WO2018079536A1 - Workpiece dividing device and workpiece dividing method - Google Patents
Workpiece dividing device and workpiece dividing method Download PDFInfo
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- WO2018079536A1 WO2018079536A1 PCT/JP2017/038321 JP2017038321W WO2018079536A1 WO 2018079536 A1 WO2018079536 A1 WO 2018079536A1 JP 2017038321 W JP2017038321 W JP 2017038321W WO 2018079536 A1 WO2018079536 A1 WO 2018079536A1
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- dicing tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
Definitions
- the present invention relates to a workpiece dividing apparatus and a workpiece dividing method, and more particularly, to a workpiece dividing apparatus and a workpiece dividing method for dividing a workpiece such as a semiconductor wafer into individual chips along a planned division line.
- wafers semiconductor wafers (hereinafter referred to as wafers) in which lines to be divided are formed in advance by half-cutting with a dicing blade or formation of modified regions by laser irradiation. ) Is divided into individual chips along a planned division line (see Patent Document 1 etc.).
- FIG. 22A and 22B are explanatory views of the wafer unit 2 to which the disk-shaped wafer 1 to be divided by the workpiece dividing apparatus is attached.
- FIG. 22A is a perspective view of the wafer unit 2
- FIG. 3 is a cross-sectional view of a unit 2.
- the wafer 1 is affixed to the center of a dicing tape 3 (also called an expansion tape or an adhesive sheet) 3 having an adhesive layer formed on one side and having a thickness of about 100 ⁇ m.
- a fixed frame (hereinafter referred to as a frame) 4 is fixed.
- the frame 4 of the wafer unit 2 is fixed by a frame fixing member (also referred to as a frame fixing mechanism) 7 indicated by a two-dot chain line.
- a frame fixing member also referred to as a frame fixing mechanism
- an expanding ring also referred to as a push-up ring
- the tension of the dicing tape 3 generated at this time is applied to the division line 5 of the wafer 1, whereby the wafer 1 is divided into individual chips 6.
- the division lines 5 are formed in the X direction and the Y direction that intersect each other.
- the shape of the divided chip 6 is a square.
- the shape of the divided chip 6 is a rectangle.
- the dicing tape 3 is a flexible member having a low Young's modulus. For this reason, in order to smoothly divide the wafer 1 into the individual chips 6, it is conceivable that the dicing tape 3 is cooled and the dicing tape 3 is expanded while the spring constant of the dicing tape 3 is increased.
- the tape expansion device (work dividing device) of Patent Document 2 includes a cold air supply means. According to Patent Document 2, the dicing tape is cooled by operating the cold air supply means to supply cold air into the processing space and cooling the processing space to, for example, 0 ° C. or lower.
- This film surface support mechanism includes a plurality of support mechanisms that are independent in the circumferential direction, and adjusts the tension of the dicing tape by individually controlling the relative heights of the plurality of support mechanisms. The elongation in the direction and the elongation in the Y direction are controlled independently.
- a circular area in plan view where the wafer 1 is affixed is referred to as a central area 3 ⁇ / b> A, and between the outer edge of the central area 3 ⁇ / b> A and the inner edge of the frame 4.
- the planar donut-shaped region provided in FIG. 5 is referred to as an annular portion region 3B, and the planar donut-shaped region at the outermost peripheral portion fixed to the frame 4 is referred to as a fixed portion region 3C.
- the annular portion region 3B is a region that is expanded by being pressed by the expanding ring 8.
- the force required to divide the wafer 1, that is, the tension that must be generated in the annular region 3 ⁇ / b> B in order to divide the wafer 1, must be increased as the number of division lines 5 increases.
- the wafer 1 having a diameter of 300 mm and the chip size is 5 mm about 120 (60 in each of the XY directions) division planned lines 5 are formed and the chip size is 1 mm. Approximately 600 division planned lines 5 are formed. Therefore, the tension that must be generated in the annular portion region 3B must be increased as the chip size is reduced.
- the inner diameter of the frame 4 on which the wafer 1 having a diameter of 300 mm is mounted (the diameter of the inner edge of the frame) is based on the SEMI standard (Semiconductor Equipment and Materials International standards) (G74-0699 for tape frame related to 300 mm wafer). It is defined as 350 mm. According to this standard, an annular region 3B having a width of 25 mm exists between the outer edge of the wafer 1 and the inner edge of the frame 4 as shown in the longitudinal sectional view of the wafer unit 2 in FIG. .
- the frame fixing member 7 that fixes the frame 4 does not come into contact with the annular portion region 3B that is expanded by the expand ring 8, as shown in the longitudinal sectional view of the main part of the workpiece dividing device.
- the dicing tape 3 is installed at a position spaced outward from the annular portion region 3B in the in-plane direction of the dicing tape 3 indicated by the arrow A.
- the force for dividing the wafer 1 caused by the upward movement of the expand ring 8 is (i) the force for expanding the entire region of the annular portion region 3B, (ii) the force for dividing the wafer 1 into the chips 6, and (iii) It is decomposed into three forces of force for expanding the dicing tape 3 between adjacent chips 6.
- the expanding ring 8 comes into contact with the annular portion region 3B of the dicing tape 3, and the expansion of the expanding ring 8 starts the expansion of the dicing tape 3.
- FIG. 25A first, the expansion of the annular portion region 3B having the lowest spring constant begins (FIG. 25B).
- a tension is generated in the annular portion region 3B, and when this tension increases to some extent, the increased tension is transmitted to the wafer 1 to start dividing the wafer 1 into chips 6 (FIG. 25C).
- the expansion of the annular portion region 3B and the expansion of the dicing tape 3 between the chips proceed simultaneously (FIGS. 25D to 25E).
- the individual chips 6 can be divided without any problem due to the tension generated in the annular portion region 3B.
- chips having a smaller chip size of 1 mm or less have also appeared.
- the force required to divide the wafer 1 increases due to an increase in the number of scheduled dividing lines 5 for dividing the wafer 1, and a force greater than the tension due to the expansion of the annular region 3B is required. was there.
- the longitudinal sectional view of the wafer unit 2 in FIG. 26 even if the expansion operation by the expanding ring 8 is completed, a part of the division line 5 formed on the wafer 1 remains undivided without being divided. A problem occurred.
- Japanese Patent Application Laid-Open No. 2004-228561 copes with this by cooling the dicing tape and increasing the spring constant of the dicing tape. Can not get enough effect.
- the chip dividing / separating device of Patent Document 3 can independently control the expansion in the X direction and the Y direction of the dicing tape, but applies a force greater than the tension due to the expansion of the annular region to the wafer. Since this is not possible, the problem of undivided lines to be divided cannot be solved.
- the present invention has been made in view of such a problem, and provides a workpiece dividing apparatus and a workpiece dividing method capable of solving the problem of undivided division lines that occur when the chip size is a small chip. With the goal.
