), And tetra n-butylammonium hydrogen sulfate (242 mg, 0.71 mmol).
  • 30% aqueous hydrogen peroxide (9.48 mL, 92.79 mmol) was added over 2.5 hours.
  • isopropyl acetate (30 mL) was added and the aqueous layer was removed.
  • ethyl 3-cyclopentene-1-carboxylate (10.00 g, 71.34 mmol), sodium tungstate dihydrate (471 mg, 1.43 mmol), phosphoric acid (content 85%, 82 mg, 0.71 mmol), methyltri-n-octylammonium hydrogensulfate (665 mg, 1.43 mmol), and sodium sulfate (3.04 g, 21.40 mmol) were added, and 30% aqueous hydrogen peroxide (9.48 mL, 92.79 mmol) was added. Was added at room temperature over 2 hours. After stirring at 20-30 ° C.
  • the method for producing an epoxy compound of the present invention is used, for example, in the chemical industry including the pharmaceutical manufacturing industry.

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  • Organic Chemistry (AREA)
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Abstract

With a step in which a phosphoric acid compound and/or a phosphonic acid compound, a group 6 metal compound, a phase transfer catalyst, and hydrogen peroxide are added to and reacted with 3-cyclopentene in which the 1-position is substituted by a C1-C6 alkoxycarbonyl group, a benzyloxycarbonyl group, a C1-C6 alkylcarbonyl group, a benzyloxycarbonyl group, a C1-C6 alkyl group or a benzoyl group (these substituents may be further substituted by specific substituents), this production method produces a corresponding epoxy compound. From a 3-cyclopentene in which the 1-position is monosubstituted with a specific substituent, a corresponding epoxy compound with high stereoselectivity can be produced.

Description

エポキシ化合物の製造方法Method for producing epoxy compound
 本発明は、1位モノ置換3-シクロペンテン化合物の2重結合を立体選択的にエポキシ化する方法に関する。 The present invention relates to a method for stereoselectively epoxidizing a double bond of a mono-substituted 3-cyclopentene compound at the 1-position.
 従来、1位モノ置換3-シクロペンテン化合物のエポキシ化は立体選択性が低く、工業的製造方法として課題があった。 Conventionally, epoxidation of 1-position mono-substituted 3-cyclopentene compounds has low stereoselectivity and has been a problem as an industrial production method.
 具体的には、オレフィン類のエポキシ化剤としてメタクロロ過安息香酸(mCPBA)が知られているが、1位モノ置換3-シクロペンテン化合物のエポキシ化は立体選択性が高くない。例えば1位の置換基がメチルエステル基の場合は3:1であり(非特許文献1)、ベンジルオキシメチル基の場合は3:2(非特許文献2)である。また、tert-ブチルジメチルシリルオキシメチル基の場合は8:1であり、立体選択性は向上するものの(非特許文献3)、高価なシリル化合物を使用することに加え、基質の分子量が増大することで廃棄物量が増え、プロセスの変換効率(アトムエコノミー)の観点でも工業的製造方法には適さない。 Specifically, metachloroperbenzoic acid (mCPBA) is known as an epoxidizing agent for olefins, but epoxidation of mono-substituted 3-cyclopentene compounds is not highly stereoselective. For example, when the substituent at the 1-position is a methyl ester group, the ratio is 3: 1 (Non-Patent Document 1), and when the substituent is a benzyloxymethyl group, the ratio is 3: 2 (Non-Patent Document 2). In the case of a tert-butyldimethylsilyloxymethyl group, the ratio is 8: 1. Although the stereoselectivity is improved (Non-patent Document 3), in addition to using an expensive silyl compound, the molecular weight of the substrate increases. This increases the amount of waste and is not suitable for an industrial manufacturing method from the viewpoint of process conversion efficiency (Atom Economy).
 また、硫酸水素4級アンモニウム塩、リン酸化合物もしくはホスホン酸化合物、および6属金属化合物の存在下、過酸化水素水を酸化剤としたシクロヘキセン化合物のエポキシ化法が知られている(特許文献1)。しかし、この反応は反応基質のシクロヘキセン環の1,2位の2か所がアリルエステル基によりsyn配置で置換されていることで酸化剤のオレフィン平面への立体経路が制御された多官能性基質のエポキシ化である(詳細は後述する)。 In addition, a method for epoxidizing a cyclohexene compound using hydrogen peroxide as an oxidizing agent in the presence of a quaternary ammonium hydrogen sulfate salt, a phosphoric acid compound or a phosphonic acid compound, and a Group 6 metal compound is known (Patent Document 1). ). However, this reaction is a multifunctional substrate in which the steric pathway to the olefin plane of the oxidant is controlled by replacing the two positions at positions 1 and 2 of the cyclohexene ring of the reaction substrate with an allyl ester group in the syn configuration. (Details will be described later).
 これに対し、モノ置換シクロペンテン環の立体選択性の高いエポキシ化反応は知られていない。 On the other hand, epoxidation reaction with high stereoselectivity of mono-substituted cyclopentene ring is not known.
特開2008-94741号公報JP 2008-94741 A
 本発明の課題は、1位モノ置換3-シクロペンテン化合物から、高いanti/synの立体選択性をもって、対応するエポキシ化合物を製造する方法を提供することである。 An object of the present invention is to provide a method for producing a corresponding epoxy compound from a mono-substituted 3-cyclopentene compound with high anti / syn stereoselectivity.
 本発明者らが鋭意研究した結果、相間移動触媒として例えば4級アンモニウム塩、リン酸化合物および/またはホスホン酸化合物、ならびに6族金属化合物を触媒に用いて1位が特定の置換基でモノ置換された3-シクロペンテン化合物と過酸化水素の反応を行うと、対応するエポキシ化合物を高収率で立体選択的に製造できることを見出した。本発明者らは、かかる知見に基づいて研究を続け、本発明を完成するに至った。 As a result of intensive studies by the present inventors, as a phase transfer catalyst, for example, a quaternary ammonium salt, a phosphoric acid compound and / or a phosphonic acid compound, and a Group 6 metal compound are used as a catalyst, and the 1-position is mono-substituted with a specific substituent. It was found that by reacting the 3-cyclopentene compound with hydrogen peroxide, the corresponding epoxy compound can be produced stereoselectively in a high yield. The inventors of the present invention have continued research based on such knowledge and have completed the present invention.
 すなわち本発明は、式(1)で表される化合物に、リン酸化合物および/またはホスホン酸化合物、6属金属化合物、相間移動触媒、ならびに過酸化水素を加えて反応させる工程を含む、式(2)で表される化合物の製造方法である。 That is, the present invention includes a step of reacting a compound represented by the formula (1) by adding a phosphoric acid compound and / or a phosphonic acid compound, a Group 6 metal compound, a phase transfer catalyst, and hydrogen peroxide, and reacting them. It is a manufacturing method of the compound represented by 2).
Figure JPOXMLDOC01-appb-C000003
                  
