WO2017177584A1 - 一种用于制造显示面板的方法、显示面板以及显示装置 - Google Patents
一种用于制造显示面板的方法、显示面板以及显示装置 Download PDFInfo
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- WO2017177584A1 WO2017177584A1 PCT/CN2016/093258 CN2016093258W WO2017177584A1 WO 2017177584 A1 WO2017177584 A1 WO 2017177584A1 CN 2016093258 W CN2016093258 W CN 2016093258W WO 2017177584 A1 WO2017177584 A1 WO 2017177584A1
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- substrate
- alignment layer
- display panel
- peripheral portion
- optical radiation
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
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Images
Classifications
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133723—Polyimide, polyamide-imide
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1262—Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/50—Protective arrangements
Definitions
- the present disclosure relates to the field of display technology, and in particular, to a method for manufacturing a display panel, a display panel, and a display device.
- TFT-LCD Thin film transistor display
- CCFL cold cathode diode
- the frame of the panel is continuously narrowed to enhance the visual beautification, but the narrowing of the frame causes the outer edge of the orientation layer to be exposed to the outside of the sealant to contact other molecules such as water molecules in the environment. This has an adverse effect.
- Embodiments of the present disclosure provide a method for manufacturing a display panel, which can effectively prevent external molecules such as water molecules and the like from entering an inside of a display panel through an edge portion of an alignment layer that overlaps with a sealant, thereby improving a display panel (especially It is the display quality of a display panel with a narrow bezel or a very narrow bezel design.
- One aspect of the present disclosure provides a method for manufacturing a display panel, wherein the display The display panel includes a first substrate, and the manufacturing method includes: forming a first alignment layer on the first substrate, wherein the first alignment layer includes a peripheral portion on a frame region of the first substrate and is located at the a central portion of the substrate on the active region surrounded by the bezel region; and processing the peripheral portion of the first alignment layer to eliminate reactive functional groups in the material of the peripheral portion.
- the first alignment layer includes polyimide.
- the first alignment layer is oriented before or after the processing.
- the processing includes at least one of heat treatment and optical radiation.
- the processing is performed by the optical radiation.
- the active region of the first alignment layer is protected from being irradiated by a mask while performing the light irradiation.
- the light source employs the same light source as that used to orient the alignment layer.
- the optical radiation employs a polarized light source.
- the optical radiation is performed twice and the light source employed by the optical radiation is rotated 90 degrees relative to the first substrate between the two optical radiations.
- the optical radiation uses ultraviolet light.
- the power of the ultraviolet light ranges from 100 to 1000 mJ/cm 2 .
- a second alignment layer is formed on a second substrate, wherein the second alignment layer includes a peripheral portion on a bezel area of the second substrate and the second substrate is described a central portion of the active area surrounding the bezel area;
- the peripheral portion of the second alignment layer is treated to eliminate reactive functional groups in the material of the peripheral portion.
- a sealant is applied on a bezel area of at least one of the first substrate and the second substrate; and the first substrate and the second are passed through the sealant The substrates are brought together.
- one of the first substrate and the second substrate is a TFT substrate, and the other of the first substrate and the second substrate is a CF substrate.
- an outer edge of the peripheral portion of at least one of the first and second alignment layers is exposed.
- a display panel including: a first substrate; a first alignment layer formed on the first substrate, wherein the first alignment layer includes a bezel area on the first substrate A peripheral portion on the upper portion and a central portion on the active region of the first substrate surrounded by the bezel region, wherein reactive functional groups in the material of the peripheral portion of the first alignment layer are eliminated.
- the central portion of the first alignment layer is oriented.
- the display panel further includes a second substrate; and a second alignment layer formed on the second substrate, wherein the second alignment layer includes a peripheral portion on a bezel area of the second substrate And a central portion on the active region of the second substrate surrounded by the bezel region, wherein a reactive functional group in a material of the peripheral portion of the second alignment layer is eliminated, wherein the first substrate And the second substrate is disposed by a frame seal glue located on the frame area.
- one of the first substrate and the second substrate is a TFT substrate, and the other of the first substrate and the second substrate is a CF substrate.
- an outer edge of the peripheral portion of at least one of the first and second alignment layers is exposed.
- Yet another aspect of the present disclosure provides a display device including the above display panel.
- Figure 1 shows a structural view of a display panel
- FIG. 2 illustrates the basic principles of the invention
- 3(a) to 3(d) illustrate a method of manufacturing a display panel according to an embodiment of the present invention.