- the workpiece dividing device of the present invention divides a workpiece adhered to the dicing tape by fixing the outer peripheral portion of the dicing tape to a ring-shaped frame having an inner diameter larger than the outer diameter of the workpiece.
- the frame fixing member that fixes the ring-shaped frame, and the back surface of the dicing tape on the opposite side of the workpiece attachment surface are arranged.
- An expanding ring that is formed in a ring shape that is smaller and larger than the outer diameter of the work, and that generates tension on the dicing tape by expanding the dicing tape by pressing the back surface of the dicing tape, and the work application surface of the dicing tape Is smaller than the inner diameter of the ring frame,
- One expand ring is formed in a ring shape having a larger opening than the outer diameter of, and an extended regulation ring dicing tape is abut upon dicing tape extended by expanding the ring.
- the dicing tape comes into contact with the expansion restriction ring when the dicing tape is expanded.
- the dicing tape is divided into an outer peripheral side region located on the outer peripheral side and an inner peripheral side region located on the inner peripheral side, with the contact portion being in contact with the expansion restriction ring as a boundary.
- the expansion operation by the expanding ring after the dicing tape comes into contact with the expansion restriction ring the expansion of the outer peripheral area is restricted by the expansion restriction ring, and only the inner peripheral area is expanded. That is, the tension of the spring constant in the inner peripheral region that is larger than the spring constant of the dicing tape is applied to the workpiece.
- work increases, the undivided problem of the division
- the expansion restricting ring has a tape position restricting portion that comes into contact with the dicing tape when the dicing tape is expanded by the expand ring, and the dicing tape of the ring frame is attached to the tape position restricting portion. It is preferable to be arranged on the same surface as the applied tape application surface or on the side where the expanding ring is arranged than the same surface.
- the expansion restriction ring includes a frame fixing portion fixed to the ring-shaped frame, and a protruding portion protruding toward the dicing tape along the peripheral edge portion of the opening of the expansion restriction ring.
- the tape position restricting portion is preferably constituted by the tip portion of the ridge portion.
- One aspect of the present invention is a frame fixing portion that is disposed on the same side as the work affixing surface of the dicing tape on the expansion regulating ring, and is a frame fixing portion that contacts the ring-shaped frame and fixes the ring-shaped frame. Is preferably provided.
- the expansion restriction ring since the expansion restriction ring also has a function of fixing the ring-shaped frame, the number of parts of the work dividing device can be reduced, and the expansion restriction ring can be used as the work dividing device.
- the frame can be fixed by the frame fixing portion in the assembling work.
- the expansion restricting ring is a frame fixing member disposed on the same side as the work affixing surface of the dicing tape, and is attached to and detached from the frame fixing member for fixing the ring-shaped frame via the expansion restricting ring. It is preferable that it is fixed freely.
- the expansion restriction ring when the chip size is a small chip, can be assembled to the frame fixing member.
- the expansion restriction ring is removed from the frame fixing member. Can be removed.
- a workpiece with a small chip size can be divided by attaching the expansion regulating ring to the frame fixing member of the workpiece dividing device. .
- the opening of the expansion restriction ring is preferably formed in a circular shape.
- the X direction and the Y direction intersecting each other, for example, in the X direction and the Y direction, like a workpiece divided into square chips having the same dimensions in the X direction and the Y direction.
- an expansion restricting ring having a circular opening in the case of a work affixed to a dicing tape having the same spring constant in the X direction and the spring constant in the Y direction.
- the opening of the expansion restriction ring is preferably formed in an elliptical shape.
- the workpiece in the X direction and the Y direction orthogonal to each other, for example, is divided in the X direction and the Y direction, such as a work divided into rectangular chips having different dimensions in the X direction and the Y direction.
- the direction of the minor axis of the ellipse is aligned in parallel with the direction in which the density of the planned dividing line is high (the direction along the short side of the chip, the direction of the high density of the chip), and the direction of the major axis of the ellipse is scheduled to be divided
- the lines are aligned parallel to the direction in which the line density is low (the direction along the long side of the chip, the direction in which the chip density is low).
- the annular region located in the direction where the density of the planned division lines is low has a small spring constant, but can impart a suitable tension to the work to divide the small division lines. Therefore, it is possible to realize a suitable dividing ability for such a workpiece.
- the direction of the minor axis of the ellipse is aligned in parallel with the direction where the spring constant is small, and the direction of the major axis of the ellipse is aligned parallel to the direction where the spring constant is large.
- the spring constant of the inner peripheral region located in the direction parallel to the direction in which the spring constant is small increases, and the inner peripheral side located in the direction parallel to the major axis direction of the ellipse. Since it approaches the spring constant of the region, a substantially uniform tension can be applied to the workpiece from the inner peripheral region. Therefore, it is possible to realize a suitable dividing ability for a work mounted on dicing tape having anisotropy in which the spring constant in the X direction and the spring constant in the Y direction are different.
- the work dividing method divides a work affixed to the dicing tape by fixing the outer peripheral portion of the dicing tape to a ring-shaped frame having an inner diameter larger than the outer diameter of the work.
- the dicing tape is expanded by pressing the dicing tape to expand the dicing tape, and the dicing tape is expanded when the dicing tape is expanded.
- an expansion restriction step for restricting expansion of the outer peripheral region located on the outer peripheral side
- the work dividing method of the present invention it is possible to solve the problem of undivision of the line to be divided that occurs when the chip size is a small chip.
- Main part structure diagram of work dividing apparatus of first embodiment The principal part expansion perspective view of the workpiece
- Main part structure diagram of work dividing apparatus of second embodiment The principal part expansion perspective view of the workpiece
- a graph that calculates the change in expansion rate relative to the amount of push-up Schematic showing the operation during the extended division process A graph that calculates the change in expansion rate relative to the push-up speed Illustration of the wafer unit with a wafer attached Vertical section of wafer unit Side view of main part of work dividing device Operation diagram of work dividing device Longitudinal cross section of wafer unit with wafer divided
- FIG. 1 is a longitudinal sectional view of a main part of a workpiece dividing apparatus 10A according to the first embodiment
- FIG. 2 is an enlarged perspective view of a main part of the workpiece dividing apparatus 10A.
- the size of the wafer unit to be divided by the workpiece dividing apparatus 10A is not limited, the embodiment exemplifies the wafer unit 2 on which the wafer 1 having a diameter of 300 mm shown in FIG. 23 is mounted.
- the work dividing apparatus 10A is an apparatus that divides the wafer 1 on which the planned division line 5 is formed into individual chips 6 along the planned division line 5.
- a plurality of division lines 5 are formed in the X direction and the Y direction intersecting each other.
- the number of the planned division lines 5 parallel to the X direction and the number of the planned division lines 5 parallel to the Y direction are 300, and the distance between them is equal, that is, a chip having a chip size of 1 mm.
- segmented into 6 is illustrated.
