WO2017156898A1 - 一种彩膜基板的制作方法以及彩膜基板、液晶显示面板 - Google Patents

一种彩膜基板的制作方法以及彩膜基板、液晶显示面板 Download PDF

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WO2017156898A1
WO2017156898A1 PCT/CN2016/085466 CN2016085466W WO2017156898A1 WO 2017156898 A1 WO2017156898 A1 WO 2017156898A1 CN 2016085466 W CN2016085466 W CN 2016085466W WO 2017156898 A1 WO2017156898 A1 WO 2017156898A1
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black matrix
color
resist pattern
color resist
substrate
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PCT/CN2016/085466
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English (en)
French (fr)
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杨红
石岩昌
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武汉华星光电技术有限公司
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Priority to US15/313,090 priority Critical patent/US20180173046A1/en
Publication of WO2017156898A1 publication Critical patent/WO2017156898A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a method for fabricating a color filter substrate, and a color film substrate and a liquid crystal display.
  • next-generation mobile display technologies are moving toward high image quality, high resolution, thinness and low power consumption.
  • LTPS Low Temperature Poly-silicon technology is popular among consumers for its superior high image quality, high resolution, ultra-lightweight and low power consumption.
  • LTPS technology is gradually replacing traditional a-Si TFT technology has become the mainstream of next-generation display technology.
  • the technical problem to be solved by the present invention is to provide a method for fabricating a color film substrate, a color film substrate, a liquid crystal display panel flip chip and a packaging method thereof, which can simplify the manufacturing process and increase the production capacity.
  • a technical solution adopted by the present invention is to provide a method for fabricating a color film substrate, which is characterized in that:
  • the black matrix is used to define a plurality of spaced color resist regions; forming a color resist pattern on the color resist regions; forming an alignment layer on the color resist pattern and the black matrix to utilize the alignment layer Fill the trench between the color resist patterns.
  • forming the color resist pattern on the color resisting region comprises: setting the color resist pattern to protrude from the black matrix, and the color resist pattern partially overlapping the black matrix.
  • the method further includes: forming a support pillar spaced apart from the color resist pattern on the black matrix;
  • the step of forming the alignment layer on the color resist pattern and the black matrix further includes:
  • the support column is covered with the alignment layer.
  • the step of forming an alignment layer on the color resist pattern and the black matrix includes:
  • the alignment layer is placed in direct contact with the color resist pattern and the black matrix.
  • the present invention further provides a color filter substrate, comprising: a substrate; a black matrix on the substrate; and a color resistance of a plurality of spaced color resist regions defined by a black matrix on the substrate pattern;
  • the color resist pattern protrudes from the black matrix and partially overlaps the black matrix.
  • the utility model further comprises a support column disposed on the black matrix spaced apart from the color resist pattern for supporting the substrate, and the orientation layer covers the support column.
  • the color resist pattern includes three color resists of red, green and blue which are arranged at intervals.
  • the material of the black matrix is a black conductive photosensitive polymer resin mixture.
  • the present invention further provides a liquid crystal display panel, comprising: an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate;
  • the color film substrate includes:
  • a substrate a black matrix on the substrate; a color resist pattern of a plurality of spaced color resist regions defined by a black matrix on the substrate; and an alignment layer on the color resist pattern and the black matrix for filling the color resist pattern and The groove between the black matrices.
  • the color resist pattern protrudes from the black matrix and partially overlaps the black matrix.
  • the utility model further comprises a support column disposed on the black matrix spaced apart from the color resist pattern for supporting the substrate, and the orientation layer covers the support column.
  • the color resist pattern includes three color resists of red, green and blue which are arranged at intervals.
  • the material of the black matrix is a black conductive photosensitive polymer resin mixture.
  • the invention has the beneficial effects that the color film substrate and the liquid crystal display panel of the present invention are formed by directly forming an alignment layer on the color resist pattern and the black matrix, which is different from the prior art.
  • the alignment layer fills the trench between the color resist patterns without the need to make a flat layer, thereby reducing a process and increasing production capacity.