- the terms “a”, “the”, “the” The terms “comprising,” “comprising,” “comprising,” “comprising,”
- the terms “upper”, “lower”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom” and their derivatives shall relate to The invention in which the direction is marked.
- the terms “overlay”, “on top of”, “positioned on” or “positioned on top of” mean that a first element, such as a first structure, exists in a second element, such as a second structure. Above, wherein an intermediate element such as an interface structure may exist between the first element and the second element.
- Fig. 1 shows a structural view of a display panel.
- the display panel includes a color film (CF) substrate 1, a TFT substrate 2, an alignment layer 3 including an alignment material such as polyimide, and a sealant 4. Since the display panel adopts a narrow bezel design, the outer edge of the alignment layer is exposed to the external environment and cannot be protected by the sealant.
- the environmental molecules 5 in the external environment enter the interior of the display panel through the outer edge of the alignment layer, as shown in the entry path 6, thereby adversely affecting. For example, if water molecules in the external environment enter the inside of the display panel along the path 6, the display of the peripheral area of the display panel may be abnormal, for example, the Mura problem.
- the inventors of the present disclosure have conducted extensive research. It has been found that since the material used for the alignment layer is usually an organic material, the reactive functional groups generated during the formation of the alignment layer are the main reason for forming the entry path 6. Thus, by eliminating the reactive functional groups of the alignment layer in the peripheral region, the formation of the entry path 6 can be effectively prevented, thereby solving the above problems.
- Figure 2 further illustrates the basic principles of the invention.
- the left side view of FIG. 2 shows a reactive functional group present in an alignment material such as polyimide of an alignment layer.
- the reactive functional group is typically located in the molecular chain of the oriented material.
- the reactive functional group is a residual reactive functional group which is generated when the alignment layer is formed.
- the reactive functional group is cleaved or closed by treatment such as heating or light irradiation, thereby removing the reactive functional group as shown in the right side view of FIG.
- the external environmental molecules cannot pass through the reactive functional groups, that is, they cannot enter the active region (ie, the display region). This meets the requirements of extremely narrow frame design and further enhances the quality of the product.
- embodiments of the present disclosure provide a manufacturing method for a display panel, wherein the display panel includes a first substrate, the manufacturing method including: forming a first orientation on the first substrate a layer, wherein the first alignment layer includes a peripheral portion on the bezel area of the first substrate and a central portion on the active area surrounded by the bezel area of the first substrate; and processing a peripheral portion of the first alignment layer to eliminate the periphery Part of the reactive functional group in the material.
- FIG. 3 illustrates a method of fabricating a display panel in accordance with an embodiment of the present disclosure.
- an alignment layer is provided on a substrate, and the substrate may be any of a TFT substrate and a color filter (CF) substrate.
- the alignment layer comprises polyimide.
- a substrate according to an embodiment of the present disclosure may be defined to include a bezel area and an active area surrounded by the bezel area, for example, a display area. Accordingly, the alignment layer includes a peripheral portion on the bezel area of the substrate and a central portion on the active area of the substrate.
- orientation processing can include conventional rubbing or light orientation as is conventional in the art.
- the peripheral portion of the first alignment layer is treated to eliminate the reactive functional groups in the material of the peripheral portion.
- Such treatment includes at least one of heat treatment and optical radiation.
- the photoirradiation treatment is preferred since the heat treatment typically only achieves a portion of the reactive functional group closure.
- optical radiation enables it to be directly closed; Photosensitive reactive functional groups, which are capable of cleavage by optical radiation, and the broken functional groups are subsequently volatilized.
- the embodiment of the present disclosure is not particularly limited thereto, and ultraviolet (UV) light is preferable.
- the power of the ultraviolet light ranges from 100 to 1000 mJ/cm 2 .
- the light source employed for the optical radiation treatment includes a polarized light source or a non-polarized light source.
- a non-polarized light source is preferable.
- a polarized light source e.g., a linearly polarized light source
- two optical radiations are applied, and between the two optical radiations, the light source and substrate are rotated 90 degrees relative to one another.
- a radiation scan may be performed first, followed by a second radiation scan after the substrate is rotated 90 degrees.
- the optical radiation treatment for eliminating the reactive functional group preferably employs the same light source as that used when orienting the alignment layer.
- the light source is an ultraviolet polarized light source.
- the active region of the first alignment layer is protected from being irradiated by the mask while performing the above-described optical radiation, thereby avoiding an adverse effect of the optical radiation on the orientation of the alignment layer.