- the wafer 1 is attached to the center of a dicing tape 3 whose outer periphery is fixed to the frame 4.
- the dicing tape 3 has a circular central portion region 3A to which the wafer 1 is attached, and an annular portion region 3B having a planar donut shape between the outer edge portion of the central portion region 3A and the inner edge portion of the frame 4. .
- the thickness of the wafer 1 is, for example, about 50 ⁇ m.
- a dicing tape 3 for example, a PVC (polyvinyl chloride) tape is used.
- the wafer 1 may be attached to the dicing tape 3 through a film adhesive such as DAF (DieFAttach Film).
- a film adhesive for example, a PO (polyolefin) -based adhesive can be used.
- the expand ring 14 is disposed on the back side of the dicing tape 3 opposite to the wafer 1 application surface, and is an opening for expansion that is smaller than the inner diameter (350 mm) of the frame 4 and larger than the outer diameter (300 mm) of the wafer 1. It is formed in a ring shape having a portion 14A.
- the expand ring 14 expands the annular portion region 3B by pressing the back surface of the annular portion region 3B of the dicing tape 3. That is, the expand ring 14 is moved upward in the B direction intersecting the in-plane direction indicated by the arrow A of the dicing tape 3 with respect to the annular portion region 3B. As a result, the annular portion region 3B is pushed up by the expand ring 14 and radially expanded.
- the expanding ring 14 may be fixed and the wafer unit 2 moved downward in the direction of the arrow C to expand the annular portion region 3B with the expanding ring 14.
- the expansion restriction ring 16 includes an expansion restriction portion 17 and a frame fixing portion 12.
- the frame fixing portion 12 is disposed on the same side as the application surface of the wafer 1 in the dicing tape 3, and the frame 4 is fixed to the lower surface 12A thereof.
- the expansion restricting portion 17 extends from the frame fixing portion 12 toward the center of the expansion restricting ring 16 rather than the frame 4.
- the annular portion region 3 ⁇ / b> B of the dicing tape 3 is brought into contact with the expansion restricting portion 17 during expansion by the expand ring 14. Note that the boundary between the frame fixing portion 12 and the expansion restricting portion 17 is indicated by the symbol D in FIGS.
- the expansion restricting portion 17 is formed in a ring shape having an expansion restricting opening (opening) 16A that is smaller than the inner diameter (350 mm) of the frame 4 and larger than the outer diameter of the expanding ring 14.
- FIG. 3 is a longitudinal sectional view of the wafer unit 2 showing the shape of the annular portion region 3B that is being expanded by the expand ring 14. As shown in FIG. FIG. 4 is an enlarged cross-sectional view of the annular portion region 3B during expansion.
- the diameter of the expansion restricting opening 16A is set to 338 mm.
- the width dimension of the outer peripheral side region 3E whose expansion is restricted by the expansion restricting portion 17 is set to 6 mm, and the width dimension of the inner peripheral side region 3F excluding the outer peripheral side region 3E in the annular portion region 3B is set to 19 mm. Is done.
- the inner peripheral side region 3F in which the expansion is not restricted by the expansion restricting portion 17 in the annular portion region 3B is a region that substantially contributes to the division of the wafer 1. That is, as the width dimension of the inner peripheral region 3F is reduced, the spring constant of the inner peripheral region 3F is increased, so that the tension applied to the wafer 1 from the inner peripheral region 3F can be increased. Therefore, it is preferable that the width dimension of the inner peripheral side region 3F is set according to the number of lines to be divided 5 and the size of the chip 6.
- step S100 of FIG. 5 the frame 4 of the wafer unit 2 is fixed by the frame fixing portion 12 of the expansion restriction ring 16 (fixing step).
- step S110 in FIG. 5 the expanding ring 14 is moved upward in the direction of arrow B from the position in FIG. 1, and expansion of the entire region of the annular portion region 3B is started (expansion step).
- step S120 in FIG. 5 when the upward movement amount of the expand ring 14 exceeds the thickness of the frame 4, the annular portion region 3 ⁇ / b> B comes into contact with the expansion restricting portion 17.
- the annular portion region 3 ⁇ / b> B is located on the outer peripheral side region 3 ⁇ / b> E located on the outer peripheral side and the inner peripheral side with the contact portion 3 ⁇ / b> D contacting the inner edge portion 16 ⁇ / b> B of the expansion restricting portion 17 as a boundary. It is divided into an inner peripheral region 3F. And expansion of the outer peripheral side area
- step S130 in FIG. 5 the expanding movement of the expanding ring 14 is continued, and the expansion of the inner peripheral side region 3F excluding the outer peripheral side region 3E in the annular portion region 3B is continuously performed, whereby the wafer 1 Is divided into individual chips 6 (dividing step). Thereafter, the upward movement of the expanding ring 14 is stopped.
- the length of the annular portion region 3B that contributes to the division of the wafer 1 is shortened from 25 mm (width size of the annular portion region 3B) to 19 mm (width size of the inner peripheral region 3F). Increases inversely with it.
- the spring constant of the inner peripheral region 3F is larger than the spring constant of the annular portion region 3B.
- a tension sufficient to divide the chip 6 can be applied to the wafer 1. Therefore, according to the workpiece dividing apparatus 10A, it is possible to solve the problem of undivided lines to be divided that occurs when the chip size is a small chip (1 mm).
- the inner edge portion 16B of the expansion restricting portion 17 that is in line contact with the adhesive layer in the annular portion region 3B is subjected to surface processing with an arithmetic average roughness (Ra) of 1.6 ( ⁇ m) as an example. .
- Ra arithmetic average roughness
- the inner edge portion 16B is chamfered with C0.2 (0.2 mm Chamber) as an example.
- the expansion restriction ring 16 of the workpiece dividing apparatus 10A includes the frame fixing unit 12 and also has a function of fixing the frame 4, the number of parts of the workpiece dividing apparatus 10A can be reduced.
- the frame 4 can be fixed by the frame fixing portion 12 in the operation of assembling the expansion restriction ring 16 to the workpiece dividing apparatus 10A.
- the expanding ring 14 of the workpiece dividing apparatus 10A is configured in a ring shape having an opening 14A for expansion that surrounds the wafer 1 of the wafer unit 2 fixed to the frame fixing unit 12.
- the expansion restricting portion 17 includes an expansion restricting opening 16 ⁇ / b> A that surrounds the ring-shaped expand ring 14.
- FIG. 6 is a longitudinal sectional view of main parts of a workpiece dividing apparatus 10B according to the second embodiment
- FIG. 7 is an enlarged perspective view of essential parts of the workpiece dividing apparatus 10B.
- the wafer unit processed by the workpiece dividing apparatus 10B the wafer unit 2 on which the wafer 1 having a diameter of 300 mm shown in FIG. 23 is mounted is exemplified.
- the same or similar members as those of the workpiece dividing apparatus 10A shown in FIGS. 1 and 2 will be described with the same reference numerals.