  • FIG. 1 is a flow chart of an embodiment of a method for fabricating a color filter substrate of the present invention
  • FIG. 2 is a schematic structural view of an embodiment of a color filter substrate of the present invention.
  • FIG. 3 is a schematic structural view of an embodiment of a liquid crystal display panel of the present invention.
  • the present invention provides a method of fabricating a color filter substrate.
  • the invention will be further described in detail below with reference to the drawings and embodiments.
  • FIG. 1 is a flowchart of an embodiment of a method for fabricating a color filter substrate according to an embodiment of the present invention.
  • the method specifically includes the following steps:
  • S10 provides a substrate;
  • the substrate may be made of glass, plastic, etc., and is not specifically limited herein;
  • S20 forms a black matrix on the substrate, and the black matrix is used to define a plurality of spaced color resist regions;
  • the black matrix is an opaque portion deposited between the color resist patterns. Its main function is to prevent background light leakage, improve display contrast, prevent color mixing and increase color purity. Since the optical density of the black matrix is required to be 3 or more, a resin resist containing a black dye can also be used by sputtering a chromium layer on the substrate glass and then etching out a desired pattern.
  • S40 forms an alignment layer on the color resist pattern and the black matrix to fill the trench between the color resist patterns by the alignment layer.
  • forming the color resist pattern on the color resistive region of S30 comprises: setting the color resist pattern to protrude from the black matrix, and partially overlapping the black resist pattern to avoid background light leakage.
  • the method further includes: forming a support pillar spaced apart from the color resist pattern on the black matrix; and covering the support pillar with the alignment layer.
  • the step of forming the alignment layer on the color resist pattern and the black matrix by S40 comprises: disposing the alignment layer in direct contact with the color resist pattern and the black matrix.
  • the trench between the color resist patterns is filled by the alignment layer without further forming a flat layer. This reduces a process and increases production capacity.
  • FIG. 2 is a schematic structural diagram of an embodiment of a color filter substrate according to an embodiment of the present invention.
  • a substrate 10 which may be made of glass or plastic;
  • the black matrix 20 on the substrate 10 is an opaque portion deposited between the color resist patterns, its main function is to prevent background light leakage, improve display contrast, prevent color mixing and increase color purity. Since the optical density of the black matrix 20 is required to be 3 or more, a resin resist containing a black dye may be used by sputtering a chromium layer on the substrate glass and then lithographically patterning the desired pattern;
  • the material of the black matrix 20 is a black conductive photosensitive polymer resin mixture
  • the color resist pattern 30 includes three color resists of red, green and blue which are arranged at intervals.
  • a support pillar 50 disposed on the black matrix 20 spaced apart from the color resist pattern 30 for supporting the substrate 10 and the alignment layer 40 covering the support pillar 50 is further included.
  • the alignment layer 40 directly on the color resist pattern 30 and the black matrix 20
  • the trench between the color resist patterns 30 is filled by the alignment layer 40 without the need to provide a flat layer. , thereby simplifying the structure of the color film substrate, reducing a process and increasing production capacity.
  • the present invention further provides a liquid crystal display panel comprising an array substrate 41, a color filter substrate 42, and a liquid crystal layer 43 disposed between the array substrate and the color filter substrate.
  • the specific structure and manufacturing method of the color filter substrate 42 are similar to the above-described embodiment of the color filter substrate. For details, refer to the embodiment of the color film substrate and the related description in the preferred embodiment.