Figure JPOXMLDOC01-appb-C000003
                  
 ここで、式(1)および式(2)におけるRは1~2個の(フェニル基および/もしくはハロゲン原子)で置換されていてもよいC~Cのアルコキシ基、1~2個のC~Cアルキル基で置換されていてもよいベンジルオキシ基、1~2個の(フェニル基および/もしくはハロゲン原子)で置換されていてもよいC~Cのアルキル基、または1~2個のC~Cアルキル基で置換されていてもよいフェニル基を表す。 Here, R in the formula (1) and the formula (2) is a C 1 -C 6 alkoxy group which may be substituted with 1 to 2 (phenyl group and / or halogen atom), 1 to 2 C 1 ~ C 4 alkyl optionally benzyloxy group optionally substituted with a group, one to two (phenyl group and / or halogen atom) with optionally substituted C 1 to C 6 alkyl group or 1, Represents a phenyl group which may be substituted by ˜2 C 1 -C 4 alkyl groups;
 本発明によれば、1位が特定の置換基でモノ置換された3-シクロペンテン化合物と過酸化水素との反応から高いanti/synの立体選択性および高収率をもって対応するエポキシ化合物を製造できる。 According to the present invention, a corresponding epoxy compound can be produced with high anti / syn stereoselectivity and high yield from the reaction of 3-cyclopentene compound monosubstituted with a specific substituent at the 1-position with hydrogen peroxide. .
(1R,2S)-4-シクロヘキセン-1,2-ジカルボン酸ジアリルの最安定コンホメーションの分子力学計算結果を表示した図。シクロヘキセン環は図の左方。The figure which displayed the molecular dynamics calculation result of the most stable conformation of (1R, 2S) -4-cyclohexene-1,2-dicarboxylate diallyl. The cyclohexene ring is on the left side of the figure. 3-シクロペンテン-1-カルボン酸エチルの最安定コンホメーションの分子力学計算結果を表示した図。シクロペンテン環は図の右方。The figure which displayed the molecular dynamics calculation result of the most stable conformation of ethyl 3-cyclopentene-1-carboxylate. The cyclopentene ring is on the right side of the figure.
 本発明はリン酸化合物および/またはホスホン酸化合物、6属金属化合物、ならびに相間移動触媒の存在下、過酸化水素を用いて前記式(1)で表される化合物を酸化して前記式(2)で表される化合物を製造する方法である。 In the present invention, the compound represented by the above formula (1) is oxidized using hydrogen peroxide in the presence of a phosphoric acid compound and / or a phosphonic acid compound, a group 6 metal compound, and a phase transfer catalyst, and the above formula (2). This is a method for producing a compound represented by
 ここで、前記式(1)および前記式(2)において、Rは1~2個の(フェニル基および/もしくはハロゲン原子)で置換されていてもよいC~Cのアルコキシ基、1~2個のC~Cアルキル基で置換されていてもよいベンジルオキシ基、1~2個の(フェニル基および/もしくはハロゲン原子)で置換されていてもよいC~Cのアルキル基、または1~2個のC~Cアルキル基で置換されていてもよいフェニル基を表す。なかでもRとしては、C~Cのアルコキシ基、ベンジルオキシ基、C~Cのアルキル基、およびフェニル基が好ましく、C~Cのアルコキシ基が特に好ましい。 In the formula (1) and the formula (2), R is a C 1 -C 6 alkoxy group which may be substituted with 1 to 2 (phenyl group and / or halogen atom), 1 to two C 1 ~ C 4 alkyl group which may be substituted benzyloxy group, 1-2 (phenyl group and / or a halogen atom) alkyl ~ C 6 optionally C 1 optionally substituted with Or a phenyl group optionally substituted by 1 to 2 C 1 -C 4 alkyl groups. Among these, R is preferably a C 1 -C 6 alkoxy group, a benzyloxy group, a C 1 -C 6 alkyl group, or a phenyl group, and particularly preferably a C 1 -C 6 alkoxy group.
 本発明の製造方法における過酸化水素源としては、例えば尿素-過酸化水素、過酸化水素水が用いられるが、なかでも過酸化水素水は安価で腐食性がなく、反応後の副生物は水であるため環境負荷が小さく、工業的に利用するには優れている。 As the hydrogen peroxide source in the production method of the present invention, for example, urea-hydrogen peroxide and hydrogen peroxide water are used. Of these, hydrogen peroxide water is inexpensive and non-corrosive, and the by-product after the reaction is water. Therefore, the environmental load is small and it is excellent for industrial use.
 本発明の製造方法において過酸化水素水を用いる場合、その濃度に制限はないが、一般的には1~80%、好ましくは20~80%の範囲から選ばれる。 When hydrogen peroxide is used in the production method of the present invention, the concentration thereof is not limited, but is generally selected from the range of 1 to 80%, preferably 20 to 80%.
 その際の過酸化水素水の使用量に制限はないが、一般的にはオレフィン類に対して0.8~3.0当量、好ましくは1.0~2.0当量の範囲から選ばれる。 The amount of hydrogen peroxide used at that time is not limited, but it is generally selected from the range of 0.8 to 3.0 equivalents, preferably 1.0 to 2.0 equivalents, relative to the olefins.
 本発明の製造方法で用いられる相間移動触媒としては、4級アンモニウム塩が好適である。 As the phase transfer catalyst used in the production method of the present invention, a quaternary ammonium salt is suitable.
 かかる4級アンモニウム塩としては、例えばメチルトリn-オクチルアンモニウムクロリド、テトラn-ブチルアンモニウムクロリド、テトラn-ブチルアンモニウムブロミド、テトラn-ブチルアンモニウムヒドロキシド、硫酸水素テトラn-へキシルアンモニウム、硫酸水素テトラn-オクチルアンモニウム、硫酸水素メチルトリn-オクチルアンモニウム、硫酸水素テトラn-ブチルアンモニウム、および硫酸水素エチルトリn-オクチルアンモニウムが好ましく、なかでも例えば硫酸水素テトラn-ブチルアンモニウムおよび硫酸水素メチルトリn-オクチルアンモニウムのような硫酸水素4級アンモニウム塩が好ましい。これら4級アンモニウム塩は単独で使用しても、二種以上を混合使用してもよい。その使用量は、一般的には基質のオレフィン類に対して0.0001~10モル%、好ましくは0.01~5モル%の範囲から選ばれる。 Such quaternary ammonium salts include, for example, methyltri n-octylammonium chloride, tetra n-butylammonium chloride, tetra n-butylammonium bromide, tetra n-butylammonium hydroxide, tetra n-hexylammonium hydrogen sulfate, tetrahydrogen hydrogen sulfate. n-Octylammonium hydrogen, methyltri-n-octylammonium hydrogensulfate, tetra-n-butylammonium hydrogensulfate, and ethyltri-n-octylammonium hydrogensulfate are preferred, for example, tetra-n-butylammonium hydrogensulfate and methyltri-n-octylammonium hydrogensulfate A quaternary ammonium hydrogen sulfate salt such as These quaternary ammonium salts may be used alone or in combination of two or more. The amount used is generally selected from the range of 0.0001 to 10 mol%, preferably 0.01 to 5 mol%, based on the olefins of the substrate.