- Fig. 3(c) shows the case when the optical radiation treatment is performed using a mask.
- the above-described treatment for eliminating the reactive functional group can also be carried out before the orientation treatment of the alignment layer as long as the treatment is not adversely affected or the effect is negligible. This can be easily achieved, for example, by protecting the central region of the alignment layer by using a mask at the time of light irradiation.
- the method according to an embodiment of the present disclosure further includes: forming another alignment layer on another substrate (this step is not shown), wherein the other alignment layer includes a border on the other substrate a peripheral portion on the region and a central portion on the active region of the other substrate surrounded by the bezel region; and the peripheral portion of the other alignment layer is treated to eliminate reactive functional groups in the material of the peripheral portion.
- the other substrate is another one of a TFT substrate and a color film (CF) substrate. That is, if the previously described substrate is a TFT substrate, the other substrate is a color film substrate; if the previously described substrate is a color film substrate, the other substrate is a TFT substrate.
- the method according to an embodiment of the present disclosure further includes The sealant is applied to the frame region of at least one of the two substrates, and then the two substrates are paired together by the sealant.
- the sealant is cured.
- the curing preferably comprises: first performing photocuring to cure the photosensitive component in the sealant, for example, partially curing the sealant by short-time irradiation of light; then performing heat treatment in the furnace to completely cure the uncured sealant. To complete the boxing process.
- the outer edges of the peripheral portions of at least one of the alignment layers respectively formed on the above two substrates are exposed as shown in FIG. 3(d).
- an embodiment of the present disclosure further provides a display panel including: a substrate; an alignment layer formed on the substrate, wherein the alignment layer includes a peripheral portion on the frame region of the substrate and is surrounded by the frame region of the substrate A central portion on the source region in which the reactive functional groups in the material of the peripheral portion of the alignment layer are eliminated.
- the central portion of the alignment layer is oriented.
- the display panel further includes another substrate; and another alignment layer formed on the other substrate, wherein the other alignment layer includes a peripheral portion on a bezel area of the other substrate and A central portion on the active region of the other substrate surrounded by the bezel region, wherein the reactive functional groups in the material of the peripheral portion of the other alignment layer are eliminated.
- the two substrates are arranged by a frame seal glue located on a frame area of the two substrates
- one of the two substrates is a TFT substrate, and the other is a CF substrate.
- outer edges of peripheral portions of at least one of the alignment layers respectively formed on the above two substrates are exposed.
- inventions of the present disclosure also provide a display device including the above display panel.