  • the color filter substrate 42 forms an alignment layer directly on the color resist pattern and the black matrix to fill the trench between the color resist patterns by using the alignment layer without further setting a flat layer.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Filters (AREA)

Abstract

一种彩膜基板的制作方法以及彩膜基板、液晶显示面板，其制作方法包括：提供一基板（10）；在基板（10）形成黑矩阵（20），黑矩阵（20）用于定义多个间隔设置的色阻区域；在色阻区域上形成色阻图案（30）；在色阻图案（30）以及黑矩阵（20）上形成取向层（40），以利用取向层（40）填补色阻图案（30）之间的沟槽。通过直接在色阻图案（30）以及黑矩阵（20）上形成取向层（40），以利用取向层（40）填补色阻图案（30）之间的沟槽，而不需要再制作平坦层，从而减少了一道制程，增加了生产产能。

Description

一种彩膜基板的制作方法以及彩膜基板、液晶显示面板
【技术领域】
本发明涉及液晶显示技术领域，特别是涉及一种彩膜基板的制作方法以及彩膜基板、液晶显示器。
【背景技术】
随着移动显示的日益普及，新一代移动显示技术向高画质、高分辨率、轻薄及低功耗发展。LTPS（Low Temperature Poly-silicon）技术以其优越的高画质、高分辨率、超轻薄及低功耗等性能备受广大消费者喜爱，LTPS技术正在逐渐取代传统a-Si TFT技术，成为新一代显示技术主流。
传统LTPS CF（彩膜基板）制作过程中需要在玻璃基板上制作一层平坦层（OC：Over Coat）,将BM（黑矩阵）与RGB（色阻图案）中间区域覆盖，增加CF表面平坦化，减少液晶扭转阻碍。因OC层除平坦化没有其他作用，使CF整体生产周期增长，造成产能损失。
【发明内容】
本发明主要解决的技术问题是提供一种彩膜基板的制作方法以及彩膜基板、液晶显示面板倒装芯片及其封装方法，能够简化制作工艺，增加生产产能。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种彩膜基板的制作方法，其特征在于，包括：
提供一基板；在基板形成黑矩阵，黑矩阵用于定义多个间隔设置的色阻区域；在色阻区域上形成色阻图案；在色阻图案以及黑矩阵上形成取向层，以利用取向层填补色阻图案之间的沟槽。
其中，在色阻区域上形成色阻图案包括：将色阻图案设置成突出于黑矩阵，并且色阻图案与黑矩阵部分重叠。
其中，在色阻图案以及黑矩阵上形成取向层步骤之前，还包括：在黑矩阵上形成与色阻图案间隔设置的支撑柱；
在色阻图案以及黑矩阵上形成取向层的步骤进一步包括：
利用所述取向层覆盖所述支撑柱。
其中，在色阻图案以及黑矩阵上形成取向层的步骤包括：
将取向层设置成与色阻图案以及黑矩阵直接接触。
为了解决上述问题，本发明还提供了一种彩膜基板，其特征在于，包括：一基板；位于基板上的黑矩阵；位于基板上黑矩阵定义的多个间隔设置的色阻区域的色阻图案；
以及位于色阻图案和黑矩阵上的取向层，用于填补色阻图案和黑矩阵之间的沟槽。
其中，色阻图案突出于所述黑矩阵并与黑矩阵部分重叠。
其中，还包括位于黑矩阵上与色阻图案间隔设置的支撑柱，用于支撑基板，取向层覆盖支撑柱。
其中，色阻图案包括间隔设置的红、绿、蓝三色色阻。
其中，黑矩阵的材料是黑色导电光敏高分子树脂混合物。
为了解决上述问题，本发明还提供了一种液晶显示面板，包括，阵列基板、彩膜基板以及设置在所述阵列基板和所述彩膜基板之间的液晶层；