 本発明の製造方法で用いられる6族金属化合物における6族金属としては、モリブデンやタングステンが好ましい。 As the group 6 metal in the group 6 metal compound used in the production method of the present invention, molybdenum or tungsten is preferable.
 6族金属がモリブデンの場合、本発明の製造方法で用いられるモリブデン化合物は水中でモリブデン酸アニオンを生成する化合物であり、例えばモリブデン酸、酸化モリブデン、硫化モリブデン、塩化モリブデン、リンモリブデン酸、モリブデン酸アンモニウム、モリブデン酸カリウム、およびモリブデン酸ナトリウムが挙げられる。 When the Group 6 metal is molybdenum, the molybdenum compound used in the production method of the present invention is a compound that generates molybdate anions in water. For example, molybdic acid, molybdenum oxide, molybdenum sulfide, molybdenum chloride, phosphomolybdic acid, molybdic acid Ammonium, potassium molybdate, and sodium molybdate.
 6族金属がタングステンの場合、本発明の製造方法で用いられるタングステン化合物は水中でタングステン酸アニオンを生成する化合物であり、例えばタングステン酸、酸化タングステン、硫化タングステン、塩化タングステン、リンタングステン酸、タングステン酸アンモニウム、タングステン酸カリウム(水和物を含む)、およびタングステン酸ナトリウム(水和物を含む)が挙げられる。 When the Group 6 metal is tungsten, the tungsten compound used in the production method of the present invention is a compound that generates a tungstate anion in water. For example, tungstic acid, tungsten oxide, tungsten sulfide, tungsten chloride, phosphotungstic acid, tungstic acid Ammonium, potassium tungstate (including hydrate), and sodium tungstate (including hydrate).
 本発明で用いる6族金属化合物としてはモリブデン酸、酸化モリブデン、リンモリブデン酸、モリブデン酸塩、タングステン酸、酸化タングステン、リンタングステン酸、およびタングステン酸塩が好ましい。なかでもモリブデン酸塩およびタングステン酸塩が好ましく、これらのなかではタングステン酸塩がより好ましく、特にタングステン酸ナトリウムが好ましいが、タングステン酸ナトリウム二水和物が最も好ましい。 As the Group 6 metal compound used in the present invention, molybdic acid, molybdenum oxide, phosphomolybdic acid, molybdate, tungstic acid, tungsten oxide, phosphotungstic acid, and tungstate are preferable. Of these, molybdate and tungstate are preferable, and tungstate is more preferable, and sodium tungstate is particularly preferable, but sodium tungstate dihydrate is most preferable.
 これら6族金属化合物は単独で使用しても、2種以上を混合使用してもよい。その使用量は、基質のオレフィン類に対して一般的には0.0001~20モル%、好ましくは0.01~20モル%の範囲から選ばれる。 These group 6 metal compounds may be used alone or in combination of two or more. The amount used is generally selected from the range of 0.0001 to 20 mol%, preferably 0.01 to 20 mol%, based on the olefins of the substrate.
 本発明の製造方法において、助触媒としてリン酸化合物および/またはホスホン酸化合物を用いることは、触媒活性を向上させるために必要である。かかるリン酸化合物および/またはホスホン酸化合物としては、リン酸、ポリリン酸、ピロリン酸、α-アミノメチルホスホン酸、α-アミノエチルホスホン酸、ニトリロトリス(メチレンホスホン酸)、フェニルホスホン酸、ならびにこれらのナトリウム塩およびカリウム塩が挙げられるが、なかでもリン酸およびフェニルホスホン酸が好ましい。リン酸化合物および/またはホスホン酸化合物の使用量は、基質のオレフィン類に対して一般的には0.0001~20モル%、好ましくは0.01~20モル%の範囲から選ばれる。 In the production method of the present invention, it is necessary to use a phosphoric acid compound and / or a phosphonic acid compound as a cocatalyst in order to improve the catalytic activity. Such phosphoric acid compounds and / or phosphonic acid compounds include phosphoric acid, polyphosphoric acid, pyrophosphoric acid, α-aminomethylphosphonic acid, α-aminoethylphosphonic acid, nitrilotris (methylenephosphonic acid), phenylphosphonic acid, and these Sodium salts and potassium salts are mentioned, among which phosphoric acid and phenylphosphonic acid are preferable. The amount of the phosphoric acid compound and / or phosphonic acid compound used is generally selected from the range of 0.0001 to 20 mol%, preferably 0.01 to 20 mol%, based on the olefins of the substrate.
 なお、添加剤として硫酸ナトリウム、硫酸ナトリウム十水和物、硫酸リチウム、硫酸カリウム、硫酸アンモニウム、または硫酸マグネシウムなどの硫酸塩を使用してもよいが、こうした添加剤が本発明の目的である立体選択性に特に影響することはなく、かかる添加剤を用いない形態も本発明の実施形態に含まれる。 In addition, although sulfates such as sodium sulfate, sodium sulfate decahydrate, lithium sulfate, potassium sulfate, ammonium sulfate, or magnesium sulfate may be used as the additive, such an additive is the stereoselective object of the present invention. There is no particular influence on the properties, and forms without using such additives are also included in the embodiments of the present invention.
 本発明の製造方法において使用する溶媒は特に限定されないが、例えばトルエン、キシレン、クロロホルム、ジクロロメタン、1,2-ジクロロエタン、アセトニトリル、ヘキサン、およびヘプタンを挙げることができる。また、これらの溶媒と水との混合物も使用可能であるし、溶媒を用いずに反応を行うこともできるが、特に溶媒を用いない反応が好ましい。 The solvent used in the production method of the present invention is not particularly limited, and examples thereof include toluene, xylene, chloroform, dichloromethane, 1,2-dichloroethane, acetonitrile, hexane, and heptane. In addition, a mixture of these solvents and water can be used, and the reaction can be performed without using a solvent, but a reaction without using a solvent is particularly preferable.
 本発明の製造方法において、エポキシ化反応は通常20~100℃の範囲で、好ましくは20~70℃の範囲で行われる。ただし4級アンモニウム塩として硫酸水素テトラn-ブチルアンモニウムを用いた場合は40~60℃の範囲が好ましい。 In the production method of the present invention, the epoxidation reaction is usually performed in the range of 20 to 100 ° C, preferably in the range of 20 to 70 ° C. However, when tetra-n-butylammonium hydrogen sulfate is used as the quaternary ammonium salt, the range of 40 to 60 ° C. is preferable.
 本実施例において、分析は以下の機器等を使用した。
ガスクロマトグラフィー(GC)
装置:アジレントテクノロジー社 7890B GCシステム
カラム:DB-624(長さ:30.0m、内径:0.32mm、膜厚:1.80μm)
注入口温度:180℃
検出器温度:260℃
初期温度:80℃
初期保持時間:2分間
昇温速度:18℃/分
最終温度:170℃
最終保持時間:24.8分間
スプリット比:1:10
キャリアガス:ヘリウム
キャリアガス流量:2mL/分
 