- the difference between the workpiece dividing device 10B of the second embodiment and the workpiece dividing device 10A of the first embodiment is that the frame fixing member 7 (see FIG. 24: existing frame fixing member) and the expansion restriction ring 18 are configured separately.
- the expansion restricting ring 18 is detachably provided to the frame fixing member 7.
- the attachment / detachment structure of the expansion restriction ring 18 with respect to the frame fixing member 7 is not particularly limited, but may be a fastening structure using a bolt as an example, or a clamp structure using a clamp mechanism.
- the frame fixing member 7 is disposed on the same side as the affixing surface of the wafer 1 in the dicing tape 3. Further, the frame fixing member 7 is installed at a position spaced outward from the annular portion region 3B in the in-plane direction of the dicing tape 3 indicated by an arrow A so as not to contact the annular portion region 3B expanded by the expand ring 14.
- the shape of the frame fixing member 7 is a ring shape, but the shape is not particularly limited as long as the expansion restriction ring 18 can be detachably attached.
- the expansion restriction ring 18 includes an expansion restriction opening (opening) 18A that is smaller than the inner diameter (350 mm) of the frame 4 and larger than the outer diameter of the expanding ring 14.
- the diameter of the expansion restricting opening 18A is also 338 mm.
- FIG. 8 is a longitudinal sectional view of the wafer unit 2 showing the shape of the annular portion region 3 ⁇ / b> B being expanded by the expand ring 14.
- the annular portion region 3 ⁇ / b> B is brought into contact with the inner edge portion 18 ⁇ / b> B of the expansion restriction ring 18 when expanded by the expand ring 14.
- the expansion restriction ring 18 restricts the expansion of the outer peripheral side region 3 ⁇ / b> E between the contact portion 3 ⁇ / b> D that contacts the inner edge portion 18 ⁇ / b> B and the inner edge portion of the frame 4 in the annular portion region 3 ⁇ / b> B.
- the frame 4 of the wafer unit 2 is fixed to the frame fixing member 7 via the expansion restricting ring 18 (fixing step).
- the annular portion region 3 ⁇ / b> B comes into contact with the inner edge portion 18 ⁇ / b> B of the expansion restriction ring 18, and is located on the outer peripheral side of the annular portion region 3 ⁇ / b> B.
- the expansion of the outer peripheral side region 3E is regulated (expansion regulation process).
- the annular portion region 3B has an outer peripheral side region 3E positioned on the outer peripheral side and an inner peripheral side region 3F positioned on the inner peripheral side with the contact portion 3D contacting the inner edge 18B as a boundary. And divided.
- the expanding movement of the expanding ring 14 is continued, and the wafer 1 is divided into individual chips 6 by continuing to expand the inner peripheral side region 3F excluding the outer peripheral side region 3E in the annular portion region 3B. (Dividing step). Thereafter, the upward movement of the expanding ring 14 is stopped.
- the expansion restriction ring 18 restricts the expansion of the outer peripheral region 3E while being sandwiched between the frame fixing member 7 and the frame 4. That is, even when the inner diameter (for example, 361 mm) of the frame fixing member 7 is larger than 350 mm, which is the inner diameter of the frame 4, by providing the expansion restriction ring 18 with the expansion restriction opening 18A having a diameter of 338 mm separately. The same effect as when the inner diameter of the frame fixing member 7 is less than 350 mm can be obtained. That is, an effect equivalent to that of the expansion restriction ring 16 (see FIGS. 1 and 2) of the first embodiment can be obtained.
- the expansion restriction rings 18 having different diameters (inner diameters) of the expansion restriction openings 18A are arranged in advance.
- the expansion restricting ring 18 having an inner diameter designated in advance as a processing condition can be selected and used.
- the expansion restriction ring 18 can be retrofitted to an existing (shipped) work dividing apparatus that does not include the expansion restriction ring 18, the existing work dividing apparatus is used to process from a large chip to a small chip. Will be able to.
- the expansion restriction ring 18 can be detached from the existing work dividing device.
- the diameter (inner diameter) of the expansion restricting opening 18A for example, 346 mm, 342 mm, and 334 mm can be exemplified in addition to 338 mm.
- FIG. 9 is a plan view in which the expansion restriction ring 20 having the circular expansion restriction opening 20A and the wafer unit 2 are overlapped.
- the wafer 22 shown in FIG. 9 is a wafer in which the number of the planned dividing lines 5 parallel to the X direction is the same as the number of the planned dividing lines 5 parallel to the Y direction, and the distance between them is the same.
- the shape of 24 is a square having the same dimensions in the X and Y directions. That is, the wafer 22 shown in FIG. 9 is a wafer in which the density of the division planned lines 5 is equal in the X direction and the Y direction.
- the wafer 22 and the expansion restriction opening 20A are circular, and the inner peripheral side region 3F having a donut shape in plan view surrounded by the outer edge of the wafer 22 and the inner edge of the expansion restriction opening 20A is formed in the circumferential direction. It has the same width dimension e in any position of the throat.
- FIG. 10 is a plan view in which the expansion restriction ring 26 having the elliptical expansion restriction opening 26A and the wafer unit 2 are overlapped.
- the wafer 28 shown in FIG. 10 is a wafer in which the number of planned division lines 5 parallel to the Y direction is larger than the number of planned division lines 5 parallel to the X direction, and the shape of the divided chips 30 is X A rectangle with a short dimension in the direction and a long dimension in the Y direction. That is, the wafer 28 shown in FIG. 10 is a wafer in which the density of the division lines 5 (the density of the chips 6) is different between the X direction and the Y direction. When such a wafer 28 is divided smoothly, it is preferable to use an expansion restriction ring 26 whose expansion restriction opening 26A has an elliptical shape.
- the direction of the minor axis a of the ellipse of the expansion restricting opening 26A is parallel to the X direction (the direction in which the density of the chip 30 is high, the direction parallel to the short side of the chip 30) of the division line 5 being high. Accordingly, the direction of the major axis b of the ellipse is aligned in parallel with the Y direction (the direction of low density of the chip 30, the direction parallel to the long side of the chip 30) with the low density of the division line 5.
- the inner peripheral area 3FA located in the direction parallel to the high-density X direction of the division line 5 has a small width dimension and a high spring constant, so that the high-density division line 5 in the X direction has a high density.
- a suitable tension for splitting can be applied to the wafer 28.
- the inner peripheral side region 3FB located in the direction parallel to the low Y direction of the division line 5 has a small width and a small spring constant, but the low division density line 5 in the Y direction is divided.
- a suitable tension can be applied to the wafer 28. Therefore, it is possible to realize a suitable division capability for the wafer 28 in which the density of the division planned lines 5 is different in the X direction and the Y direction.
- the spring constant in the X direction and the spring constant in the Y direction are equal, or a difference occurs between the spring constant in the X direction and the spring constant in the Y direction due to the tape generation direction.