彩膜基板包括：
一基板；位于基板上的黑矩阵；位于基板上黑矩阵定义的多个间隔设置的色阻区域的色阻图案；以及位于色阻图案和黑矩阵上的取向层，用于填补色阻图案和黑矩阵之间的沟槽。
其中，色阻图案突出于黑矩阵并与黑矩阵部分重叠。
其中，还包括位于黑矩阵上与色阻图案间隔设置的支撑柱，用于支撑基板，取向层覆盖支撑柱。
其中，色阻图案包括间隔设置的红、绿、蓝三色色阻。
其中，黑矩阵的材料是黑色导电光敏高分子树脂混合物。
本发明的有益效果是：区别于现有技术的情况，本发明的彩膜基板的制作方法以及彩膜基板、液晶显示面板，通过直接在在色阻图案以及黑矩阵上形成取向层，以利用取向层填补色阻图案之间的沟槽，而不需要再制作平坦层，从而减少了一道制程，增加了生产产能。
【附图说明】
图1是本发明彩膜基板的制作方法一实施方式的流程图；
图2是本发明彩膜基板一实施方式的结构示意图；
图3是本发明液晶显示面板一实施方式的结构示意图。
【具体实施方式】
在以下描述中阐述了具体的细节以便充分理解本发明。但是本发明能够以多种不同于在此描述的其他方式来实施，本领域技术人员可以在不违背本发明内涵的情况下做类似推广。因此本发明不受下面公开的具体实施方式的限制。
针对背景技术中提到的缺陷，本发明提供一种彩膜基板的制作方法。下面将结合附图和实施方式对本发明作进一步的详细描述。
参阅图1，图1为本发明彩膜基板的制作方法一实施方式的流程图，本发明彩膜基板的制作方法一实施方式中，所述方法具体包括如下步骤：
S10提供一基板；该基板可以是玻璃、塑料等材质，在这里不做具体限定；
S20在基板形成黑矩阵，黑矩阵用于定义多个间隔设置的色阻区域；
S30在色阻区域上形成色阻图案；
黑矩阵是沉积在色阻图案之间的不透光部分，它的主要作用是防止背景光泄漏，提高显示对比度，防止混色和增加颜色的纯度。由于黑矩阵的光密度要求在3以上，因此采用在基片玻璃上溅射铬层，然后光刻出所需图案的方法，也可以采用采用含有黑色染料的树脂光刻胶。
S40在色阻图案以及黑矩阵上形成取向层，以利用取向层填补色阻图案之间的沟槽。
优选的，S30在色阻区域上形成色阻图案包括：将色阻图案设置成突出于黑矩阵，并且色阻图案与黑矩阵部分重叠，以避免背景光泄露。
优选的，S40在色阻图案以及黑矩阵上形成取向层步骤之前，还包括：在黑矩阵上形成与色阻图案间隔设置的支撑柱；利用取向层覆盖支撑柱。
优选的，S40在色阻图案以及黑矩阵上形成取向层的步骤包括：将取向层设置成与色阻图案以及黑矩阵直接接触。
上述本发明彩膜基板的制作方法实施方式中，通过直接在在色阻图案以及黑矩阵上形成取向层，以利用取向层填补色阻图案之间的沟槽，而不需要再制作平坦层，从而减少了一道制程，增加了生产产能。
参阅图2，图2为本发明的彩膜基板一实施方式的结构示意图，本发明彩膜基板一实施方式中，包括：
基板10，该基板可以是玻璃或者塑料等材质；
位于基板10上的黑矩阵20，黑矩阵20是沉积在色阻图案之间的不透光部分，它的主要作用是防止背景光泄漏，提高显示对比度，防止混色和增加颜色的纯度。由于黑矩阵20的光密度要求在3以上，因此采用在基片玻璃上溅射铬层，然后光刻出所需图案的方法，也可以采用采用含有黑色染料的树脂光刻胶；
其中，优选的，黑矩阵20的材料是黑色导电光敏高分子树脂混合物；
位于基板10上黑矩阵20定义的多个间隔设置的色阻区域的色阻图案30，其中，色阻图案30突出于黑矩阵20并与黑矩阵部分重叠，以避免背景光泄露；
其中，优选的，色阻图案30包括间隔设置的红、绿、蓝三色色阻。
以及位于色阻图案30和黑矩阵20上的取向层40，用于填补色阻图案30和黑矩阵20之间的沟槽，其中，取向层40和色阻图案30以及黑矩阵20直接接触，而不再设置平坦层。
本发明彩膜基板一优选实施方式中，继续参照图2，还包括位于黑矩阵20上与色阻图案30间隔设置的支撑柱50，用于支撑基板10，取向层40覆盖支撑柱50。