核磁気共鳴(NMR)
装置:ブルカー社 Ultra Shield(400MHz)
ソフト:ブルカー社 TopSpin
 
分子力学計算
ソフトウェア:シュレディンガー社「Maestro」バージョン10.7
計算方法:Advanced mode mixed-torstional /low-mode samples 機能(分子力学計算)によるコンホメーションサーチ(真空中)
計算条件:上記モードのデフォルト値を使用(真空中)
力場:OPLS3
 
[実施例1]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成
In this example, the following equipment was used for the analysis.
Gas chromatography (GC)
Apparatus: Agilent Technologies, Inc. 7890B GC system column: DB-624 (length: 30.0 m, inner diameter: 0.32 mm, film thickness: 1.80 μm)
Inlet temperature: 180 ° C
Detector temperature: 260 ° C
Initial temperature: 80 ° C
Initial holding time: 2 minutes Temperature rising rate: 18 ° C / min Final temperature: 170 ° C
Final retention time: 24.8 minutes Split ratio: 1:10
Carrier gas: Helium carrier gas Flow rate: 2 mL / min
Nuclear magnetic resonance (NMR)
Equipment: Bruker Ultra Shield (400 MHz)
Software: Bruker TopSpin

Molecular mechanics <br/> Software: Schrödinger "Maestro" version 10.7
Calculation method: Advanced mode mixed-torstional / low-mode samples Conformation search (in vacuum) by function (molecular mechanics calculation)
Calculation conditions: Use the default value of the above mode (in vacuum)
Force field: OPLS3