- the expansion restricting opening 20A as shown in FIG. 9 is circular. It is preferable to use the expansion restricting ring 20. Thereby, since the extension amount in the X direction and the extension amount in the Y direction of the inner peripheral side region at the time of expansion become equal, an equal tension can be applied to the wafer from the inner peripheral side region 3F.
- an expansion restriction ring having an elliptical expansion restriction opening 26A as shown in FIG. Preferably 26 is used.
- the direction of the minor axis a of the ellipse is aligned with the X direction having a small spring constant
- the direction of the major axis b of the ellipse is aligned with the Y direction having a large spring constant.
- the graph of FIG. 11 shows the expansion rate (diameter 350 mm) of the annular portion region when the expansion restricting ring is not used and the expansion of the inner peripheral region when the expansion restricting ring is used with respect to the wafer unit 2 of FIG.
- the expansion rate when the diameter of the expansion restricting opening is set to 346 mm, 342 mm, and 338 mm is shown.
- “MD (Machine Direction)” in FIG. 11 is a direction parallel to the feeding direction at the time of manufacturing the dicing tape 3 and having a small spring constant.
- CD (Cross Direction)” is a direction orthogonal to MD and having a large spring constant.
- the expansion rate of the annular region when not using the expansion restriction ring was 6.1% for “MD” and 6.0% for “CD”.
- the expansion rate of the inner peripheral region is 6.8%, 7.5%, 8.4 for “MD”.
- CD it increased to 7.2%, 7.5%, and 8.1%. That is, it was confirmed that as the diameter of the expansion restricting opening was reduced, the chip dividing ability was improved.
- the graph of FIG. 12 shows the chip division rate (diameter 350 mm) when the expansion restriction ring is not used and the chip division ratio when the expansion restriction ring is used for the wafer unit 2 of FIG.
- the division ratio when the diameter of the expansion restricting opening is set to 338 mm is shown.
- the division ratio “with DAF” in FIG. 12 is the division ratio of the chip 6 when the wafer 1 is attached to the dicing tape 3 via the DAF, and the division ratio “without DAF” The division ratio of the chip 6 when the wafer 1 is directly attached to the dicing tape 3.
- the division ratio of the chip 6 was 15.0% when “with DAF” and 41.0% when “without DAF”.
- the split ratio of the tip 6 increases to 61.0% when “with DAF” and 100% when “without DAF”. Rose. In other words, it was confirmed that the division capability of the chip 6 was improved by using the extended restriction ring regardless of whether “DAF is present” or “without DAF”.
- the expansion restriction ring 16 restricts the expansion of the outer peripheral side region 3E and expands only the inner peripheral side region 3F.
- the expansion rate can be increased, and the tension applied to the wafer 1 can be increased. Therefore, it has been confirmed that the undivided problem of the division line 5 that occurs when the chip size is a small chip can be solved.
- FIG. 13 is a cross-sectional view of a main part of a workpiece dividing apparatus 10C according to the third embodiment.
- the difference in structure between the workpiece dividing apparatus 10C in FIG. 13 and the workpiece dividing apparatus 10A shown in FIG. 1 is that a protrusion 34 is provided on the expansion restriction ring 32 of the workpiece dividing apparatus 10C in FIG. .
- a tape position restricting portion is constituted by the tip portion 34A of the ridge 34, and the tip portion 34A is connected to the back surface (tape applying surface) 4A of the frame 4 to which the outer peripheral portion of the dicing tape 3 is fixed (attached). They are arranged on the same plane. That is, the tip end 34A of the ridge 34 constituting the tape position restricting portion is arranged at a position on the same surface as the attaching surface 3G of the dicing tape 3 when the frame 4 is fixed to the expansion restricting ring 32. Yes.
- the tip 34 ⁇ / b> A of the protrusion 34 of the expansion restricting ring 32 is already in contact with the application surface 3 ⁇ / b> G of the dicing tape 3 from the state before the dicing tape 3 is expanded by the expand ring 14. ing. That is, the expansion restriction ring 32 restricts the expansion of the outer peripheral side region 3E of the dicing tape 3 from the state before the expansion of the dicing tape 3 by the expand ring 14.
- the expansion of the inner peripheral side region 3F of the dicing tape can be started immediately after the expanding ring 14 contacts the dicing tape 3. Therefore, according to the workpiece dividing apparatus 10C, the problem of undivided lines to be divided that occurs when the chip size is a small chip is further increased as compared with the case where the extended restriction ring 14 of FIG. It can be solved efficiently.
- the workpiece dividing apparatus 10C of FIG. 13 when the height of the expansion operation end position of the expand ring 14 is the same, the workpiece dividing apparatus 10C of FIG. The expansion amount (tension) of the inner region 3F of the dicing tape 3 is increased as compared with the dividing device 10A. Therefore, according to the workpiece dividing apparatus 10C of FIG. 13, the problem of undivided division lines that occurs when the chip size is a small chip can be further solved.
- the work dividing apparatus 10C of FIG. Compared with the dividing device 10 ⁇ / b> A, the height of the expansion operation end position of the expanding ring 14 can be lowered by the thickness of the frame 4.
- a sufficient expansion amount (tension) can be obtained even with a small upward movement amount of the expanding ring 14, and thus the division that occurs when the chip size is a small chip. The problem of undivided scheduled lines can be solved more efficiently.
- the expansion restriction ring 14 of FIG. 14 when the expansion restriction ring 32 is used as shown in the enlarged cross-sectional view of the main part of the workpiece dividing apparatus 10C shown in FIG. 14, the expansion restriction ring 14 of FIG. Compared with the case where the expansion ring 14 is used, the height of the expansion operation end position of the expand ring 14 can be lowered by the thickness of the frame 4. The division problem can be solved efficiently. Note that, in FIG. 14, the expansion operation end position of the expand ring 14 in the case where the expansion restriction ring 14 that does not include the ridge portion 32 is used is indicated by a two-dot chain line.
- the arithmetic average roughness (Ra) is, as an example, in the distal end portion 34A of the protruding portion 34 of the expansion restriction ring 32, as in the case of the inner edge portion 16B of the expansion restriction ring 14 in FIG.
- Surface processing to 1.6 ( ⁇ m) is performed. This prevents the tip portion 34A and the annular portion region 3B from slipping relatively due to the frictional force between the tip portion 34A and the annular portion region 3B.
- FIG. 15 is a cross-sectional view of a main part of a workpiece dividing apparatus 10D according to the fourth embodiment.