本发明彩膜基板实施方式中，通过直接在在色阻图案30以及黑矩阵20上形成取向层40，以利用取向层40填补色阻图案30之间的沟槽，而不需要再设置平坦层，从而简化了彩膜基板的结构，减少了一道制程，增加了生产产能。
参照图3，本发明还提供了一种液晶显示面板，包括阵列基板41、彩膜基板42以及设置在阵列基板和彩膜基板之间的液晶层43。
其中，彩膜基板42的具体结构以及制造方法与上述的彩膜基板的实施方式类似，具体请参见上述彩膜基板的实施方式以及优选实施方式中的相关描述。
本发明液晶显示面板实施方式中，彩膜基板42通过直接在在色阻图案以及黑矩阵上形成取向层，以利用取向层填补色阻图案之间的沟槽，而不需要再设置平坦层，从而简化了彩膜基板的结构，减少了一道制程，增加了生产产能。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (14)

  1. 一种彩膜基板的制作方法，其中，包括：
    提供一基板；
    在所述基板形成黑矩阵，所述黑矩阵用于定义多个间隔设置的色阻区域；
    在所述色阻区域上形成色阻图案；
    在所述色阻图案以及所述黑矩阵上形成取向层，以利用所述取向层填补所述色阻图案之间的沟槽。
  2. 根据权利要求1所述的彩膜基板的制作方法，其中，所述在所述色阻区域上形成色阻图案包括：
    将所述色阻图案设置成突出于所述黑矩阵，并且所述色阻图案与所述黑矩阵部分重叠。
  3. 根据权利要求1所述的彩膜基板的制作方法，其中，在所述色阻图案以及所述黑矩阵上形成取向层步骤之前，还包括：在所述黑矩阵上形成与所述色阻图案间隔设置的支撑柱；
    在所述色阻图案以及所述黑矩阵上形成取向层的步骤进一步包括：
    利用所述取向层覆盖所述支撑柱。
  4. 根据权利要求1所述的彩膜基板的制作方法，其中，在所述色阻图案以及所述黑矩阵上形成取向层的步骤包括：
    将所述取向层设置成与所述色阻图案以及所述黑矩阵直接接触。
  5. 一种彩膜基板，其中，包括：
    一基板；
    位于所述基板上的黑矩阵；
    位于所述基板上所述黑矩阵定义的多个间隔设置的色阻区域的色阻图案；
    以及位于所述色阻图案和所述黑矩阵上的取向层，用于填补所述色阻图案和所述黑矩阵之间的沟槽。
  6. 根据权利要求5所述的彩膜基板，其中，所述色阻图案突出于所述黑矩阵并与所述黑矩阵部分重叠。
  7. 根据权利要求5所述的彩膜基板，其中，还包括位于所述黑矩阵上与所述色阻图案间隔设置的支撑柱，用于支撑所述基板，所述取向层覆盖所述支撑柱。
  8. 根据权利要求5所述的彩膜基板，其中，所述色阻图案包括间隔设置的红、绿、蓝三色色阻。
  9. 根据权利要求5所述的彩膜基板，其中，所述黑矩阵的材料是黑色导电光敏高分子树脂混合物。
  10. 一种液晶显示面板，其中，包括，阵列基板、彩膜基板以及设置在所述阵列基板和所述彩膜基板之间的液晶层；
    所述彩膜基板包括：
    一基板；
    位于所述基板上的黑矩阵；
    位于所述基板上所述黑矩阵定义的多个间隔设置的色阻区域的色阻图案；
    以及位于所述色阻图案和所述黑矩阵上的取向层，用于填补所述色阻图案和所述黑矩阵之间的沟槽。
  11. 根据权利要求10所述的液晶显示面板，其中，所述色阻图案突出于所述黑矩阵并与所述黑矩阵部分重叠。
  12. 根据权利要求10所述的彩膜基板，其中，还包括位于所述黑矩阵上与所述色阻图案间隔设置的支撑柱，用于支撑所述基板，所述取向层覆盖所述支撑柱。
  13. 根据权利要求10所述的彩膜基板，其中，所述色阻图案包括间隔设置的红、绿、蓝三色色阻。
  14. 根据权利要求10所述的彩膜基板，其中，所述黑矩阵的材料是黑色导电光敏高分子树脂混合物。
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