[Example 1]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000004
                  
Figure JPOXMLDOC01-appb-C000004
                  
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸エチル(10.01g、71.38mmol)、タングステン酸ナトリウム二水和物(235mg、0.71mmol)、フェニルホスホン酸(56mg、0.36mmol)、および硫酸水素テトラn-ブチルアンモニウム(242mg、0.71mmol)を加えた。反応液を50℃に昇温後、30%過酸化水素水(9.48mL、92.79mmol)を4時間かけて添加した。50℃で1時間撹拌した後、酢酸イソプロピル(30mL)を添加し、水層を除去した。有機層を1mol/Lチオ硫酸ナトリウム水溶液(28.6mL)、10%食塩水(22.0mL)で順次洗浄した。得られた有機層を減圧下で濃縮し、表題化合物(10.40g、anti/syn=93/7)を得た。収率93%。
H-NMR (400MHz、 CDCl) δ 1.25 (t、J=7.2Hz, 3H)、1.89 (dd、J=9.6、 14.0Hz、2H)、 2.35 (dd、J=8.0、14.0Hz、2H)、 2.59-2.68 (m、1H)、3.52 (s、 2H)、 4.13 (q、J=7.2Hz、2H).
 図1に、分子力学計算による特許文献1の実施例1に記載された出発物質である化合物(1)の最安定コンホメーションを示す。なお、この化合物中の2つのアリルエステル基の立体配置は特定されていないが、生成物である化合物(2)および化合物(3)の立体構造からして、化合物(1)中の2つのアリルエステル基の立体配置はsyn配置であったことは明らかである。
Under a nitrogen stream in a reaction vessel, ethyl 3-cyclopentene-1-carboxylate (10.01 g, 71.38 mmol), sodium tungstate dihydrate (235 mg, 0.71 mmol), phenylphosphonic acid (56 mg, 0.36 mmol) ), And tetra n-butylammonium hydrogen sulfate (242 mg, 0.71 mmol). After raising the temperature of the reaction solution to 50 ° C., 30% aqueous hydrogen peroxide (9.48 mL, 92.79 mmol) was added over 4 hours. After stirring at 50 ° C. for 1 hour, isopropyl acetate (30 mL) was added and the aqueous layer was removed. The organic layer was washed successively with 1 mol / L aqueous sodium thiosulfate solution (28.6 mL) and 10% brine (22.0 mL). The obtained organic layer was concentrated under reduced pressure to obtain the title compound (10.40 g, anti / syn = 93/7). Yield 93%.
1 H-NMR (400 MHz, CDCl 3 ) δ 1.25 (t, J = 7.2 Hz, 3H), 1.89 (dd, J = 9.6, 14.0 Hz, 2H), 2.35 (dd , J = 8.0, 14.0 Hz, 2H), 2.59-2.68 (m, 1H), 3.52 (s, 2H), 4.13 (q, J = 7.2 Hz, 2H) .
FIG. 1 shows the most stable conformation of the compound (1) which is the starting material described in Example 1 of Patent Document 1 by molecular mechanics calculation. Although the configuration of the two allyl ester groups in this compound is not specified, the two allyl groups in compound (1) are determined from the three-dimensional structure of product (2) and compound (3). It is clear that the steric configuration of the ester group was a syn configuration.
 図1に示すように、化合物(1)の最安定コンホメーションは、同等のエネルギーレベルのものが2つあるが(ポテンシャルエネルギー:いずれも23.353kcal/mol)、この結果からすると、いずれのコンホメーションをとる場合でも、シクロヘキセン環の1,2位置換基のいずれか一方の置換基は必ずアキシアル位となり、シクロヘキセン環の二重結合を含む環面に対し、当該置換基が存在する側の面は立体的に混み合うことになる。そのためエポキシ化剤たる酸化剤は当該置換基とは反対側の面から選択的に近づくことが強く示唆され、それ故、高いanti/synの立体選択性が期待できたものである。 As shown in FIG. 1, the most stable conformation of compound (1) has two of the same energy level (potential energy: both 23.353 kcal / mol). Even in the case of conformation, one of the substituents at the 1,2-position of the cyclohexene ring is always in the axial position, and the side on which the substituent exists is present with respect to the ring surface containing the double bond of the cyclohexene ring. Will be crowded in three dimensions. Therefore, it is strongly suggested that the oxidizing agent as an epoxidizing agent is selectively approached from the surface opposite to the substituent, and therefore high anti / syn stereoselectivity can be expected.
 一方、図2に同様の条件での分子力学計算による、本発明における出発物質の一例として実施例1で用いた3-シクロペンテン-1-カルボン酸エチルの最安定コンホメーションを示す(ポテンシャルエネルギー:-31.69kcal/mol)。その1位置換基であるエチルエステル基はシクロペンテン環と平行に位置するため、シクロペンテン環の二重結合を含む環面に対して、いずれの面についても立体的な差異はほとんど無いことが強く示唆される。すなわち、この計算結果からは、エポキシ化反応のRe面とSi面の立体的環境の差異はほとんどなく、したがって本発明のエポキシ化反応に高いanti/synの立体選択性は期待できなかったところ、実際には予想外に高い立体選択性があることが判明したのである。
[実施例2]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成
On the other hand, FIG. 2 shows the most stable conformation of ethyl 3-cyclopentene-1-carboxylate used in Example 1 as an example of the starting material in the present invention by molecular mechanics calculation under the same conditions (potential energy: -31.69 kcal / mol). Since the ethyl ester group, which is the 1-position substituent, is located in parallel with the cyclopentene ring, it strongly suggests that there is almost no steric difference on either side of the ring surface containing the double bond of the cyclopentene ring. Is done. That is, from this calculation result, there was almost no difference in the steric environment between the Re plane and the Si plane of the epoxidation reaction, and therefore high anti / syn stereoselectivity could not be expected for the epoxidation reaction of the present invention. In fact, it was found that there was unexpectedly high stereoselectivity.
[Example 2]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸エチル(10.00g、71.34mmol)、モリブデン酸ナトリウム二水和物(174mg、0.72mmol)、フェニルホスホン酸(57mg、0.36mmol)、および硫酸水素テトラn-ブチルアンモニウム(242mg、0.71mmol)を加えた。反応液を50℃に昇温後、30%過酸化水素水(9.48mL、92.79mmol)を2.5時間かけて添加した。50℃で46時間撹拌した後、酢酸イソプロピル(30mL)を添加し、水層を除去した。有機層を1mol/Lチオ硫酸ナトリウム水溶液(28.5mL)、10%食塩水(22.0mL)で順次洗浄した。得られた有機層を減圧下で濃縮し、表題化合物(9.12g、anti/syn=89/11)を得た。収率82%。 Under a nitrogen stream in a reaction vessel, ethyl 3-cyclopentene-1-carboxylate (10.00 g, 71.34 mmol), sodium molybdate dihydrate (174 mg, 0.72 mmol), phenylphosphonic acid (57 mg, 0.36 mmol) ), And tetra n-butylammonium hydrogen sulfate (242 mg, 0.71 mmol). After raising the temperature of the reaction solution to 50 ° C., 30% aqueous hydrogen peroxide (9.48 mL, 92.79 mmol) was added over 2.5 hours. After stirring at 50 ° C. for 46 hours, isopropyl acetate (30 mL) was added and the aqueous layer was removed. The organic layer was washed successively with 1 mol / L aqueous sodium thiosulfate solution (28.5 mL) and 10% brine (22.0 mL). The obtained organic layer was concentrated under reduced pressure to obtain the title compound (9.12 g, anti / syn = 89/11). Yield 82%.
 
[実施例3]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成

[Example 3]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸エチル(20.00g、142.67mmol)、タングステン酸ナトリウム二水和物(941mg、2.85mmol)、フェニルホスホン酸(226mg、1.43mmol)、硫酸水素メチルトリn-オクチルアンモニウム(1.33g、2.85mmol)、および硫酸ナトリウム(6.08g、42.80mmol)を加え、30%過酸化水素水(9.48mL、92.79mmol)を室温で3時間かけて添加した。20~30℃で19時間撹拌した後、酢酸イソプロピル(60mL)を添加し、水層を除去した。有機層を10%チオ硫酸ナトリウム水溶液(67.67g)、10%食塩水(44mL)で順次洗浄した。得られた有機層を減圧下で濃縮し、表題化合物(23.96g、anti/syn=92/8)を得た。収率108%。 Under a nitrogen stream in a reaction vessel, ethyl 3-cyclopentene-1-carboxylate (20.00 g, 142.67 mmol), sodium tungstate dihydrate (941 mg, 2.85 mmol), phenylphosphonic acid (226 mg, 1.43 mmol) ), Methyl tri-n-octylammonium hydrogensulfate (1.33 g, 2.85 mmol), and sodium sulfate (6.08 g, 42.80 mmol) were added, and 30% aqueous hydrogen peroxide (9.48 mL, 92.79 mmol) was added. Added over 3 hours at room temperature. After stirring at 20-30 ° C. for 19 hours, isopropyl acetate (60 mL) was added and the aqueous layer was removed. The organic layer was washed successively with 10% aqueous sodium thiosulfate solution (67.67 g) and 10% brine (44 mL). The obtained organic layer was concentrated under reduced pressure to obtain the title compound (23.96 g, anti / syn = 92/8). Yield 108%.
 
[実施例4]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成

[Example 4]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸エチル(1.00g、7.13mmol)、タングステン酸ナトリウム二水和物(47mg、0.14mmol)、フェニルホスホン酸(58mg、0.07mmol)、メチルトリn-オクチルアンモニウムクロリド(58mg、0.14mmol)、および硫酸ナトリウム(0.304g、2.14mmol)を加え、30%過酸化水素水(0.95mL、9.27mmol)を室温で1.5時間かけて添加し、23~24℃で22時間、47℃で3時間撹拌した。後処理は行わず反応終点で評価した。ガスクロマトグラフィーによる定量収率は84%、生成比はanti/syn=89/11であった。 Under a nitrogen stream in a reaction vessel, ethyl 3-cyclopentene-1-carboxylate (1.00 g, 7.13 mmol), sodium tungstate dihydrate (47 mg, 0.14 mmol), phenylphosphonic acid (58 mg, 0.07 mmol) ), Methyltri-n-octylammonium chloride (58 mg, 0.14 mmol), and sodium sulfate (0.304 g, 2.14 mmol) were added, and 30% aqueous hydrogen peroxide (0.95 mL, 9.27 mmol) was added at room temperature. The mixture was added over 5 hours and stirred at 23-24 ° C. for 22 hours and at 47 ° C. for 3 hours. Evaluation was made at the end point of the reaction without post-treatment. The quantitative yield by gas chromatography was 84%, and the production ratio was anti / syn = 89/11.
 