- the difference in structure between the workpiece dividing device 10D of FIG. 15 and the workpiece dividing device 10C shown in FIG. 13 is that the tip portion 38A of the protruding strip portion 38 of the expansion regulating ring 36 of the workpiece dividing device 10D is attached to the dicing tape 3. It exists in the point arrange
- the pasting surface 3G of the dicing tape 3 is already pressed against the tip 38 ⁇ / b> A of the protruding strip 38 of the expansion restricting ring 36 from the state before the dicing tape 3 is expanded by the expand ring 14. ing. That is, the expansion of the outer peripheral side region 3E of the dicing tape 3 from the state before the expansion of the dicing tape 3 by the expanding ring 14 is restricted by the expansion restricting ring 32, and the inner peripheral side region 3F has already been expanded. Therefore, according to the workpiece dividing apparatus 10D, compared to the workpiece dividing apparatus C in FIG. 13, it is possible to more efficiently solve the problem of undivided lines to be divided that occur when the chip size is a small chip.
- the workpiece dividing apparatus 10D of FIG. 15 and the workpiece dividing apparatus 10C of FIG. 13 when the height of the expansion operation end position of the expand ring 14 is the same, the workpiece dividing apparatus 10D of FIG.
- the expansion amount (tension) of the inner region 3F of the dicing tape 3 is increased as compared with the dividing device 10C. Therefore, according to the workpiece dividing apparatus 10D of FIG. 15, the problem of undivided division lines that occurs when the chip size is a small chip can be further solved.
- the work dividing apparatus 10D of FIG. Compared with the dividing device 10 ⁇ / b> C, the height of the expansion operation end position of the expand ring 14 can be lowered by the difference in the protruding length of the protruding line portion 38 relative to the protruding line portion 34.
- the work dividing apparatus 10D of FIG. 15 the problem of undivided lines to be divided that occurs when the chip size is a small chip can be solved more efficiently than the work dividing apparatus 10C of FIG.
- the expansion restriction ring 32 of FIG. Compared with the case of using, the height of the expansion end position of the expanding ring 14 can be shortened by the difference in the protruding length of the protruding strip portion 38 relative to the protruding strip portion 34, and the chip size is reduced by the difference. In this case, the problem of undivided lines to be divided that occurs can be efficiently solved.
- the expansion operation end position of the expand ring 14 in the case where the expansion restriction ring 32 including the ridge portion 32 is used is indicated by a two-dot chain line.
- the arithmetic average roughness (Ra) is, as an example, in the distal end portion 38A of the protruding strip portion 38 of the expansion restriction ring 36, similarly to the inner edge portion 16B of the expansion restriction ring 14 in FIG. Surface processing to 1.6 ( ⁇ m) is performed. This prevents the tip portion 38A and the annular portion region 3B from slipping relatively due to the frictional force between the tip portion 38A and the annular portion region 3B.
- FIG. 17 is an enlarged cross-sectional view of a main part of a workpiece dividing apparatus 10E according to the fifth embodiment.
- an expansion regulating ring 40 is detachably provided on the frame fixing member 7.
- the tip end portion 34 ⁇ / b> A of the ridge 34 is disposed at a position (see FIG. 13) on the same plane as the pasting surface 3 ⁇ / b> G of the dicing tape 3.
- the expansion of the inner peripheral side region 3F of the dicing tape can be started immediately after the expanding ring 14 contacts the dicing tape 3. Therefore, according to the workpiece dividing device 10E, the problem of undivided lines to be divided that occurs when the chip size is a small chip is further increased than when the extended restriction ring 14 of FIG. It can be solved efficiently.
- FIG. 18 is an enlarged cross-sectional view of a main part of a workpiece dividing apparatus 10F according to the sixth embodiment.
- the work dividing apparatus 10F in FIG. 18 is provided with an expansion regulating ring 42 detachably attached to the frame fixing member 7.
- an expansion regulating ring 42 detachably attached to the frame fixing member 7.
- line part 38 is arrange
- the dicing tape 3 is held in an expanded state by fitting an expansion holding ring called a sub-ring into the frame 4 in the subsequent step of the dividing step S130 shown in FIG.
- the extended holding ring is fitted to the frame 4 in a state where the outer peripheral side region 3E is extended.
- the expansion of the outer peripheral side region 3E can be restricted by the tip portions 34A and 38A of the ridges 34 and 38, so that the outer peripheral side region It is possible to prevent the 3E dicing tape 3 from extending and reducing its thickness. Therefore, even when the extended holding ring is attached to the frame 4 in a state where the outer peripheral side region 3E is extended, the outer peripheral side region 3E can be prevented from being broken.
- the thickness of the outer peripheral side region 3E is not reduced. Therefore, in the heat shrinking process of the outer peripheral side region 3E by light heating, the light of the outer peripheral side region 3E Absorption rate increases, and conversion efficiency from light to heat increases. Thereby, the outer peripheral side area
- the expansion rate (%) of the dicing tape 3 is shown on the vertical axis
- the push-up amount (mm) of the annular portion region 3B due to the upward movement of the expand ring 14 is shown on the horizontal axis.
- FIG. 19 also shows that the expansion rate corresponding to the push-up amount differs for each expansion restriction ring 16, 18, 32, 36, 40, 42 as described later. Since the expansion rate by the expansion restriction ring 18 is equal to the expansion rate by the expansion restriction ring 16, the description of the expansion rate by the expansion restriction ring 18 is omitted. Similarly, the expansion rate due to the expansion restriction ring 40 is equal to the expansion rate due to the expansion restriction ring 32, and the expansion rate due to the expansion restriction ring 42 is equal to the expansion rate due to the expansion restriction ring 36. A description of the rate is also omitted.
- a line A in FIG. 19 shows a change in the expansion rate when the expansion restriction ring is not used (the diameter of the expansion restriction opening 16A corresponds to 350 mm).
- Line B shows the change in expansion rate when the expansion restriction ring 16 having a diameter of the expansion restriction opening 16A of 338 mm is applied.
- a line C indicates a change in expansion rate when the expansion restriction ring 32 having a diameter of the expansion restriction opening 32A of 338 mm is applied.
- Line D shows the change in the expansion rate when the expansion restricting ring 36 having the expansion restricting opening 36A having a diameter of 338 mm is applied.
- the protrusion length of the protrusion 34 of the expansion restriction ring 32 is set to 1.5 mm, which is equal to the thickness of the frame 4 as described later, and the protrusion length of the protrusion 38 of the expansion restriction ring 36 is Set to 4.5 mm.
- FIG. 20 is a schematic diagram showing the operation of the expanding ring 14 during the expansion division process.
- FIG. 20 shows the dimensions of each member for calculating the expansion rate of the lines A, B, C, and D shown in FIG.
- the inner diameter D1 of the frame 4 is 350 mm
- the thickness t of the frame 4 is 1.5 mm
- the symbol x in FIG. 20 indicates the push-up amount of the annular portion region 3B due to the upward movement of the expand ring 14.
- a roller 44 for reducing the frictional force with the dicing tape 3 is disposed at the upper end of the expanding ring 14, and the arrangement diameter D3 of the roller 44 is 323.2 mm.
- a symbol d in FIG. 20 indicates the diameter of the roller 44.