- the display device includes, but is not limited to, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like, or any product or component having a display function.
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Abstract
Description
Claims (22)
- 一种用于显示面板的制造方法,其中所述显示面板包括第一基板,所述制造方法包括:在第一基板上形成第一取向层,其中所述第一取向层包括位于所述第一基板的边框区域上的周边部分和位于所述第一基板的被所述边框区域围绕的有源区域上的中心部分;以及处理所述第一取向层的所述周边部分以消除所述周边部分的材料中的活性官能团。
- 根据权利要求1所述的方法,其中,所述第一取向层包括聚酰亚胺。
- 根据权利要求1所述的方法,其中,在所述处理之前或之后对所述第一取向层进行定向。
- 根据权利要求1或3所述的方法,其中,所述处理包括热处理和光辐射中的至少一种。
- 根据权利要求4所述的方法,其中,通过所述光辐射进行所述处理。
- 根据权利要求5所述的方法,其中,在进行所述光辐射时通过掩模保护所述第一取向层的所述有源区域不被辐射。
- 根据权利要求5所述的方法,其中,所述光辐射采用的光源与定向取向层时采用的光源相同。
- 根据权利要求5所述的方法,其中,所述光辐射采用偏振光源。
- 根据权利要求8所述的方法,其中,进行两次所述光辐射以及在两次所述光辐射之间将所述光辐射采用的光源相对于所述第一基板旋转90度。
- 根据权利要求5所述的方法,其中,所述光辐射使用紫外光。
- 根据权利要求10所述的方法,其中,所述紫外光的功率范围为100到1000mJ/cm2。
- 根据权利要求1所述的方法,其中,在第二基板上形成第二取向层,其中所述第二取向层包括位于所述第二基板的边框区域上的周边部分和位于所述第二基板的被所述边框区域围绕的有源区域上的中心部分;以 及处理所述第二取向层的所述周边部分以消除所述周边部分的材料中的活性官能团。
- 根据权利要求1所述的方法,其中,在所述第一基板和所述第二基板中至少一者的边框区域上施加封框胶;以及通过所述封框胶将所述第一基板和所述第二基板对盒到一起。
- 根据权利要求1所述的方法,其中,所述第一基板和所述第二基板中的一个为TFT基板,以及所述第一基板和所述第二基板中的另一个为CF基板。
- 根据权利要求1所述的方法,其中,在所述边框区域中,所述第一和第二取向层中的至少一个的所述周边部分的外边缘被暴露。
- 一种显示面板,包括:第一基板;形成在所述第一基板上的第一取向层,其中所述第一取向层包括位于所述第一基板的边框区域上的周边部分和位于所述第一基板的被所述边框区域围绕的有源区域上的中心部分,其中所述第一取向层的所述周边部分的材料中的活性官能团被消除。
- 根据权利要求16所述的显示面板,其中,所述第一取向层包括聚酰亚胺。
- 根据权利要求16所述的显示面板,其中,所述第一取向层的所述中心部分被定向。
- 根据权利要求16所述的显示面板,其中,还包括第二基板;以及形成在第二基板上的第二取向层,其中所述第二取向层包括位于所述第二基板的边框区域上的周边部分和位于所述第二基板的被所述边框区域围绕的有源区域上的中心部分,其中所述第二取向层的所述周边部分的材料中的活性官能团被消除,其中所述第一基板和所述第二基板通过位于所述边框区域上的封框胶对合设置。
- 根据权利要求19所述的显示面板,其中,所述第一基板和所述第 二基板中的一个为TFT基板,以及所述第一基板和所述第二基板中的另一个为CF基板。
- 根据权利要求19所述的显示面板,其中,在所述边框区域中,所述第一和第二取向层中的至少一个的所述周边部分的外边缘被暴露。
- 一种显示装置,其中,包括权利要求16-21中任一项所述的显示面板。
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JPH11149080A (ja) * | 1997-11-17 | 1999-06-02 | Matsushita Electric Ind Co Ltd | 液晶表示装置の製造方法 |
CN101498858A (zh) * | 2009-03-05 | 2009-08-05 | 福建华映显示科技有限公司 | 彩色滤光基板与液晶显示面板的制作方法 |
US20110205470A1 (en) * | 2010-02-23 | 2011-08-25 | Samsung Mobile Display Co., Ltd. | Flat panel display and method of manufacturing the same |
CN103955084A (zh) * | 2014-03-31 | 2014-07-30 | 京东方科技集团股份有限公司 | 一种显示面板及其制备方法、显示装置 |
CN104238194A (zh) * | 2014-09-15 | 2014-12-24 | 上海天马微电子有限公司 | 一种显示面板及其制造方法 |
CN105700208A (zh) * | 2016-04-13 | 2016-06-22 | 京东方科技集团股份有限公司 | 一种用于制造显示面板的方法、显示面板以及显示装置 |
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JP2001083532A (ja) * | 1999-09-10 | 2001-03-30 | Canon Inc | 液晶素子 |
US20130120722A1 (en) * | 2011-11-14 | 2013-05-16 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Method and system for forming alignment film region through uv light exposure |
CN104345501B (zh) * | 2013-08-05 | 2018-01-19 | 北京京东方光电科技有限公司 | 制备窄边框显示装置的方法 |
CN103406302B (zh) * | 2013-08-23 | 2015-08-12 | 深圳市华星光电技术有限公司 | 基于紫外线的清洗方法及清洗装置 |
KR102426386B1 (ko) * | 2014-04-18 | 2022-07-27 | 스미또모 가가꾸 가부시키가이샤 | 패턴 편광 필름 및 그의 제조 방법 |
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CN101498858A (zh) * | 2009-03-05 | 2009-08-05 | 福建华映显示科技有限公司 | 彩色滤光基板与液晶显示面板的制作方法 |
US20110205470A1 (en) * | 2010-02-23 | 2011-08-25 | Samsung Mobile Display Co., Ltd. | Flat panel display and method of manufacturing the same |
CN103955084A (zh) * | 2014-03-31 | 2014-07-30 | 京东方科技集团股份有限公司 | 一种显示面板及其制备方法、显示装置 |
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CN105700208A (zh) * | 2016-04-13 | 2016-06-22 | 京东方科技集团股份有限公司 | 一种用于制造显示面板的方法、显示面板以及显示装置 |
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