[実施例5]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成

[Example 5]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸エチル(10.00g、71.34mmol)、タングステン酸ナトリウム二水和物(471mg、1.43mmol)、リン酸(含量85%、82mg、0.71mmol)、硫酸水素メチルトリn-オクチルアンモニウム(665mg、1.43mmol)、および硫酸ナトリウム(3.04g、21.40mmol)を加え、30%過酸化水素水(9.48mL、92.79mmol)を室温で2時間かけて添加した。20~30℃で16.5時間撹拌した後、酢酸イソプロピル(30mL)を添加し、水層を除去した。有機層を1mol/Lチオ硫酸ナトリウム水溶液(21.4mL)、10%食塩水(20.0mL)で順次洗浄した。得られた有機層をガスクロマトグラフィーで評価した。定量収率は83%、生成比はanti/syn=87/13であった。 Under a nitrogen stream in a reaction vessel, ethyl 3-cyclopentene-1-carboxylate (10.00 g, 71.34 mmol), sodium tungstate dihydrate (471 mg, 1.43 mmol), phosphoric acid (content 85%, 82 mg, 0.71 mmol), methyltri-n-octylammonium hydrogensulfate (665 mg, 1.43 mmol), and sodium sulfate (3.04 g, 21.40 mmol) were added, and 30% aqueous hydrogen peroxide (9.48 mL, 92.79 mmol) was added. Was added at room temperature over 2 hours. After stirring at 20-30 ° C. for 16.5 hours, isopropyl acetate (30 mL) was added and the aqueous layer was removed. The organic layer was washed successively with 1 mol / L aqueous sodium thiosulfate solution (21.4 mL) and 10% brine (20.0 mL). The obtained organic layer was evaluated by gas chromatography. The quantitative yield was 83%, and the production ratio was anti / syn = 87/13.
 
[実施例6]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成

[Example 6]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 反応容器に窒素気流下、酢酸イソプロピル(300mL)、3-シクロペンテン-1-カルボン酸エチル(125.02g、891.82mmol)、タングステン酸ナトリウム二水和物(2.94g、8.92mmol)、フェニルホスホン酸(0.71g、4.46mmol)、および硫酸水素テトラn-ブチルアンモニウム(3.03g、8.92mmol)を加えた。反応液を50℃に昇温後、30%過酸化水素水(118.41mL、1159.37mmol)を5.5時間かけて添加した。50℃で21時間撹拌した後、酢酸イソプロピル(100mL)を添加し、水層を除去した。有機層を1mol/Lチオ硫酸ナトリウム水溶液(357mL)、10%食塩水(250mL)で順次洗浄した。得られた有機層を減圧下で濃縮し、表題化合物(113.38g、anti/syn=94/6)を得た。収率81%。 Under a nitrogen stream in a reaction vessel, isopropyl acetate (300 mL), ethyl 3-cyclopentene-1-carboxylate (125.02 g, 891.82 mmol), sodium tungstate dihydrate (2.94 g, 8.92 mmol), phenyl Phosphonic acid (0.71 g, 4.46 mmol) and tetra n-butylammonium hydrogen sulfate (3.03 g, 8.92 mmol) were added. After raising the temperature of the reaction solution to 50 ° C., 30% aqueous hydrogen peroxide (118.41 mL, 1159.37 mmol) was added over 5.5 hours. After stirring at 50 ° C. for 21 hours, isopropyl acetate (100 mL) was added and the aqueous layer was removed. The organic layer was washed successively with 1 mol / L aqueous sodium thiosulfate solution (357 mL) and 10% brine (250 mL). The obtained organic layer was concentrated under reduced pressure to obtain the title compound (113.38 g, anti / syn = 94/6). Yield 81%.
 
[実施例7]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸エチルの合成

[Example 7]
Synthesis of ethyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 反応容器に窒素気流下、トルエン(2.0mL)、3-シクロペンテン-1-カルボン酸エチル(1.00g、7.13mmol)、タングステン酸ナトリウム二水和物(47mg、0.14mmol)、フェニルホスホン酸(11mg、0.07mmol)、硫酸水素メチルトリn-オクチルアンモニウム(66mg、0.14mmol)、および硫酸ナトリウム(304mg、2.14mmol)を加え、30%過酸化水素水(0.95mL、9.27mmol)を室温で1.5時間かけて添加し、20~30℃で46時間撹拌した。後処理は行わず反応終点をガスクロマトグラフィーで評価した。生成比はanti/syn=87/13であった。 Under a nitrogen stream in a reaction vessel, toluene (2.0 mL), ethyl 3-cyclopentene-1-carboxylate (1.00 g, 7.13 mmol), sodium tungstate dihydrate (47 mg, 0.14 mmol), phenylphosphone Acid (11 mg, 0.07 mmol), methyltri-n-octylammonium hydrogensulfate (66 mg, 0.14 mmol), and sodium sulfate (304 mg, 2.14 mmol) were added and 30% aqueous hydrogen peroxide (0.95 mL, 9.4). 27 mmol) was added at room temperature over 1.5 hours and stirred at 20-30 ° C. for 46 hours. No post-treatment was performed, and the reaction end point was evaluated by gas chromatography. The production ratio was anti / syn = 87/13.
 
[実施例8]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸イソプロピルの合成

[Example 8]
Synthesis of isopropyl (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸イソプロピル(10.00g、64.87mmol)、タングステン酸ナトリウム二水和物(428mg、1.30mmol)、フェニルホスホン酸(103mg、0.65mmol)、およびテトラn-ブチルアンモニウム(441mg、1.30mmol)を加えた。反応液を50℃に昇温後、30%過酸化水素水(8.61mL、84.33mmol)を4時間かけて添加した。50℃で2時間撹拌した後、酢酸イソプロピル(30mL)を添加し、水層を除去した。有機層を1mol/Lチオ硫酸ナトリウム水溶液(19.5mL)、10%食塩水(22mL)で順次洗浄した。得られた有機層を減圧下で濃縮し、表題化合物(11.92g、anti/syn=94/6)を得た。収率103%。
H-NMR (400MHz, CDCl) δ 1.23 (d、J=6.4Hz、6H)、 1.89 (dd、J=8.8、 14.4Hz、2H)、 2.64-2.70 (m、3H)、 3.46 (s、2H)、 4.99 (m、1H).
 