- the expansion rate (%) of the line A was calculated with the diameter d of the roller 44 being 5 mm, and the expansion rates (%) of the lines B, C, and D were calculated with the diameter d of the roller 44 being 7 mm.
- the annular portion region 3B is pushed up by the upward movement of the expand ring 14 and comes into contact with the expansion restriction ring 16.
- the expansion rate immediately after the contact is higher than the expansion rate when the expansion restriction ring is not applied (see line A). That is, when the expansion restriction ring 16 is applied, the expansion rate after the push-up amount exceeds about 5.0 mm is higher than the expansion rate when the expansion restriction ring is not applied.
- the tip portion 38 of the ridge portion 38 presses the annular portion region 3B in advance, so that the expansion ring 14 is expanded before contacting the annular portion region 3B.
- the rate is already over 0%. For this reason, when the expansion restriction ring 36 is applied, the expansion rate immediately after the expansion ring 14 contacts the annular portion region 3B becomes higher than the expansion rate when the expansion restriction ring 32 is applied (see line C).
- FIG. 21 shows the rate of increase per unit time of each expansion rate (%) of lines A, B, C, and D shown in FIG. 19 (hereinafter referred to as expansion rate speed (% / sec)). A graph showing the change is shown.
- the expansion rate speed (% / sec) is shown on the left vertical axis
- the push-up speed (mm / sec) of the annular portion region 3B is shown on the right vertical axis
- the ring due to the upward movement of the expand ring 14 is shown.
- the push-up amount (mm) of the partial region 3B is shown on the horizontal axis.
- FIG. 21 shows, as an example, a change in the expansion rate speed when the push-up speed of the annular region 3B is constant. As the expansion rate speed increases, the tension generated in the dicing tape 3 increases and the force for dividing the wafer into chips increases.
- a line E in FIG. 21 shows a change in push-up speed with a push-up amount from 0.00 mm to 20.00 mm.
- the line E indicates the upward moving speed of the expanding ring 14.
- the expanding ring 14 moves up at a constant speed (200 mm / sec) within a range of 0.00 mm to about 18.50 mm, and thereafter moves up to 20.00 mm while decelerating.
- FIG. 21 shows a change in the expansion rate speed corresponding to the expansion rate of line B in FIG. 19 when the expansion regulating ring 16 in which the diameter of the expansion regulating opening 16A is 338 mm is applied.
- a line H in FIG. 21 shows a change in expansion rate speed corresponding to the expansion rate in lines C and D in FIG. 19 when the expansion restriction rings 32 and 36 in which the diameters of the expansion restriction openings 32A and 36A are 338 mm are applied. Is shown.
- the expansion restricting ring 36 When the expansion restricting ring 36 is applied, the annular portion region 3B is preliminarily expanded by the ridge portion 38 before expansion by the expand ring 14, but the expansion rate speed is different from that when the expansion restricting ring 32 is applied. There is no. For this reason, the change of the expansion rate speed when the expansion restriction rings 32 and 36 are applied is indicated by the same line H.
- the speed increases according to the push-up amount, and reaches the maximum (maximum expansion rate speed) when the push-up amount reaches about 18.50 mm. After that, it goes down each.
- the expansion restriction ring 16 when the expansion restriction ring 16 is applied (see the line G), the annular portion region 3B is pushed up by the upward movement of the expanding ring 14 and comes into contact with the expansion restriction ring 16.
- the expansion rate speed immediately after the contact becomes higher than the expansion rate speed when the expansion restriction ring is not applied (see the line F).
- the expansion rate speed after the pushing amount exceeds about 4.00 mm becomes higher than the expansion rate speed when the expansion restriction ring is not applied, and the maximum expansion rate speed is applied to the expansion restriction ring. It increases more than the case where it does not (increase from about 95% / sec to about 115% / sec).
- the expansion restricting ring 16 by applying the expansion restricting ring 16, the amount of expansion of the dicing tape 3 is increased (see FIG. 19) and the maximum expansion rate speed is increased to the dicing tape 3 as compared with the case where the expansion restricting ring is not applied. Since the generated tension increases, it is possible to solve the problem of undivided lines to be divided that occurs when the chip size is a small chip.
- the dicing tape 3 increases in the amount of expansion (see FIG. 19) and increases the maximum expansion rate speed as compared with the case where the expansion restricting ring is not applied. Since the tension generated in 3 increases, the above-described undivided problem can be solved.
Abstract
Description
図1は、第1実施形態に係るワーク分割装置10Aの要部縦断面図であり、図2は、ワーク分割装置10Aの要部拡大斜視図である。なお、ワーク分割装置10Aによって分割処理されるウェーハユニットのサイズは限定されるものではないが、実施形態では、図23に示した直径300mmのウェーハ1がマウントされたウェーハユニット2を例示する。 [
FIG. 1 is a longitudinal sectional view of a main part of a
図6は、第2実施形態に係るワーク分割装置10Bの要部縦断面図であり、図7は、ワーク分割装置10Bの要部拡大斜視図である。なお、ワーク分割装置10Bによって処理されるウェーハユニットについても、図23に示した直径300mmのウェーハ1がマウントされたウェーハユニット2を例示する。また、図1、図2に示したワーク分割装置10Aと同一又は類似の部材については同一の符号を付して説明する。 [
FIG. 6 is a longitudinal sectional view of main parts of a
一方、分割予定ライン5の密度の低いY方向と平行な方向に位置する内周側領域3FBは、幅寸法は小さくならずバネ定数は小さいが、密度の低いY方向の分割予定ライン5を分割するための好適な張力をウェーハ28に付与することができる。よって、X方向とY方向において分割予定ライン5の密度が異なるウェーハ28に対して好適な分割能力を実現することができる。 As a result, the inner peripheral area 3FA located in the direction parallel to the high-density X direction of the
On the other hand, the inner peripheral side region 3FB located in the direction parallel to the low Y direction of the
図13は、第3実施形態に係るワーク分割装置10Cの要部断面図である。 [
FIG. 13 is a cross-sectional view of a main part of a
図15は、第4実施形態に係るワーク分割装置10Dの要部断面図である。 [
FIG. 15 is a cross-sectional view of a main part of a
図17は、第5実施形態に係るワーク分割装置10Eの要部拡大断面図である。 [
FIG. 17 is an enlarged cross-sectional view of a main part of a
図18は、第6実施形態に係るワーク分割装置10Fの要部拡大断面図である。 [
FIG. 18 is an enlarged cross-sectional view of a main part of a
Claims (8)
- ワークの外径よりも大きい内径を有するリング状フレームにダイシングテープの外周部が固定され、前記ダイシングテープに貼付された前記ワークを分割予定ラインに沿って個々のチップに分割するワーク分割装置において、
前記ダイシングテープにおける前記ワークの貼付面と反対側の裏面側に配置され、前記リング状フレームの内径よりも小さく、かつ前記ワークの外径よりも大きいリング状に形成され、前記ダイシングテープの裏面を押圧して前記ダイシングテープを拡張させるエキスパンドリングと、
前記ダイシングテープにおける前記ワークの貼付面と同一側に配置され、前記リング状フレームの内径よりも小さく、かつ前記エキスパンドリングの外径よりも大きい開口部を有するリング状に形成され、前記エキスパンドリングによる前記ダイシングテープの拡張の際に前記ダイシングテープが当接される拡張規制リングと、
を備える、ワーク分割装置。 In a workpiece dividing apparatus in which an outer peripheral portion of a dicing tape is fixed to a ring-shaped frame having an inner diameter larger than the outer diameter of the workpiece, and the workpiece pasted on the dicing tape is divided into individual chips along a planned division line.