[実施例9]
(1R,3s,5S)-6-オキサビシクロ[3.1.0]ヘキサン-3-カルボン酸イソブチルの合成
Under a nitrogen stream in a reaction vessel, isopropyl 3-cyclopentene-1-carboxylate (10.00 g, 64.87 mmol), sodium tungstate dihydrate (428 mg, 1.30 mmol), phenylphosphonic acid (103 mg, 0.65 mmol) ), And tetra n-butylammonium (441 mg, 1.30 mmol). After raising the temperature of the reaction solution to 50 ° C., 30% aqueous hydrogen peroxide (8.61 mL, 84.33 mmol) was added over 4 hours. After stirring at 50 ° C. for 2 hours, isopropyl acetate (30 mL) was added and the aqueous layer was removed. The organic layer was washed sequentially with 1 mol / L aqueous sodium thiosulfate solution (19.5 mL) and 10% brine (22 mL). The obtained organic layer was concentrated under reduced pressure to obtain the title compound (11.92 g, anti / syn = 94/6). Yield 103%.
1 H-NMR (400 MHz, CDCl 3 ) δ 1.23 (d, J = 6.4 Hz, 6H), 1.89 (dd, J = 8.8, 14.4 Hz, 2H), 2.64-2 .70 (m, 3H), 3.46 (s, 2H), 4.99 (m, 1H).

[Example 9]
Synthesis of (1R, 3s, 5S) -6-oxabicyclo [3.1.0] hexane-3-carboxylate isobutyl
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 反応容器に窒素気流下、3-シクロペンテン-1-カルボン酸イソブチル(1.00g、5.95mmol)、タングステン酸ナトリウム二水和物(39mg、0.12mmol)、フェニルホスホン酸(9.4mg、0.06mmol)、硫酸水素メチルトリn-オクチルアンモニウム(55mg、0.12mmol)、および硫酸ナトリウム(254mg、1.78mmol)を加え、30%過酸化水素水(0.79mL、7.73mmol)を室温で1時間かけて添加した。20~30℃で17.5時間撹拌した後、1mol/Lチオ硫酸ナトリウム水溶液(1.8mL)および酢酸イソプロピル(10mL)を添加し、水層を除去した。水層を酢酸イソプロピル(10mL)で再抽出し、合わせた有機層を水(5mL)で洗浄した。得られた有機層をガスクロマトグラフィーで評価した。生成比はanti/syn=91/9であった。
[比較例1]
Under a nitrogen stream in a reaction vessel, isobutyl 3-cyclopentene-1-carboxylate (1.00 g, 5.95 mmol), sodium tungstate dihydrate (39 mg, 0.12 mmol), phenylphosphonic acid (9.4 mg, 0 0.06 mmol), methyl tri-n-octylammonium hydrogensulfate (55 mg, 0.12 mmol), and sodium sulfate (254 mg, 1.78 mmol) were added, and 30% aqueous hydrogen peroxide (0.79 mL, 7.73 mmol) was added at room temperature. Added over 1 hour. After stirring at 20-30 ° C. for 17.5 hours, 1 mol / L aqueous sodium thiosulfate solution (1.8 mL) and isopropyl acetate (10 mL) were added, and the aqueous layer was removed. The aqueous layer was re-extracted with isopropyl acetate (10 mL) and the combined organic layers were washed with water (5 mL). The obtained organic layer was evaluated by gas chromatography. The production ratio was anti / syn = 91/9.
[Comparative Example 1]
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 反応容器に窒素気流下、3-シクロペンテン-1-メチルベンゾエート(1.00g、7.13mmol)、タングステン酸ナトリウム二水和物(23.5mg、0.07mmol)、フェニルホスホン酸(5.7mg、0.04mmol)、および硫酸水素テトラn-ブチルアンモニウム(24.4mg、0.07mmol)を加えた。反応液を50℃に昇温後、30%過酸化水素水(0.95mL、9.27mmol)を2時間かけて添加した。50℃で2時間撹拌した後、酢酸イソプロピル(3mL)を添加し、水層を除去した。有機層を1mol/Lチオ硫酸ナトリウム水溶液(2.9mL)で洗浄し、得られた有機層をガスクロマトグラフィーで評価した。生成比はanti/syn=64/36であった。 Under a nitrogen stream in a reaction vessel, 3-cyclopentene-1-methylbenzoate (1.00 g, 7.13 mmol), sodium tungstate dihydrate (23.5 mg, 0.07 mmol), phenylphosphonic acid (5.7 mg, 0.04 mmol), and tetra n-butylammonium hydrogen sulfate (24.4 mg, 0.07 mmol) were added. After raising the temperature of the reaction solution to 50 ° C., 30% aqueous hydrogen peroxide (0.95 mL, 9.27 mmol) was added over 2 hours. After stirring at 50 ° C. for 2 hours, isopropyl acetate (3 mL) was added and the aqueous layer was removed. The organic layer was washed with 1 mol / L aqueous sodium thiosulfate solution (2.9 mL), and the obtained organic layer was evaluated by gas chromatography. The production ratio was anti / syn = 64/36.
 この結果は、式(1)におけるシクロペンテン環の1位の置換基を、R(C=O)-に代えてベンゾイルオキシメチル基とした場合、シクロペンテン環のエポキシ化反応のanti/synの立体選択性が顕著に低下することを示している。 This result shows that when the substituent at the 1-position of the cyclopentene ring in the formula (1) is a benzoyloxymethyl group instead of R (C═O) —, the anti / syn stereoselection of the epoxidation reaction of the cyclopentene ring It shows that the sex is significantly reduced.
 本発明のエポキシ化合物の製造方法は、例えば医薬品製造業を含む化学工業で利用される。 The method for producing an epoxy compound of the present invention is used, for example, in the chemical industry including the pharmaceutical manufacturing industry.

Claims (9)

  1.  式(1)で表される化合物に、リン酸化合物および/またはホスホン酸化合物、6属金属化合物、相間移動触媒、ならびに過酸化水素を加えて反応させる工程を含む、式(2)で表される化合物の製造方法。ここで、式(1)および式(2)におけるRは1~2個の(フェニル基および/もしくはハロゲン原子)で置換されていてもよいC~Cのアルコキシ基、1~2個のC~Cアルキル基で置換されていてもよいベンジルオキシ基、1~2個の(フェニル基および/もしくはハロゲン原子)で置換されていてもよいC~Cのアルキル基、または1~2個のC~Cアルキル基で置換されていてもよいフェニル基を表す。
    Figure JPOXMLDOC01-appb-C000001
                      
    Figure JPOXMLDOC01-appb-C000002
    The compound represented by the formula (1) is represented by the formula (2) including a step of adding a phosphoric acid compound and / or a phosphonic acid compound, a group 6 metal compound, a phase transfer catalyst, and hydrogen peroxide to react. A method for producing a compound. Here, R in the formula (1) and the formula (2) is a C 1 -C 6 alkoxy group which may be substituted with 1 to 2 (phenyl group and / or halogen atom), 1 to 2 C 1 ~ C 4 alkyl optionally benzyloxy group optionally substituted with a group, one to two (phenyl group and / or halogen atom) with optionally substituted C 1 to C 6 alkyl group or 1, Represents a phenyl group which may be substituted by ˜2 C 1 -C 4 alkyl groups;
    Figure JPOXMLDOC01-appb-C000001

    Figure JPOXMLDOC01-appb-C000002
  2.  RがC~Cのアルコキシ基、ベンジルオキシ基、C~Cのアルキル基、またはフェニル基である、請求項1に記載の製造方法。 The production method according to claim 1, wherein R is a C 1 -C 6 alkoxy group, a benzyloxy group, a C 1 -C 6 alkyl group, or a phenyl group.
  3.  RがC~Cのアルコキシ基である、請求項1に記載の製造方法。 The production method according to claim 1, wherein R is a C 1 -C 6 alkoxy group.
  4.  リン酸化合物および/またはホスホン酸化合物がフェニルホスホン酸またはリン酸である、請求項1から3のいずれかに記載の製造方法。 The production method according to any one of claims 1 to 3, wherein the phosphoric acid compound and / or the phosphonic acid compound is phenylphosphonic acid or phosphoric acid.
  5.  6属金属化合物がタングステン酸塩またはモリブデン酸塩である、請求項1から4のいずれかに記載の製造方法。 The production method according to any one of claims 1 to 4, wherein the Group 6 metal compound is tungstate or molybdate.
  6.  6属金属化合物がタングステン酸ナトリウム二水和物である、請求項1から4のいずれかに記載の製造方法。 The production method according to any one of claims 1 to 4, wherein the Group 6 metal compound is sodium tungstate dihydrate.
  7.  相間移動触媒が4級アンモニウム塩である、請求項1から6のいずれかに記載の製造方法。 The production method according to any one of claims 1 to 6, wherein the phase transfer catalyst is a quaternary ammonium salt.
  8.  4級アンモニウム塩が硫酸水素4級アンモニウム塩である、請求項7に記載の製造方法。 The production method according to claim 7, wherein the quaternary ammonium salt is a quaternary ammonium hydrogen sulfate salt.
  9.  硫酸水素4級アンモニウム塩が硫酸水素テトラn-ブチルアンモニウムまたは硫酸水素メチルトリn-オクチルアンモニウムである、請求項8に記載の製造方法。 The production method according to claim 8, wherein the quaternary ammonium hydrogen sulfate salt is tetra-n-butylammonium hydrogensulfate or methyltri-n-octylammonium hydrogensulfate.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116375667A (en) * 2023-06-04 2023-07-04 北京世纪迈劲生物科技有限公司 Epoxidation method of 3-cyclohexene-1-carboxylic acid-3-cyclohexene-1-ylmethyl ester

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007081889A2 (en) * 2006-01-05 2007-07-19 Teva Gyógyszergyár Zártkörüen Müködö Részvénytársaság Production of dolasetron
JP2008094741A (en) * 2006-10-10 2008-04-24 Showa Denko Kk Process for producing polyfunctional epoxy compound by selective oxidation of triolefin compound

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007081889A2 (en) * 2006-01-05 2007-07-19 Teva Gyógyszergyár Zártkörüen Müködö Részvénytársaság Production of dolasetron
JP2008094741A (en) * 2006-10-10 2008-04-24 Showa Denko Kk Process for producing polyfunctional epoxy compound by selective oxidation of triolefin compound

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
CRESSWELL, A. J. ET AL.: "Catalytic, stereospecific syn-dichlorination of alkenes", NATURE CHEMISTRY, vol. 7, no. 2, 2015, pages 146 - 152, XP055487923, ISSN: 1755-4330 *
ENKVIST, E. ET AL.: "Carbocyclic 3'-deoxyadenosine-based highly potent bisubstrate-analog inhibitor of basophilic protein kinases", BIORGANIC & MEDICINAL CHEMISTRY LETTERS, vol. 17, 2007, pages 5336 - 5339, XP022249711, ISSN: 0960-894X *
GIANNELLA, M. ET AL.: "Synthesis and muscarinic properties of (1S*,3R*,5R*)-trimethyl(1-methyl-6-oxabicyclo[3.1. 0]hex-3-yl)methyl ammonium iodide", CHEMICAL & PHARMACEUTICAL BULLETIN, vol. 42, no. 6, 1994, pages 1286 - 1290, XP055487922, ISSN: 0009-2363 *
GRELLEPOIS, F. ET AL.: "1-(Trifluoromethyl) cyclopent-3-enecarboxylic Acid Derivatives: Platforms for Bifunctional Cyclic Trifluoromethyl BuildingBlocks", EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, vol. 2012, no. 3, 2012, pages 509 - 517, XP055487918, ISSN: 1099-0690 *
MARTINEZ, L. E. ET AL.: "Highly Efficient and Enantioselective Synthesis of Carbocyclic Nucleoside Analogs Using Selective Early Transition Metal Catalysis", JOURNAL OF ORGANIC CHEMISTRY, vol. 61, no. 22, 1996, pages 7963 - 7966, XP002041317, ISSN: 0022-3263 *
WHITE, D. E ET AL.: "Abroadly applicable and practical oligomeric (salen) Co catalyst for enantioselective epoxide ring-opening reactions", TETRAHEDRON, vol. 70, no. 27-28, 2014, pages 4165 - 4180, XP029026739, ISSN: 0040-4020 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116375667A (en) * 2023-06-04 2023-07-04 北京世纪迈劲生物科技有限公司 Epoxidation method of 3-cyclohexene-1-carboxylic acid-3-cyclohexene-1-ylmethyl ester

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