The dicing tape is disposed on the back side opposite to the work sticking surface, and is formed in a ring shape smaller than the inner diameter of the ring-shaped frame and larger than the outer diameter of the work. An expanding ring that presses and expands the dicing tape;
The dicing tape is arranged on the same side as the work sticking surface, is formed in a ring shape having an opening smaller than the inner diameter of the ring-shaped frame and larger than the outer diameter of the expanding ring, and is based on the expanding ring. An expansion regulating ring against which the dicing tape comes into contact when the dicing tape is expanded,
A workpiece dividing device. - 前記拡張規制リングは、前記エキスパンドリングによる前記ダイシングテープの拡張の際に、前記ダイシングテープに当接するテープ位置規制部を有し、
前記テープ位置規制部は、前記リング状フレームの前記ダイシングテープが貼付されたテープ貼付面と同一面上、又は前記同一面よりも前記エキスパンドリングが配置される側に配置される、請求項1に記載のワーク分割装置。 The expansion restricting ring has a tape position restricting portion that comes into contact with the dicing tape when the dicing tape is expanded by the expanding ring.
The said tape position control part is arrange | positioned on the same surface as the tape sticking surface where the said dicing tape of the said ring-shaped frame was stuck, or the side by which the said expanded ring is arrange | positioned rather than the said same surface. The workpiece dividing device described. - 前記拡張規制リングは、前記リング状フレームに固定されるフレーム固定部と、前記拡張規制リングの前記開口部の周縁部に沿って前記ダイシングテープに向けて突出した凸条部と、を備え、
前記テープ位置規制部は、前記凸条部の先端部によって構成される、請求項2に記載のワーク分割装置。 The expansion restriction ring includes a frame fixing portion that is fixed to the ring-shaped frame, and a protrusion that protrudes toward the dicing tape along a peripheral edge portion of the opening of the expansion restriction ring,
The work dividing apparatus according to claim 2, wherein the tape position restricting portion is configured by a tip portion of the ridge portion. - 前記拡張規制リングには、前記ダイシングテープにおける前記ワークの貼付面と同一側に配置されたフレーム固定部であって、前記リング状フレームに当接して前記リング状フレームを固定するフレーム固定部が備えられる、請求項1に記載のワーク分割装置。 The expansion restricting ring includes a frame fixing portion that is disposed on the same side of the dicing tape as the work attachment surface, and that is fixed to the ring-shaped frame in contact with the ring-shaped frame. The workpiece dividing device according to claim 1, wherein
- 前記拡張規制リングは、前記ダイシングテープにおける前記ワークの貼付面と同一側に配置されたフレーム固定部材であって、前記拡張規制リングを介して前記リング状フレームを固定するフレーム固定部材に着脱自在に固定される、請求項1に記載のワーク分割装置。 The expansion restricting ring is a frame fixing member disposed on the same side as the work attachment surface of the dicing tape, and is detachably attached to a frame fixing member that fixes the ring-shaped frame via the expansion restricting ring. The work dividing apparatus according to claim 1, which is fixed.
- 前記拡張規制リングの前記開口部は円形に形成される、請求項1から5のいずれか1項に記載のワーク分割装置。 The work dividing apparatus according to any one of claims 1 to 5, wherein the opening of the expansion restriction ring is formed in a circular shape.
- 前記拡張規制リングの前記開口部は楕円形に形成される、請求項1から5のいずれか1項に記載のワーク分割装置。 The work dividing apparatus according to any one of claims 1 to 5, wherein the opening of the expansion restriction ring is formed in an elliptical shape.
- ワークの外径よりも大きい内径を有するリング状フレームにダイシングテープの外周部が固定され、前記ダイシングテープに貼付された前記ワークを分割予定ラインに沿って個々のチップに分割するワーク分割方法において、
前記ダイシングテープを押圧して前記ダイシングテープを拡張することにより前記ダイシングテープに張力を発生させる拡張工程と、
前記ダイシングテープの拡張の際に前記ダイシングテープのうち外周側に位置する外周側領域の拡張を規制する拡張規制工程と、
前記外周側領域を除く前記ダイシングテープの拡張を継続して前記ワークを個々のチップに分割する分割工程と、
を備える、ワーク分割方法。 In the work dividing method in which the outer peripheral portion of the dicing tape is fixed to a ring-shaped frame having an inner diameter larger than the outer diameter of the work, and the work attached to the dicing tape is divided into individual chips along the division line.
An expansion step of generating tension in the dicing tape by expanding the dicing tape by pressing the dicing tape;
An expansion regulating step for regulating expansion of the outer peripheral side region located on the outer peripheral side of the dicing tape when the dicing tape is expanded;
A dividing step of dividing the work into individual chips by continuing to expand the dicing tape excluding the outer peripheral region;
A work dividing method comprising:
Priority Applications (5)
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KR1020227010904A KR102434738B1 (en) | 2016-10-28 | 2017-10-24 | Workpiece dividing device and workpiece dividing method |
JP2018547681A JP6920629B2 (en) | 2016-10-28 | 2017-10-24 | Work dividing device and work dividing method |
CN201780066523.8A CN109891556B (en) | 2016-10-28 | 2017-10-24 | Workpiece dividing device and workpiece dividing method |
KR1020197011634A KR102246098B1 (en) | 2016-10-28 | 2017-10-24 | Work splitting device and work splitting method |
KR1020217012222A KR102383560B1 (en) | 2016-10-28 | 2017-10-24 | Workpiece dividing device and workpiece dividing method |
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JP (3) | JP6920629B2 (en) |
KR (3) | KR102246098B1 (en) |
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KR20190067816A (en) | 2019-06-17 |
JP2021168419A (en) | 2021-10-21 |
KR20210048592A (en) | 2021-05-03 |
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CN109891556B (en) | 2022-11-22 |
JP7214958B2 (en) | 2023-01-31 |
KR102383560B1 (en) | 2022-04-08 |
JP6920629B2 (en) | 2021-08-25 |
KR102246098B1 (en) | 2021-04-29 |
KR20220046708A (en) | 2022-04-14 |
CN109891556A (en) | 2019-06-14 |
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JPWO2018079536A1 (en) | 2019-10-03 |
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